CN109609904A - 用于蒸发器源的承载器装置 - Google Patents
用于蒸发器源的承载器装置 Download PDFInfo
- Publication number
- CN109609904A CN109609904A CN201811574378.7A CN201811574378A CN109609904A CN 109609904 A CN109609904 A CN 109609904A CN 201811574378 A CN201811574378 A CN 201811574378A CN 109609904 A CN109609904 A CN 109609904A
- Authority
- CN
- China
- Prior art keywords
- carrier device
- evaporator
- side wall
- evaporator source
- wall construction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010276 construction Methods 0.000 claims abstract description 66
- 239000000463 material Substances 0.000 claims abstract description 28
- 239000000758 substrate Substances 0.000 claims abstract description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 67
- 239000010439 graphite Substances 0.000 claims description 63
- 229910002804 graphite Inorganic materials 0.000 claims description 63
- 238000009413 insulation Methods 0.000 claims description 40
- 238000000034 method Methods 0.000 claims description 26
- 239000012530 fluid Substances 0.000 claims description 20
- 239000002131 composite material Substances 0.000 claims description 18
- 239000000178 monomer Substances 0.000 claims description 12
- 229920000049 Carbon (fiber) Polymers 0.000 claims description 11
- 239000004917 carbon fiber Substances 0.000 claims description 11
- 239000000835 fiber Substances 0.000 claims description 11
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims description 11
- 239000000725 suspension Substances 0.000 claims description 10
- 238000010025 steaming Methods 0.000 claims description 8
- 238000004891 communication Methods 0.000 claims description 7
- 239000006260 foam Substances 0.000 claims description 5
- 239000011159 matrix material Substances 0.000 claims description 5
- 229910052799 carbon Inorganic materials 0.000 claims description 4
- 238000009826 distribution Methods 0.000 claims description 3
- 239000000203 mixture Substances 0.000 claims description 3
- 239000004575 stone Substances 0.000 claims description 3
- 239000004744 fabric Substances 0.000 claims description 2
- 230000003014 reinforcing effect Effects 0.000 claims 1
- 238000004381 surface treatment Methods 0.000 abstract description 7
- 238000013461 design Methods 0.000 description 30
- 238000007789 sealing Methods 0.000 description 26
- 238000010438 heat treatment Methods 0.000 description 20
- 238000005553 drilling Methods 0.000 description 15
- 230000008569 process Effects 0.000 description 13
- 239000003575 carbonaceous material Substances 0.000 description 11
- 238000001704 evaporation Methods 0.000 description 9
- 230000005855 radiation Effects 0.000 description 6
- 230000008020 evaporation Effects 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 239000011810 insulating material Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 3
- 230000008878 coupling Effects 0.000 description 3
- 238000010168 coupling process Methods 0.000 description 3
- 238000005859 coupling reaction Methods 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000011049 filling Methods 0.000 description 3
- 230000005484 gravity Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000035939 shock Effects 0.000 description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 230000003321 amplification Effects 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 230000003116 impacting effect Effects 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 238000003199 nucleic acid amplification method Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 241001074085 Scophthalmus aquosus Species 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000005485 electric heating Methods 0.000 description 1
- 239000003733 fiber-reinforced composite Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000011900 installation process Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 238000003032 molecular docking Methods 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 229910052573 porcelain Inorganic materials 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 239000011208 reinforced composite material Substances 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102014007522.2A DE102014007522A1 (de) | 2014-05-23 | 2014-05-23 | Trägeranordnung für eine Verdampferquelle |
