CN110057479B - Coating type double-layer sensitive film for FP cavity optical fiber pressure sensor and preparation method - Google Patents
Coating type double-layer sensitive film for FP cavity optical fiber pressure sensor and preparation method Download PDFInfo
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- 238000002360 preparation method Methods 0.000 title abstract description 8
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- 229910052751 metal Inorganic materials 0.000 claims abstract description 33
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- 229920002120 photoresistant polymer Polymers 0.000 claims description 40
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 25
- 239000004205 dimethyl polysiloxane Substances 0.000 claims description 16
- 235000013870 dimethyl polysiloxane Nutrition 0.000 claims description 16
- CXQXSVUQTKDNFP-UHFFFAOYSA-N octamethyltrisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)O[Si](C)(C)C CXQXSVUQTKDNFP-UHFFFAOYSA-N 0.000 claims description 16
- 238000004987 plasma desorption mass spectroscopy Methods 0.000 claims description 16
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 claims description 16
- 238000009616 inductively coupled plasma Methods 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 6
- 229910052709 silver Inorganic materials 0.000 claims description 6
- 239000004332 silver Substances 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 6
- 238000007747 plating Methods 0.000 claims description 5
- 238000004090 dissolution Methods 0.000 claims description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 4
- 229910052737 gold Inorganic materials 0.000 claims description 4
- 239000010931 gold Substances 0.000 claims description 4
- 238000005566 electron beam evaporation Methods 0.000 claims description 3
- 238000005516 engineering process Methods 0.000 claims description 3
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- 239000010410 layer Substances 0.000 description 55
- 239000000377 silicon dioxide Substances 0.000 description 11
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- 238000001514 detection method Methods 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
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- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
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- 239000002356 single layer Substances 0.000 description 2
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/18—Metallic material, boron or silicon on other inorganic substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/20—Metallic material, boron or silicon on organic substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L1/00—Measuring force or stress, in general
- G01L1/24—Measuring force or stress, in general by measuring variations of optical properties of material when it is stressed, e.g. by photoelastic stress analysis using infrared, visible light, ultraviolet
- G01L1/242—Measuring force or stress, in general by measuring variations of optical properties of material when it is stressed, e.g. by photoelastic stress analysis using infrared, visible light, ultraviolet the material being an optical fibre
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L11/00—Measuring steady or quasi-steady pressure of a fluid or a fluent solid material by means not provided for in group G01L7/00 or G01L9/00
- G01L11/02—Measuring steady or quasi-steady pressure of a fluid or a fluent solid material by means not provided for in group G01L7/00 or G01L9/00 by optical means
- G01L11/025—Measuring steady or quasi-steady pressure of a fluid or a fluent solid material by means not provided for in group G01L7/00 or G01L9/00 by optical means using a pressure-sensitive optical fibre
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0035—Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface
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- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Measuring Fluid Pressure (AREA)
Abstract
The invention relates to a coating type double-layer sensitive film for an FP cavity optical fiber pressure sensor and a preparation method thereof, and belongs to the technical field of pressure sensors. The FP cavity optical fiber pressure sensor comprises a capillary glass tube, a single-mode optical fiber and a sensitive film, wherein the single-mode optical fiber is inserted from one annular end face of the capillary glass tube, the other annular end face is fixedly connected with a coated double-layer sensitive film which covers the single-mode optical fiber, and an air cavity is formed between the single-mode optical fiber and the coated double-layer sensitive film and used as an FP cavity; the coating type double-layer sensitive film comprises a soft film and a metal hard film coated on the outer surface of the soft film, wherein the metal hard film is arranged opposite to the fiber core cross section of the single-mode fiber, the diameter of the metal hard film is equal to the diameter of the fiber core cross section of the single-mode fiber, and the diameter of the soft film is equal to the outer diameter of the annular end face of the capillary glass tube. The invention coats the metal hard film with larger elastic modulus and large reflectivity on the outer surface of the soft film with small elastic modulus to form the sensitive film with an outer coated double-layer structure, and has good deformability and reflectivity.
Description
Technical Field
The invention relates to the technical field of pressure sensors, in particular to a coating type double-layer sensitive film for an FP cavity optical fiber pressure sensor and a preparation method thereof.
