CN109913806A - A kind of preparation method of OGS touch screen - Google Patents
A kind of preparation method of OGS touch screen Download PDFInfo
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- CN109913806A CN109913806A CN201910243658.8A CN201910243658A CN109913806A CN 109913806 A CN109913806 A CN 109913806A CN 201910243658 A CN201910243658 A CN 201910243658A CN 109913806 A CN109913806 A CN 109913806A
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Abstract
The invention discloses a kind of preparation method of OGS touch screen, include the following steps: that S1. forms patterned ink layer on the transparent substrate；S2. it is coated with composite membrane, the composite membrane includes the shadow film that disappears stacked gradually on the transparent substrate, the first transparent conductive film and molybdenum aluminium molybdenum film；S3. the molybdenum aluminium molybdenum film is patterned；S4. first transparent conductive film is patterned；S5. OC layers of production the first；S6. it is coated with the second transparent conductive film；S7. second transparent conductive film is patterned；S8. OC layers of production the 2nd.In the present invention, creatively by the existing shadow film that disappears/first transparent conductive film plated film and molybdenum aluminium molybdenum film plated film, film-plating process is integrated into a film-plating process twice, it is possible to reduce a film-plating process, improve producing efficiency, reduce cost of manufacture, meanwhile, OGS touch screen it is functional.
Description
Technical field
The present invention relates to touch screen technology fields, more particularly to a kind of preparation method of OGS touch screen.
Background technique
Touch screen, also known as touch panel, touch screen etc. are that can receive contact (including finger or glue nib) etc. defeated
The induction type liquid crystal display or thin screen display device, user for entering signal pass through the pattern or text energy reality on touching display screen
Now to the operation of host.Touch screen has many advantages, such as that sturdy and durable, reaction speed is fast, saves space, is easy to exchange.
OGS(One Glass Solution, i.e., integrated touch-control) touch screen, refer to the table in the face glass of touch screen
Face directly prints touch-control sensing circuit layer, and one block of glass plays a dual role of protecting glass and touch sensing simultaneously.It compares
In traditional GG (Glass-Glass) structure touch screen, OGS touch screen has thin thickness, light weight, light transmittance height, is conducive to drop
The advantages that low production cost will be the main direction of development of future touchscreens.
Traditional OGS touch screen the preparation method comprises the following steps: S1. forms patterned ink layer on the transparent substrate；S2. it plates
Composite membrane processed, the composite membrane include stacking gradually in disappear shadow film and the first transparent conductive film on the transparent substrate；S3.
First transparent conductive film is patterned；S4. OC layers of production the first；S5. it is coated with the second transparent conductive film；S6. right
Second transparent conductive film is patterned；S7. it is coated with molybdenum aluminium molybdenum film；S8. the molybdenum aluminium molybdenum film is patterned；S9.
Make the 2nd OC layers.Need individually to do 3 film-plating process in the preparation method of traditional OGS touch screen, that is, shadow film/the first that disappear is saturating
Bright conductive film plated film, the second transparent conductive film plated film and molybdenum aluminium molybdenum film plated film, operating process is complicated, and the process-cycle is long, at high cost.
Summary of the invention
In order to make up the defect of prior art, the present invention provides a kind of preparation method of OGS touch screen.
The technical problems to be solved by the invention are achieved by the following technical programs:
A kind of preparation method of OGS touch screen, includes the following steps:
S1. patterned ink layer is formed on the transparent substrate；
S2. it is coated with composite membrane, the composite membrane includes stacking gradually in the shadow film that disappears, the first electrically conducting transparent on the transparent substrate
Film and molybdenum aluminium molybdenum film；
S3. the molybdenum aluminium molybdenum film is patterned；
S4. first transparent conductive film is patterned；
S5. OC layers of production the first；
S6. it is coated with the second transparent conductive film；
S7. second transparent conductive film is patterned；
S8. OC layers of production the 2nd.
