CN109773292A - A kind of device and method of million aural maskings Electrolyzed Processing high aspect ratio microstructures - Google Patents

A kind of device and method of million aural maskings Electrolyzed Processing high aspect ratio microstructures Download PDF

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Publication number
CN109773292A
CN109773292A CN201910153666.3A CN201910153666A CN109773292A CN 109773292 A CN109773292 A CN 109773292A CN 201910153666 A CN201910153666 A CN 201910153666A CN 109773292 A CN109773292 A CN 109773292A
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million
plate
anodes
sound
cathode
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CN109773292B (en
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杜立群
翟科
赵明
王舒萱
温义奎
曹强
张希
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Dalian University of Technology
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Dalian University of Technology
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Abstract

A kind of device and method of million aural maskings Electrolyzed Processing high aspect ratio microstructures, belongs to Electrolyzed Processing field, and upper cover plate, lateral coaming plate, lower plate form electrolyte cavities in the device;Million sound anodes are installed on upper cover plate, and cathode plate is fixed on lower plate;Etching part is fixed on million sound anodes, and piezoelectric ceramics is pasted on the inside of million sound anodes.The technique of million aural masking Electrolyzed Processings raising micro-structure deep etching ability are as follows: electrolyte is pumped by inlet opening in electrolyte cavities and flows out and recycles from fluid hole;It is that piezoelectric ceramics is passed through mega sonic wave signal by ceramic lead, piezoelectric ceramics generates million acoustic vibration excitation anode Workpiece vibrations, mega sonic wave is radiated into electrolyte;It is respectively anode workpiece, cathode plate access etching electric current by positive wire, cathode contact screw, realizes anode electrolysis processing.Operation of the present invention is simple and easy, can effectively improve the deep etching ability of metal micro structure, realizes million aural masking Electrolyzed Processings of metal high aspect ratio microstructures.

Description

A kind of device and method of million aural maskings Electrolyzed Processing high aspect ratio microstructures
Technical field
The present invention relates to a kind of exposure mask electrochemical machining method, especially a kind of mega sonic wave exposure mask Electrolyzed Processing high-aspect-ratio is micro- The device and method of structure belongs to Electrolyzed Processing field.
Background technique
Currently, the method for production metal micro structure mainly has, LIGA technology or UV-LIGA technology, mechanical microfabrication techniques, Electrical discharge machining (EDM), laser processing, chemical etching, Electrolyzed Processing (ECM) etc..Wherein, compared to other processing methods, electricity Solution processing has the advantages that impulse- free robustness, indeformable, without residual stress after processing, tool is lossless and surface quality is good.
Exposure mask Electrolyzed Processing is the combination of photoetching process and electrolytic processing process, usually first coats one layer of tool in workpiece surface There is the exposure mask of photosensitive property, and it is made to combine closely with substrate, through overexposure, development, prepares specific pattern on the surface of the workpiece Shielding layer, then unprotected workpiece material is removed by Electrolyzed Processing, finally processes the graphic structure of needs.Exposure mask electricity Solution processing can with one-pass molding process large-scale group's micro-structure, and can protect in addition to having the characteristics that Electrolyzed Processing Higher machining accuracy and repeatable accuracy are demonstrate,proved, there is the advantage of high-volume, high-precision, low cost.
For exposure mask Electrolyzed Processing, people improve its processing effect using many technical measures, such as patent of invention CN 104551282 A disclose a kind of system and method that array micro-pit Electrolyzed Processing locality is improved using Flexible formwork assembly.The party Method ensures being bonded for Flexible formwork assembly and workpiece using high speed electrolytic liquid forward impact Flexible formwork assembly, improves micro-pit array electrolysis The locality of processing.But due to that machining accuracy will be made to be difficult to ensure using the deformation of Flexible formwork assembly, Flexible formwork assembly.In addition, negative Positive pole clearance is too small, and electrolyte has differences anode workpiece surface pressing after being stitched by cathode tool group, and workpiece surface is each Region flow field is uneven, it is also possible to the problems such as causing machining accuracy inconsistent.
