CN109856929B - Signal processing device and processing method, alignment system and alignment method and photoetching machine - Google Patents
Signal processing device and processing method, alignment system and alignment method and photoetching machine Download PDFInfo
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Abstract
The invention provides a signal processing device with phase compensation, comprising: the signal acquisition module is used for acquiring actual working signals; the signal simulation module is used for simulating working signals with any frequency and amplitude, and the signals obtained through simulation are defined as detection signals; the signal processing module is optionally connected with the signal acquisition module and the signal simulation module and is used for conditioning and sampling the received signals; the phase difference detection module is respectively connected with the signal simulation module and the signal processing module and is used for detecting the phase difference between the detection signals before and after being processed by the signal processing module; and the output control module is connected with the phase difference detection module and the signal processing module, forms a phase difference compensation table and compensates the phase of the working signal processed by the signal processing module according to the phase compensation table. The invention provides a signal processing device and a processing method, an alignment system and an alignment method and a photoetching machine, which eliminate phase difference generated after different levels of light are mixed in signal processing.
Description
Technical Field
The present invention relates to the field of signal processing, and in particular, to a signal processing apparatus and a signal processing method, an alignment system and an alignment method, and a lithography machine.
Background
As shown in fig. 1, in the self-reference interference alignment system of the conventional lithography machine, the alignment system specifically includes a laser module, an optical imaging module, an electronic signal acquisition module, and a software module. The illumination light signal output by the laser module is converted into an alignment light signal through the optical imaging module, and the alignment light signal is converted into an alignment electric signal through the electronic signal acquisition module so as to be uploaded to the software module for data processing.
Wherein, the optical signal who inputs in the electronic signal acquisition module has contained 1-9 grades (to 16um periodic grating) grating frequency/amplitude composition, and its input signal intensity of using mathematical expression is:
wherein m represents the order, ωmRepresenting the angular frequency, A, produced by the scanning of the m-order light across the gratingmShowing the amplitude of m-order diffracted light,
Indicating the initial phase of the m-order light.
The silicon chip alignment system uses the stages 1, 3, 5, 7 and 9 to calculate the alignment position. These signals are shown in fig. 2, where the frequency of the signal is proportional to the order and the amplitude of the signal is inversely proportional to the square of the order.
The signals are mixed together and used as an input source, and the input source is input into the electronic signal acquisition module, conditioned and sampled and then transmitted to the software module. The signal processing procedure is shown in fig. 3. Because the input source comprises signals with different frequencies and different amplitudes, after the signals pass through the same signal conditioning circuit, the signals of each grade respectively generate energy A equal to the input signal energy A due to the existence of high-pass filtering and low-pass filteringiFrequency f of input signalmRelative phase difference αim。
In the practical use process of the silicon chip alignment system, due to the difference of silicon chip processes, input energy A of each leveliIs varied while the frequency f of the input signal ismVarying with the order, these variations result in different phase differences αimEventually, the alignment position is changed and the alignment effect is deteriorated.
Disclosure of Invention
An object of embodiments of the present invention is to provide a signal processing apparatus and a signal processing method, an alignment system and an alignment method, and a lithography machine, so as to solve the problem of different phase differences in a signal processing link due to different input light energies at different levels and different frequencies at different levels in the existing signal processing process.
In order to achieve the above object, an embodiment of the present invention provides a signal processing apparatus with phase compensation, including:
the signal acquisition module is configured to be used for acquiring actual working signals;
the signal simulation module is configured to simulate the working signal with any frequency and amplitude, and the simulated signal is defined as a detection signal;
the signal processing module is optionally connected with the signal acquisition module and the signal simulation module and is used for conditioning and sampling the received signals;
the phase difference detection module is respectively connected with the signal simulation module and the signal processing module and is configured to detect the phase difference between the detection signals before and after being processed by the signal processing module;
and the output control module is connected with the phase difference detection module and the signal processing module and is configured to form a phase difference compensation table containing phase difference information corresponding to the detection signals with a plurality of arbitrary frequencies and amplitudes and perform phase compensation on the actual working signals processed by the signal processing module according to the phase compensation table.
Further, the signal processing device further comprises a first switch configured to control on/off between the signal processing module and the signal simulation module and between the signal processing module and the signal acquisition module.
Furthermore, the signal processing device further comprises a second switch, and the second switch is respectively connected with the signal processing module, the phase difference detection module and the output control module and is configured to control on and off between the signal processing module and the output control module and between the phase difference detection module and the output control module.
