CN109962028A - A kind of Full-automatic and its cleaning process for chip - Google Patents
A kind of Full-automatic and its cleaning process for chip Download PDFInfo
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- CN109962028A CN109962028A CN201910310896.6A CN201910310896A CN109962028A CN 109962028 A CN109962028 A CN 109962028A CN 201910310896 A CN201910310896 A CN 201910310896A CN 109962028 A CN109962028 A CN 109962028A
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- Prior art keywords
- cleaning
- workbench
- swinging arm
- chip
- automatic
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- 238000004140 cleaning Methods 0.000 title claims abstract description 98
- 238000000034 method Methods 0.000 title claims abstract description 16
- 230000008569 process Effects 0.000 title claims abstract description 14
- 239000000463 material Substances 0.000 claims abstract description 46
- 239000012530 fluid Substances 0.000 claims abstract description 39
- 239000007921 spray Substances 0.000 claims abstract description 25
- 238000001035 drying Methods 0.000 claims abstract description 21
- 229910000838 Al alloy Inorganic materials 0.000 claims abstract description 9
- 230000001680 brushing effect Effects 0.000 claims abstract description 5
- 230000007723 transport mechanism Effects 0.000 claims description 20
- 239000007788 liquid Substances 0.000 claims description 19
- 238000003860 storage Methods 0.000 claims description 15
- 230000008878 coupling Effects 0.000 claims description 14
- 238000010168 coupling process Methods 0.000 claims description 14
- 238000005859 coupling reaction Methods 0.000 claims description 14
- 239000007789 gas Substances 0.000 claims description 14
- 239000000126 substance Substances 0.000 claims description 9
- 230000007246 mechanism Effects 0.000 claims description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 6
- 239000004677 Nylon Substances 0.000 claims description 6
- 229920001778 nylon Polymers 0.000 claims description 6
- 239000004094 surface-active agent Substances 0.000 claims description 6
- 239000000203 mixture Substances 0.000 claims description 4
- 230000002000 scavenging effect Effects 0.000 claims description 4
- 239000000919 ceramic Substances 0.000 claims description 3
- 239000013527 degreasing agent Substances 0.000 claims description 3
- 238000005237 degreasing agent Methods 0.000 claims description 3
- 239000008367 deionised water Substances 0.000 claims description 3
- 229910021641 deionized water Inorganic materials 0.000 claims description 3
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- 238000002791 soaking Methods 0.000 claims description 3
- 238000005119 centrifugation Methods 0.000 claims description 2
- 230000007423 decrease Effects 0.000 claims description 2
- 239000003595 mist Substances 0.000 claims description 2
- 238000011109 contamination Methods 0.000 abstract description 8
- 230000007115 recruitment Effects 0.000 abstract description 5
- 230000000694 effects Effects 0.000 abstract description 4
- 238000007654 immersion Methods 0.000 abstract 1
- 238000005520 cutting process Methods 0.000 description 3
- 230000005611 electricity Effects 0.000 description 2
- 230000001717 pathogenic effect Effects 0.000 description 2
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000007771 core particle Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 239000003643 water by type Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02076—Cleaning after the substrates have been singulated
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Cleaning In General (AREA)
Abstract
The present invention relates to a kind of Full-automatics and its cleaning process for chip, belong to chip cleaning equipment technical field, including aluminium alloy post, control cabinet, power supply device, the bracket is equipped with cleaning chamber, the cleaning is intracavitary to be equipped with workbench, rotating device, locker, first swinging arm device and the second swinging arm device, after material arrival workbench is locked, pass through the medical fluid spray immersion of the first swinging arm device and automatic brushing, the automatic cleaning and drying of second swinging arm device, simultaneously, the time of different cleaning solution and cleaning can be set for different degrees of contamination, cleaning effect can further be promoted, and whole process uses full automatic working, multiple cleaning chambers are arranged simultaneously to work, effectively increase working efficiency, reduce recruitment cost.
Description
Technical field
The invention belongs to chip cleaning equipment technical field, in particular to a kind of Full-automatic for chip and
Its cleaning process.
Background technique
The core particles size of current chip is smaller and smaller, and because chip is very crisp, and band containing arsenic is toxic.Under normal circumstances, we
It is cut using blade, but the contamination generated after dicing is especially more, these contaminations seriously affect routing operation when encapsulation,
And the performance and reliability of product are influenced, so the cleaning after chip cutting becomes more and more important.
