CN109576085A - 一种tft面板机台的管道清洗剂及其清洗方法 - Google Patents
一种tft面板机台的管道清洗剂及其清洗方法 Download PDFInfo
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- 239000008367 deionised water Substances 0.000 claims abstract description 20
- 229910021641 deionized water Inorganic materials 0.000 claims abstract description 20
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- 239000000126 substance Substances 0.000 claims abstract description 9
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 8
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- KWYUFKZDYYNOTN-UHFFFAOYSA-M potassium hydroxide Inorganic materials [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 17
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 claims description 13
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- 229920002134 Carboxymethyl cellulose Polymers 0.000 claims description 12
- 235000010948 carboxy methyl cellulose Nutrition 0.000 claims description 12
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 claims description 8
- QFOHBWFCKVYLES-UHFFFAOYSA-N Butylparaben Chemical compound CCCCOC(=O)C1=CC=C(O)C=C1 QFOHBWFCKVYLES-UHFFFAOYSA-N 0.000 claims description 7
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- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 claims description 6
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- 235000010228 ethyl p-hydroxybenzoate Nutrition 0.000 claims description 6
- 239000004403 ethyl p-hydroxybenzoate Substances 0.000 claims description 6
- NUVBSKCKDOMJSU-UHFFFAOYSA-N ethylparaben Chemical compound CCOC(=O)C1=CC=C(O)C=C1 NUVBSKCKDOMJSU-UHFFFAOYSA-N 0.000 claims description 6
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- LXCFILQKKLGQFO-UHFFFAOYSA-N methylparaben Chemical compound COC(=O)C1=CC=C(O)C=C1 LXCFILQKKLGQFO-UHFFFAOYSA-N 0.000 claims description 4
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- DPXJVFZANSGRMM-UHFFFAOYSA-N acetic acid;2,3,4,5,6-pentahydroxyhexanal;sodium Chemical group [Na].CC(O)=O.OCC(O)C(O)C(O)C(O)C=O DPXJVFZANSGRMM-UHFFFAOYSA-N 0.000 claims description 3
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 claims description 2
- 125000000373 fatty alcohol group Chemical group 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 claims description 2