106141347 A of patent of invention CN discloses system and the side of a kind of pressure-assisted Electrolyzed Processing micro-pit array Method.Electrolyte flows to anode workpiece by the through-hole of cathode tool, and fixture inlet electrolyte pressure is constant when Electrolyzed Processing, together When, fixture liquid outlet is closed, and the electrolyte in fixture working chamber is in high pressure conditions, and the electrolyte of high pressure acts on flexible die On plate, be conducive to Flexible formwork assembly and fitted closely with anode workpiece, electrolyte permeability is prevented to enter Flexible formwork assembly and workpiece surface Joint place reduces dispersion corrosion;And the flow field above anode workpiece is stablized, and the essence of micro-pit array Electrolyzed Processing is helped to improve Degree.However, gas, which can be discharged, in the sap cavity form used in the invention certain difficulty, the etching that may will limit pit is deep Degree, hinders the progress of deep etching process.
106378500 A of patent of invention CN discloses a kind of adjustable wedge gap mask Electrolyzed Processing micro runner device.It is logical It crosses and parallel electrolyte channel is changed to Varied clearance runner, the method is conducive to remove electrolysate and heat, and it is big deep to improve electrolysis Spend the precision of fluid channel.However, such method is only applicable to unidirectional micro-channel structure processing, for other figure micro-structures Exposure mask Electrolyzed Processing will lose meaning.
13-16 pages of the phase of " electric machining and mold " 2010 the 1st has carried out a shock wave and has assisted pure titanium multiple micro-holes photoetching electricity Experimental study is solved, using pulsed sound as shock wave source.Group's hole machined, average pore size have been carried out on thick 100 μm of pure titanium sheet metals It is 371 μm, material ablation rate reaches 35 μm/min.In conjunction with shock wave generate pressure disturbance, promote electrolyte circulation and The discharge of electrolysate, improves machining accuracy and efficiency.However, the permeability of shock wave is general, although shock pressure is in casting slot Certain effect is inside produced, etching efficiency is improved, but the method is still suitable for shallow texture or thin plate etching, to advanced wide It is acted on than micro-structure etching power limited.
It is limited to the isotropism attribute of etachable material, exposure mask electrochemical machining process can lead to the problem of lateral erosion, lateral erosion problem Presence make existing exposure mask electrochemical machining method be confined to Surface Texture processing or thin plate through-hole processing, be difficult to meet micro- mould Process requirements of the structure devices such as tool to high aspect ratio microstructures.
Summary of the invention
In order to overcome the problems, such as traditional exposure mask Electrolyzed Processing deep etching scarce capacity, the present invention, which provides, a kind of utilizes mega sonic wave Mega sonic wave is introduced into exposure mask electrolytic process by the device and method of exposure mask Electrolyzed Processing high aspect ratio microstructures by ad hoc fashion. By the way that mega sonic wave is introduced into a specific manner in exposure mask electrolytic process, while avoiding photoresist micro-structure from playing glue, piezoelectricity pottery Porcelain drives anode workpiece vibration to be etched, improves the deep etching ability of exposure mask Electrolyzed Processing, realizes high-aspect-ratio metal micro structure Million aural masking Electrolyzed Processings.
