CN109868461B - Sampling system is put to microwave plasma chemistry vapour deposition device - Google Patents
Sampling system is put to microwave plasma chemistry vapour deposition device Download PDFInfo
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- CN109868461B CN109868461B CN201910181537.5A CN201910181537A CN109868461B CN 109868461 B CN109868461 B CN 109868461B CN 201910181537 A CN201910181537 A CN 201910181537A CN 109868461 B CN109868461 B CN 109868461B
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- bottom plate
- bell jar
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- quartz bell
- positioning
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- 238000005070 sampling Methods 0.000 title abstract description 19
- 230000008021 deposition Effects 0.000 title description 10
- 239000010453 quartz Substances 0.000 claims abstract description 70
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 70
- 230000007246 mechanism Effects 0.000 claims abstract description 27
- 238000005229 chemical vapour deposition Methods 0.000 claims abstract description 17
- 239000013049 sediment Substances 0.000 claims abstract description 3
- 230000033001 locomotion Effects 0.000 claims description 8
- 238000007789 sealing Methods 0.000 claims description 5
- 238000000034 method Methods 0.000 abstract description 14
- 230000008569 process Effects 0.000 abstract description 12
- 238000000151 deposition Methods 0.000 description 9
- 239000010432 diamond Substances 0.000 description 5
- 229910003460 diamond Inorganic materials 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 2
- 230000003028 elevating effect Effects 0.000 description 2
- 230000017525 heat dissipation Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000005234 chemical deposition Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005518 electrochemistry Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
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Abstract
A microwave plasma chemical vapor deposition device lofting and sampling system comprises a rack and a lifting lofting mechanism, wherein the lifting lofting mechanism comprises a supporting seat and a supporting bottom plate arranged on the supporting seat, and the supporting bottom plate is in sliding fit with the supporting seat along the horizontal direction; a quartz bell jar for placing sediments is further arranged above the supporting bottom plate, and the quartz bell jar is lifted along with the supporting bottom plate in the vertical direction; and the frame is also provided with a positioning device for detecting the position of the quartz bell jar. This sampling system is put to microwave plasma chemical vapor deposition device puts through going up and down and gets mechanism, supporting seat and with the structure of supporting baseplate of the horizontal sliding fit of supporting seat and lay, makes lofting, operating space no longer restricted among the sampling process, and lofting, sampling process are simple nothing to hinder, can effectually avoid because operating space is limited and lead to damaging the emergence of the quartz bell jar condition.
Description
Technical Field
The invention belongs to the technical field of microwave plasma chemical vapor deposition, and particularly relates to a sample placing and taking system of a microwave plasma chemical vapor deposition device.
Background
The diamond has the characteristics of extremely high hardness, wide forbidden band, high breakdown voltage, high carrier mobility, high thermal conductivity, high chemical stability, high optical permeability and the like, and has very good application prospects in the fields of semiconductors, electrochemistry, optics, thermotics, ultraprecise processing and the like. Now, artificial diamonds have been widely used in the field of jewelry and have given a certain impact on the natural diamond market.
At present, a microwave plasma chemical vapor deposition method is the most effective method for preparing high-quality diamond products, and high-power quartz bell jar type microwave plasma chemical deposition equipment has the advantages of easy cleaning of a reaction chamber, convenient replacement of a quartz bell jar, convenient adjustment of a plasma state and the like, and is widely used.
In order to obtain a larger deposition area and reduce the etching of plasma to the quartz bell jar, the size of the quartz bell jar is larger, and the volume and the weight of structures such as a water-cooling flange, a water-cooling base station and the like which are matched with the quartz bell jar are larger; meanwhile, in order to obtain plasma in an ideal state, the height of the quartz bell jar in the resonant cavity needs to be accurately adjustable. The traditional vertical lifting lofting structure has the characteristics of limited operation space, inconvenient use, low production efficiency, easy damage to a quartz bell jar and the like, is extremely inconvenient in the actual use process, and has the risk of damaging the quartz bell jar due to limited space in the lofting and lofting process.
The Chinese invention patent 'a quartz bell jar for a microwave plasma chemical vapor deposition device' (patent number: CN105525274A) discloses a quartz bell jar for a microwave plasma chemical vapor deposition device, wherein the quartz bell jar is a cylindrical tube at the lower end, and a hemispherical seal with a plurality of quartz rings is arranged at the upper end; the quartz circular rings are distributed on the middle lower part of the hemispherical seal in a horizontal array mode, the outer diameter of each quartz circular ring is the same as that of the cylindrical barrel, and the quartz circular rings play a role in increasing heat dissipation under the condition of external air cooling; in actual use, however, although the heat dissipation capability of the quartz bell jar can be improved and the temperature of the quartz bell jar can be reduced, the quartz bell jar is limited in operation space, inconvenient to use and easy to damage.
