CN109692843B - Substrate cleaning device and substrate production equipment - Google Patents
Substrate cleaning device and substrate production equipment Download PDFInfo
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- CN109692843B CN109692843B CN201910120531.7A CN201910120531A CN109692843B CN 109692843 B CN109692843 B CN 109692843B CN 201910120531 A CN201910120531 A CN 201910120531A CN 109692843 B CN109692843 B CN 109692843B
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- 238000004140 cleaning Methods 0.000 title claims abstract description 209
- 239000000758 substrate Substances 0.000 title claims abstract description 49
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 19
- 239000007788 liquid Substances 0.000 claims abstract description 104
- 238000001914 filtration Methods 0.000 claims abstract description 62
- 239000007787 solid Substances 0.000 claims abstract description 55
- 238000007781 pre-processing Methods 0.000 claims abstract description 6
- 239000002245 particle Substances 0.000 claims description 18
- 238000012544 monitoring process Methods 0.000 claims description 16
- 238000000926 separation method Methods 0.000 claims description 16
- 238000005406 washing Methods 0.000 abstract description 16
- 230000002035 prolonged effect Effects 0.000 abstract description 5
- 239000002585 base Substances 0.000 description 10
- 238000000034 method Methods 0.000 description 7
- 230000008569 process Effects 0.000 description 7
- 239000003292 glue Substances 0.000 description 6
- 238000012423 maintenance Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000011010 flushing procedure Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000002253 acid Substances 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/14—Removing waste, e.g. labels, from cleaning liquid; Regenerating cleaning liquids
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D35/00—Filtering devices having features not specifically covered by groups B01D24/00 - B01D33/00, or for applications not specifically covered by groups B01D24/00 - B01D33/00; Auxiliary devices for filtration; Filter housing constructions
- B01D35/02—Filters adapted for location in special places, e.g. pipe-lines, pumps, stop-cocks
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The invention provides a substrate cleaning device and substrate production equipment. The substrate cleaning device comprises a cleaning cavity and a filtering system connected with the cleaning cavity, wherein the filtering system is used for filtering cleaning liquid in the cleaning cavity and supplying the filtered cleaning liquid to the cleaning cavity; the pretreatment unit is used for crushing the solid in the cleaning liquid output from the cleaning cavity and separating the crushed solid from the liquid; the filtering unit is used for filtering the cleaning liquid output by the preprocessing unit and inputting the filtered cleaning liquid into the cleaning cavity. This base plate belt cleaning device can effectively avoid the great solid foreign matter of a large amount of sizes directly to flow into the filter unit and lead to its jam, has effectively prolonged the life of filter unit, and it is cleaner still to make the washing liquid of backward flow input to washing chamber once more, has improved base plate belt cleaning device's cleaning quality.
Description
Technical Field
The invention relates to the technical field of display, in particular to a substrate cleaning device and substrate production equipment.
Background
In the panel industry production process, a large amount of substrate cleaning equipment is involved, and a filter in the cleaning equipment is a main consumable spare part. In production, the filter element is stopped due to blockage, the filter element needs to be stopped for cleaning or replacing, and the service life of the filter element can be seriously shortened when the filter element is blocked for a long time. This not only reduces equipment utilization rate, and increases the work load of equipment maintenance and the use amount of consumptive material.
In addition, the filter is mainly disassembled and cleaned manually after the filter element is blocked, the whole operation time is long, and the manual labor is large. Especially, some cleaning equipment adopts high-concentration acid and alkali or organic liquid medicine, and when the cleaning equipment is manually cleaned, the whole body protective clothing needs to be worn for cleaning, so that the safety risk is high.
Disclosure of Invention
The invention provides a substrate cleaning device and substrate production equipment aiming at the technical problems in the prior art. This base plate belt cleaning device can effectively avoid the great solid foreign matter of a large amount of sizes directly to flow into the filter unit and lead to its jam, has effectively prolonged the life of filter unit, and it is cleaner still to make the washing liquid of backward flow input to washing chamber once more, has improved base plate belt cleaning device's cleaning quality.
The invention provides a substrate cleaning device, which comprises a cleaning cavity and a filtering system connected with the cleaning cavity, wherein the filtering system is used for filtering cleaning liquid in the cleaning cavity and supplying the filtered cleaning liquid to the cleaning cavity; the pretreatment unit is used for crushing the solid in the cleaning liquid output from the cleaning cavity and separating the crushed solid from the liquid; the filtering unit is used for filtering the cleaning liquid output by the preprocessing unit and inputting the filtered cleaning liquid into the cleaning cavity.
