CN110129745A - The film plating process of the deielectric-coating of changeable refractive index and color film containing the deielectric-coating - Google Patents
The film plating process of the deielectric-coating of changeable refractive index and color film containing the deielectric-coating Download PDFInfo
- Publication number
- CN110129745A CN110129745A CN201910419245.0A CN201910419245A CN110129745A CN 110129745 A CN110129745 A CN 110129745A CN 201910419245 A CN201910419245 A CN 201910419245A CN 110129745 A CN110129745 A CN 110129745A
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- CN
- China
- Prior art keywords
- coating
- deielectric
- film
- refractive index
- nitrogen
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
Abstract
The invention discloses the film plating process of the deielectric-coating of changeable refractive index and containing the color film of the deielectric-coating, include the following steps: to provide substrate to be coated；Using Vacuum Coating method, using silicon target as target, using nitrogen and oxygen as reaction gas, deposition medium film, controls the variations in refractive index of deielectric-coating by adjusting the flow proportional of nitrogen and oxygen on the substrate.The refractive index of traditional deielectric-coating immobilizes, in the present invention, using Vacuum Coating method, using silicon target as target, using nitrogen and oxygen as reaction gas, deposition medium film on the substrate, the variations in refractive index of deielectric-coating is controlled by adjusting the flow proportional of nitrogen and oxygen, the preparation that multiple color film can be realized according to demand, be presented colourful different colours, be more flexible the preparation of color film and variability, coating process is stable, simple, it is lower to equipment configratioin requirement, to reduce equipment investment, save coating cost.
Description
Technical field
The present invention relates to coating technique fields, film plating process more particularly to the deielectric-coating of changeable refractive index and contain
The color film of the deielectric-coating.
Background technique
As the improvement of people's living standards, the electronic products such as mobile phone have become the essential articles for daily use of people,
In recent years, consumer was not only higher and higher to the requirement of handset capability, while the requirement to its comfort level and appearance is also continuous
It improves, more and more users wish that oneself used product is a special and distinguished product, it is seen then that this
Innovation discontented and for electronic product appearance and change affirmative of a little users for the appearance of electronic product at this stage
There are many expectations.In face of consumer's increasingly higher demands, when technological innovation and function innovation are constantly being sought by many producers
Come while catering to environment, energy conservation and the development trend of differenceization, for the favor won public eyeball, obtain consumer, no
The disconnected appearance with regard to product improves.
In order to meet to the multifarious requirement of the color of electronic product appearance, the color film of colorful is on product design
It is more and more widely used.Existing color film is usually by first medium film and the alternately arranged heap of second medium film
Folded film layer, wherein the refractive index of the first medium film is higher than the refractive index of the second medium film, first medium film is usually adopted
With silicon nitride film, second medium film generallys use silicon oxide film, since the refractive index of first medium film and second medium film is solid
Fixed constant, the color change of color film is not abundant enough.
Summary of the invention
In order to make up the defect of prior art, the present invention provides the film plating process of the deielectric-coating of changeable refractive index and contains and is somebody's turn to do
The color film of deielectric-coating.
The technical problems to be solved by the invention are achieved by the following technical programs:
The film plating process of the deielectric-coating of changeable refractive index, includes the following steps:
Substrate to be coated is provided；
Using Vacuum Coating method, using silicon target as target, using nitrogen and oxygen as reaction gas, deposition is situated between on the substrate
Plasma membrane controls the variations in refractive index of deielectric-coating by adjusting the flow proportional of nitrogen and oxygen.
Further, the refractive index of the deielectric-coating changes between 1.46-2.0.
A kind of color film is by first medium film and the alternately arranged stacking film layer of second medium film, the first medium
The refractive index of film is higher than the refractive index of the second medium film, wherein the first medium film and second medium film are all made of
Film plating process is stated to be prepared.
The invention has the following beneficial effects:
The refractive index of traditional deielectric-coating immobilizes, in the present invention, using Vacuum Coating method, using silicon target as target, with nitrogen
Gas and oxygen are as reaction gas, and deposition medium film, is controlled by adjusting the flow proportional of nitrogen and oxygen on the substrate
The variations in refractive index of deielectric-coating processed can realize the preparation of multiple color film according to demand, colourful different colours are presented, make
The preparation of color film is more flexible and variability, and coating process is stable, simple, lower to equipment configratioin requirement, to reduce
Equipment investment, saves coating cost.
Specific embodiment
The present invention will now be described in detail with reference to examples, and the examples are only preferred embodiments of the present invention,
It is not limitation of the invention.
Existing color film is usually by first medium film and the alternately arranged stacking film layer of second medium film, wherein described
The refractive index of first medium film is higher than the refractive index of the second medium film, and first medium film generallys use silicon nitride film, and second
Deielectric-coating generallys use silicon oxide film, and the color of color film is derived mainly from deielectric-coating, due to first medium film and second medium
The refractive index of film is fixed and invariable, can only by adjusting the material of deielectric-coating, film thickness and the number of plies to obtaining multiple color film,
The preparation process flexibility and variability of color film are insufficient, are unable to satisfy consumer demand.
