CN109957831B - Electrolytic polishing and residual stress detection integrated device - Google Patents

Electrolytic polishing and residual stress detection integrated device Download PDF

Info

Publication number
CN109957831B
CN109957831B CN201910283793.5A CN201910283793A CN109957831B CN 109957831 B CN109957831 B CN 109957831B CN 201910283793 A CN201910283793 A CN 201910283793A CN 109957831 B CN109957831 B CN 109957831B
Authority
CN
China
Prior art keywords
servo motor
electrolytic polishing
polishing
working platform
residual stress
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201910283793.5A
Other languages
Chinese (zh)
Other versions
CN109957831A (en
Inventor
许明三
张正
曾寿金
黄旭
王涛
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujian University of Technology
Original Assignee
Fujian University of Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujian University of Technology filed Critical Fujian University of Technology
Priority to CN201910283793.5A priority Critical patent/CN109957831B/en
Publication of CN109957831A publication Critical patent/CN109957831A/en
Application granted granted Critical
Publication of CN109957831B publication Critical patent/CN109957831B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25FPROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00Electrolytic etching or polishing
    • C25F3/16Polishing
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25FPROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F7/00Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects; Servicing or operating
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01LMEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L1/00Measuring force or stress, in general
    • G01L1/25Measuring force or stress, in general using wave or particle radiation, e.g. X-rays, microwaves, neutrons
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01LMEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L5/00Apparatus for, or methods of, measuring force, work, mechanical power, or torque, specially adapted for specific purposes
    • G01L5/0047Apparatus for, or methods of, measuring force, work, mechanical power, or torque, specially adapted for specific purposes measuring forces due to residual stresses

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

The invention belongs to the technical field of detection of residual stress of samples, and discloses an integrated device for electrolytic polishing and residual stress detection, which comprises an X-ray diffraction system, a detection head, a working platform, a polishing solution recovery device, an anti-corrosion flushing device, a transverse servo motor, a longitudinal servo motor, a clamp device, a sample piece and an online electrolytic polishing system, wherein the working platform for fixing the sample piece is arranged below the detection head of the X-ray diffraction system, and is provided with the transverse servo motor and the longitudinal servo motor, and the working platform is driven to transversely and longitudinally move through the transverse servo motor, the longitudinal servo motor and a ball screw; the working platform is provided with a clamp device for fixing the sample; an online electrolytic polishing system is arranged on one side of the working platform; the online electrolytic polishing system is provided with a polishing solution recovery device and an anti-corrosion flushing device. The method realizes the detection of residual stress by X-ray diffraction, and integrates electrolytic polishing and liquid recovery.