Preferably, the pretreatment unit includes a crushing portion and a separating portion, the crushing portion being connected to the separating portion;
the crushing part is used for crushing the solid in the cleaning liquid output from the cleaning cavity into solid particles smaller than the original volume of the solid;
the separation part is used for separating the solid particles in the cleaning liquid from the liquid.
Preferably, the crushing part comprises a housing, a shaft arranged in the housing, an impeller arranged on the shaft and a driving part arranged outside the housing;
the shell is provided with a first opening and a second opening, and cleaning liquid can enter the shell from the first opening and can be output to the separation part from the second opening;
the driving piece is used for driving the shaft to rotate, so that the shaft drives the impeller to rotate, and solid in the cleaning liquid is crushed.
Preferably, the separation part comprises a cavity and a filter pipe; the filtering pipeline comprises a main pipeline positioned outside the cavity and sub-pipelines positioned in the cavity, and the main pipeline is communicated with the sub-pipelines;
the main pipeline is connected with the second opening, the end part of the free end of the sub-pipeline is closed, and a plurality of third openings are formed in the pipe wall of the sub-pipeline;
the aperture of the third opening is smaller than the smallest diameter of the solid particles.
Preferably, the number of the sub-pipes is plural.
Preferably, the filtration unit comprises a filter comprising a chamber and a filter element disposed in the chamber; the filter element is used for filtering solids in the cleaning solution;
the chamber wall is provided with a first inlet, a first outlet, a second inlet and a second outlet, and the first inlet is used for inputting cleaning liquid into the chamber; the first outlet is used for outputting the cleaning liquid filtered by the filter element; the second inlet is used for inputting self-cleaning liquid to clean the filter element; the second outlet is used for outputting self-cleaning liquid.
Preferably, the first inlet and the second inlet are disposed at a first side of the chamber, the first outlet and the second outlet are symmetrically disposed at a second side and a third side of the chamber, and the second side and the third side are disposed oppositely.
Preferably, the number of the filters is two, and the two filters are connected in parallel;
the filter unit further comprises a switching structure, and the switching structure is used for switching one of the two sets of filters to be opened and the other set of filters to be closed.
Preferably, the filtration unit further comprises a monitoring control module, and the switching structure comprises a first switch and a second switch, wherein the first switch and the second switch are respectively connected with the first inlet and the first outlet of one set of the filters;
the switching structure further comprises a third switch and a fourth switch, wherein the third switch and the fourth switch are respectively connected with the first inlet and the first outlet of another set of the filter;
the monitoring control module is connected with the first switch, the second switch, the third switch and the fourth switch, and the monitoring control module is used for controlling the opening and closing of the first switch, the second switch, the third switch and the fourth switch so as to control the closing of one set of filter and the opening of the other set of filter when the output flow of the cleaning liquid of the filter is monitored to not reach a set flow value.
Preferably, the switching structure further comprises a fifth switch and a sixth switch, the fifth switch and the sixth switch are respectively connected with the second inlet and the second outlet of one set of the filters;
the switching structure further comprises a seventh switch and an eighth switch, and the seventh switch and the eighth switch are respectively connected with the second inlet and the second outlet of another set of the filter;
the monitoring control module is connected with the fifth switch, the sixth switch, the seventh switch and the eighth switch, and is further used for controlling the fifth switch, the sixth switch, the seventh switch and the eighth switch to be turned on and off so as to control the filter to carry out self-cleaning when the monitored cleaning liquid output flow of the turned-on filter does not reach a set flow value.
The invention also provides a substrate production device which comprises the substrate cleaning device.
The invention has the beneficial effects that: according to the substrate cleaning device provided by the invention, the pretreatment unit is arranged, so that large-size solid foreign matters in the cleaning liquid can be crushed into small-size solid particles, and the small-size solid particles can be separated from the liquid, so that the phenomenon that a large amount of large-size solid foreign matters directly flow into the filtering unit to cause blockage of the filtering unit is effectively avoided, the service life of the filtering unit is effectively prolonged, the cleaning liquid pretreated by the pretreatment unit can be further filtered by the filtering unit, the small-size solid foreign matters in the cleaning liquid are filtered, the cleaning liquid which flows back again and is input into the cleaning cavity is cleaner, and the cleaning quality of the substrate cleaning device is improved.
