CN109755164A - Wafer handling and inflation system - Google Patents
Wafer handling and inflation system Download PDFInfo
- Publication number
- CN109755164A CN109755164A CN201711087048.0A CN201711087048A CN109755164A CN 109755164 A CN109755164 A CN 109755164A CN 201711087048 A CN201711087048 A CN 201711087048A CN 109755164 A CN109755164 A CN 109755164A
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- China
- Prior art keywords
- wafer
- filling device
- gas filling
- handling
- control cabinet
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Abstract
A kind of handling of wafer and inflation system, it includes a wafer handler and a gas filling device, the wafer handler is for loading and unloading wafer cassette, the gas filling device is to connect the wafer cassette, the wafer handler includes the control cabinet of a pedestal and a control wafer cassette handling, the pedestal include a bracket, one be installed in the plummer on the bracket and one be located at the plummer below accommodating cavity, the plummer is located in the accommodating cavity to load the wafer cassette, the control cabinet and the gas filling device.
Description
Technical field
The present invention relates to a kind of wafer handling for wafer cassette and inflation systems.
Background technique
In the technique of large-sized semiconductor crystal wafer, usually using front open type wafer box (FOUP:Front Opening
Unified Pod) as the device for storing and conveying wafer.The wafer cassette has an enclosure space, is beneficial to prevent ring around
Dust, aqueous vapor and the oxygen in border enter and react with wafer and defect (such as circuit breaking or short circuit) is caused to generate, to improve
The manufacturing yield of wafer.
However, under manufacture of semiconductor technology constantly miniature situation, from a processing step to next in silicon wafer process
A processing step high latency allowed (Queue Time) is shorter and shorter, so that production efficiency reduces or product is good
Rate is deteriorated, and the high latency for resulting in the need for extending silicon wafer process is to improve product yield.Therefore, it is necessary to use a wafer to fill
Handler is used to load wafer cassette and take a breath to the wafer cassette using a gas filling device, to remove in the wafer cassette
Moisture and oxygen, the high latency in silicon wafer process be appropriately extended can.However, in the prior art, controlling the crystalline substance
The control device of circle handler is usually separately positioned with the wafer handler, therefore, needs additional space to place
State control device.
Summary of the invention
In view of the foregoing, it is necessary to provide a kind of handling of wafer and inflation system, to solve the above technical problems.
A kind of handling of wafer and inflation system comprising a wafer handler and a gas filling device, the wafer
Handler is for loading and unloading wafer cassette, and the gas filling device is to connect the wafer cassette, the wafer handler packet
The control cabinet of a pedestal and a control wafer cassette handling is included, the pedestal includes a bracket, one is installed in holding on the bracket
Microscope carrier and an accommodating cavity below the plummer, the plummer is to load the wafer cassette, the control cabinet
And the gas filling device is located in the accommodating cavity.
Further, the bracket, the plummer and a shell, which enclose, sets to form the accommodating cavity.
Further, the shell is mounted at the bracket.
Further, the gas filling device and the control cabinet are arranged side by side in the accommodating cavity, and the gas
Body filling device is between the control cabinet and the bracket.
Further, the gas filling device is fixed on the bracket, and the control cabinet is fixed on the plummer court
To the surface of the accommodating cavity.
Further, the control cabinet and the gas filling device are communicated to connect with a Cloud Server respectively, the cloud
Server sends to the control cabinet and accuses instruction, and the control cabinet controls the dress of the wafer cassette according to the control instruction
It unloads, the Cloud Server sends triggering command to the gas filling device and pause instruction, the gas filling device receive
Start to inflate and be evacuated to the wafer cassette when triggering command, the gas filling device, which receives the pause instruction, to be stopped
It inflates and is evacuated to the wafer cassette.
Wafer handling of the invention and inflation system, the gas filling device and the control cabinet are contained in described together
In accommodating cavity, so that whole wafer handling and inflation system are compact-sized, production space is saved.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of the wafer handling and inflation system in a preferred embodiment of the present invention.
Fig. 2 is that wafer shown in FIG. 1 loads and unloads and schematic diagram is disassembled in the part of inflation system.
Fig. 3 is the hardware architecture diagram of wafer shown in FIG. 1 handling and the gas filling device in inflation system.
Main element symbol description
| Wafer handling and inflation system | 1 |
| Wafer handler | 300 |
| Gas filling device | 100 |
| Wafer cassette | 200 |
| Pedestal | 31 |
| Control cabinet | 35 |
| Bracket | 311 |
| Plummer | 313 |
| Shell | 315 |
| Accommodating cavity | 316 |
| Cloud Server | 2 |
| Inflatable component | 101 |
| Vacuum elements | 102 |
| First filter element | 11 |
| Air pressure sensing and regulating element | 12 |
| Switch valve | 13 |
| Sensing flux and regulating element | 14 |
| Second filter element | 15 |
| Airtight element | 16、16’ |
| Gas ducting | 111 |
| Temperature and humidity sensing element | 17 |
| Anti-return element | 18 |
| Air pressure sensing element | 19 |
| Suction element | 20 |
| Pump-line | 112 |
The present invention that the following detailed description will be further explained with reference to the above drawings.
