CN109913830B - 一种多功能真空镀膜机 - Google Patents
一种多功能真空镀膜机 Download PDFInfo
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- CN109913830B CN109913830B CN201910308642.0A CN201910308642A CN109913830B CN 109913830 B CN109913830 B CN 109913830B CN 201910308642 A CN201910308642 A CN 201910308642A CN 109913830 B CN109913830 B CN 109913830B
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- sputtering
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- 238000001771 vacuum deposition Methods 0.000 title claims abstract description 15
- 238000004544 sputter deposition Methods 0.000 claims abstract description 150
- 230000007246 mechanism Effects 0.000 claims abstract description 26
- 239000012495 reaction gas Substances 0.000 claims abstract description 6
- 150000002500 ions Chemical class 0.000 claims abstract description 5
- 238000005507 spraying Methods 0.000 claims abstract 6
- 239000007789 gas Substances 0.000 claims description 44
- 238000002347 injection Methods 0.000 claims description 16
- 239000007924 injection Substances 0.000 claims description 16
- 230000005540 biological transmission Effects 0.000 claims description 9
- 238000007789 sealing Methods 0.000 claims description 5
- 238000005477 sputtering target Methods 0.000 claims description 3
- 239000013077 target material Substances 0.000 claims 1
- 239000011248 coating agent Substances 0.000 abstract description 10
- 238000000576 coating method Methods 0.000 abstract description 10
- 239000002184 metal Substances 0.000 abstract description 9
- 238000009713 electroplating Methods 0.000 abstract description 6
- 230000002950 deficient Effects 0.000 abstract description 5
- 238000000034 method Methods 0.000 description 5
- 239000010408 film Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
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Priority Applications (1)
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CN201910308642.0A CN109913830B (zh) | 2019-04-17 | 2019-04-17 | 一种多功能真空镀膜机 |
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CN201910308642.0A CN109913830B (zh) | 2019-04-17 | 2019-04-17 | 一种多功能真空镀膜机 |
Publications (2)
Publication Number | Publication Date |
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CN109913830A CN109913830A (zh) | 2019-06-21 |
CN109913830B true CN109913830B (zh) | 2021-08-06 |
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CN201910308642.0A Active CN109913830B (zh) | 2019-04-17 | 2019-04-17 | 一种多功能真空镀膜机 |
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CN (1) | CN109913830B (zh) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101790598A (zh) * | 2007-08-31 | 2010-07-28 | 株式会社爱发科 | 溅镀装置 |
CN104342621A (zh) * | 2013-07-25 | 2015-02-11 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 磁场调节装置及等离子体加工设备 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE1021296B1 (nl) * | 2014-04-18 | 2015-10-23 | Soleras Advanced Coatings Bvba | Sputter systeem voor uniform sputteren |
CN105779949B (zh) * | 2014-12-19 | 2019-01-18 | 北京北方华创微电子装备有限公司 | 边磁铁框架及磁控溅射设备 |
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2019
- 2019-04-17 CN CN201910308642.0A patent/CN109913830B/zh active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101790598A (zh) * | 2007-08-31 | 2010-07-28 | 株式会社爱发科 | 溅镀装置 |
CN104342621A (zh) * | 2013-07-25 | 2015-02-11 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 磁场调节装置及等离子体加工设备 |
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CN109913830A (zh) | 2019-06-21 |
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Address after: 518000 101, building B35, Tantou West Industrial Zone, Tantou community, Songgang street, Bao'an District, Shenzhen, Guangdong Province Patentee after: Guangdong Tiancheng Vacuum Technology Co.,Ltd. Country or region after: China Address before: 518000 101, building B35, Tantou West Industrial Zone, Tantou community, Songgang street, Bao'an District, Shenzhen, Guangdong Province Patentee before: SHENZHEN TIANCHENG ROBOT Co.,Ltd. Country or region before: China |
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Effective date of registration: 20240222 Address after: 518000 building B35, Tantou West Industrial Park, Songgang street, Bao'an District, Shenzhen City, Guangdong Province Patentee after: SHENZHEN TIANCHENG VACUUM TECHNOLOGY Co.,Ltd. Country or region after: China Address before: 518000 101, building B35, Tantou West Industrial Zone, Tantou community, Songgang street, Bao'an District, Shenzhen, Guangdong Province Patentee before: Guangdong Tiancheng Vacuum Technology Co.,Ltd. Country or region before: China |