Further, the transparent substrate is glass substrate.
Further, the material of first transparent conductive film and the second transparent conductive film is ITO.
Further, the transparent substrate includes viewfinder area and non-viewfinder area, and the ink layer is laminated in transparent substrate
Non- viewfinder area；First transparent conductive film covers entire viewfinder area and non-viewfinder area；The second transparent conductive film covering is whole
A viewfinder area and non-viewfinder area；The molybdenum aluminium molybdenum film is completely covered in second transparent conductive film.
Further, patterned ink layer is formed using yellow light technique.
Further, patterned method is carried out to the molybdenum aluminium molybdenum film are as follows: molybdenum aluminium molybdenum film is successively passed through into gluing, is exposed
Light, development and etching, wherein the etching solution used in etching is aluminium etching solution.
Further, patterned method is carried out to first transparent conductive film are as follows: transparent in molybdenum aluminium molybdenum film and first
It is coated with positive-working photoresist on conductive film, the first transparent conductive film is successively passed through into gluing, exposure, development and etching, wherein etching
The middle etching solution used is ITO etching solution.
Further, patterned method is carried out to second transparent conductive film are as follows: transparent in molybdenum aluminium molybdenum film and second
It is coated with positive-working photoresist on conductive film, the second transparent conductive film is successively passed through into gluing, exposure, development and etching, wherein etching
The middle etching solution used is ITO etching solution.
Further, the shadow film that disappears is single or multi-layer structure, using silicon oxy-nitride material, silica material, nitridation
At least one of silicon materials, oxidation niobium material are formed.
Further, the composite membrane and the second transparent conductive film are in vacuum coating equipment using magnetron sputtering side
Formula carries out being coated with forming.
The invention has the following beneficial effects:
In the present invention, creatively by the existing shadow film that disappears/first transparent conductive film plated film and molybdenum aluminium molybdenum film plated film plated film twice
Processing procedure is integrated into a film-plating process, it is possible to reduce and a film-plating process improves producing efficiency, reduces cost of manufacture, meanwhile,
OGS touch screen it is functional.
Specific embodiment
The present invention will now be described in detail with reference to examples, and the examples are only preferred embodiments of the present invention,
It is not limitation of the invention.
A kind of preparation method of OGS touch screen, includes the following steps:
S1. patterned ink layer is formed on the transparent substrate；
S2. it is coated with composite membrane, the composite membrane includes stacking gradually in the shadow film that disappears, the first electrically conducting transparent on the transparent substrate
Film and molybdenum aluminium molybdenum film；
S3. the molybdenum aluminium molybdenum film is patterned；
S4. first transparent conductive film is patterned；
S5. OC layers of production the first；
S6. it is coated with the second transparent conductive film；
S7. second transparent conductive film is patterned；
S8. OC layers of production the 2nd.
Wherein, the transparent substrate is glass substrate.The glass substrate is soda-lime-silica glass or high-boron-silicon glass or height
Aluminosilicate glass.
In the present invention, the material of first transparent conductive film and the second transparent conductive film is macromolecule electrically conducting transparent material
Material, including ITO, AZO, BZO, GZO, graphene it is one or more.Preferably, first transparent conductive film and second is thoroughly
The material of bright conductive film is ITO.
The transparent substrate includes viewfinder area and non-viewfinder area, and the ink layer is laminated in the non-viewfinder area of transparent substrate；
First transparent conductive film covers entire viewfinder area and non-viewfinder area；Second transparent conductive film cover entire viewfinder area and
Non- viewfinder area；The molybdenum aluminium molybdenum film is completely covered in second transparent conductive film.
In the present invention, the structure of the OGS touch screen viewfinder area are as follows: the 2nd OC layers/second transparent conductive film/the first OC
Layer/the first transparent conductive film/disappears shadow film/transparent substrate, the structure of non-viewfinder area are as follows: the 2nd OC layers/the second transparent conductive film/molybdenum
Aluminium molybdenum film/the first transparent conductive film/disappears shadow film/ink layer/transparent substrate.
