CN109650743A - Through the grey three silver medal LOW-E glass of crystal and preparation method thereof of color neutrality - Google Patents
Through the grey three silver medal LOW-E glass of crystal and preparation method thereof of color neutrality Download PDFInfo
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- CN109650743A CN109650743A CN201910042873.1A CN201910042873A CN109650743A CN 109650743 A CN109650743 A CN 109650743A CN 201910042873 A CN201910042873 A CN 201910042873A CN 109650743 A CN109650743 A CN 109650743A
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3626—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing a nitride, oxynitride, boronitride or carbonitride
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3639—Multilayers containing at least two functional metal layers
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
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Abstract
The present invention relates to grey three silver medal LOW-E glass of a kind of crystal through color neutrality and preparation method thereof, the glass includes the composite film that glass matrix and plating are located at one side surface of glass matrix, the composite film includes the first medium layer being sequentially depositing outwardly from the glass matrix, first infrared reflecting layer, first protective layer, second dielectric layer, second infrared reflecting layer, improve layer through color, coat of metal, third dielectric layer, third infrared reflecting layer, second protective layer and medium protective layer, first infrared reflecting layer, second infrared reflecting layer and the third infrared reflecting layer are Ag layers, the color improvement layer that penetrates is Cu layers, the present invention is by designing reasonable film layer structure and adjusting the thickness proportion of each film layer, so that glass product of the invention is neutral through color and crystal ash face is presented in appearance Color increases more beautiful artistic effect for the whole design of building, meets the esthetic requirement of top-grade building.
Description
Technical field
The present invention relates to field of glass production technology, and in particular to a kind of grey three silver medal LOW-E glass of crystal through color neutrality
Glass and preparation method thereof.
Background technique
With the reinforcement that the implementation dynamics of national energy conservation and emission reduction policy increases and people realize low-carbon environment-friendly, with LOW-
E glass be representative energy-saving glass in door and window, glass curtain wall using more and more extensive.In LOW-E glass family, energy saving
Three excellent silver medal LOW-E glass of energy are widely applied.
But in three traditional silver medal LOW-E glass processings, product penetrates a* value generally -4 or so, not through color
Enough neutrality, when showing as through coated glass observation object, object can show greening, affect the original light of glass and pass through effect
Fruit.
Summary of the invention
The present invention provides a kind of grey three silver medal LOW-E glass of the crystal through color neutrality, and it is saturating can effectively to solve glass product
The green problem of colour cast is crossed, so that the light for promoting LOW-E glass passes through effect and outdoor reflected colour in crystal ash color.
In order to achieve the above objectives, the technical solution adopted by the present invention is that: a kind of three silver medal LOW-E of crystal ash through color neutrality
Glass, the composite film of one side surface of glass matrix is located at including glass matrix and plating, and the composite film includes certainly
First medium layer that the glass matrix is sequentially depositing outwardly, the first infrared reflecting layer, the first protective layer, second dielectric layer,
Two infrared reflecting layers improve layer, coat of metal, third dielectric layer, third infrared reflecting layer, the second protective layer and Jie through color
Quality guarantee sheath, first infrared reflecting layer, second infrared reflecting layer and the third infrared reflecting layer are Ag layers, described
Through color improve layer be Cu layer, it is described through color improvement layer with a thickness of 4-8nm.
Further, first infrared reflecting layer with a thickness of 5-9nm；Second infrared reflecting layer with a thickness of 6-
9nm；The third infrared reflecting layer with a thickness of 12-16nm.
Further, the first medium layer is by the SiNx layer that is sequentially depositing from the side of the glass matrix towards outside
With ZnOx layers form, the first medium layer with a thickness of 28-36nm.
Further, the second dielectric layer is the composite layer of ZnSnOx layers, ZnOx layers or both of the above, and described second is situated between
Matter layer with a thickness of 40-49nm.
Further, the third dielectric layer by be sequentially depositing from the side of the glass matrix towards outside AZO layer,
ZnSnOx layers and ZnOx layer form, the third dielectric layer with a thickness of 73-81nm.
Further, first protective layer and second protective layer are AZO layers；The coat of metal is NiCr
Layer.
Further, first protective layer with a thickness of 8-12nm；The coat of metal with a thickness of 0.8-
2.3nm；Second protective layer with a thickness of 8-12nm.