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- ZAWGLAXBGYSUHN-UHFFFAOYSA-M sodium;2-[bis(carboxymethyl)amino]acetate Chemical compound [Na+].OC(=O)CN(CC(O)=O)CC([O-])=O ZAWGLAXBGYSUHN-UHFFFAOYSA-M 0.000 claims 1
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 claims 1
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 claims 1
- ILJSQTXMGCGYMG-UHFFFAOYSA-N triacetic acid Chemical compound CC(=O)CC(=O)CC(O)=O ILJSQTXMGCGYMG-UHFFFAOYSA-N 0.000 claims 1
- 241000894006 Bacteria Species 0.000 abstract description 15
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- 239000000758 substrate Substances 0.000 abstract description 8
- 230000003111 delayed effect Effects 0.000 abstract 1
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 11
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- 238000004519 manufacturing process Methods 0.000 description 9
- 238000002360 preparation method Methods 0.000 description 7
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N monobenzene Natural products C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 6
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- 239000000047 product Substances 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- DWAQJAXMDSEUJJ-UHFFFAOYSA-M Sodium bisulfite Chemical compound [Na+].OS([O-])=O DWAQJAXMDSEUJJ-UHFFFAOYSA-M 0.000 description 4
- 230000006837 decompression Effects 0.000 description 4
- 239000012530 fluid Substances 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 229940079827 sodium hydrogen sulfite Drugs 0.000 description 4
- 235000010267 sodium hydrogen sulphite Nutrition 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 3
- 229940098779 methanesulfonic acid Drugs 0.000 description 3
- 230000000844 anti-bacterial effect Effects 0.000 description 2
- 230000001580 bacterial effect Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- IDGUHHHQCWSQLU-UHFFFAOYSA-N ethanol;hydrate Chemical compound O.CCO IDGUHHHQCWSQLU-UHFFFAOYSA-N 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000000706 filtrate Substances 0.000 description 2
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- ANAXUMJVWLPBJO-UHFFFAOYSA-N octadecanoyl bromide Chemical compound CCCCCCCCCCCCCCCCCC(Br)=O ANAXUMJVWLPBJO-UHFFFAOYSA-N 0.000 description 2
- 239000005416 organic matter Substances 0.000 description 2