In addition, the contamination of chip needs timely to be cleaned after dicing, general control is within 15 minutes, otherwise core
After piece dries, the contamination on chip is difficult to clean up.Under prior art scenario, usually manual loading and unloading by two fluids or
Person's high-pressure pump cleaning machine cleans, because of timeliness, Manual-cleaning machine utilization rate is lower, and operative employee needs frequently to travel to and fro between
Between cutting machine and cleaning machine, very big labor intensity is brought to operative employee, not only working efficiency is low, also improves enterprise indirectly
The recruitment cost of industry.Also there are segment chip product, such as LED blue chip, many processes are passed through before test grading, these
Process is also easy to produce new contamination, and these stain the effect for using common two fluids or high-pressure pump cleaning machine to clean not
It is very well, often to occur sordid phenomenon after cleaning, while the yield of LED blue chip product is big, also just needs to operate
The more frequent loading and unloading operation of work, and a large amount of operative employee is needed, further improve the recruitment cost of enterprise.
Summary of the invention
In order to overcome the drawbacks of the prior art, the present invention provides a kind of Full-automatic for chip and its clearly
Technique is washed, chamber is cleaned by setting, the cleaning is intracavitary to be equipped with workbench, the first swinging arm device, the second swinging arm device and rotation
Full-automatic cleaning may be implemented in rotary device and locker, while different for different degrees of contamination setting
Cleaning solution and scavenging period, further improve cleaning effect, have greatly saved the recruitment cost of enterprise, have improved work
Efficiency.
Realizing the technical solution of above-mentioned purpose is:
The present invention provides a kind of Full-automatic for chip, includes aluminium alloy post, the aluminium alloy branch
Frame is equipped with warning device, sensor, a control cabinet and the power supply device connecting with the control cabinet, the table of the control cabinet
Face is equipped with a control panel, and material box, the platform transport mechanism to transmit material are additionally provided on the bracket, and the platform passes
It send mechanism to be connected at least one cleaning chamber transport mechanism, is connected with cleaning chamber below the cleaning chamber transport mechanism；
The top of the cleaning chamber is equipped with workbench, and the lower section of the workbench is equipped with several to provide vacuum environment
Vacuum generator, rotating device is fixedly connected with below the workbench, is equipped with lock around the table top of the workbench
Device, the cleaning is intracavitary to be additionally provided with the first swinging arm device to hydrojet scrub and the second swing arm to clean and dry up
Device, the cleaning is intracavitary to be additionally provided with discharge outlet, vent and material outflow mechanism；
The rotating device, locker, the first swinging arm device and the second swinging arm device are electrically connected with the control cabinet.
The further setting of the present invention is that the workbench is porous ceramics table top, and the bottom of the workbench, which is equipped with, to be used
With the cylinder of self-powered platform.
The further setting of the present invention is that the cleaning cavity wall is covered with nylon sponge, can be prevented in the course of work
The liquid thrown away, which returns, to be reflected back on the material cleaned, and the surface of the nylon sponge is additionally provided with pod, by what is sputtered
Liquid auto-guiding to cleaning chamber bottom.
The further setting of the present invention is that the locker is along several equally distributed eccentric clamps of table surface
Pawl passes through centrifugal force automatically lock material.
The further setting of the present invention is that first swinging arm device is that medical fluid is coated with and scrubs arm, including spray dress
It sets, brush unit, the first stepper motor, first shaft coupling, rotary shaft and the second stepper motor, second shaft coupling, screw rod, institute
It states the first stepper motor and rotary shaft is connected by first shaft coupling, moved left and right to control the first swinging arm device；Described second
Stepper motor connects second shaft coupling and screw rod, moves up and down to control the first swinging arm device；
The brush unit is set to the top of the spray equipment, and the spray equipment is connected with spray liquid storage addition dress
It sets.
The further setting of the present invention is, second swinging arm device include cleaning device, third stepper motor and with
The third shaft coupling of the third stepper motor connection；
The cleaning device includes two fluid cleaning sprayers, flowmeter, pressure-regulating valve, in the two fluids cleaning sprayer
Equipped with drying nozzle；The two fluids cleaning sprayer is connected with cleaning solution storage adding set, and the drying nozzle is connected with dry
Pathogenic dryness stores adding set.
The further setting of the present invention is that the chemical solution of surfactant is filled in the spray liquid storage adding set
Liquid, the chemical solution include wax liquor, degreasing agent, any solution in deionized water or a variety of solution be mixed to form it is mixed
Close liquid.