Based on this, the present invention provides a kind of film plating process of the deielectric-coating of changeable refractive index, includes the following steps:
Substrate to be coated is provided；The present invention is not especially limited the material of substrate, such as can be glass substrate, this implementation
Example substrate include but is not limited to different materials enumerated supra, be also possible to other it is unlisted in the present embodiment but by
Other materials well-known to those skilled in the art.
Using Vacuum Coating method, using silicon target as target, using nitrogen and oxygen as reaction gas, sink on the substrate
Product deielectric-coating controls the variations in refractive index of deielectric-coating by adjusting the flow proportional of nitrogen and oxygen.
It is appreciated that the refractive index of deielectric-coating is divided when being used as reaction gas preparation media film using nitrogen and oxygen respectively
Not Wei 2.0 and 1.46, reaction gas is used as using nitrogen and oxygen in the present invention, by the flow proportional of adjusting nitrogen and oxygen come
The variations in refractive index of deielectric-coating is controlled, the refractive index of the deielectric-coating changes between 1.46-2.0.
In the present invention, the deielectric-coating reacted by the silicon target sputtered in vacuum cavity with reaction gas and deposit and
At.The present invention is not especially limited the specific process parameter of vacuum coating, and structure and principle are all this technology personnel
It is learnt by technical manual or is known by routine experiment method, those skilled in the art can adjust according to actual needs
It is whole.
The present invention also provides a kind of color film, be by first medium film and the alternately arranged stacking film layer of second medium film,
The refractive index of the first medium film is higher than the refractive index of the second medium film, wherein the first medium film and second is situated between
Plasma membrane is all made of above-mentioned film plating process and is prepared.
It should be noted that color film be by first medium film and the alternately arranged stacking film layer of second medium film, it is described
The refractive index of first medium film is higher than the refractive index of the second medium film, utilizes the refraction of first medium film and second medium film
Rate is different, so that the overall reflectivity of color film is different, the light of different colours can be reflected, so that user's human eye is seen
Show the product of different colors.
Embodiments of the present invention above described embodiment only expresses, the description thereof is more specific and detailed, but can not
Therefore limitations on the scope of the patent of the present invention are interpreted as, as long as skill obtained in the form of equivalent substitutions or equivalent transformations
Art scheme should all be fallen within the scope and spirit of the invention.
Claims (3)
1. the film plating process of the deielectric-coating of changeable refractive index, which is characterized in that it includes the following steps:
Substrate to be coated is provided；
Using Vacuum Coating method, using silicon target as target, using nitrogen and oxygen as reaction gas, deposition is situated between on the substrate
Plasma membrane controls the variations in refractive index of deielectric-coating by adjusting the flow proportional of nitrogen and oxygen.
2. the film plating process of the deielectric-coating of changeable refractive index as described in claim 1, which is characterized in that the folding of the deielectric-coating
Rate is penetrated to change between 1.46-2.0.
3. a kind of color film, which is characterized in that be by first medium film and the alternately arranged stacking film layer of second medium film, it is described
The refractive index of first medium film is higher than the refractive index of the second medium film, wherein the first medium film and second medium film
Film plating process described in claim 1 is all made of to be prepared.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910419245.0A CN110129745A (en) | 2019-05-20 | 2019-05-20 | The film plating process of the deielectric-coating of changeable refractive index and color film containing the deielectric-coating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910419245.0A CN110129745A (en) | 2019-05-20 | 2019-05-20 | The film plating process of the deielectric-coating of changeable refractive index and color film containing the deielectric-coating |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN110129745A true CN110129745A (en) | 2019-08-16 |
Family
ID=67571661
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910419245.0A Pending CN110129745A (en) | 2019-05-20 | 2019-05-20 | The film plating process of the deielectric-coating of changeable refractive index and color film containing the deielectric-coating |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN110129745A (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013001023A1 (en) * | 2011-06-30 | 2013-01-03 | Agc Glass Europe | Temperable and non-temperable transparent nanocomposite layers |
| CN103436849A (en) * | 2013-08-20 | 2013-12-11 | 广州新视界光电科技有限公司 | Sputtering method for sull |
| CN108205167A (en) * | 2017-12-18 | 2018-06-26 | 信利光电股份有限公司 | A kind of method for improving electronic product cover board colour stability |
-
2019
- 2019-05-20 CN CN201910419245.0A patent/CN110129745A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013001023A1 (en) * | 2011-06-30 | 2013-01-03 | Agc Glass Europe | Temperable and non-temperable transparent nanocomposite layers |
| CN103436849A (en) * | 2013-08-20 | 2013-12-11 | 广州新视界光电科技有限公司 | Sputtering method for sull |
| CN108205167A (en) * | 2017-12-18 | 2018-06-26 | 信利光电股份有限公司 | A kind of method for improving electronic product cover board colour stability |
Non-Patent Citations (1)
| Title |
|---|
| 朱勇等: "射频磁控反应溅射氮氧化硅薄膜的研究", 《光学学报》 * |
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| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20190816 |
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| RJ01 | Rejection of invention patent application after publication |