In step S1, patterned ink layer is formed by yellow light technique on the transparent substrate.Specifically, using blade coating or
The method of spin coating makes uniform ink layer on the surface of transparent substrate；Gluing, exposure, development, heat cure are passed through to ink layer
Etc. techniques will invest transparent substrate viewfinder area ink layer removal, form patterned ink layer.
The ink layer is black ink layer, and the ink layer is laminated in the non-viewfinder area of transparent substrate, has high cover
Property, planarization, the characteristics such as insulating properties.Its primarily function has two o'clock: first is that light-proofness, prevents from seeing from the front of touch screen
The strong contact conductor of the reflectives such as metal；Second is that touching the face shaping constancy of screen products, i.e. the shape of ink layer has determined
The face shaping of touch screen.
In step S2, using magnetron sputtering coater plated film, the transparent substrate for having formed ink layer sequentially enters the shadow film that disappears
Target position, the target position of the first transparent conductive film and the target position of molybdenum aluminium molybdenum film, the shadow film that will disappear, the first transparent conductive film and molybdenum aluminium molybdenum film
It disposably coats and, will not influence subsequent patterning process, so that it may realize the film-plating process three times in conventional scheme
It is reduced to film-plating process twice.
The shadow film that disappears employed in the present invention is single or multi-layer structure, using silicon oxy-nitride material, silica material
At least one of material, silicon nitride material, oxidation niobium material are formed.Preferably, the shadow film that disappears includes the oxidation being stacked
Niobium film layer and membranous layer of silicon oxide.Make visible light lower conductive film layer etching shade in viewfinder area invisible by the way that the shadow film that disappears is arranged,
Visible light transmittance improves 0.5%-2%, macroscopic better effect.
In step S3, the molybdenum aluminium molybdenum film is patterned using yellow light etching technics.The yellow light etching technics are as follows:
Molybdenum aluminium molybdenum film is successively passed through into gluing, exposure, development and etching, wherein the etching solution used in etching is aluminium etching solution.Specifically
Ground carries out patterned method to the molybdenum aluminium molybdenum film are as follows: (1) gluing: photoresists are uniformly coated on molybdenum aluminium molybdenum film, are passed through
Hot plate preliminary drying volatilizees photoresists diluent, is adhered on molybdenum aluminium molybdenum film；(2) it exposes: good by pre-production with ultraviolet light
Chromium plate is irradiated to photoresists surface；(3) develop: the photoresists of molybdenum aluminium molybdenum film surface are handled with developer solution, by the photoresists of decomposition
Layer removes, and the photoresists of the molybdenum aluminium molybdenum film surface after development will firmly treatment Jing Guo certain temperature；(4) it etches: being etched with aluminium
Liquid falls molybdenum aluminium molybdenum film without the molybdenum aluminium molybdenum erosion that photoresists cover, and has thus obtained required pattern；(5) it demoulding: uses
High-concentration alkali liquor makees liquid parting, and remaining photoresists on molybdenum aluminium molybdenum film are peeled off.
It should be noted that the present invention is not especially limited the composition of aluminium etching solution, can use in the prior art originally
Aluminium etching solution known to the technical staff of field.As an example, the aluminium etching solution includes phosphoric acid, nitric acid and acetic acid.