DE102014007522.2 | 2014-05-23 | ||
CN201580026919.0A CN106414790B (zh) | 2014-05-23 | 2015-05-20 | 用于蒸发器源的承载器装置 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201580026919.0A Division CN106414790B (zh) | 2014-05-23 | 2015-05-20 | 用于蒸发器源的承载器装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN109609904A true CN109609904A (zh) | 2019-04-12 |
Family
ID=53433158
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201580026919.0A Active CN106414790B (zh) | 2014-05-23 | 2015-05-20 | 用于蒸发器源的承载器装置 |
CN201811574378.7A Pending CN109609904A (zh) | 2014-05-23 | 2015-05-20 | 用于蒸发器源的承载器装置 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201580026919.0A Active CN106414790B (zh) | 2014-05-23 | 2015-05-20 | 用于蒸发器源的承载器装置 |
Country Status (3)
Country | Link |
---|---|
CN (2) | CN106414790B (ar) |
DE (1) | DE102014007522A1 (ar) |
WO (1) | WO2015177219A1 (ar) |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1964620A (zh) * | 2003-12-12 | 2007-05-16 | 山米奎普公司 | 对从固体升华的蒸气流的控制 |
CN101454478A (zh) * | 2006-04-20 | 2009-06-10 | 壳牌可再生能源有限公司 | 沉积材料的热蒸发设备、用途和方法 |
EP2073248A1 (en) * | 2007-12-21 | 2009-06-24 | Applied Materials, Inc. | Linear electron source, evaporator using linear electron source, and applications of electron sources |
US20110275196A1 (en) * | 2010-05-03 | 2011-11-10 | University Of Delaware | Thermal Evaporation Sources with Separate Crucible for Holding the Evaporant Material |
CN102712993A (zh) * | 2009-11-30 | 2012-10-03 | 维易科精密仪器国际贸易(上海)有限公司 | 直线淀积源 |
CN103545460A (zh) * | 2012-07-10 | 2014-01-29 | 三星显示有限公司 | 有机层沉积设备、有机发光显示设备及其制造方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5167984A (en) * | 1990-12-06 | 1992-12-01 | Xerox Corporation | Vacuum deposition process |
JP3237399B2 (ja) * | 1994-06-03 | 2001-12-10 | 東洋インキ製造株式会社 | 真空蒸着装置 |
DE19820859A1 (de) * | 1998-05-09 | 1999-11-11 | Leybold Systems Gmbh | Vorrichtung zum Beschichten flacher Substrate |
WO2009049285A1 (en) * | 2007-10-12 | 2009-04-16 | University Of Delaware | Thermal evaporation sources for wide-area deposition |
US20100282167A1 (en) * | 2008-12-18 | 2010-11-11 | Veeco Instruments Inc. | Linear Deposition Source |
US20100285218A1 (en) | 2008-12-18 | 2010-11-11 | Veeco Instruments Inc. | Linear Deposition Source |
US20100159132A1 (en) * | 2008-12-18 | 2010-06-24 | Veeco Instruments, Inc. | Linear Deposition Source |
US20120052617A1 (en) * | 2010-12-20 | 2012-03-01 | General Electric Company | Vapor deposition apparatus and process for continuous deposition of a doped thin film layer on a substrate |
-
2014
- 2014-05-23 DE DE102014007522.2A patent/DE102014007522A1/de not_active Withdrawn
-
2015
- 2015-05-20 WO PCT/EP2015/061130 patent/WO2015177219A1/de active Application Filing
- 2015-05-20 CN CN201580026919.0A patent/CN106414790B/zh active Active
- 2015-05-20 CN CN201811574378.7A patent/CN109609904A/zh active Pending
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1964620A (zh) * | 2003-12-12 | 2007-05-16 | 山米奎普公司 | 对从固体升华的蒸气流的控制 |
CN101454478A (zh) * | 2006-04-20 | 2009-06-10 | 壳牌可再生能源有限公司 | 沉积材料的热蒸发设备、用途和方法 |
EP2073248A1 (en) * | 2007-12-21 | 2009-06-24 | Applied Materials, Inc. | Linear electron source, evaporator using linear electron source, and applications of electron sources |
CN102712993A (zh) * | 2009-11-30 | 2012-10-03 | 维易科精密仪器国际贸易(上海)有限公司 | 直线淀积源 |
US20110275196A1 (en) * | 2010-05-03 | 2011-11-10 | University Of Delaware | Thermal Evaporation Sources with Separate Crucible for Holding the Evaporant Material |
CN103545460A (zh) * | 2012-07-10 | 2014-01-29 | 三星显示有限公司 | 有机层沉积设备、有机发光显示设备及其制造方法 |
Also Published As
Publication number | Publication date |
---|---|
CN106414790A (zh) | 2017-02-15 |
WO2015177219A1 (de) | 2015-11-26 |
DE102014007522A1 (de) | 2015-11-26 |
CN106414790B (zh) | 2019-01-04 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
AD01 | Patent right deemed abandoned | ||
AD01 | Patent right deemed abandoned |
Effective date of abandoning: 20220311 |