The further setting of the present invention is that two fluid aqueous vapors are filled in the cleaning solution storage adding set, described two
Fluid aqueous vapor is gas-vapor mix liquid, is sprayed by two fluid cleaning sprayers, is in micro- mist；In the dry gas storage adding set
It is filled with compressed gas, the compressed gas is drying nitrogen.
The present invention also provides a kind of cleaning process using the above-mentioned Full-automatic for chip, include with
Lower step:
S1, starting: starting control cabinet, control material are transferred to workbench through platform transport mechanism, cleaning chamber transport mechanism,
Vacuum generator starts vacuum environment；
S2, medical fluid spray impregnate: workbench decline is sprayed the chemical solution of surfactant by the first swinging arm device
Surface of material is poured to be impregnated；Spray time is 1-20 seconds, and soaking time is 0-60 seconds；
S3, hairbrush scrub: worktable rotary, locker lock material, the fan-shaped swing of brush unit, in scrub material
While hydro-peening material；Worktable rotary speed is 1-400RPM, and brushing time is 1-30 seconds, and the bristle diameter of brush unit is
0.02-0.1mm, bristle lengths 80-150mm；
S4, the cleaning of two fluids: by the second swinging arm device, the two fan-shaped swings of fluid cleaning sprayer use two fluid waters
Gas mixed liquor cleans material；Worktable rotary speed is 100-2000RPM, and scavenging period is 1-600 seconds, the water of two fluid aqueous vapors
Pressure is 0.2-0.5Mpa, water flow 0.2-0.5L/M；
S5, dry: drying nozzle is dried material using compressed gas；Worktable rotary speed is 100-2000RPM,
Drying time is 1-600 seconds；
S6 terminates: drying finishes, and workbench stops rotating, and workbench rises, and spreads out of mechanism by material and spreads out of material；
So far, cleaning process terminates, and the cleaning for carrying out next batch materials is recycled with this.
The utility model has the advantages that compared with the existing technology, present invention is distinguished in that the present invention provides one kind to be used for chip
Full-automatic and its cleaning process, set by the way that aluminium alloy post, control cabinet, power supply device is arranged, on the bracket
There is cleaning chamber, the cleaning is intracavitary to be equipped with workbench, rotating device, locker, the first swinging arm device and the second swinging arm device,
After material arrival workbench is locked, the medical fluid spray for passing through the first swinging arm device impregnates and automatic brushing, the second swing arm
The automatic cleaning and drying of device, meanwhile, different cleaning solution and cleaning can be set for different degrees of contamination
Time can further improve cleaning effect, and whole using full automatic working, while multiple cleaning chambers are arranged and carry out works
Make, effectively increase working efficiency, reduce recruitment cost, applicability is extensive, including the cleaning after chip package cutting
And cleaning of the chip after test grading can use.
Detailed description of the invention
Fig. 1 is the main view of the Full-automatic for chip of a preferred embodiment.
Fig. 2 is the rearview of the Full-automatic for chip of a preferred embodiment.
Fig. 3 is the structural schematic diagram that chamber (5) are cleaned in Fig. 2.
Fig. 4 is the top view of one of cleaning chamber (5) in Fig. 2.
Wherein, 1- aluminium alloy post, 11- material box, 2- control cabinet, 21- control panel, 3- platform transport mechanism, 4- are clear
Chamber transport mechanism is washed, 5- cleans chamber, the first swinging arm device of 51-, the second swinging arm device of 52-, 53- pod, 6- workbench, 61-
Rotating device, 62- locker, 63- cylinder.
Specific embodiment
The present invention will be further explained below with reference to the attached drawings and specific examples.
Referring to FIG. 1 to 4, the present invention provides a kind of Full-automatic for chip, includes aluminium alloy
Bracket 1, the aluminium alloy post 1 are equipped with warning device, sensor, a control cabinet 2 and the electricity connecting with the control cabinet 2
The surface of source device, the control cabinet 2 is equipped with a control panel 21, and 1 is additionally provided with material box 11, to transmit object on the bracket
The platform transport mechanism 3 of material, there are two clean chamber transport mechanism 4, the cleaning chamber conveyer for the connection of platform transport mechanism 3
The lower section of structure 4 is connected with cleaning chamber 5；
The top of the cleaning chamber 5 is equipped with workbench 6, and the lower section of the workbench 6 is equipped with several to provide vacuum
The vacuum generator of environment, the lower section of the workbench 6 are fixedly connected with rotating device 61, around the table top of the workbench 6
Equipped with locker 62, be additionally provided in the cleaning chamber 5 to the first swinging arm device 51 of hydrojet scrub and cleaning and
Second swinging arm device 52 of drying is additionally provided with discharge outlet, vent and material in the cleaning chamber 5 and spreads out of mechanism；
The rotating device 61, locker 62, vacuum generator, the first swinging arm device 51 and the second swinging arm device 52 are
It is electrically connected with the control cabinet 2.