Furthermore, the signal simulation module comprises a digital waveform generation module, a filter and a voltage-to-current unit, and the digital waveform generation module is connected with the voltage-to-current unit through the filter.
Furthermore, the digital waveform generating module comprises a digital waveform generating unit and a digital-to-analog converting unit, the filter comprises a low-pass filter, and the digital waveform generating unit is connected with the filter through the digital-to-analog converting unit.
Further, the phase difference detection module comprises a normalization module and a phase sensitive detector, the normalization module is configured to normalize the voltage signal provided by the signal simulation module, and the phase sensitive detector is connected with the normalization module and configured to detect and obtain the phase difference between the output signals of the signal processing module and the normalization module.
Furthermore, the normalization module comprises a peak detector and a divider, the input ends of the peak detector and the divider are both connected with the signal simulation module, the output end of the peak detector is connected with the input end of the divider, and the output end of the divider is connected with the phase sensitive detector.
Furthermore, the phase sensitive detector comprises a multiplier and a low-pass filter, the multiplier is respectively connected with the output ends of the normalization module and the signal processing module, and the output end of the multiplier is connected with the output control module through the low-pass filter.
Furthermore, the signal processing device further comprises a first analog-to-digital converter, an input end of the first analog-to-digital converter is connected with the second switch, and an output end of the first analog-to-digital converter is connected with the output control module.
Further, the phase difference detection module includes a square wave signal conversion unit, a second analog-to-digital converter, a third analog-to-digital converter and a comparison unit, the square wave signal conversion unit converts the detection signal into a square wave signal with the same frequency and amplitude, an input end of the second analog-to-digital converter is connected with an output end of the signal processing module, an input end of the third analog-to-digital converter is connected with the square wave signal conversion unit, and the comparison unit is respectively connected with output ends of the second analog-to-digital converter and the third analog-to-digital converter and is configured to compare a phase difference between output signals of the second analog-to-digital converter and the third analog-to-digital converter to obtain a phase difference between the detection signals before and after being processed by the signal processing module.
Furthermore, the signal processing module comprises a current-to-voltage conversion unit, a high-pass filter, a gain adjusting unit and a low-pass filter, the current-to-voltage conversion unit is connected with the high-pass filter, the gain adjusting unit and the low-pass filter in sequence, the current-to-voltage conversion unit is selectively connected with the signal acquisition module and the signal simulation module respectively, and the low-pass filter is connected with the output control module and the phase difference detection module respectively.
The embodiment of the invention also provides a self-reference interference alignment system which comprises the signal processing device and is used for processing and phase compensating the alignment signals of all diffraction orders used for alignment position calculation.
The embodiment of the invention also provides a photoetching machine which comprises the self-reference interference alignment system.
The embodiment of the invention also provides a signal processing method adopting the signal processing device with the phase compensation, which comprises the following steps:
detection mode: the signal processing module is selectively connected with the signal simulation module and disconnected with the signal acquisition module, so that a detection path comprising the signal simulation module, the signal processing module, the phase difference detection module and the output control module is conducted;
the signal simulation module simulates and generates a plurality of working signals with any frequency and amplitude, defines the simulated signals as detection signals and respectively sends the detection signals to the signal processing module and the phase difference detection module, the signal processing module conditions and samples the received signals, and the phase difference detection module detects the phase difference between the detection signals before and after being processed by the signal processing module and sends the phase difference to the output control module;
the output control module forms a phase difference compensation table according to phase differences corresponding to the detection signals with a plurality of arbitrary frequencies and amplitudes;
processing and compensation modes: the signal processing module is selectively connected with the signal acquisition module and disconnected with the signal simulation module, so that a working channel comprising the signal acquisition module, the signal processing module and the output control module is conducted;
the signal acquisition module acquires an actual working signal and sends the actual working signal to the signal processing module;
and the output control module performs phase compensation on the actual working signal processed by the signal processing module according to the phase compensation table.
Furthermore, a first switch is arranged on the detection passage and the working passage, and the on-off of the detection passage and the working passage is controlled through the first switch; the first switch is configured to control on and off between the signal processing module and the signal simulation module and between the signal processing module and the signal acquisition module.
