CN110053369A - A kind of apparatus for baking - Google Patents
A kind of apparatus for baking Download PDFInfo
- Publication number
- CN110053369A CN110053369A CN201910274457.4A CN201910274457A CN110053369A CN 110053369 A CN110053369 A CN 110053369A CN 201910274457 A CN201910274457 A CN 201910274457A CN 110053369 A CN110053369 A CN 110053369A
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- Prior art keywords
- temperature
- control module
- baking
- heating
- temperature control
- Prior art date
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- 238000010438 heat treatment Methods 0.000 claims abstract description 72
- 239000000758 substrate Substances 0.000 claims abstract description 38
- 230000006698 induction Effects 0.000 claims description 20
- 238000006243 chemical reaction Methods 0.000 claims description 7
- 238000001514 detection method Methods 0.000 claims description 4
- 230000036413 temperature sense Effects 0.000 claims description 3
- 230000005540 biological transmission Effects 0.000 claims description 2
- 208000027418 Wounds and injury Diseases 0.000 abstract description 4
- 230000006378 damage Effects 0.000 abstract description 4
- 208000014674 injury Diseases 0.000 abstract description 4
- 238000010586 diagram Methods 0.000 description 12
- 238000000034 method Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 3
- 238000007639 printing Methods 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000007641 inkjet printing Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 210000000746 body region Anatomy 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J11/00—Devices or arrangements of selective printing mechanisms, e.g. ink-jet printers or thermal printers, for supporting or handling copy material in sheet or web form
- B41J11/0015—Devices or arrangements of selective printing mechanisms, e.g. ink-jet printers or thermal printers, for supporting or handling copy material in sheet or web form for treating before, during or after printing or for uniform coating or laminating the copy material before or after printing
- B41J11/002—Curing or drying the ink on the copy materials, e.g. by heating or irradiating
Landscapes
- Drying Of Solid Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
The present invention provides a kind of apparatus for baking comprising cabinet, the interior definition of the cabinet have baking chamber, and the baking is intracavitary to be provided with carrying thermal station and temperature control module.Wherein the temperature control module is equipped with a heating location by the carrying thermal station, when the carrying thermal station carries substrate to be processed and heats to it, the temperature control module is heated by the heating function of its own in the heating location, to promote the temperature of its surrounding space.The present invention provides a kind of apparatus for baking, it has the temperature control module of conducting self-heating function in the corner location setting of substrate edges to be processed, temperature-compensating can be carried out to the edge of substrate to be processed by the heating function of itself, its thermal injury is reduced, to reduce the corner areas of the substrate to be processed and the otherness of other interregional temperature uniformities.
Description
Technical field
The present invention relates to the Preparation equipment technical field of display panel, in particular to a kind of apparatus for baking.
Background technique
In field of display technology, liquid crystal display (Liquid Crystal Display, LCD) and Organic Light Emitting Diode
The flat-panel monitors such as (Organic Light Emitting Diode, OLED) display gradually replace CRT monitor, extensively
General is applied to LCD TV, mobile phone, personal digital assistant, digital camera, computer screen or laptop screen etc..
The development trend of OLED is carried out towards the direction of inkjet printing at present, but during inkjet printing, respectively
A minimum of three layers of film layer for having printing, drying, a baking, and printing, including hole injection layer, transport layer and luminescent layer.Each time
Dry, baking is both needed to after printing, baking process is that whether completely drying has main relationship with final solvent, if baking temperature
Lack of uniformity, will lead to the Time Inconsistency that the solvent of partial region can not be dried or be dried, eventually lead to mura's
It generates.
And toast that required uniformity requirement is higher at present, and the baking temperature of glass edge portion is relatively low, causes
Have the possibility of mura phenomenon (display brightness unevenly causes the phenomenon that various traces) generation.
Therefore, it is necessory to develop a kind of novel apparatus for baking, to overcome the deficiencies of existing technologies.
Summary of the invention
It is an object of the present invention to provide a kind of apparatus for baking, be able to solve in the prior art because of baking temperature not
The display panel edge handled by it is caused to lead to the problem of mura.
To achieve the above object, the present invention provides a kind of apparatus for baking comprising cabinet, the interior definition of the cabinet have baking
Chamber, the baking is intracavitary to be provided with carrying thermal station and temperature control module.Wherein the temperature control module is set by the carrying thermal station
There is a heating location, when the carrying thermal station carries substrate to be processed and heats to it, the temperature control module
It is heated by the heating function of its own in the heating location, to promote the temperature of its surrounding space.