As preferred and non-limiting, the workbench 6 is porous ceramics table top, the bottom of the workbench 6 be equipped with to
The cylinder 63 of self-powered platform 6.
As preferred and non-limiting, 5 inner wall of cleaning chamber is covered with nylon sponge, prevents the liquid thrown away when work from returning
It reflects back on the material cleaned, the surface of the nylon sponge is equipped with pod 53, will sputter the liquid auto-guiding come
To the bottom of cleaning chamber 5.
As preferred and non-limiting, the locker 62 be along the equally distributed four centrifugations clamping jaw of 6 table top of workbench,
Pass through centrifugal force automatically lock material.
As preferred and non-limiting, first swinging arm device 51 is that medical fluid is coated with and scrubs arm, including spray equipment,
Brush unit, the first stepper motor, first shaft coupling, rotary shaft and the second stepper motor, second shaft coupling, screw rod, it is described
First stepper motor connects rotary shaft by first shaft coupling, moves left and right to control the first swinging arm device 51；Described second
Stepper motor connects second shaft coupling and screw rod, moves up and down to control the first swinging arm device 51；
The brush unit is set to the top of the spray equipment, and the spray equipment is connected with spray liquid storage addition dress
It sets.
As preferred and non-limiting, second swinging arm device 52 include cleaning device, third stepper motor and with institute
State the third shaft coupling of third stepper motor connection；
The cleaning device includes two fluid cleaning sprayers, flowmeter, pressure-regulating valve, in the two fluids cleaning sprayer
Equipped with drying nozzle；The two fluids cleaning sprayer is connected with cleaning solution storage adding set, and the drying nozzle is connected with dry
Pathogenic dryness stores adding set.
As preferred and non-limiting, the chemical solution of surfactant is filled in the spray liquid storage adding set,
The chemical solution includes the mixing that wax liquor, degreasing agent, any solution in deionized water or a variety of solution are mixed to form
Liquid.
As preferred and non-limiting, two fluid aqueous vapors, two fluid are filled in the cleaning solution storage adding set
Aqueous vapor is gas-vapor mix liquid；It is filled with compressed gas in the dry gas storage adding set, the compressed gas is drying nitrogen.
The cleaning process that the above-mentioned Full-automatic for chip is used in the present invention, includes following steps:
S1, starting: starting control cabinet 2, control material are transferred to work through platform transport mechanism 3, cleaning chamber transport mechanism 4
Platform 6, vacuum generator start vacuum environment；
S2, medical fluid spray impregnate: workbench 6 declines, by the first swinging arm device 51, by the chemical solution of surfactant
Surface of material is sprayed to be impregnated；Spray time is 1-20 seconds, and soaking time is 0-60 seconds；
S3, hairbrush scrub: workbench 6 rotates, and locker 62 locks material, and the fan-shaped swing of brush unit is being scrubbed
Hydro-peening material while material；6 rotation speed of workbench is 1-400RPM, and brushing time is 1-30 seconds, the bristle of brush unit
Diameter is 0.02-0.1mm, bristle lengths 80-150mm；
S4, the cleaning of two fluids: by the second swinging arm device 52, the two fan-shaped swings of fluid cleaning sprayer use two fluids
Gas-vapor mix liquid cleans material；6 rotation speed of workbench is 100-2000RPM, and scavenging period is 1-600 seconds, two fluid aqueous vapors
Hydraulic pressure be 0.2-0.5Mpa, water flow 0.2-0.5L/M；
S5, dry: drying nozzle is dried material using compressed gas；6 rotation speed of workbench is 100-
2000RPM, drying time are 1-600 seconds；
S6 terminates: drying finishes, and workbench 6 stops rotating, and workbench 6 rises, and spreads out of mechanism by material and spreads out of object
Material；
So far, cleaning process terminates, and the cleaning for carrying out next batch materials is recycled with this.
It should be noted that mentioned platform transport mechanism 3, cleaning chamber transport mechanism 4 include transmission electricity in the present invention
Machine, driving wheel, conveyer belt etc. belong to the prior art, are not described in detail in the present invention；Mentioned rotating device 61 in the present invention
Include rotating electric machine, rotary shaft, belt pulley etc., belongs to the prior art, be not described in detail in the present invention；It is used in the present invention
Language " first, second " is used for description purposes only, and does not indicate any sequence, should not be understood as indicating or implying relative importance,
These terms can be construed to title.