By adopting the substrate cleaning device, the substrate production equipment provided by the invention improves the utilization rate of the substrate production equipment, reduces the workload of equipment maintenance and the consumption of consumable materials, and can comprehensively realize the refinement and automatic management of a production line.
Drawings
FIG. 1 is a schematic view of a substrate cleaning apparatus according to an embodiment of the present invention;
FIG. 2 is a schematic view of a crushing section of the substrate cleaning apparatus according to the embodiment of the present invention;
FIG. 3 is a schematic diagram of a separating portion of the substrate cleaning apparatus according to the embodiment of the present invention;
FIG. 4 is a schematic structural view of a filtering conduit of the separation part in the embodiment of the present invention;
FIG. 5 is a schematic view of a filter in the filter unit according to the embodiment of the present invention;
fig. 6 is a schematic structural diagram of two sets of filters in the filter unit according to the embodiment of the present invention.
Wherein the reference numbers indicate:
1. a cleaning chamber; 2. a pre-processing unit; 21. a crushing section; 210. a housing; 211. a shaft; 212. an impeller; 213. a drive member; 214. a first opening; 215. a second opening; 22. a separation section; 220. a cavity; 221. a main pipeline; 222. a subduct; 223. a third opening; 224. a fourth opening; 3. a filtration unit; 30. a filter; 301. a chamber; 302. a filter element; 303. a first inlet; 304. a first outlet; 305. a second inlet; 306. a second outlet; 31. a first switch; 32. a second switch; 33. a third switch; 34. a fourth switch; 4. and a liquid supply jar.
Detailed Description
In order to make those skilled in the art better understand the technical solution of the present invention, a substrate cleaning apparatus and a substrate production apparatus provided by the present invention will be described in further detail with reference to the accompanying drawings and the detailed description.
The embodiment of the invention provides a substrate cleaning device, which comprises a cleaning cavity 1 and a filtering system connected with the cleaning cavity 1, wherein the filtering system is used for filtering cleaning liquid in the cleaning cavity 1 and supplying the filtered cleaning liquid to the cleaning cavity 1, the filtering system comprises a pretreatment unit 2 and a filtering unit 3, the pretreatment unit 2 is connected with the cleaning cavity 1 and the filtering unit 3, and the filtering unit 3 is connected with the cleaning cavity 1; the pretreatment unit 2 is used for crushing the solid in the cleaning liquid output from the cleaning cavity 1 and separating the crushed solid from the liquid; the filtering unit 3 is used for filtering the cleaning liquid output by the pretreatment unit 2 and inputting the filtered cleaning liquid into the cleaning cavity 1.
A liquid supply jar 4 is connected between the pretreatment unit 2 and the filter unit 3, and the liquid supply jar 4 is used for supplying clean cleaning liquid to the filter system, so that the filter system can input the pretreated and filtered cleaning liquid and the newly supplied cleaning liquid into the cleaning cavity 1 to clean the substrate in the cleaning cavity 1.
In this embodiment, the substrate cleaning apparatus, such as a color filter substrate cleaning apparatus, generally strips the PR glue on the color filter substrate, cleans the PR glue through the cleaning liquid in the cleaning chamber 1, outputs the cleaning liquid with the PR glue for filtering, and filters the PR glue in the cleaning liquid. The cleaning solution usually adopts KOH solution with concentration of 20%, and the cleaning solution usually cannot completely dissolve the PR glue into small-sized solid particles, so that the larger PR glue usually causes the original filter unit of the apparatus to be blocked, so that the cleaning solution cannot normally flow back into the cleaning chamber 1 for substrate cleaning.
Through setting up pretreatment unit 2, can smash the great solid foreign matter of size in the washing liquid for the less solid particle of size, and can separate the less solid particle of size and liquid, thereby effectively avoid the great solid foreign matter of a large amount of sizes directly to flow into filter unit 3 and lead to its jam, filter unit 3's life has effectively been prolonged, through setting up filter unit 3, can further filter the washing liquid after pretreatment of pretreatment unit 2, thereby filter the less solid foreign matter of size in the washing liquid, make the washing liquid of backward flow input to washing chamber 1 once more cleaner, the cleaning quality of base plate cleaning device has been improved.
