CN109962398A - A kind of fixed device of crystal for micro-slice laser - Google Patents

A kind of fixed device of crystal for micro-slice laser Download PDF

Info

Publication number
CN109962398A
CN109962398A CN201711403550.8A CN201711403550A CN109962398A CN 109962398 A CN109962398 A CN 109962398A CN 201711403550 A CN201711403550 A CN 201711403550A CN 109962398 A CN109962398 A CN 109962398A
Authority
CN
China
Prior art keywords
crystal
heat
conducting plate
micro
connecting hole
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201711403550.8A
Other languages
Chinese (zh)
Inventor
丁宏玉
李伟平
朱海波
罗近雅
曾杰云
李文景
冯广宁
梁崇智
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
GUANGDONG HUAKUAI PHOTON TECHNOLOGY CO.,LTD.
Guangdong Huayi Laser Technology Co., Ltd
Original Assignee
Guangdong Han Tang Rapid Manufacturing Application Technology Research Institute Co Ltd
Guangdong Liang Ze Laser Technology Co Ltd
Guangdong Hua Fast Photon Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Guangdong Han Tang Rapid Manufacturing Application Technology Research Institute Co Ltd, Guangdong Liang Ze Laser Technology Co Ltd, Guangdong Hua Fast Photon Technology Co Ltd filed Critical Guangdong Han Tang Rapid Manufacturing Application Technology Research Institute Co Ltd
Priority to CN201711403550.8A priority Critical patent/CN109962398A/en
Publication of CN109962398A publication Critical patent/CN109962398A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02Constructional details
    • H01S3/025Constructional details of solid state lasers, e.g. housings or mountings
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02Constructional details
    • H01S3/04Arrangements for thermal management
    • H01S3/0405Conductive cooling, e.g. by heat sinks or thermo-electric elements

Abstract

The invention discloses a kind of fixed devices of crystal for micro-slice laser, it include sequentially connected first heat-conducting plate, second heat-conducting plate and third heat-conducting plate, first heat-conducting plate, second heat-conducting plate, third heat-conducting plate is respectively equipped with the first light hole being arranged concentrically, crystal connecting hole, second light hole, crystal is equipped in the crystal connecting hole, crystal connecting hole aperture is all larger than the first light hole aperture and the second light hole aperture, first light hole aperture and the second light hole aperture are respectively less than crystal circumscribed circle diameter, make sufficiently to thermally contact between crystal and heat-conducting plate, and reduce the difference of the thermal expansion coefficient between thermally conductive plate material and crystal, constraint crystal is displaced it not, improve the durability of microchip solid state laser and the quality of laser light source.