Above specific embodiment is only the preferred embodiment of this creation, all in this wound not to limit this creation
Any modification, equivalent substitution, improvement and etc. done within the spirit and principle of work, should be included in this creation protection scope it
It is interior.
Claims (9)
1. a kind of Full-automatic for chip, includes aluminium alloy post, the aluminium alloy post is equipped with alarm
Device, sensor, a control cabinet and the power supply device connecting with the control cabinet, the surface of the control cabinet are equipped with a control
Panel, it is characterised in that:
Material box, the platform transport mechanism to transmit material are additionally provided on the bracket, the platform transport mechanism is connected with
At least one cleans chamber transport mechanism, is connected with cleaning chamber below the cleaning chamber transport mechanism；
The top of the cleaning chamber is equipped with workbench, and the lower section of the workbench is equipped with several to provide the true of vacuum environment
Empty generator is fixedly connected with rotating device below the workbench, is equipped with locker around the table top of the workbench,
The cleaning is intracavitary to be additionally provided with the first swinging arm device to hydrojet scrub and the second swinging arm device to clean and dry up,
The cleaning is intracavitary to be additionally provided with discharge outlet, vent and material outflow mechanism；
The rotating device, locker, vacuum generator, the first swinging arm device and the second swinging arm device with the control cabinet
Electrical connection.
2. being used for the Full-automatic of chip as described in claim 1, it is characterised in that:
The workbench is porous ceramics table top, and the bottom of the workbench is equipped with the cylinder to self-powered platform.
3. being used for the Full-automatic of chip as described in claim 1, it is characterised in that:
The cleaning cavity wall is covered with nylon sponge, and the surface of the nylon sponge is equipped with pod.
4. being used for the Full-automatic of chip as described in claim 1, it is characterised in that:
The locker is along several equally distributed centrifugation clamping jaws of table surface.
5. being used for the Full-automatic of chip as described in claim 1, it is characterised in that:
First swinging arm device be medical fluid be coated with and scrub arm, including spray equipment, brush unit, the first stepper motor,
First shaft coupling, rotary shaft and the second stepper motor, second shaft coupling, screw rod, first stepper motor pass through first
Axis device connects rotary shaft, moves left and right to control the first swinging arm device；Second stepper motor connection second shaft coupling and
Screw rod is moved up and down to control the first swinging arm device；
The brush unit is set to the top of the spray equipment, and the spray equipment is connected with spray liquid storage adding set.
6. being used for the Full-automatic of chip as described in claim 1, it is characterised in that:
Second swinging arm device includes cleaning device, third stepper motor and the third connecting with the third stepper motor
Shaft coupling；
The cleaning device includes two fluid cleaning sprayers, flowmeter, pressure-regulating valve, is also set in the two fluids cleaning sprayer
There is drying nozzle；The two fluids cleaning sprayer is connected with cleaning solution storage adding set, and the drying nozzle is connected with drying
Gas stores adding set.
7. being used for the Full-automatic of chip as claimed in claim 5, it is characterised in that:
The chemical solution of surfactant is filled in the spray liquid storage adding set, the chemical solution includes removing wax
The mixed liquor that liquid, degreasing agent, any solution in deionized water or a variety of solution are mixed to form.
8. being used for the Full-automatic of chip as claimed in claim 6, it is characterised in that:
Two fluid aqueous vapors are filled in the cleaning solution storage adding set, the two fluids aqueous vapor is gas-vapor mix liquid, is passed through
Two fluid cleaning sprayers spray, and are in micro- mist；It is filled with compressed gas in the dry gas storage adding set, the compressed gas is
Drying nitrogen.