- -1 polyoxy Polymers 0.000 description 2
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- 238000001953 recrystallisation Methods 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 230000001954 sterilising effect Effects 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 125000004494 ethyl ester group Chemical group 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 238000005816 glass manufacturing process Methods 0.000 description 1
- 239000004519 grease Substances 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 229910003480 inorganic solid Inorganic materials 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000002503 metabolic effect Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 230000002000 scavenging effect Effects 0.000 description 1
- DCKVNWZUADLDEH-UHFFFAOYSA-N sec-butyl acetate Chemical compound CCC(C)OC(C)=O DCKVNWZUADLDEH-UHFFFAOYSA-N 0.000 description 1
- 239000010865 sewage Substances 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/88—Ampholytes; Electroneutral compounds
- C11D1/94—Mixtures with anionic, cationic or non-ionic compounds
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/02—Inorganic compounds ; Elemental compounds
- C11D3/04—Water-soluble compounds
- C11D3/044—Hydroxides or bases
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/20—Organic compounds containing oxygen
- C11D3/2093—Esters; Carbonates
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/20—Organic compounds containing oxygen
- C11D3/2096—Heterocyclic compounds
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/20—Organic compounds containing oxygen
- C11D3/22—Carbohydrates or derivatives thereof
- C11D3/222—Natural or synthetic polysaccharides, e.g. cellulose, starch, gum, alginic acid or cyclodextrin
- C11D3/225—Natural or synthetic polysaccharides, e.g. cellulose, starch, gum, alginic acid or cyclodextrin etherified, e.g. CMC
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/26—Organic compounds containing nitrogen
- C11D3/30—Amines; Substituted amines ; Quaternized amines
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/48—Medical, disinfecting agents, disinfecting, antibacterial, germicidal or antimicrobial compositions
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/02—Anionic compounds