In order to achieve the above object, The technical solution adopted by the invention is as follows:
A kind of device of million aural maskings Electrolyzed Processing high aspect ratio microstructures, including upper cover plate 1, lateral coaming plate 2, lower plate 3, Fastening bolt group 4, million sound anodes 5, etching workpiece 6, cathode plate 7.The upper cover plate 1, lateral coaming plate 2, the composition electrolysis of lower plate 3 Sap cavity, and it is affixed by fastening bolt group 4;Million sound anodes 5 are installed on upper cover plate 1, and cathode plate 7 is fixed on lower plate 3;Etch work Part 6 is anode workpiece, is fixed on million sound anodes 5, is fixed as an elastomer with the close contact of million sound anodes 5.Million sound 5 viscous pressing electroceramics 500 of anode, piezoelectric ceramics 500, million sound anode tool heads 50, etching workpiece 6 are integrally vibrated to electrolysis Mega sonic wave is radiated in liquid, forms million acoustic disturbances in electrolyte, promotes the etch product discharge in micro-structure, and then promote deep The realization of erosion process.Anode and cathode spacing is adjusted by the position adjusting knob 54 being installed on million sound anodes 5, guarantees different processing Reasonable anode and cathode spacing under technique.
The lateral coaming plate 2 is equipped with liquid inlet/outlet 20,21.
The upper cover plate 1 is equipped with a threaded hole 10.
The million sound anodes 5 include million sound anode tool heads 50, sealing plate 51, holding screw 52, round tube 53, position Adjusting knob 54.The million sound anode tool heads 50 are affixed by holding screw 52 with sealing plate 51, and 51 center of sealing plate is set There is a through-hole, clear size of opening and round tube 53 cooperate, and 53 tube wall of round tube is provided with external screw thread, and position adjusting knob 54 is set to 53 end of round tube Portion, with round tube 53 by being threadedly engaged.The million sound anode tool heads 50 include piezoelectric ceramics 500, ceramic lead 501, sun Polar conductor 502, conducting wire 501 and conducting wire 502 pass through the extraction of round tube 53 and connect electricity, logical for piezoelectric ceramics 500 by ceramic lead 501 Enter mega sonic wave pumping signal, the external screw thread of round tube 53 and the threaded hole 10 on upper cover plate 1 form worm drive pair.
Million acoustic frequencies of the million sound anodes 5 in 1MHz or more, i.e., million frequency of source of piezoelectric ceramics group 1MHz with On.The low cavitation effect of 1Mhz or more high frequency sound wave, it is ensured that sound wave is not damaged to glue film in million aural masking electrochemical machining processes.
The cathode plate 7 is disc structure, wherein conducting screw hole 70 is provided in the middle part of cathode plate 7, contact screw 8 is pacified On conducting screw hole 70;7 periphery of cathode plate is provided with fastening thread hole 71.
The lower plate 3 includes upper layer and lower layer plate, and top plate center is equipped with a circular cathode mounting hole 30, cathode plate 7 It is placed in cathode mounting hole 30;Lower plywood center is equipped with a square hole, and lower plywood is equipped with bolt hole 31, bottom thread hole 32, spiral shell Keyhole 31 is used for through fastening bolt group, and screw 80 passes through bottom thread hole 32 and is anchored on cathode plate threaded hole 71.
A kind of method of million aural maskings Electrolyzed Processing high aspect ratio microstructures is etched workpiece as million sound sources in this method A part, sound source generates million sound high frequency components and acoustic streaming and sprays effect.On the one hand fluid boundary layer is thinned for million acoustic disturbances, The effect of another aspect acoustic streaming, which can spray the electrolyte near sound source surface, to be expelled, and the update of electrolyte is promoted.In this way, electrolysis adds It is spouting that the acoustic streaming effect that the etch product generated in micro-structure can be generated by sound source at once is etched in work, is greatly reduced Concentration polarization improves the deep etching ability of exposure mask Electrolyzed Processing, and then obtains the high-aspect-ratio being etched on metal works Micro-structure.Following steps are realized:
(1) photoresist micro-structure, substrate grinding, polishing, spin coating, the standards such as photoresist exposure, development are made on substrate Technique realizes that glue film is graphical, exposes conductive substrates;
(2) patterned substrate to be processed is fixed on million sound anodes 5, makes to etch 6 back side of workpiece, million sound anodes 5 of abutting End face, and do corresponding encapsulation process.