Further, the medium protective layer be SiNx layer or SiNxOy layers, the medium protective layer with a thickness of 28-
35nm。
The present invention also provides a kind of preparation method of the grey three silver medal LOW-E glass of above-mentioned crystal through color neutrality, features
It is, includes the following steps: that, using magnetron sputtering coating method, successively plating sets the first medium of 28-36nm on glass matrix
Layer, the first infrared reflecting layer of 5-9nm, the first protective layer of 8-12nm, the second dielectric layer of 40-49nm, 6-9nm it is second red
Third dielectric layer, the 12- for improving layer, the coat of metal of 0.8-2.3nm, 73-81nm through color of outer reflective layer, 4-8nm
Third infrared reflecting layer, the second protective layer of 8-12nm and the medium protective layer of 28-35nm of 16nm；Wherein, described first
Infrared reflecting layer, second infrared reflecting layer and the third infrared reflecting layer are Ag layers, described to improve layer through color as Cu
Layer.
Further, the first medium layer is by the SiNx layer that is sequentially depositing from the side of the glass matrix towards outside
It is formed with ZnOx layers；The second dielectric layer is ZnSnOx layers, ZnOx layers or is made of its composite layer；The third dielectric layer by
AZO layer, ZnSnOx layers and the ZnOx layers of composition being sequentially depositing from the side of the glass matrix towards outside；First protection
Layer and second protective layer are AZO layers；The coat of metal is NiCr layers；The medium protective layer be SiNx layer or
SiNxOy layers.
After the above technical solution is adopted, the invention has the following advantages over the prior art: the present invention is closed by design
The film layer structure of reason and the thickness proportion for adjusting each film layer, so that glass product of the invention is neutral through color and appearance is presented
Crystal ash color increases more beautiful artistic effect for the whole design of building, meets the esthetic requirement of top-grade building；This hair
It is bright that color is penetrated to improve through color improvement layer (Cu layers) by setting, because copper has stronger selective absorbing to visible light,
Can make glass product penetrates color into neutralc tint；The present invention makes glass product appearance in water by the collocation of reasonable thicknesses of layers
Brilliant ash color, increases the diversity of three silver products colors, it is green through colour cast can effectively to solve three traditional silver medal LOW-E glass
The problem of.
Detailed description of the invention
Attached drawing 1 is the structural schematic diagram of the grey three silver medal LOW-E glass of the crystal of the invention through color neutrality.
Wherein,
100, glass matrix；
200, composite film；201, first medium layer；202, the first infrared reflecting layer；203, the first protective layer；204,
Second medium layer；205, the second infrared reflecting layer；206, improve layer through color；207, coat of metal；208, third dielectric layer；
209, third infrared reflecting layer；210, the second protective layer；211, medium protective layer.
Specific embodiment
Below in conjunction with the accompanying drawings and embodiment the invention will be further described.
As shown in Figure 1, a kind of grey three silver medal LOW-E glass of crystal through color neutrality, including glass matrix 100 and plating are set
Composite film 200 in 100 1 side surface of glass matrix, composite film 200 include being sequentially depositing outwardly from glass matrix 100
First medium layer 201, the first infrared reflecting layer 202, the first protective layer 203, second dielectric layer 204, the second infrared reflecting layer
205, improve layer 206, coat of metal 207, third dielectric layer 208, third infrared reflecting layer 209, the second protective layer through color
210 and medium protective layer 211.
It is specific:
First infrared reflecting layer 202, the second infrared reflecting layer 205 and third infrared reflecting layer 209 are Ag layers, and first is infrared
Reflecting layer 202 with a thickness of 5-9nm；Second infrared reflecting layer 205 with a thickness of 6-9nm；The thickness of third infrared reflecting layer 209
For 12-16nm.
Improving layer 206 through color is Cu layers, through color improvement layer 206 with a thickness of 4-8nm.Copper has visible light relatively strong
Selective absorbing, can make glass product through color at neutralc tint.
First medium layer 201 is by the SiNx layer and ZnOx layer group that are sequentially depositing from the side of glass matrix 100 towards outside
At, first medium layer 201 with a thickness of 28-36nm.
Second dielectric layer 204 is the composite layer of ZnSnOx layers, ZnOx layers or both of the above, the thickness of second dielectric layer 204
For 40-49nm.
Third dielectric layer 208 by be sequentially depositing from the side of glass matrix 100 towards outside AZO layer, ZnSnOx layers and
ZnOx layers composition, third dielectric layer 208 with a thickness of 73-81nm.
