CN110120463A - Display base plate and preparation method thereof, display device - Google Patents
Display base plate and preparation method thereof, display device Download PDFInfo
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- CN110120463A CN110120463A CN201910441280.2A CN201910441280A CN110120463A CN 110120463 A CN110120463 A CN 110120463A CN 201910441280 A CN201910441280 A CN 201910441280A CN 110120463 A CN110120463 A CN 110120463A
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
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- H—ELECTRICITY
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Abstract
The present invention provides a kind of display base plates and preparation method thereof, display device.Display base plate includes display area and non-display area, the non-display area includes the inorganic encapsulated layer of functional layer, the barricade being arranged in the functional layer and the covering functional layer and barricade, between the display area and barricade, the functional layer includes multiple spaced grooves, and the contact surface of the functional layer and inorganic encapsulated layer is made to form concaveconvex structure.Multiple spaced grooves are arranged by the region between display area and barricade in the present invention, the contact surface of functional layer and inorganic encapsulated layer is set to form concaveconvex structure, increase the region membranous layer binding force, eliminate the delamination in region or cracking between display area and barricade, avoid the water oxygen intrusion path because of delamination or cracking formation, the validity and reliability of encapsulation has been effectively ensured, and had many advantages, such as low manufacture cost, be easy to technique realization.
Description
Technical field
The present invention relates to field of display technology, and in particular to a kind of display base plate and preparation method thereof, display device.
Background technique
Organic Light Emitting Diode (Organic Light Emitting Diode, OLED) is active light-emitting display device,
Have many advantages, such as self-luminous, wide viewing angle, high contrast, compared with low power consumption, reaction speed is fast, bright in luster, slimming is flexible.With
The continuous development of display technology, OLED technology more and more apply in various display devices, become the mainstream of existing market.
Since OLED display technology is shone using luminous organic material, luminous organic material is easily reacted with water oxygen, minimal amount
Vapor and oxygen can damage luminous organic material, deteriorate the luminescent properties of oled panel, therefore oled panel is to envelope
Equipped with very high requirement.Existing packaged type mainly includes cover board packaged type and thin-film package mode, and flexible OLED is usual
Using thin-film package (Thin Film Encapsulation, TFE) mode, thin-film package have the characteristics that it is frivolous, pliable,
To obstruct the water oxygen etch from luminous organic material upper layer.
Actual use shows there are problems that package failure, and package failure using the oled panel of thin-film packing structure
Problem is the problem of thin-film packing structure of all kinds not can effectively solve always.Therefore, existing encapsulation scheme how is solved
Existing package failure problem is this field technical problem urgently to be resolved.
Summary of the invention
The embodiment of the present invention is the technical problem to be solved is that, provide a kind of display base plate and preparation method thereof, display dress
It sets, to solve the problems, such as package failure existing for existing encapsulation scheme.
In order to solve the above-mentioned technical problem, the embodiment of the invention provides a kind of display base plate, including display area and non-
Display area, the non-display area include functional layer, the barricade being arranged in the functional layer and the covering functional layer
With the inorganic encapsulated layer of barricade, between the display area and barricade, the functional layer includes multiple spaced grooves,
The contact surface of the functional layer and inorganic encapsulated layer is set to form concaveconvex structure.
Optionally, the functional layer includes the insulating layer of substrate and setting on the substrate, and the multiple interval is set
The groove set is arranged in the substrate or insulating layer.
Optionally, the substrate includes the first substrate, the buffer layer being arranged in first substrate and is arranged described
The second substrate on buffer layer, the multiple spaced groove are arranged in second substrate.
Optionally, the insulating layer include the first insulating layer, setting second insulating layer on the first insulating layer and
Third insulating layer on the second insulating layer is set, and the multiple spaced groove setting is in first insulation
On layer, second insulating layer or third insulating layer.
Optionally, the barricade includes the first barricade around the display area and second around first barricade
Barricade, the multiple spaced groove are arranged between the display area and the first barricade, first barricade and the
Two barricades are for preventing the organic material of inkjet printing from overflowing.
Optionally, in the plane perpendicular to display base plate, the cross sectional shape of the groove includes rectangle, semicircle or falls
It is trapezoidal.
Optionally, in the plane for being parallel to display base plate, the groove is around the display area.
The embodiment of the invention also provides a kind of display devices, including display base plate above-mentioned.
In order to solve the above-mentioned technical problem, described the embodiment of the invention also provides a kind of preparation method of display base plate
Display base plate includes display area and non-display area, and preparation method includes:
Functional layer is formed in the non-display area, the functional layer includes multiple spaced grooves；
Barricade is formed in the non-display area, the multiple spaced groove is made to be located at the display area and gear
Between wall；
The inorganic encapsulated layer for covering the functional layer and barricade is formed in the non-display area, makes the functional layer and nothing
The contact surface of machine encapsulated layer forms concaveconvex structure.
Optionally, functional layer is formed in the non-display area, the functional layer includes multiple spaced grooves, packet
It includes:
Form substrate；
The first insulating layer, second insulating layer and third insulating layer are sequentially formed in substrate, it is the multiple spaced
Groove is formed on first insulating layer, second insulating layer or third insulating layer.
Optionally, functional layer is formed in the non-display area, the functional layer includes multiple spaced grooves, packet
It includes:
The first substrate, buffer layer and the second substrate sequentially formed, the multiple spaced groove are formed in described
In second substrate；
The first insulating layer, second insulating layer and third insulating layer are sequentially formed in second substrate.