Specific embodiment
It please refers to Fig.1 to Fig.3, the wafer handling of a better embodiment of the invention and inflation system 1 comprising a wafer
Handler 300 and a gas filling device 100, for being inflated to wafer cassette 200 to protect the crystalline substance in wafer cassette 200
Circle.
The wafer handler 300 includes a pedestal 31 and a control cabinet 35.
The pedestal 31 protrudes out the plummer 313 to be formed perpendicular to 311 direction of bracket including 311, one edge of a bracket,
And one be located at 313 lower section of the plummer and enclose accommodating made of setting as the bracket 311, plummer 313 and a shell 315
Chamber 316.The plummer 313 is for loading the wafer cassette 200.The control cabinet 35 is contained in the accommodating cavity 316, is used
In the handling for controlling the wafer cassette 200.The shell 315 is mounted at the bracket 311, so that the wafer fills
Unload and the installation of inflation system 1 and maintenance process it is simple.
In present embodiment, the control cabinet 35 is communicated with a Cloud Server 2 by wired or wireless mode.The cloud
Server 2 sends control instruction to the control cabinet 35, and the control cabinet controls the wafer cassette according to the control instruction
200 handling.
The gas filling device 100 is contained in the accommodating cavity 316.In present embodiment, the gas filling dress
It sets 100 to be arranged side by side with the control cabinet 35 in the accommodating cavity 316, and the gas filling device 100 is located at the control
Between case 35 and the bracket 311 processed.The gas filling device is fixed on the bracket 311, and the control cabinet 35 is fixed on
The lower surface of the plummer.The control cabinet 35 in other embodiments, the gas filling device 100 and the control
Arrangement of the case 35 in the accommodating cavity 316 can be set as needed.
The gas filling device 100 includes an inflatable component 101 and a vacuum elements 102.The inflatable component 101 is used for
When receiving a triggering command, the gas for meeting humidity and air pressure requirement is filled with the wafer cassette 200.The vacuum elements 102
For the gas in the wafer cassette 200 being extracted out, and detects when the inflatable component 101 starts gas being filled with the wafer cassette 200
Survey the humidity value and temperature value of institute's gas bleeding.
In the present embodiment, which is communicated with Cloud Server 2 by wired or wireless mode.
The Cloud Server 2 is for sending the triggering command to the inflatable component 101 and the vacuum elements 102 simultaneously, so that notice should
Inflatable component 101 starts to inflate to the wafer cassette 200, and the vacuum elements 102 is notified to start to be evacuated from the wafer cassette 200.
The gas filling device 100 is also used to the humidity value for the gas that the vacuum elements 102 are detected and humidity value being sent to the cloud
Server 2.To which, the Cloud Server 2 can calculate the one opposite of the gas according to the humidity value and temperature value for the gas detected
Humidity value, and the rh value is compared with a predetermined rh value, it is somebody's turn to do when the rh value of the gas is equal to
When predetermined rh value, which sends a pause to the inflatable component 101 and the vacuum elements 102 simultaneously and refers to
It enables, so that the inflatable component 101 be notified to stop inflating to the wafer cassette 200, and the vacuum elements 102 is notified to stop from the crystalline substance
Circle box 200 is evacuated.At this point, 100 operation suspension of gas filling device.
In another embodiment, the inflatable component 101 can with the vacuum elements 102 by wired or wireless mode into
Row communication.When the vacuum elements 102 judge according to the humidity value and atmospheric pressure value of the gas detected the rh value of the gas
When equal to the predetermined rh value, which stops being evacuated from the wafer cassette 200, and to the inflatable component 101
A pause instruction is sent, so that the inflatable component 101 be notified to stop inflating to the wafer cassette 200.
Wherein, the humidity and the gas of air pressure requirement of meeting is compression drying air (CDA) or nitrogen.
The inflatable component 101 connects a gas source (not shown), which is used for the gas exported to the gas source
Body is filled with the wafer cassette 200 after being handled.In the present embodiment, the inflatable component 101 include one first filter element 11,
One air pressure sensing and regulating element 12, a switch valve 13, a sensing flux and regulating element 14, one second filter element 15, one
Airtight element 16 and for connecting first filter element 11, the air pressure sensing and regulating element 12, the switch valve 13, the stream
The gas ducting 111 of amount sensing and regulating element 14, second filter element 15 and the airtight element 16.The inflatable component
101 are connect by first filter element 11 with the gas source, and are connect by the airtight element 16 with the wafer cassette 200.
