CN109907108A - A kind of cereal plasma preprocessor and its method - Google Patents
A kind of cereal plasma preprocessor and its method Download PDFInfo
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- CN109907108A CN109907108A CN201910315338.9A CN201910315338A CN109907108A CN 109907108 A CN109907108 A CN 109907108A CN 201910315338 A CN201910315338 A CN 201910315338A CN 109907108 A CN109907108 A CN 109907108A
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- plasma
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- vibra shoot
- mounting rack
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Abstract
The invention discloses a kind of cereal plasma preprocessors, comprising: shell, one end have feed inlet, and the other end has discharge port；Vibratory feed is arranged in the shell, and is connected to the inlet port and outlet port；Plasma mounting rack is arranged above the vibratory feed；Multiple plasma generating units are equidistantly detachably arranged on the plasma mounting rack；Gas buffer tank is arranged on the plasma mounting rack, and is connected to the plasma generating unit；Air blower is arranged in the shell, and is connected to the gas buffer tank, also discloses a kind of cereal plasma processing method, and the present invention can fine-tune the plasma processing condition of cereal, realizes accurate control of the plasma to the processing of cereal.
Description
Technical field
The present invention relates to cereal processing equipment more particularly to a kind of cereal plasma preprocessor and a kind of cereal etc. from
Daughter preprocess method.
Background technique
China human mortality is numerous, accounts for 1/5th of total world population.Under the premise of guaranteeing grain yield, crop storage is
It is crucial.With the progress of science and technology and the raising of living standards of the people, the requirement to grain quality is also increasing year by year.But
It is, since the moisture after grain harvest is higher, if sunning or drying are not in time, to be easy to cause mouldy, lesion and insect pest etc. existing
As occurring, the storage of cereal is influenced, direct economic loss is caused.
In the past, since yield is not high and technology is not advanced, for drying mode mainly based on natural drying, feature is dry
The dry time is long, is influenced by weather and place big.With agrotechnical development, carrying out grain dry using drying machine becomes master
Stream.But region is perfect for existing drying equipment, must separately ward off footpath in terms of improving grain dry efficiency and energy saving
Diameter.
Summary of the invention
The present invention has designed and developed a kind of low-temperature plasma processing equipment, carries out plasma pretreatment to cereal, then by paddy
Object is dry by drying machine, can effectively improve the drying efficiency of cereal and reduce energy consumption for drying.
The present invention also provides a kind of cereal plasma processing method, the spacing for providing plasma mounting rack and vibra shoot is adjusted
The vibration frequency formula of formula and vibra shoot can fine-tune the plasma processing condition of cereal, realize plasma to paddy
The accurate control of the processing of object.
Technical solution provided by the invention are as follows:
A kind of cereal plasma preprocessor, comprising:
Shell, one end have feed inlet, and the other end has discharge port；
Vibratory feed is arranged in the shell, and is connected to the inlet port and outlet port；
Plasma mounting rack is arranged above the vibratory feed；
Multiple plasma generating units are equidistantly detachably arranged on the plasma mounting rack；
Gas buffer tank is arranged on the plasma mounting rack, and is connected to the plasma generating unit；
Air blower is arranged in the shell, and is connected to the gas buffer tank.
Preferably, the vibratory feed includes:
Vibration rack is detachably arranged in the shell；
Vibra shoot is resiliently supported above the vibration rack；
Eccentric wheel is rotatably supported on the vibration rack；
Eccentric ratio, one end connect the eccentric wheel, and can be along the creep of the eccentric wheel, and the bias is even
The bar other end connects the vibra shoot.
Preferably, further includes:
First buffer stopper is detachably connected the vibra shoot；
Second buffer stopper is detachably connected the vibration rack；
Buffer spring is arranged between first buffer stopper and second buffer stopper.
It preferably, further include plasma mounting plate, surface has the plasma beam mounting hole of multiple arrays, described etc.
Ion mounting plate is detachably secured on the plasma mounting rack.
Preferably, the plasma generating unit includes:
Fixing seat, for circle, surface has multiple through holes；
Multiple air inlets connect mouth, are arranged in the fixing seat, pass through the through hole；
Low-field electrode is arranged in the one end the air inlet Lian Zui；
High-field electrode connects the air inlet by fixed plug and connects the mouth other end.
Preferably, there is gas-guide tube between the gas buffer tank and air blower.
Preferably, the plasma mounting rack connects the housing bottom by elevating mechanism, can adjust described etc.