Optionally, when the multiple spaced groove is formed on the third insulating layer, the multiple interval
The groove of setting and the via hole of display area with a patterning processes by forming.
Optionally, in the plane perpendicular to display base plate, the cross sectional shape of the groove includes rectangle, semicircle or falls
It is trapezoidal.
Optionally, in the plane for being parallel to display base plate, the groove is around the display area.
The embodiment of the invention provides a kind of display base plate and preparation method thereof, display device, by display area with
Multiple spaced grooves are arranged in region between barricade, and functional layer and the contact surface of inorganic encapsulated layer is made to form concave-convex knot
Structure increases the region membranous layer binding force, eliminates the delamination in region or cracking between display area and barricade, avoids because of delamination
Or the water oxygen intrusion path that cracking is formed, the validity and reliability of encapsulation is effectively ensured, and there is low manufacture cost, be easy to
The advantages that technique is realized.
Certainly, implement any of the products of the present invention or method it is not absolutely required at the same reach all the above excellent
Point.Other features and advantages of the present invention will illustrate in subsequent specification embodiment, also, partly implement from specification
It is become apparent in example, or understand through the implementation of the invention.The purpose of the embodiment of the present invention and other advantages can pass through
Specifically noted structure is achieved and obtained in the specification, claims and drawings.
Detailed description of the invention
Attached drawing is used to provide to further understand technical solution of the present invention, and constitutes part of specification, with this
The embodiment of application technical solution for explaining the present invention together, does not constitute the limitation to technical solution of the present invention.Attached drawing
In the shapes and sizes of each component do not reflect actual proportions, purpose is schematically illustrate the content of present invention.
Fig. 1 is the structural schematic diagram of display base plate of the embodiment of the present invention；
Fig. 2 is that the invention shows the structural schematic diagrams of substrate first embodiment；
Fig. 3 is that first embodiment of the invention forms the schematic diagram after base pattern；
Fig. 4 is that first embodiment of the invention forms the schematic diagram after active layer, gate electrode pattern；
Fig. 5 is that first embodiment of the invention forms the schematic diagram after third insulating layer pattern；
Fig. 6 is that first embodiment of the invention forms the schematic diagram after source electrode and drain electrode pattern；
Fig. 7 is that first embodiment of the invention forms the schematic diagram after anode pattern；
Fig. 8 is that first embodiment of the invention forms the schematic diagram after pixel defining layer and barricade pattern；
Fig. 9 is that first embodiment of the invention forms the schematic diagram after organic luminous layer and cathode pattern；
Figure 10 is that first embodiment of the invention forms the schematic diagram after encapsulation layer pattern；
Figure 11 is the schematic diagram at first embodiment of the invention organic layer edge；
Figure 12 is that the invention shows the structural schematic diagrams of substrate second embodiment.
Description of symbols:
1-glass support plate；The first substrate of 10a-；The second substrate of 10b-；
11-buffer layers；12-active layers；13-the first insulating layer；
14-first gate electrodes；15-the second gate electrode；16-second insulating layers；
17-capacitance electrodes；18-third insulating layers；19-source electrodes；
20-drain electrodes；21-the four insulating layer；31-anodes；
32-pixel defining layers；33-organic luminous layers；34-cathodes；
35-the first inorganic layer；36-organic layers；37-the second inorganic layer；
100-display areas；200-non-display areas；300-barricades；
400-reinforcement structures；101-thin film transistor (TFT)s；201-grooves；
202-the first barricade；203-the second barricade.
Specific embodiment
Specific embodiments of the present invention will be described in further detail with reference to the accompanying drawings and examples.Following embodiment
For illustrating the present invention, but it is not intended to limit the scope of the invention.It should be noted that in the absence of conflict, the application
In embodiment and embodiment in feature can mutual any combination.
Currently, the existing oled panel using thin-film packing structure includes display area and non-display area, display area
Be provided with multiple luminescence units, non-display area is provided with barricade, thin-film package include folded the first inorganic layer set, organic layer and
Second inorganic layer, the gear of the multiple luminescence units and non-display area of the first inorganic layer and the second inorganic layer covering display area
Wall, organic layer are provided only on display area, between the first inorganic layer and the second inorganic layer.It is studied through present inventor
It is due to being folded in panel it was found that there is the reason of package failure using the oled panel of above-mentioned thin-film packing structure
The non-display area of panel occurs delamination (peeling) in journey, and the crack that delamination is formed provides extraneous water oxygen and intrudes into display
The water oxygen intrusion path of the organic luminous layer in region, thus the luminescent properties of oled panel is caused to deteriorate.Through present inventor
Further study show that, relative to the thickness of display area inorganic film, the film layer in region is thick between display area and barricade
Degree is smaller, while organic layer also ends in the position, so that the film layer in the region only includes multiple inorganic layers, film inter-layer bonding force
Weakness, thus the region between display area and barricade occurs for most of delamination.
In order to solve the problems, such as package failure existing for existing encapsulation scheme, the embodiment of the invention provides a kind of display bases
Plate and preparation method thereof, display device, can be effectively ensured the validity and reliability of encapsulation, and have low manufacture cost, easily
In technique realize the advantages that.Display base plate of the embodiment of the present invention includes display area and non-display area, the display area packet
Include multiple luminescence units of array distribution, the non-display area include functional layer, the barricade being arranged in the functional layer with
And the inorganic encapsulated layer of the covering functional layer and barricade, the region between the display area and barricade is provided with increase film layer
The reinforcement structure of binding force, reinforcement structure include the multiple spaced grooves being arranged in the functional layer, make the function
The contact surface of the contact surface of ergosphere and inorganic encapsulated layer formation concaveconvex structure, functional layer and inorganic encapsulated layer forms concaveconvex structure can
To eliminate the delamination of region film layer or cracking between display area and barricade, avoids the formation of extraneous water oxygen and intrude into display area
The water oxygen intrusion path of organic luminous layer.