The air pressure sensing and regulating element 12, the switch valve 13, the sensing flux and regulating element 14 and second filter element 15
It is sequentially arranged between first filter element 11 and the airtight element 16.In other embodiments, the air pressure sensing with
The order of connection of regulating element 12, the switch valve 13, the sensing flux and regulating element 14 and second filter element 15
It can change as needed.
The gas that first filter element 11 is used to export the gas source is filtered, to prevent the particle in the gas
Pollute or damage the wafer in the wafer cassette 200.In the present embodiment, which is a pneumatic filter.
The air pressure sensing and regulating element 12 are used to sense the atmospheric pressure value of the filtered gas, and by the air pressure of the gas
Value is adjusted within the scope of a preset air pressure value.In the present embodiment, the air pressure sensing and regulating element 12 include an air pressure transmission
Sensor and an air pressure valve.The preset air pressure value range is -1kpa to -6kpa.
The switch valve 13 can be at opening or closing state.After allowing filtering when the switch valve 13 is in the open state
The gas pass through, the filtered gas can be prevented to pass through when the switch valve 13 is in close state.That is, closing can be passed through
The switch valve 13, which controls the inflatable component 101, to be stopped inflating to the wafer cassette 200.
The sensing flux and regulating element 14 are used to sense the flow of the filtered gas, and by the flow tune of the gas
Within the scope of section to a predetermined amount of flow value.In the present embodiment, which is 0 to 100 liter/min.
Second filter element 15 will be for that will flow through first filter element 11, the air pressure sensing and regulating element 12, be somebody's turn to do
The gas of switch valve 13 and the sensing flux and regulating element 14 is further filtered, to remove first filter element
11, the particle that the air pressure sensing and regulating element 12, the switch valve 13 and the sensing flux and regulating element 14 itself generate
To further ensure that the cleannes of the gas.In the present embodiment, which is a pneumatic filter.
In the present embodiment, the vacuum elements 102 are anti-including an airtight element 16 ', a temperature and humidity sensing element 17, one
Back-flow component 18, an air pressure sensing element 19, a suction element 20 and for connecting the airtight element 16 ', the temperature and humidity sense
Survey the pump-line 112 of element 17, the anti-return element 18, the air pressure sensing element 19 and the suction element 20.
The suction element 20 includes a bleeding point (not shown), which is used to be formed in the bleeding point negative
Pressure, to make the gas in the wafer cassette 200 be extracted under the action of negative pressure and enter the vacuum elements 102.In this embodiment party
In formula, which is a vacuum pump.The airtight element 16 ', the temperature and humidity sensing element 17, the anti-return element
18 and the air pressure sensing element 19 be sequentially connected between the wafer cassette 200 and the suction element 20.In other embodiment party
In formula, the company of the airtight element 16 ', the temperature and humidity sensing element 17, the anti-return element 18 and the air pressure sensing element 19
Connecing sequence can also change as needed.
The airtight element 16 ' is used to for the temperature and humidity sensing element 17 being tightly connected to the wafer cassette 200, thus prevent by
The gas of extraction is revealed when entering the temperature and humidity sensing element 17.Wherein, the airtight element 16 ' and the airtight 16 structure class of element
Seemingly, this is not repeated.
The temperature and humidity sensing element 17 is used to sense the humidity value and temperature value of the extracted gas, the humidity of the gas
Value corresponds to the rh value of the gas with temperature value.In the present embodiment, which includes a temperature
Quick resistance and a humistor.When the rh value for the gas detected is equal to the predetermined rh value, the gas source
It closes, i.e., the inflatable component 101 stops inflation.
The air pressure sensing element 19 is used to sense the atmospheric pressure value of the extracted gas.In the present embodiment, the air pressure
Sensing element 19 is a baroceptor.
The atmospheric pressure value that the anti-return element 18 is used to work as the gas that the air pressure sensing element 19 measures is greater than a predetermined gas
The gas backstreaming in the vacuum elements 102 is prevented when pressure value (e.g., becoming barotropic state), that is, prevent the air pressure of external environment from falling
Pour into the wafer cassette 200.In the present embodiment, which is a check-valves.
The gas filling device 100 and the control cabinet 35 are non-interference.
Wafer handling of the invention and inflation system 1, the gas filling device 100 and control cabinet 35 are contained in institute together
It states in accommodating cavity 316, so that whole wafer handling and inflation system 1 are compact-sized, saves production space, and shell 315 is removable
It unloads, so that wafer handling and the installation of inflation system 1 and maintenance process are simple, meets 6S standard requirements.Furthermore the gas is filled out
It fills and sets 100 and controlled by Cloud Server 2, have no effect on the normal operation and maintenance of wafer handler 300.