Further, a second switch can be arranged on the detection path and the working path, and the second switch is respectively connected with the signal processing module, the phase difference detection module and the output control module and is configured to control the connection and disconnection between the signal processing module and the output control module and between the phase difference detection module and the output control module.
The embodiment of the invention also provides a self-reference interference alignment method, which is used for processing and phase compensation of alignment signals of each diffraction order for alignment position calculation by adopting the signal processing method.
The embodiment of the invention also provides a photoetching machine, which adopts the self-reference interference alignment method to carry out alignment, and when processing the alignment signals of a batch of silicon wafers with the same silicon wafer process, firstly adopts the detection mode to form or update the phase difference compensation table, and then adopts the processing and compensation mode to carry out processing and phase compensation on the alignment signals.
The embodiment of the invention provides a signal processing device and a processing method, an alignment system and an alignment method and a photoetching machine, wherein in a detection mode, a phase difference detection module is arranged to detect a first phase difference of a detection signal before and after the detection signal is processed by the signal processing module, then a phase difference compensation table is formed according to the first phase difference and frequency and amplitude information of the detection signal, in the processing and compensation mode, the phase difference compensation table is inquired according to the frequency and amplitude information of an actual working signal to obtain a corresponding second phase difference, phase compensation is carried out on the signal in the actual working process processed by the signal processing module according to the second phase difference, and the phase difference generated in a signal processing link after different levels of light are mixed in the signal processing process is eliminated.
Drawings
FIG. 1 is a schematic diagram of a prior art alignment system;
FIG. 2 is a waveform diagram of various levels of optical signals used for alignment position calculation in the prior art;
FIG. 3 is a schematic diagram of a signal acquisition module according to the prior art;
fig. 4 is a schematic structural diagram of a signal processing apparatus according to an embodiment of the present invention;
fig. 5 is a waveform diagram of each link in the signal processing apparatus according to the first embodiment of the present invention;
fig. 6 is a schematic structural diagram of a signal processing apparatus according to a third embodiment of the present invention.
In the figure, 300: signal processing module, 301: signal acquisition module, 302: current-to-voltage unit, 303: high-pass filter, 304: gain adjustment unit, 305: low-pass filter, 306: analog-to-digital converter, 400: signal processing module, 401: signal acquisition module, 402: first switch, 403: current-to-voltage unit, 404: high-pass filter, 405: gain adjustment unit, 406: low-pass filter, 407: second switch, 408: first analog-to-digital converter, 409: voltage-to-current unit, 410: digital waveform generation unit, 411: digital-to-analog conversion unit, 412: low-pass filter, 413: divider, 414: multiplier, 415: low pass filter, 416: peak detector, 600: signal processing module, 601: signal acquisition module, 602: third switch, 603: current-to-voltage unit, 604: high-pass filter, 605: gain adjustment unit, 606: low-pass filter, 607: second analog-to-digital converter, 608: digital-to-analog converter, 609: low-pass filter, 610: voltage-to-current unit, 611: square wave signal conversion unit, 612: and a third analog-to-digital converter.
Detailed Description
The following describes in more detail embodiments of the present invention with reference to the schematic drawings. Advantages and features of the present invention will become apparent from the following description and claims. It is to be noted that the drawings are in a very simplified form and are not to precise scale, which is merely for the purpose of facilitating and distinctly claiming the embodiments of the present invention.
Example one
As shown in fig. 4, an embodiment of the present invention provides a signal processing apparatus with phase compensation, including:
a signal acquisition module 401 configured to acquire an actual working signal;
the signal simulation module is configured to simulate and generate the working signal with any frequency and amplitude, and the simulated signal is defined as a detection signal;
a signal processing module 400, optionally connected to the signal acquisition module 401 and the signal simulation module, for conditioning and sampling the received signal;
a phase difference detection module respectively connected to the signal simulation module and the signal processing module 400, and configured to detect a phase difference between the detection signals before and after being processed by the signal processing module 400;
and an output control module (not shown) connected to the phase difference detection module and the signal processing module, and configured to form a phase difference compensation table including phase difference information corresponding to the detection signals with a plurality of arbitrary frequencies and amplitudes, and perform phase compensation on the actual working signal processed by the signal processing module according to the phase compensation table. In this embodiment, the signal processing apparatus further includes a first switch 402 configured to control on/off between the signal processing module 400 and the signal simulation module, and between the signal processing module 400 and the signal acquisition module 401.