Description

A kind of fixed device of crystal for micro-slice laser
[technical field]
The present invention relates to a kind of fixed devices of crystal for micro-slice laser.
[background technique]
Microchip solid state laser is a kind of small-sized, high quality laser light source, can continuous or pulse operation, structure It is compact, easy to use, it has a good application prospect, wherein the core element for generating laser is Nd:YAG crystal or Nd:YVO4 Crystal, shape can be rectangular or rectangle, be also possible to circle, and size range is general are as follows: thickness is less than 2mm, diameter Or side length is generally within 10mm, when with sufficiently strong 808nm laser irradiation to Nd:YAG or Nd:YVO4When on crystal, crystal The laser that wavelength is 1064nm can be issued.
But above-mentioned crystal temperature under 808nm laser irradiation can increase, in order to maintain preferable performance, it is necessary to dissipate to it Heat fixes the mode of crystal and heat dissipation as shown in Figure 1-3, crystal 12 is placed on one in Fig. 1 in existing micro-slice laser In metal sleeve 11, crystal tabletting 13 is locked by screwing briquetting 14 again after pressing against crystal 12;Crystal 12 is placed in Fig. 2 and Fig. 3 It is locked in metal sleeve 11, then directly by crystal briquetting 15, realizes the fixation and heat dissipation of crystal, but above-mentioned fixation and heat dissipation Mode has the following disadvantages: that 1, crystal is not enough with intermetallic thermally contact;2, due in the case where pump light irradiates, crystal temperature effect It can increase, and metal sleeve differs larger with the thermal expansion rate of crystal, after a number of uses, contact meeting of the crystal with metal sleeve It gradually fluffs, so as to cause the reduction of heat-transfer effect and the minute movement of position, due to conducting heat, bad and crystal displacement is affected The output-index of laser;3, also more difficult in batch production process to accomplish consistency, it is difficult to carry out quality control.
[summary of the invention]
The invention overcomes the shortcomings of the above-mentioned technology and provides a kind of crystal for micro-slice laser to fix device, Make sufficiently to thermally contact between crystal and heat-conducting plate, and reduce the difference of the thermal expansion coefficient between thermally conductive plate material and crystal, about Shu Jingti is displaced it not, improves the durability of microchip solid state laser and the quality of laser light source.
To achieve the above object, present invention employs following technical proposals:
A kind of fixed device of crystal for micro-slice laser includes sequentially connected first heat-conducting plate, second leads Hot plate and third heat-conducting plate, it is logical that first heat-conducting plate, the second heat-conducting plate, third heat-conducting plate are respectively equipped with first be arranged concentrically Unthreaded hole, crystal connecting hole, the second light hole, the crystal connecting hole is interior to be equipped with crystal, and crystal connecting hole aperture is all larger than First light hole aperture and the second light hole aperture, first light hole aperture and the second light hole aperture are respectively less than outside crystal Connect circular diameter.
First heat-conducting plate, the second heat-conducting plate, third heat-conducting plate are one of thermal conductive ceramic, tungsten copper piece, sapphire Or it is a variety of.
First heat-conducting plate and the thermally conductive plate thickness of third are all larger than 0.1mm.
First heat-conducting plate, the second heat-conducting plate and third heat-conducting plate geomery are all the same.
The big 10um or more of the crystal connecting hole aperture ratio crystal circumscribed circle diameter.
The crystal connecting hole is circular hole or square hole, and the crystal shape is identical cylindric to connect hole shape with crystal Or flat column.
The crystal is welded in crystal connecting hole by thermally conductive glue or low-temperature metal solder.
Between first heat-conducting plate and the second heat-conducting plate, the second heat-conducting plate and third heat-conducting plate by thermally conductive glue or The welding of low-temperature metal solder.
The beneficial effects of the present invention are:
The present invention guarantees the compactness and uniformity that laser crystal is contacted with heat-conducting plate, guarantees product quality and keeps laser Crystal light pass surface is parallel with thermally conductive plate surface, to guarantee the assembly precision of subsequent handling, the thermal expansion coefficient of thermally conductive plate material It is close with crystal, it is displaced it not to constrain crystal, convenient for batch production control.