First protective layer 203 and the second protective layer 210 are AZO layers；Coat of metal 207 is NiCr layers.First protection
Layer 203 with a thickness of 8-12nm；Coat of metal 207 with a thickness of 0.8-2.3nm；Second protective layer 210 with a thickness of 8-
12nm。
Medium protective layer 211 be SiNx layer or SiNxOy layers, medium protective layer 211 with a thickness of 28-35nm.
A kind of preparation method preparing the grey three silver medal LOW-E glass of the above-mentioned crystal through color neutrality, includes the following steps: to adopt
With magnetron sputtering coating method, the first of the first medium layer 201,5-9nm that set 28-36nm is successively plated on glass matrix 100
Infrared reflecting layer 202, the first protective layer 203 of 8-12nm, the second dielectric layer 204 of 40-49nm, 6-9nm it is second infrared anti-
Penetrate the third dielectric layer for improving layer 206, the coat of metal 207 of 0.8-2.3nm, 73-81nm through color of layer 205,4-8nm
208, the third infrared reflecting layer 209 of 12-16nm, the second protective layer 210 of 8-12nm and the medium protective layer of 28-35nm
211。
Specific: the first infrared reflecting layer 202, the second infrared reflecting layer 205 and third infrared reflecting layer 209 are Ag layers；
Improving layer 206 through color is Cu layers；First medium layer 201 towards outside by being sequentially depositing from the side of glass matrix 100
SiNx layer and ZnOx layers of composition；Second dielectric layer 204 is ZnSnOx layers, ZnOx layers or is made of its composite layer；Third dielectric layer
208 by be sequentially depositing from the side of glass matrix 100 towards outside AZO layer, ZnSnOx layers and ZnOx layers form；First protection
Layer 203 and the second protective layer 210 are AZO layers；Coat of metal 207 is NiCr layers；Medium protective layer 211 be SiNx layer or
SiNxOy layers.
It is illustrated below in conjunction with specific embodiment:
Embodiment one:
Using magnetron sputtering coating method, on 100 surface of glass matrix, plating sets composite film 200, specifically includes following step
It is rapid:
(1) magnetron sputtering coating method is used, plating sets first medium layer 201 on glass matrix 100: in medium frequency alternating current
Under the control in source, silicon target is in argon gas and nitrogen mixture atmosphere (Ar:N2=9:7) under sputtering sedimentation, Zn target is mixed in argon gas and oxygen
Close atmosphere (Ar:O2=7:10) under sputtering sedimentation, the first medium layer 201 of depositional coating thickness 28.8nm is (from inside to outside successively
For the SiNx layer of 18.1nm thickness and the ZnOx layer of 10.7nm thickness)；
(2) magnetron sputtering coating method is used, plating sets the first infrared reflecting layer 202 on first medium layer 201: in direct current
Under the control of power supply, Ag target sputtering sedimentation under pure argon atmosphere, depositional coating with a thickness of 7.01nm Ag layer；
(3) magnetron sputtering coating method is used, plating sets the first protective layer 203 on the first infrared reflecting layer 202: in intermediate frequency
Under the control of AC power source, AZO target sputtering sedimentation under an argon atmosphere, depositional coating with a thickness of 10nm AZO layer；
(4) magnetron sputtering coating method is used, plating sets second dielectric layer 204 on the first protective layer 203: in midfrequent AC
Under the control of power supply, Zn, ZnSn target are in argon gas and oxygen mix atmosphere (Ar:O2=7:10) under sputtering sedimentation, deposition film thickness
Degree is the second dielectric layer 204 (the ZnSnOx layer of 31.4nm thickness and the ZnOx layer of 16.7nm thickness) of 48.1nm；
(5) magnetron sputtering coating method is used, plating sets the second infrared reflecting layer 205 in second dielectric layer 204: in direct current
Under the control of power supply, Ag target sputtering sedimentation under pure argon atmosphere, depositional coating with a thickness of 6.53nm Ag layer；
(6) magnetron sputtering coating method is used, plating, which is set, on the second infrared reflecting layer 205 improves layer 206 through color: straight