Preferably, the switch module further includes a second switch 407, and the second switch 407 is respectively connected to the signal processing module 400, the phase difference detection module and the output control module, and is configured to control on/off between the signal processing module 400 and the output control module, and between the phase difference detection module and the output control module
In this embodiment, the signal simulation module includes a digital waveform generation module, a filter, and a voltage-to-current unit 409, and the digital waveform generation module is connected to the voltage-to-current unit 409 through the filter. Preferably, the digital waveform generating module includes a digital waveform generating unit 410 and a digital-to-analog converting unit 411, the filter includes a low-pass filter 412, and the digital waveform generating unit 410 is connected to the filter through the digital-to-analog converting unit 411. The digital waveform generating unit 410 is, for example, an FPGA, but is not limited thereto.
In this embodiment, the phase difference detection module includes a normalization module and a phase sensitive detector, the normalization module is configured to normalize the voltage signal provided by the signal simulation module, and the phase sensitive detector is connected to the normalization module and configured to detect and obtain the phase difference between the output signals of the signal processing module and the normalization module.
Further, the normalization module comprises a peak detector 416 and a divider 413, wherein the input ends of the peak detector 416 and the divider 413 are connected with the signal simulation module, the output end of the peak detector 416 is connected with the input end of the divider 413, and the output end of the divider 413 is connected with the phase sensitive detector; the phase sensitive detector comprises a multiplier 414 and a low pass filter 415, the multiplier 414 is connected to the output of the normalization module and the signal processing module 400, respectively, and the output of the multiplier 414 is connected to the controller through the low pass filter.
Further, the signal processing apparatus further includes a first analog-to-digital converter 408, an input end of the first analog-to-digital converter 408 is connected to the second switch, and an output end of the first analog-to-digital converter 408 is connected to the output control module.
In this embodiment, the signal processing module 400 includes a current-to-voltage unit 403, a high pass filter 404, a gain adjustment unit 405, and a low pass filter 406, the current-to-voltage unit 403 is sequentially connected to the high pass filter 404, the gain adjustment unit 405, and the low pass filter 406, the current-to-voltage unit 403 is selectively connected to the signal acquisition module or the signal simulation module through a first switch 402, and the low pass filter 406 is respectively connected to the controller and the phase difference detection module.
Referring to fig. 4 and 5, the operation principle of the phase difference compensation device according to the first embodiment will be described.
1) The first switch 402 and the second switch 407 switch the operating module of the signal processing apparatus to a detection mode, specifically, the first switch 402 and the second switch 407 are set to the position of S2, and the phase difference detection path is turned on.
2) Generation of a photocurrent signal I desired to be simulated by the digital waveform generation unit 410SIGNALIN＝Ai(1+cos(2πfmt)), wherein the amplitude as well as the frequency of the signal can be set by a register of the digital waveform generation unit 410.
In the present embodiment, the digital-to-analog converter 411 is a 24-bit chip with 5V reference, and the output signal range is 0.29 uv-5V. Through the conversion of the voltage-to-current unit 409 (conversion ratio of 1mA/V), the output range of the current signal is 0.29 nA-5 mA. The FPGA and dac 411 uses a 10ns clock, and each waveform uses 500 points for point-drawing, so that the minimum period of a single signal is 5 us. In summary, the range of the photocurrent signal is 0-2 MHz.
3) After the analog photocurrent signal passes through the signal processing module 400, the output signal is VSIGNALOUT＝X(cos(2πfmt+αim)). Wherein the amplitude of the signal is adjusted to a fixed value X due to the gain adjustment unit 405, and the energy A of the input signal is generated on the signaliFrequency f of input signalmRelative phase difference αim。
4) Informing the normalization module divider 413 and the peak detector 416 to normalize the voltage signal output by the low pass filter 412, and generating a reference signal V with the same frequency, the same phase and the amplitude of 1V as the analog photocurrent signalREF＝cos(2πfmt)
5) The signal V is passed through a multiplier 414SIGNALOUTAnd signal VREFMultiplied by, the calculation output is
The AC component is filtered out by low pass filtering 415 to obtain a voltage value representing the phase difference
6) The phase difference value at this time is converted by the first analog-to-digital converter 408 to form a first phase difference, and the first phase difference, the frequency and amplitude information of the detection signal are processed to obtain a phase difference compensation table.