The invention relates to a double exhaust flat plate type epitaxial furnace (patent number: CN102618921B), which comprises a quartz bell jar (1) and a bottom plate (15), wherein the upper end of the bottom plate (15) is provided with the quartz bell jar (1), the middle part of the upper end of the quartz bell jar (1) is provided with a quartz flange interface (2), the upper end of the quartz flange interface (2) is connected with a stainless steel exhaust pipe (4) through a flange (3), the stainless steel exhaust pipe (4) is connected with a power motor (10), a pneumatic valve (5) is arranged between the flange (3) and the power motor (10), the pneumatic valve (5) is connected with a right electromagnetic valve (6), a position sensor (8) is connected with the electromagnetic valve (6) through a lead, and a time switch (7) is arranged between the position sensor (8) and the electromagnetic valve (6); the invention has simple structure, adopts a double-exhaust system, can discharge the high-particle-density atmosphere in the bell jar in vacuum, and introduces the clean room atmosphere with low particle density, thereby obtaining relatively clean epitaxial growth environment.
Disclosure of Invention
The invention aims to provide a sample placing and taking system of a microwave plasma chemical vapor deposition device, aiming at the defects of the prior art, so that the drawing type sample placing and taking is realized, the process is simple and convenient, and the quartz bell jar is effectively prevented from being damaged.
In order to solve the technical problems, the invention adopts the technical scheme that:
a microwave plasma chemical vapor deposition device lofting and sampling system comprises a frame and a lifting lofting mechanism;
the top of the frame is provided with an upper bottom plate, a resonant cavity and a lifting device, the upper bottom plate is provided with a through hole, the lifting device is fixedly arranged on the upper bottom plate, and the resonant cavity is arranged at the through hole of the upper bottom plate;
the lifting placing and taking mechanism comprises a supporting seat and a supporting bottom plate arranged on the supporting seat, and the supporting bottom plate is in sliding fit with the supporting seat along the horizontal direction;
a quartz bell jar for placing sediments is further arranged above the supporting bottom plate, the quartz bell jar is pulled along with the supporting bottom plate along the horizontal direction, and the quartz bell jar is lifted along with the supporting bottom plate along the vertical direction;
and the frame is also provided with a positioning device for detecting the position of the quartz bell jar.
The lifting device comprises a lifting motor, a commutator, a ball screw and a screw nut, and the lifting motor is in control connection with the ball screw through the commutator;
the ball screw is arranged along vertical symmetry, the lower end of the ball screw penetrates through the supporting seat and is matched with the screw nut, the tail end of the ball screw is rotatably connected with the bearing seat fixedly arranged on the rack, and the top end of the ball screw is connected with the commutator to convert the rotary motion of the lifting motor into linear motion.
The two sides of the supporting seat are symmetrically provided with guide seats arranged along the horizontal direction, and the two sides of the supporting bottom plate are symmetrically provided with guide rails matched with the guide seats, so that sliding fit in the horizontal direction is realized.
The supporting bottom plate is provided with a lower flange for placing a quartz bell jar, and the lower flange is fixedly arranged with the supporting bottom plate through a pillar.
The positioning device comprises a longitudinal positioning mechanism and a horizontal positioning mechanism;
the longitudinal positioning mechanism comprises a position sensor fixedly arranged on the rack and is used for measuring the longitudinal position of the quartz bell jar in real time;
the horizontal positioning mechanism comprises a positioning block arranged on the guide seat, the positioning block is provided with a positioning hole, and the positioning hole is matched and positioned with a spring positioning pin arranged on the supporting base plate.
And a sealing ring is arranged at the joint of the quartz bell jar and the lower flange.
And two bottom cross beams are fixedly arranged on the rack, and two ends of each bottom cross beam are provided with corresponding ball screws.