Under the control in galvanic electricity source, Cu target sputtering sedimentation under pure argon atmosphere, depositional coating with a thickness of 6.59nm Cu layer；
(7) magnetron sputtering coating method is used, sets coat of metal 207 improving plating on layer 206 through color: in direct current
Under the control in source, NiCr target sputtering sedimentation under pure argon atmosphere, depositional coating with a thickness of 1.02nm NiCr layer；
(8) magnetron sputtering coating method is used, third dielectric layer 208 is plated on the second coat of metal: in midfrequent AC
Under the control of power supply, AZO target is under straight argon atmosphere, and ZnSn target, Zn target are in argon gas and oxygen mix atmosphere (Ar:O2=7:10) under
Successively sputtering sedimentation, depositional coating with a thickness of 77.8nm third dielectric layer 208 (be followed successively by from inside to outside 10nm thickness AZO layer,
The ZnSn layer of 51.6nm thickness and the Zn layer of 13.2nm thickness)；
(9) magnetron sputtering coating method is used, third infrared reflecting layer 209 is plated on third dielectric layer 208: in direct current
Under the control in source, Ag target sputtering sedimentation under pure argon atmosphere, depositional coating with a thickness of 13.75nm Ag layer；
(10) magnetron sputtering coating method is used, plating sets the second protective layer 210 on third infrared reflecting layer 209: in
Under the control of frequency AC power source, AZO target sputtering sedimentation under an argon atmosphere, depositional coating with a thickness of 9.5nm AZO layer；
(11) magnetron sputtering coating method is used, plating sets medium protective layer 211 on the second protective layer 210, hands in intermediate frequency
Under the control in galvanic electricity source, silicon target is in argon gas and nitrogen mixture atmosphere (Ar:N2=9:7) under sputtering sedimentation, depositional coating with a thickness of
34.1nm SiNx layer.
Optical performance test is carried out to glass product obtained above, obtains that the results are shown in Table 1:
Table 1
| Glass surface color | R%g | L*g | a*g | b*g |
| 8.58 | 35.16 | -0.18 | -3.14 | |
| Film surface color | R%f | L*f | a*f | b*f |
| 2.5 | 17.94 | 4.35 | -0.75 | |
| Through color | T% | / | a*t | b*t |
| 55.66 | / | -0.76 | 1.64 | |
| Side Color | R%c | L*c | a*c | b*c |
| 14.9 | 45.49 | -0.33 | -4.93 |
Quantitative measurement is carried out to glass product obtained above, the radiance for obtaining monolithic glass product is 0.02；
Film layer wiping, film layer not demoulding in wiping process are carried out according to GB9656-2003；Impact experiment, resistance to is carried out to glass product
Irradiation experiment and anti-oxidant experiment, experimental result are able to satisfy requirement.
Particularly, in the present invention, a*, b* are psychometric chroma；+ a* indicates red；- a* indicates green；+ b* indicates yellow
Color；- b* indicates blue；T% is visible transmission percentage；A*t is the red green degree of transmitted light；B*t is transmitted light
Champac degree；R% indicates light reflection percentage.
Embodiment two:
Using magnetron sputtering coating method, on 100 surface of glass matrix, plating sets composite film 200, specifically includes following step
It is rapid:
(1) magnetron sputtering coating method is used, plating sets first medium layer 201 on glass matrix 100: in medium frequency alternating current
Under the control in source, silicon target is in argon gas and nitrogen mixture atmosphere (Ar:N2=9:7) under sputtering sedimentation, Zn target is mixed in argon gas and oxygen
Close atmosphere (Ar:O2=7:10) under sputtering sedimentation, depositional coating with a thickness of 35.1nm first medium layer 201 (from the inside to the outside according to
It is secondary for the SiNx layer of 24.4nm thickness and the ZnOx layer of 10.7nm thickness)；
(2) magnetron sputtering coating method is used, plating sets the first infrared reflecting layer 202 on first medium layer 201: in direct current
Under the control of power supply, Ag target sputtering sedimentation under pure argon atmosphere, depositional coating with a thickness of 6.87nm Ag layer；