Fig. 1 is the structural schematic diagram of display base plate of the embodiment of the present invention.As shown in Figure 1, display base plate includes display area
100 and annular be centered around the non-display area 200 of the periphery of display area 100.In the plane for being parallel to display base plate, display
Region includes multiple luminescence units of array distribution, and non-display area 200 includes annular barricade 300 and is located at display area
Annular reinforcement structure 400 between 100 and barricade 300.Wherein, each luminescence unit of display area 100 is as a sub- picture
Element, 3 outgoing different colours light (such as RGB) luminescence units or 4 outgoing different colours light (such as red, green, blue and white) shine
Unit forms a pixel unit.In the plane perpendicular to display base plate, display area 100 includes driving structure layer and sets
The light emitting structure layer on driving structure layer is set, non-display area 200 includes the barricade of functional layer and setting on a functional
300, and setting reinforcement structure 400 on a functional, functional layer includes substrate and the insulating layer that is arranged in substrate, barricade
Organic material is prevented to overflow to non-display area when printing organic material for subsequent i alphakjet, reinforcement structure 400 is located at viewing area
Between domain and barricade, to eliminate delamination or the cracking of the region film layer, avoids the formation of extraneous water oxygen and intrude into having for display area
The water oxygen intrusion path of machine luminescent layer.Wherein, driving structure layer mainly includes multiple thin film transistor (TFT)s (Thin Film
Transistor, TFT), light emitting structure layer mainly includes anode, pixel defining layer, organic luminous layer, cathode and encapsulated layer.
The embodiment of the present application provides a kind of flexible oled display substrate, passes through the region between display area and barricade
Multiple spaced grooves are set, so that the contact surface of functional layer and inorganic encapsulated layer is formed concaveconvex structure, increases the region film
Layer binding force, eliminates the delamination in region or cracking between display area and barricade, avoids the water because of delamination or cracking formation
Oxygen intrusion path, be effectively ensured encapsulation validity and reliability, and have low manufacture cost, be easy to technique realize etc. it is excellent
Point solves the problems, such as package failure existing for existing encapsulation scheme.
Below by the specific embodiment technical solution that the present invention will be described in detail.
First embodiment
Fig. 2 is to illustrate the invention shows the structural schematic diagram of substrate first embodiment perpendicular to the flat of display base plate
The structure of display area and non-display area on face.As shown in Fig. 2, in the plane perpendicular to display base plate, display area
Main structure includes the driving structure layer and light emitting structure layer being arranged in substrate, and driving structure layer includes multiple film crystals
It manages, is only illustrated by taking a luminescence unit and a thin film transistor (TFT) as an example in Fig. 2.Specifically, substrate includes the first substrate
10a, the buffer layer 11 being arranged on the first substrate 10a and the second substrate 10b being arranged on buffer layer 11, driving structure layer master
It to include the thin film transistor (TFT) 101 being arranged on the second substrate 10b.Light emitting structure layer mainly includes and thin film transistor (TFT) 101
Drain electrode connection anode 31, limit pixel openings region pixel defining layer 32, be arranged in it is organic in pixel openings region
Luminescent layer 33, the cathode 34 being arranged on organic luminous layer 33, the first inorganic layer 35 of the entire substrate of covering, setting are in the first nothing
Second inorganic layer 37 of organic layer 36 on machine layer 35 and the entire substrate of covering, it is the first inorganic layer 35, organic in display area
Layer 36 and the second inorganic layer 37 form encapsulated layer, and in non-display area, the first inorganic layer 35 and the second inorganic layer 37 form inorganic
Encapsulated layer.
As shown in Fig. 2, the main structure of non-display area includes being arranged in substrate in the plane perpendicular to display base plate
On insulating layer, setting reinforcement structure on the insulating layer and barricade and the inorganic encapsulated layer for covering reinforcement structure and barricade,
Substrate and insulating layer are as functional layer.Wherein, substrate include the first substrate 10a, the buffer layer 11 that is arranged on the first substrate 10a
With the second substrate 10b being arranged on buffer layer 11, insulating layer include the first insulating layer 13 being formed simultaneously with driving structure layer,
Second insulating layer 16 and third insulating layer 18, barricade include the first barricade 202 and the second barricade 203, the first barricade 202 and second
Barricade 203 is arranged with 32 same layer of pixel defining layer in display area, material is identical and is formed by same one-time process, inorganic envelope
Filling layer includes the first inorganic layer 35 and the second inorganic layer 37.Wherein, reinforcement structure is arranged in third insulating layer 18 far from substrate one
On the surface of side, including multiple spaced grooves 201, multiple spaced grooves 201 are located at display area and first
Between barricade 202.In the plane perpendicular to display base plate, the cross sectional shape of groove 201 can be rectangle, semicircle, the ladder that falls
The cross sectional shape of the shapes such as shape, the first barricade 202 and the second barricade 203 can be the shapes such as rectangle, trapezoidal.It is being parallel to display
In the plane of substrate, the first barricade 202 and the second barricade 203 are around the surrounding of display area, and groove 201 is around display area
Surrounding and it is parallel to the first barricade 202.