Description

Electrolytic polishing and residual stress detection integrated device
Technical Field
The invention belongs to the technical field of residual stress detection of samples, and particularly relates to an electrolytic polishing and residual stress detection integrated device.
Background
As shown in fig. 1, the principle of X-ray diffraction method: when the X-ray irradiates on the polycrystal, diffraction occurs when the X-ray optical path difference 2dsin theta of the adjacent 2 atomic planes is an integral multiple of the wavelength lambda, and the Bragg equation 2dsin theta = n lambda is satisfied, wherein d is the material crystal face spacing theta and is the diffraction angle, and lambda is the characteristic spectral line wavelength of the X-ray tube target material. The X-ray stress meter obtains the change of the microscopic interplanar spacing d by measuring the diffraction angle 2 theta. And calculating the stress sigma=k.M of the material by using an elastic mechanics theory, wherein k is a stress constant, M= (2 theta)/(sin ψ), and M is required to be determined experimentally.
Electrolytic polishing: the workpiece is used as an anode to be connected with the positive electrode of the direct current power supply. And a conductive material resistant to electrolyte corrosion such as lead, stainless steel and the like is used as a cathode, and is connected to the cathode of a direct current power supply. Immersing the two materials at a certain distance in electrolyte which generally takes sulfuric acid and phosphoric acid as basic components, and under a certain temperature, voltage and current density (generally lower than 1A/cm) 2 ) Then, the workpiece is energized for a certain period of time (typically, several tens of seconds to several minutes), and the minute raised portions on the surface of the workpiece are dissolved first, and gradually become a smooth and bright surface.
With the rapid development of the technology for detecting residual stress, three methods for detecting residual stress generally appear, and for the X-ray diffraction method, only the residual stress of the surface of the sample is detected. Meanwhile, if the same surface is measured at different positions, the point required to be measured is required to be searched through a manual sample, so that the working load is large, and meanwhile, the inaccuracy can cause large errors.
If the residual stress of the depth of the sample is detected, the residual stress is detected after electrolytic polishing, and meanwhile, the position of the electrolytic polishing is required to be found, so that the position is not easy to find, the precision is poor, and the efficiency is low. When the electrolytic polishing pen is used, one part of electrolytic polishing liquid can flow back through the system of the electrolytic polishing pen, and the other part is wasted.
In the related art, patent 1 is as follows: application number CN201510336332, a method, a device and application for measuring residual stress of a thin plate by using a name-assisted ray diffraction method; aiming at the measurement of the residual stress of the plate such as casting, heat treatment, rolling, slitting and the like, when the residual stress of the thin plate is measured, the thin plate is horizontally fixed by the clamp, and meanwhile, a certain horizontal tensile force is applied to the thin plate, so that the influence of the gravity of the warping thin plate on the measurement result of the residual stress is eliminated under the action of the tensile force, and the reliability of the result of measuring the residual stress of the thin plate by a ray method is improved. The defects are that: accurate repeated positioning measurement of the sample cannot be achieved. The electrolytic polishing and the recovery of polishing liquid at the measuring point at any time can not be carried out, and then the measurement is carried out again, and the layered accurate measurement at the same position can not be carried out.
Related patent 2: the application number CN201310676632, name, a laser ultrasonic nondestructive testing method and equipment for residual stress of a composite material, which is characterized in that an emission light source of a laser emitter is focused on the composite material to be tested through a convex lens, then a laser beam reflected by the composite material is formed into a parallel beam through the convex lens, the parallel beam is then emitted onto a triple prism to be divided into two laser beams, the two laser beams are respectively reflected through a reflecting mirror on the premise of ensuring that the optical paths of the two laser beams are equal, and the two reflected laser beams are respectively focused on two input ends of a balance receiver through the convex lens; the output signal of the output end of the balance receiver is processed and converted into the numerical value of the residual stress of the composite material to be detected by the terminal processor. The above patent has the disadvantages that: accurate repeated positioning measurement of the sample cannot be achieved. Layered measurement of the same point and accurate measurement of different points on the same plane cannot be achieved.
The related patent 3 is as follows: application number CN201610134534, mechanical arm detection device and method for residual stress of complex-named member, comprising: an industrial personal computer; the manipulator scanning mechanism comprises a manipulator and a manipulator controller, wherein the manipulator is used for clamping an ultrasonic transducer, and the manipulator is connected and communicated with the manipulator controller and the industrial personal computer; the ultrasonic receiving and transmitting mechanism comprises an ultrasonic transducer, an ultrasonic pulse receiving and transmitting card and a data acquisition card, wherein the ultrasonic pulse receiving and transmitting card and the high-speed acquisition card are arranged on the industrial personal computer, and the industrial personal computer is used for receiving and transmitting and acquiring pulse signals. When a tested sample is placed in a known fixed position in a manipulator moving space, and is detected, the industrial personal computer controls a manipulator holding an ultrasonic transducer to scan a moving track, the ultrasonic transducer transmits ultrasonic waves, receives ultrasonic pulse echo signals reflected by a tested piece, extracts sound velocity information in the ultrasonic echo signals and feeds the sound velocity information back to the industrial personal computer to obtain residual stress characteristic distribution. The above patent has the disadvantages that: repeated positioning measurement of the sample cannot be accurately achieved.
Disclosure of Invention