The invention has the beneficial effects that:
1) according to the microwave plasma chemical vapor deposition device placing and sampling system, the lifting placing and taking mechanism, the supporting seat and the supporting bottom plate which is horizontally matched with the supporting seat in a sliding mode are structurally arranged, so that the operation space is not limited in the process of placing and sampling, the supporting bottom plate only needs to be pulled and pulled in the horizontal direction, the quartz bell jar placed above the supporting bottom plate is horizontally pulled out to the position without shielding, the process of placing and sampling is simple and free of obstruction, and the condition that the quartz bell jar is damaged due to the limited operation space can be effectively avoided;
2) the positioning device can be used for detecting the position of the quartz bell jar and comprises a longitudinal positioning mechanism and a horizontal positioning mechanism; the longitudinal positioning mechanism can measure the longitudinal position of the quartz bell jar in real time when the quartz bell jar enters the resonant cavity, so that collision is avoided; and the horizontal positioning mechanism realizes the positioning of the drawing support base plate in the horizontal movement direction through the spring positioning pin arranged on the support base plate and the positioning block and the positioning hole arranged on the guide seat, so that the lofting and sampling processes are accurate and simple.
Drawings
FIG. 1 is a perspective view of the present invention;
fig. 2 is a front view of the present invention.
Detailed Description
The following description of the embodiments of the present invention is provided for illustrative purposes, and other advantages and effects of the present invention will become apparent to those skilled in the art from the present disclosure.
The invention provides a microwave plasma chemical vapor deposition device placing and sampling system, which is shown in figure 1 and figure 2. The microwave plasma chemical vapor deposition device lofting and sampling system comprises a frame 16 and a lifting lofting mechanism; the top of frame is erect and is equipped with upper plate 1, resonant cavity 2 and elevating gear, and upper plate 1 is last to be opened there is the through-hole, and elevating gear sets firmly on upper plate 1, and resonant cavity 2 lays in the through-hole department of upper plate 1.
The lifting, placing and taking mechanism comprises a supporting seat and a supporting bottom plate 10 arranged on the supporting seat, and the supporting bottom plate 10 is in sliding fit with the supporting seat along the horizontal direction.
A quartz bell jar 3 for placing deposits is also arranged above the supporting bottom plate 10, the quartz bell jar 3 is drawn along with the supporting bottom plate 10 along the horizontal direction, and the quartz bell jar 3 is lifted along with the supporting bottom plate 10 along the vertical direction. In this embodiment, the support base plate 10 is provided with a lower flange 5 for placing the quartz bell jar 3, and the lower flange 5 is fixedly connected with the support base plate 10 through a pillar 11. Correspondingly, a sealing ring is arranged on the quartz bell jar 3 to isolate the inside of the quartz bell jar 3 from air, and plasma is excited and generated in the inside of the quartz bell jar 3.
The lifting device comprises a lifting motor 25, a commutator, a ball screw 6 and a screw nut 14, and the lifting motor 25 is in control connection with the ball screw 6 through the commutator to realize lifting adjustment of the support base plate 10; the frame 16 is also provided with a positioning device 4 for detecting the position of the quartz bell jar 3, preferably comprising a longitudinal positioning mechanism and a horizontal positioning mechanism. The longitudinal positioning mechanism comprises a position sensor fixedly arranged on the frame, and is used for measuring the longitudinal position of the quartz bell jar in real time when the quartz bell jar 3 enters the resonant cavity 2; the horizontal positioning mechanism comprises a spring positioning pin 12 arranged on the support base plate 10, a positioning block 19 is arranged on the guide seat, a positioning hole is formed in the positioning block 19, and the spring positioning pin 12 is matched with the positioning hole for positioning so as to realize positioning of the pull support base plate 10 in the horizontal movement direction.
The ball screw 6 is arranged along vertical symmetry, the lower end part of the ball screw 6 penetrates through the supporting seat to be matched with the screw nut 14, the non-end part of the ball screw 6 is rotationally connected with the bearing seat 15 fixedly arranged on the bottom cross beam 20 of the rack 16, the top end part of the ball screw 6 is connected with the commutator, and the rotary motion of the lifting motor 25 is converted into linear motion. Preferably, the bottom cross beam 20 is fixedly arranged on the frame 16, two bottom cross beams 20 are arranged, and two ends of each bottom cross beam 20 are provided with corresponding ball screws 6, so that the quartz bell jar 3 placed on the supporting bottom plate 10 can be lifted stably.
Guide seats distributed along the horizontal direction are symmetrically arranged on two sides of the supporting seat, and guide rails matched with the guide seats are symmetrically arranged on two sides of the supporting bottom plate 10 to realize sliding fit in the horizontal direction; in this embodiment, the guide rails and the guide seats are slidably engaged, outer guide blocks 7 are symmetrically arranged on the inner side of the ball screw 6 on the cross beam 9, outer guide rails 18 are arranged on the inner sides of the outer guide blocks 7, inner guide blocks 8 and inner guide rails 17 are correspondingly arranged on two sides of the support base plate 10, and the inner guide rails 17 are slidably engaged with the outer guide rails 18.