Below by the preparation process of the present embodiment display base plate technical solution that the embodiment of the present invention will be further explained.Its
In, described " patterning processes " include depositional coating, coating photoresist, mask exposure, development, etching, removing in the present embodiment
Photoresist etc. is handled, and described " photoetching process " includes the processing such as coating film layer, mask exposure, development, this reality in the present embodiment
Applying vapor deposition, deposition, coating, coating etc. described in example is preparation process mature in the related technology.
Fig. 3~10 are the schematic diagram of the present embodiment display base plate preparation process.The preparation process of display base plate includes:
(1) base pattern is formed.Forming base pattern includes: that one layer of flexible material is first coated in glass support plate 1, solidification
Film forming forms the first substrate 10a.Then, one layer of buffer thin film is deposited on the first substrate 10a, is formed and is covered entire first base
11 pattern of buffer layer of bottom 10a.Finally, one layer of coating flexible material on buffer layer 11, film-forming form the second substrate
10b.Wherein, flexible material can use polyimides PI, polyethylene terephthalate PET or surface treated polymer
The materials such as mantle form flexible substrates, as shown in Figure 3.Buffer thin film can use silicon nitride SiNx or silicon oxide sio x etc., can
To be single layer, it is also possible to nitrogenize the multilayered structure of silicon/oxidative silicon.In the present embodiment, display area and the equal shape of non-display area
At having the first substrate 10a, buffer layer 11 and the second substrate 10b.
(2) active layer, gate electrode, capacitor electrode patterns are formed on the substrate.Be formed on the substrate active layer, gate electrode,
Capacitor electrode patterns include:
A, on the basis of forming above structure, one layer of active layer film is deposited, by patterning processes to active layer film
It is patterned, forms 12 pattern of active layer being arranged on the second substrate 10b in display area；
B, then, it is sequentially depositing the first insulation film and the first metallic film, by patterning processes to the first metallic film
It is patterned, the first insulating layer 13 for forming covering active layer 12, the first gate electrode 14 being arranged on the first insulating layer 13, the
Two gate electrode 15 and grid line (not shown) pattern.Wherein, first gate electrode 14, the second gate electrode 15 and grid line are made only in display
Region, non-display area at this time are formed with the first insulating layer 13.
C, then, it is sequentially depositing the second insulation film and the second metallic film, by patterning processes to the second metallic film
It is patterned, forms the second insulating layer 16 of covering first gate electrode 14 and the second gate electrode 15 and is arranged in second insulating layer
17 pattern of capacitance electrode on 16, the position of capacitance electrode 17 is corresponding with the position of the second gate electrode 15, capacitance electrode 17 with
Second gate electrode 15 constitutes capacitor, as shown in Figure 4.Wherein, capacitance electrode 17 is made only in display area, non-display area at this time
Domain is formed with the first insulating layer 13 and second insulating layer 16.
(3) the third insulating layer pattern for offering via hole and groove is formed.Formation offers via hole and the third of groove is exhausted
Edge layer pattern includes: to deposit third insulation film on the basis of forming above structure, is insulated by patterning processes to third thin
Film is patterned, and forms 18 pattern of third insulating layer opened up there are two the first via hole in display area, in two the first via holes
Third insulating layer 18, second insulating layer 16 and the first insulating layer 13 be etched away, active layer 12 is exposed, in non-display area
Multiple spaced grooves 201 are formed, as shown in Figure 5.Wherein, two the first via holes are made only in display area, at this time
Non-display area is formed with the first insulating layer 13, second insulating layer 16 and third insulating layer 18, is formed on third insulating layer 18 more
A spaced groove 201, multiple spaced grooves 201 are used as reinforcement structure, for increasing the combination between film layer
Power avoids the formation of extraneous water oxygen and intrudes into eliminate delamination or the cracking of the multiple inorganic layers in region between display area and barricade
The water oxygen intrusion path of the organic luminous layer of display area.In the plane perpendicular to display base plate, the cross sectional shape of groove 201
It can be the shapes such as rectangle, semicircle, inverted trapezoidal, in the plane for being parallel to display base plate, groove 201 is looped around display area
Surrounding.In this patterning processes, in order to be formed simultaneously two the first via holes and multiple grooves, halftoning or grey can be used
The masking process of tune is etched by first time and forms two the first via holes, forms multiple grooves by second of etching.It is practical real
Shi Shi, the parameters such as the width of groove and groove spacing can be according to the distance between display area and the first barricade and technique
Level is arranged.The thickness less than third insulating layer can be set into the depth of groove, i.e. groove does not carve third insulating layer
It wears；The overall thickness less than second insulating layer and third insulating layer also can be set into the depth of groove, i.e. groove insulate third
Layer is cut through, but does not cut through second insulating layer；The depth of groove also can be set into less than the first insulating layer, second insulating layer
With the overall thickness of third insulating layer, i.e. groove cuts through second insulating layer and third insulating layer, but does not carve the first insulating layer
It wears.When actual implementation, groove can also be formed in the first insulating layer and second insulating layer.Since third insulating layer is needed aobvious
Show that region forms via hole, needs a patterning processes, the present embodiment forms groove on third insulating layer can use the secondary structure
Figure technique will form via hole and in non-display area formation groove by being formed simultaneously with a patterning processes in display area,
It avoids and increases additional process flow, it can be compatible with existing preparation process well.
(4) source electrode and drain electrode pattern is formed.Forming source electrode and drain electrode pattern includes: to form above structure
On the basis of, third metallic film is deposited, third metallic film is patterned by patterning processes, forms source electricity in display area
Pole 19, drain electrode 20 and data line (not shown) pattern, source electrode 19 and drain electrode 20 pass through two the first via holes and have respectively
Active layer 12 connects, as shown in Figure 6.In this patterning processes, the third metallic film of non-display area is etched completely away.