- C11D1/12—Sulfonic acids or sulfuric acid esters; Salts thereof
- C11D1/29—Sulfates of polyoxyalkylene ethers
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- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/38—Cationic compounds
- C11D1/62—Quaternary ammonium compounds
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- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/18—Glass; Plastics
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- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/20—Industrial or commercial equipment, e.g. reactors, tubes or engines
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Abstract
本发明化工技术领域,具体涉及一种TFT面板机台的管道清洗剂。以质量百分含量计,其组成如下:强碱性物质5%~10%;有机助剂 10%~15%;表面活性剂3%~10%;螯合剂1%~5%;抗污垢再沉积剂0.5%~2%;杀菌剂0.05%‑0.1%;余量的去离子水。本发明该管道清洗剂不但能有效降低因使用时间长久管菌数量爆发引起的管道污染,而且能抑制管道细菌的生长,大大延缓其爆发周期。采用该管道清洗剂和行业内在用的玻璃基板清洗剂大都兼容,清洗管道后不会有残留,不会影响正常清洗工艺的良率。
Description
技术领域
本发明平板显示生产领域,具体涉及一种TFT面板机台的管道清洗剂。
背景专利
在平板显示领域中,包括液晶显示(LCD)、触摸屏(TP)、有机电致发光(OLED)显示用玻璃基板的制备工艺过程中首先会使用的前清洗制程用以除去附着于玻璃基板在镀膜前存在的指纹、灰尘、玻璃粉、油脂及其他有机或无机固体粒子。在高世代线,清洗药液一般在机台和管路中的循环流程为:清洗药液按配比注入机台Tank——高效滤芯过滤——>水泵抽取加压喷淋清洗和滚刷清洗——>高效滤芯过滤——>药液回流tank,清洗温度为40±10℃。喷淋带来了丰富的泡沫和空气,长时间的恒温条件以及机台因为满产基本只有每月一次的停机清理等因素,导适在这种条件下逐渐适应环境的细菌会慢慢生长并附着于管路内壁。随着管菌的繁衍,其新陈代谢物在内壁会附着并逐渐堆积,并且吸附清洗玻璃时脱落下来的脏污杂物。细菌的爆发会导致管路滤芯使用寿命的从每月一换增加到每5天一换;吸附的杂物有时也会因为液体流动带着细菌结块脱落,引起局部污染严重而导致产品良率下降。一般新建成的世代线使用到3-5年左右就会发生管菌生长爆发而导致的滤芯堵塞、清洗药液使用寿命降低、增加机台维护和保养等现象,影响良率,降低产能。
由于高世代线投入很高,所以全球的高世代线也不过几十条,所以针对管菌生长引起的污染并没有针对性较强的清洗产品。其他行业比如石油行业、污水行业等管道清洗剂成分复杂,不能满足于泛半导体行业的TFT生产对于原料的苛刻要求,另外厂家由于成本和产能的关系,也不会冒险使用其他行业的管道清洗剂。常见的提高世代线冲洗压力,加大清洗剂浓度和频率的冲洗管道方法虽然可以减轻管壁附着的菌斑,但是不但影响产能,而且治标不治本,细菌残留很多,很容易在温暖且富集氧气的生产环境中再次滋生,重新导致爆发污染。
发明内容
本发明的目的是提供一种TFT面板机台的管道清洗剂,特别适用于高世代线玻璃清洗制程。该管道清洗剂不但能有效降低因使用时间长久管菌数量爆发引起的管道污染,而且能抑制管道细菌的生长,大大延缓其爆发周期。采用该管道清洗剂和行业内在用的玻璃基板清洗剂大都兼容,清洗管道后不会有残留,不会影响正常清洗工艺的良率。
本发明提供的TFT面板机台的管道清洗剂,以质量百分数含量计,其组成如下:
强碱性物质 5%~10%;
有机助剂 10%~15%;
表面活性剂 3%~10%;
螯合剂 1%~5%;
抗污垢再沉积剂 0.5%~2%;
杀菌剂 0.05%-0.1%;
余量为去离子水。
上述的玻璃基板环保水基管道清洗剂中,所述强碱性物质为无机碱或有机碱。
无机碱包括氢氧化钾或氢氧化钠;有机碱包括四甲基氢氧化铵或四乙基氢氧化铵。优选无机碱中的氢氧化钾。
所述强碱性物质用于调剂所述管道清洗剂的pH,使其始终处于合适的pH范围内。调节管道清洗剂在一定的碱性条件下,能最大程度地发挥其清洁力;强pH的条件使细菌生长环境发生变化,起到杀菌的效果。当所述强碱性物质的含量低于1wt%或高于5wt%时,可能引起pH不在合适的范围,从而导致管道清洗剂清洗能力的下降,因此,在一定条件下,需要控制所述无机碱性物质在1wt%~5wt%的质量范围内。
上述的玻璃基板环保水基管道清洗剂中,所述有机助剂为N-甲基吡咯烷酮(NMP)、N-乙基吡咯烷酮(NEP)、γ-丁内酯(GBL)中任一种或任两种的组合,优选N-甲基吡咯烷酮。这几种有机助剂能溶解大多数的有机和无机化合物,可提高管道清洗剂体系的对不同物质的溶解性,提高管道清洗剂体系的稳定性。