(3) magnetron sputtering coating method is used, plating sets the first protective layer 203 on the first infrared reflecting layer 202: in intermediate frequency
Under the control of AC power source, AZO target sputtering sedimentation under an argon atmosphere, depositional coating with a thickness of 10nm AZO layer；
(4) magnetron sputtering coating method is used, plating sets second dielectric layer 204 on the first protective layer 203: in midfrequent AC
Under the control of power supply, Zn, ZnSn target are in argon gas and oxygen mix atmosphere (Ar:O2=7:10) under sputtering sedimentation, deposition film thickness
Degree is that the second dielectric layer 204 of 44.2nm (is followed successively by the ZnSnOx layer of 27.5nm thickness and the ZnOx of 16.7nm thickness from the inside to the outside
Layer)；
(5) magnetron sputtering coating method is used, plating sets the second infrared reflecting layer 205 in second dielectric layer 204: in direct current
Under the control of power supply, Ag target sputtering sedimentation under pure argon atmosphere, depositional coating with a thickness of 6.53nm Ag layer；
(6) magnetron sputtering coating method is used, plating, which is set, on the second infrared reflecting layer 205 improves layer 206 through color: straight
Under the control in galvanic electricity source, Cu target sputtering sedimentation under pure argon atmosphere, depositional coating with a thickness of 7.2nm Cu layer；
(7) magnetron sputtering coating method is used, plating sets coat of metal 207 on the second infrared reflecting layer 205: in direct current
Under the control of power supply, NiCr target sputtering sedimentation under pure argon atmosphere, depositional coating with a thickness of 1.32nm NiCr layer；
(8) magnetron sputtering coating method is used, plating sets third dielectric layer 208 on the second coat of metal: is handed in intermediate frequency
Under the control in galvanic electricity source, AZO target is under straight argon atmosphere, and ZnSn target, Zn target are in argon gas and oxygen mix atmosphere (Ar:O2=7:10)
Under successively sputtering sedimentation, depositional coating with a thickness of 75.2nm the (ZnSn of the AZO layer of 10nm thickness, 52nm thickness of third dielectric layer 208
The Zn layer of layer and 13.2nm thickness)；
(9) magnetron sputtering coating method is used, plating sets third infrared reflecting layer 209 on third dielectric layer 208: in direct current
Under the control of power supply, Ag target sputtering sedimentation under pure argon atmosphere, depositional coating with a thickness of 13.6nm Ag layer；
(10) magnetron sputtering coating method is used, plating sets the second protective layer 210 on third infrared reflecting layer 209: in
Under the control of frequency AC power source, AZO target sputtering sedimentation under an argon atmosphere, depositional coating with a thickness of 9.5nm AZO layer；
(11) magnetron sputtering coating method is used, plating sets medium protective layer 211 on the second protective layer 210, hands in intermediate frequency
Under the control in galvanic electricity source, silicon target is in argon gas, nitrogen and oxygen mix atmosphere (Ar:N2=9:7:1) under sputtering sedimentation, depositional coating
With a thickness of the SiNxOy layer of 29.5nm.
Optical performance test is carried out to glass product obtained above, obtains that the results are shown in Table 2:
Table 2
| Glass surface color | R%g | L*g | a*g | b*g |
| 13 | 42.77 | -0.72 | -6.28 | |
| Film surface color | R%f | L*f | a*f | b*f |
| 3.11 | 20.47 | -5.38 | -9.11 | |
| Through color | T% | / | a*t | b*t |
| 53.39 | / | -1.82 | -1.19 | |
| Side Color | R%c | L*c | a*c | b*c |
| / | 50.25 | -2.38 | -4.5 |
Quantitative measurement is carried out to glass product obtained above, the radiance for obtaining monolithic glass product is 0.02；
Film layer wiping, film layer not demoulding in wiping process are carried out according to GB9656-2003；Impact experiment, resistance to is carried out to glass product
Irradiation experiment and anti-oxidant experiment, experimental result are able to satisfy requirement.