By the above process, the driving structure layer positioned at display area is completed in substrate, positioned at non-display area
The preparation of reinforcement structure.Wherein, the driving structure layer positioned at display area includes active layer 12, first gate electrode 14, second gate
Electrode 15, capacitance electrode 17, source electrode 19, drain electrode 20, grid line and data line, grid line and data line square crossing limit son
Pixel, the thin film transistor (TFT) being made of active layer 12, first gate electrode 14, source electrode 19 and drain electrode 20 are arranged in sub-pixel
It is interior.Insulating layer positioned at non-display area includes the first insulating layer 13, second insulating layer 16 and third insulating layer 18, as reinforcement
Multiple grooves of structure are arranged on surface of the third insulating layer 18 far from the first side substrate 10a.Wherein, the first insulating layer and
Second insulating layer is also referred to as gate insulation layer (GI), and third insulating layer is also referred to as interlayer insulating film (ILD).
(5) anode pattern is formed.Forming anode pattern includes: first to coat the 4th absolutely on the basis of forming above structure
Edge film, by mask exposure develop photoetching process display area formed covering source electrode 19 and drain electrode 20 the 4th absolutely
21 pattern of edge layer, the 4th insulating layer 21 offer the second via hole, and the second via hole exposes drain electrode 20.Then deposition electrically conducting transparent
Film is patterned transparent conductive film by patterning processes, forms 31 pattern of anode in display area, anode 31 passes through the
Two via holes are connect with drain electrode 20, as shown in Figure 7.Wherein, the 4th insulating layer 21 and anode 31 are made only in display area, non-aobvious
The 4th insulation film and transparent conductive film for showing region are removed.Wherein, the 4th insulating layer is also referred to as planarization layer
(PLN), transparent conductive film can use tin indium oxide ITO or indium zinc oxide IZO.
(6) pixel defining layer and barricade pattern are formed.It forms pixel defining layer and barricade pattern includes: to form earlier figures
Pixel definition film is coated in the substrate of case, and pixel defining layer (Pixel Define is formed in display area by photoetching process
Layer) 32 pattern forms the first barricade 202 and 203 pattern of the second barricade, i.e. 32 pattern of pixel defining layer in non-display area
With the first barricade 202 and 203 pattern of the second barricade by being formed with a photoetching process, the two same layer is arranged and uses identical material
Material, pixel defining layer 32 limit the pixel openings region of exposed anode 31, the first barricade 202 and second gear in each sub-pixel
Wall 203 is arranged on third insulating layer 18, and the distance between the second barricade 203 and display area are greater than the first barricade 202 and show
Show the distance between region, as shown in Figure 8.Wherein, pixel defining layer 32 is formed in display area, the first barricade 202 and second
Barricade 203 is formed in non-display area, and non-display area at this time is formed with by the first insulating layer 13, second insulating layer 16 and
The insulating layer of three insulating layers 18 composition is formed in existing on third insulating layer 18 as multiple grooves of reinforcement structure and setting
The first barricade 202 and the second barricade 203 on third insulating layer 18, multiple grooves be located at the first barricade 202 and display area it
Between.Wherein, pixel defining layer can be using polyimides, acrylic or polyethylene terephthalate etc., the first barricade 202
Be with the cross-sectional shape of the second barricade 203 it is trapezoidal, can be set according to actual needs the first barricade 202 and the second barricade 203
Height, the two height may be the same or different.
(7) organic luminous layer and cathode pattern are formed.It forms organic luminous layer and cathode pattern includes: to form earlier figures
Luminous organic material and cathodic metal are successively deposited in the substrate of case, forms organic luminous layer 33 and 34 figure of cathode in display area
Case, the anode 31 in pixel openings region that organic luminous layer 33 is limited with pixel defining layer 32 are connect, and the setting of cathode 34 exists
On organic luminous layer 33, as shown in Figure 9.Wherein, organic luminous layer 33 mainly includes luminescent layer (EML).It is non-aobvious in this technique
The luminous organic material and cathodic metal for showing region are etched completely away.When actual implementation, organic luminous layer may include successively
Hole injection layer, hole transmission layer, luminescent layer, electron transfer layer and the electron injecting layer of setting improve electrons and holes injection
The efficiency of luminescent layer, cathode can use magnesium Mg, silver Ag, aluminium Al, copper Cu, one kind of lithium Li et al. metal material or above-mentioned metal
Alloy.
(8) encapsulation layer pattern is formed.Forming encapsulation layer pattern includes: first to deposit the in the substrate for forming aforementioned pattern
One inorganic thin film, the first inorganic thin film cover display area and non-display area, form 35 pattern of the first inorganic layer, i.e. the first nothing
Machine layer 35 covers pixel defining layer 32, organic luminous layer 33 and cathode 34 in display area, covers multiple in non-display area
Corresponding groove type is formed every the groove 201, the first barricade 202 and the second barricade 203 of setting, and in multiple 201 positions of groove
Shape.Then, organic layer 36 is formed in display area using inkjet printing mode, organic layer 36 is made only in the first of display area
On inorganic layer 35.Finally, the second inorganic thin film of deposition, the second inorganic thin film cover display area and non-display area, the is formed
Two inorganic layers, 37 pattern, as shown in Figure 10.In this way, the encapsulated layer including inorganic/organic/inorganic three-decker is completed, it is intermediate
Organic layer be made only in display area, upper layer and lower layer inorganic layer covers display area and non-display area, the second inorganic layer 37
Corresponding groove shapes are formed in multiple groove locations.