[Detailed description of the invention]
Fig. 1 is the cross-sectional view that the prior art applies one;
Fig. 2 is the cross-sectional view that the prior art applies two;
Fig. 3 is the cross-sectional view that the prior art applies three;
Fig. 4 is one exploded view of the embodiment of the present invention;
Fig. 5 is one cross-sectional view of the embodiment of the present invention;
Fig. 6 is two exploded view of the embodiment of the present invention.
[specific embodiment]
It is described in further detail with reference to the accompanying drawing with embodiments of the present invention:
As Figure 4-Figure 6, the fixed device of a kind of crystal for micro-slice laser includes sequentially connected first to lead Hot plate 1, the second heat-conducting plate 2 and third heat-conducting plate 3, first heat-conducting plate 1, the second heat-conducting plate 2, third heat-conducting plate 3 are set respectively There are the first light hole 4, crystal connecting hole 5, the second light hole 6 being arranged concentrically, is equipped with crystal 7, institute in the crystal connecting hole 5 State 5 aperture of crystal connecting hole and be all larger than 6 aperture of 4 aperture of the first light hole and the second light hole, 4 aperture of the first light hole and Second light hole, 6 aperture is respectively less than 7 circumscribed circle diameter of crystal, and pump light sequentially passes through the first light hole 4, crystal 7, the second light passing Hole 6, when pump light is irradiated on crystal 7,7 temperature of crystal rises, and heat passes to the second heat-conducting plate 2, the first heat-conducting plate 1 and third Heat dissipation is realized on heat-conducting plate 3.
Wherein, first heat-conducting plate 1, the second heat-conducting plate 2, third heat-conducting plate 3 can be thermal conductive ceramic, tungsten copper piece, Lan Bao Same material in stone can also be the various material in thermal conductive ceramic, tungsten copper piece, sapphire, dissipating for crystal 7 is better achieved Heat.
First heat-conducting plate 1, the second heat-conducting plate 2 and 3 geomery of third heat-conducting plate are all the same, convenient for the first light hole 4, crystalline substance Being arranged concentrically between body connecting hole 5, the second light hole 6, and first heat-conducting plate 1 is all larger than with 3 thickness of third heat-conducting plate 0.1mm guarantees mechanical performance and improves thermal diffusivity, and 5 aperture ratio crystal of crystal connecting hole, the 7 big 10um of diameter, being convenient for will be brilliant Body 7 is placed in crystal connecting hole 5.
First heat-conducting plate 1, the second heat-conducting plate 2, third heat-conducting plate thermal conductivity be above 20W/m/k, thermal expansion rate Respectively less than 10*10-6/K.
As shown in Figure 4 and Figure 6, the crystal connecting hole 5 is circular hole or square hole, and 7 shape of crystal is to connect with crystal 5 shape of hole is identical cylindric or flat column.
The crystal 7 is welded in crystal connecting hole 5 by thermally conductive glue or solder, first heat-conducting plate 1 It is welded between the second heat-conducting plate 2, the second heat-conducting plate 2 and third heat-conducting plate by thermally conductive glue or solder.
Assembling process: crystal 7 is first passed through into heat-conducting glue or low-temperature metal solder weldbonding on the first heat-conducting plate 1, wherein leading Hot glue and solder have to coating uniformly, and use certain pressure compaction, and observe under the microscope, guarantee crystal 7 The center deviation of the first light hole 4 on center and the first heat-conducting plate 1 is less than 0.1mm, the surface of crystal 7 and first thermally conductive The depth of parallelism on the surface of plate 1 is less than 0.05mm, then thermally conductive in the first heat-conducting plate 1 and the contact surface of the second heat-conducting plate 2 and second The uniform coated with thermally conductive glue of 5 inner periphery of crystal connecting hole or solder on plate 2, by the crystal connecting hole 5 on the second heat-conducting plate 2 Quasicrystal 7 is blocked, and in the uniform coated with thermally conductive glue of contact surface or solder of the second heat-conducting plate 2 and third heat-conducting plate 3, then Third heat-conducting plate 3 is covered and heated, connects the first heat-conducting plate 1, the second heat-conducting plate 2 with third heat-conducting plate 3 and crystal It connects hole 5 and realizes that high temperature stickup is fixed or is welded and fixed with crystal 7, temperature is depending on the fusing point according to heat-conducting glue or solder.