(3) electrolysis unit is assembled, the million sound anodes 5 with etching workpiece 6 are packed into upper cover plate 1, cathode plate 7 is packed into bottom Plate 3, and lateral coaming plate is installed between upper cover plate 1, lower plate 3, three forms electrolysis unit chamber by the fastening of fastening bolt group 4, By adjusting anode and cathode spacing to target size.
(4) the million sound electrolysis units assembled are pumped into electrolyte and are flowed out from fluid hole 21 by inlet opening 20 and recycled.Institute Million sound electrolysis units are stated to electrolyte without particular/special requirement.
It (5) is that piezoelectric ceramics 500 is passed through mega sonic wave signal by ceramic lead 501, piezoelectric ceramics 500 generates million sound and vibrations It is dynamic, and excitation anode Workpiece vibration, anode workpiece radiate mega sonic wave into electrolyte as million sound sources;
It (6) is respectively to etch workpiece 6, the access direct current conduct of cathode plate 7 by positive wire 502, cathode contact screw 8 Electric current is etched, realizes the Electrolyzed Processing of anode, is formed in electrolyte 9 and is disturbed by the acoustic streaming of sound source of etched area, by etched area Product excludes.
The beneficial effects of the present invention are:
(1) device of a kind of million aural maskings Electrolyzed Processing high aspect ratio microstructures provided by the invention, and propose anode The method of sound source formula exposure mask Electrolyzed Processing high aspect ratio microstructures.The acoustic streaming injection effect of the workpiece generation that is etched as sound source It answers, etch product can be discharged immediately, promote the generation further etched, can effectively improve exposure mask Electrolyzed Processing Deep etching ability.
(2) the million sound effect in the present invention: sound source working frequency is 1MHz or more, has energy density big, penetration capacity By force, the small feature of cavitation, it is not damaged to all kinds of micro-structures and micro element while generating high frequency components.
Detailed description of the invention
Fig. 1 is mega sonic wave exposure mask electrolytic machining device general view of the present invention;
Fig. 2 is mega sonic wave exposure mask electrolytic machining device half sectional view of the present invention;
Fig. 3 is upper cover plate half sectional view;
Fig. 4 (a) is that million sound anodes encapsulate view;
Fig. 4 (b) is million sound anode head 3-D views;
Fig. 5 (a) is the 3-D view of lower plate;
Fig. 5 (b) is the lower plywood schematic diagram of lower plate;
Fig. 6 (a) is the front schematic view of cathode plate;
Fig. 6 (b) is the schematic rear view of cathode plate;
Fig. 7 is the half sectional view after lower plate and cathode assembly;
Fig. 8 is million aural masking Electrolyzed Processing schematic illustrations of the invention;
In figure: 1 upper cover plate;2 lateral coaming plates;3 lower plates;4 fastening bolt groups;5000000 sound anodes;6 anode workpieces (etching work Part);7 cathode plates;8 contact screws;9 electrolyte;10 threaded holes;11 bolts hole;
20 inlet openings;21 fluid holes;30 cathode mounting holes;31 bolts hole;32 bottom thread holes;50000000 sound anode tools Head;51 sealing plates;52 holding screws;53 round tubes;54 position adjusting knobs;70 conducting screw holes;71 fastening thread holes;80 spiral shells Nail;
500 piezoelectric ceramics;501 ceramic leads;502 positive wires.
Specific embodiment
Illustrated embodiment with reference to the accompanying drawing, the invention will be further described.
A kind of device and method of million aural maskings Electrolyzed Processing high aspect ratio microstructures passes through following tooling and technical process It realizes.