The invention aims to find the defects of the existing equipment based on observation in a practical operation test, thereby providing an improved device, providing an integrated device for electrolytic polishing and residual stress detection, and realizing the integration of the electrolytic polishing and liquid recovery. When the original deep detection is carried out, the residual stress detection can be carried out after the sample piece is disassembled and moved to the outside for electrolytic polishing and then clamped again, the repeated disassembly and movement of the sample piece are difficult, the position of the detection point is difficult to accurately position, the problems of low detection efficiency, large detection error and the like are caused, and the invention effectively solves the problems, and greatly improves the detection efficiency and precision.
In order to achieve the above purpose, the technical scheme of the invention is as follows:
the integrated device for electrolytic polishing and residual stress detection comprises an X-ray diffraction system 1, a detection head 11, a working platform 2, a polishing solution recovery device 71, an anti-corrosion flushing device 77, a transverse servo motor 3, a longitudinal servo motor 4, a clamp device 5, a sample 6 and an online electrolytic polishing system 7, and is characterized in that the working platform 2 is arranged below the detection head of the X-ray diffraction system 1, and the clamp device 5 for fixing the sample is arranged on the working platform; the working platform is provided with a transverse servo motor 3 and a longitudinal servo motor 4, and is driven to transversely and longitudinally move by the transverse servo motor, the longitudinal servo motor and a ball screw; an online electrolytic polishing system 7 is arranged on one side of the working platform; the online electrolytic polishing system is provided with a polishing solution recovery device and an anti-corrosion flushing device.
Preferably, the online electrolytic polishing system 7 comprises a polishing solution recycling device 71, a servo motor III 72, a clamping robot 73, a clamping device 74, a force sensor 75, an electrolytic polishing pen 76 and an anti-corrosion flushing device 77, wherein the clamping robot 73 is arranged on the polishing solution recycling device 71, the servo motor 72 is used for controlling the movement of an arm of the clamping robot, and the clamping robot 73 clamps the electrolytic polishing pen 76 to move up and down and back and forth to corresponding points through the clamping device 74 of the arm; a force sensor 75 is arranged at the wrist of the clamping robot 73, and the force is determined; meanwhile, the lower part of the arm of the clamping robot is provided with an anti-corrosion flushing device 77; the liquid sensor senses the electrolytic polishing liquid which triggers the anti-corrosion flushing device to slowly discharge water to flush overflowed, and then flows into the polishing liquid recovery device body through a water outlet on the workbench.
Preferably, a workbench is placed in the middle of the workbench, a drainage port 24 is arranged on one side of the workbench, four grooves 21 are arranged on the surface of the workbench, drainage holes 22 are uniformly distributed on the grooves, and a liquid detector 23 is respectively arranged in each of the four grooves and each drainage hole and is used for detecting liquid in which a part of polishing liquid flows back and another part flows out when a polishing pen polishes a sample, and then the polishing liquid after flowing out is flushed into a polishing liquid recovery device through a flushing device.
Preferably, the liquid detector has a liquid sensor.
Compared with the prior art, the invention has the beneficial effects that:
the invention realizes the detection of residual stress by X-ray diffraction, and integrates electrolytic polishing and liquid recovery. The original depth detection needs repeated disassembly and assembly, moves the sample piece to the outside for electrolytic polishing, and then the residual stress detection can be carried out next time after the sample piece is clamped again, so that the repeated disassembly and movement of the sample piece are caused, the detection point is difficult to accurately position, the problems of low detection efficiency, large detection error and the like are caused, and the detection efficiency and the detection precision are greatly improved.
The repeated accurate positioning of the sample piece is achieved through the combination of the electrolytic polishing device, the residual stress detection device and the improved working platform, firstly, the residual stress can be detected at points of different positions on the same surface of the sample piece, and secondly, the layering detection can be carried out on the same position. When the residual stress of the sample piece such as laser cladding is detected, different points of the same surface can be measured. Meanwhile, an electrolytic polishing pen is arranged beside the sample, and the sample is subjected to layering detection at the same position through accurate positioning and electrolytic polishing. And meanwhile, the polishing solution is recovered to prevent the working platform from being corroded.
Drawings
The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments consistent with the invention and together with the description, serve to explain the principles of the invention.
Fig. 1 is a schematic view of the diffraction principle of the existing X-ray in the crystal.
FIG. 2 is a schematic view of the device for detecting residual stress by combining electrolytic polishing and residual stress detection.
FIG. 3 is a schematic illustration of the polishing of the integrated electropolishing and residual stress detection apparatus of the present invention.
FIG. 4 is a schematic view of the structure of a working box of the integrated electrolytic polishing and residual stress detection device of the invention.
FIG. 5 is a schematic side view of a portion of an integrated electropolishing and residual stress detection apparatus of the present invention.
FIG. 6 is an overall schematic view of an integrated electropolishing and residual stress detection apparatus in accordance with the present invention.
Detailed Description
The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings.