In actual installation, according to requirements, the commutator comprises a three-way commutator and a two-way commutator, cushion blocks 21 are arranged below the three-way commutator and the two-way commutator, and the bottoms of the cushion blocks 21 are connected with the bottom plate 1; the three-way commutator is arranged between two end parts of the lifting device, the power of the lifting motor 25 is transmitted to the two-way commutator and the vertical ball screw 6, the two-way commutator is arranged at the end part of the lifting device and is connected with the horizontal shaft rod 23 of the transmission structure and the vertical ball screw 6, the power in the horizontal direction is transmitted to the vertical ball screw 6, and the shaft rod 23 of the transmission structure is connected with each part through the shaft coupling 24.
After the device is checked and confirmed to be error-free, a carrier to be deposited and a deposition table are placed at a specified position on the lower flange 5, and diamond deposition is carried out.
Firstly, lofting process:
1. after the spring positioning pin 12 is pulled up, the supporting base plate 10 is pulled out manually, and components such as the quartz bell jar 3, the lower flange 5 and the like are pulled to the maximum distance;
2. taking down the quartz bell jar 3, and cleaning the sealing position of the quartz bell jar 3 and the lower flange 5;
3. placing the prepared deposition table and deposition carrier at the designated position of the lower flange 5;
4. placing a quartz bell jar 3 at a designated position on a lower flange 5, and buckling a deposition table and a deposition carrier in the quartz bell jar;
5. pushing the supporting base plate 10 to the target position by hand, and checking whether the spring positioning pin 12 enters the positioning block 19;
6. controlling a lifting motor 25 to lift the components such as the quartz bell jar 3 to a target height, and accurately measuring the height of the components in real time by using a positioning device 4;
7. and (5) after lofting is finished, carrying out subsequent operation.
After the lofting is finished, the equipment enters a normal working stage, and after the growth of the product is finished, sampling operation is carried out.
II, sampling process:
1. controlling the lifting motor 25 to lower the components such as the quartz bell jar 3 and the like to the lowest position;
2. after the spring positioning pin 12 is pulled up, the supporting base plate 10 is pulled out manually, and components such as the quartz bell jar 3, the lower flange 5 and the like are pulled to the maximum distance;
3. taking the quartz bell jar 3 down and taking out the deposition table;
4. cleaning the sealing position of the quartz bell jar 3 and the lower flange 5;
4. placing the quartz bell jar 3 at a designated position on the lower flange 5;
5. pushing the supporting base plate 10 to the target position by hand in the horizontal direction, and checking whether the spring positioning pin 12 enters the positioning hole on the positioning block 19;
6. and finishing sampling.
This sampling system is put to microwave plasma chemical vapor deposition device puts through going up and down and gets mechanism, supporting seat and with the setting of supporting seat horizontal sliding fit's supporting baseplate 10 for operation space is no longer restricted among lofting, the sampling process, along horizontal direction pull supporting baseplate 10 can, lofting, the simple easy operation of sampling process can effectually avoid leading to damaging the emergence of the 3 circumstances of quartz bell jar owing to operation space is limited.
Where the words "first", "second", etc. are used in this patent to define parts, those skilled in the art will recognize that: the use of "first" and "second" is merely for convenience in describing the invention and to simplify the description, and the words are not intended to have a special meaning.
The foregoing shows and describes the general principles, essential features, and advantages of the invention. It will be understood by those skilled in the art that the present invention is not limited to the embodiments described above, which are given by way of illustration of the principles of the present invention, and that various changes and modifications may be made without departing from the spirit and scope of the invention as defined by the appended claims. The scope of the invention is defined by the appended claims and equivalents.
In the description of the present invention, it is to be understood that the terms "front", "rear", "left", "right", "center", etc., indicate orientations or positional relationships based on those shown in the drawings, and are used only for convenience in describing the present invention and for simplicity in description, but do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus, are not to be construed as limiting the scope of the present invention.