In the present embodiment, the pretreatment unit 2 includes a crushing section 21 and a separating section 22, the crushing section 21 being connected to the separating section 22; the crushing section 21 is used for crushing the solid in the cleaning liquid output from the cleaning chamber 1 into solid particles smaller than the original volume; the separation section 22 is used to separate solid particles in the cleaning liquid from the liquid. The arrangement of the crushing part 21 and the separating part 22 can separate out the solid foreign matters with larger size in the cleaning liquid, thereby avoiding the solid foreign matters with larger size from flowing into the subsequent filtering unit 3 and further avoiding the solid foreign matters with larger size from blocking the filtering unit 3.
As shown in fig. 2, the crushing unit 21 includes a housing 210, a shaft 211 disposed in the housing 210, an impeller 212 disposed on the shaft 211, and a driving member 213 disposed outside the housing 210; the casing 210 is provided with a first opening 214 and a second opening 215, and the cleaning liquid can enter the casing 210 from the first opening 214 and can be output to the separation part 22 from the second opening 215; the driving member 213 is used for driving the shaft 211 to rotate, so that the shaft 211 drives the impeller 212 to rotate, thereby realizing the pulverization of the solid in the cleaning solution. The impeller 212 cuts and pulverizes the solids in the cleaning solution. The driving member 213 may employ a motor.
As shown in fig. 3, the separation portion 22 includes a cavity 220 and a filtering duct; the filtering pipeline comprises a main pipeline 221 positioned outside the cavity 220 and a sub-pipeline 222 positioned in the cavity 220, and the main pipeline 221 is communicated with the sub-pipeline 222; the main pipe 221 is connected with the second opening, the free end part of the sub-pipe 222 is closed, and the pipe wall of the sub-pipe 222 is provided with a plurality of third openings 223; the aperture of the third opening 223 is smaller than the smallest diameter of the solid particles. In this way, the sub-pipe 222 can filter 90% of solid particles therein, only allow the cleaning solution to flow out from the third opening 223 to the cavity 220, and allow the cleaning solution in the cavity 220 to flow to the filter unit 3 through the pipe, so as to reduce the filtering pressure of the filter unit 3 and effectively prolong the service life of the filter unit 3. The main pipe 221 is connected to the crushing portion, a fourth opening 224 is formed in the cavity 220, the fourth opening 224 is connected to the liquid supply jar, and the cleaning liquid in the cavity 220 can be output to the liquid supply jar through the fourth opening 224.
In addition, the solid foreign matters in the sub-pipe 222 can be fully decomposed under the soaking action of the cleaning liquid in the cavity 220, and the solid foreign matters which cannot be decomposed can be directly cleaned when the sub-pipe 222 is cleaned. For example, when a color filter substrate is cleaned, the PR paste peeled off from the substrate may be slowly degraded by the high-concentration KOH solution in the sub-duct 222 of the separation portion 22.
In this embodiment, as shown in fig. 4, the number of the sub-pipes 222 is plural. So can carry out more abundant filtration to the washing liquid. It should be noted that the number of the sub-pipes 222 and the aperture specification and the number of the third openings 223 on the pipe wall of the sub-pipe 222 can be specifically set according to the separation requirement in the actual production process, and are not specifically limited herein. The size of the third openings 223 in the walls of different subducts 222 may be different, and the number of the third openings may also be different.
It should be further noted that the main pipe 221 communicates with the filtering unit 3. A filter screen may be disposed in the sub-pipe 222, in which case, the free end of the sub-pipe 222 is not closed, and the pipe wall of the sub-pipe 222 is also not provided with the third opening 223, so that the sub-pipe 222 filters the solid particles with smaller size through the filter screen therein.
In the present embodiment, as shown in fig. 5, the filter unit 3 includes a filter 30, and the filter 30 includes a chamber 301 and a filter element 302 disposed in the chamber 301; the filter element 302 is used for filtering solids in the cleaning solution; a first inlet 303, a first outlet 304, a second inlet 305 and a second outlet 306 are formed in the wall of the chamber 301, and the first inlet 303 is used for inputting cleaning liquid into the chamber 301; the first outlet 304 is used for outputting the cleaning liquid filtered by the filter element 302; a second inlet 305 for feeding a self-cleaning liquid for cleaning the filter element 302; the second outlet 306 is for outputting a self-cleaning liquid.