As shown in fig. 2-6, an integrated device for electrolytic polishing and residual stress detection comprises an X-ray diffraction system 1, a detection head 11, a working platform 2, a polishing solution recovery device 71, an anti-corrosion flushing device 77, a transverse servo motor 3, a longitudinal servo motor 4, a clamp device 5, a sample 6 and an online electrolytic polishing system 7, wherein the working platform 2 is arranged below the detection head of the X-ray diffraction system 1, and the clamp device 5 for fixing the sample is arranged on the working platform and is used for fixing the sample on the working platform; the working platform is provided with a transverse servo motor 3 and a longitudinal servo motor 4, and is driven to transversely and longitudinally move by the transverse servo motor, the longitudinal servo motor and a ball screw; an online electrolytic polishing system 7 is arranged on one side of the working platform; the online electrolytic polishing system is provided with a polishing solution recovery device and an anti-corrosion flushing device.
Preferably, the online electrolytic polishing system 7 comprises a polishing solution recycling device 71, a servo motor III 72, a clamping robot 73, a clamping device 74, a force sensor 75, an electrolytic polishing pen 76 and an anti-corrosion flushing device 77, wherein the clamping robot 73 is arranged on the polishing solution recycling device 71, the servo motor III 72 is used for controlling the movement of an arm of the clamping robot, the clamping robot 73 clamps the electrolytic polishing pen 76 through the clamping device 74 of the arm and moves up and down and back and forth to a corresponding point, and the clamping device is a robot arm for clamping the electrolytic polishing pen; a force sensor 75 is arranged at the wrist of the clamping robot 73, and the force is determined; meanwhile, an anti-corrosion flushing device 77 is arranged at the lower part of the arm of the clamping robot, when the electrolytic polishing pen performs electrolytic polishing, part of electrolytic polishing liquid flows back to the original equipment through the electrolytic polishing pen, and the other part of electrolytic polishing liquid cannot overflow; the liquid sensor senses the electrolytic polishing liquid which triggers the anti-corrosion flushing device to slowly discharge water to flush overflowed, and then flows into the polishing liquid recovery device body through a water outlet on the workbench.
The working principle is as follows. As shown in fig. 2, at the beginning of the experiment, the working platform 2 is electrically driven by a transverse servo motor and a longitudinal servo motor, the accurate points of the sample 6 required to be measured are found by the user, and then the residual stress of the sample is detected by using the X-ray diffractometer system 1 according to the basic steps. If the point is measured, the feeding step by step can be realized through a servo motor, for example, for a laser cladding test piece, the measurement can be carried out along the forming direction of the test piece, the residual stress at different places in the forming process can be obtained, the repeated positioning can be realized, and the accurate detection can be carried out at different points on the same surface.
As shown in fig. 3, the working platform comprises a sample 6, a liquid detector 23, a servo motor and a drainage port, the working platform is driven by the transverse servo motor 3 and the longitudinal servo motor 4 to realize accurate moving distance, then the clamping robot 73 moves up and down and back to corresponding points by clamping the electrolytic polishing pen 76, a force sensor 7 is arranged at the wrist of the clamping robot 5, and whether the pressure of the electrolytic polishing pen on the surface of the workpiece meets the requirement is controlled by determining the force; the sample is eroded by controlling the time and the flow rate of the polishing liquid, and meanwhile, the lower part of the mechanical arm is provided with an anti-corrosion flushing device, when the electrolytic polishing pen performs electrolytic polishing, part of the electrolytic polishing liquid flows back to the original equipment through the electrolytic polishing pen, and the other part of the electrolytic polishing liquid cannot overflow. The liquid sensor senses at this time, triggers the flushing device and then slowly goes out water to wash the polishing solution that overflows, prevents the platform from being corroded. And then flows into the box body through a water outlet on the workbench.
As shown in fig. 4, a workbench is placed in the middle of the workbench, a drainage port 24 is provided on one side of the workbench, four grooves 21 are arranged on the surface of the workbench, drainage holes 22 are uniformly distributed on the grooves, and a liquid detector 23 is respectively installed in each of the four grooves and each drainage hole and is used for detecting liquid in which a part of polishing liquid flows back and another part flows out when a polishing pen polishes a sample, and then the polishing liquid after flowing out is flushed into a polishing liquid recovery device by a flushing device. The liquid detector has a liquid sensor.
As shown in FIG. 5, after the electrolytic polishing, the servo motor drives the electrolytic polishing pen to return to the original position, and drives the whole working platform to return to the original position. Then the X-ray diffractometer detects the residual stress of the depth of the original point. The experimental time is reduced, unnecessary trouble is reduced, and meanwhile, errors can be avoided as much as possible, so that the test has better accuracy.
During real-time detection, the working platform carries out transverse and longitudinal feeding according to the servo motor and the ball screw, and the point to be measured can be accurately found. When the detection of one point is finished, if the residual stress in the forming direction of the sample like laser cladding is required to be measured, the measurement can be performed again through the accurate one-point measurement of the motor driving working platform without manually searching for the moving sample. When the residual stress at a certain point is needed to be measured, the platform can be moved to one side left, then the left mechanical arm grabs the electrolytic polishing pen to move downwards and then applies a force to press the electrolytic polishing pen to the working surface to carry out electrolytic polishing, and the redundant polishing liquid can be recovered. After the electrolytic polishing is finished, the polishing device moves to the original position, and layering detection of the same position can be performed.
According to the invention, the electrolytic polishing pen can be clamped by the clamping device, the force, time and flow speed are controlled, the sample is subjected to electrolytic polishing, and online erosion and backflow are realized, and the working platform is protected; the detection device is high in precision and efficiency through the driving of the servo motor and the condition of integration.
The embodiments described above are only some, but not all, embodiments of the invention. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.

