CN109957779A - Electrode continous way magnetron sputtering coating single side production line before thin-film solar cells - Google Patents
Electrode continous way magnetron sputtering coating single side production line before thin-film solar cells Download PDFInfo
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- CN109957779A CN109957779A CN201711337310.2A CN201711337310A CN109957779A CN 109957779 A CN109957779 A CN 109957779A CN 201711337310 A CN201711337310 A CN 201711337310A CN 109957779 A CN109957779 A CN 109957779A
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- magnetron sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0623—Sulfides, selenides or tellurides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
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- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
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- Organic Chemistry (AREA)
- Photovoltaic Devices (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses electrode continous way magnetron sputtering coating single side production lines before thin-film solar cells, including unreeling room, upstream chamber, import surge chamber, deposited chamber, outlet surge chamber, downstream chamber and winding room, main drive roll, which is set to, unreels room and winding interior, and multiple live-rollers are set in each chamber of sub-line；Several vapor deposition areas are equipped in the deposited chamber, each vapor deposition area is equipped with an evaporator and two heaters, the heater is erected on vapor deposition two opposite of area respectively, substrate to be deposited is transmitted between two heaters with live-roller, the evaporator includes the shell of top surface setting nozzle, the housing central section is equipped with buffer part, and the buffer part is connected with the heating pipe being connected with vapor deposition raw material room far from nozzle on one side, and the heating pipe extends to nozzle direction.Coating film production line provided by the invention can be realized the high-volume of all kinds of large-area coating films, low cost production, and sputter deposition rate is high, and technique is versatile.
Description
Technical field
The present invention relates to electrode continous way magnetron sputtering coating single side production lines before thin-film solar cells, belong to Vacuum Deposition
Technical field of membrane.
Background technique
Sun hull cell has the advantages that quality is small, thickness is very thin, flexible.Thin-film solar cells is made because it is simple
Standby technique, cheap manufacturing cost and higher efficiency, are just more and more paid close attention to by people.In the past few years, people
To the electrode material of thin-film solar cells, mechanism and device optimization in terms of done many work outstanding, achieve huge
Progress.It is to influence battery performance and cost in fact, being also component very crucial in novel solar battery to electrode
Key factor, but research in this respect is not enough.The material of current industrialization production solar film battery mainly has: tellurium
Cadmium, copper indium gallium selenide, non-crystalline silicon, GaAs etc..
Vacuum coating technology is begun to show in the 1930s, four the fifties start industrial application occur, and industrialization is big to advise
Mould production starts from widely answering in the 1980s, obtaining in the industry such as electronics, aerospace, packaging, decoration, gold stamping printing
With.Vacuum coating technology is the new technology of a kind of novel materials synthesis and processing, is the important set of field of surface engineering technique
At part.Vacuum coating technology is the plated film that the surface of solids is coated to one layer of property using physics, chemical means, to make
There is the surface of solids wear-resistant, high temperature resistant, corrosion-resistant, anti-oxidant, radiation protection, conduction, magnetic conduction, insulation and ornament lamp many to be better than
The superior function of solid material itself reaches and improves product quality, extends life of product, the significant technology warp of energy saving and acquisition
The effect for benefit of helping.Need plated film is referred to as substrate, and the material of plating is referred to as target.
Magnetron sputtering is to make target atom or molecule be sputtered out using lotus energy particle bombardment solid target and deposit to
A kind of technique of substrate surface.Metallic target and ceramic target can be selected in target.Magnetron sputtering the preparation method has deposition rate height, substrate
The advantages of temperature is low, film forming adhesion is good, easy to control, at low cost, suitable large area is film-made.Exactly needs are made for vacuum evaporation
The substance of film, which is put in vacuum, to be evaporated or distils, and is allowed to be precipitated over the substrate surface.The device of vacuum evaporation is simpler
Single, technological parameter is less, the growth of easily-controllable made membrane, and impurity content is low in film.But the height of vacuum degree directly affects film
Structure and performance, vacuum degree is low, and material is seriously polluted by residual gas molecule, film performance be deteriorated, improve underlayer temperature have
Conducive to the desorption of gas molecule.
With in field of vacuum coating coating technique make rapid progress, the requirement to coated product is also higher and higher, therefore
More and more improving also occurs in coating film production line, and the requirement of production line increases accordingly, the coating film production line of the prior art it is whole
Body stability and plating film uniformity, production efficiency is low and corresponding equipment cost is high.
