CN110091648A - A kind of mask pattern drawing apparatus and method for drafting - Google Patents
A kind of mask pattern drawing apparatus and method for drafting Download PDFInfo
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- CN110091648A CN110091648A CN201810081419.2A CN201810081419A CN110091648A CN 110091648 A CN110091648 A CN 110091648A CN 201810081419 A CN201810081419 A CN 201810081419A CN 110091648 A CN110091648 A CN 110091648A
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- mask pattern
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- drafting
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- 238000000034 method Methods 0.000 title claims abstract description 45
- 239000007788 liquid Substances 0.000 claims abstract description 146
- 239000000758 substrate Substances 0.000 claims abstract description 86
- 239000000463 material Substances 0.000 claims abstract description 20
- 238000003860 storage Methods 0.000 claims description 28
- 230000007246 mechanism Effects 0.000 claims description 16
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims description 16
- 230000008569 process Effects 0.000 claims description 15
- 229920002120 photoresistant polymer Polymers 0.000 claims description 12
- 230000001105 regulatory effect Effects 0.000 claims description 11
- 238000012806 monitoring device Methods 0.000 claims description 10
- 230000007935 neutral effect Effects 0.000 claims description 10
- 235000011389 fruit/vegetable juice Nutrition 0.000 claims description 9
- 238000006073 displacement reaction Methods 0.000 claims description 7
- 230000003287 optical effect Effects 0.000 claims description 6
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 5
- 150000002736 metal compounds Chemical class 0.000 claims description 5
- 229920000642 polymer Polymers 0.000 claims description 5
- 238000012360 testing method Methods 0.000 claims description 5
- 229910001338 liquidmetal Inorganic materials 0.000 claims description 4
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 claims description 4
- 229910052753 mercury Inorganic materials 0.000 claims description 4
- 238000004621 scanning probe microscopy Methods 0.000 claims description 4
- 239000002775 capsule Substances 0.000 claims description 3
- 230000007613 environmental effect Effects 0.000 claims description 2
- 230000008901 benefit Effects 0.000 abstract description 7
- 239000002699 waste material Substances 0.000 abstract description 7
- 239000000499 gel Substances 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- 229910052710 silicon Inorganic materials 0.000 description 6
- 239000010703 silicon Substances 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- 229910002804 graphite Inorganic materials 0.000 description 5
- 239000010439 graphite Substances 0.000 description 5
- OWEGMIWEEQEYGQ-UHFFFAOYSA-N 100676-05-9 Natural products OC1C(O)C(O)C(CO)OC1OCC1C(O)C(O)C(O)C(OC2C(OC(O)C(O)C2O)CO)O1 OWEGMIWEEQEYGQ-UHFFFAOYSA-N 0.000 description 4
- GUBGYTABKSRVRQ-PICCSMPSSA-N Maltose Natural products O[C@@H]1[C@@H](O)[C@H](O)[C@@H](CO)O[C@@H]1O[C@@H]1[C@@H](CO)OC(O)[C@H](O)[C@H]1O GUBGYTABKSRVRQ-PICCSMPSSA-N 0.000 description 4
- 230000001276 controlling effect Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 230000010412 perfusion Effects 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 2
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 229910052792 caesium Inorganic materials 0.000 description 2
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 2
- 230000008602 contraction Effects 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229910052733 gallium Inorganic materials 0.000 description 2
- 230000036541 health Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 229910052701 rubidium Inorganic materials 0.000 description 2
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 description 2
- 239000000523 sample Substances 0.000 description 2
- 230000032258 transport Effects 0.000 description 2
- 229930091371 Fructose Natural products 0.000 description 1
- 239000005715 Fructose Substances 0.000 description 1
- RFSUNEUAIZKAJO-ARQDHWQXSA-N Fructose Chemical compound OC[C@H]1O[C@](O)(CO)[C@@H](O)[C@@H]1O RFSUNEUAIZKAJO-ARQDHWQXSA-N 0.000 description 1
- WQZGKKKJIJFFOK-GASJEMHNSA-N Glucose Natural products OC[C@H]1OC(O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-GASJEMHNSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229930006000 Sucrose Natural products 0.000 description 1
- CZMRCDWAGMRECN-UGDNZRGBSA-N Sucrose Chemical compound O[C@H]1[C@H](O)[C@@H](CO)O[C@@]1(CO)O[C@@H]1[C@H](O)[C@@H](O)[C@H](O)[C@@H](CO)O1 CZMRCDWAGMRECN-UGDNZRGBSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 208000027418 Wounds and injury Diseases 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000008103 glucose Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 208000014674 injury Diseases 0.000 description 1
- 229910000765 intermetallic Inorganic materials 0.000 description 1
- 239000011344 liquid material Substances 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 239000005720 sucrose Substances 0.000 description 1
- 238000006557 surface reaction Methods 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B43—WRITING OR DRAWING IMPLEMENTS; BUREAU ACCESSORIES
- B43K—IMPLEMENTS FOR WRITING OR DRAWING
- B43K5/00—Pens with ink reservoirs in holders, e.g. fountain-pens
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B43—WRITING OR DRAWING IMPLEMENTS; BUREAU ACCESSORIES
- B43K—IMPLEMENTS FOR WRITING OR DRAWING
- B43K7/00—Ball-point pens
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B43—WRITING OR DRAWING IMPLEMENTS; BUREAU ACCESSORIES
- B43L—ARTICLES FOR WRITING OR DRAWING UPON; WRITING OR DRAWING AIDS; ACCESSORIES FOR WRITING OR DRAWING
- B43L13/00—Drawing instruments, or writing or drawing appliances or accessories not otherwise provided for
Abstract
The invention discloses a kind of mask pattern drawing apparatus and method for drafting.The mask pattern drawing apparatus in substrate for drawing mask pattern, it includes drawing tool and mounting table, wherein, the mounting table is for placing the substrate, the drawing tool includes drawing head and liquid storing part, and the liquid storing part draws liquid for storing mask pattern, and the drafting head is communicated with the liquid storing part, when the drafting head and the substrate contact, the mask pattern in the liquid storing part is drawn liquid and can be transferred in the substrate through the drafting head.Mask pattern drawing apparatus of the invention, which can form mask pattern with lower cost and simple technique, can form any desired pattern by the direct drafting of drawing tool, have the advantages that applied widely, high-efficient, mask material waste rate is low etc..