Embodiment three:
Using magnetron sputtering coating method, on 100 surface of glass matrix, plating sets composite film 200, specifically includes following step
It is rapid:
(1) magnetron sputtering coating method is used, plating sets first medium layer 201 on glass matrix 100: in medium frequency alternating current
Under the control in source, silicon target is in argon gas and nitrogen mixture atmosphere (Ar:N2=9:7) under sputtering sedimentation, Zn target is mixed in argon gas and oxygen
Close atmosphere (Ar:O2=7:10) under sputtering sedimentation, depositional coating with a thickness of 33.1nm first medium layer 201 (from the inside to the outside according to
It is secondary for the SiNx layer of 22.4nm thickness and the ZnOx layer of 10.7nm thickness)；
(2) magnetron sputtering coating method is used, plating sets the first infrared reflecting layer 202 on first medium layer 201: in direct current
Under the control of power supply, Ag target sputtering sedimentation under pure argon atmosphere, depositional coating with a thickness of 7.58nm Ag layer；
(3) magnetron sputtering coating method is used, plating sets the first protective layer 203 on the first infrared reflecting layer 202: in intermediate frequency
Under the control of AC power source, AZO target sputtering sedimentation under an argon atmosphere, depositional coating with a thickness of 10nm AZO layer；
(4) magnetron sputtering coating method is used, plating sets second dielectric layer 204 on the first protective layer 203: in midfrequent AC
Under the control of power supply, Zn, ZnSn target are in argon gas and oxygen mix atmosphere (Ar:O2=7:10) under sputtering sedimentation, deposition film thickness
Degree is that the second dielectric layer 204 of 40.3nm (is followed successively by the ZnSnOx layer of 23.6nm thickness and the ZnOx of 16.7nm thickness from the inside to the outside
Layer)；
(5) magnetron sputtering coating method is used, plating sets the second infrared reflecting layer 205 in second dielectric layer 204: in direct current
Under the control of power supply, Ag target sputtering sedimentation under pure argon atmosphere, depositional coating with a thickness of 8.76nm Ag layer；
(6) magnetron sputtering coating method is used, plating, which is set, on the second infrared reflecting layer 205 improves layer 206 through color: straight
Under the control in galvanic electricity source, Cu target sputtering sedimentation under pure argon atmosphere, depositional coating with a thickness of 4.92nm Cu layer；
(7) magnetron sputtering coating method is used, plating sets coat of metal 207 on the second infrared reflecting layer 205: in direct current
Under the control of power supply, NiCr target sputtering sedimentation under pure argon atmosphere, depositional coating with a thickness of 1.11nm NiCr layer；
(8) magnetron sputtering coating method is used, plating sets third dielectric layer 208 on the second coat of metal: is handed in intermediate frequency
Under the control in galvanic electricity source, AZO target is under straight argon atmosphere, and ZnSn target, Zn target are in argon gas and oxygen mix atmosphere (Ar:O2=7:10)
Under successively sputtering sedimentation, depositional coating (are followed successively by the AZO of 10nm thickness with a thickness of the third dielectric layer 208 of 77.8nm from the inside to the outside
The Zn layer of layer, the ZnSn layer of 53.3nm thickness and 13.3nm thickness)；
(9) magnetron sputtering coating method is used, plating sets third infrared reflecting layer 209 on third dielectric layer 208: in direct current
Under the control of power supply, Ag target sputtering sedimentation under pure argon atmosphere, depositional coating with a thickness of 14.93nm Ag layer；
(10) magnetron sputtering coating method is used, plating sets the second protective layer 210 on third infrared reflecting layer 209: in
Under the control of frequency AC power source, AZO target sputtering sedimentation under an argon atmosphere, depositional coating with a thickness of 9.5nm AZO layer；
(11) magnetron sputtering coating method is used, plating sets medium protective layer 211 in midfrequent AC on the second protective layer 210
Under the control of power supply, silicon target is in argon gas and nitrogen mixture atmosphere (Ar:N2=9:7) under sputtering sedimentation, depositional coating with a thickness of
34.8nm SiNx layer.
Optical performance test is carried out to glass product obtained above, obtains that the results are shown in Table 3:
Table 3
| Glass surface color | R%g | L*g | a*g | b*g |
| 10.07 | 37.97 | -1.65 | -5.56 | |
| Film surface color | R%f | L*f | a*f | b*f |
| 3.57 | 22.18 | 0.7 | -2.7 | |
| Through color | T% | / | a*t | b*t |
| 56.3 | / | -1.97 | 1.05 | |
| Side Color | R%c | L*c | a*c | b*c |
| 16.06 | 47.06 | -1.62 | -6.8 |
Quantitative measurement is carried out to glass product obtained above, the radiance for obtaining monolithic glass product is 0.02；
Film layer wiping, film layer not demoulding in wiping process are carried out according to GB9656-2003；Impact experiment, resistance to is carried out to glass product
Irradiation experiment and anti-oxidant experiment, experimental result are able to satisfy requirement.
The present invention is by designing reasonable film layer structure and adjusting the thickness proportion of each film layer, so that glass of the invention
Product is neutral through color and crystal ash color is presented in appearance, increases more beautiful artistic effect for the whole design of building, accords with
The esthetic requirement for closing top-grade building, not only increases the diversity of three silver products colors, and efficiently solves traditional three silver medals
The LOW-E glass problem green through colour cast.