In the present embodiment, the phase difference compensation table is not limited to the table-form correspondence, and for example, the obtained first phase difference α may be usedimStoring as a measured value, fitting according to the frequency, amplitude information and first phase difference of the detected signal, for example, fitting by multiple linear regression to form a fitting curve, and selecting corresponding α according to the fitting curve by testing the amplitude and frequency of the actual working signal obtained during actual testimThe value is used as a compensation. The fitting curve relationship is essentially to establish the corresponding relationship between the phase difference and the frequency and amplitude, and thus can be understood as the phase difference compensation table described in the present embodiment. The embodiment also provides a self-reference interference alignment system, which comprises the signal processing device, a phase compensation device and a phase compensation device, wherein the signal processing device is used for processing and phase compensating alignment signals of each diffraction order used for alignment position calculation; the embodiment also provides a photoetching machine which comprises the self-reference interference alignment system.
Example two
The embodiment of the invention also provides a signal processing method adopting the signal processing device with the phase compensation, which comprises the following steps:
detection mode: the signal processing module is selectively connected with the signal simulation module and disconnected with the signal acquisition module, so that a detection path comprising the signal simulation module, the signal processing module, the phase difference detection module and the output control module is conducted;
the signal simulation module is configured to simulate and generate a plurality of working signals with any frequency and amplitude, define a signal obtained by simulation as a detection signal, and send the detection signal to the signal processing module 400 and the phase difference detection module respectively, the signal processing module conditions and samples a received signal, and the phase difference detection module detects a phase difference between the detection signals before and after being processed by the signal processing module 400 and sends the phase difference to the output control module;
the output control module forms a phase difference compensation table according to phase differences corresponding to the detection signals with a plurality of arbitrary frequencies and amplitudes;
processing and compensation modes: the signal processing module 400 is selectively connected with the signal acquisition module and disconnected from the signal simulation module, so that a working channel comprising the signal acquisition module, the signal processing module and the output control module is conducted;
the signal acquisition module acquires an actual working signal and sends the actual working signal to the signal processing module;
the output control module performs phase compensation on the actual working signal processed by the signal processing module 400 according to the phase compensation table.
In this embodiment, a first switch 402 is disposed on the detection path and the working path, and the on-off of the detection path and the working path is controlled by the first switch; the first switch is configured to control on and off between the signal processing module and the signal simulation module and between the signal processing module and the signal acquisition module. Preferably, a second switch 407 may be further disposed on the detection path and the working path, and the second switch is respectively connected to the signal processing module, the phase difference detection module, and the output control module, and is configured to control on/off between the signal processing module and the output control module, and between the phase difference detection module and the output control module.
In this embodiment, the signal simulation module includes a digital waveform generation module, a filter, and a voltage-to-current unit 409, and the digital waveform generation module is connected to the voltage-to-current unit 409 through the filter. Preferably, the digital waveform generating module includes a digital waveform generating unit 410 and a digital-to-analog converting unit 411, the filter includes a low-pass filter 412, and the digital waveform generating unit 410 is connected to the filter through the digital-to-analog converting unit 411. The digital waveform generating unit 410 is, for example, an FPGA, but is not limited thereto.
In this embodiment, the phase difference detection module includes a normalization module and a phase sensitive detector, the normalization module is configured to normalize the voltage signal provided by the signal simulation module, and the phase sensitive detector is connected to the normalization module and configured to detect and obtain the phase difference between the output signals of the signal processing module 400 and the normalization module.
Further, the normalization module comprises a peak detector 416 and a divider 413, wherein the input ends of the peak detector 416 and the divider 413 are connected with the signal simulation module, the output end of the peak detector 416 is connected with the input end of the divider 413, and the output end of the divider 413 is connected with the phase sensitive detector; the phase sensitive detector comprises a multiplier 414 and a low pass filter 415, the multiplier 414 is connected with the output ends of the normalization module and the signal processing module 400 respectively, the output end of the multiplier 414 is connected with the low pass filter 415, and the controller obtains the first phase difference according to the output end of the low pass filter 415.
Further, the signal processing apparatus further includes a first analog-to-digital converter 408, an input end of the first analog-to-digital converter 408 is connected to the second switch, and an output end of the first analog-to-digital converter 408 is connected to the output control module.
In this embodiment, the signal processing module 400 includes a current-to-voltage unit 403, a high pass filter 404, a gain adjustment unit 405, and a low pass filter 406, the current-to-voltage unit 403 is sequentially connected to the high pass filter 404, the gain adjustment unit 405, and the low pass filter 406, the current-to-voltage unit 403 is selectively connected to the signal acquisition module or the signal simulation module through a first switch 402, and the low pass filter 406 is respectively connected to the controller and the phase difference detection module.