The filter 30 has a filtering function and a self-cleaning function, and the working process of the filter 30 is as follows: when the filter 30 is normally used for filtering, the first inlet 303 and the first outlet 304 are opened, and at this time, the cleaning solution enters the filter element 302 in the chamber 301 from the first inlet 303 for filtering, and then flows out from the first outlet 304, so that the cleaning solution filtering function is realized; when the filter 30 is clogged, the first inlet 303 and the first outlet 304 are closed, the second inlet 305 and the second outlet 306 are automatically opened, and the self-cleaning liquid flows into the chamber 301 from the second inlet 305 and flows out of the second outlet 306 after the self-cleaning liquid flows into the chamber 301 and flows out of the filter element 302, so that the self-cleaning function of the filter 30 is realized. Wherein the liquid is self-cleaning, such as water.
The filter 30 of this structure can realize filtering capability, can accomplish the automatically cleaning on line when blockking up again to can improve the base plate belt cleaning device to a great extent and use the rate, and reduce artifical washing work load, improve base plate cleaning efficiency.
In this embodiment, the first inlet 303 and the second inlet 305 are disposed on a first side of the chamber 301, the first outlet 304 and the second outlet 306 are symmetrically disposed on a second side and a third side of the chamber 301, and the second side and the third side are disposed opposite to each other. Each inlet and each outlet are distributed in this way, the flow direction of the cleaning liquid in the filter 30 is opposite to the flow direction of the self-cleaning liquid, so that the filter element 302 is backwashed by the self-cleaning liquid, the self-cleaning of the filter 30 is more thorough and efficient, and the cleaning effect is better.
Preferably, in the present embodiment, as shown in fig. 6, there are two sets of filters 30, and the two sets of filters 30 are connected in parallel; the filter unit 3 further comprises a switching mechanism for switching one of the two sets of filters 30 on and the other off. The arrangement of the switching structure can prevent the filtering unit 3 from stopping filtering operation due to the blockage of one set of the filter 30, and ensure that the filtering unit 3 can continuously perform filtering operation.
In this embodiment, the filtering unit 3 further includes a monitoring control module, the switching structure includes a first switch 31 and a second switch 32, the first switch 31 and the second switch 32 are respectively connected to the first inlet 303 and the first outlet 304 of one set of the filters 30; the switching arrangement further comprises a third switch 33 and a fourth switch 34, the third switch 33 and the fourth switch 34 being connected to the first inlet 303 and the first outlet 304 of the other set of filters 30, respectively; the monitoring control module is connected with the first switch 31, the second switch 32, the third switch 33 and the fourth switch 34, and is used for controlling the opening and closing of the first switch 31, the second switch 32, the third switch 33 and the fourth switch 34 so as to control the closing of one set of filter 30 and the opening of the other set of filter 30 when the monitored output flow of the cleaning liquid of one set of filter 30 does not reach the set flow value.
The substrate cleaning device is provided with two sets of filters 30, when one set of filters 30 is blocked and cannot work continuously, the filters 30 can be switched to realize continuous production, and the equipment utilization rate is improved. The switching principle of the two sets of filters 30 during filtering is as follows: when one set of filters 30 is activated, the first switch 31 and the second switch 32 are automatically opened, and the third switch 33 and the fourth switch 34 are automatically closed. When monitoring that the output flow of the cleaning liquid of the set of filter 30 does not reach the set flow value in the production, the monitoring control module indicates that the filter element of the set of filter 30 is blocked, at the moment, the third switch 33 and the fourth switch 34 are automatically opened, the first switch 31 and the second switch 32 are closed, the set of filter 30 is automatically switched to another set of filter 30 for filtering operation, and the production is continuously maintained. The clogged filter 30 is then automatically put into a self-cleaning mode.
In this embodiment, the switching structure further includes a fifth switch and a sixth switch, and the fifth switch and the sixth switch are respectively connected to the second inlet and the second outlet of one set of the filters; the switching structure also comprises a seventh switch and an eighth switch, and the seventh switch and the eighth switch are respectively connected with a second inlet and a second outlet of the other set of filter; the monitoring control module is connected with the fifth switch, the sixth switch, the seventh switch and the eighth switch, and is further used for controlling the opening and closing of the fifth switch, the sixth switch, the seventh switch and the eighth switch so as to control the filter to carry out self-cleaning when the monitored output flow of the cleaning liquid of the opened filter does not reach a set flow value.