The spacing of ion mounting rack and the vibra shoot.
Preferably, the eccentric ratio is driven by motor.
A kind of cereal plasma pre-treatment method, comprising:
Cereal enters plasma processor by outer feed inlet, and under the control of outer feed inlet baffle, suitable to enter vibration
Dynamic slot；Vibra shoot constantly vibrates repeatedly under the drive that vibrating transportation fills, and the cereal into vibra shoot is made to advance while do
Throw movement, cereal kernel rolls during upthrow, the grade sprayed with the plasma generation unit above vibra shoot from
Sub-stream nozzle contact realizes plasma treatment, most afterwards through outgoing material mouth discharge；
Wherein, the spacing of plasma processor and vibra shoot is adjustable, between the plasma processor and the vibra shoot
Away from calculation formula are as follows:
Wherein, DiFor the spacing of plasma processor and vibra shoot, DmaxBetween plasma processor and the maximum of vibra shoot
Away from ν is the transmission speed for vibrating transmitting device, and g is acceleration of gravity, tuFor the coefficient with time correlation, tαFor cereal wait from
The processing time in subprocessor.
It preferably, further include the vibration frequency that vibra shoot is adjusted by adjusting eccentric wheel speed；
The vibration frequency calculates formula are as follows:
Wherein, f is the vibration frequency of vibra shoot, and ν is the transmission speed for vibrating transmitting device, SlFor eccentric wheel rim week
It is long, tuFor the coefficient with time correlation, tαThe processing time for being cereal in plasma processor, ρuFor Oscillating Coefficients；ραFor with
The relevant coefficient of cereal；G is acceleration of gravity, DiFor the spacing of plasma mounting rack and vibra shoot, DmaxPlasma mounting rack with
The maximum spacing of vibra shoot.
Beneficial effect of the present invention
The present invention provides a low-temperature plasma processing equipment, carries out plasma pretreatment to cereal, then cereal is passed through
Drying machine is dry, can effectively improve the drying efficiency of cereal and reduce energy consumption for drying.
The present invention also provides a kind of cereal plasma processing method, the spacing for providing plasma mounting rack and vibra shoot is adjusted
The vibration frequency formula of formula and vibra shoot can fine-tune the plasma processing condition of cereal, realize plasma to paddy
The accurate control of the processing of object, and vibratory feed is adjustable into grain speed, and time saving and energy saving, adaptability is good.
Detailed description of the invention
Fig. 1 is the front view of low-temperature plasma processor of the present invention.
Fig. 2 is the left view of low-temperature plasma processor of the present invention.
Fig. 3 is the cross-sectional view of low-temperature plasma processor of the present invention.
Fig. 4 is plasma mounting rack structural schematic diagram of the present invention.
Fig. 5 is vibratory feed structural schematic diagram of the present invention.
Fig. 6 is that cellular construction schematic diagram occurs in vitro for of the present invention wait.
Specific embodiment
Present invention will be described in further detail below with reference to the accompanying drawings, to enable those skilled in the art referring to specification text
Word can be implemented accordingly.
As shown in Figs. 1-2, low-temperature plasma processor provided by the invention include shell 100, vibratory feed 200,
And plasma producing apparatus.
Wherein, shell 100 includes square shell 150 and the outer support frame 110 that 150 bottom of square shell is arranged in, rectangular
The side of shell 150 has outer feed inlet 130, and the other side has outer discharge port 140, as a preference, on outer feed inlet 130
Outer feed inlet baffle 120 is arranged in side, and effect is can to control cereal flow, and make cereal even into vibra shoot, improve etc.
Ion processing rate, when work, cereal is entered by outer feed inlet 130, and controls cereal flow by outer feed inlet baffle 120, in right amount
Cereal by outer feed inlet 130 enter outside 140 direction of discharge port of vibratory feed 200 advance.