Claims (2)

1. The integrated device for electrolytic polishing and residual stress detection comprises an X-ray diffraction system (1), a detection head (11), a working platform (2), a transverse servo motor (3), a longitudinal servo motor (4), a clamp device (5), a sample piece (6) and an online electrolytic polishing system (7), and is characterized in that the working platform (2) is arranged below the detection head of the X-ray diffraction system (1), and the clamp device (5) for fixing the sample piece is arranged on the working platform (2); the working platform is provided with a transverse servo motor (3) and a longitudinal servo motor (4), and is driven to transversely and longitudinally move through the transverse servo motor, the longitudinal servo motor and a ball screw; an online electrolytic polishing system (7) is arranged on one side of the working platform (2);
the online electrolytic polishing system (7) comprises a polishing solution recycling device (71), a servo motor III (72), a clamping robot (73), a clamping device (74), a force sensor (75), an electrolytic polishing pen (76) and an anti-corrosion flushing device (77), wherein the clamping robot (73) is arranged on the polishing solution recycling device (71), the servo motor III (72) is used for controlling the movement of an arm of the clamping robot, and the clamping robot (73) clamps the electrolytic polishing pen (76) through the clamping device (74) of the arm to move up and down and back and forth to corresponding points; a force sensor (75) is arranged at the wrist of the clamping robot (73), and the force is determined through the force sensor; meanwhile, the lower part of the arm of the clamping robot is provided with an anti-corrosion flushing device (77); the liquid sensor senses that the electrolytic polishing liquid triggering the anti-corrosion flushing device to slowly discharge water to flush overflowed water, and then flows into the polishing liquid recovery device body through a water outlet on the workbench;
a workbench is placed in the middle of the workbench, a drainage port (24) is formed in one side of the workbench, four grooves (21) are formed in the surface of the workbench, drain holes (22) are uniformly distributed in the grooves, and a liquid detector (23) is respectively arranged in each of the four grooves and each drain hole and is used for detecting liquid after one part of polishing liquid flows back and the other part flows out when a polishing pen polishes a sample, and then the polishing liquid after flowing out is flushed into a polishing liquid recovery device (71) through a flushing device.
2. The integrated electropolishing and residual stress detection apparatus of claim 1, wherein said liquid detector has a liquid sensor.
CN201910283793.5A 2019-04-10 2019-04-10 Electrolytic polishing and residual stress detection integrated device Active CN109957831B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201910283793.5A CN109957831B (en) 2019-04-10 2019-04-10 Electrolytic polishing and residual stress detection integrated device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201910283793.5A CN109957831B (en) 2019-04-10 2019-04-10 Electrolytic polishing and residual stress detection integrated device