Description
Technical field
The present invention relates to micro-nano manufacturing technology fields, and in particular to a kind of mask pattern drawing apparatus and method for drafting.
Background technique
Mask is that sample such as performs etching, deposits, being modified at the techniques as a kind of processing step common in micro-nano processing
The formation of important process before, mask pattern is the core of the technique.Common mask material includes photoresist, metal material
(such as Au, Ni, Al) and nonmetallic or metallic compound (such as SiO2、Si3N4, TiN etc.) etc..Currently, photoresist mask is usually wanted
By spin coating, alignment and exposure, development and etc. after mask pattern could be copied in substrate.Metal and metal compound
The method that object material mask mostly uses sputtering is transferred in substrate.These common mask pattern forming method needs match
Expensive machinery equipment, at high cost and complex process, and waste of material is more serious, also there is different degrees of dirt to environment
Dye, while also having certain injury to human body.
For this purpose, if can search out a kind of low cost, especially simple process, save material, process is to environment and people
The all harmless mask pattern forming method of body then will all have weight for mask process itself or even for micro-nano manufacture field
Want meaning.
Summary of the invention
Based on above-mentioned status, the main purpose of the present invention is to provide a kind of mask pattern drawing apparatus and method for drafting,
It can directly draw out mask pattern by drawing tool in substrate, at low cost and easy to operate, and can accomplish material
Material without waste.
Above-mentioned purpose is achieved through the following technical solutions:
According to the first aspect of the invention, a kind of mask pattern drawing apparatus, for drawing mask pattern in substrate,
Including drawing tool and mounting table, wherein the mounting table for placing the substrate, the drawing tool include draw head and
Liquid storing part, the liquid storing part draw liquid for storing mask pattern, and the drafting head is communicated with the liquid storing part, when the drafting
When head is contacted with the substrate, the mask pattern in the liquid storing part, which draws liquid, to be transferred to the substrate through the drafting head
On.
Preferably, the drawing tool includes pen, Signing refill, refill for ball-point pen or Neutral ball-point for ball-point pen；
Alternatively, the drafting head is Pen nib, the liquid storing part includes reservoir；
Alternatively, the drafting head is ball pen head, the liquid storing part includes liquid storage pipe, and the ball pen head is installed on described
The lower end of liquid storage pipe；
Alternatively, the drafting head is signature nib, the liquid storing part includes liquid storage pipe, and the signature nib is installed on described
The lower end of liquid storage pipe；
Alternatively, the drafting head is gel ink pen head, the liquid storing part includes liquid storage pipe, and the gel ink pen head is installed on described
The lower end of liquid storage pipe；
Alternatively, the head of drawing includes hollow ball seat and the ball for being placed in the ball seat front end, the liquid storing part includes
Liquid storage pipe, the lower end drawn head and be installed on the liquid storage pipe；
Alternatively, the drafting head includes pen tip and proposition, the liquid storing part includes reservoir, the proposition have with it is described
The liquid outlet that reservoir communicates, wherein the pen tip is snugly installed on the radial outside of the proposition, and the pen tip is equipped with
The line of rabbet joint extended longitudinally together, the line of rabbet joint extend to the liquid outlet of the proposition from the tip of the pen tip.
It preferably, further include movement mechanism, for generating relative motion between the drawing tool and the mounting table；
And/or further include force snesor, the lower section of the substrate is set, is applied to for detecting the drawing tool
Contact force in the substrate；
And/or further include monitoring device, for observing the contact area of the drawing tool Yu the substrate, with observation
The drawing process of mask pattern；
And/or further include temperature regulating device, for drawing liquid and/or the substrate to the mask pattern in the liquid storing part
Temperature controlled.
Preferably, the movement mechanism at least makes the drawing tool relative to the mounting table along tri- directions X, Y and Z
Movement；
And/or the monitoring device includes that optical imagery microscope, scanning probe microscopy or environment scan electronic are micro-
Mirror.
Preferably, the bracket for further including pedestal and being movably mounted on the pedestal, the drawing tool are fixed on institute
It states on bracket, the drawing tool can be mobile with Z-direction in X direction relative to the pedestal and be turned about the Z axis；
And/or the mounting table is three-shaft displacement platform.
According to the second aspect of the invention, a kind of mask pattern method for drafting is drawn using mentioned-above mask pattern
Device is drawn in substrate, obtains mask pattern；
Preferably, the method uses photoresist, liquid metal mercury, low-melting-point metal, metal compound solution, molten
Sugar, sugar juice, polymer or the high molecular material of state draw liquid as mask pattern and draw mask pattern.