In step S4, first transparent conductive film is patterned using yellow light etching technics.The yellow light etching
Technique are as follows: positive-working photoresist is coated on molybdenum aluminium molybdenum film and the first transparent conductive film, by the first transparent conductive film successively by applying
Glue, exposure, development and etching, wherein the etching solution used in etching is ITO etching solution.Specifically, it transparent is led to described first
Electrolemma carries out patterned method are as follows: (1) gluing: by the molybdenum aluminium molybdenum film and first of positive-working photoresist even spread after patterning
In transparent conductive film, positive-working photoresist diluent is volatilized by hot plate preliminary drying；(2) it exposes: passing through pre-production with ultraviolet light
Good chromium plate, is irradiated to positive-working photoresist surface, the positive-working photoresist by ultraviolet light part is made to react, in ultraviolet light
Selective exposure is carried out to positive-working photoresist under lamp；(3) develop: being handled with developer solution, the Positive photosensitive that will be decomposed by illumination
Glue removes, and retains the positive-working photoresist of unexposed portion, and the positive-working photoresist of decomposition is removed；(4) it etches: using ITO etching solution
The first transparent conductive film that no photoresists are covered erodes, and has thus obtained required pattern；(5) demoulding: with highly concentrated
Degree lye makees liquid parting, and remaining positive-working photoresist on molybdenum aluminium molybdenum film is peeled off.
In the present invention, the aluminium etching solution used when patterning to molybdenum aluminium molybdenum film will not be sent out with the first transparent conductive film
Raw reaction, the first transparent conductive film is intact when so patterning to molybdenum aluminium molybdenum film remains.
In the present invention, the ITO etching solution used when patterning to transparent conductive film can occur anti-with molybdenum aluminium molybdenum film
It answers, in order to avoid the molybdenum aluminium molybdenum film of the pattern of lesions when patterning to transparent conductive film, the present invention is to electrically conducting transparent
Synchronization is coated with positive-working photoresist, and second electrically conducting transparent on molybdenum aluminium molybdenum film and transparent conductive film when film is patterned
The molybdenum aluminium molybdenum film is completely covered in film.
It should be noted that the present invention is not especially limited the composition of ITO etching solution, can use in the prior art originally
ITO etching solution known to the technical staff of field.As an example, the ITO etching solution be include HNO3, HCL and H2The mixing of O
Liquid.
As it can be seen that the shadow film that will disappear, the first transparent conductive film and molybdenum aluminium molybdenum membrane disposable, which coat, to be come, Bu Huiying in the present invention
Ring subsequent patterning process, so that it may realize and the film-plating process three times in conventional scheme is reduced to film-plating process twice.
In step S7, second transparent conductive film is patterned using yellow light etching technics.Thoroughly to described second
Bright conductive film carries out patterned method are as follows: positive-working photoresist is coated on molybdenum aluminium molybdenum film and the second transparent conductive film, by second
Transparent conductive film successively passes through gluing, exposure, development and etching, wherein the etching solution used in etching is ITO etching solution.
In step S8, the entire 2nd OC layers are made on the second transparent conductive film, plays the role of protection circuit.
In the present invention, the described first OC layers and the 2nd OC layers be OC insulating layer；Pass through ultraviolet exposure, development, production
First OC layers and the 2nd OC layers.
In invention, the composite membrane and the second transparent conductive film are in vacuum coating equipment using magnetron sputtering side
Formula carries out being coated with forming.
Embodiments of the present invention above described embodiment only expresses, the description thereof is more specific and detailed, but can not
Therefore limitations on the scope of the patent of the present invention are interpreted as, as long as skill obtained in the form of equivalent substitutions or equivalent transformations
Art scheme should all be fallen within the scope and spirit of the invention.
Claims (10)
1. a kind of preparation method of OGS touch screen, which is characterized in that it includes the following steps:
S1. patterned ink layer is formed on the transparent substrate；
S2. it is coated with composite membrane, the composite membrane includes stacking gradually in the shadow film that disappears, the first electrically conducting transparent on the transparent substrate
Film and molybdenum aluminium molybdenum film；
S3. the molybdenum aluminium molybdenum film is patterned；
S4. first transparent conductive film is patterned；
S5. OC layers of production the first；
S6. it is coated with the second transparent conductive film；
S7. second transparent conductive film is patterned；
S8. OC layers of production the 2nd.