Publications (2)

Publication Number Publication Date
CN109957831A CN109957831A (en) 2019-07-02
CN109957831B true CN109957831B (en) 2024-04-02

Family

ID=67025978

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201910283793.5A Active CN109957831B (en) 2019-04-10 2019-04-10 Electrolytic polishing and residual stress detection integrated device

Country Status (1)

Country Link
CN (1) CN109957831B (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110814421B (en) * 2019-11-29 2020-10-27 常熟市宏盛冷轧带钢有限公司 Cold rolling foil internal stress detection equipment
CN111207869A (en) * 2020-02-07 2020-05-29 航天科工防御技术研究试验中心 Additive product residual stress testing method
CN111366282A (en) * 2020-03-26 2020-07-03 福建工程学院 Stress detection and analysis experiment table
CN113275679A (en) * 2021-05-12 2021-08-20 安徽工程大学 Electrolytic grinding machining system and method for industrial robot
CN113203509A (en) * 2021-05-21 2021-08-03 南京钢铁股份有限公司 Method for testing residual stress of steel thin welding plate with narrow welding line characteristic

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10176963A (en) * 1996-12-18 1998-06-30 Hitachi Constr Mach Co Ltd X-ray stress-measuring apparatus and local electrolytic processing apparatus
DE102005024474A1 (en) * 2005-05-24 2006-11-30 Volkswagen Ag Electrolytically etching a cavity in the surface of a workpiece, especially for measuring inherent internal stresses, comprises repeatedly etching and measuring the cavity from beneath
JP2014013183A (en) * 2012-07-04 2014-01-23 Kowa Dennetsu Keiki:Kk X-ray stress measurement device and x-ray stress measurement method
CN105415153A (en) * 2015-12-09 2016-03-23 浙江工业大学 Hydraulic pressure suspension polishing device with controllable fluid boundary
CN105699158A (en) * 2016-02-03 2016-06-22 清华大学 Electrolytic etching device and test system for cutting residual stress distribution test
CN107227486A (en) * 2017-07-11 2017-10-03 北京科技大学 A kind of metal partial electrolysis burnishing device
CN206906117U (en) * 2017-05-19 2018-01-19 北京工业大学 Electrobrightening --- X ray stress analysis test platform
JP2018040018A (en) * 2016-09-05 2018-03-15 株式会社X線残留応力測定センター Metallic surface electrolytic polishing device and metal electrolytic polishing method
CN209779037U (en) * 2019-04-10 2019-12-13 福建工程学院 Electrolytic polishing and residual stress detection integrated device

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050173259A1 (en) * 2004-02-06 2005-08-11 Applied Materials, Inc. Endpoint system for electro-chemical mechanical polishing
US10416102B2 (en) * 2017-06-23 2019-09-17 Bruker Axs, Inc. X-ray diffraction device and method to measure stress with 2D detector and single sample tilt