Fig. 1, Fig. 2 are the general view and partial view of mega sonic wave exposure mask electrolytic machining device of the present invention, mainly include upper Cover board 1, lateral coaming plate 2, lower plate 3, fastening bolt group 4, million sound anodes 5, etching workpiece 6, cathode plate 7.The upper cover plate 1, Lateral coaming plate 2, lower plate 3 form electrolyte cavities, and affixed by fastening bolt group 4, and lateral coaming plate 2 is equipped with liquid inlet/outlet 20,21; Million sound anodes 5 are installed on upper cover plate 1, and cathode plate 7 is fixed on lower plate 3;Etching workpiece 6 is anode workpiece, is fixed on million sound sun On pole 5, an elastomer is fixed as with the close contact of million sound anodes 5.Million sound anodes, the 5 viscous pressing electroceramics 500.Figure 3 be the half sectional view of upper cover plate 1, is provided with threaded hole 10 and four groups of bolts hole 11 on upper cover plate 1.
Fig. 4 (a) is the encapsulation view of million sound anodes 5, and million sound anodes 5 include million sound anode tool heads 50, sealing plate 51, tight Determine screw 52, round tube 53, position adjusting knob 54.The million sound anode tool heads 50 pass through holding screw with sealing plate 51 52 is affixed, and 51 center of sealing plate is equipped with a through-hole, and clear size of opening and round tube 53 cooperate, and 53 tube wall of round tube is provided with external screw thread, position Adjusting knob 54 is set to 53 end of round tube, with round tube 53 by being threadedly engaged.As shown in Fig. 4 (b), million sound anode tool heads 50 packet Piezoelectric ceramics 500, ceramic lead 501, positive wire 502 are included, conducting wire 501 and conducting wire 502 pass through the extraction of round tube 53 and connect electricity, circle The external screw thread of pipe 53 and the threaded hole 10 on upper cover plate 1 form worm drive pair.
Fig. 6 (a), the 3-D view that figure (b) is cathode plate 7, cathode plate 7 are disc structure, wherein are opened in the middle part of cathode plate 7 There are conducting screw hole 70, fastening thread hole 71.Fig. 5 (a) is the 3-D view of lower plate 3, and lower plate 3 includes upper layer and lower layer plate, Top plate center is equipped with a circular cathode mounting hole 30;Lower plywood center is equipped with a square hole, and the circle of top plate is lower plywood side The circumcircle of shape, lower plywood are equipped with bolt hole 31, bottom thread hole 32, and bolt hole 31 is used to pass through fastening bolt group.Fig. 7 is Half sectional view after lower plate 3 and cathode assembly, cathode plate 7 are placed in anode mounting hole 30, and screw 80 passes through bottom thread hole 32 are anchored on cathode plate threaded hole 71.Contact screw 8 is mounted on conducting screw hole 70.
Fig. 8 is million aural masking Electrolyzed Processing schematic illustrations of the invention, piezoelectric ceramics 500, million sound anode tool heads 50, sun Pole workpiece 6 is fixed together, and three in one, which is vibrated, radiates mega sonic wave into electrolyte 9, is formed in electrolyte 9 and with etched area is The acoustic streaming of sound source disturbs, and etched area product is excluded.
The device and method of mega sonic wave exposure mask electrochemical machining method processing high aspect ratio microstructures of the present invention, by following basic Step is realized, firstly, the anode workpiece 6 of mask pattern is fixed on million sound anodes 5,6 back side of anode workpiece is made to be close to million The end face of sound anode 5, and corresponding sealed insulation processing is done at other positions;Secondly, million sound anodes 5 are packed on upper cover plate 1, Cathode plate 7 is mounted on lower plate 3;Again, by upper cover plate 1, lateral coaming plate 2, lower plate 3 is fixed as by fastening bolt group 4 One.
Mega sonic wave exposure mask electrochemical machining method of the present invention processes high aspect ratio microstructures, real by following basic process steps It is existing, firstly, the million sound electrolysis units assembled are pumped into electrolyte by inlet opening 20 and flows out and recycles from fluid hole 21, It is secondary, it is that piezoelectric ceramics is passed through mega sonic wave pumping signal by ceramic lead 501, piezoelectric ceramics generates million acoustic vibrations, excitation anode Workpiece 6 vibrates, and radiates mega sonic wave into electrolyte 9;Again, it is respectively by positive wire 502 and contact screw 8 respectively Anode workpiece 6 and the access etching electric current of cathode plate 7, realize anode electrolysis processing.