Background
The optical fiber sensor can be used for measuring various physical quantities such as pressure, strain, displacement, temperature, humidity, current, magnetic field and the like, and the optical fiber pressure sensor based on the FP cavity has the characteristics of high reliability, high sensitivity, severe environment resistance, electromagnetic interference resistance and the like, and is widely applied to the fields such as aerospace, bridge construction, high-temperature oil wells, acoustic port internal detection, biomedical treatment and the like. Compared with the traditional FP optical fiber pressure sensor, the extrinsic diaphragm type FP optical fiber pressure sensor has higher sensitivity and stronger anti-interference capability, and has great application potential in the aspects of member health monitoring, medical ultrasonic detection, in-vivo detection and the like which need high-precision measurement.
The extrinsic diaphragm type FP optical fiber sensor is mostly formed by two reflectors of an FP cavity formed by an optical fiber end face and a sensitive diaphragm which are obtained by cutting, and the diaphragm vibrates under the action of external force, so that the interference condition of the FP cavity changes, and the change of external pressure can be obtained by detecting the interference change. Therefore, the design and processing of the sensitive diaphragm has an important impact on the overall performance index of the sensor.
FP cavity fiber optic sensors based on different materials to make sensitive films of different structures have been reported many times: for example, (1) Dai et al uses a single-layer graphene film as a sensitive film, combines a single-mode fiber sleeved with a capillary to form an FP cavity, and then makes an FP cavity fiber sensor; among them, the sensitive film made of single-layer graphene film has low elastic modulus, but has low refractive index, high cost and easy damage. (2) Majun et al used multilayer graphene as the sensitive film, and sensitive films made of multilayer graphene had high response between 0.2-22Khz, while as the graphene thickness increased, the refractive index of the sensitive film increased but its elastic modulus increased. (3) The photon crystal reflector is used as a sensitive film, and has high response within 10-50Khz, and the sensitive film prepared by the photon crystal reflector has the characteristics of high reflectivity and high elastic modulus.
The existing sensitive film has only a single characteristic of high reflectivity or low elastic modulus, and can not meet the use requirement of an actual FP cavity optical fiber pressure sensor.
Disclosure of Invention
In view of the above, the invention provides a coating type double-layer sensitive film for an FP cavity optical fiber pressure sensor and a preparation method thereof, wherein the sensitive film is formed by coating a layer of metal hard film with high reflectivity on the outer surface of a soft film with small elastic modulus, and has the characteristics of small elastic modulus and high reflectivity.
The invention provides a coating type double-layer sensitive film for an FP cavity optical fiber pressure sensor, which consists of a capillary glass tube, a single-mode optical fiber and a sensitive film, wherein the single-mode optical fiber is inserted from one annular end face of the capillary glass tube, the other annular end face of the capillary glass tube is fixedly connected with the coating type double-layer sensitive film which covers the capillary glass tube, an air cavity is formed between the single-mode optical fiber and the coating type double-layer sensitive film and is used as an FP cavity, and the inner diameter of the annular end face of the capillary glass tube is equal to the diameter of the single-mode optical fiber; the center of the cross section of the single-mode fiber and the center of the sensitive film are both on the axis of the capillary glass tube, and the cross section of the fiber core of the single-mode fiber and the sensitive film are used as two cavity mirrors of the FP cavity, and form 90 degrees with the axis of the capillary glass tube, so as to form the FP cavity interference structure.
The coated double-layer sensitive film comprises a soft film and a metal hard film coated on the outer surface of the soft film, wherein the soft film and the metal hard film form an inverted T-shaped structure, the metal hard film is arranged opposite to the fiber core cross section of a single-mode fiber, the diameter of the metal hard film is equal to the diameter of the fiber core cross section of the single-mode fiber, and the diameter of the soft film is equal to the outer diameter of the annular end face of a capillary glass tube.
Further, the soft film is a rubber film or a silica gel film with a smooth and clean surface, and the soft film is preferably made of PDMS.
Further, the metal hard film is made of gold or silver.
Further, the thickness of the soft film is 0.5-10 mu m, and the thickness of the metal hard film is 10-1000nm.
The invention also provides a preparation method of the plating type double-layer sensitive film, which comprises the following steps:
s1, depositing an oxide layer on a substrate as a sacrificial layer, spin-coating a photoresist layer on the oxide layer, exposing the photoresist with high-energy radiation through a specific pattern on a mask plate, removing the photoresist with changed properties after exposure by using a developing solution to obtain empty slots with pattern shapes corresponding to the mask plate, then etching the whole surface by using ICP (inductively coupled plasma) with the rest of the photoresist as a mask, and obtaining marks with corresponding patterns on the oxide layer so as to facilitate the positioning of subsequent overlay steps;
s2, coating photoresist again, and positioning by using another mask plate with the same mark pattern arranged at the same position as the mask plate in the step S1, wherein the mask plate in the step S2 is also provided with a circular pattern; forming a cylindrical empty groove in the photoresist through the same exposure and dissolution steps as in the step 1, and filling the cylindrical empty groove with a soft film solution to prepare a soft film;
s3, coating photoresist on the soft film again, and positioning by using another mask plate with the same mark pattern arranged at the same position as the mask plate in the step S1, wherein the mask plate in the step S3 is also provided with a circular pattern, and the circle center of the circular pattern is coincident with that of the circular pattern arranged on the mask plate in the step S2; forming a cylindrical empty groove in the photoresist through the same exposure and dissolution steps as in the step 1, and plating a layer of metal hard film on the outer surface of the soft film through an electron beam evaporation technology;
s4, removing the photoresist and the substrate to obtain the plated double-layer sensitive film.