As shown in figure 3, including air blower 160, vibratory feed 200, high-frequency and high-voltage exchange inside plasma processor
Power supply 180, motor 190, gas-guide tube 210, vibra shoot 211, plasma generation unit 212, plasma mounting rack 213, gas are slow
It rushes case 214, plasma support frame 215 and plasma beam mounting plate 216 to form, wherein exchanged by air blower 160, high-frequency and high-voltage
Beam 212, the plasma generating source that plasma mounting rack 213 forms and vibrating transportation occur for power supply 180, gas-guide tube 210, plasma
Part device 200 generate to crop vibrative formula mode of movement.Air blower 160 be plasma generation unit 212 provide generation etc. from
The air of sub-stream nozzle, air are being filled with gas buffer tank 214 so as to which stable homogeneous is assigned into generation Shu Qianxian
In each plasma generation unit, the stability and quality of plasma air-flow can be improved in this way, to enhance plasma (orifice) gas
Flow the effect handled cereal.Plasma generation unit dot matrix is arranged on plasma mounting plate 216, and plasma air-flow is made to exist
It is sprayed on the whole at planar structure, so that mass disposal cereal is achieved under atmospheric pressure normal temperature environment.Vibrating transportation part
200 generate to crop vibrative formula mode of movement, upthrow movement is done while so that cereal is done forward travel, cereal kernel is in upthrow
During roll, make cereal kernel different sides and plasma air flow contacts, to improve the processing quality of cereal
The time is handled with shortening.Plasma processor at work, cereal by outer feed inlet 130 enter plasma processor, and
It is suitable to enter vibra shoot 211 under the control of outer feed inlet baffle 120；Vibra shoot is under the drive that vibrating transportation fills 200, no
Disconnected vibration repeatedly makes the cereal into vibra shoot 211 advance while doing upthrow movement, and cereal kernel is sent out during upthrow
Raw rolling, the plasma air flow contacts sprayed with the plasma generation unit 212 above vibra shoot realize plasma treatment, most
It is discharged by outer discharge port 140.
There is gas buffer tank 214 to make the sky from air blower 160 for the top of plasma beam mounting rack 213 as shown in Figure 4
Gas is capable of being assigned on each plasma generation unit 212 of stable homogeneous.Plasma mounting rack passes through elevator on the whole
Structure is connected with support arm 110, the relative position of this structure adjustable plasma beam nozzle and vibra shoot 211, thus expand etc.
The scope of application of plasma processor and the manufacturing cost for reducing plasma processor.
As shown in figure 5, vibratory feed 200 includes: that vibration rack 217, vibra shoot 211, eccentric wheel 311 and bias connect
Bar 312, vibration rack 217 are detachably arranged in shell by Luoshan；Vibra shoot 211 is supported on vibration branch by spring
217 top of frame；Eccentric wheel 311 is rotatably supported on vibration rack 217；312 one end connecting eccentric wheel 311 of eccentric ratio, and
Vibra shoot 211 can be connected along the creep of eccentric wheel 311, the eccentric ratio other end.
In another embodiment, one end of vibra shoot 211 has interior feed inlet 218, one section of communicating pipe has interior discharge port
220。
It in another embodiment, further include being arranged between vibration rack 217 and vibra shoot 211 that buffer unit 219 is arranged,
Including the first buffer stopper 313, the second buffer stopper 314 and buffer spring 315, the first buffer stopper 313 is detachably connected vibra shoot
211；Second buffer stopper 314 its be detachably connected vibration rack 217；Buffer spring 316 is arranged in the first buffer stopper 313 and second
Between buffer stopper 314, eccentric wheel 311 connects motor 190, and when work, motor 190 crosses belt pulley and eccentric ratio is driven to do circumference fortune
Dynamic, eccentric ratio 312 often rotates a circle, then connecting rod is driven to do primary translation around circle is determined.The every translation of connecting rod is primary, drives buffering elastic
Spring 315 occurs once to deform, so that vibra shoot 211 be made to occur once to vibrate, buffer unit is connected at connecting rod, can effectively be dropped
The service life of influence and extension plasma processor of the low vibration to complete machine.
As shown in fig. 6, plasma generating unit 212 includes: fixing seat 221, for circle, surface has multiple run through
Hole；Multiple air inlets connect mouth 225, and it is arranged in fixing seat 221, and passes through through hole；Low-field electrode 222, which is arranged, connects mouth in air inlet
225 one end；High-field electrode 224 connects 225 other end of mouth by fixed 223 connection air inlet of plug.