Claims (4)
1. The utility model provides a microwave plasma chemical vapor deposition device lofting system which characterized in that: comprises a frame and a lifting placing and taking mechanism; the top of the frame is provided with an upper bottom plate, a resonant cavity and a lifting device, the upper bottom plate is provided with a through hole, the lifting device is fixedly arranged on the upper bottom plate, and the resonant cavity is arranged at the through hole of the upper bottom plate; the lifting placing and taking mechanism comprises a supporting seat and a supporting bottom plate arranged on the supporting seat, and the supporting bottom plate is in sliding fit with the supporting seat along the horizontal direction; a quartz bell jar for placing sediments is further arranged above the supporting bottom plate, the quartz bell jar is pulled along with the supporting bottom plate along the horizontal direction, and the quartz bell jar is lifted along with the supporting bottom plate along the vertical direction; the frame is also provided with a positioning device for detecting the position of the quartz bell jar, the lifting device comprises a lifting motor, a commutator, a ball screw and a screw nut, and the lifting motor is in control connection with the ball screw through the commutator; the ball screw is arranged vertically and symmetrically, the lower end part of the ball screw penetrates through the supporting seat and is matched with the screw nut, the tail end part of the ball screw is rotationally connected with a bearing seat fixedly arranged on the rack, the top end part of the ball screw is connected with the commutator to convert the rotary motion of the lifting motor into linear motion, guide seats arranged along the horizontal direction are symmetrically arranged on two sides of the supporting seat, guide rails matched with the guide seats are symmetrically arranged on two sides of the supporting bottom plate to realize sliding fit in the horizontal direction, and the positioning device comprises a longitudinal positioning mechanism and a horizontal positioning mechanism; the longitudinal positioning mechanism comprises a position sensor fixedly arranged on the rack and is used for measuring the longitudinal position of the quartz bell jar in real time; the horizontal positioning mechanism comprises a positioning block arranged on the guide seat, the positioning block is provided with a positioning hole, and the positioning hole is matched and positioned with a spring positioning pin arranged on the supporting base plate.
2. A microwave plasma chemical vapor deposition apparatus lofting system according to claim 1, wherein: the supporting bottom plate is provided with a lower flange for placing a quartz bell jar, and the lower flange is fixedly arranged with the supporting bottom plate through a pillar.
3. A microwave plasma chemical vapor deposition apparatus lofting system according to claim 2, wherein: and a sealing ring is arranged at the joint of the quartz bell jar and the lower flange.
4. A microwave plasma chemical vapor deposition apparatus lofting system according to claim 1, wherein: and two bottom cross beams are fixedly arranged on the rack, and two ends of each bottom cross beam are provided with corresponding ball screws.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910181537.5A CN109868461B (en) | 2019-03-11 | 2019-03-11 | Sampling system is put to microwave plasma chemistry vapour deposition device |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201910181537.5A CN109868461B (en) | 2019-03-11 | 2019-03-11 | Sampling system is put to microwave plasma chemistry vapour deposition device |
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| CN109868461B true CN109868461B (en) | 2021-01-22 |
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| CN110804732B (en) * | 2019-06-17 | 2021-09-17 | 湖上产业发展集团有限公司 | Plasma CVD apparatus |
| CN114672790B (en) * | 2022-04-06 | 2022-11-11 | 广东熹钻技术有限公司 | Microwave plasma chemical vapor deposition system |
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| CN201165463Y (en) * | 2007-12-17 | 2008-12-17 | 中国电子科技集团公司第四十八研究所 | Vertical lifting and moving mechanism of major diameter cylindrical vacuum bell glass bell glass |
| CN101525742A (en) * | 2009-04-20 | 2009-09-09 | 南京大学 | Method for sample loading, sampling and sample transferring of chemical vapor deposition material growing equipment |
| CN204138761U (en) * | 2014-08-28 | 2015-02-04 | 湖南红太阳光电科技有限公司 | A kind of automatic controls for fire door |
| CN205024352U (en) * | 2015-08-18 | 2016-02-10 | 浙江工商职业技术学院 | Long brilliant equipment of sapphire |
| CN205556760U (en) * | 2016-03-21 | 2016-09-07 | 上海福宜真空设备有限公司 | Lift turning position device |
| CN107946226B (en) * | 2017-12-25 | 2020-12-04 | 中国电子科技集团公司第四十八研究所 | Mechanical battery piece positioning platform |
| CN108624870B (en) * | 2018-07-05 | 2023-07-28 | 成都纽曼和瑞微波技术有限公司 | Tunable round-parabolic cavity type high-power microwave plasma chemical vapor deposition device |
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Effective date of registration: 20231208 Address after: 450001 121, Wutong street, Zhengzhou high tech Development Zone, Henan Patentee after: ZHENGZHOU RESEARCH INSTITUTE FOR ABRASIVES & GRINDING Co.,Ltd. Patentee after: Jinggong Ruiyi Technology (Henan) Co.,Ltd. Address before: 450001 121 Wutong street, Zhengzhou new and high tech Zone, Henan Patentee before: ZHENGZHOU RESEARCH INSTITUTE FOR ABRASIVES & GRINDING Co.,Ltd. |
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