Further, in the step S2, the soft film is made of PDMS, the thickness of the soft film is 0.5-10 mu m, and the surface is smooth and clean.
Further, in step S3, the metal hard film is made of gold or silver, and the thickness of the metal hard film is 10-1000nm.
Compared with the prior art, the technical scheme of the invention has the following beneficial effects: the coating type double-layer sensitive film of the invention is characterized in that a metal hard film with larger elastic modulus and high reflectivity is coated on the outer surface of a soft film with small elastic modulus to form a double-layer composite film, when the film is used as a cavity mirror of an optical fiber FP cavity, deformation mainly occurs on an outer soft film layer, the deformation amount of the metal hard film layer in the diameter range of an optical fiber mode field is small, the reflectivity is high, the round trip times of light beams in the cavity can be effectively increased, the Q value and the reflection spectrum sharpness of the FP cavity are improved, and the sensitivity of the sensor is improved.
Drawings
The drawings are only for purposes of illustrating particular embodiments and are not to be construed as limiting the invention, like reference numerals being used to refer to like parts throughout the several views.
FIG. 1 is a schematic perspective cross-sectional diagram of an FP cavity fiber pressure sensor based on a coated double-layer sensitive film in an embodiment of the invention;
FIG. 2 is a schematic view of the structure of the coated double-layer sensitive film in FIG. 1;
fig. 3 (a) -3 (k) are schematic flow diagrams of the process for preparing a plated double-layer sensitive film according to an embodiment of the invention.
Reference numerals:
1-a capillary glass tube; 2-single mode optical fiber; 3-sensitive film; 31-soft film; 32-metal hard film; 4-air chambers; 5-silicon bottom; a 6-silicon dioxide layer; 7-photoresist.
Detailed Description
For the purpose of making the objects, technical solutions and advantages of the present invention more apparent, embodiments of the present invention will be further described with reference to the accompanying drawings.
The invention provides a coating type double-layer sensitive film for an FP cavity optical fiber pressure sensor, which is characterized in that the FP cavity optical fiber pressure sensor consists of a capillary glass tube 1, a single-mode optical fiber 2 and a sensitive film 3, wherein the single-mode optical fiber 2 is inserted from an annular end face of the capillary glass tube 1, the other annular end face of the capillary glass tube 1 is fixedly connected with the coating type double-layer sensitive film 3 which covers the capillary glass tube, an air cavity 4 is formed between the single-mode optical fiber 2 and the coating type double-layer sensitive film 3 and is used as an FP cavity, and the inner diameter of the annular end face of the capillary glass tube 1 is equal to the diameter of the single-mode optical fiber 2; the center of the cross section of the single-mode fiber 2 and the center of the sensitive film 3 are both on the axis of the capillary glass tube 1, and the cross section of the fiber core of the single-mode fiber 2 and the sensitive film 3 are used as two cavity mirrors of the FP cavity, and form 90 degrees with the axis of the capillary glass tube 1 to form an FP cavity interference structure.
The sensitive film 3 in the embodiment of the invention is a coating type double-layer sensitive film, and comprises a soft film 31 and a metal hard film 32 coated on the outer surface of the soft film 31, wherein the metal hard film 32 is opposite to the fiber core cross section of the single-mode fiber 2, the diameter of the metal hard film 32 is equal to the diameter of the fiber core cross section of the single-mode fiber 2, and the diameter of the soft film 31 is equal to the outer diameter of the annular end face of the capillary glass tube 1.
As shown in fig. 2, in a specific embodiment, the soft film 31 in the coated double-layer sensitive film 3 is made of PDMS, the metal hard film 32 is made of silver, and the surface of the PDMS soft film 31 is smooth and clean; the thickness of the soft film 31 in the finally prepared coating type double-layer sensitive film 3 is 2.5 mu m, and the thickness of the silver metal hard film 32 is 400nm; the diameter of the PDMS soft membrane 31 is equal to the inner diameter of the annular end face of the capillary glass tube 1 and is 250 mu m; the diameter of the silver hard film 32 is equal to the diameter of the core cross section of the single mode fiber 2 and is 10 μm.