(9) finally, removing glass support plate 1, the preparation of complete display base plate, as shown in Figure 2.
By the above process, the system of the light emitting structure layer positioned at display area, the barricade positioned at non-display area is completed
It is standby.Wherein, the light emitting structure layer positioned at display area include anode 31, pixel defining layer 32, organic luminous layer 33, cathode 34 with
And encapsulated layer, the barricade positioned at non-display area includes the first barricade 202 and the second barricade 203, is made multiple spaced recessed
Slot 201 is between display area and the first barricade.
It is more due to being formed on the third insulating layer 18 in region between display area and the first barricade 202 in the present embodiment
A spaced groove, so that the first inorganic layer 35 and the second inorganic layer 37 of subsequent deposition are similarly formed accordingly in the region
Groove shapes, the first inorganic layer 35 and the second inorganic layer 37 are used as inorganic encapsulated layer.In this way, in display area and the first barricade
The contact surface of region between 202, third insulating layer 18 and the first inorganic layer 35 includes multiple concaveconvex structures turned back, and first is inorganic
The contact surface of layer 35 and the second inorganic layer 37 includes multiple concaveconvex structures turned back, by the way that multiple concaveconvex structures turned back are arranged,
On the one hand the contact area between film layer is increased, the bond strength between film layer is enhanced, on the other hand increases the anti-of the region
Curved intensity enhances the antistripping ability of film layer, thus effectively prevents delamination or cracking occur in the region, effectively eliminates
Because of the crack that delamination or cracking are formed, the water oxygen invasion that extraneous water oxygen intrudes into the organic luminous layer of display area is thoroughly prevented
Path ensure that the luminescent properties of oled panel.Further, due between display area and the first barricade 202 region formed
The first inorganic layer 35 also have multiple grooves, when using inkjet printing (IJP) mode display area formed organic layer 36 when,
These grooves, which can play, prevents the organic material of inkjet printing from overflowing (Overflow) to non-display area, thus has improved
The linearity at 36 edge of machine layer.Specifically, when the organic material of inkjet printing flows to non-display area, groove is not only to having
The flowing of machine material applies biggish resistance, and part organic material needs first to fill groove and could continue to flow, thus will
Organic layer 36 it is edge limited in recess region.
Figure 11 is the schematic diagram at first embodiment of the invention organic layer edge.Wherein solid line indicates the present embodiment organic layer side
Edge, dotted line indicate prior art organic layer edge.As shown in figure 11, by this present embodiment in display area 100 and barricade 300
Between region insulating layer on form multiple spaced grooves so that the first inorganic layer of subsequent deposition is same in the region
Corresponding groove shapes are formed, these grooves, which not only act as, hinders the organic material of inkjet printing to overflow to non-display area, has
Effect shortens the spilling distance of organic organic material, and organic layer edge is made to have preferable linearity, improves encapsulation
Energy.In contrast, due between display area 100 in existing structure and the first barricade 202 region be flat surface, cause to spray
The organic material of ink printing is overflowed to non-display area, not only overflows distance, but also make organic layer edge irregular.
It can be seen that display base plate provided by the present embodiment by above-mentioned preparation flow, by display area and the
Region setting between one barricade includes the reinforcement structure of multiple spaced grooves, and reinforcement structure not only increases between film layer
Bond strength, and enhance the antistripping ability of film layer, avoid the multiple nothings in region between display area and the first barricade
The delamination of machine layer or cracking eliminate the crack because of delamination or cracking formation, have thoroughly prevented extraneous water oxygen and intruded into viewing area
The water oxygen intrusion path of the organic luminous layer in domain has been effectively ensured the validity and reliability of encapsulation, ensure that oled panel
Luminescent properties.Further, the present embodiment is mentioned by setting reinforcement structure so that organic layer edge has preferable linearity
High encapsulation performance.In addition, the preparation process of the present embodiment can be realized using the Preparation equipment of existing maturation, to prior art
Improvement is smaller, can be compatible with existing preparation process well, therefore has low manufacture cost, is easy to technique realization, production effect
The advantages that rate height and high yields.The present embodiment efficiently solves the problems, such as package failure existing for existing encapsulation scheme, is improving
There is practical application value in oled panel overall package effect, have a good application prospect.
It should be noted that structure and its preparation process shown in the present embodiment are only a kind of exemplary illustration.It is practical real
Shi Shi can change according to actual needs corresponding construction and increase or decrease patterning processes.For example, oled display substrate is not only
It can be also possible to bottom emitting structure with emission structure at top.For another example, thin film transistor (TFT) not only can be top gate structure, be also possible to
Bottom grating structure not only can be double-gate structure, be also possible to single grid structure.For another example, thin film transistor (TFT) can be amorphous silicon (a-
Si) thin film transistor (TFT), low temperature polycrystalline silicon (LTPS) thin film transistor (TFT) or oxide (Oxide) thin film transistor (TFT), driving structure layer
With other electrodes, lead and layer can also be set in light emitting structure layer.For another example, the first barricade and the second barricade can be with
Including dottle pin layer etc., the embodiment of the present invention does not do specific restriction herein.