上述的玻璃基板环保水基管道清洗剂中,所述的表面活性剂由阴离子表面活性剂和双子表面活性剂复配而得。
所述阴离子表面活性剂为脂肪醇聚氧乙烯基醚硫酸盐(AES),优选月桂醇聚氧乙烯基醚硫酸盐。AES具有良好的水溶性,在水中有很强的去污能力,有效除去管道内壁累积的灰尘、玻璃粉等杂质。当所述阴离子表面活性剂含量低于3wt%时,去污能力减弱,当所述阴离子表面活性剂含量高于10wt%时,管道清洗剂的稳定性会下降。
所述双子表面活性剂为式Ⅰ所示双子表面活性剂(Gemini);
式Ⅰ
所述双子表面活性剂具有优异的渗透性能和润湿性,其在复配体系中用量很少。与上述AES表面活性剂复配,能有效提高其去污力,提升清洗效率,对较顽固的污渍很有效除去。
所述双子表面活性剂Gemini可按照如下的常规的方法进行制备:以1mol间苯二酚、1.2mol亚硫酸氢钠、200mL水(间苯二酚、亚硫酸氢钠、水摩尔比为1:1.2;2)为原料,加入到三口瓶中搅拌均匀,再加入甲醛含量为1.2mol的40vol%的甲醛水溶液,逐渐加热至回流并保持冷凝回流12h;萃取有机物,洗涤干燥后减压旋除溶剂可得2,4-二羟基-1,5-苯二甲磺酸;
以DMF为溶剂置入三口瓶中,再加入0.5mol2,4-二羟基-1,5-苯二甲磺酸和1.1mol的NaOH,搅拌条件下滴加1.1mol的硬脂基溴,加热至90℃恒温搅拌12h。反应结束后过滤除去无机盐,滤液减压旋除溶剂,乙醇-水体系重结晶可得到目标产物。
上述的管道清洗剂中,所述螯合剂为次氨基三乙酸钠(NTA)。螯合剂可以和金属离子生产可溶性络合物,提高溶液溶解度和透明度,并有一定的杀菌能力。
上述的管道清洗剂中,所述抗污垢再沉积剂为羧甲基纤维素钠(CMC);CMC的作用是防止管壁上被洗脱的污渍再次沉淀到管壁上,形成二次污染。
上述的管道清洗剂中,所述杀菌剂为尼泊金酯类杀菌剂,包括尼泊金甲酯、尼泊金乙酯、尼泊金丙酯、尼泊金丁酯。优选尼泊金丁酯。杀菌剂的主要作用是用于清洗后的抑菌。在管路的设计中,难免会有拐角,弯头,以及口径变化的连接处,这些部位在清洗时收到的作用力会削弱很多,成为清洗的死角。清洗后没洗净的细菌会很快繁殖,所以需要杀菌剂抑制细菌生长。
上述的管道清洗剂中,所述水为去离子水,在25℃时,其电阻率不低于18MΩ
本发明提供的管道清洗剂用于清洗TFT面板前清洗的机台管道,将所述管道清洗剂配制成水溶液的形式进行清洗;所述管道清洗剂水溶液的质量分数为15%~40%。
上述的管道清洗剂,其在TFT机台的具体清洗方法如下:
在机台混液槽(Tank)中注入管道清洗剂和去离子水,并按所需比例配制成水溶液。升温至35-50℃。管道与Tank循环冲洗1h左右。清洗后排放管道清洗剂,用去离子水清洗Tank及管路10min。
本发明的显著优点为:
本发明用在TFT面板清洗行业中,能有效降低素玻璃前清洗段管路因使用时间长久,管菌数量爆发而引起的管道污染,并且清洗后能长时间有效抑制管道细菌的生长,大大延缓其爆发周期。降低滤芯更换的成本,节约机台清洗时间,提高产品产能。采用该管道清洗剂和行业内在用的玻璃基板清洗剂大都兼容,清洗管道后不会有残留,不会影响正常清洗工艺的良率。
具体实施方式
下述实施例中所使用的实验方法如无特殊说明,均为常规方法。
下述实施例中所用的材料、试剂等,如无特殊说明,均可从商业途径或简单的商业原料自制得到。
实施例1:用于TFT机台的管道清洗剂
由下述重量百分数的组分组成:
氢氧化钾(KOH) 5%、NMP 15%、AES 4%、Gemini 2%、NTA 2%、CMC 0.5%、尼泊金丁酯0.05%、去离子水71.45%。
其中双子表面活性剂Gemini的具体制备方法为:
以1mol间苯二酚、1.2mol亚硫酸氢钠、200mL水(间苯二酚、亚硫酸氢钠、水摩尔比为1:1.2;2)为原料,加入到三口瓶中搅拌均匀,再加入甲醛含量为1.2mol的40vol%的甲醛水溶液,逐渐加热至回流并保持冷凝回流12h;萃取有机物,洗涤干燥后减压旋除溶剂可得2,4-二羟基-1,5-苯二甲磺酸;
以DMF为溶剂置入三口瓶中,再加入0.5mol2,4-二羟基-1,5-苯二甲磺酸和1.1mol的NaOH,搅拌条件下滴加1.1mol的硬脂基溴,加热至90℃恒温搅拌12h。反应结束后过滤除去无机盐,滤液减压旋除溶剂,乙醇-水体系重结晶可得到目标产物。
实施例2、用于TFT机台的管道清洗剂
由下述重量百分数的组分组成:
氢氧化钾(KOH) 10%、NEP 5%、AES 5%、Gemini 1%、NTA 3%、CMC 1%、尼泊金丁酯 0.25%、去离子水74.75%。
其中双子表面活性剂Gemini的具体制备方法参照实施例1。
实施例3、用于TFT机台的管道清洗剂
由下述重量百分数的组分组成:
四甲基氢氧化铵(TMAH) 10%、NMP 10%、AES 6%、Gemini 2%、NTA 5%、CMC 1.5%、尼泊金丁酯 0.1%、去离子水65.40%。
其中双子表面活性剂Gemini的具体制备方法参照实施例1。
实施例4、用于TFT机台的管道清洗剂
由下述重量百分数的组分组成:
氢氧化钾(KOH) 5%、GBL 15%、AES 8%、Gemini 2%、NTA 5%、CMC 0.5%、尼泊金丁酯0.5%、去离子水64.00%。
其中双子表面活性剂Gemini的具体制备方法参照实施例1。