The embodiment also provides a self-reference interference alignment method, which is used for processing and phase compensating the alignment signals of each diffraction order for alignment position calculation by adopting the signal processing method; the embodiment also provides a photoetching machine which adopts the self-reference interference alignment method for alignment. When the photoetching machine is used for processing the alignment signals of a batch of silicon wafers with the same silicon wafer process, the phase difference compensation table is formed or updated by adopting the detection mode, and then the alignment signals are processed and subjected to phase compensation by adopting the processing and compensation mode.
EXAMPLE III
As shown in fig. 6, different from the first embodiment, the normalization module and the phase sensitive detector in the first embodiment are eliminated, and an a/D module is additionally added: a third analog-to-digital converter 612.
The phase difference detection module includes a square wave signal conversion unit 611, a second analog-to-digital converter 607, a third analog-to-digital converter 612, and a comparison unit (not shown), where the square wave signal conversion unit converts the detection signal into a square wave signal with the same frequency and amplitude, the square wave signal conversion unit may be an FPGA, an input end of the second analog-to-digital converter 607 is connected to an output end of the signal processing module 600, an input end of the third analog-to-digital converter 612 is connected to the square wave signal conversion unit, and the comparison unit is respectively connected to output ends of the second analog-to-digital converter 607 and the third analog-to-digital converter 612, and is configured to compare a phase difference between output signals of the second analog-to-digital converter 607 and the third analog-to-digital converter 612 to obtain a phase difference between the detection signals before and after.
Further, the signal processing module 600 includes a current-to-voltage unit 603, a high pass filter 604, a gain adjustment unit 605 and a low pass filter 606, the current-to-voltage unit 603 is sequentially connected to the high pass filter 604, the gain adjustment unit 605 and the low pass filter 606, the current-to-voltage unit 603 is selectively connected to the signal acquisition module 601 and the signal simulation module, respectively, and the low pass filter 606 is connected to the output control module and the phase difference detection module, respectively.
In the present embodiment, while outputting the analog photocurrent signal, a group of analog photocurrent signals and light photocurrent signals are output through the square wave signal conversion unit 611After the acquisition, the square wave signal is used as a reference to observe how many sampling periods the phase zero point of the photocurrent signal differs from the phase zero point of the square wave signal, and the periods are converted into phase offsets, that is, the first phase difference α is obtainedim。
Those skilled in the art can directly and unambiguously obtain other contents of the corresponding schemes in this embodiment according to the descriptions of the first embodiment and the second embodiment, for example, the connection relationship and the operation principle of the third switch 602, the digital-to-analog converter 608, the low-pass filter 609, and the voltage-to-current unit 610 can be known in combination with the first embodiment and the second embodiment, and therefore, the description thereof is omitted here.
The embodiment of the invention provides a signal processing device and a processing method, an alignment system and an alignment method and a photoetching machine, wherein in a detection mode, a phase difference detection module is arranged to detect a first phase difference of a detection signal before and after the detection signal is processed by the signal processing module, then a phase difference compensation table is formed according to the first phase difference and frequency and amplitude information of the detection signal, in the processing and compensation mode, the phase difference compensation table is inquired according to the frequency and amplitude information of an actual working signal to obtain a corresponding second phase difference, phase compensation is carried out on the signal in the actual working process processed by the signal processing module according to the second phase difference, and the phase difference generated in a signal processing link after different levels of light are mixed in the signal processing process is eliminated.
The above description is only a preferred embodiment of the present invention, and does not limit the present invention in any way. It will be understood by those skilled in the art that various changes, substitutions and alterations can be made herein without departing from the spirit and scope of the invention as defined by the appended claims.
Claims (18)
1. A signal processing apparatus with phase compensation, comprising:
the signal acquisition module is configured to be used for acquiring actual working signals;
the signal simulation module is configured to simulate the working signal with any frequency and amplitude, and the simulated signal is defined as a detection signal;
the signal processing module is optionally connected with the signal acquisition module and the signal simulation module and is used for conditioning and sampling the received signals;
the phase difference detection module is respectively connected with the signal simulation module and the signal processing module and is configured to detect the phase difference between the detection signals before and after being processed by the signal processing module;
and the output control module is connected with the phase difference detection module and the signal processing module and is configured to form a phase difference compensation table containing phase difference information corresponding to the detection signals with a plurality of arbitrary frequencies and amplitudes and perform phase compensation on the actual working signals processed by the signal processing module according to the phase difference compensation table.
