CN109868461A - A kind of microwave plasma CVD device puts sampling system - Google Patents
A kind of microwave plasma CVD device puts sampling system Download PDFInfo
- Publication number
- CN109868461A CN109868461A CN201910181537.5A CN201910181537A CN109868461A CN 109868461 A CN109868461 A CN 109868461A CN 201910181537 A CN201910181537 A CN 201910181537A CN 109868461 A CN109868461 A CN 109868461A
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- Prior art keywords
- bell cover
- support baseboard
- quartz bell
- plasma cvd
- lifting
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- 238000005070 sampling Methods 0.000 title claims abstract description 28
- 238000005268 plasma chemical vapour deposition Methods 0.000 title claims abstract description 19
- 239000010453 quartz Substances 0.000 claims abstract description 68
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 68
- 230000007246 mechanism Effects 0.000 claims abstract description 20
- 238000007789 sealing Methods 0.000 claims description 7
- 230000033001 locomotion Effects 0.000 claims description 6
- 238000005259 measurement Methods 0.000 claims description 5
- 238000000034 method Methods 0.000 abstract description 15
- 230000008569 process Effects 0.000 abstract description 13
- 238000000151 deposition Methods 0.000 description 8
- 230000008021 deposition Effects 0.000 description 8
- 239000010432 diamond Substances 0.000 description 5
- 229910003460 diamond Inorganic materials 0.000 description 4
- 238000001816 cooling Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005234 chemical deposition Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 230000003670 easy-to-clean Effects 0.000 description 1
- 230000005518 electrochemistry Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000007514 turning Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Abstract
A kind of microwave plasma CVD device puts sampling system, including rack and lifting take mechanism, and lifting takes the support baseboard that mechanism includes support base and is placed on support base, and support baseboard is slidably matched in the horizontal direction with support base；It is additionally provided with the quartz bell cover for placing deposit above support baseboard, realizes lifting of the quartz bell cover with support baseboard in the vertical direction；The positioning device for detecting quartz bell cover position is additionally provided in rack.The microwave plasma CVD device puts sampling system, the structure laying of mechanism, support base and the support baseboard being slidably matched with support base level is taken by going up and down, make that setting-out, operating space is no longer restricted in sampling process, setting-out, sampling process are simply without prejudice, can effectively avoid the occurrence of causing to damage quartz bell cover since operating space is limited.
Description
Technical field
The invention belongs to microwave plasma chemical gas phase deposition technology field, in particular to a kind of microwave plasma chemical
Vapor phase growing apparatus puts sampling system.
Background technique
Diamond has high hardness, broad stopband, high-breakdown-voltage, high carrier mobility, high heat conductance, Gao Huaxue
The features such as stability, high optical transmission, has very in fields such as semiconductor, electrochemistry, optics, calorifics, Ultra-precision Turnings
Good application prospect.Existing diamond has been widely used in bullion field, and has resulted in natural diamond market
Certain impact.
Microwave current plasma chemical vapor deposition is to prepare excellent diamonds product most efficient method, Gao Gong
Rate quartz bell cover type micro-wave plasma chemical deposition equipment has reaction chamber easy to clean, and quartz bell cover replacement is convenient, plasma
The advantages that body status adjustment is convenient, such equipment are being widely used.
Biggish depositional area and reduce plasma to the etching of quartz bell cover in order to obtain, the size of quartz bell cover compared with
Greatly, the water-cooling flange and the isostructural volume and weight of water cooling base station being used cooperatively therewith with quartz bell cover also will be bigger than normal；Simultaneously
The plasma of perfect condition in order to obtain, quartz bell cover will be realized accurate adjustable in the internal height of resonant cavity.Traditional hangs down
Go straight up to drop and take spline structure, have the characteristics that operating space it is limited, it is inconvenient for use it is prompt, production efficiency is low, quartz bell cover easy to damage,
It is extremely inconvenient in the actual use process, there is damage quartz bell cover risk since space is limited during taking sample.
Chinese invention patent " a kind of quartz bell cover for microwave plasma CVD device " (patent No.:
CN105525274A a kind of quartz bell cover for microwave plasma CVD device, the quartz clock) are disclosed
Cover, is lower end cylindrical tube, and upper end is the hemispherical sealing with multiple quartzy annulus；The quartz annulus is in horizontal array point
It is distributed in the middle and lower part of hemispherical sealing, and the outer diameter of quartzy annulus is identical as the outer diameter of cylindrical tube, is adding air-cooled condition outside
Under, which plays the role of increasing heat dissipation；However in actual use, although being able to ascend the heat radiation energy of quartz bell cover
Power reduces the temperature of quartz bell cover, but the victory limited, inconvenient for use to its operating space, quartz bell cover easy to damage.