9. a kind of cleaning process using as described in claim 1 for the Full-automatic of chip, which is characterized in that
The following steps are included:
S1, starting: starting control cabinet, control material are transferred to workbench, vacuum through platform transport mechanism, cleaning chamber transport mechanism
Generator starts vacuum environment；
S2, medical fluid spray impregnate: workbench decline, and by the first swinging arm device, the chemical solution spray of surfactant is arrived
Surface of material is impregnated；Spray time is 1-20 seconds, and soaking time is 0-60 seconds；
S3, hairbrush scrub: worktable rotary, locker lock material, the fan-shaped swing of brush unit, in the same of scrub material
When hydro-peening material；Worktable rotary speed is 1-400RPM, and brushing time is 1-30 seconds, and the bristle diameter of brush unit is
0.02-0.1mm, bristle lengths 80-150mm；
S4, the cleaning of two fluids: by the second swinging arm device, the two fan-shaped swings of fluid cleaning sprayer are mixed using two fluid aqueous vapors
It closes liquid and cleans material；Worktable rotary speed is 100-2000RPM, and scavenging period is 1-600 seconds, and the hydraulic pressure of two fluid aqueous vapors is
0.2-0.5Mpa, water flow 0.2-0.5L/M；
S5, dry: drying nozzle is dried material using compressed gas；Worktable rotary speed is 100-2000RPM, dry
Time is 1-600 seconds；
S6 terminates: drying finishes, and workbench stops rotating, and workbench rises, and spreads out of mechanism by material and spreads out of material；
So far cleaning process terminates, and is recycled with this, carries out the cleaning of next batch materials.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910310896.6A CN109962028A (en) | 2019-04-18 | 2019-04-18 | A kind of Full-automatic and its cleaning process for chip |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910310896.6A CN109962028A (en) | 2019-04-18 | 2019-04-18 | A kind of Full-automatic and its cleaning process for chip |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN109962028A true CN109962028A (en) | 2019-07-02 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910310896.6A Pending CN109962028A (en) | 2019-04-18 | 2019-04-18 | A kind of Full-automatic and its cleaning process for chip |
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Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111048405A (en) * | 2020-01-07 | 2020-04-21 | 厦门英惟达智能科技有限公司 | Product cleaning process for digitally cleaning chip wafer |
| CN111331504A (en) * | 2020-04-13 | 2020-06-26 | 争丰半导体科技(苏州)有限公司 | Full-automatic grinding and cleaning integrated machine for wafer |
| CN111921935A (en) * | 2020-08-11 | 2020-11-13 | 深圳市汤诚科技有限公司 | Chip online cleaning equipment |
| CN112185857A (en) * | 2020-09-29 | 2021-01-05 | 王健 | Swinging spraying process for wafer electroplating pretreatment |
| CN112189876A (en) * | 2020-09-27 | 2021-01-08 | 赵智霞 | Skirt-strut type tobacco pesticide degradation device |
| CN112366133A (en) * | 2021-01-13 | 2021-02-12 | 中电鹏程智能装备有限公司 | Wiping and cleaning device and cleaning method for semiconductor product |
| CN112635301A (en) * | 2020-12-21 | 2021-04-09 | 中环领先半导体材料有限公司 | Method for improving poor back sealing liquid medicine of 8-inch polished wafer |
| CN114472332A (en) * | 2022-01-21 | 2022-05-13 | 智程半导体设备科技(昆山)有限公司 | Soaking type photoresist removing, cleaning and drying integrated machine |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN111048405A (en) * | 2020-01-07 | 2020-04-21 | 厦门英惟达智能科技有限公司 | Product cleaning process for digitally cleaning chip wafer |
| CN111331504A (en) * | 2020-04-13 | 2020-06-26 | 争丰半导体科技(苏州)有限公司 | Full-automatic grinding and cleaning integrated machine for wafer |
| CN111921935A (en) * | 2020-08-11 | 2020-11-13 | 深圳市汤诚科技有限公司 | Chip online cleaning equipment |
| CN111921935B (en) * | 2020-08-11 | 2022-06-10 | 深圳市汤诚科技有限公司 | Chip online cleaning equipment |
| CN112189876A (en) * | 2020-09-27 | 2021-01-08 | 赵智霞 | Skirt-strut type tobacco pesticide degradation device |
| CN112189876B (en) * | 2020-09-27 | 2022-08-09 | 赵智霞 | Skirt-strut type tobacco pesticide degradation device |
| CN112185857A (en) * | 2020-09-29 | 2021-01-05 | 王健 | Swinging spraying process for wafer electroplating pretreatment |
| CN112635301A (en) * | 2020-12-21 | 2021-04-09 | 中环领先半导体材料有限公司 | Method for improving poor back sealing liquid medicine of 8-inch polished wafer |
| CN112366133A (en) * | 2021-01-13 | 2021-02-12 | 中电鹏程智能装备有限公司 | Wiping and cleaning device and cleaning method for semiconductor product |
| CN114472332A (en) * | 2022-01-21 | 2022-05-13 | 智程半导体设备科技(昆山)有限公司 | Soaking type photoresist removing, cleaning and drying integrated machine |
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