Further, in other embodiments, wherein the central point of the heating location and its nearest described carrying
The distance range of the point for the substrate to be processed being arranged in thermal station is 10-90mm.
Further, in other embodiments, wherein the temperature control module is intracavitary also with initial bit in the baking
It sets, the temperature control module can convert movement between the initial position and the heating location.
Further, in other embodiments, wherein the heating location includes the first heating location and the second heating
Position, the temperature control module can convert shifting between the initial position and first heating location or the second heating location
It is dynamic.
Further, in other embodiments, wherein the central point of the initial position and its nearest described carrying
The distance range of the point for the substrate to be processed being arranged in thermal station is 100-300mm.
Further, in other embodiments, wherein the temperature control module is arranged on a stretching structure, and pass through institute
It states stretching for stretching structure and carries out position conversion between the initial position and the heating location, wherein the stretching structure connects
It connects on the cabinet.
Further, in other embodiments, wherein the temperature control module is arranged on an air cylinder structure, and pass through institute
The mobile progress position conversion between the initial position and the heating location of piston for stating air cylinder structure, wherein the cylinder knot
Structure is connected on the cabinet.
Further, in other embodiments, wherein the baking is intracavitary to be additionally provided with temperature induction unit, the temperature
Degree sensing unit detects the temperature of its position, and the temperature value detected is issued the temperature control module, the control
Warm module by the temperature value received compared with temperature value preset in it, when the temperature value received is low in the inner
When the preset temperature numerical value, the heating operation can be carried out in the heating location.
Further, in other embodiments, wherein the temperature control module includes control unit and heating unit, wherein
Described control unit receives the detection temperature value of temperature induction unit transmission, and with temperature value ratio preset in it
Compared with the heating unit being instructed to exist when the low preset temperature numerical value in the inner of the detection temperature value received
The heating location carries out the heating operation.
Further, in other embodiments, wherein the temperature control module includes 2 or more quantity.It is wherein described
The setting quantity and set-up mode of temperature control module with the need depending on, and be not limited, as long as substrate edges to be processed and whole can be made
Body region carries out temperature-compensating, reduces thermal injury.
Compared with the existing technology, the beneficial effects of the present invention are a kind of apparatus for baking is provided, in substrate to be processed
The corner location setting at edge has the temperature control module of conducting self-heating function, can treat place by the heating function of itself
Manage substrate edge carry out temperature-compensating, reduce its thermal injury, thus reduce the substrate to be processed corner areas and its
The otherness of his interregional temperature uniformity.
Further, the temperature control module can independent control moved, so as to the substrate to be processed
Each region temperature-compensating is carried out to it as needed, further expand its application range.
Detailed description of the invention
To describe the technical solutions in the embodiments of the present invention more clearly, make required in being described below to embodiment
Attached drawing is briefly described, it should be apparent that, drawings in the following description are only some embodiments of the invention, for
For those skilled in the art, without creative efforts, it can also be obtained according to these attached drawings other attached
Figure.
Fig. 1 is the structural schematic diagram for the apparatus for baking that the embodiment of the present invention 1 provides；
Fig. 2 is the structural schematic diagram carried when thermal station carries substrate to be processed in the embodiment of the present invention 1；
Fig. 3 is the structural schematic diagram for the apparatus for baking that the embodiment of the present invention 2 provides；
Fig. 4 is the structural schematic diagram carried when thermal station carries substrate to be processed in the embodiment of the present invention 2；
Fig. 5 is in structural schematic diagram when heating location for temperature control module in the embodiment of the present invention 2；
Fig. 6 is the structural schematic diagram for being moved to initial position in the embodiment of the present invention 2 after temperature control module completion temperature-compensating.
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation description, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, it is obtained by those of ordinary skill in the art without making creative efforts every other
Embodiment shall fall within the protection scope of the present invention.
In the description of the present invention, it is to be understood that, term " center ", " transverse direction ", "upper", "lower", "left", "right",
The orientation or positional relationship of the instructions such as "vertical", "horizontal", "top", "bottom", "inner", "outside" be orientation based on the figure or
Positional relationship is merely for convenience of description of the present invention and simplification of the description, rather than the device or element of indication or suggestion meaning must
There must be specific orientation, be constructed and operated in a specific orientation, therefore be not considered as limiting the invention.In addition, belonging to
Meaning is used for descriptive purposes only and cannot be understood as indicating or suggesting relative importance or implicitly indicated in " first " " second "
The quantity of the technical characteristic shown.Limit as a result, by the feature of " first ", " second " can explicitly or implicitly include one or
More this feature of person.In description of the invention, unless otherwise indicated, the meaning of " plurality " is two or more.In addition,
Term " includes " and its any deformation, it is intended that cover and non-exclusive include.