2. the preparation method of OGS touch screen as described in claim 1, which is characterized in that the transparent substrate is glass substrate.
3. the preparation method of OGS touch screen as described in claim 1, which is characterized in that first transparent conductive film and
The material of two transparent conductive films is ITO.
4. the preparation method of OGS touch screen as described in claim 1, which is characterized in that the transparent substrate includes viewfinder area
With non-viewfinder area, the ink layer is laminated in the non-viewfinder area of transparent substrate；First transparent conductive film covers entire form
Area and non-viewfinder area；Second transparent conductive film covers entire viewfinder area and non-viewfinder area；Second transparent conductive film is complete
Molybdenum aluminium molybdenum film described in all standing.
5. the preparation method of OGS touch screen as described in claim 1, which is characterized in that form patterning using yellow light technique
Ink layer.
6. the preparation method of OGS touch screen as described in claim 1, which is characterized in that carry out pattern to the molybdenum aluminium molybdenum film
The method of change are as follows: molybdenum aluminium molybdenum film is successively passed through into gluing, exposure, development and etching, wherein the etching solution used in etching is aluminium
Etching solution.
7. the preparation method of OGS touch screen as claimed in claim 3, which is characterized in that first transparent conductive film into
The patterned method of row are as follows: positive-working photoresist is coated on molybdenum aluminium molybdenum film and the first transparent conductive film, by the first transparent conductive film
Successively by gluing, exposure, development and etching, wherein the etching solution used in etching is ITO etching solution.
8. the preparation method of OGS touch screen as claimed in claim 3, which is characterized in that second transparent conductive film into
The patterned method of row are as follows: positive-working photoresist is coated on molybdenum aluminium molybdenum film and the second transparent conductive film, by the second transparent conductive film
Successively by gluing, exposure, development and etching, wherein the etching solution used in etching is ITO etching solution.
9. the preparation method of OGS touch screen as described in claim 1, which is characterized in that the shadow film that disappears is single-layer or multi-layer
Structure is formed using at least one of silicon oxy-nitride material, silica material, silicon nitride material, oxidation niobium material.
10. the preparation method of OGS touch screen as described in claim 1, which is characterized in that the composite membrane and second transparent is led
Electrolemma is to carry out being coated with forming using magnetron sputtering mode in vacuum coating equipment.
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| CN201910243658.8A CN109913806A (en) | 2019-03-28 | 2019-03-28 | A kind of preparation method of OGS touch screen |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110658947A (en) * | 2019-08-22 | 2020-01-07 | 信利光电股份有限公司 | Integrated black touch screen and manufacturing method thereof |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN202838283U (en) * | 2012-08-27 | 2013-03-27 | 惠州比亚迪实业有限公司 | Capacitor touch screen |
| CN203825592U (en) * | 2014-05-09 | 2014-09-10 | 浙江金指科技有限公司 | OGS touch screen |
| CN107861656A (en) * | 2017-11-08 | 2018-03-30 | 合肥鑫晟光电科技有限公司 | Manufacture method, the display device of touch-screen |
-
2019
- 2019-03-28 CN CN201910243658.8A patent/CN109913806A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN202838283U (en) * | 2012-08-27 | 2013-03-27 | 惠州比亚迪实业有限公司 | Capacitor touch screen |
| CN203825592U (en) * | 2014-05-09 | 2014-09-10 | 浙江金指科技有限公司 | OGS touch screen |
| CN107861656A (en) * | 2017-11-08 | 2018-03-30 | 合肥鑫晟光电科技有限公司 | Manufacture method, the display device of touch-screen |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110658947A (en) * | 2019-08-22 | 2020-01-07 | 信利光电股份有限公司 | Integrated black touch screen and manufacturing method thereof |
| CN110658947B (en) * | 2019-08-22 | 2023-04-25 | 信利光电股份有限公司 | Integrated black touch screen and manufacturing method thereof |
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Application publication date: 20190621 |