The above is only better embodiment of the invention, not the limitation to the present invention in any form, though
The right present invention has been that better embodiment is disclosed above, is not intended to limit the invention, any person skilled in the art,
Without departing from the scope of the present invention, when the technology contents using the disclosure above are modified or are modified to
With the equivalent implementations of variation, but without departing from the technical solutions of the present invention, according to the technical essence of the invention to
Any simple modification, equivalent change and modification that upper embodiment is done, all of which are still within the scope of the technical scheme of the invention.
Claims (6)
1. a kind of wafer handling and inflation system comprising a wafer handler and a gas filling device, the wafer dress
For loading and unloading wafer cassette, the gas filling device includes handler to connect the wafer cassette, the wafer handler
One pedestal and the control cabinet of a control wafer cassette handling, the pedestal include a bracket, one are installed in carrying on the bracket
Platform and one be located at accommodating cavity below the plummer, the plummer to load the wafer cassette, the control cabinet and
The gas filling device is located in the accommodating cavity.
2. wafer as described in claim 1 handling and inflation system, which is characterized in that further include one being installed on the bracket
Shell, the bracket, the plummer and the shell, which enclose, to be set to form the accommodating cavity.
3. wafer handling as claimed in claim 2 and inflation system, which is characterized in that the shell is movably installed in the branch
Frame.
4. wafer handling as described in claim 1 and inflation system, which is characterized in that the gas filling device and the control
Case processed is arranged side by side in the accommodating cavity, and the gas filling device is between the control cabinet and the bracket.
5. wafer handling as claimed in claim 4 and inflation system, which is characterized in that the gas filling device is fixed on institute
Bracket is stated, the control cabinet is fixed on the plummer towards the surface of the accommodating cavity.
6. wafer handling as described in claim 1 and inflation system, which is characterized in that the control cabinet and gas filling
Device is communicated to connect with a Cloud Server respectively, and the Cloud Server sends to the control cabinet and accuses instruction, the control cabinet
The handling of the wafer cassette are controlled according to the control instruction, the Cloud Server sends to the gas filling device and triggers
Instruction and pause instruction, the gas filling device start to inflate and be evacuated to the wafer cassette when receiving the triggering command,
The gas filling device, which receives the pause instruction, to be stopped inflating and being evacuated to the wafer cassette.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711087048.0A CN109755164A (en) | 2017-11-07 | 2017-11-07 | Wafer handling and inflation system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711087048.0A CN109755164A (en) | 2017-11-07 | 2017-11-07 | Wafer handling and inflation system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN109755164A true CN109755164A (en) | 2019-05-14 |
Family
ID=66400750
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201711087048.0A Pending CN109755164A (en) | 2017-11-07 | 2017-11-07 | Wafer handling and inflation system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN109755164A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111952226B (en) * | 2019-05-16 | 2024-03-26 | 华景电通股份有限公司 | Wafer carrier monitoring system and monitoring method thereof |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN203466172U (en) * | 2012-11-05 | 2014-03-05 | 圣凰科技有限公司 | Gas filling device with flow control for wafer carrier |
| CN104167382A (en) * | 2013-05-16 | 2014-11-26 | 昕芙旎雅有限公司 | Load port device |
| CN106505023A (en) * | 2015-09-08 | 2017-03-15 | 古震维 | A kind of with the wafer handler for blowing off function |
| CN206179838U (en) * | 2016-11-23 | 2017-05-17 | 北京亿微纳科技有限公司 | Wafer automatic loading equipment |
| CN107068604A (en) * | 2017-03-14 | 2017-08-18 | 大族激光科技产业集团股份有限公司上海分公司 | Wafer cassette conveys Load System |
-
2017
- 2017-11-07 CN CN201711087048.0A patent/CN109755164A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN203466172U (en) * | 2012-11-05 | 2014-03-05 | 圣凰科技有限公司 | Gas filling device with flow control for wafer carrier |
| CN104167382A (en) * | 2013-05-16 | 2014-11-26 | 昕芙旎雅有限公司 | Load port device |
| CN106505023A (en) * | 2015-09-08 | 2017-03-15 | 古震维 | A kind of with the wafer handler for blowing off function |
| CN206179838U (en) * | 2016-11-23 | 2017-05-17 | 北京亿微纳科技有限公司 | Wafer automatic loading equipment |
| CN107068604A (en) * | 2017-03-14 | 2017-08-18 | 大族激光科技产业集团股份有限公司上海分公司 | Wafer cassette conveys Load System |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111952226B (en) * | 2019-05-16 | 2024-03-26 | 华景电通股份有限公司 | Wafer carrier monitoring system and monitoring method thereof |
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| PB01 | Publication | ||
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Application publication date: 20190514 |