In the description of the present invention, it should be noted that unless otherwise clearly defined and limited, term " installation ", " phase
Even ", " connection " shall be understood in a broad sense, for example, it may be being fixedly connected, may be a detachable connection, or be integrally connected；It can
To be mechanical connection, it is also possible to be electrically connected；It can be directly connected, can also can be indirectly connected through an intermediary
Connection inside two elements.For the ordinary skill in the art, above-mentioned term can be understood at this with concrete condition
Concrete meaning in invention.
Term used herein above is not intended to limit exemplary embodiment just for the sake of description specific embodiment.Unless
Context clearly refers else, otherwise singular used herein above "one", " one " also attempt to include plural number.Also answer
When understanding, term " includes " and/or "comprising" used herein above provide the feature, integer, step, operation, list
The presence of member and/or component, and do not preclude the presence or addition of other one or more features, integer, step, operation, unit, group
Part and/or combination thereof.
Embodiment 1
Referring to Fig. 1, Fig. 1 show the structural schematic diagram of apparatus for baking provided in this embodiment, the present invention provides one kind
Apparatus for baking, including cabinet, the interior definition of cabinet have baking chamber, toast intracavitary is provided with and carry thermal station 1, temperature control module 3 and temperature
Sensing unit 4.
Fig. 2 show the structural schematic diagram of apparatus for baking when carrying thermal station carries substrate to be processed, places position in substrate 2
The quadrangle at edge is set, i.e. four temperature control modules 3 and temperature induction unit 4 is arranged in heating location, and wherein temperature control module 3 has itself
Heating function can carry out temperature-compensating to substrate 2, and temperature induction unit 4 can detect the temperature at heating location, heating location
The central point carrying thermal station nearest with it on the point distance L1 of substrate to be processed 2 that is arranged be 50mm.
It is additionally provided with control unit on apparatus for baking, connect with temperature induction unit 4 and temperature induction unit 4 can be received
Numerical value.Carrying thermal station 1 is in heated condition, temperature sense when carrying is input to and toasts intracavitary substrate 2 to be processed
Temperature at 4 induction heating position of unit, when control unit knows the temperature value of temperature induction unit 4 lower than preset temperature
When, it is default to compensate to reach to the temperature at heating location to be notified that temperature control module 3 is in heated condition
Temperature.
Illustrate the baking operation process of the apparatus for baking in the preferred embodiment of the present invention below:
First in the quadrangle at substrate placement location edge, i.e. four temperature control modules 3 and temperature sense list is arranged in heating location
Member 4；
So that carrying thermal station 1 is in heated condition, after waiting it to reach preset temperature, substrate 2 is then placed on carrying heat
On platform 1, substrate 2 is aligned, is fixed；
When control unit knows the temperature value of temperature induction unit 4 lower than preset temperature, it is notified that temperature control module 3
In heated condition to compensate to reach preset temperature to the temperature at heating location.
Embodiment 2
Referring to Fig. 3, Fig. 3 show the structural schematic diagram of apparatus for baking provided in this embodiment, the present invention provides one kind
Apparatus for baking, including cabinet, the interior definition of cabinet have baking chamber, toast intracavitary is provided with and carry thermal station 1, temperature control module 3 and temperature
Sensing unit 4.
Temperature control module 3 has initial position and heating location, and temperature control module 3 can be between initial position and heating location
It is mobile.Wherein temperature control module 3 is arranged on a stretching structure, and stretching in initial position and heating location by stretching structure
Between carry out position conversion, wherein stretching structure is connected on the cabinet.
In other embodiments, wherein temperature control module also can be set on an air cylinder structure, and pass through air cylinder structure
Piston it is mobile position conversion is carried out between initial position and heating location, wherein air cylinder structure is connected on the cabinet.
Fig. 4 show the structural schematic diagram carried when thermal station carries substrate to be processed in the present embodiment, places in substrate 2
Four temperature induction units 4 are arranged in the quadrangle at position edge, i.e. heating location, and four temperature control modules 3 are arranged in initial position.Its
Middle temperature control module 3 has the function of conducting self-heating, and temperature-compensating can be carried out to substrate 2, and temperature induction unit 4 can detect heating position
Set the temperature at place.The point distance L2 for the substrate to be processed 2 being arranged in the central point of the initial position carrying thermal station nearest with it
For 200mm.