As shown in fig. 3 (a) -3 (k), the preparation method of the plating type double-layer sensitive film in the embodiment of the invention is as follows:
(1) Plating a silicon dioxide layer 6 with the thickness of 1-3um on the silicon substrate 5 as a sacrificial layer, spin-coating a thin photoresist on the silicon dioxide layer 6, covering a mask on the thin photoresist, and forming triangular mark patterns on the edge of the mask; exposing the photoresist by using ultraviolet light through a triangle mark pattern on the mask plate, and melting the photoresist with changed properties by using a developing solution; and removing the mask, directly etching the surface of the device by utilizing an ICP technology, and then removing the thin-layer photoresist to obtain triangular marks (not shown in the figure) on the silicon dioxide layer 6, so that the positioning and the alignment of subsequent process steps are facilitated, as shown in fig. 3 (a).
(2) A photoresist 7 having a thickness of 2.5 μm was spin-coated on the silicon dioxide layer 6 using a spin coater in the region other than the triangular mark of the silicon dioxide layer 6, as shown in fig. 3 (b).
(3) And (3) covering the photoresist 7 with another mask, wherein triangular mark patterns are formed at the same positions of the mask in the step (3) and the mask in the step (1), and the triangular mark patterns of the mask in the step (3) are aligned with the triangular mark of the silicon dioxide layer 6.
In the step (3), a round hole with the diameter of 250 μm is further formed in the mask, ultraviolet light is used to expose the photoresist 7 through the round hole in the mask, the photoresist 7 in the middle exposure part is melted by using a developing solution, and a cylindrical groove with the diameter of 250 μm is formed in the photoresist 7, as shown in fig. 3 (c).
(4) The prepared PDMS solution was dried in a vacuum oven to remove bubbles, and spin-coated on the silicon oxide layer 6 and the photoresist 7 using a spin coater, so that the PDMS solution was filled in the cylindrical grooves with a diameter of 250 μm in step (3), as shown in fig. 3 (d).
(5) The PDMS soft film 31 was prepared by transversely scraping the surface of the PDMS substrate with a flat and smooth rubber blade until the blade was in contact with the top surface of the photoresist 7, removing the excess PDMS solution, leaving only the PDMS solution in the 250 μm cylindrical groove in the photoresist, and then heat-treating, as shown in fig. 3 (e).
(6) After the heating is completed, a thin layer of solid is provided on the silicon dioxide layer 6, which is etched using ICP technique, as shown in fig. 3 (f).
(7) A photoresist 7 is spin-coated on the silicon oxide layer 6 and the PDMS soft film 31 of step (6) again using a spin coater, as shown in fig. 3 (g).
(8) And (3) covering the photoresist 7 with another mask, wherein triangular mark patterns are formed at the same positions of the mask in the step (8) and the mask in the step (1), the triangular mark patterns of the mask in the step (8) are aligned with the triangular mark of the silicon dioxide layer 6, a circular hole with the diameter of 10 mu m is formed in the mask in the step (8), and the circular hole in the step (8) coincides with the circle center of the circular hole in the step (3).
The photoresist 7 was exposed through the circular holes in the mask plate using ultraviolet light, and the photoresist 7 in the middle exposure portion was melted by a developing solution, and a cylindrical groove having a diameter of 10 μm was obtained in the photoresist 7, as shown in fig. 3 (h).
(9) A silver metal layer was plated as a metal hard film 32 with a thickness of 400nm in a cylinder groove with a diameter of 10 μm, on the PDMS soft film 31 and outside the cylinder groove with a diameter of 10 μm, on the photoresist 7 by using an electron beam evaporation technique, as shown in fig. 3 (i).
(10) The whole device is then immersed in acetone solution upside down, removing the excess photoresist 7 and the silver metal layer on the photoresist 7, leaving the PDMS soft film 31 and the silver metal layer 7 plated thereon on the silicon dioxide layer 6, as shown in fig. 3 (j).
(11) The silica layer 6 was dissolved with hydrofluoric acid to produce a plated double-layer sensitive film as shown in fig. 3 (k).