Air blower 160 is that plasma generation unit 212 provides the air for generating plasma air-flow, and air is entering generation beam
It is preceding to be first filled with gas buffer tank 214 so as to which being assigned in each plasma generation unit for stable homogeneous, in this way
To improve the stability and quality of plasma air-flow, to enhance the effect that plasma air-flow handles cereal.Plasma occurs
Unit dot matrix is arranged on plasma mounting plate 216, sprays plasma air-flow at planar structure on the whole, so that atmosphere
Mass disposal cereal is achieved under normal pressure and temperature environment.Vibrating transportation part 200 generate to crop vibrative formula mode of movement,
Upthrow movement is done while so that cereal is done forward travel, cereal kernel rolls during upthrow, makes cereal kernel
Different sides and plasma air flow contacts, to improve the processing quality of cereal and shorten the processing time.Plasma processor
At work, cereal enters plasma processor by outer feed inlet 130, and under the control of outer feed inlet baffle 120, suitable
Into vibra shoot 211；Vibra shoot constantly vibrates repeatedly under the drive that vibrating transportation fills 200, makes into vibra shoot 211
Cereal advances while doing upthrow movement, and cereal kernel rolls during upthrow, sends out with the plasma above vibra shoot
The plasma air flow contacts that raw unit 212 sprays are realized plasma treatment, are most discharged afterwards through outgoing material mouth 140.
The distance computation formula of plasma mounting rack and vibra shoot are as follows:
Wherein, DiFor the spacing of plasma mounting rack and vibra shoot, DmaxBetween plasma mounting rack and the maximum of vibra shoot
Away from ν is the transmission speed for vibrating transmitting device, and g is acceleration of gravity, tuFor the coefficient with time correlation, tαFor cereal wait from
The processing time in subprocessor.
The vibration frequency of vibra shoot is adjusted by adjusting eccentric wheel speed, vibration frequency calculates formula are as follows:
Wherein, f is the vibration frequency of vibra shoot, and ν is the transmission speed for vibrating transmitting device, SlFor eccentric wheel rim week
It is long, tuFor the coefficient with time correlation, tαThe processing time for being cereal in plasma processor, ρuFor Oscillating Coefficients；ραFor with
The relevant coefficient of cereal；G is acceleration of gravity, DiFor the spacing of plasma mounting rack and vibra shoot, DmaxPlasma mounting rack with
The maximum spacing of vibra shoot
The present invention provides a low-temperature plasma processing equipment, carries out plasma pretreatment to cereal, then cereal is passed through
Drying machine is dry, can effectively improve the drying efficiency of cereal and reduce energy consumption for drying.
The present invention also provides a kind of cereal plasma processing method, the spacing for providing plasma mounting rack and vibra shoot is adjusted
The vibration frequency formula of formula and vibra shoot can fine-tune the plasma processing condition of cereal, realize plasma to paddy
The accurate control of the processing of object.
Although the embodiments of the present invention have been disclosed as above, but its is not only in the description and the implementation listed
With it can be fully applied to various fields suitable for the present invention, for those skilled in the art, can be easily
Realize other modification, therefore without departing from the general concept defined in the claims and the equivalent scope, the present invention is simultaneously unlimited
In specific details and legend shown and described herein.
Claims (10)
1. a kind of cereal plasma preprocessor characterized by comprising
Shell, one end have feed inlet, and the other end has discharge port；
Vibratory feed is arranged in the shell, and is connected to the inlet port and outlet port；
Plasma mounting rack is arranged above the vibratory feed；
Multiple plasma generating units are equidistantly detachably arranged on the plasma mounting rack；
Gas buffer tank is arranged on the plasma mounting rack, and is connected to the plasma generating unit；
Air blower is arranged in the shell, and is connected to the gas buffer tank.
2. cereal plasma preprocessor according to claim 1, which is characterized in that the vibratory feed packet
It includes:
Vibration rack is detachably arranged in the shell；
Vibra shoot is resiliently supported above the vibration rack；
Eccentric wheel is rotatably supported on the vibration rack；
Eccentric ratio, one end connect the eccentric wheel, and can be along the creep of the eccentric wheel, and the eccentric ratio is another
One end connects the vibra shoot.
3. cereal plasma preprocessor according to claim 2, which is characterized in that further include:
First buffer stopper is detachably connected the vibra shoot；
Second buffer stopper is detachably connected the vibration rack；
Buffer spring is arranged between first buffer stopper and second buffer stopper.
4. cereal plasma preprocessor according to claim 1 or 3, which is characterized in that further include plasma installation
Plate, surface have the plasma beam mounting hole of multiple arrays, and the plasma mounting plate is detachably secured to the plasma
On mounting rack.
5. cereal plasma preprocessor according to claim 4, which is characterized in that the plasma generating unit
Include:
Fixing seat, for circle, surface has multiple through holes；
Multiple air inlets connect mouth, are arranged in the fixing seat, pass through the through hole；
Low-field electrode is arranged in the one end the air inlet Lian Zui；
High-field electrode connects the air inlet by fixed plug and connects the mouth other end.