Fig. 5 show structural schematic diagram when temperature control module in the present embodiment is in heating location, also sets on apparatus for baking
It is equipped with control unit, the numerical value of temperature induction unit 4 is connect and can received with temperature induction unit 4.Carrying thermal station 1 is carrying
Being input to when toasting intracavitary substrate 2 to be processed is to be in heated condition, the temperature at 4 induction heating position of temperature induction unit
Degree is notified that temperature control module 3 from first when control unit knows the temperature value of temperature induction unit 4 lower than preset temperature
Beginning position is moved at heating location, and wherein temperature control module 3 is in heated condition to compensate to the temperature at heating location
To reach preset temperature.The substrate to be processed being wherein arranged in the central point of heating location carrying thermal station nearest with it
The distance L1 of 2 point is 50mm.
Fig. 6 is that temperature control module is moved to the structural schematic diagram of initial position after completing temperature-compensating in the present embodiment, when adding
After the temperature at the thermal potential place of setting reaches preset temperature, control unit is notified that temperature control module 3 is moved to initial position from heating location.
Illustrate the baking operation process of the apparatus for baking in the preferred embodiment of the present invention below:
First in the quadrangle at 2 placement location edge of substrate, i.e. four temperature induction units 4 are arranged in heating location, initial
Four temperature control modules 3 are arranged in position；
So that carrying thermal station 1 is in heated condition, after waiting it to reach preset temperature, substrate 2 is then placed on carrying heat
On platform 1, substrate 2 is aligned, is fixed；
When control unit knows the temperature value of temperature induction unit 4 lower than preset temperature, it is notified that temperature control module 3
It is moved to from heating location from initial position, wherein temperature control module 3 is in heated condition to carry out to the temperature at heating location
Compensation is to reach preset temperature；
After temperature at heating location reaches preset temperature, control unit is notified that temperature control module 3 is moved from heating location
It moves to initial position.
The beneficial effects of the present invention are a kind of apparatus for baking is provided, set in the corner location of substrate edges to be processed
The temperature control module with conducting self-heating function is set, the edge of substrate to be processed can be carried out by the heating function of itself
Temperature-compensating reduces its thermal injury, thus reduce the substrate to be processed corner areas and other interregional temperature it is uniform
The otherness of property.
Further, the temperature control module can independent control moved, so as to the substrate to be processed
Each region temperature-compensating is carried out to it as needed, further expand its application range.
The above is only a preferred embodiment of the present invention, it is noted that for the ordinary skill people of the art
Member, various improvements and modifications may be made without departing from the principle of the present invention, these improvements and modifications also should be regarded as
Protection scope of the present invention.
Claims (10)
1. a kind of apparatus for baking, which is characterized in that it includes cabinet, and definition has baking chamber in the cabinet, and the baking is intracavitary
It is provided with carrying thermal station and temperature control module；Wherein the temperature control module is equipped with a heating location by the carrying thermal station, when
When the carrying thermal station carries substrate to be processed and heats to it, heating that the temperature control module passes through its own
Function is heated in the heating location, to promote the temperature of its surrounding space.
2. apparatus for baking according to claim 1, which is characterized in that the central point of the heating location institute nearest with it
The distance range for stating the point for the substrate to be processed being arranged in carrying thermal station is 10-90mm.
3. a kind of apparatus for baking according to claim 1, which is characterized in that the temperature control module is intracavitary also in the baking
With initial position, the temperature control module can convert movement between the initial position and the heating location.
4. apparatus for baking according to claim 3, which is characterized in that the heating location includes the first heating location and the
Two heating locations, the temperature control module can be between the initial position and first heating location or the second heating locations
Conversion movement.
5. apparatus for baking according to claim 3, which is characterized in that the central point of the initial position institute nearest with it
The distance range for stating the point for the substrate to be processed being arranged in carrying thermal station is 100-300mm.
6. apparatus for baking according to claim 3, which is characterized in that the temperature control module is arranged on a stretching structure,
And position conversion is carried out between the initial position and the heating location by stretching for the stretching structure, wherein described stretch
Shrinking structure is connected on the cabinet.