In summary, the invention provides a coated double-layer sensitive film for an FP cavity optical fiber pressure sensor and a preparation method thereof, wherein the coated double-layer sensitive film coats a metal hard film with larger elastic modulus and high reflectivity on the outer surface of a soft film with small elastic modulus to form a double-layer composite film, and the film is used as a cavity mirror of an optical fiber FP cavity, when being pressed, deformation mainly occurs on an outer soft film layer, the deformation of the metal hard film layer in the diameter range of an optical fiber mode field is small, the reflectivity is high, the round trip times of light beams in the cavity can be effectively increased, and the Q value and the reflection spectrum sharpness of the FP cavity are improved, thereby improving the sensitivity of the sensor.
The embodiments described above and features of the embodiments herein may be combined with each other without conflict.
The foregoing description of the preferred embodiments of the invention is not intended to limit the invention to the precise form disclosed, and any such modifications, equivalents, and alternatives falling within the spirit and scope of the invention are intended to be included within the scope of the invention.
Claims (6)
1. The utility model provides a cladding layer double-deck sensitive film for FP chamber fiber optic pressure sensor, this FP chamber fiber optic pressure sensor comprises capillary glass pipe, single mode fiber and sensitive film, wherein single mode fiber inserts from an annular terminal surface of capillary glass pipe, another annular terminal surface of capillary glass pipe links firmly with the cladding layer double-deck sensitive film that will cover it, forms an air chamber as the FP cavity between single mode fiber and the cladding layer double-deck sensitive film, the diameter of capillary glass pipe annular terminal surface equals with the diameter of single mode fiber; the center of the cross section of the single-mode fiber and the center of the sensitive film are both on the axis of the capillary glass tube, and the cross section of the fiber core of the single-mode fiber and the sensitive film are used as two cavity mirrors of the FP cavity, and form 90 degrees with the axis of the capillary glass tube to form an FP cavity interference structure; the double-layer sensitive film is characterized by comprising a soft film and a metal hard film coated on the outer surface of the soft film, wherein the soft film and the metal hard film form an inverted T-shaped structure, the metal hard film is arranged opposite to the fiber core cross section of a single-mode fiber, the diameter of the metal hard film is equal to the diameter of the fiber core cross section of the single-mode fiber, the diameter of the soft film is equal to the outer diameter of the annular end face of a capillary glass tube, the soft film is a rubber film or a silica gel film with a smooth and clean surface, and the metal hard film is made of gold or silver.
2. The coated double-layer sensitive film for FP cavity fiber optic pressure sensor of claim 1, wherein the flexible film is made of PDMS.
3. The coated double-layer sensitive film for an FP cavity fiber pressure sensor of claim 1, wherein the thickness of the soft film is 0.5-10 μm, and the thickness of the metal hard film is 10-1000nm.
4. A method for preparing a coated double-layer sensitive film, comprising the steps of:
s1, depositing an oxide layer on a substrate as a sacrificial layer, spin-coating a photoresist layer on the oxide layer, exposing the photoresist with high-energy radiation through a specific pattern on a mask plate, removing the photoresist with changed properties after exposure by using a developing solution to obtain empty slots with pattern shapes corresponding to the mask plate, then etching the whole surface by using ICP (inductively coupled plasma) with the rest of the photoresist as a mask, and obtaining marks with corresponding patterns on the oxide layer so as to facilitate the positioning of subsequent overlay steps;
s2, coating photoresist again, and positioning by using another mask plate with the same mark pattern arranged at the same position as the mask plate in the step S1, wherein the mask plate in the step S2 is also provided with a circular pattern; forming a cylindrical empty groove in the photoresist through the same exposure and dissolution steps as in the step 1, and filling the cylindrical empty groove with a soft film solution to prepare a soft film;
s3, coating photoresist on the soft film again, and positioning by using another mask plate with the same mark pattern arranged at the same position as the mask plate in the step S1, wherein the mask plate in the step S3 is also provided with a circular pattern, and the circle center of the circular pattern is coincident with that of the circular pattern arranged on the mask plate in the step S2; forming a cylindrical empty groove in the photoresist through the same exposure and dissolution steps as in the step 1, and plating a layer of metal hard film on the outer surface of the soft film through an electron beam evaporation technology;
s4, removing the photoresist and the substrate to obtain the plated double-layer sensitive film.
5. The method for preparing a coated double-layer sensitive film according to claim 4, wherein in step S2, the flexible film is made of PDMS, and the thickness of the flexible film is 0.5-10 μm, and the surface is smooth and clean.
6. The method for preparing a plated double-layer sensitive film according to claim 4, wherein in step S3, the metal hard film is made of gold or silver, and the thickness of the metal hard film is 10-1000nm.
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