6. cereal plasma preprocessor according to claim 4, which is characterized in that the gas buffer tank and air blast
There is gas-guide tube between machine.
7. cereal plasma preprocessor according to claim 1 or 6, which is characterized in that the plasma mounting rack
The housing bottom is connected by elevating mechanism, the spacing of the plasma mounting rack and the vibra shoot can be adjusted.
8. cereal plasma preprocessor according to claim 2, which is characterized in that the eccentric ratio is driven by motor
It is dynamic.
9. a kind of cereal plasma pre-treatment method characterized by comprising
Cereal enters plasma processor by outer feed inlet, and under the control of outer feed inlet baffle, suitable to enter vibra shoot；
Vibra shoot constantly vibrates repeatedly under the drive that vibrating transportation fills, and so that the cereal into vibra shoot is advanced while doing upthrow fortune
Dynamic, cereal kernel rolls during upthrow, the plasma (orifice) gas sprayed with the plasma generation unit above vibra shoot
Stream contact realizes plasma treatment, most afterwards through outgoing material mouth discharge；
Wherein, the spacing of plasma processor and vibra shoot is adjustable, the spacing meter of the plasma processor and the vibra shoot
Calculate formula are as follows:
Wherein, DiFor the spacing of plasma processor and vibra shoot, DmaxThe maximum spacing of plasma processor and vibra shoot, ν are
The transmission speed of transmitting device is vibrated, g is acceleration of gravity, tuFor the coefficient with time correlation, tαIt is cereal in plasma treatment
The processing time in machine.
10. cereal plasma pre-treatment method according to claim 9, which is characterized in that further include inclined by adjusting
The vibration frequency of heart wheel speed adjustment vibra shoot；
The vibration frequency calculates formula are as follows:
Wherein, f is the vibration frequency of vibra shoot, and ν is the transmission speed for vibrating transmitting device, SlFor eccentric wheel rim perimeter, tuFor
With the coefficient of time correlation, tαThe processing time for being cereal in plasma processor, ρuFor Oscillating Coefficients；ραFor with cereal phase
The coefficient of pass；G is acceleration of gravity, DiFor the spacing of plasma mounting rack and vibra shoot, DmaxPlasma mounting rack and vibra shoot
Maximum spacing.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN201910315338.9A CN109907108A (en) | 2019-04-19 | 2019-04-19 | A kind of cereal plasma preprocessor and its method |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910315338.9A CN109907108A (en) | 2019-04-19 | 2019-04-19 | A kind of cereal plasma preprocessor and its method |
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ID=66977821
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114651869A (en) * | 2022-03-28 | 2022-06-24 | 北京中和锦程科技有限公司 | Grain microorganism inactivation device |
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|---|---|---|---|---|
| JP2010166855A (en) * | 2009-01-22 | 2010-08-05 | Toshihiko Hanai | Processing method for long storage of cereal, cereals processed to be storable for long, and processing apparatus for long storage of cereal |
| CN205156540U (en) * | 2015-11-19 | 2016-04-13 | 安徽香飘飘食品有限公司 | Vibrating grain drier of interior blast air |
| CN108719801A (en) * | 2018-04-13 | 2018-11-02 | 国家粮食局科学研究院 | A kind of full bread basket of fast food and its processing method |
| CN108750192A (en) * | 2018-05-03 | 2018-11-06 | 江苏经贸职业技术学院 | A kind of plasma disinfection package mechanism for food processing |
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2019
- 2019-04-19 CN CN201910315338.9A patent/CN109907108A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010166855A (en) * | 2009-01-22 | 2010-08-05 | Toshihiko Hanai | Processing method for long storage of cereal, cereals processed to be storable for long, and processing apparatus for long storage of cereal |
| CN205156540U (en) * | 2015-11-19 | 2016-04-13 | 安徽香飘飘食品有限公司 | Vibrating grain drier of interior blast air |
| CN108719801A (en) * | 2018-04-13 | 2018-11-02 | 国家粮食局科学研究院 | A kind of full bread basket of fast food and its processing method |
| CN108750192A (en) * | 2018-05-03 | 2018-11-06 | 江苏经贸职业技术学院 | A kind of plasma disinfection package mechanism for food processing |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114651869A (en) * | 2022-03-28 | 2022-06-24 | 北京中和锦程科技有限公司 | Grain microorganism inactivation device |
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