CN109768099A - 一种具有低点缺陷密度的二类超晶格光探测器 - Google Patents

一种具有低点缺陷密度的二类超晶格光探测器 Download PDF

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CN109768099A
CN109768099A CN201910039014.7A CN201910039014A CN109768099A CN 109768099 A CN109768099 A CN 109768099A CN 201910039014 A CN201910039014 A CN 201910039014A CN 109768099 A CN109768099 A CN 109768099A
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gasb
inas
layers
optical detector
class superlattices
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詹健龙
宋禹析
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Zhejiang Taoteng Infrared Technology Co Ltd
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Zhejiang Taoteng Infrared Technology Co Ltd
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Abstract

本发明公开了一种具有低点缺陷密度的二类超晶格光探测器,所述二类超晶格光探测器为InAs/GaSb二类超晶格光探测器,所述InAs/GaSb二类超晶格光探测器的吸收区包括有InAs层和GaSb层,GaSb层中凝入有Bi元素。本发明通过在分子束外延生长GaSb层时凝入一定量的Bi元素,能够有效减少吸收区中的空位或者反位存在,降低探测器的缺陷密度,使得SRH复合减少,器件暗电流下降,载流子的扩散速度增加,器件的量子效率增加,提高InAs/GaSb T2SL光探测器的性能。

Description

一种具有低点缺陷密度的二类超晶格光探测器
技术领域
本发明属于二类超晶格光探测器技术领域,具体涉及一种具有低点缺陷密度的二类超晶格光探测器。
背景技术
分子束外延(MBE)生长的GaSb中主要缺陷为Ga空位(bulk growth方法中主要是Ga反位),研究表明这些Ga空位是现有二类超晶格材料中SRH电流的主要来源和少数载流子寿命的主要限制因素。因此,如果能够减少Ga空位的产生,能够进一步提高二类超晶格光探测器的性能。
发明内容
为解决上述技术问题,本发明采用的技术方案是:一种具有低点缺陷密度的二类超晶格光探测器,所述二类超晶格光探测器为InAs/GaSb二类超晶格光探测器,所述InAs/GaSb二类超晶格光探测器的吸收区包括有InAs层和GaSb层,GaSb层中凝入有Bi元素。
吸收区的具体结构为7ML InAs/10ML GaSb0.94Bi0.06
本发明的有益效果是:本发明通过在分子束外延生长GaSb层时通过凝入一定量的Bi元素,能够有效减少吸收区中的空位或者反位存在,降低探测器的缺陷密度,使得SRH复合减少,器件暗电流下降,载流子的扩散长度增加,器件的量子效率增加,提高InAs/GaSb二类超晶格光探测器的性能。
具体实施方式
一种具有低点缺陷密度的二类超晶格光探测器,所述二类超晶格光探测器为InAs/GaSb二类超晶格光探测器,所述InAs/GaSb二类超晶格光探测器的吸收区包括有InAs层和GaSb层,GaSb层中凝入有Bi元素。
吸收区的具体结构为7ML InAs/10ML GaSb0.94Bi0.06。其中ML为原子层。
以上详细描述了本发明的较佳具体实施例,应当理解,本领域的普通技术人员无需创造性劳动就可以根据本发明的构思做出诸多修改和变化,因此,凡本技术领域中技术人员依本发明的构思在现有技术的基础上通过逻辑分析、推理或者有限的实验可以得到的技术方案,皆应在由权利要求书所确定的保护范围内。

Claims (2)

1.一种具有低点缺陷密度的二类超晶格光探测器,其特征在于,所述二类超晶格光探测器为InAs/GaSb二类超晶格光探测器,所述InAs/GaSb二类超晶格光探测器的吸收区包括有InAs层和GaSb层,GaSb层中凝入有Bi元素。
2.如权利要求1所述的具有低点缺陷密度的二类超晶格光探测器,其特征在于,所述吸收区的具体结构为7ML InAs/10ML GaSb0.94Bi0.06
CN201910039014.7A 2019-01-16 2019-01-16 一种具有低点缺陷密度的二类超晶格光探测器 Pending CN109768099A (zh)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021062589A1 (zh) * 2019-09-30 2021-04-08 嘉兴风云科技有限责任公司 一种能够缩减层厚度的二类超晶格光探测器

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102569521A (zh) * 2012-02-02 2012-07-11 中国科学院半导体研究所 钝化InAs/GaSb二类超晶格红外探测器制作方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102569521A (zh) * 2012-02-02 2012-07-11 中国科学院半导体研究所 钝化InAs/GaSb二类超晶格红外探测器制作方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
SHUMIN WANG 等: "Bismuth Incorporation and Lattice Contraction in GaSbBi and InSbBi》", 《2011 13TH INTERNATIONAL CONFERENCE ON TRANSPARENT OPTICAL NETWORKS》 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021062589A1 (zh) * 2019-09-30 2021-04-08 嘉兴风云科技有限责任公司 一种能够缩减层厚度的二类超晶格光探测器

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Application publication date: 20190517