Chinese invention patent " a kind of Double-exhaust flat-plate epitaxial furnace " (patent No.: CN102618921B) discloses a kind of double
It is vented flat epitaxial furnace, including quartz bell cover (1) and bottom plate (15), bottom plate (15) upper end is equipped with quartz bell cover (1), quartz
The upper center of bell jar (1) is provided with a quartz flange interface (2), and the upper end of quartz flange interface (2) is by flange (3) and not
Rust steel exhaust pipe (4) is connected, and stainless steel exhaust pipe (4) is connected with power motor (10), flange (3) and power motor (10) it
Between be equipped with pneumatic operated valve (5), pneumatic operated valve (5) is connected with the solenoid valve (6) on right side, position sensor (8) pass through conducting wire and electromagnetism
Valve (6) is connected, and clock switch (7) are equipped among conducting wire between position sensor (8) and solenoid valve (6)；Inventive structure letter
It is single, using dual exhaust system, the high grain density atmosphere vacuum inside bell jar can be discharged, by the toilet of low grain density
Atmosphere introduces, to obtain relatively clean epitaxial growth environment, but the placement to quartz bell cover, in the actual use process
It is extremely inconvenient, there is damage quartz bell cover risk during taking sample.
Summary of the invention
The purpose of the present invention is in view of the above shortcomings of the prior art, provide a kind of microwave plasma CVD
Device puts sampling system, realizes that drawing and pulling type takes sample, and process is simple and convenient, and effectively avoids damage quartz bell cover.
In order to solve the above technical problems, the technical solution adopted by the present invention is that:
A kind of microwave plasma CVD device puts sampling system, including rack and lifting take mechanism；
The top shelf of rack is equipped with upper plate, resonant cavity and lifting device, is provided with through-hole on upper plate, and lifting device is fixedly arranged on
On upper plate, resonant cavity is laid in the through hole of upper plate；
Lifting takes the support baseboard that mechanism includes support base and is placed on support base, and support baseboard and support base are along level side
To being slidably matched；
The quartz bell cover for placing deposit is additionally provided with above support baseboard, quartz bell cover companion support baseboard is in the horizontal direction
Pull, and realize the lifting of quartz bell cover in the vertical direction with support baseboard；
The positioning device for detecting quartz bell cover position is additionally provided in rack.
The lifting device includes lifting motor, commutator, ball screw and feed screw nut, and lifting motor passes through commutation
Device and ball screw control connect；
Ball screw is vertically symmetrical arranged and its lower end passes through support base and is cooperated with feed screw nut, the end of ball screw
Portion is rotatablely connected with the bearing block being fixedly arranged in rack, and the top end part of ball screw is connect with commutator, by returning for lifting motor
Transhipment turn turns to linear motion.
The two sides of the support base are symmetrically arranged with the guide bracket laid in the horizontal direction, the two sides of support baseboard be symmetrically arranged with
The guide rail of guide bracket cooperation, realizes being slidably matched for horizontal direction.
The support baseboard is equipped with the lower flange for placing quartz bell cover, and lower flange passes through pillar and support baseboard
It is fixed.
The positioning device includes vertical location device and level locating mechanism；
The vertical location device includes the position sensor being fixedly arranged in rack, longitudinal position for real-time measurement quartz bell cover
It sets；
The level locating mechanism includes the locating piece being arranged on guide bracket, and location hole is offered on locating piece, location hole with
The spring holder cooperation positioning being arranged on support baseboard.
The junction of the quartz bell cover and lower flange is equipped with sealing ring.
Bottom cross beam is installed in the rack, and bottom cross beam is equipped with two, the both ends of every foundation crossbeam are equipped with accordingly
Ball screw.