7. apparatus for baking according to claim 3, which is characterized in that the temperature control module is arranged on an air cylinder structure,
And position conversion is carried out between the initial position and the heating location by the way that the piston of the air cylinder structure is mobile, wherein institute
Air cylinder structure is stated to be connected on the cabinet.
8. apparatus for baking according to claim 1, which is characterized in that the baking is intracavitary to be additionally provided with temperature sense list
Member, the temperature induction unit detects the temperature of its position, and the temperature value detected is issued the temperature control mould
Block, the temperature control module by the temperature value received compared with temperature value preset in it, when the temperature value received
When the low preset temperature numerical value in the inner, the heating operation can be carried out in the heating location.
9. apparatus for baking according to claim 8, which is characterized in that the temperature control module includes that control unit and heating are single
Member, wherein described control unit receives the detection temperature value of temperature induction unit transmission, and with temperature preset in it
Numerical value compares, and when the low preset temperature numerical value in the inner of the detection temperature value received, can instruct the heating
Unit carries out the heating operation in the heating location.
10. apparatus for baking according to claim 1, which is characterized in that the temperature control module includes 2 or more quantity.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910274457.4A CN110053369B (en) | 2019-04-08 | 2019-04-08 | Baking device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910274457.4A CN110053369B (en) | 2019-04-08 | 2019-04-08 | Baking device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN110053369A true CN110053369A (en) | 2019-07-26 |
| CN110053369B CN110053369B (en) | 2021-06-01 |
Family
ID=67318506
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910274457.4A Active CN110053369B (en) | 2019-04-08 | 2019-04-08 | Baking device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN110053369B (en) |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06258644A (en) * | 1993-03-08 | 1994-09-16 | Hitachi Ltd | Substrate baking furnace |
| CN102372423A (en) * | 2010-08-16 | 2012-03-14 | 福清市新福兴玻璃有限公司 | Hot bending furnace for colored glazing glass, method for preparing colored glazing toughened hot-bent glass and colored glazing toughened hot-bent glass |
| CN105390222A (en) * | 2015-11-30 | 2016-03-09 | 合保电气（芜湖）有限公司 | Baking apparatus for resistor disc of lightning arrester |
| CN105629666A (en) * | 2014-10-29 | 2016-06-01 | 李东明 | Improved light resistance pre-baking oven heating device |
| CN107422499A (en) * | 2017-07-28 | 2017-12-01 | 武汉华星光电技术有限公司 | Substrate heating equipment |
| CN108231634A (en) * | 2018-02-10 | 2018-06-29 | 六安联众工业自动化技术有限公司 | A kind of LED substrate baking box and its substrate baking method |
| CN208368548U (en) * | 2018-07-19 | 2019-01-11 | 广东聚华印刷显示技术有限公司 | The apparatus for baking of glass substrate |
-
2019
- 2019-04-08 CN CN201910274457.4A patent/CN110053369B/en active Active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06258644A (en) * | 1993-03-08 | 1994-09-16 | Hitachi Ltd | Substrate baking furnace |
| CN102372423A (en) * | 2010-08-16 | 2012-03-14 | 福清市新福兴玻璃有限公司 | Hot bending furnace for colored glazing glass, method for preparing colored glazing toughened hot-bent glass and colored glazing toughened hot-bent glass |
| CN105629666A (en) * | 2014-10-29 | 2016-06-01 | 李东明 | Improved light resistance pre-baking oven heating device |
| CN105390222A (en) * | 2015-11-30 | 2016-03-09 | 合保电气（芜湖）有限公司 | Baking apparatus for resistor disc of lightning arrester |
| CN107422499A (en) * | 2017-07-28 | 2017-12-01 | 武汉华星光电技术有限公司 | Substrate heating equipment |
| CN108231634A (en) * | 2018-02-10 | 2018-06-29 | 六安联众工业自动化技术有限公司 | A kind of LED substrate baking box and its substrate baking method |
| CN208368548U (en) * | 2018-07-19 | 2019-01-11 | 广东聚华印刷显示技术有限公司 | The apparatus for baking of glass substrate |
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| Publication number | Publication date |
|---|---|
| CN110053369B (en) | 2021-06-01 |
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Address after: 9-2 Tangming Avenue, Guangming New District, Shenzhen City, Guangdong Province Applicant after: TCL China Star Optoelectronics Technology Co.,Ltd. Address before: 9-2 Tangming Avenue, Guangming New District, Shenzhen City, Guangdong Province Applicant before: Shenzhen China Star Optoelectronics Technology Co.,Ltd. |
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