The switching principle of the two sets of filters in self-cleaning is as follows: when the output flow of the cleaning liquid of one set of the filters does not reach the set flow value, the monitoring control module controls the fifth switch and the sixth switch which are connected with the second inlet and the second outlet of the set of the filters to be automatically opened, so that the self-cleaning mode of the set of the filters which are blocked is started. When the output flow of the cleaning liquid of the other set of filter does not reach the set flow value, the monitoring control module controls the seventh switch and the eighth switch which are connected with the second inlet and the second outlet of the other set of filter to be automatically opened in the same way, so that the set of filter which is blocked starts the self-cleaning mode.
During the self-cleaning process of the filter, the self-cleaning mode can be automatically controlled to be closed after the filter is cleaned by setting the flushing flow and the flushing time of the self-cleaning liquid, namely the fifth switch and the sixth switch are closed, or the seventh switch and the eighth switch are closed. Of course, it may also be determined whether to turn off the self-cleaning mode of the filter by monitoring whether the output flow of the cleaning solution of the filter reaches the set flow value in real time during the self-cleaning process.
It should be noted that the filtering operation and the self-cleaning operation of the two sets of filters are performed independently without mutual influence, the clogged filter is automatically in a standby state after the self-cleaning is finished, and the other set of filter is started again after being clogged. The filter in the embodiment is automatically cleaned and cleaned to be confirmed in the whole process, the operation is convenient, and the automation degree is high.
The working process of the substrate cleaning device in this embodiment specifically includes:
1. when the substrate cleaning device starts to work, a set of filters is started.
2. The cleaning liquid output from the cleaning cavity firstly enters the crushing part to crush the large-size solid foreign matters in the cleaning liquid, and the cleaning liquid output from the crushing part flows into the separation part to carry out solid-liquid separation.
3. In the cleaning process, when the monitored output flow of the cleaning liquid of the currently started filter does not reach a set flow value, the filter is automatically switched to another filter.
4. When the filter is switched, the self-cleaning is automatically carried out on the blocked filter (namely the filter of which the output flow of the cleaning solution does not reach the set flow value), and the filter is in a standby state after the cleaning is finished.
5. And subsequently, when the other set of filter is blocked, performing online switching and self-cleaning of the filter according to the steps 3 and 4.
6. After the entire substrate cleaning operation is finished, the cleaning operation of the entire substrate cleaning apparatus is performed, including cleaning the sub-pipes in the separation section.
This base plate belt cleaning device can realize comprehensive automatic control filter in service behavior, does not need personnel to intervene the operation in the cleaning process, and the device can realize automatically that the filter switches and filter self-cleaning function to effectively improved the device and used the rate, and reduced personnel and washd the operation, and then can realize producing line and become more meticulous, automated management.
In addition, only one set of filter may be provided in the filtering unit, and only when the set of filter is clogged, the filtering operation needs to be stopped, then the filter is self-cleaned, and after the self-cleaning operation is completed, the set of filter is started to filter.
This base plate belt cleaning device, through setting up the preprocessing unit, can smash the great solid foreign matter of size in the washing liquid for the less solid particle of size, and can separate the less solid particle of size and liquid, thereby effectively avoid the great solid foreign matter of a large amount of sizes directly to flow into the filter unit and lead to its jam, the life of filter unit has effectively been prolonged, through setting up the filter unit, can further filter the washing liquid after the preprocessing unit preliminary treatment, thereby filter the less solid foreign matter of size in the washing liquid, make the washing liquid of backward flow input to the washing chamber once more cleaner, the cleaning quality of base plate belt cleaning device has been improved.
The embodiment of the invention also provides substrate production equipment which comprises the substrate cleaning device in the embodiment.
Through adopting the base plate belt cleaning device in above-mentioned embodiment, improved this base plate production facility's utilization rate to reduce the work load of equipment maintenance and the use amount of consumptive material, can realize comprehensively that the production line is meticulous and automated management.
It will be understood that the above embodiments are merely exemplary embodiments taken to illustrate the principles of the present invention, which is not limited thereto. It will be apparent to those skilled in the art that various modifications and improvements can be made without departing from the spirit and substance of the invention, and these modifications and improvements are also considered to be within the scope of the invention.