Claims (8)

1. a kind of fixed device of crystal for micro-slice laser, it is characterised in that: include sequentially connected first thermally conductive Plate (1), the second heat-conducting plate (2) and third heat-conducting plate (3), first heat-conducting plate (1), the second heat-conducting plate (2), third heat-conducting plate (3) the first light hole (4), crystal connecting hole (5), the second light hole (6) being arranged concentrically, the crystal connecting hole are respectively equipped with (5) crystal (7) are equipped in, crystal connecting hole (5) aperture is all larger than the first light hole (4) aperture and the second light hole (6) Aperture, the first light hole (4) aperture and the second light hole (6) aperture are respectively less than crystal (7) circumscribed circle diameter.
2. a kind of fixed device of crystal for micro-slice laser according to claim 1, it is characterised in that: described the One heat-conducting plate (1), the second heat-conducting plate (2), third heat-conducting plate (3) are one of thermal conductive ceramic, tungsten copper piece, sapphire or more Kind.
3. a kind of fixed device of crystal for micro-slice laser according to claim 1, it is characterised in that: first leads Hot plate (1) and third heat-conducting plate (3) thickness are all larger than 0.1mm.
4. a kind of fixed device of crystal for micro-slice laser according to claim 1, it is characterised in that: first leads Hot plate (1), the second heat-conducting plate (2) and third heat-conducting plate (3) geomery are all the same.
5. a kind of fixed device of crystal for micro-slice laser according to claim 1, it is characterised in that: the crystalline substance Body connecting hole (5) aperture ratio crystal (7) big 10um or more of circumscribed circle diameter.
6. a kind of fixed device of crystal for micro-slice laser according to claim 1, it is characterised in that: the crystalline substance Body connecting hole (5) is circular hole or square hole, and crystal (7) shape is identical with crystal connecting hole (5) shape cylindric or square Column.
7. a kind of fixed device of crystal for micro-slice laser according to claim 1, it is characterised in that: the crystalline substance Body (7) is welded in crystal connecting hole (5) by thermally conductive glue or low-temperature metal solder.
8. a kind of fixed device of crystal for micro-slice laser according to claim 1, it is characterised in that: described the Pass through thermally conductive glue or low temperature between one heat-conducting plate (1) and the second heat-conducting plate (2), the second heat-conducting plate (2) and third heat-conducting plate Brazing metal welding.
CN201711403550.8A 2017-12-22 2017-12-22 A kind of fixed device of crystal for micro-slice laser Pending CN109962398A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201711403550.8A CN109962398A (en) 2017-12-22 2017-12-22 A kind of fixed device of crystal for micro-slice laser

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201711403550.8A CN109962398A (en) 2017-12-22 2017-12-22 A kind of fixed device of crystal for micro-slice laser

Publications (1)

Publication Number Publication Date
CN109962398A true CN109962398A (en) 2019-07-02

Family

ID=67019180

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201711403550.8A Pending CN109962398A (en) 2017-12-22 2017-12-22 A kind of fixed device of crystal for micro-slice laser

Country Status (1)

Country Link
CN (1) CN109962398A (en)

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4132063A1 (en) * 1991-09-26 1993-04-08 Deutsche Aerospace Micro crystal laser cooling appts. - uses sapphire or synthetic diamond plane ground as conductor of thermal energy and is in contact with micro crystal surface
JPH05335679A (en) * 1992-05-29 1993-12-17 Nippon Columbia Co Ltd Semiconductor laser-excited solid-state laser device
FR2899033A1 (en) * 2006-03-24 2007-09-28 Thales Sa Optical laser beam amplifying device for use in vacuum container, has thermomechanical interface e.g. cryogenic liquid film, between crystal and part, partially immersing crystal in liquid, and provided in contact with cylindrical surface
US20120103569A1 (en) * 2010-11-02 2012-05-03 Gerald Ho Kim Silicon-Based Cooling Package for Laser Gain Medium
CN203193115U (en) * 2013-01-31 2013-09-11 鞍山煜宸科技有限公司 Laser crystal heat radiation structure of end pump solid-state laser
CN204732668U (en) * 2015-07-07 2015-10-28 杭州单色科技有限公司 A kind of end pumping solid laser crystal heat abstractor
US9397469B1 (en) * 2015-04-06 2016-07-19 Voxtel, Inc. Er,Yb:YAB laser system
CN207691188U (en) * 2017-12-22 2018-08-03 广东华快光子科技有限公司 A kind of crystal fixing device for micro-slice laser