Summary of the invention
In view of the above-mentioned problems existing in the prior art, the object of the present invention is to provide can vertical plated film thin film solar electricity
Electrode continous way magnetron sputtering coating single side production line before pond.
For achieving the above object, The technical solution adopted by the invention is as follows:
The purpose of the present invention is to provide electrode continous way magnetron sputtering coating single side production line before thin-film solar cells,
It is set to and puts including unreeling room, upstream chamber, import surge chamber, deposited chamber, outlet surge chamber, downstream chamber and winding room, main drive roll
It rolls up room and winding is indoor, multiple live-rollers are set in each chamber of sub-line；Wherein,
Several vapor deposition areas are equipped in the deposited chamber, each vapor deposition area is equipped with an evaporator and two heaters, described to add
Hot device is erected on vapor deposition two opposite of area respectively, and substrate to be deposited is transmitted between two heaters with live-roller, the evaporator packet
The shell of top surface setting nozzle is included, the housing central section is equipped with buffer part, and the buffer part is connected on one side far from nozzle
The heating pipe being connected with vapor deposition raw material room, the heating pipe extend to nozzle direction.
Electrode continous way magnetron sputtering coating single side production line before thin-film solar cells provided by the invention, including unreel
Room, upstream chamber, import surge chamber, deposited chamber, outlet surge chamber, downstream chamber and winding room, main drive roll are set to and unreel room and receipts
Volume is indoor, and multiple live-rollers are set in each chamber of sub-line；Wherein,
Several vapor deposition areas are equipped in the deposited chamber, each vapor deposition area is equipped with an evaporator and two heaters, described to add
Hot device is erected on vapor deposition two opposite of area respectively, and substrate to be deposited is transmitted between two heaters with live-roller, the evaporator packet
The shell of top surface setting nozzle is included, the housing central section is equipped with buffer part, and the buffer part is connected on one side far from nozzle
The heating pipe being connected with vapor deposition raw material room, the heating pipe extend to nozzle direction, and the heater is distinguished parallel
Plated film area two sides are erected on, and wherein a heater passes through evaporator buffer part, film substrate to be plated is suspended at another heater face
To evaporator side.
The buffer part is a hollow cavity.
The heating pipe extends into buffer part, and development length is different.
The heating pipe along its with buffer part far from being arranged in dot matrix in nozzle face.
Center of the heating pipe to the length that buffer part extends from buffer part far from nozzle face becomes larger to its outside.
Center of the heating pipe to the length that buffer part extends from buffer part far from nozzle face arranges shape to its outside
At a hemispherical.
The heating pipe pipe diameter size is different.
The heating pipe is alternatively arranged with its pipe diameter size.
Evaporator shell top surface nozzle is right against film substrate to be plated.
Compared with prior art, electrode continous way magnetron sputtering coating single side before thin-film solar cells provided by the invention
The advantage of production line is: CIGS thin-film is prepared using three-stage co-evaporation process, using vertical total based on linear type evaporator
Vapo(u)rization system prepares size not less than 40 × 60cm to realize2CIGS thin-film, realize large area film on two-dimentional scale
Homoepitaxial.Cooperation copper indium gallium selenide cell integrated artistic develops the Mo electrode for being suitble to copper indium gallium selenide feature, AZO on this basis
Transparent conductive electrode magnetron sputtering preparation system forms complete copper indium gallium selenide engineering equipment.Copper and indium is prepared using vertical structure
Gallium selenium film has many advantages, such as energy conservation and avoids substrate deformation and improve yield, vertical based on linear evaporator vacuum
The space layout for the realization various combination that plated film uniset can be convenient.
In short, electrode continous way magnetron sputtering coating single side production line can before thin-film solar cells provided by the invention
Realize high-volume, the low cost production of all kinds of large-area coating films, and sputter deposition rate is high, technique is versatile.Element diffusion
Path is short, no intermediate product, element-free evaporation, thus preparation speed is fast, high-efficient, and yields is up to 95% or more, especially suitable
Close large-scale industrial production.
Detailed description of the invention
Fig. 1 is evaporation structure schematic diagram provided by the invention；
Fig. 2 is electrode continous way magnetron sputtering coating single side production line vapor deposition before thin-film solar cells provided by the invention
One preferred embodiment schematic diagram of room；
Fig. 3 is electrode continous way magnetron sputtering coating single side production line vapor deposition before thin-film solar cells provided by the invention
Another preferred embodiment schematic diagram in room.