Claims (8)
1. A substrate cleaning device comprises a cleaning cavity and a filtering system connected with the cleaning cavity, wherein the filtering system is used for filtering cleaning liquid in the cleaning cavity and supplying the filtered cleaning liquid to the cleaning cavity; the pretreatment unit is used for crushing the solid in the cleaning liquid output from the cleaning cavity and separating the crushed solid from the liquid; the filtering unit is used for filtering the cleaning liquid output by the preprocessing unit and inputting the filtered cleaning liquid into the cleaning cavity;
the pretreatment unit comprises a crushing part and a separating part, and the crushing part is connected with the separating part;
the crushing part is used for crushing the solid in the cleaning liquid output from the cleaning cavity into solid particles smaller than the original volume of the solid;
the separation part is used for separating the solid particles in the cleaning liquid from the liquid;
the crushing part comprises a shell, a shaft arranged in the shell, an impeller arranged on the shaft and a driving part arranged outside the shell;
the shell is provided with a first opening and a second opening, and cleaning liquid can enter the shell from the first opening and can be output to the separation part from the second opening;
the driving piece is used for driving the shaft to rotate so as to enable the shaft to drive the impeller to rotate, and therefore solid in the cleaning liquid is crushed;
the separation part comprises a cavity and a filtering pipeline; the filtering pipeline comprises a main pipeline positioned outside the cavity and sub-pipelines positioned in the cavity, and the main pipeline is communicated with the sub-pipelines;
the main pipeline is connected with the second opening, the end part of the free end of the sub-pipeline is closed, and a plurality of third openings are formed in the pipe wall of the sub-pipeline;
the aperture of the third opening is smaller than the smallest diameter of the solid particles.
2. The substrate cleaning apparatus according to claim 1, wherein the number of the sub-pipes is plural.
3. The substrate cleaning apparatus of any one of claims 1-2, wherein the filter unit comprises a filter comprising a chamber and a filter element disposed in the chamber; the filter element is used for filtering solids in the cleaning solution;
the chamber wall is provided with a first inlet, a first outlet, a second inlet and a second outlet, and the first inlet is used for inputting cleaning liquid into the chamber; the first outlet is used for outputting the cleaning liquid filtered by the filter element; the second inlet is used for inputting self-cleaning liquid to clean the filter element; the second outlet is used for outputting self-cleaning liquid.
4. The substrate cleaning apparatus of claim 3, wherein the first inlet and the second inlet are disposed at a first side of the chamber, the first outlet and the second outlet are symmetrically disposed at a second side and a third side of the chamber, and the second side and the third side are disposed opposite to each other.
5. The apparatus for cleaning a substrate according to claim 4, wherein the number of the filters is two, and the two filters are connected in parallel;
the filter unit further comprises a switching structure, and the switching structure is used for switching one of the two sets of filters to be opened and the other set of filters to be closed.
6. The apparatus for cleaning substrates of claim 5, wherein the filtering unit further comprises a monitoring control module, the switching structure comprises a first switch and a second switch, the first switch and the second switch are respectively connected to the first inlet and the first outlet of one set of the filters;
the switching structure further comprises a third switch and a fourth switch, wherein the third switch and the fourth switch are respectively connected with the first inlet and the first outlet of another set of the filter;
the monitoring control module is connected with the first switch, the second switch, the third switch and the fourth switch, and the monitoring control module is used for controlling the opening and closing of the first switch, the second switch, the third switch and the fourth switch so as to control the closing of one set of filter and the opening of the other set of filter when the output flow of the cleaning liquid of the filter is monitored to not reach a set flow value.
7. The substrate cleaning apparatus of claim 6, wherein the switching structure further comprises a fifth switch and a sixth switch, the fifth switch and the sixth switch being connected to the second inlet and the second outlet of one set of the filters, respectively;
the switching structure further comprises a seventh switch and an eighth switch, and the seventh switch and the eighth switch are respectively connected with the second inlet and the second outlet of another set of the filter;
the monitoring control module is connected with the fifth switch, the sixth switch, the seventh switch and the eighth switch, and is further used for controlling the fifth switch, the sixth switch, the seventh switch and the eighth switch to be turned on and off so as to control the filter to carry out self-cleaning when the monitored cleaning liquid output flow of the turned-on filter does not reach a set flow value.
8. A substrate production apparatus characterized by comprising the substrate cleaning device according to any one of claims 1 to 7.
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| CN201910120531.7A CN109692843B (en) | 2019-02-18 | 2019-02-18 | Substrate cleaning device and substrate production equipment |
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| CN109692843B true CN109692843B (en) | 2020-12-01 |
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| CN115090030B (en) * | 2022-07-27 | 2023-06-23 | 江西江岳环保科技有限公司 | Method for observing clogging degree of filter medium through cleaning agent flow rate change |
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