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4132063A1 (en) * 1991-09-26 1993-04-08 Deutsche Aerospace Micro crystal laser cooling appts. - uses sapphire or synthetic diamond plane ground as conductor of thermal energy and is in contact with micro crystal surface
JPH05335679A (en) * 1992-05-29 1993-12-17 Nippon Columbia Co Ltd Semiconductor laser-excited solid-state laser device
FR2899033A1 (en) * 2006-03-24 2007-09-28 Thales Sa Optical laser beam amplifying device for use in vacuum container, has thermomechanical interface e.g. cryogenic liquid film, between crystal and part, partially immersing crystal in liquid, and provided in contact with cylindrical surface
US20120103569A1 (en) * 2010-11-02 2012-05-03 Gerald Ho Kim Silicon-Based Cooling Package for Laser Gain Medium
CN203193115U (en) * 2013-01-31 2013-09-11 鞍山煜宸科技有限公司 Laser crystal heat radiation structure of end pump solid-state laser
US9397469B1 (en) * 2015-04-06 2016-07-19 Voxtel, Inc. Er,Yb:YAB laser system
CN204732668U (en) * 2015-07-07 2015-10-28 杭州单色科技有限公司 A kind of end pumping solid laser crystal heat abstractor
CN207691188U (en) * 2017-12-22 2018-08-03 广东华快光子科技有限公司 A kind of crystal fixing device for micro-slice laser

Similar Documents

Publication Publication Date Title
US20080304540A1 (en) System and method for thermal analysis using variable thermal resistance
TWI325047B (en) Heat pipe and manufacturing method thereof
KR20080047415A (en) Heat treatment apparatus, computer program and storage medium
US20100108297A1 (en) Heat Pipe and Making Method Thereof
CN101453859A (en) Loop type heat pipe radiator and manufacturing method thereof
US20180061684A1 (en) Optical heating of light absorbing objects in substrate support
CN207691188U (en) A kind of crystal fixing device for micro-slice laser
CN105202956A (en) Manufacturing method of composite vapor chamber with base plate made of molybdenum-copper or tungsten-copper alloy and other heat sink materials
CN109592988A (en) A kind of preparation method of diamond microtrabeculae enhancing high-heat conductivity graphite material
CN110073143A (en) Fluorescent light source device and its manufacturing method
CN109411431A (en) A kind of heat exchange structure and preparation method thereof
CN109962398A (en) A kind of fixed device of crystal for micro-slice laser
CN112103252B (en) Refrigeration type LTCC micro-system based on metal micro-channel and preparation method thereof
CN111854291A (en) Efficient active heat exchange spectrum beam combination grating integrated module and preparation method thereof
US20170336308A1 (en) Heating arrangement for a material testing device
WO2020048239A1 (en) High-power optical fiber laser gain optical fiber heat-dissipating device
TWI305132B (en)
CN201576886U (en) Radiating device of semiconductor laser
US11175100B2 (en) Heat sinks using memory shaping materials
CN203193115U (en) Laser crystal heat radiation structure of end pump solid-state laser
CN209516310U (en) A kind of laser die group
CN113594834B (en) Slat type laser crystal heat sink heat dissipation device, welding device and use method
US9151483B2 (en) Heat pipe for cooling optical sources
CN110125559A (en) A kind of laser cutting device suitable for being cut to sheet metal with film
CN109921279A (en) A kind of laser die group

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
TA01 Transfer of patent application right
TA01 Transfer of patent application right

Effective date of registration: 20220414

Address after: 528400 zone a, third floor, No. 28, Yuquan Road, Torch Development Zone, Zhongshan City, Guangdong Province

Applicant after: GUANGDONG HUAKUAI PHOTON TECHNOLOGY CO.,LTD.

Applicant after: Guangdong Huayi Laser Technology Co., Ltd

Address before: 3 / F, building 1, Shumao building, 6 Xiangxing Road, Torch Development Zone, Zhongshan City, Guangdong Province, 528400

Applicant before: GUANGDONG HUAKUAI PHOTON TECHNOLOGY CO.,LTD.

Applicant before: GUANGDONG HANTANG RAPID MANUFACTURING APPLICATION TECHNOLOGY RESEARCH INSTITUTE Co.,Ltd.

Applicant before: GUANGDONG LIANGZE LASER TECHNOLOGY Co.,Ltd.