Second embodiment
Figure 12 is to illustrate the invention shows the structural schematic diagram of substrate second embodiment perpendicular to the flat of display base plate
The structure of display area and non-display area on face.The main structure of the present embodiment display base plate and aforementioned first embodiment are basic
Identical, the main structure of display area includes multiple luminescence units in array distribution, and each luminescence unit includes being arranged in base
Driving structure layer and light emitting structure layer on bottom, the main structure of non-display area include the insulating layer being arranged in substrate, set
It sets barricade on the insulating layer and covers the inorganic encapsulated layer and reinforcement structure of barricade.As shown in figure 12, with aforementioned first
Embodiment is different, and the present embodiment reinforcement structure is arranged on surface of the second substrate 10b far from the first side substrate 10a, packet
Multiple spaced grooves 201 are included, multiple spaced grooves 201 are located between display area and the first barricade 202.
In the present embodiment, substrate, the insulation of the driving structure layer and light emitting structure layer and non-display area of display area
The structures such as layer and barricade are identical as the structure of aforementioned first embodiment, and which is not described herein again.Since the present embodiment is as reinforcement knot
Multiple spaced grooves 201 of structure are arranged on the second substrate 10b, and between display area and the first barricade 202
Region, thus the first insulating layer 13, second insulating layer 16, third insulating layer 18, the first inorganic layer 35 and second being subsequently formed
Inorganic layer 37 is similarly formed corresponding groove shapes in the region.In this way, the region between display area and the first barricade 202,
The contact surface of second substrate 10b and the first insulating layer 13, the contact surface of the first insulating layer 13 and second insulating layer 16, the second insulation
Layer 16 and the contact surface of third insulating layer 18, the contact surface and the first inorganic layer 35 of third insulating layer 18 and the first inorganic layer 35
Contact surface with the second inorganic layer 37 includes multiple concaveconvex structures turned back, the concaveconvex structure turned back by these, one side
The contact area for increasing film layer, enhances the bond strength of film layer, on the other hand increases the bending strength in the region, enhancing
The antistripping ability of film layer, thus effectively prevent delamination or cracking occur in the region.When actual implementation, groove can also be with
It is formed on the first substrate or buffer layer.Due to being inorganic layer on the second substrate, formed using depositional mode, therefore
After forming groove in two substrates, the film layer being subsequently formed can keep the groove shapes, and contact surface is between guaranteeing subsequent film
The improvement effect of concaveconvex structure, membranous layer binding force is obvious.
The technical effect of aforementioned first embodiment not only may be implemented in the present embodiment, including avoids display area and first gear
The delamination of the multiple inorganic layers in region or cracking and make organic layer edge that there is preferable linearity etc. between wall, and passes through
Increase the quantity for forming the film layer of groove, increases the bending strength in the region, enhance the antistripping ability of film layer, it can be most
Region between display area and the first barricade is avoided to limits delamination or cracking occur.
The preparation flow of the present embodiment display base plate and aforementioned first embodiment are essentially identical, the difference is that step (1)
It is formed during base pattern, after forming the second substrate, forms multiple intervals by the way of exposure development or coining and set
The groove set, less than the thickness of the second substrate, i.e. groove does not cut through the second substrate the depth of groove.Step (1) forms the
During three insulating layer patterns, two the first via holes only are formed in display area.Other processes are identical as aforementioned first embodiment,
Which is not described herein again.
Although aforementioned be located at display to form groove on third insulating layer and form groove and groove in the second substrate
It is illustrated for region between region and the first barricade, but the technical concept based on the embodiment of the present invention, the present invention is implemented
The structure of example display base plate can also there are many extensions and deformation.For example, between the first barricade and the first barricade region phase
It answers and groove is set in film layer.For another example, multiple spaced grooves are arranged between display area and the first barricade close to the
The region of one barricade, to improve based on the binding force between film layer.For another example, multiple spaced grooves are arranged in display area
Close to the region of display area between the first barricade, to improve based on the linearity at organic layer edge etc., these extensions and
It deforms within the scope of the present invention.
3rd embodiment
Technical concept based on the embodiment of the present invention, the embodiment of the invention also provides a kind of preparation sides of display base plate
Method.The display base plate includes display area and non-display area, and the preparation method of the present embodiment display base plate includes:
S1, functional layer is formed in the non-display area, the functional layer includes multiple spaced grooves；
S2, barricade is formed in the non-display area, the multiple spaced groove is made to be located at the display area
Between barricade；
S3, the inorganic encapsulated layer for covering the functional layer and barricade is formed in the non-display area, make the functional layer
Concaveconvex structure is formed with the contact surface of inorganic encapsulated layer.
In one embodiment, step S1 includes:
Form substrate；
The first insulating layer, second insulating layer and third insulating layer are sequentially formed in substrate, it is the multiple spaced
Groove is formed on first insulating layer, second insulating layer or third insulating layer.
In another embodiment, step S1 includes:
The first substrate, buffer layer and the second substrate sequentially formed, the multiple spaced groove are formed in described
In second substrate；
The first insulating layer, second insulating layer and third insulating layer are sequentially formed in second substrate.
Wherein, in the plane perpendicular to display base plate, the cross sectional shape of the groove includes rectangle, semicircle or the ladder that falls
Shape；In the plane for being parallel to display base plate, the groove is around the display area.
In the present embodiment, structure, material, relevant parameter and its detailed preparation process of each film layer are in previous embodiment
Middle detailed description, which is not described herein again.
The preparation method for present embodiments providing a kind of display base plate passes through the region shape between display area and barricade
At reinforcement structure, reinforcement structure eliminates the de- of region between display area and barricade for increasing the region membranous layer binding force
Layer or cracking avoid the water oxygen intrusion path because of delamination or cracking formation, the validity and reliability of encapsulation have been effectively ensured.