The above embodiments merely illustrate the technical concept and features of the present invention, and its object is to allow person skilled in the art
Scholar cans understand the content of the present invention and implement it accordingly, and it is not intended to limit the scope of the present invention.It is all according to the present invention
Equivalent change or modification made by Spirit Essence, should be covered by the protection scope of the present invention.
Claims (10)
1. a kind of grey three silver medal LOW-E glass of crystal through color neutrality, it is characterised in that: be located at institute including glass matrix and plating
The composite film of one side surface of glass matrix is stated, the composite film includes first be sequentially depositing outwardly from the glass matrix
Dielectric layer, the first infrared reflecting layer, the first protective layer, second dielectric layer, the second infrared reflecting layer, through color improve layer, metal
Protective layer, third dielectric layer, third infrared reflecting layer, the second protective layer and medium protective layer, first infrared reflecting layer, institute
It states the second infrared reflecting layer and the third infrared reflecting layer is Ag layers, the color improvement layer that penetrates is Cu layers, described to penetrate color
Improve layer with a thickness of 4-8nm.
2. a kind of grey three silver medal LOW-E glass of crystal through color neutrality according to claim 1, it is characterised in that: described
First infrared reflecting layer with a thickness of 5-9nm；Second infrared reflecting layer with a thickness of 6-9nm；The third infrared external reflection
Layer with a thickness of 12-16nm.
3. a kind of grey three silver medal LOW-E glass of crystal through color neutrality according to claim 1, it is characterised in that: described
First medium layer is made of the SiNx layer and ZnOx layer being sequentially depositing from the side of the glass matrix towards outside, and described first
Dielectric layer with a thickness of 28-36nm.
4. a kind of grey three silver medal LOW-E glass of crystal through color neutrality according to claim 1, it is characterised in that: described
Second dielectric layer is the composite layer of ZnSnOx layers, ZnOx layers or both of the above, the second dielectric layer with a thickness of 40-49nm.
5. a kind of grey three silver medal LOW-E glass of crystal through color neutrality according to claim 1, it is characterised in that: described
Third dielectric layer by be sequentially depositing from the side of the glass matrix towards outside AZO layer, ZnSnOx layers and ZnOx layers form,
The third dielectric layer with a thickness of 73-81nm.
6. a kind of grey three silver medal LOW-E glass of crystal through color neutrality according to claim 1, it is characterised in that: described
First protective layer and second protective layer are AZO layers；The coat of metal is NiCr layers.
7. a kind of grey three silver medal LOW-E glass of crystal through color neutrality according to claim 6, it is characterised in that: described
First protective layer with a thickness of 8-12nm；The coat of metal with a thickness of 0.8-2.3nm；The thickness of second protective layer
For 8-12nm.
8. a kind of grey three silver medal LOW-E glass of crystal through color neutrality according to claim 1, it is characterised in that: described
Medium protective layer be SiNx layer or SiNxOy layers, the medium protective layer with a thickness of 28-35nm.
9. a kind of preparation method of the grey three silver medal LOW-E glass of crystal through color neutrality, which comprises the steps of:
Using magnetron sputtering technique, successively plating sets the first infrared external reflection of the first medium layer of 28-36nm, 5-9nm on glass matrix
The transmission color of layer, the second infrared reflecting layer of the first protective layer of 8-12nm, the second dielectric layer of 40-49nm, 6-9nm, 4-8nm
Improve third infrared reflecting layer, the 8- of layer, the coat of metal of 0.8-2.3nm, the third dielectric layer of 73-81nm, 12-16nm
The second protective layer of 12nm and the medium protective layer of 28-35nm；Wherein, first infrared reflecting layer, described second infrared
Reflecting layer and the third infrared reflecting layer are Ag layers, and the color improvement layer that penetrates is Cu layers.
10. a kind of preparation method of the grey three silver medal LOW-E glass of crystal through color neutrality according to claim 9, special
Sign is: the first medium layer is by the SiNx layer and ZnOx layer group that are sequentially depositing from the side of the glass matrix towards outside
At；The second dielectric layer is ZnSnOx layers, ZnOx layers or is made of its composite layer；The third dielectric layer is by from the glass
AZO layer that the side of matrix is sequentially depositing towards outside, ZnSnOx layers and ZnOx layers of composition；First protective layer and described
Two protective layers are AZO layers；The coat of metal is NiCr layers；The medium protective layer is SiNx layer or SiNxOy layers.
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