2. The signal processing apparatus of claim 1, wherein the signal processing apparatus further comprises a first switch configured to control on/off between the signal processing module and the signal simulation module and between the signal processing module and the signal acquisition module.
3. The signal processing apparatus according to claim 2, wherein the signal processing apparatus further comprises a second switch, and the second switch is respectively connected to the signal processing module, the phase difference detection module and the output control module, and configured to control on/off between the signal processing module and the output control module, and between the phase difference detection module and the output control module.
4. The signal processing apparatus of claim 1, wherein the signal simulation module comprises a digital waveform generation module, a filter, and a voltage-to-current unit, the digital waveform generation module being connected to the voltage-to-current unit through the filter.
5. The signal processing apparatus of claim 4, wherein the digital waveform generation module comprises a digital waveform generation unit and a digital-to-analog conversion unit, the filter comprises a low-pass filter, and the digital waveform generation unit is connected to the filter through the digital-to-analog conversion unit.
6. The signal processing apparatus of claim 1, wherein the phase difference detection module comprises a normalization module and a phase sensitive detector, the normalization module is configured to normalize the voltage signal provided by the signal simulation module, and the phase sensitive detector is connected to the normalization module and configured to detect and obtain a phase difference between the signal processing module and the output signal of the normalization module.
7. The signal processing apparatus of claim 6 wherein the normalization module comprises a peak detector and a divider, inputs of the peak detector and the divider each being connected to the signal simulation module, an output of the peak detector being connected to an input of the divider, and an output of the divider being connected to the phase sensitive detector.
8. The signal processing apparatus of claim 6, wherein the phase sensitive detector comprises a multiplier and a low pass filter, the multiplier is connected to the output terminals of the normalization module and the signal processing module, respectively, and the output terminal of the multiplier is connected to the output control module through the low pass filter.
9. The signal processing apparatus of claim 3, further comprising a first analog-to-digital converter, an input of the first analog-to-digital converter being connected to the second switch, an output of the first analog-to-digital converter being connected to the output control module.
10. The signal processing apparatus of claim 1, wherein the phase difference detection module comprises a square wave signal conversion unit, a second analog-to-digital converter, a third analog-to-digital converter and a comparison unit, the square wave signal conversion unit converts the detection signals into square wave signals with the same frequency and amplitude, an input terminal of the second analog-to-digital converter is connected with an output terminal of the signal processing module, an input terminal of the third analog-to-digital converter is connected with the square wave signal conversion unit, and the comparison unit is respectively connected with output terminals of the second analog-to-digital converter and the third analog-to-digital converter and configured to compare a phase difference between output signals of the second analog-to-digital converter and the third analog-to-digital converter to obtain a phase difference between the detection signals before and after being processed by the signal processing module.
11. The signal processing apparatus of claim 1, wherein the signal processing module comprises a current-to-voltage unit, a high-pass filter, a gain adjustment unit, and a low-pass filter, the current-to-voltage unit is sequentially connected to the high-pass filter, the gain adjustment unit, and the low-pass filter, the current-to-voltage unit is selectively connected to the signal acquisition module and the signal simulation module, respectively, and the low-pass filter is connected to the output control module and the phase difference detection module, respectively.
12. A self-referencing interferometric alignment system comprising a signal processing apparatus according to any one of claims 1 to 11 for processing and phase compensating alignment signals for each diffraction order used in the alignment position calculation.
13. A lithography machine comprising the self-referencing interferometric alignment system of claim 12.
14. A signal processing method using the signal processing apparatus with phase compensation according to claim 1, comprising:
detection mode: the signal processing module is selectively connected with the signal simulation module and disconnected with the signal acquisition module, so that a detection path comprising the signal simulation module, the signal processing module, the phase difference detection module and the output control module is conducted;
the signal simulation module simulates and generates a plurality of working signals with any frequency and amplitude, defines the simulated signals as detection signals and respectively sends the detection signals to the signal processing module and the phase difference detection module, the signal processing module conditions and samples the received signals, and the phase difference detection module detects the phase difference between the detection signals before and after being processed by the signal processing module and sends the phase difference to the output control module;
the output control module forms a phase difference compensation table according to phase differences corresponding to the detection signals with a plurality of arbitrary frequencies and amplitudes;
processing and compensation modes: the signal processing module is selectively connected with the signal acquisition module and disconnected with the signal simulation module, so that a working channel comprising the signal acquisition module, the signal processing module and the output control module is conducted;
the signal acquisition module acquires an actual working signal and sends the actual working signal to the signal processing module;
and the output control module performs phase compensation on the actual working signal processed by the signal processing module according to the phase difference compensation table.