Preferably, comprising steps of
S10, mask pattern drafting liquid is filled in the liquid storing part of the drawing tool；
S20, contact the drafting head of the drawing tool with the substrate, so that the mask artwork stored in the liquid storing part
Case is drawn liquid and is transferred in the substrate through the drafting head；
S30, make to form relative motion between the drawing tool and the substrate, so that the mask pattern draws liquid and exists
Mask pattern is formed in the substrate.
Preferably, the mask pattern drawing apparatus includes temperature regulating device, wherein in step S20 and/or step S30, is led to
It crosses the temperature regulating device and controls the temperature that the mask pattern in the liquid storing part draws liquid and/or the substrate.
Preferably, the mask pattern drawing apparatus includes force snesor, wherein in step S20 and/or step S30, is led to
The testing result for crossing the force snesor controls the contact force drawn between head and the substrate.
Preferably, in step S30, by controlling the size for drawing the contact force between head and the substrate and contacting
The length of time controls the diameter of line thickness and/or point in mask pattern.
Mask pattern drawing apparatus of the invention can form mask pattern with lower cost and simple technique, pass through
The direct drafting of drawing tool, can form any desired pattern, and there is applied widely, high-efficient, mask material to waste
The low advantage of rate.Middle photoresist mask process, processing step significantly reduce compared with the prior art, and efficiency significantly improves, to ring
Border and human health are also more friendly.
Detailed description of the invention
Hereinafter reference will be made to the drawings is described mask pattern drawing apparatus according to the present invention and method for drafting.In figure:
Fig. 1 is a kind of schematic illustration of the mask pattern drawing apparatus of preferred embodiment according to the present invention；
Fig. 2 is a kind of flow chart of the mask pattern method for drafting of preferred embodiment according to the present invention；
Fig. 3 is the schematic diagram that drawing tool draws dot pattern in substrate.
Fig. 4 is the schematic diagram that drawing tool draws linear pattern in substrate.
Figure label: 1- drawing tool, 2- control device, 3- mounting table, 4- force snesor, 5- substrate, 6- monitoring device,
7- pedestal, 8- mask pattern, 9- bracket, 10- column, 11- crossbeam, 12- sliding rail, 13- draw head.
Specific embodiment
Based on the defect for the prior art being previously mentioned in background technology part, the present invention in order to simplify mask making processes,
It reduces production cost and reduces waste of material, provide a kind of mask pattern drawing apparatus and method for drafting.
Specifically, referring to Fig. 1, according to the first aspect of the invention, a kind of mask pattern drawing apparatus is provided, be used for
Mask pattern is drawn in substrate 5, which includes drawing tool 1 and mounting table 3, wherein the mounting table 3
For placing the substrate 5, substrate can also be preferably fixed, the drawing tool 1 includes drawing head 13 and liquid storing part
(not shown), the liquid storing part is for liquid (hereinafter referred to as mask pattern drafting liquid) needed for storing drafting mask pattern, institute
It states drafting head 13 to communicate with the liquid storing part, the mask when the drafting head 13 is contacted with the substrate 5, in the liquid storing part
Pattern is drawn liquid and can be transferred in the substrate 5 through the drafting head 13.Then, by control drawing tool 1 relative to
The motion profile of substrate 5 can draw liquid using mask pattern and draw out required mask pattern.
Mask pattern drawing apparatus of the invention can form mask pattern with lower cost and simple technique, pass through
The direct drafting of drawing tool, can form any desired pattern, and there is applied widely, high-efficient, mask material to waste
The low advantage of rate.Middle photoresist mask process, processing step significantly reduce compared with the prior art, and efficiency significantly improves, to ring
Border and human health are also more friendly.
In the present invention, the material that can be used for drawing mask pattern includes but is not limited to photoresist and any can be used for
Make the liquid material of mask, preferably such as liquid metal mercury, low-melting-point metal (such as gallium, rubidium, caesium), metal compound solution
(such as ferric chloride in aqueous solution), the sugar of molten condition, sugar juice, polymer or high molecular material etc., wherein the sugar can
To include the sugar of single kind, the mixture of sugar or containing sugar substance etc..
In order to realize the drafting of mask pattern, the present invention creatively expects to use for reference used book when the mankind write
Write tool --- the principle of pen (such as pen, signature pen, ball pen or gel ink pen etc.) forms the drawing tool 1.
The writing implements such as pen, ball pen are since the eighties in 19th century comes out, by more than 100 years continuously improve, hair
Exhibition is technically quite mature by now, have structure it is simple, it is easy to carry, not ink bleed, be not affected by the external environment, book
Write smooth, lines uniformly, can be write and the advantages that without often perfusion ink the long period.
Wherein, ball pen, signature pen or gel ink pen are when writing, the ball and writing surface (usually paper of written front end
) contact, the thrust by writing pressure and horizontal direction vertically downward, ball can be pressed writing simultaneously for meeting when due to writing
Power passes to writing surface, and writing surface reaction force is transmitted on the ball seat of rotating bearing ball to ball, and by ball, that is, is rolling
Two pairs of pressure and reaction forces are formed respectively between pearl and the ball seat for supporting it and between ball and writing surface, meanwhile,
Due to the frictional resistance effect between the thrust and ball and writing surface of horizontal direction, ball can be made to rotate；Due to book
Medium (ink or ink) is write to the wetability of writing surface greater than the wetability to ball, will just be adhered to the writing on ball surface
Medium is transferred and adhered on writing surface and forms line (word) mark.