实施例5、用于TFT机台的管道清洗剂
由下述重量百分数的组分组成:
氢氧化钠(NaOH) 10%、NMP 10%、AES 4%、Gemini 1%、NTA 3%、CMC 1%、尼泊金乙酯0.5%、去离子水70.50%。
其中双子表面活性剂Gemini的具体制备方法参照实施例1。
实施例6、用于TFT机台的管道清洗剂
由下述重量百分数的组分组成:
氢氧化钾(KOH) 10%、NMP6%、GBL 6%、AES 7%、Gemini 3%、NTA 5%、CMC 2%、尼泊金丁酯1%、去离子水60.00%。
其中双子表面活性剂Gemini的具体制备方法参照实施例1。
管道清洗剂清洗性能的测定
1.污垢出去能力测试。
对实施例1~6所制得的管道清洗剂进行性能评估,其具体测试方法为:将有菌群污染替换下来的管道切成3cm*3cm的小片,浸泡在配制好的质量分数为20%的管道清洗剂水溶液的烧杯中。浸泡时将烧瓶置于附有超声和加热的液槽中,40℃下,超声清洗10min,然后在25℃的去离子水清洗槽清洗1min。烘箱50℃烘烤10min后,用电子显微镜观察表面洁净度。评判标准如下:
☆:管道内面洁净;
○:管道内面基本洁净,有各别地方还有污渍附着;
×:管道内面污渍附着较多,清洗前后变化不明显。
2.除菌抑菌测试。
将实施例1-6中所配管道清洗剂配制成的质量分数为20%的管道清洗剂水溶液,在机台测试,测试温度40℃。管道与Tank循环冲洗1h。清洗完毕切换正常工艺后,通过滤芯的更换频次判定。评判标准如下:
☆:清洗后28天更换滤芯;
○:清洗后21天更换滤芯;
×:清洗后10天更换滤芯。
表1 具体实施例的统计情况
对比例1:用于TFT机台的管道清洗剂
由下述重量百分数的组分组成:
氢氧化钾(KOH) 10%、NMP 10%、AES 4%、NTA 3%、CMC 1%、尼泊金乙酯 1%、去离子水71.00%。
对比例2:用于TFT机台的管道清洗剂
由下述重量百分数的组分组成:
氢氧化钾(KOH) 10%、NMP 10%、Gemini 3%、NTA 3%、CMC 1%、尼泊金乙酯 1%、去离子水72.00%。
对比例3:用于TFT机台的管道清洗剂
由下述重量百分数的组分组成:
氢氧化钾(KOH) 3%、NMP 10%、AES 4%、Gemini 1%、NTA 3%、CMC 1%、尼泊金乙酯 1%、去离子水77.00%。
对比例4:用于TFT机台的管道清洗剂
由下述重量百分数的组分组成:
氢氧化钾(KOH) 10%、NMP 10%、AES 4%、Gemini 2%、NTA 3%、CMC 1%、去离子水70.00%。
对比例5:用于TFT机台的管道清洗剂
由下述重量百分数的组分组成:
氢氧化钾(KOH) 10%、NMP 10%、AES 8%、Gemini 2%、尼泊金乙酯 1%、去离子水69.00%。
清洗能力评判同实施例,其结果如下:
表2 实施例与对比例的评价统计情况
以上所述仅为本发明的优选实施例,本行业的技术人员应该了解,本发明并非因此限制其专利范围,凡是利用本发明说明书内容所作的等效成分变换,直接或间接运用在其他相关的技术领域,均同理包括在本发明的专利保护范围内。
Claims (10)
1.一种TFT面板机台的管道清洗剂,其特征在于:以质量百分含量计,其组成如下:
强碱性物质 5%~10%;
有机助剂 10%~15%;
表面活性剂 3%~10%;
螯合剂 1%~5%;
抗污垢再沉积剂 0.5%~2%;
杀菌剂 0.05%-0.1%;
余量为去离子水。
2.根据权利要求1所述的TFT面板机台的管道清洗剂,其特征在于:所述强碱性物质为无机碱或有机碱。
3.根据权利要求2所述的TFT面板机台的管道清洗剂,其特征在于:其无机碱包括氢氧化钾或氢氧化钠;有机碱包括四甲基氢氧化铵或四乙基氢氧化铵。
4.根据权利要求1所述的TFT面板机台的管道清洗剂,其特征在于:所述有机助剂为N-甲基吡咯烷酮NMP、N-乙基吡咯烷酮NEP、γ-丁内酯GBL中任一种或任两种。
5.根据权利要求1所述的TFT面板机台的管道清洗剂,其特征在于:所述的表面活性剂由阴离子表面活性剂和双子表面活性剂复配而得。
6.根据权利要求5中所述的TFT面板机台的管道清洗剂,其特征在于:所述阴离子表面活性剂为脂肪醇聚氧乙烯基醚硫酸盐AES。
7.根据权利要求5中所述的TFT面板机台的管道清洗剂,其特征在于:所述双子表面活性剂Gemini的结构式如下所示:
。
8.根据权利要求1所述的TFT面板机台的管道清洗剂,其特征在于:所述螯合剂为次氨基三乙酸钠NTA;所述抗污垢再沉积剂为羧甲基纤维素钠CMC;所述杀菌剂为尼泊金酯类杀菌剂,具体为尼泊金甲酯、尼泊金乙酯、尼泊金丙酯、尼泊金丁酯中的任意一种。
9.根据权利要求1所述的TFT面板机台的管道清洗剂,其特征在于:所述去离子水,在25℃时,其电阻率不低于18MΩ。
10.一种如权利要求1所述的TFT面板机台的管道清洗剂的使用方法,其特征在于:具体清洗方法如下:
在机台混液槽Tank中注入管道清洗剂和去离子水,并按所需比例配制成水溶液;升温至35-50℃;管道与Tank循环冲洗1h;清洗后排放管道清洗剂,用去离子水清洗Tank及管路10min;其中将所述TFT面板机台的管道清洗剂配制成水溶液;所述管道清洗剂水溶液的质量分数为15%~40%。
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