The preparation method of the present embodiment can be realized using the Preparation equipment of existing maturation, smaller to prior art improvement, can be fine
Ground is compatible with existing preparation process, thus have low manufacture cost, be easy to technique realize, high production efficiency and yields height etc. it is excellent
Point.The present embodiment efficiently solves the problems, such as package failure existing for existing encapsulation scheme, is improving oled panel overall package effect
There is practical application value in fruit, have a good application prospect.
Fourth embodiment
Technical concept based on the embodiment of the present invention, the embodiment of the invention also provides a kind of display device, including it is aforementioned
The display base plate of embodiment.Display device can be with are as follows: mobile phone, tablet computer, television set, display, laptop, digital phase
Any products or components having a display function such as frame, navigator.
In the description of the embodiment of the present invention, it is to be understood that term " middle part ", "upper", "lower", "front", "rear",
The orientation or positional relationship of the instructions such as "vertical", "horizontal", "top", "bottom" "inner", "outside" be orientation based on the figure or
Positional relationship is merely for convenience of description of the present invention and simplification of the description, rather than the device or element of indication or suggestion meaning must
There must be specific orientation, be constructed and operated in a specific orientation, therefore be not considered as limiting the invention.
In the description of the embodiment of the present invention, it should be noted that unless otherwise clearly defined and limited, term " peace
Dress ", " connected ", " connection " shall be understood in a broad sense, for example, it may be being fixedly connected, may be a detachable connection, or integrally
Connection；It can be mechanical connection, be also possible to be electrically connected；Can be directly connected, can also indirectly connected through an intermediary,
It can be the connection inside two elements.For the ordinary skill in the art, above-mentioned art can be understood with concrete condition
The concrete meaning of language in the present invention.
Although disclosed herein embodiment it is as above, the content only for ease of understanding the present invention and use
Embodiment is not intended to limit the invention.Technical staff in any fields of the present invention is taken off not departing from the present invention
Under the premise of the spirit and scope of dew, any modification and variation, but the present invention can be carried out in the form and details of implementation
Scope of patent protection, still should be subject to the scope of the claims as defined in the appended claims.
Claims (14)
1. a kind of display base plate, which is characterized in that including display area and non-display area, the non-display area includes function
The inorganic encapsulated layer of layer, the barricade being arranged in the functional layer and the covering functional layer and barricade, in the viewing area
Between domain and barricade, the functional layer includes multiple spaced grooves, makes the contact of the functional layer with inorganic encapsulated layer
Face forms concaveconvex structure.
2. display base plate according to claim 1, which is characterized in that the functional layer includes substrate and is arranged described
Insulating layer in substrate, the multiple spaced groove are arranged in the substrate or insulating layer.
3. display base plate according to claim 2, which is characterized in that the substrate includes the first substrate, is arranged described
Buffer layer in first substrate and the second substrate being arranged on the buffer layer, the multiple spaced groove, which is arranged, to exist
In second substrate.
4. display base plate according to claim 2, which is characterized in that the insulating layer exists including the first insulating layer, setting
The third insulating layer of second insulating layer and setting on the second insulating layer on first insulating layer, the multiple interval
The groove of setting is arranged on first insulating layer, second insulating layer or third insulating layer.
5. display base plate according to claim 1, which is characterized in that the barricade includes around the of the display area
One barricade and the second barricade around first barricade, the multiple spaced groove setting the display area with
Between first barricade, first barricade and the second barricade are for preventing the organic material of inkjet printing from overflowing.
6. according to any display base plate of claim 2~5, which is characterized in that in the plane perpendicular to display base plate,
The cross sectional shape of the groove includes rectangle, semicircle or inverted trapezoidal.
7. according to any display base plate of claim 2~5, which is characterized in that in the plane for being parallel to display base plate,
The groove is around the display area.
8. a kind of display device, which is characterized in that including any display base plate of claim 1~7.
9. a kind of preparation method of display base plate, which is characterized in that the display base plate includes display area and non-display area,
Preparation method includes:
Functional layer is formed in the non-display area, the functional layer includes multiple spaced grooves；
Form barricade in the non-display area, make the multiple spaced groove be located at the display area and barricade it
Between；
The inorganic encapsulated layer for covering the functional layer and barricade is formed in the non-display area, makes the functional layer and inorganic envelope
The contact surface for filling layer forms concaveconvex structure.
10. preparation method according to claim 9, which is characterized in that functional layer is formed in the non-display area, it is described
Functional layer includes multiple spaced grooves, comprising:
Form substrate；
The first insulating layer, second insulating layer and third insulating layer, the multiple spaced groove are sequentially formed in substrate
It is formed on first insulating layer, second insulating layer or third insulating layer.
11. preparation method according to claim 9, which is characterized in that functional layer is formed in the non-display area, it is described
Functional layer includes multiple spaced grooves, comprising:
The first substrate, buffer layer and the second substrate sequentially formed, the multiple spaced groove are formed in described second
In substrate；
The first insulating layer, second insulating layer and third insulating layer are sequentially formed in second substrate.
12. preparation method according to claim 10, which is characterized in that when the multiple spaced groove is formed in
When on the third insulating layer, the via hole of the multiple spaced groove and display area passes through with a patterning processes shape
At.
13. according to any preparation method of claim 9~12, which is characterized in that in the plane perpendicular to display base plate
On, the cross sectional shape of the groove includes rectangle, semicircle or inverted trapezoidal.
14. according to any preparation method of claim 9~12, which is characterized in that in the plane for being parallel to display base plate
On, the groove is around the display area.
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