There are one of line of rabbet joint, exactly this one of line of rabbet joint among the pen tip of pen, realizes the complete of gravity and ink surface tension
U.S. balance.When without writing, the line of rabbet joint among pen tip is closure, and the part on line of rabbet joint both sides is combined closely,
The channel diameter very little for leaving ink for, since the surface tension coefficient of substance is constant, and surface tension and radius of curvature are at anti-
Than the surface tension of such ink is just big, ooze ink will not and come；When starting to write with pen, due to the hand to hold a pen
It can firmly be pressed downward, which can open, and the surface tension of ink becomes smaller, and ink can flow out, and more firmly be pressed downward,
The person's handwriting of writing is thicker.
Based on the writing principle of the writing implements such as above-mentioned ball pen and pen, the present invention is attempted liquid mask material
Material (namely mask material drafting liquid) is filled in the core pipe of refill for ball-point pen or in the ink cartridge of pen, that is, is realized and stablized
Draw out the purpose of mask pattern on substrate 5 evenly, and fill it is primary after can draw the long period (can also draw compared with
More patterns), without often filling.Therefore, the drawing tool 1 in the present invention may include pen, Signing refill, refill for ball-point pen
Or Neutral ball-point for ball-point pen, it is drawn that is, the production of the writing implements such as existing pen, signature pen, ball pen or gel ink pen can be directlyed adopt
Tool 1, it will be able to realize the drafting of mask pattern.When being drawn, can will be covered by squeezing the ink cartridge of pen
Mould pattern is drawn in liquid sucking ink function capsule, or mask pattern is filled into the core of Signing refill, refill for ball-point pen or Neutral ball-point for ball-point pen
Guan Zhong.Any used Signing refill, refill for ball-point pen or Neutral ball-point for ball-point pen it is cleaned it is clean after may be used to constitute in the present invention
Drawing tool 1.
Present invention firstly provides mask pattern is drawn as drawing tool using existing writing implement, to substitute now
There is the complexity being widely adopted in technology and expensive mask fabrication equipment, on the one hand enrich and improve mask process itself,
On the other hand it is also opened for pen, Signing refill, refill for ball-point pen or Neutral ball-point for ball-point pen etc. this quotidian writing implement
Completely new application field.
As alternate embodiments of the invention, the drawing tool 1 can not also directly adopt ready-made pen, signature
The writing implements such as pen core, refill for ball-point pen or Neutral ball-point for ball-point pen, but and/or knot identical as the principle of these writing implements can be made
The similar dedicated drawing tool of structure, to obtain the certain characteristics for being different from ready-made class tool, such as greater or lesser
Liquid storage capacity, thicker or thinner drafting head, greater or lesser drawing tool total length, the contour structures for being easy to clamp, with
And more particularly suitable angle (angle i.e. between drawing tool 1 and substrate 5), etc. is being easy to get under clamp position.
For example, the drafting head 13 of drawing tool 1 can use ready-made Pen nib, but the rest part of drawing tool 1
It then remakes, to obtain characteristic at least one of above-mentioned.Certainly, in order to can be realized drawing tool 1 similar to pen book
The function of writing, the liquid storing part of drawing tool 1 include reservoir, similar with the ink cartridge of pen.When being drawn, pass through
Reservoir is squeezed to draw mask pattern in liquid sucking reservoir.
For another example the drawing tool 1 is also possible to the tool similar with pen principle being fabricated separately, before obtaining
At least one characteristic stated.That is, it draws the principle that head 13 can not also use ready-made Pen nib, but be fabricated separately
Similar structure, for example including pen tip and proposition, and the liquid storing part then equally includes reservoir, wherein the proposition has
The liquid outlet communicated with the reservoir, wherein the pen tip is snugly installed on the radial outside of the proposition, the pen tip
It is equipped with the line of rabbet joint extended longitudinally together, the line of rabbet joint extends to the liquid outlet of the proposition from the tip of the pen tip.This
In embodiment, drawing head 13 is the greater or lesser structure similar to Pen nib of such as size remake, especially
Ground, wherein the length of the line of rabbet joint on pen tip, rigidity of pen tip etc., can draw the property of liquid according to the mask pattern specifically used
Matter (such as viscosity etc.) is configured, and preferably draws effect to reach.It, will by squeezing reservoir when being drawn
Mask pattern is drawn in liquid sucking reservoir.
In another example the drafting head 13 of drawing tool 1 can be using ready-made ball pen head (or gel ink pen head, signature pen
Head etc.), remaining position of drawing tool is then remake, to obtain characteristic at least one of above-mentioned.For example, the liquid storing part packet
Liquid storage pipe is included, the ball pen head is installed on the lower end of the liquid storage pipe.When being drawn, mask pattern is drawn into liquid
It is filled into liquid storage pipe.
In another example the drawing tool 1 be also possible to be fabricated separately with refill for ball-point pen, Signing refill or Neutral ball-point for ball-point pen etc.
Similar tool, that is, its draw head 13 can not also use ready-made ball pen head (or gel ink pen head, signature nib
Deng), but the structure that the principle that is fabricated separately is similar for example including hollow ball seat and is placed in the ball of the ball seat front end,
The liquid storing part equally includes liquid storage pipe, the lower end drawn head and be installed on the liquid storage pipe.In present embodiment, head is drawn
13 be the knot similar to ball pen head (or gel ink pen head, signature pen head) greater or lesser such as size remake
Structure, particularly, wherein the gap etc. between the size of ball seat, the size of ball, ball seat and ball, can use according to specific
Mask pattern draw liquid property (such as viscosity etc.) be configured, with reach preferably draw effect.When being drawn
When processed, mask pattern is drawn into perfusion into liquid storage pipe.