The beneficial effects of the present invention are:
1) microwave plasma CVD device puts sampling system, by lifting take mechanism, support base and with
The structure of the support baseboard that support base level is slidably matched is laid, and makes that setting-out, operating space is no longer restricted in sampling process, only
Pull support baseboard in the horizontal direction is needed, it is unobstructed that the quartz bell cover level for being placed on above support baseboard is drawn to top
Place, setting-out, sampling process are simply without prejudice, can effectively avoid causing to damage quartz bell cover situation since operating space is limited
Generation；
2) by setting positioning device, can be used in detect quartz bell cover position, and positioning device include vertical location device and
Level locating mechanism；Vertical location device can be when quartz bell cover enters intra resonant cavity, and real-time measurement quartz bell cover is indulged
To position, avoid colliding；And level locating mechanism is on support baseboard by being equipped with spring holder, and on guide bracket
The locating piece and location hole of arranging realize positioning of the pull support baseboard in horizontal movement direction, so that setting-out, sampling process
Precision is simplified.
Detailed description of the invention
Fig. 1 is perspective view of the invention；
Fig. 2 is main view of the invention.
Specific embodiment
Embodiments of the present invention are illustrated by particular specific embodiment below, those skilled in the art can be by this explanation
Content disclosed by book is understood other advantages and efficacy of the present invention easily.
The present invention provides a kind of microwave plasma CVD devices to put sampling system, such as Fig. 1 and Fig. 2 institute
Show.The microwave plasma CVD device puts sampling system, including rack 16 and lifting take mechanism；The top of rack
Portion is provided with upper plate 1, resonant cavity 2 and lifting device, through-hole is provided on upper plate 1, and lifting device is fixedly arranged on upper plate 1
On, resonant cavity 2 is laid in the through hole of upper plate 1.
It includes support base and the support baseboard being placed on support base 10 that lifting, which takes mechanism, and support baseboard 10 and support base
It is slidably matched in the horizontal direction.
The quartz bell cover 3 for placing deposit is additionally provided with above support baseboard 10, quartz bell cover 3 is in company with support baseboard 10
Pull in the horizontal direction, and realize the lifting of quartz bell cover 3 in the vertical direction with support baseboard 10.In the present embodiment, institute
Support baseboard 10 is stated equipped with the lower flange 5 for placing quartz bell cover 3, and lower flange 5 passes through pillar 11 and support baseboard 10
It is fixed.Correspondingly, being equipped with sealing ring on quartz bell cover 3,3 inside of quartz bell cover is isolated with air, plasma exists
Its internal excitation and generation.
The lifting device includes lifting motor 25, commutator and ball screw 6 and feed screw nut 14, and lifting motor
25 are connected by commutator and the control of ball screw 6, realize the lift adjustment to support baseboard 10；It is additionally provided with and is used in rack 16
Detect the positioning device 4 of 3 position of quartz bell cover, it is preferred that the positioning device includes vertical location device and horizontal location machine
Structure.Vertical location device includes the position sensor being fixedly arranged in rack, when quartz bell cover 3 enters 2 inside of resonant cavity, is used for
The lengthwise position of real-time measurement quartz bell cover；Level locating mechanism includes that spring holder 12 is equipped on support baseboard 10, is led
Seat is equipped with locating piece 19, and location hole is offered on locating piece 19, and spring holder 12 and location hole cooperation position, and realizes and takes out
Draw positioning of the support baseboard 10 in horizontal movement direction.
Ball screw 6 is vertically symmetrical arranged, and lower end passes through support base and feed screw nut 14 cooperates, ball screw 6
Vertically be symmetrical arranged and its lower end pass through support base and feed screw nut 14 and cooperates, the non-end of ball screw 6 be fixedly arranged on
Bearing block 15 on the bottom cross beam 20 of rack 16 is rotatablely connected, and the top end part of ball screw 6 is connect with commutator, by lifting motor
25 rotary motion is converted into linear motion.Preferably, bottom cross beam 20 is installed in rack 16, and bottom cross beam 20 is equipped with two,
The both ends of every foundation crossbeam 20 are equipped with corresponding ball screw 6, enable the quartz bell cover 3 being placed on support baseboard 10
Smoothly lifting.
The two sides of the support base are symmetrically arranged with the guide bracket laid in the horizontal direction, and the two sides of support baseboard 10 are symmetrically arranged with
With the guide rail of guide bracket cooperation, being slidably matched for horizontal direction is realized；In the present embodiment, being slidably matched for guide rail and guide bracket passes through
Outer guide 18, support are equipped on the inside of the fixed outer guide block 7 symmetrically laid in the inside of ball screw 6, outer guide block 7 on crossbeam 9
The two sides of bottom plate 10 are equipped with interior guide block 8 and interior guide rail 17 accordingly, and interior guide rail 17 is slidably matched with outer guide 18.