The depth-to-width ratio and locality of exposure mask Electrolyzed Processing micro-structure can be significantly improved using the method, guarantee micro-structure device The service performance of part.In current density 3A/cm2, right under the processing conditions of electrolysis time 120s, 10wt% sodium chloride electrolyte 100 μm of original aperture group hole arrays are processed, and overcome exposure mask electrolytic processing process using the method for anode sound source of the present invention The shallow processing problems always existed, 124.18 μm of mean value of group's hole machined back aperture, 47.75 μm of depth mean value, depth-to-width ratio up to 0.4, Locality is up to 3.95.Compared to conventional mask electrolytic process (145.6 μm of aperture, 36.56 μm of hole depth, deeply width without the effect of million sound Than 0.24, locality 1.56), etch depth-to-width ratio and locality all greatly improve.As it can be seen that can quickly be obtained using the method for the present invention Obtain the metal group micro-structure of high-aspect-ratio.
Embodiment described above only expresses embodiments of the present invention, and but it cannot be understood as to the invention patent Range limitation, it is noted that for those skilled in the art, without departing from the inventive concept of the premise, also Several modifications and improvements can be made, these are all belonged to the scope of protection of the present invention.

Claims (4)

1. a kind of device of million aural masking Electrolyzed Processing high aspect ratio microstructures, which is characterized in that the device includes upper cover Plate (1), lateral coaming plate (2), lower plate (3), fastening bolt group (4), million sound anodes (5), etching workpiece (6), cathode plate (7);Institute Upper cover plate (1), lateral coaming plate (2), the lower plate (3) stated form electrolyte cavities, and, lateral coaming plate affixed by fastening bolt group (4) (2) it is equipped with into and out of fluid apertures (20), (21);Million sound anodes (5) are installed on upper cover plate (1), and cathode plate (7) is fixed on lower plate (3);Etching workpiece (6) is anode workpiece, is fixed on million sound anodes (5), is fixed as a bullet with the close contact of million sound anodes (5) Property body;
The million sound anodes (5) include million sound anode tool heads (50), sealing plate (51), holding screw (52), round tube (53), Position adjusting knob (54);The million sound anode tool heads (50) are affixed by holding screw (52) with sealing plate (51), close Sealing plate (51) central through hole and round tube (53) cooperate, and round tube (53) tube wall is provided with external screw thread, position adjusting knob (54) and round tube (53) by being threadedly engaged, anode and cathode spacing is adjusted by position adjusting knob (54);The million sound anode tool heads (50) Including piezoelectric ceramics (500), ceramic lead (501), positive wire (502), piezoelectric ceramics (500) is pasted on million sound anodes (5) Inside, conducting wire (501) and conducting wire (502) pass through round tube (53) extraction and connect electricity;On the external screw thread of round tube (53) and upper cover plate (1) Threaded hole (10) forms worm drive pair.
2. a kind of device of million aural maskings Electrolyzed Processing high aspect ratio microstructures according to claim 1, which is characterized in that Million acoustic frequencies of the million sound anodes (5) are in 1MHz or more.
3. a kind of device of million aural maskings Electrolyzed Processing high aspect ratio microstructures according to claim 1 or 2, feature exist In, the cathode plate (7) is disc structure, it is provided with conducting screw hole (70), fastening thread hole (71) on cathode plate (7), under Bottom plate (3) is equipped with cathode mounting hole (30), bolt hole (31), bottom thread hole (32);Cathode plate (7) is placed in cathode mounting hole (30) in, bolt hole (31) is used for through fastening bolt group (4), and screw (80) passes through bottom thread hole (32) and is anchored on cathode plate On threaded hole (71), contact screw (8) is mounted on conducting screw hole (70).