Smooth smoothness, lines are uniform, draw the time with drawing for various types of drawing tools 1 involved in the present invention
The general character such as longer.
Preferably, as shown in Figure 1, mask pattern drawing apparatus of the invention can also include movement mechanism, in institute
It states and generates relative motion between drawing tool 1 and the mounting table 3, so as to realize mask artwork by controlling the movement mechanism
The automatic drafting of case is especially that by the automatic drafting of complex pattern.Specifically, the movement mechanism can drive drafting
Tool 1 is moved in space, and/or, the movement mechanism can drive mounting table 3 to be moved in space.It is preferred that
Ground, shown movement mechanism move the drawing tool 1 along tri- directions X, Y and Z relative to the mounting table 3, thus
The automatic drafting and the automatic drafting of curved surface pattern of plane pattern may be implemented, at least so as in planar substrate 5
And/or mask pattern is formed in curved substrate 5.
Preferably, as shown in Figure 1, mask pattern drawing apparatus of the invention further includes control device 2, such as desktop computer,
Work station, laptop etc. are used to control the movement mechanism, to make the drawing tool 1 according to scheduled figure
Case is drawn, the mask pattern needed.In particular it is required that the mask pattern drawn (can preferably exist in a computer
In the control device 2) it is pre-rendered go out, it is however based on the pattern generation motion profile drawn out in computer, i.e., controllable
The corresponding movement of movement mechanism output, to draw the drawing tool 1 according to the motion profile.
Preferably, as shown in Figure 1, mask pattern drawing apparatus of the invention further includes pedestal 7 and is movably mounted to institute
State the bracket 9 on pedestal 7, the drawing tool 1 is fixed on the bracket 9, so as to by means of the bracket 9 relative to institute
It states the movement of pedestal 7 and realizes the movement of drawing tool 1.In a preferred embodiment, the drawing tool 1 can be opposite
It is mobile with Z-direction in X direction in the pedestal 7 and turn about the Z axis, as shown in Figure 1, at this point, the bracket 9 includes column
10, crossbeam 11 and sliding rail 12, central post 10 are installed on pedestal 7, and crossbeam 11 is installed on the column 10, and can be relative to
The column 10 rotates, while can also move up and down along the column 10, and the sliding rail 12 is slidably mounted on the crossbeam 11
On, and can reciprocatingly slide along the length direction of the crossbeam 11.In this preferred embodiment, drawing tool 1 can be with respect to base
Seat 7 realizes movement in three dimensions.
Preferably, the mounting table 3 can use three-shaft displacement platform, that is, the table top of mounting table 3 can in X direction, the side Y
It is moved to Z-direction, at this point, the movement mechanism or part of it are built in the mounting table 3.
In one embodiment, drawing tool 1 is relative to the pedestal 7 in X direction with the movement of Z-direction and around Z
The rotation of axis can realize manually, such as adjusting the drafting head 13 of drawing tool 1 to base before drawing work and starting
It at the position at bottom 5, is then locked, fixes drawing tool 1 and the relative position of pedestal 7, drawing process later then leads to
Movement mechanism is crossed to realize, for example, completing by the three-dimensional motion of three-shaft displacement platform.
In another embodiment, drawing tool 1 relative to the pedestal 7 in X direction with the movement of Z-direction and around
The rotation of Z axis can be realized by the movement mechanism, at this point, drawing tool 1 can both have been used relative to the movement of the pedestal 7
Drawing after adjusting the drafting head 13 of drawing tool 1 to the position of substrate 5, and can participate in front of drawing work and starting
Process processed.
Preferably, as shown in Figure 1, mask pattern drawing apparatus of the invention further includes force snesor 4, it is arranged in the base
The lower section at bottom 5, such as be directly installed in the mounting table 3, the substrate 5 is applied to for detecting the drawing tool 1
Contact force, and preferably will test result and send the control device 2 to.Pass through cooperateing with for movement mechanism and the force snesor 4
Work, can effectively control the contact force size between drawing tool 1 and substrate 5, thus being changed without drawing tool 1 or drawing
The track drafting of different scale is obtained in the case where head 13 processed, that is, can control the diameter of the width, graphical pointv of drawing lines
Size etc..
By means of control device 2 to the control of movement mechanism and to the data acquisition of force snesor 4, may be implemented to drafting
The motion profile of tool 1 and the accurate control of contact force size, to guarantee the precision for the mask pattern drawn out.
Preferably, as shown in Figure 1, mask pattern drawing apparatus of the invention can also include monitoring device 6, for observing
The contact area of the drawing tool 1 and the substrate 5, to observe the drawing process of mask pattern.