Specific embodiment
The present invention is made further to illustrate in detail, completely below with reference to embodiment and comparative example.
As depicted in figs. 1 and 2, in the present embodiment, electrode continous way magnetron sputtering before thin-film solar cells of the invention
Coating single side production line includes unreeling room, upstream chamber, import surge chamber, deposited chamber, outlet surge chamber, downstream chamber and winding room,
Main drive roll, which is set to, unreels room and winding interior, and multiple live-rollers are set in each chamber of sub-line；Wherein,
Several vapor deposition areas are equipped in deposited chamber, each vapor deposition area is equipped with an evaporator and two heaters, heater difference
It is erected on vapor deposition two opposite of area, substrate to be deposited is transmitted between two heaters with live-roller, and evaporator is arranged including a top surface
The shell of nozzle, housing central section are connected on one side and are deposited what raw material room was connected far from nozzle equipped with buffer part, buffer part
Heating pipe, heating pipe extend to nozzle direction.
As shown in figures 1 and 3, in the present embodiment, electrode continous way magnetron sputtering before thin-film solar cells of the invention
Coating single side production line includes unreeling room, upstream chamber, import surge chamber, deposited chamber, outlet surge chamber, downstream chamber and winding room,
Main drive roll, which is set to, unreels room and winding interior, and multiple live-rollers are set in each chamber of sub-line；Wherein,
Several vapor deposition areas are equipped in the deposited chamber, each vapor deposition area is equipped with an evaporator and two heaters, described to add
Hot device is erected on vapor deposition two opposite of area respectively, and substrate to be deposited is transmitted between two heaters with live-roller, the evaporator packet
The shell of top surface setting nozzle is included, the housing central section is equipped with buffer part, and the buffer part is connected on one side far from nozzle
The heating pipe being connected with vapor deposition raw material room, the heating pipe extend to nozzle direction, and the heater is distinguished parallel
Plated film area two sides are erected on, and wherein a heater passes through evaporator buffer part, film substrate to be plated is suspended at another heater face
To evaporator side.
In the present embodiment, buffer part is a hollow cavity.
In the present embodiment, heating pipe extends into buffer part, and development length is different.
In the present embodiment, heating pipe along its with buffer part far from being arranged in dot matrix in nozzle face.
In the present embodiment, center of the heating pipe to the length that buffer part extends from buffer part far from nozzle face to its outside
Become larger.
In the present embodiment, center of the heating pipe to the length that buffer part extends from buffer part far from nozzle face to its outside
Arrangement forms a hemispherical.
In the present embodiment, heating pipe pipe diameter size is different.
In the present embodiment, heating pipe is alternatively arranged with its pipe diameter size.
In the present embodiment, evaporator shell top surface nozzle is right against film substrate to be plated.
Be it is necessary to described herein finally: above embodiments are served only for making technical solution of the present invention further detailed
Ground explanation, should not be understood as limiting the scope of the invention, those skilled in the art's above content according to the present invention
The some nonessential modifications and adaptations made all belong to the scope of protection of the present invention.
Claims (10)
1. electrode continous way magnetron sputtering coating single side production line before thin-film solar cells, it is characterised in that: including unreel room,
Upstream chamber, import surge chamber, deposited chamber, outlet surge chamber, downstream chamber and winding room, main drive roll, which is set to, unreels room and winding room
Interior, multiple live-rollers are set in each chamber of sub-line；Wherein,
Several vapor deposition areas are equipped in the deposited chamber, each vapor deposition area is equipped with an evaporator and two heaters, the heater
It is erected on vapor deposition two opposite of area respectively, substrate to be deposited is transmitted between two heaters with live-roller, and the evaporator includes one
The shell of nozzle is arranged in top surface, and the housing central section is equipped with buffer part, and the buffer part is connected on one side and steams far from nozzle
The connected heating pipe in raw material room is plated, the heating pipe extends to nozzle direction.