In actual installation, according to demand, commutator includes three-dimensional commutator and two-way commutator, three-dimensional commutator and double
It is equipped with cushion block 21 below to commutator, the bottom of cushion block 21 is connect with bottom plate 1；The arrangement of three-dimensional commutator is placed in lifting device
Between both ends, the power of lifting motor 25 is propagated to two-way commutator and the equal components of vertical ball screw 6, two-way commutation
Device is placed in the end of lifting device, connect with the shaft 23 of drive mechanism level and vertical ball screw 6, by horizontal direction
Power pass to vertical ball screw 6, and the shaft 23 of drive mechanism is attached with each component by shaft coupling 24.
After device complete machine inspection confirmation is errorless, the carrier and deposition table that will be deposited are put into designated position on lower flange 5
Place, carries out the deposition of diamond, working principle and the process for putting sampling system are specific as follows.
One, setting-out process:
1. after spring holder 12 is pulled up, being manually pulled out support baseboard 10, the components such as quartz bell cover 3, lower flange 5 are drawn to
Maximum distance；
2. quartz bell cover 3 is removed, and clear up at 5 sealing of quartz bell cover 3 and lower flange；
3. in advance ready deposition table and deposition vehicle are placed in the specified place of lower flange 5；
4. quartz bell cover 3 is placed in the specified location on lower flange 5, deposition table and deposition vehicle are buckled in quartz bell cover
It is interior；
5. moving support baseboard 10 to target position with hand push, and check whether spring holder 12 enters in locating piece 19；
6. control lifting motor 25 to promote the equal components of quartz bell cover 3 to object height, and with the accurate real-time measurement of positioning device 4
Its height；
7. setting-out terminates, subsequent operation is carried out.
After setting-out, equipment, which will enter normal working stage, will be sampled operation after growing to product.
Two, sampling process:
The components such as quartz bell cover 3 are reduced to extreme lower position 1. controlling lifting motor 25；
2. after spring holder 12 is pulled up, being manually pulled out support baseboard 10, the components such as quartz bell cover 3, lower flange 5 are drawn to
Maximum distance；
3. quartz bell cover 3 is removed, deposition table is taken out；
4. clearing up at quartz bell cover 3 and 5 sealing of lower flange；
4. quartz bell cover 3 is placed in the specified location on lower flange 5；
5. moving support baseboard 10 to target position with hand push in horizontal direction, and check whether spring holder 12 enters locating piece
Positioning hole on 19；
6. sampling terminates.
The microwave plasma CVD device puts sampling system, by lifting take mechanism, support base and
The setting for the support baseboard 10 being slidably matched with support base level, so that operating space is no longer restricted in setting-out, sampling process,
Pull support baseboard 10 in the horizontal direction, setting-out, sampling process are simple to operation, can effectively avoid due to operating space
It is limited and cause damage quartz bell cover 3 the occurrence of.
The words such as " first ", " second " have been used in this patent come if limiting components, those skilled in the art should
Know: the use of " first ", " second " is intended merely to facilitate the description present invention and simplifies description, and there is no special for above-mentioned word
Meaning.
The basic principles, main features and advantages of the present invention have been shown and described above.The technology of the industry
Personnel are it should be appreciated that the present invention is not limited to the above embodiments, and the above embodiments and description only describe this
The principle of invention, various changes and improvements may be made to the invention without departing from the spirit and scope of the present invention, these changes
Change and improvement is both fallen within the scope of claimed invention.The claimed scope of the invention is by appended claims and is equal
Object defines.
In the description of the present invention, it is to be understood that, term "front", "rear", "left", "right", "center", etc. instructions
Orientation or positional relationship is to be based on the orientation or positional relationship shown in the drawings, and is only that the present invention is described with simplified for ease of description,
Rather than indicate or imply signified device or element and must have a particular orientation, construct and operate for specific orientation, because
And it should not be understood as the limitation to present invention protection content.
Claims (7)
1. a kind of microwave plasma CVD device puts sampling system, it is characterised in that: put including rack and lifting
Take mechanism；
The top shelf of rack is equipped with upper plate, resonant cavity and lifting device, is provided with through-hole on upper plate, and lifting device is fixedly arranged on
On upper plate, resonant cavity is laid in the through hole of upper plate；
Lifting takes the support baseboard that mechanism includes support base and is placed on support base, and support baseboard and support base are along level side
To being slidably matched；
The quartz bell cover for placing deposit is additionally provided with above support baseboard, quartz bell cover companion support baseboard is in the horizontal direction
Pull, and realize the lifting of quartz bell cover in the vertical direction with support baseboard；
The positioning device for detecting quartz bell cover position is additionally provided in rack.