Since mask pattern usually has lesser scale, for this purpose, monitoring device 6 preferably has zoom function, it is excellent
It is selected as micro-nano observation device.For example, the monitoring device 6 may include optical imagery microscope, scanning probe microscopy or ring
Border scanning electron microscope etc..Specifically, the liquid when property and drafting of liquid can be drawn according to used mask pattern
Body conveying capacity selects suitable micro-nano observation device.When the characteristic size for the liquid that single transports is nanoscale or more, one
As optical imagery microscope can be used constitute the monitoring device 6, its advantage is that in real time, conveniently, inexpensively；It is transported when single
When the characteristic size of liquid is less than optical imagery microscopical resolution ratio, if it is that can solidify that corresponding mask pattern, which draws liquid,
Liquid, then can be observed after hardening using scanning probe microscopy, such as atomic force microscope etc., its advantage is that point
Resolution is high, can reach Subnano-class, and the three-dimensional appearance of available mask pattern；When the feature ruler for the liquid that single transports
It is very little when being less than the microscopical resolution ratio of optical imagery but corresponding mask pattern and drawing liquid and cannot solidify, environmental scanning can be used
Electron microscope constitutes the monitoring device 6.
Preferably, mask pattern drawing apparatus of the invention can also include temperature regulating device (not shown), such as be arranged
Between the outside and substrate and mounting table of the liquid storing part of the drawing tool 1, heating element and temperature detection are preferably included
Element, the temperature so as to draw liquid and substrate to the mask pattern in the liquid storing part control, are allowed to meet example
Such as suitable viscosities.For example, the logical of the heating element can be controlled according to the testing result of the temperature detecting element
Disconnected situation can conveniently realize the temperature control that liquid is drawn to mask pattern.
Particularly, when the sugar or use sugar juice of use molten condition draw liquid as mask pattern, temperature regulating device
Effect become apparent because sugar viscosity with temperature variation it is relatively more obvious.Preferably, when the setting temperature regulating device
When, the liquid storing part of drawing tool 1 can be used heat-resisting material and be made, the liquid storage pipe is made for example, by using metal material, or
Described reservoir, etc. is made using high temperature resistant silica gel.
Preferably, mask pattern drawing apparatus of the invention is in specific works, as shown in Figure 1, can be first by drawing tool 1
On the bracket 9 being fixed on pedestal 7 (such as being fixed on sliding rail 12), drawing tool 1 is moved to by target by mobile bracket 9
Behind position (such as top of substrate 5), bracket 9 is locked so that drawing tool 1 remains stationary, the control of control device 2 is utilized to carry
Platform 3 (such as three-shaft displacement platform) is set to move along Z-direction, after force snesor 4 detects that draw head 13 contacts with substrate 5,
Start the drafting for being masked pattern, for example, control mounting table 3 in X direction, Y-direction and Z-direction movement make to draw head 13 and base
5 makes discontinuous contact of bottom can form dotted mask pattern 8 (as shown in Figure 3)；Or control mounting table 3 is transported with Y-direction in X direction
It is dynamic that drafting head 13 is made to contact the mask pattern 8 (as shown in Figure 4) that can form linear always with substrate 5, by Points And lines
Form the mask pattern of arbitrary shape.
On the basis of above-mentioned work, according to the second aspect of the invention, a kind of method for drafting of mask pattern is provided,
This method is drawn on substrate 5 using mask pattern drawing apparatus of the present invention, obtains mask pattern.
Preferably, the method is using photoresist, liquid metal mercury, low-melting-point metal (such as gallium, rubidium, caesium), metallization
Polymer solution (such as ferric chloride in aqueous solution), the sugar of molten condition, sugar juice, polymer or high molecular material etc. are used as mask
Pattern draws liquid and draws mask pattern.
Particularly, since the fusing point of sugar is lower, the fusing point of most of sugar is at 200 DEG C hereinafter, for example, the fusing point of sucrose is
186 DEG C, the fusing point of maltose is 110 DEG C, and the fusing point of fructose is 103~105 DEG C, and the fusing point of glucose is 146 DEG C, etc.,
When being heated to fusing point or more (such as being heated to 200 DEG C), sugar is liquid (molten condition), therefore can be using the present invention
Mask pattern drawing apparatus form the pattern of needs on substrate 5 in a manner of drawing (that is, drawing tool can be stored
In 1 liquid storing part, and can be transferred in substrate 5 through the drafting head 13), and sugared toughness, it can be with substrate 5 well
Adherency, after being cooled to room temperature, sugar can be solidified into solid-like again well, it can be ensured that pattern is completely covered on substrate
On 5.
On the other hand, sugar belongs to ease of solubility substance, the solution of any concentration can be configured to the sugared insoluble liquid such as water, equally
The pattern for being conducive to that mask pattern drawing apparatus of the invention is used to form needs on substrate 5 in a manner of drawing is (that is, same
Sample can store in the liquid storing part of drawing tool 1, and can be transferred in substrate 5 through the drafting head 13), and sugar is molten
Liquid equally has viscosity, can adhere to well with substrate 5, and after the solvent in sugar juice is evaporated or vapored away, sugared ingredient is just
It can keep in substrate 5, so can equally guarantee that pattern completely covers on substrate 5.Particularly, it is evaporated in sugar juice molten
During agent, the mask pattern that sugar juice is formed can be shunk, and until solvent all evaporation just stopping contractions, be only left sugar
Mask pattern.The precision of mask pattern can be improved in the phenomenon that this contraction, to improve subsequent such as micro-nano technology
Precision.
Meanwhile sugared another considerable advantage for making mask is, and after substrate 5 is processed, the removal ratio of mask
It is relatively simple, substrate 5 need to be only put into a period of time in the liquid of the energy dissolved sugar such as water, so that it may which sugar is dissolved into corresponding liquid
In, substrate 5 is taken out from liquid later, not sugared product can be obtained after dry.
