CN109791039B - 使用光学显微镜产生样本的三维信息的方法 - Google Patents

使用光学显微镜产生样本的三维信息的方法 Download PDF

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CN109791039B
CN109791039B CN201780057121.1A CN201780057121A CN109791039B CN 109791039 B CN109791039 B CN 109791039B CN 201780057121 A CN201780057121 A CN 201780057121A CN 109791039 B CN109791039 B CN 109791039B
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CN109791039A (zh
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R·苏塔耳曼
J·J·徐
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KLA Corp
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KLA Tencor Corp
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Priority claimed from US15/233,812 external-priority patent/US20180045937A1/en
Priority claimed from US15/338,838 external-priority patent/US10157457B2/en
Priority claimed from US15/346,607 external-priority patent/US10168524B2/en
Priority claimed from US15/346,594 external-priority patent/US10359613B2/en
Application filed by KLA Tencor Corp filed Critical KLA Tencor Corp
Publication of CN109791039A publication Critical patent/CN109791039A/zh
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/022—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness by means of tv-camera scanning
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0608—Height gauges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/22—Measuring arrangements characterised by the use of optical techniques for measuring depth
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/04—Measuring microscopes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/0004—Microscopes specially adapted for specific applications
    • G02B21/0016—Technical microscopes, e.g. for inspection or measuring in industrial production processes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/36—Microscopes arranged for photographic purposes or projection purposes or digital imaging or video purposes including associated control and data processing arrangements
    • G02B21/365—Control or image processing arrangements for digital or video microscopes
    • G02B21/367—Control or image processing arrangements for digital or video microscopes providing an output produced by processing a plurality of individual source images, e.g. image tiling, montage, composite images, depth sectioning, image comparison
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T1/00—General purpose image data processing
    • G06T1/0007—Image acquisition
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/50—Depth or shape recovery
    • G06T7/55—Depth or shape recovery from multiple images
    • G06T7/571—Depth or shape recovery from multiple images from focus
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/60—Analysis of geometric attributes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/25—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2210/00—Aspects not specifically covered by any group under G01B, e.g. of wheel alignment, caliper-like sensors
    • G01B2210/56—Measuring geometric parameters of semiconductor structures, e.g. profile, critical dimensions or trench depth
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/10—Image acquisition modality
    • G06T2207/10056—Microscopic image
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30108—Industrial image inspection
    • G06T2207/30148—Semiconductor; IC; Wafer

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Multimedia (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Geometry (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Microscoopes, Condenser (AREA)
CN201780057121.1A 2016-08-10 2017-08-08 使用光学显微镜产生样本的三维信息的方法 Active CN109791039B (zh)

Applications Claiming Priority (9)

Application Number Priority Date Filing Date Title
US15/233,812 2016-08-10
US15/233,812 US20180045937A1 (en) 2016-08-10 2016-08-10 Automated 3-d measurement
US15/338,838 US10157457B2 (en) 2016-08-10 2016-10-31 Optical measurement of opening dimensions in a wafer
US15/338,838 2016-10-31
US15/346,607 US10168524B2 (en) 2016-08-10 2016-11-08 Optical measurement of bump hieght
US15/346,594 2016-11-08
US15/346,594 US10359613B2 (en) 2016-08-10 2016-11-08 Optical measurement of step size and plated metal thickness
US15/346,607 2016-11-08
PCT/US2017/045950 WO2018031574A1 (en) 2016-08-10 2017-08-08 Optical measurement of bump hieght

Publications (2)

Publication Number Publication Date
CN109791039A CN109791039A (zh) 2019-05-21
CN109791039B true CN109791039B (zh) 2021-03-23

Family

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Application Number Title Priority Date Filing Date
CN201780057121.1A Active CN109791039B (zh) 2016-08-10 2017-08-08 使用光学显微镜产生样本的三维信息的方法

Country Status (5)

Country Link
KR (1) KR102226779B1 (ko)
CN (1) CN109791039B (ko)
SG (1) SG11201901045UA (ko)
TW (1) TWI769172B (ko)
WO (1) WO2018031574A1 (ko)

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09113235A (ja) * 1995-10-16 1997-05-02 Dainippon Screen Mfg Co Ltd 三次元計測方法および表示方法、ならびに三次元計測装置
US6366357B1 (en) * 1998-03-05 2002-04-02 General Scanning, Inc. Method and system for high speed measuring of microscopic targets
TW555954B (en) * 2001-02-28 2003-10-01 Olympus Optical Co Confocal microscope, optical height-measurement method, automatic focusing method
JP2004354469A (ja) * 2003-05-27 2004-12-16 Yokogawa Electric Corp 共焦点顕微鏡表示装置
JP2005055540A (ja) * 2003-08-07 2005-03-03 Olympus Corp 共焦点顕微鏡及び高さ測定装置
US7512436B2 (en) * 2004-02-12 2009-03-31 The Regents Of The University Of Michigan Method of evaluating metabolism of the eye
GB2457851B (en) * 2006-12-14 2011-01-05 Ion Torrent Systems Inc Methods and apparatus for measuring analytes using large scale fet arrays
US7729049B2 (en) * 2007-05-26 2010-06-01 Zeta Instruments, Inc. 3-d optical microscope
US9389408B2 (en) * 2010-07-23 2016-07-12 Zeta Instruments, Inc. 3D microscope and methods of measuring patterned substrates
TWI414817B (zh) * 2010-07-23 2013-11-11 Univ Nat Taipei Technology 線型彩色共焦顯微系統
US10048480B2 (en) * 2011-01-07 2018-08-14 Zeta Instruments, Inc. 3D microscope including insertable components to provide multiple imaging and measurement capabilities
JP6488073B2 (ja) * 2014-02-28 2019-03-20 株式会社日立ハイテクノロジーズ ステージ装置およびそれを用いた荷電粒子線装置

Also Published As

Publication number Publication date
TWI769172B (zh) 2022-07-01
WO2018031574A1 (en) 2018-02-15
CN109791039A (zh) 2019-05-21
SG11201901045UA (en) 2019-03-28
TW201825860A (zh) 2018-07-16
WO2018031574A9 (en) 2018-04-05
KR20190029766A (ko) 2019-03-20
KR102226779B1 (ko) 2021-03-10

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