2. a kind of microwave plasma CVD device according to claim 1 puts sampling system, feature exists
In: the lifting device include lifting motor, commutator, ball screw and feed screw nut, and lifting motor by commutator with
Ball screw control connection；
Ball screw is vertically symmetrical arranged and its lower end passes through support base and is cooperated with feed screw nut, the end of ball screw
Portion is rotatablely connected with the bearing block being fixedly arranged in rack, and the top end part of ball screw is connect with commutator, by returning for lifting motor
Transhipment turn turns to linear motion.
3. a kind of microwave plasma CVD device according to claim 2 puts sampling system, feature exists
In: the two sides of the support base are symmetrically arranged with the guide bracket laid in the horizontal direction, and the two sides of support baseboard are symmetrically arranged with and guide bracket
The guide rail of cooperation realizes being slidably matched for horizontal direction.
4. a kind of microwave plasma CVD device according to claim 2 puts sampling system, feature exists
In: the support baseboard is equipped with the lower flange for placing quartz bell cover, and lower flange is fixed by pillar and support baseboard.
5. a kind of microwave plasma CVD device according to claim 3 puts sampling system, feature exists
In: the positioning device includes vertical location device and level locating mechanism；
The vertical location device includes the position sensor being fixedly arranged in rack, longitudinal position for real-time measurement quartz bell cover
It sets；
The level locating mechanism includes the locating piece being arranged on guide bracket, and location hole is offered on locating piece, location hole with
The spring holder cooperation positioning being arranged on support baseboard.
6. a kind of microwave plasma CVD device according to claim 4 puts sampling system, feature exists
In: the junction of the quartz bell cover and lower flange is equipped with sealing ring.
7. a kind of microwave plasma CVD device according to claim 2 puts sampling system, feature exists
In: bottom cross beam is installed in the rack, and bottom cross beam is equipped with two, the both ends of every foundation crossbeam are equipped with corresponding ball wire
Bar.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910181537.5A CN109868461B (en) | 2019-03-11 | 2019-03-11 | Sampling system is put to microwave plasma chemistry vapour deposition device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910181537.5A CN109868461B (en) | 2019-03-11 | 2019-03-11 | Sampling system is put to microwave plasma chemistry vapour deposition device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN109868461A true CN109868461A (en) | 2019-06-11 |
| CN109868461B CN109868461B (en) | 2021-01-22 |
Family
ID=66920134
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910181537.5A Active CN109868461B (en) | 2019-03-11 | 2019-03-11 | Sampling system is put to microwave plasma chemistry vapour deposition device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN109868461B (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110804732A (en) * | 2019-06-17 | 2020-02-18 | 湖上产业发展集团有限公司 | Plasma CVD apparatus |
| CN114672790A (en) * | 2022-04-06 | 2022-06-28 | 广东熹钻技术有限公司 | Microwave plasma chemical vapor deposition system |
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|---|---|---|---|---|
| CN201165463Y (en) * | 2007-12-17 | 2008-12-17 | 中国电子科技集团公司第四十八研究所 | Vertical lifting and moving mechanism of major diameter cylindrical vacuum bell glass bell glass |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110804732A (en) * | 2019-06-17 | 2020-02-18 | 湖上产业发展集团有限公司 | Plasma CVD apparatus |
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| CN114672790A (en) * | 2022-04-06 | 2022-06-28 | 广东熹钻技术有限公司 | Microwave plasma chemical vapor deposition system |
Also Published As
| Publication number | Publication date |
|---|---|
| CN109868461B (en) | 2021-01-22 |
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Effective date of registration: 20231208 Address after: 450001 121, Wutong street, Zhengzhou high tech Development Zone, Henan Patentee after: ZHENGZHOU RESEARCH INSTITUTE FOR ABRASIVES & GRINDING Co.,Ltd. Patentee after: Jinggong Ruiyi Technology (Henan) Co.,Ltd. Address before: 450001 121 Wutong street, Zhengzhou new and high tech Zone, Henan Patentee before: ZHENGZHOU RESEARCH INSTITUTE FOR ABRASIVES & GRINDING Co.,Ltd. |
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