Specifically, as described in Figure 2, mask pattern method for drafting of the invention comprising steps of
S10, mask pattern drafting liquid is filled in the liquid storing part of the drawing tool 1；
S20, contact the drafting head 13 of the drawing tool 1 with the substrate 5, so that is stored in the liquid storing part covers
Mould pattern is drawn liquid and is transferred in the substrate 5 through the drafting head 13；
S30, make to form relative motion between the drawing tool 1 and the substrate 5, so that the mask pattern draws liquid
Mask pattern 8 is formed in the substrate 5.
It preferably,, can be in different ways by mask pattern according to the different structure of drawing tool 1 in step S10
Liquid is drawn to be filled in the liquid storing part of drawing tool 1.
For example, when the liquid storing part of the drawing tool 1 includes reservoir, such as drawing tool 1 is the pen (ink of pen
Water pocket is to constitute reservoir) or drawing tool 1 when including the drafting head that pen nib or structure are similar to pen nib, step S10
In, mask pattern is drawn in the liquid sucking reservoir by squeezing the reservoir.
For example, when the liquid storing part of the drawing tool 1 includes liquid storage pipe, for example, drawing tool 1 include ball pen head or
When structure is similar to the drafting head of ball pen head, in step S10, mask pattern drafting liquid is filled in a manner of injecting or being perfused
It infuses in the liquid storage pipe；
For example, when the drawing tool 1 includes Signing refill, refill for ball-point pen or Neutral ball-point for ball-point pen, in step S10, with note
Mask pattern drafting liquid is filled to the core pipe of the Signing refill, refill for ball-point pen or Neutral ball-point for ball-point pen by the mode penetrated or be perfused
In.
In above embodiment, the specific implementation of injection is for example including utilizing such as syringe to draw mask pattern
It is injected into corresponding liquid storing part after drawing liquid；The specific implementation of perfusion using such as beaker etc. for example including can be filled
The vessel of liquid pour into mask pattern drafting liquid in corresponding liquid storing part.
Preferably, the mask pattern drawing apparatus includes temperature regulating device, wherein in step S20 and/or step S30, is led to
It crosses the temperature regulating device and controls the temperature that the mask pattern in the liquid storing part draws liquid and substrate.
Preferably, the mask pattern drawing apparatus includes force snesor 4, wherein in step S20 and/or step S30,
The contact force between the drafting head 13 and the substrate 5 is controlled by the testing result of the force snesor 4.
Preferably, in step S30, by control the size for drawing the contact force between head 13 and the substrate 5 and
The length of time of contact controls the diameter of line thickness and/or point in mask pattern.Due to the drafting head 13 with
Point contact state is formed between the substrate 5, is detected the point contact state by the force snesor 4 and is controlled and draws head 13
Contact force, time of contact when point contact between substrate 5, then the contact force drawn between head 13 and the substrate 5,
Time of contact, corner dimension and the size for drawing head 13 etc. can codetermine the delivery rate and volume of liquid, thus controllably
The line thickness of mask pattern processed and/or the diameter of point, and then the fine degree of controllable mask pattern.
Illustrate the operating process of mask pattern method for drafting of the invention in conjunction with specific example below.
Embodiment 1: the mask pattern of photoresist is drawn in the small square piece of graphite (substrate 5) with signature pen (drawing tool 1).
It is injected into after drawing suitable photoresist with syringe in the pen core of signature pen, the signature pen of photoresist will be filled with
It is fixed on bracket, signature pen is moved to the position where the small square piece of graphite by mobile bracket, is made under the cooperation of force snesor 4
The pen tip of signature pen is contacted with the small square piece of graphite, and controlling three-shaft displacement platform (mounting table 3) movement at this time makes pen tip and the small side of graphite
Piece holding is contacted always to form linear mask pattern, after completing, is taken the small square piece of graphite from mounting table 3 with tweezers
Under, it is put into glassware, cools and solidifies photoresist at room temperature, just obtain stable mask pattern.
Embodiment 2: the mask pattern of maltose solution is drawn in silicon wafer (substrate 5) with pen (drawing tool 1).
The ink cartridge of pen is squeezed by suitable maltose solution sucking ink function capsule, the pen of maltose solution will be marked with
It is fixed on bracket, signature pen is moved to the position where silicon wafer by mobile bracket, makes pen under the cooperation of force snesor 4
Pen tip is contacted with silicon wafer, and controlling three-shaft displacement platform (mounting table 3) movement at this time is kept in contact pen tip and silicon wafer to form lines
Silicon wafer after completing, is removed from mounting table 3 with tweezers, is put into glassware, when in sugar juice by shape mask pattern
After solvent is evaporated or vapored away, sugared ingredient will be kept on silicon chip surface, and stable mask pattern is obtained.
To sum up, the drawing tool for being used to be formed mask pattern in the present invention is pen or has similar structures or principle with pen
Tool, on the one hand, pen is simple and easy to get as a kind of daily stationery, and by the development of many years and has improved ten since pen comes out
It is divided into ripe, required pattern can be steadily obtained during drawing mask pattern；On the other hand, pen or there is class with pen
Cost of manufacture like the more currently used mask equipment of cost of manufacture of the tool of structure or principle is much lower and easily controllable,
Enormously simplify the manufacture craft of mask, hence it is evident that improve work efficiency.In addition, having similar structures or original using pen or with pen
The tool of reason, which draws mask pattern, can be realized the straight forming of pattern, so as to effectively avoid the waste of mask material, simultaneously
The pollution to environment can be reduced.