15. The signal processing method according to claim 14, wherein a first switch is provided on the detection path and the operation path, and the on/off of the detection path and the operation path is controlled by the first switch; the first switch is configured to be used for controlling the connection and disconnection between the signal processing module and the signal simulation module and between the signal processing module and the signal acquisition module.
16. The signal processing method according to claim 15, wherein a second switch is further disposed on the detection path and the working path, and the second switch is respectively connected to the signal processing module, the phase difference detection module and the output control module, and configured to control on/off of the signal processing module and the output control module, and the phase difference detection module and the output control module.
17. A self-referencing interferometric alignment method, characterized in that the alignment signals of the individual diffraction orders used for the alignment position calculation are processed and phase compensated using the signal processing method as claimed in any of claims 14 to 16.
18. A lithography machine, characterized in that, when the self-reference interference alignment method according to claim 17 is used for alignment, and alignment signals of a batch of silicon wafers with the same silicon wafer process are processed, the phase difference compensation table is formed or updated by using the detection mode, and then the alignment signals are processed and phase-compensated by using the processing and compensation mode.
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| CN201711241310.2A CN109856929B (en) | 2017-11-30 | 2017-11-30 | Signal processing device and processing method, alignment system and alignment method and photoetching machine |
| PCT/CN2018/118148 WO2019105410A1 (en) | 2017-11-30 | 2018-11-29 | Signal processing device and processing method, alignment system, alignment method, and lithography machine |
| TW107143044A TWI693486B (en) | 2017-11-30 | 2018-11-30 | Signal processing device and processing method, alignment system, alignment method and photoetching machine |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1835394A (en) * | 2005-03-18 | 2006-09-20 | 雅马哈株式会社 | Class-D amplifier |
| CN101482704A (en) * | 2008-12-10 | 2009-07-15 | 上海微电子装备有限公司 | Alignment light intensity signal collection and demodulation apparatus |
| CN103425006A (en) * | 2012-05-22 | 2013-12-04 | 上海微电子装备有限公司 | Aligning signal processing device used for photolithographic equipment, and aligning device used for photolithographic equipment |
Family Cites Families (9)
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| JP2004022750A (en) * | 2002-06-14 | 2004-01-22 | Yamaha Corp | Semiconductor device |
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| CN100468203C (en) * | 2005-10-14 | 2009-03-11 | 上海微电子装备有限公司 | Aligning position determination by higher off-axis aligning signal |
| EP3279738A1 (en) * | 2006-08-31 | 2018-02-07 | Nikon Corporation | Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method |
| US8493547B2 (en) * | 2009-08-25 | 2013-07-23 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
| NL2007215A (en) * | 2010-09-08 | 2012-03-12 | Asml Netherlands Bv | Lithographic apparatus, device manufacturing method, and method of applying a pattern to a substrate. |
| JP5936479B2 (en) * | 2012-08-03 | 2016-06-22 | キヤノン株式会社 | Measuring apparatus, lithography apparatus, and article manufacturing method |
| US20170336712A1 (en) * | 2014-12-17 | 2017-11-23 | Asml Netherlands B.V. | Method and apparatus for using patterning device topography induced phase |
| KR102190292B1 (en) * | 2015-12-31 | 2020-12-14 | 에이에스엠엘 네델란즈 비.브이. | Selection of measurement locations for patterning processes |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1835394A (en) * | 2005-03-18 | 2006-09-20 | 雅马哈株式会社 | Class-D amplifier |
| CN101482704A (en) * | 2008-12-10 | 2009-07-15 | 上海微电子装备有限公司 | Alignment light intensity signal collection and demodulation apparatus |
| CN103425006A (en) * | 2012-05-22 | 2013-12-04 | 上海微电子装备有限公司 | Aligning signal processing device used for photolithographic equipment, and aligning device used for photolithographic equipment |
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