4. a kind of method for carrying out million aural masking Electrolyzed Processing high aspect ratio microstructures using any device of 1-3, special Sign is, comprising the following steps:
1) photoresist micro-structure is made on substrate, substrate grinding polishes, spin coating, the standard technologies such as photoresist exposure, development, It realizes that glue film is graphical, exposes conductive substrates;
2) patterned substrate to be processed is fixed on million sound anodes (5), makes to etch workpiece (6) back side million sound anodes of abutting (5) end face, and do corresponding encapsulation process;
3) electrolysis unit is assembled, the million sound anodes (5) with etching workpiece (6) are packed into upper cover plate (1), cathode plate (7) is packed into Lower plate (3), and lateral coaming plate is installed between upper cover plate (1), lower plate (3), three is formed by fastening bolt group (4) fastening Electrolysis unit chamber, by adjusting anode and cathode spacing to target size;
4) electrolyte is pumped into the million sound electrolysis units assembled by inlet opening (20), flows out and recycles from fluid hole (21);
It 5) is that piezoelectric ceramics (500) are passed through mega sonic wave signal by ceramic lead (501), piezoelectric ceramics (500) generates million sound and vibrations It is dynamic, and excitation anode Workpiece vibration, anode workpiece radiate mega sonic wave into electrolyte as million sound sources;
It 6) is respectively to etch workpiece (6), cathode plate (7) access direct current conduct by positive wire (502), contact screw (8) Electric current is etched, realizes the Electrolyzed Processing of anode, is formed in electrolyte (9) and is disturbed by the acoustic streaming of sound source of etched area, will etched Area's product excludes.
CN201910153666.3A 2019-03-01 2019-03-01 Device and method for electrolyzing and processing high-depth-to-width-ratio microstructure by megasonic mask Active CN109773292B (en)

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CN110394515A (en) * 2019-07-25 2019-11-01 合肥工业大学 One kind being used for gear teeth groove face micro-structure Electrolyzed Processing tooling
CN111515480A (en) * 2020-04-22 2020-08-11 大连理工大学 Particle-assisted mask electrolytic machining device and method

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CN103887146A (en) * 2012-12-19 2014-06-25 中微半导体设备(上海)有限公司 High-aspect-ratio micro structure etching method with use of switchable power generator
CN108018584A (en) * 2017-11-20 2018-05-11 大连理工大学 A kind of million acoustic-electric casting machines and method for improving the micro- electroforming uniformity of metal
CN108560024A (en) * 2018-05-11 2018-09-21 大连理工大学 Reduce the million sound auxiliary electrocasting method of micro- electroformed layer residual stress

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JPH01246017A (en) * 1988-03-25 1989-10-02 Shizuoka Seiki Co Ltd Electrolytic finish machining method for wire-cut electric discharge machining workpiece
CN101327537A (en) * 2008-07-09 2008-12-24 南京航空航天大学 Electrochemical processing method of high depth-to-width ratio micro metallic bundle pillar structure and special-purpose tool
CN103887146A (en) * 2012-12-19 2014-06-25 中微半导体设备(上海)有限公司 High-aspect-ratio micro structure etching method with use of switchable power generator
CN108018584A (en) * 2017-11-20 2018-05-11 大连理工大学 A kind of million acoustic-electric casting machines and method for improving the micro- electroforming uniformity of metal
CN108560024A (en) * 2018-05-11 2018-09-21 大连理工大学 Reduce the million sound auxiliary electrocasting method of micro- electroformed layer residual stress

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110394515A (en) * 2019-07-25 2019-11-01 合肥工业大学 One kind being used for gear teeth groove face micro-structure Electrolyzed Processing tooling
CN110394515B (en) * 2019-07-25 2020-07-03 合肥工业大学 Be used for gear groove face micro-structure electrolytic machining frock
CN111515480A (en) * 2020-04-22 2020-08-11 大连理工大学 Particle-assisted mask electrolytic machining device and method
CN111515480B (en) * 2020-04-22 2021-07-02 大连理工大学 Particle-assisted mask electrolytic machining device and method

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