CN109609904A - 用于蒸发器源的承载器装置 - Google Patents

用于蒸发器源的承载器装置 Download PDF

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Publication number
CN109609904A
CN109609904A CN201811574378.7A CN201811574378A CN109609904A CN 109609904 A CN109609904 A CN 109609904A CN 201811574378 A CN201811574378 A CN 201811574378A CN 109609904 A CN109609904 A CN 109609904A
Authority
CN
China
Prior art keywords
carrier device
evaporator
side wall
evaporator source
wall construction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201811574378.7A
Other languages
English (en)
Chinese (zh)
Inventor
G·乌尔温登
E·格罗斯
U·恩勒特
A·索格
A·斯特劳布
P·冯比斯马克
M·皮施
L·科诺斯
A·马里恩菲尔德
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Baden Wurttemberg Solar Energy And Hydrogen Energy Research Center (zsw)
Nice Solar Energy GmbH
Original Assignee
Baden Wurttemberg Solar Energy And Hydrogen Energy Research Center (zsw)
Nice Solar Energy GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Baden Wurttemberg Solar Energy And Hydrogen Energy Research Center (zsw), Nice Solar Energy GmbH filed Critical Baden Wurttemberg Solar Energy And Hydrogen Energy Research Center (zsw)
Publication of CN109609904A publication Critical patent/CN109609904A/zh
Pending legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/243Crucibles for source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
CN201811574378.7A 2014-05-23 2015-05-20 用于蒸发器源的承载器装置 Pending CN109609904A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102014007522.2A DE102014007522A1 (de) 2014-05-23 2014-05-23 Trägeranordnung für eine Verdampferquelle
DE102014007522.2 2014-05-23
CN201580026919.0A CN106414790B (zh) 2014-05-23 2015-05-20 用于蒸发器源的承载器装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
CN201580026919.0A Division CN106414790B (zh) 2014-05-23 2015-05-20 用于蒸发器源的承载器装置

Publications (1)

Publication Number Publication Date
CN109609904A true CN109609904A (zh) 2019-04-12

Family

ID=53433158

Family Applications (2)

Application Number Title Priority Date Filing Date
CN201580026919.0A Active CN106414790B (zh) 2014-05-23 2015-05-20 用于蒸发器源的承载器装置
CN201811574378.7A Pending CN109609904A (zh) 2014-05-23 2015-05-20 用于蒸发器源的承载器装置

Family Applications Before (1)

Application Number Title Priority Date Filing Date
CN201580026919.0A Active CN106414790B (zh) 2014-05-23 2015-05-20 用于蒸发器源的承载器装置

Country Status (3)

Country Link
CN (2) CN106414790B (ar)
DE (1) DE102014007522A1 (ar)
WO (1) WO2015177219A1 (ar)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1964620A (zh) * 2003-12-12 2007-05-16 山米奎普公司 对从固体升华的蒸气流的控制
CN101454478A (zh) * 2006-04-20 2009-06-10 壳牌可再生能源有限公司 沉积材料的热蒸发设备、用途和方法
EP2073248A1 (en) * 2007-12-21 2009-06-24 Applied Materials, Inc. Linear electron source, evaporator using linear electron source, and applications of electron sources
US20110275196A1 (en) * 2010-05-03 2011-11-10 University Of Delaware Thermal Evaporation Sources with Separate Crucible for Holding the Evaporant Material
CN102712993A (zh) * 2009-11-30 2012-10-03 维易科精密仪器国际贸易(上海)有限公司 直线淀积源
CN103545460A (zh) * 2012-07-10 2014-01-29 三星显示有限公司 有机层沉积设备、有机发光显示设备及其制造方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5167984A (en) * 1990-12-06 1992-12-01 Xerox Corporation Vacuum deposition process
JP3237399B2 (ja) * 1994-06-03 2001-12-10 東洋インキ製造株式会社 真空蒸着装置
DE19820859A1 (de) * 1998-05-09 1999-11-11 Leybold Systems Gmbh Vorrichtung zum Beschichten flacher Substrate
WO2009049285A1 (en) * 2007-10-12 2009-04-16 University Of Delaware Thermal evaporation sources for wide-area deposition
US20100282167A1 (en) * 2008-12-18 2010-11-11 Veeco Instruments Inc. Linear Deposition Source
US20100285218A1 (en) 2008-12-18 2010-11-11 Veeco Instruments Inc. Linear Deposition Source
US20100159132A1 (en) * 2008-12-18 2010-06-24 Veeco Instruments, Inc. Linear Deposition Source
US20120052617A1 (en) * 2010-12-20 2012-03-01 General Electric Company Vapor deposition apparatus and process for continuous deposition of a doped thin film layer on a substrate

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1964620A (zh) * 2003-12-12 2007-05-16 山米奎普公司 对从固体升华的蒸气流的控制
CN101454478A (zh) * 2006-04-20 2009-06-10 壳牌可再生能源有限公司 沉积材料的热蒸发设备、用途和方法
EP2073248A1 (en) * 2007-12-21 2009-06-24 Applied Materials, Inc. Linear electron source, evaporator using linear electron source, and applications of electron sources
CN102712993A (zh) * 2009-11-30 2012-10-03 维易科精密仪器国际贸易(上海)有限公司 直线淀积源
US20110275196A1 (en) * 2010-05-03 2011-11-10 University Of Delaware Thermal Evaporation Sources with Separate Crucible for Holding the Evaporant Material
CN103545460A (zh) * 2012-07-10 2014-01-29 三星显示有限公司 有机层沉积设备、有机发光显示设备及其制造方法

Also Published As

Publication number Publication date
CN106414790A (zh) 2017-02-15
WO2015177219A1 (de) 2015-11-26
DE102014007522A1 (de) 2015-11-26
CN106414790B (zh) 2019-01-04

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Effective date of abandoning: 20220311