2. electrode continous way magnetron sputtering coating single side production line before thin-film solar cells, it is characterised in that: including unreel room,
Upstream chamber, import surge chamber, deposited chamber, outlet surge chamber, downstream chamber and winding room, main drive roll, which is set to, unreels room and winding room
Interior, multiple live-rollers are set in each chamber of sub-line；Wherein,
Several vapor deposition areas are equipped in the deposited chamber, each vapor deposition area is equipped with an evaporator and two heaters, the heater
It is erected on vapor deposition two opposite of area respectively, substrate to be deposited is transmitted between two heaters with live-roller, and the evaporator includes one
The shell of nozzle is arranged in top surface, and the housing central section is equipped with buffer part, and the buffer part is connected on one side and steams far from nozzle
The connected heating pipe in raw material room is plated, the heating pipe extends to nozzle direction, and the heater is parallel respectively to be erected
In plated film area two sides, and wherein, a heater passes through evaporator buffer part, and film substrate to be plated is suspended at another heater towards steaming
Send out device side.
3. electrode continous way magnetron sputtering coating single side production line before thin-film solar cells according to claim 1 or 2,
It is characterized by: the buffer part is a hollow cavity.
4. electrode continous way magnetron sputtering coating single side production line before thin-film solar cells according to claim 3,
Be characterized in that: the heating pipe extends into buffer part, and development length is different.
5. electrode continous way magnetron sputtering coating single side production line before thin-film solar cells according to claim 4,
Be characterized in that: the heating pipe along its with buffer part far from being arranged in dot matrix in nozzle face.
6. electrode continous way magnetron sputtering coating single side production line before thin-film solar cells according to claim 4,
Be characterized in that: center of the heating pipe to the length that buffer part extends from buffer part far from nozzle face becomes larger to its outside.
7. electrode continous way magnetron sputtering coating single side production line before thin-film solar cells according to claim 6,
Be characterized in that: center of the heating pipe to the length that buffer part extends from buffer part far from nozzle face arranges shape to its outside
At a hemispherical.
8. electrode continous way magnetron sputtering coating single side production line before thin-film solar cells according to claim 3,
Be characterized in that: the heating pipe pipe diameter size is different.
9. electrode continous way magnetron sputtering coating single side production line before thin-film solar cells according to claim 8,
Be characterized in that: the heating pipe is alternatively arranged with its pipe diameter size.
10. electrode continous way magnetron sputtering coating single side produces before thin-film solar cells according to claim 1 or 2
Line, it is characterised in that: evaporator shell top surface nozzle is right against film substrate to be plated.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711337310.2A CN109957779A (en) | 2017-12-14 | 2017-12-14 | Electrode continous way magnetron sputtering coating single side production line before thin-film solar cells |
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| CN201711337310.2A CN109957779A (en) | 2017-12-14 | 2017-12-14 | Electrode continous way magnetron sputtering coating single side production line before thin-film solar cells |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114737157A (en) * | 2022-04-27 | 2022-07-12 | 重庆金美新材料科技有限公司 | Production and processing equipment for metal film |
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| US20120100644A1 (en) * | 2010-10-22 | 2012-04-26 | Valeriy Prushinskiy | Organic layer deposition apparatus, and method of manufacturing organic light-emitting display apparatus using the same |
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| CN105779944A (en) * | 2014-12-23 | 2016-07-20 | 中国电子科技集团公司第十八研究所 | Linear evaporating source used for preparing CIGS solar battery |
| CN205839111U (en) * | 2016-08-05 | 2016-12-28 | 陈睦 | A kind of vacuum coater |
| CN106319473A (en) * | 2016-08-31 | 2017-01-11 | 湘潭宏大真空技术股份有限公司 | CIGS solar cell film production line |
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2017
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Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101165205A (en) * | 2006-10-18 | 2008-04-23 | 甘国工 | Method and device for coating anti reflection passive film on crystal silicon solar cell sheet |
| US20120100644A1 (en) * | 2010-10-22 | 2012-04-26 | Valeriy Prushinskiy | Organic layer deposition apparatus, and method of manufacturing organic light-emitting display apparatus using the same |
| CN102618839A (en) * | 2012-03-22 | 2012-08-01 | 威海金博新能源科技有限公司 | Roll-to-roll continuous vacuum coating production machine |
| CN105779944A (en) * | 2014-12-23 | 2016-07-20 | 中国电子科技集团公司第十八研究所 | Linear evaporating source used for preparing CIGS solar battery |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114737157A (en) * | 2022-04-27 | 2022-07-12 | 重庆金美新材料科技有限公司 | Production and processing equipment for metal film |
| CN114737157B (en) * | 2022-04-27 | 2023-10-20 | 重庆金美新材料科技有限公司 | Production and processing equipment for metal film |
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Application publication date: 20190702 |