Those skilled in the art will readily recognize that above-mentioned each preferred embodiment can be free under the premise of not conflicting
Ground combination, superposition.
It should be appreciated that above-mentioned embodiment is merely exemplary, and not restrictive, without departing from of the invention basic
In the case where principle, those skilled in the art can be directed to the various apparent or equivalent modification or replace that above-mentioned details is made
It changes, is all included in scope of the presently claimed invention.
Claims (10)
1. a kind of mask pattern drawing apparatus, for drawing mask pattern in substrate, which is characterized in that including drawing tool and
Mounting table, wherein the mounting table includes drawing head and liquid storing part, the storage for placing the substrate, the drawing tool
Liquid is drawn for storing mask pattern by liquid portion, and the drafting head is communicated with the liquid storing part, when the drafting head and the substrate
When contact, the mask pattern in the liquid storing part is drawn liquid and can be transferred in the substrate through the drafting head.
2. mask pattern drawing apparatus according to claim 1, which is characterized in that
The drawing tool includes pen, Signing refill, refill for ball-point pen or Neutral ball-point for ball-point pen；
Alternatively, the drafting head is Pen nib, the liquid storing part includes reservoir；
Alternatively, the drafting head is ball pen head, the liquid storing part includes liquid storage pipe, and the ball pen head is installed on the liquid storage
The lower end of pipe；
Alternatively, the drafting head is signature nib, the liquid storing part includes liquid storage pipe, and the signature nib is installed on the liquid storage
The lower end of pipe；
Alternatively, the drafting head is gel ink pen head, the liquid storing part includes liquid storage pipe, and the gel ink pen head is installed on the liquid storage
The lower end of pipe；
Alternatively, the head of drawing includes hollow ball seat and the ball for being placed in the ball seat front end, the liquid storing part includes liquid storage
Pipe, the lower end drawn head and be installed on the liquid storage pipe；
Alternatively, the drafting head includes pen tip and proposition, the liquid storing part includes reservoir, and the proposition has and the liquid storage
The liquid outlet that capsule communicates, wherein the pen tip is snugly installed on the radial outside of the proposition, and the pen tip is equipped with together
The line of rabbet joint extended longitudinally, the line of rabbet joint extend to the liquid outlet of the proposition from the tip of the pen tip.
3. mask pattern drawing apparatus according to claim 1 or 2, which is characterized in that
It further include movement mechanism, for generating relative motion between the drawing tool and the mounting table；
And/or further include force snesor, the lower section of the substrate is set, for detect the drawing tool be applied to it is described
Contact force in substrate；
And/or further include monitoring device, for observing the contact area of the drawing tool Yu the substrate, to observe mask
The drawing process of pattern；
And/or further include temperature regulating device, for drawing the temperature of liquid and/or the substrate to the mask pattern in the liquid storing part
Degree is controlled.
4. mask pattern drawing apparatus according to claim 3, which is characterized in that the movement mechanism at least makes described draw
Tool processed is moved relative to the mounting table along tri- directions X, Y and Z；
And/or the monitoring device includes optical imagery microscope, scanning probe microscopy or environmental scanning electron microscope.
5. mask pattern drawing apparatus described in one of -4 according to claim 1, which is characterized in that further include pedestal and movably
The bracket being installed on the pedestal, the drawing tool are fixed on the bracket, and the drawing tool can be relative to institute
It is mobile with Z-direction in X direction and turn about the Z axis to state pedestal；
And/or the mounting table is three-shaft displacement platform.
6. a kind of mask pattern method for drafting, which is characterized in that drawn using mask pattern described in one of -5 according to claim 1
Device processed is drawn in substrate, obtains mask pattern；
Preferably, the method is using photoresist, liquid metal mercury, low-melting-point metal, metal compound solution, molten condition
Sugar, sugar juice, polymer or high molecular material draw liquid as mask pattern and draw mask pattern.
7. mask pattern method for drafting according to claim 6, which is characterized in that comprising steps of
S10, mask pattern drafting liquid is filled in the liquid storing part of the drawing tool；
S20, contact the drafting head of the drawing tool with the substrate, so that the mask pattern stored in the liquid storing part is drawn
Liquid processed is transferred in the substrate through the drafting head；
S30, make to form relative motion between the drawing tool and the substrate, so that the mask pattern draws liquid described
Mask pattern is formed in substrate.
8. mask pattern method for drafting according to claim 7, which is characterized in that the mask pattern drawing apparatus includes
Temperature regulating device, wherein in step S20 and/or step S30, the mask artwork in the liquid storing part is controlled by the temperature regulating device
Case draws the temperature of liquid and/or the substrate.
9. mask pattern method for drafting according to claim 7 or 8, which is characterized in that the mask pattern drawing apparatus
Including force snesor, wherein in step S20 and/or step S30, drawn described in the testing result control by the force snesor
Contact force between head processed and the substrate.
10. mask pattern method for drafting according to claim 9, which is characterized in that in step S30, by described in control
Size and the length of time of contact of the contact force between head and the substrate are drawn to control the line thickness in mask pattern
And/or the diameter of point.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810081419.2A CN110091648A (en) | 2018-01-29 | 2018-01-29 | A kind of mask pattern drawing apparatus and method for drafting |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810081419.2A CN110091648A (en) | 2018-01-29 | 2018-01-29 | A kind of mask pattern drawing apparatus and method for drafting |
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| CN110091648A true CN110091648A (en) | 2019-08-06 |
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