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10176963A (en) * 1996-12-18 1998-06-30 Hitachi Constr Mach Co Ltd X-ray stress-measuring apparatus and local electrolytic processing apparatus
DE102005024474A1 (en) * 2005-05-24 2006-11-30 Volkswagen Ag Electrolytically etching a cavity in the surface of a workpiece, especially for measuring inherent internal stresses, comprises repeatedly etching and measuring the cavity from beneath
JP2014013183A (en) * 2012-07-04 2014-01-23 Kowa Dennetsu Keiki:Kk X-ray stress measurement device and x-ray stress measurement method
CN105415153A (en) * 2015-12-09 2016-03-23 浙江工业大学 Hydraulic pressure suspension polishing device with controllable fluid boundary
CN105699158A (en) * 2016-02-03 2016-06-22 清华大学 Electrolytic etching device and test system for cutting residual stress distribution test
JP2018040018A (en) * 2016-09-05 2018-03-15 株式会社X線残留応力測定センター Metallic surface electrolytic polishing device and metal electrolytic polishing method
CN206906117U (en) * 2017-05-19 2018-01-19 北京工业大学 Electrobrightening --- X ray stress analysis test platform
CN107227486A (en) * 2017-07-11 2017-10-03 北京科技大学 A kind of metal partial electrolysis burnishing device
CN209779037U (en) * 2019-04-10 2019-12-13 福建工程学院 Electrolytic polishing and residual stress detection integrated device

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
电沉积宽晶粒尺寸分布纳米镍的本征拉伸行为;郑耀东;戴品强;许伟长;胡树韧;;稀有金属材料与工程;第39卷(第10期);全文 *

Also Published As

Publication number Publication date
CN109957831A (en) 2019-07-02

Similar Documents

Publication Publication Date Title
CN109957831B (en) Electrolytic polishing and residual stress detection integrated device
CN101244523B (en) Laser process testing method and special instrument
US5519330A (en) Method and apparatus for measuring degree of corrosion of metal materials
US11092501B2 (en) Ultrasonic testing device and method for connection force of interference fit
CN105157630A (en) Contact type measurement method having on-machine ultrasonic and automatic thickness-measurement function
CN107037130B (en) Monocular vision three-D ultrasonic nondestructive detection system and detection method
US9671222B2 (en) Method and device for determining thickness of rolling stock
US8327460B2 (en) Probe microscope and measurement method using the same
CN1077027A (en) The measuring method of material surface film and basal body binding force and device
CN209779037U (en) Electrolytic polishing and residual stress detection integrated device
CN104647141A (en) In-place measurement method for thickness of large-sized wall plate
CN114137083A (en) Automatic ultrasonic detection method and device for fusion reactor divertor DOME plate
CN109612940B (en) Nondestructive testing system and nondestructive testing method for rapidly controlling generation of ultrasound by laser array
CN205353010U (en) Simple and easy supersound water logging scanning apparatus
CN113899818A (en) Ultrasonic detection method for R-region defects of T-shaped component for fuselage structure
CN109855577B (en) Coupling gap self-adaptive adjusting method in ultrasonic non-contact scanning thickness measurement
CN116242513A (en) In-service nondestructive testing method and system for steel box girder welding line and electronic equipment
CN107283080B (en) Measuring and calibrating device for laser processing focal length and incidence angle
JPS61164152A (en) Inspecting installation
JP2743717B2 (en) Sensitivity detection method for structural materials and water quality control system for nuclear power plant
CN111060044A (en) Method for measuring thickness of welding type target by adopting water immersion type C-scan equipment
Krauss et al. Strategies in electro-chemical machining of tungsten for divertor application
CN114460012B (en) Ultrasonic wave intensity enhancement method suitable for underwater environment laser ultrasonic material detection and application
CN117537968A (en) Laser ultrasonic detection system and method for measuring residual stress
Singh et al. Automated Inspection of corroded steel structures

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant