CN109545886B - Preparation method of half-chip polycrystalline solar cell - Google Patents

Preparation method of half-chip polycrystalline solar cell Download PDF

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Publication number
CN109545886B
CN109545886B CN201811227637.9A CN201811227637A CN109545886B CN 109545886 B CN109545886 B CN 109545886B CN 201811227637 A CN201811227637 A CN 201811227637A CN 109545886 B CN109545886 B CN 109545886B
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silicon wafer
fixed
auxiliary
stirring shaft
guide
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CN109545886A (en
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朱金浩
吴国强
许布
刘义德
陈珏荣
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Zhejiang Guanglong Energy Technology Co ltd
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Zhejiang Guanglong Energy Technology Co ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1804Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic Table
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/38Removing material by boring or cutting
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/186Particular post-treatment for the devices, e.g. annealing, impurity gettering, short-circuit elimination, recrystallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/186Particular post-treatment for the devices, e.g. annealing, impurity gettering, short-circuit elimination, recrystallisation
    • H01L31/1868Passivation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1876Particular processes or apparatus for batch treatment of the devices
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/547Monocrystalline silicon PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)

Abstract

The invention provides a preparation method of a half-chip polycrystalline solar cell. The manufacturing method solves the technical problems that the steps of the existing manufacturing method are too simple, the quality of a half cell cannot be guaranteed, the product quality is poor and the like. The preparation method of the half-wafer polycrystalline solar cell comprises the following steps: a. cleaning and detecting purchased silicon wafers; b. putting the inspected silicon wafer into an alkaline solution for texturing; c. putting the quartz boat into a diffusion furnace for diffusion; d. placing the diffused silicon wafer into an etching machine for etching; e. soaking the etched silicon wafer in hydrofluoric acid; f. putting the graphite boat into a PECVD device for film coating; g. printing the coated silicon wafer in a screen printing mode; h. placing the printed silicon wafer into a sintering furnace for sintering; i. putting the silicon wafer basket into a passivation treatment device for passivation; j. and cutting the passivated cell piece by a laser slicer. The invention has the advantage of good product quality.

Description

Preparation method of half-chip polycrystalline solar cell
Technical Field
The invention belongs to the technical field of solar cells, and relates to a preparation method of a half-chip polycrystalline solar cell.
Background
The half piece is a packaging technology of the assembly of the battery after 1/2 cutting, essentially reduces the internal resistance of a single battery piece, and can be used for packaging polycrystal or single crystal assembly. Half-cell batteries have many advantages over "standard" full cells, the most important being the reduction of power output loss from the cell to the module.
Through search, for example, chinese patent literature discloses a manufacturing method of a half cell [ application No.: 201710305225.1, respectively; publication No.: CN 107195727a ]. The manufacturing method of the half cell is characterized by comprising the following steps: the method comprises the following steps: designing a half cell graph, wherein the half cell graph is symmetrical along the center line of the cell; step two: carrying out silk-screen printing and sintering on the polycrystalline silicon wafer subjected to wet texturing-phosphorus diffusion-wet etching-PSG removal-PECVD coating treatment by adopting the half cell graph to prepare a cell; step three: and D, performing laser cutting on the battery piece prepared in the step two along the center line, and chamfering a right angle formed after the laser cutting to prepare a half battery piece.
Although the manufacturing method disclosed in this patent is easy to operate, the steps of the manufacturing method are too simple to ensure the quality of the half-cell, and the product quality is poor, so it is necessary to design a manufacturing method of the half-cell polycrystalline solar cell.
Disclosure of Invention
The invention aims to provide a preparation method of a half-chip polycrystalline solar cell aiming at the problems in the prior art, and the preparation method has the characteristic of good product quality.
The purpose of the invention can be realized by the following technical scheme: a preparation method of a half-wafer polycrystalline solar cell is characterized by comprising the following steps:
a. cleaning and detecting purchased silicon wafers, and removing unqualified silicon wafers;
b. putting the inspected silicon wafer into an alkaline solution for texturing;
c. putting the textured silicon wafer into a quartz boat, and putting the quartz boat into a diffusion furnace for diffusion;
d. placing the diffused silicon wafer into an etching machine for etching;
e. soaking the etched silicon wafer in hydrofluoric acid for 20-30min to remove phosphorosilicate glass on the surface of the silicon wafer;
f. placing the soaked silicon wafer into a graphite boat, and placing the graphite boat into a PECVD device for film coating to form a three-layer antireflection film;
g. printing the coated silicon wafer in a screen printing mode;
h. placing the printed silicon wafer into a sintering furnace for sintering to obtain a battery piece;
i. stacking 200 and 400 battery pieces in the same direction in a silicon wafer basket, and putting the silicon wafer basket in a passivation treatment device for passivation;
j. and cutting the passivated cell slice by a laser slicer to divide the cell slice into two, thereby obtaining the finished semi-polycrystalline solar cell.
The cleaning process in the step a is as follows: the silicon wafer is firstly put into a sodium hydroxide solution to be soaked for 10-20min, then put into a nitric acid solution to be soaked for 15-25min, and finally put into a hydrofluoric acid solution to be soaked for 5-10 min.
And f, the total thickness of the three layers of antireflection films in the step f is 90-110 nm.
The printing process in the step g comprises the following steps: preparing back silver paste, back aluminum paste and front silver paste by using preparation equipment; printing 30-50mg of back silver paste on the silicon wafer by using a back electrode screen printing plate, and drying at the temperature of 220-250 ℃; 1300-1600mg of back aluminum paste is screen-printed by a back electric field screen printing plate and dried at the temperature of 280-320 ℃; 110-130mg of positive silver paste was screen printed with a positive electrode.
And g, the electrode in the step g is of a front-back structure of a half-chip structure.
By adopting the method, the passivation treatment is added to passivate impurities and defects in the cell, the recombination in a silicon wafer body is reduced, the efficiency of the cell is improved, the slurry can be prepared on line through the preparation equipment, and the slurry is uniformly mixed, so that the printing quality can be ensured; and a special laser slicer is added for cutting, so that the quality of the half cell can be ensured, and the product quality is reliable.
The preparation equipment comprises a workbench, a preparation box is fixed on the workbench, a feed inlet is formed in the upper portion of the preparation box, a first electromagnetic valve is arranged at the feed inlet, a discharge outlet is formed in the lower portion of the preparation box, a second electromagnetic valve is arranged at the discharge outlet, an upright post is fixed on the workbench, a lifting seat is arranged on the upright post and is positioned right above the preparation box, the lifting seat is connected with a driving structure capable of enabling the lifting seat to move up and down, the lifting seat is connected with the upper end of a connecting rod, the lower end of the connecting rod extends into the preparation box and is connected with a mounting plate, a stirring mechanism is arranged on the mounting plate and comprises a main stirring shaft, a first auxiliary stirring shaft, a second auxiliary stirring shaft, a driving motor, a driving wheel, a support, a guide strip, a guide block and an auxiliary strip, the driving motor is fixed on the mounting plate, A first auxiliary stirring shaft and a second auxiliary stirring shaft are respectively vertically arranged on the mounting plate, the first auxiliary stirring shaft and the second auxiliary stirring shaft are symmetrically arranged on two sides of the main stirring shaft, a main gear is fixed at the upper end of the main stirring shaft and is meshed with a driving wheel, a spiral forward blade is fixed at the lower end of the main stirring shaft, a first auxiliary gear is fixed at the upper end of the first auxiliary stirring shaft and is meshed with the main gear, a first spiral reverse blade is fixed at the lower end of the first auxiliary stirring shaft, a second auxiliary gear is fixed at the upper end of the second auxiliary stirring shaft and is meshed with the main gear, a second spiral reverse blade is fixed at the lower end of the second auxiliary stirring shaft, a support is fixed on the mounting plate, a guide block is fixed on the support, a guide bar is arranged on the guide block in a sliding manner, the auxiliary bar is horizontally fixed on the guide bar, a first push plate is fixed at one end of the auxiliary bar, the first push plate is, and the second pushing plate is vertically arranged, one side of the auxiliary strip is provided with a first tooth part, the other side of the auxiliary strip is provided with a second tooth part, the first auxiliary stirring shaft is also provided with a first half gear which can be meshed with the first tooth part, and the second auxiliary stirring shaft is also provided with a second half gear which can be meshed with the second tooth part.
The working principle of the preparation equipment is as follows: putting various raw materials into a preparation box, controlling a driving motor to drive a driving wheel to rotate, driving a main gear to rotate, driving a main stirring shaft to rotate by the main gear, driving a spiral forward blade to rotate by the main stirring shaft, driving a secondary gear I and a secondary gear II to rotate by the main gear, driving a secondary stirring shaft I to rotate by the secondary gear I, driving a spiral reverse blade I by the secondary stirring shaft, driving a secondary stirring shaft II to rotate by the secondary gear II, driving a spiral reverse blade II by the secondary stirring shaft II, and stirring the raw materials in the preparation box by the spiral forward blade, the spiral reverse blade I and the spiral reverse blade II; meanwhile, the first half gear is meshed with the first tooth part to enable the auxiliary strip to move leftwards, the second half gear is meshed with the second tooth part to enable the auxiliary strip to move rightwards after moving to the leftmost end, the auxiliary strip can move leftwards and rightwards, the first pushing plate and the second pushing plate push the raw materials in the preparation box to the middle of the preparation box repeatedly, the lifting seat can also be driven by the driving structure to move upwards and downwards, the lifting seat drives the mounting plate to move upwards and downwards through the connecting rod, and therefore the raw materials at all positions of the whole preparation box can be stirred uniformly and quickly.
The driving structure comprises an air cylinder, a guide rail and a sliding block, the guide rail is vertically fixed on the stand column, the sliding block is arranged on the guide rail, the air cylinder is fixed on the stand column, a piston rod of the air cylinder vertically faces upwards, the end part of a piston rod of the air cylinder is connected with the sliding block, and the lifting seat is connected with the sliding block through a connecting frame.
When the lifting seat needs to move up and down, the piston rod of the control cylinder moves up and down, the piston rod of the cylinder drives the sliding block to move up and down along the guide rail, and the sliding block drives the lifting seat to move up and down, so that the lifting seat can move up and down.
The cross sections of the first pushing plate and the second pushing plate are arc-shaped.
An observation port is further formed in the side portion of the preparation box, and a transparent observation plate is arranged at the observation port.
With the above structure, the abnormity in the preparation box can be observed through the observation plate.
The observation plate is an organic glass plate.
Still have the instruction subassembly on the stand, instruct the subassembly including instruction pole and pointer, the instruction pole is vertical to be fixed on the stand, has the scale mark on the instruction pole, and the pointer is fixed on the slider, and the pointer is towards the instruction pole.
By adopting the structure, the pointer moves up and down along with the sliding block and faces the indicating rod, so that the height position of the mounting plate can be conveniently known, and the indication is visual.
The first pushing plate is also provided with a plurality of first crushing cutters, the cross sections of the first crushing cutters are triangular, the second pushing plate is also provided with a plurality of second crushing cutters, and the cross sections of the second crushing cutters are triangular.
By adopting the structure, through the action of the first crushing cutter and the second crushing cutter, the raw materials can be crushed when the first pushing plate and the second pushing plate move left and right.
Still have auxiliary structure on the mounting panel, auxiliary structure includes auxiliary cylinder one, auxiliary cylinder two, linkage rope one, linkage rope two, leading wheel one and leading wheel two are fixed respectively on the mounting panel, auxiliary cylinder one set is established on vice (mixing) shaft one, the upper end of auxiliary cylinder one links to each other with the mounting panel through spring one, a plurality of material holes one have been seted up to the lateral part of auxiliary cylinder one, the one end of linkage rope one links to each other with auxiliary cylinder one, the other end of linkage rope one is walked around leading wheel one and is linked to each other with auxiliary strip one end, auxiliary cylinder two sets are established on vice (mixing) shaft two, the upper end of auxiliary cylinder two is passed through spring two and is linked to each other with the mounting panel, a plurality of material holes two have been seted up to the lateral part of auxiliary cylinder two, the one end of linkage rope two links to each other with auxiliary cylinder two, the other end.
By adopting the structure, when the auxiliary strip moves leftwards, the auxiliary cylinder moves downwards under the action of the linkage rope I and the linkage rope II and is matched with the spring I and the spring II, the auxiliary cylinder moves upwards, the auxiliary cylinder I can perform auxiliary flow guiding on the spiral reverse vane I, when the auxiliary strip moves rightwards, the auxiliary cylinder moves upwards under the action of the linkage rope I and the linkage rope II and is matched with the spring I and the spring II, the auxiliary cylinder II moves downwards, the auxiliary cylinder II can perform auxiliary flow guiding on the spiral reverse vane II, and the auxiliary effect is good.
The auxiliary structure further comprises a first guide pillar, a second guide pillar, a first guide ring and a second guide ring, the first guide ring and the second guide ring are respectively fixed on the mounting plate, the upper end of the first guide pillar is slidably arranged in the first guide ring, the lower end of the first guide pillar is connected with the first auxiliary cylinder, the upper end of the second guide pillar is slidably arranged in the second guide ring, and the lower end of the second guide pillar is connected with the second auxiliary cylinder.
By adopting the structure, the first auxiliary cylinder and the second auxiliary cylinder can be guided by moving up and down under the action of the first guide pillar, the second guide pillar, the first guide ring and the second guide ring.
The laser slicer comprises a machine base, a support frame is fixed on the machine base, a movable base is arranged on the support frame and is connected with a moving structure capable of driving the movable base to move back and forth, a laser generator is fixed on the movable base, a cutting head is connected on the laser generator, a condensing lens is arranged on the cutting head, a main shaft is vertically arranged on the machine base, the lower end of the main shaft is connected with a power structure capable of driving the main shaft to rotate, the upper end of the main shaft is connected with the middle part of a rotating strip, a placing plate is fixed at the end part of the rotating strip and can be positioned under the cutting head, a placing groove for placing a battery piece is formed in the placing plate, a cleaning mechanism capable of cleaning the placing plate is further arranged on the machine base and comprises a stand column, a sliding seat, a first push rod motor, a lifting platform, a working roller, a cloth placing roller, a cloth collecting roller, cleaning cloth, a water storage tank, a conveying pump, the slide sets up on the stand, the slide links to each other with one can drive its round trip movement's removal structure two, push rod motor one is fixed on the slide, push rod motor one's push rod is vertical downwards, push rod motor one's push rod tip and elevating platform link to each other, the cloth feeding roller, cloth collecting roller and working roll from top to bottom in proper order the level rotate the setting on the elevating platform, and the working roll can with place the board and contact, cleaning cloth one end is convoluteed on the cloth feeding roller, the cleaning cloth other end is walked around the working roll and is linked to each other with the cloth collecting roller, cloth collecting roller tip still can drive its pivoted servo motor one with one and link to each other, the installation pipe passes through the locating lever level and fixes on the elevating platform, and the installation pipe is located the working roll lateral part, be fixed with a plurality of atomising heads on the installation pipe, the installation pipe is linked together through raceway and.
The working principle of the laser slicer is as follows: put the battery piece on placing the board, drive the main shaft through the power structure and rotate, the main shaft drives and rotates the strip and rotate, it drives and places the board rotation to rotate the strip, make and place the board and be located the cutting head below, drive the sliding seat round trip movement through the removal structure, the sliding seat drives the cutting head round trip movement, the cutting head will place the battery piece on the board and be divided into two, drive the elevating platform through the push rod motor and move down, make the cleaning cloth of cleaning roller department with place the board contact, drive the slider round trip movement through two removal structures, the slider makes the elevating platform round trip movement, and simultaneously, carry the atomising head department through the raceway with the water in the water storage tank, spray it on placing the board, the cleaning cloth can be with whole board clean up of placing, thereby can guarantee the normal clear of section operation, it is reliable to slice.
The first movable structure comprises a first guide rod, a first guide block, a first lead screw, a nut, a second servo motor and a connecting plate, the first guide rod is horizontally fixed on the support frame, the first guide block is arranged on the first guide rod, the lead screw is horizontally arranged on the support frame, the lead screw is parallel to the first guide rod, the end part of the lead screw is connected with the second servo motor, the nut is in threaded connection with the lead screw, the nut is connected with an inner ring of a bearing, an outer ring of the bearing is connected with a bearing seat, the bearing seat is connected with the first guide block through the connecting plate, and the movable seat is fixed on the connecting plate.
When the movable seat needs to move back and forth, the servo motor II is controlled to drive the screw rod to rotate, the screw rod enables the nut to rotate, the nut drives the bearing seat to move back and forth, and the bearing seat drives the movable seat to move back and forth through the connecting plate, so that the movable seat can move back and forth.
The second moving structure comprises a second guide rod, a second guide block and a second push rod motor, the second guide rod is horizontally fixed on the stand column, the second guide block is arranged on the second guide rod, the second push rod motor is fixed on the stand column, the push rod of the second push rod motor is horizontally arranged, the end part of the push rod of the second push rod motor is connected with the second guide block, and the sliding seat is connected with the second guide block.
When the sliding seat needs to move back and forth, the second push rod motor is controlled to drive the second guide block to move back and forth, and the second guide block drives the sliding seat to move back and forth, so that the sliding seat can move back and forth.
And limiting blocks are further fixed at two ends of the second guide rod.
The power structure I comprises a third servo motor, a driving gear and a driven gear, the third servo motor is fixed on the base, an output shaft of the third servo motor is vertically upward, the driving gear is fixed at the end of the output shaft of the third servo motor, the driven gear is fixed at the lower end of the main shaft, and the driving gear is meshed with the driven gear.
When the main shaft needs to rotate, the servo motor III is controlled to drive the driving gear to rotate, the driving gear drives the driven gear to rotate, and the driven gear drives the main shaft to rotate, so that the main shaft can rotate.
And a blocking plate is further fixed on the lifting platform and is positioned below the cloth collecting roller.
By adopting the structure, sundries on the cleaning cloth can be prevented from falling onto the placing plate through the separation plate, and the separation is convenient.
The passivation treatment device comprises a rack, a passivation box is fixed on the rack, a plurality of lifting doors are arranged on the passivation box, the lifting doors divide the interior of the passivation box into a plurality of process chambers, a conveying line for conveying silicon wafer baskets is arranged on the rack and penetrates through the process chambers, the conveying line comprises two rows of rolling shafts for bearing and horizontally conveying the silicon wafer baskets, the process chambers comprise a pretreatment chamber, a first treatment chamber, a second treatment chamber and a post-treatment chamber which are sequentially arranged along the conveying direction of the conveying line, and the passivation treatment device is characterized in that a feeding mechanism is further arranged on the rack, the feeding mechanism comprises a base, a storage platform, a rotating shaft, a feeding paddle, an alarm bell, a controller and a square detection plate, the base is fixed on the rack, the storage platform is arranged on the base, a plurality of storage convex parts for storing the silicon wafer baskets are arranged on the storage platform, and the storage platform is further connected with a moving structure capable of driving the storage platform, the vertical setting of pivot is in the frame, and the pivot is located base and transfer chain between the two, the pivot lower extreme links to each other with one can drive its pivoted power structure two, pivot upper end and mounting bar link to each other, be fixed with push rod motor three on the mounting bar, the push rod of push rod motor three is vertical downwards, the push rod tip and the elevator of push rod motor three link to each other, be fixed with push rod motor four on the elevator, the push rod level setting of push rod motor four, push rod motor four's push rod tip and material loading oar link to each other, the pick-up plate passes through the link rod and the mounting panel links to each other, and be located the material loading oar below, be fixed with four travel switches on the pick-up plate, alarm bell and controller are all fixed on the base, alarm bell and travel switch pass through the circuit.
The principle of the passivation treatment device is as follows: when the silicon wafer basket with the battery pieces is required to be input into the passivation box, the silicon wafer basket is stored at the storage convex part of the storage platform, the third push rod motor is controlled to drive the lifting block to move downwards, the lifting block enables the feeding paddle to move downwards, the fourth push rod motor is controlled to drive the feeding paddle to extend forwards, the feeding paddle is inserted into the storage convex part, the third push rod motor is controlled to drive the lifting block to move upwards, the feeding paddle takes out the silicon wafer basket on the storage platform, the fourth push rod motor is controlled to drive the feeding paddle to retract backwards, the third push rod motor is controlled to enable the feeding paddle to move upwards and downwards, the bottom of the silicon wafer basket on the feeding paddle is in contact with the travel switch, the travel switch transmits a signal to the controller, the controller can control the alarm bell to work, whether the silicon wafer basket on the feeding paddle is placed right or not can be judged, the rotating shaft is driven to rotate by the second power structure, the, and the fourth control push rod motor drives the feeding paddle to extend forwards, so that the feeding paddle is positioned above the conveying line, the third control push rod motor drives the lifting block to move downwards, the lifting block enables the feeding paddle to move downwards, the silicon wafer basket is placed on the conveying line, manual feeding is replaced, and the feeding is convenient.
The feeding mechanism further comprises a dust collector and a U-shaped dust collection pipe, the dust collection pipe is fixed to the end portion of the detection plate, air inlets are formed in two ends of the dust collection pipe and are vertical upwards, an air outlet is formed in the middle of the dust collection pipe, the air outlet is communicated with the dust collector through a connecting pipe, and the dust collector is fixed to the rack.
By adopting the structure, the fourth control push rod motor drives the feeding paddle to extend forwards, the silicon wafer basket on the feeding paddle gradually passes through the dust collection pipe, the dust collector is started, dust at the bottom of the silicon wafer basket is removed through the dust collection pipe, and dust removal is rapid.
The moving structure III comprises a guide rod, a guide sleeve, a servo motor IV, a gear and a rack, the guide rod is horizontally fixed on the base, the guide sleeve is arranged on the guide rod, the rack is horizontally fixed on the base, the rack is parallel to the guide rod, the servo motor IV is fixed on the guide sleeve, an output shaft of the servo motor IV faces vertically downwards, the gear is fixed at the end of the output shaft of the servo motor IV, the gear is meshed with the rack, and the material storage table is fixed on the guide sleeve.
When the storage table is required to move back and forth, the servo motor is controlled to drive the gears to rotate, the gears are gradually meshed with the racks, the guide sleeve is enabled to move back and forth along the guide rod, and the guide sleeve drives the storage table to move back and forth, so that the storage table can move back and forth.
The second power structure comprises a second stepping motor, a second driving wheel and a second driven wheel, the second stepping motor is fixed on the rack, an output shaft of the second stepping motor is vertically upward, the second driving wheel is fixed at the end part of the output shaft of the second stepping motor, the second driven wheel is fixed at the lower end of the rotating shaft, and the second driving wheel is meshed with the second driven wheel.
When the rotating shaft needs to be rotated, the second stepping motor is controlled to drive the second driving wheel to rotate, the second driving wheel drives the second driven wheel to rotate, and the second driven wheel drives the rotating shaft to rotate, so that the rotating shaft can be rotated.
Compared with the prior art, the preparation method of the half-wafer polycrystalline solar cell has the advantages that: the passivation treatment is added to passivate impurities and defects in the cell, so that the composition in the silicon wafer body is reduced, the efficiency of the cell is improved, the slurry can be prepared on line through the preparation equipment, and the slurry is uniformly mixed, so that the printing quality can be ensured; and a special laser slicer is added for cutting, so that the quality of the half cell can be ensured, and the product quality is reliable.
Drawings
FIG. 1 is a schematic plan view of a dispensing apparatus.
Fig. 2 is a schematic perspective view of a stirring mechanism in the dispensing apparatus.
FIG. 3 is a schematic perspective view of a dispensing apparatus with portions broken away.
Fig. 4 is a schematic perspective view of an auxiliary structure in the dispensing apparatus.
Fig. 5 is a schematic plan view of a laser microtome.
Fig. 6 is a schematic perspective view of a portion of a laser microtome with portions broken away.
Fig. 7 is a schematic perspective view of the passivation treatment apparatus.
Fig. 8 is a schematic perspective view of a passivation treatment apparatus with a removed portion.
FIG. 9 is a schematic plan view of a removed part of the passivation treating apparatus.
In the figure, 1, a workbench; 2. preparing a box; 2a, a feed inlet; 2b, a discharge hole; 3. a second electromagnetic valve; 4. an observation plate; 5. a first electromagnetic valve; 6. a connecting rod; 7. a lifting seat; 8. a connecting frame; 9. a slider; 10. a guide rail; 11. an indication lever; 12. a pointer; 13. a cylinder; 14. a column; 15. a second pushing plate; 15a, a second crushing knife; 16. an auxiliary bar; 16a, a first tooth part; 16b, a second tooth part; 17. a guide strip; 18. a driving wheel; 19. a main gear; 20. a first half gear; 21. a support; 22. a first driven gear; 23. a guide block; 24. a secondary gear II; 25. a first pushing plate; 25a, a crushing knife I; 26. a half gear II; 27. mounting a plate; 28. a secondary stirring shaft II; 29. a second spiral reverse blade; 30. a main stirring shaft; 31. a helical forward blade; 32. a drive motor; 33. a first auxiliary stirring shaft; 34. a first spiral reverse blade; 35. a first auxiliary cylinder; 36. a first spring; 37. a first guide wheel; 38. a linkage rope I; 39. a first guide ring; 40. a first guide post; 41. a second guide ring; 42. a second guide post; 43. a linkage rope II; 44. a second auxiliary cylinder; 45. a second spring; 46. a machine base; 47. rotating the strip; 48. a driven gear; 49. a main shaft; 50. a servo motor III; 51. a driving gear; 52. a support frame; 53. placing the plate; 54. a servo motor II; 55. a bearing seat; 56. a nut; 57. a screw rod; 58. a first guide rod; 59. a first guide block; 60. a movable seat; 61. a laser generator; 62. a cutting head; 63. a condenser lens; 64. a work roll; 65. a barrier plate; 66. a cloth collecting roller; 67. a lifting platform; 68. a push rod motor I; 69. a push rod motor II; 70. a cloth releasing roller; 71. a cleaning cloth; 72. a column; 73. a spray head; 74. installing a pipe; 75. a slide base; 76. a second guide block; 77. a second guide rod; 78. a water delivery pipe; 79. a delivery pump; 80. a water storage tank; 81. a frame; 82. a second driving wheel; 83. a second stepping motor; 84. a base; 85. a controller; 86. an alarm bell; 87. a material storage table; 87a, a storage protrusion; 88. detecting a plate; 89. a feeding paddle; 90. a third push rod motor; 91. a lifting block; 92. a push rod motor IV; 93. mounting a bar; 94. a rotating shaft; 95. a second driven wheel; 96. a link rod; 97. a travel switch; 98. a vacuum cleaner; 99. a connecting pipe; 100. a dust collection pipe; 101. a gear; 102. a rack; 103. a servo motor IV; 104. a guide sleeve; 105. a guide bar; 106. and a limiting block.
Detailed Description
The following are specific embodiments of the present invention and are further described with reference to the drawings, but the present invention is not limited to these embodiments.
The preparation method of the half-wafer polycrystalline solar cell comprises the following steps:
a. cleaning and detecting purchased silicon wafers, and removing unqualified silicon wafers;
b. putting the inspected silicon wafer into an alkaline solution for texturing;
c. putting the textured silicon wafer into a quartz boat, and putting the quartz boat into a diffusion furnace for diffusion;
d. placing the diffused silicon wafer into an etching machine for etching;
e. soaking the etched silicon wafer in hydrofluoric acid for 20-30min to remove phosphorosilicate glass on the surface of the silicon wafer; in this embodiment, the soaking time is 25 min;
f. placing the soaked silicon wafer into a graphite boat, and placing the graphite boat into a PECVD device for film coating to form a three-layer antireflection film;
g. printing the coated silicon wafer in a screen printing mode;
h. placing the printed silicon wafer into a sintering furnace for sintering to obtain a battery piece;
i. stacking 200 and 400 battery pieces in the same direction in a silicon wafer basket, and putting the silicon wafer basket in a passivation treatment device for passivation; in the embodiment, 300 battery pieces are stacked in the same direction in the silicon wafer basket;
j. and cutting the passivated cell slice by a laser slicer to divide the cell slice into two, thereby obtaining the finished semi-polycrystalline solar cell.
The cleaning process in the step a is as follows: soaking the silicon wafer in sodium hydroxide solution for 10-20min, then in nitric acid solution for 15-25min, and finally in hydrofluoric acid solution for 5-10 min; in this embodiment, the cleaning process in step a is as follows: the silicon wafer is firstly put into a sodium hydroxide solution to be soaked for 15min, then put into a nitric acid solution to be soaked for 20min, and finally put into a hydrofluoric acid solution to be soaked for 7 min.
The total thickness of the three layers of antireflection films in the step f is 90-110 nm; in this embodiment, the total thickness of the three-layer antireflection film in step f is 100 nm.
The printing process in the step g is as follows: preparing back silver paste, back aluminum paste and front silver paste by using preparation equipment; printing 30-50mg of back silver paste on the silicon wafer by using a back electrode screen printing plate, and drying at the temperature of 220-250 ℃; 1300-1600mg of back aluminum paste is screen-printed by a back electric field screen printing plate and dried at the temperature of 280-320 ℃; printing 110-130mg of positive silver paste by using a positive electrode screen printing method; in this embodiment, the printing process in step g is: preparing back silver paste, back aluminum paste and front silver paste by using preparation equipment; printing 40mg of back silver paste on the silicon wafer by using a back electrode screen printing plate, and drying at the temperature of 230 ℃; printing 1500mg of back aluminum paste by using a back electric field screen printing plate, and drying at 300 ℃; printing 120mg of positive silver paste by using a positive electrode screen printing plate; the back silver paste, the back aluminum paste and the front silver paste all adopt the formula raw materials in the prior art.
And g, the electrode in the step g is of a front-back structure of a half-chip structure, the structure is beneficial to laser cutting into half-chips, and meanwhile, the pattern design is matched to play the best battery power.
By adopting the method, the passivation treatment is added to passivate impurities and defects in the cell, the recombination in the silicon wafer body is reduced, the efficiency of the cell is improved, the slurry can be prepared on line through the preparation equipment, and the slurry is uniformly mixed, so that the printing quality can be ensured; and a special laser slicer is added for cutting, so that the quality of the half cell can be ensured, and the product quality is reliable.
The half cell is manufactured into a corresponding component, and the half cell has the following advantages:
firstly, the method comprises the following steps: compared with the conventional integral component, the output power of the half photovoltaic component with the same efficiency is obviously improved; the fill factor FF is improved due to the reduction of the series resistance of the half-chip module, and the temperature of the module during power generation operation is lower than that of a conventional module due to the reduction of the internal resistance of the module, so that the power generation capacity of the module is further improved.
Secondly, the method comprises the following steps: the half-piece assembly can reduce the power loss caused by shielding, can obviously improve the generated energy of the assembly in the early and late stages and during the deposition and accumulation of snow on the lower edge of the assembly, and improves the economic benefit of a power station.
Thirdly, the method comprises the following steps: compared with other new technologies, the half-chip technology is mature, the fast large-scale mass production is easy to realize, and meanwhile, the additional cost is not much increased.
As shown in fig. 1-4, the dispensing apparatus includes a workbench 1, a dispensing box 2 is fixed on the workbench 1, and in this embodiment, the dispensing box 2 is fixed on the workbench 1 by means of bolts; the upper part of the preparation box 2 is provided with a feeding hole 2a, a first electromagnetic valve 5 is arranged at the feeding hole 2a, the lower part of the preparation box 2 is provided with a discharging hole 2b, a second electromagnetic valve 3 is arranged at the discharging hole 2b, and an upright post 14 is fixed on the workbench 1; the upright post 14 is provided with a lifting seat 7, the lifting seat 7 is positioned right above the preparation box 2, the lifting seat 7 is connected with a driving structure which can enable the lifting seat 7 to move up and down, the lifting seat 7 is connected with the upper end of a connecting rod 6, the lower end of the connecting rod 6 extends into the preparation box 2 and is connected with a mounting plate 27, the mounting plate 27 is provided with a stirring mechanism, the stirring mechanism comprises a main stirring shaft 30, an auxiliary stirring shaft I33, an auxiliary stirring shaft II 28, a driving motor 32, a driving wheel 18, a support 21, a guide strip 17, a guide block 23 and an auxiliary strip 16, the driving motor 32 is fixed on the mounting plate 27, an output shaft of the driving motor 32 is vertically upward, the driving wheel 18 is fixed at the end part of the output shaft of the driving motor 32, the main stirring shaft 30, the auxiliary stirring shaft I33 and the auxiliary stirring shaft II 28 are respectively vertically arranged on the mounting plate 27, a main gear 19 is fixed at the upper end of a main stirring shaft 30, the main gear 19 is meshed with a driving wheel 18, a spiral forward blade 31 is fixed at the lower end of the main stirring shaft 30, a first driven gear 22 is fixed at the upper end of a first driven shaft 33, the first driven gear 22 is meshed with the main gear 19, a first spiral reverse blade 34 is fixed at the lower end of the first driven shaft 33, a second driven gear 24 is fixed at the upper end of a second driven shaft 28, the second driven gear 24 is meshed with the main gear 19, a second spiral reverse blade 29 is fixed at the lower end of the second driven shaft 28, a bracket 21 is fixed on a mounting plate 27, a guide block 23 is fixed on the bracket 21, a guide bar 17 is arranged on the guide block 23 in a sliding manner, an auxiliary bar 16 is horizontally fixed on the guide bar 17, a first pushing plate 25 is fixed at one end of the auxiliary bar 16, the first pushing plate 25 is arranged vertically, a second pushing plate 15 is fixed at the other end of the auxiliary bar 16, one side of the auxiliary strip 16 is provided with a first tooth part 16a, the other side of the auxiliary strip 16 is provided with a second tooth part 16b, the first auxiliary stirring shaft 33 is further provided with a first half gear 20, the first half gear 20 can be meshed with the first tooth part 16a, the second auxiliary stirring shaft 28 is further provided with a second half gear 26, and the second half gear 26 can be meshed with the second tooth part 16 b.
The driving structure comprises a cylinder 13, a guide rail 10 and a sliding block 9, the guide rail 10 is vertically fixed on a vertical column 14, the sliding block 9 is arranged on the guide rail 10, the cylinder 13 is fixed on the vertical column 14, and in the embodiment, the cylinder 13 is fixed on the vertical column 14 in a bolt connection mode; the piston rod of the cylinder 13 is vertically upward, the end part of the piston rod of the cylinder 13 is connected with the sliding block 9, and the lifting seat 7 is connected with the sliding block 9 through the connecting frame 8.
The cross sections of the first pushing plate 25 and the second pushing plate 15 are both arc-shaped.
The side part of the preparation box 2 is also provided with an observation port, and a transparent observation plate 4 is arranged at the observation port; by adopting the structure, the abnormity in the preparation box 2 can be observed through the observation plate 4; the viewing plate 4 is a plexiglas plate.
The upright post 14 is also provided with an indicating assembly, the indicating assembly comprises an indicating rod 11 and a pointer 12, the indicating rod 11 is vertically fixed on the upright post 14, the indicating rod 11 is provided with scale marks, the pointer 12 is fixed on the sliding block 9, and the pointer 12 faces the indicating rod 11; with this structure, the pointer 12 moves up and down along with the slider 9, and the pointer 12 faces the indication rod 11, so that the height position of the mounting plate 27 can be known conveniently, and the indication is intuitive.
The first pushing plate 25 is also provided with a plurality of first crushing knives 25a, and in the embodiment, the number of the first crushing knives 25a is fifty; the section of the first crushing knife 25a is triangular, the second pushing plate 15 is further provided with a plurality of second crushing knives 15a, and in the embodiment, the number of the second crushing knives 15a is fifty; the section of the second crushing knife 15a is triangular; by adopting the structure, under the action of the first crushing cutter 25a and the second crushing cutter 15a, when the first pushing plate 25 and the second pushing plate 15 move left and right, the raw materials can be crushed.
The mounting plate 27 is further provided with an auxiliary structure, the auxiliary structure comprises an auxiliary cylinder I35, an auxiliary cylinder II 44, a linkage rope I38, a linkage rope II 43, a guide wheel I37 and a guide wheel II, the guide wheel I37 and the guide wheel II are respectively fixed on the mounting plate 27, the auxiliary cylinder I35 is sleeved on the auxiliary stirring shaft I33, the upper end of the auxiliary cylinder I35 is connected with the mounting plate 27 through a spring I36, the side part of the auxiliary cylinder I35 is provided with a plurality of material holes I, and in the embodiment, the number of the material holes I is twenty; one end of a first linkage rope 38 is connected with a first auxiliary cylinder 35, the other end of the first linkage rope 38 bypasses a first guide wheel 37 and is connected with one end of an auxiliary strip 16, a second auxiliary cylinder 44 is sleeved on a second auxiliary stirring shaft 28, the upper end of the second auxiliary cylinder 44 is connected with a mounting plate 27 through a second spring 45, and a plurality of second material holes are formed in the side portion of the second auxiliary cylinder 44; one end of the second linkage rope 43 is connected with the second auxiliary cylinder 44, and the other end of the second linkage rope 43 bypasses the second guide wheel to be connected with two ends of the auxiliary strip 16.
The auxiliary structure further comprises a first guide post 40, a second guide post 42, a first guide ring 39 and a second guide ring 41, the first guide ring 39 and the second guide ring 41 are respectively fixed on the mounting plate 27, the upper end of the first guide post 40 is slidably arranged in the first guide ring 39, the lower end of the first guide post 40 is connected with the first auxiliary cylinder 35, the upper end of the second guide post 42 is slidably arranged in the second guide ring 41, and the lower end of the second guide post 42 is connected with the second auxiliary cylinder 44; with this structure, the first auxiliary cylinder 35 and the second auxiliary cylinder 44 can be guided to move up and down by the action of the first guide post 40, the second guide post 42, the first guide ring 39, and the second guide ring 41.
The working principle of the preparation equipment is as follows: putting various raw materials into a preparation box 2, controlling a driving motor 32 to drive a driving wheel 18 to rotate, driving the driving wheel 18 to drive a main gear 19 to rotate, driving the main gear 19 to drive a main stirring shaft 30 to rotate, driving the main stirring shaft 30 to drive a spiral forward blade 31 to rotate, simultaneously driving the main gear 19 to drive a first slave gear 22 and a second slave gear 24 to rotate, driving a first slave stirring shaft 33 to rotate from the first slave gear 22, driving a first spiral reverse blade 34 from the first slave stirring shaft 33, driving a second slave stirring shaft 28 to rotate from the second slave gear 24, driving a second spiral reverse blade 29 from the second slave stirring shaft 28, and stirring the raw materials in the preparation box 2 by the spiral forward blade 31, the first spiral reverse blade 34 and the second spiral reverse blade 29; meanwhile, the first half gear 20 is meshed with the first tooth part 16a, so that the auxiliary strip 16 moves leftwards and moves leftwards to the leftmost end, the second half gear 26 is meshed with the second tooth part 16b, so that the auxiliary strip 16 moves rightwards, the auxiliary strip 16 can move leftwards and rightwards, the first push plate 25 and the second push plate 15 move leftwards and rightwards by the auxiliary strip 16, and the first push plate 25 and the second push plate 15 repeatedly push the raw materials in the preparation box 2 to the middle of the preparation box 2; when the auxiliary strip 16 moves leftwards, the first auxiliary cylinder 35 moves downwards under the action of the first linkage rope 38 and the second linkage rope 43 and is matched with the first spring 36 and the second spring 45, the second auxiliary cylinder 44 moves upwards, the first auxiliary cylinder 35 can perform auxiliary flow guiding on the first spiral reverse blade 34, and when the auxiliary strip 16 moves rightwards, the first auxiliary cylinder 35 moves upwards and the second auxiliary cylinder 44 moves downwards under the action of the first linkage rope 38 and the second linkage rope 43 and is matched with the first spring 36 and the second spring 45, and the second auxiliary cylinder 44 can perform auxiliary flow guiding on the second spiral reverse blade 29; also can control cylinder 13 and drive slider 9 and reciprocate along guide rail 10, slider 9 drives lift seat 7 and reciprocates, and lift seat 7 drives mounting panel 27 through connecting rod 6 and reciprocates to can be fast with whole preparation case 2 everywhere raw material mixing even.
As shown in fig. 5-6, the laser slicer includes a base 1, a supporting frame 7 is fixed on the base 1, and in this embodiment, the supporting frame 7 is fixed on the base 1 by means of bolts; the supporting frame 7 is provided with a movable seat 16, the movable seat 16 is connected with a moving structure I capable of driving the movable seat 16 to move back and forth, a laser generator 17 is fixed on the movable seat 16, a cutting head 18 is connected on the laser generator 17, and a condenser lens 19 is arranged on the cutting head 18; the cleaning machine comprises a machine base 1, a main shaft 4 is vertically arranged on the machine base 1, the lower end of the main shaft 4 is connected with a power structure capable of driving the main shaft to rotate, the upper end of the main shaft 4 is connected with the middle part of a rotating strip 2, a placing plate 8 is fixed at the end part of the rotating strip 2, the placing plate 8 can be positioned under a cutting head 18, a placing groove for placing a battery piece is formed in the placing plate 8, a cleaning mechanism capable of cleaning the placing plate 8 is further arranged on the machine base 1 and comprises a stand column 28, a sliding seat 32, a first push rod motor 24, a lifting platform 23, a working roller 20, a cloth releasing roller 26, a cloth collecting roller 22, cleaning cloth 27, a water storage tank 37, a conveying pump 36 and a mounting pipe 30, the stand column 28 is fixed on the machine base 1, and in the embodiment, the stand column 28; the slide seat 32 is arranged on the upright post 28, the slide seat 32 is connected with a moving structure II capable of driving the slide seat to move back and forth, and the push rod motor I24 is fixed on the slide seat 32, in the embodiment, the push rod motor I24 is fixed on the slide seat 32 in a bolt connection mode; the push rod of the push rod motor I24 is vertically downward, the end part of the push rod motor I24 is connected with the lifting platform 23, the cloth releasing roller 26, the cloth collecting roller 22 and the working roller 20 are sequentially and horizontally arranged on the lifting platform 23 from top to bottom, the working roller 20 can be in contact with the placing plate 8, one end of the cleaning cloth 27 is wound on the cloth releasing roller 26, the other end of the cleaning cloth 27 bypasses the working roller 20 and is connected with the cloth collecting roller 22, the end part of the cloth collecting roller 22 is also connected with a servo motor I capable of driving the cloth collecting roller to rotate, the mounting pipe 30 is horizontally fixed on the lifting platform 23 through a positioning rod, the mounting pipe 30 is positioned at the side part of the working roller 20, a plurality of spray heads 29 are fixed on the mounting pipe 30, and in the embodiment, the number; the mounting pipe 30 is communicated with a water storage tank 37 through a water conveying pipe 35, the water storage tank 37 is fixed on the machine base 1, and a conveying pump 36 is arranged on the water conveying pipe 35.
The first movable structure comprises a first guide rod 14, a first guide block 15, a first screw rod 13, a nut 12, a second servo motor 9 and a connecting plate, the first guide rod 14 is horizontally fixed on the support frame 7, the first guide block 15 is arranged on the first guide rod 14, the second screw rod 13 is horizontally arranged on the support frame 7, the first screw rod 13 is parallel to the first guide rod 14, the end part of the second screw rod 13 is connected with the second servo motor 9, the nut 12 is in threaded connection with the screw rod 13, the nut 12 is connected with the inner ring of the bearing, the outer ring of the bearing is connected with the bearing seat 11, the bearing seat 11 is connected with the first guide block 15 through the connecting plate, and the movable seat 16 is fixed on.
The second moving structure comprises a second guide rod 34, a second guide block 33 and a second push rod motor 25, the second guide rod 34 is horizontally fixed on the upright post 28, the second guide block 33 is arranged on the second guide rod 34, the second push rod motor 25 is fixed on the upright post 28, and in the embodiment, the second push rod motor 25 is fixed on the upright post 28 in a bolt connection mode; the push rod of the push rod motor II 25 is horizontally arranged, the end part of the push rod motor II 25 is connected with the guide block II 33, and the sliding seat 32 is connected with the guide block II 33.
And limiting blocks are further fixed at two ends of the second guide rod 34.
The power structure comprises a servo motor III 5, a driving gear 6 and a driven gear 3, the servo motor III 5 is fixed on the machine base 1, an output shaft of the servo motor III 5 is vertically upward, the driving gear 6 is fixed at the end part of the output shaft of the servo motor III 5, the driven gear is fixed at the lower end of the main shaft 4, and the driving gear 6 is meshed with the driven gear 3.
A blocking plate 21 is further fixed on the lifting platform 23, and in the embodiment, the blocking plate 21 is further fixed on the lifting platform 23 in a welding manner; the blocking plate 21 is positioned below the cloth collecting roller 22; by adopting the structure, sundries on the cleaning cloth 27 can be prevented from falling onto the placing plate 8 through the separation plate 21, and the separation is convenient.
The working principle of the laser slicer is as follows: placing the battery pieces on a placing plate 8, controlling a third servo motor 5 to drive a driving gear 6 to rotate, driving the driving gear 6 to drive a driven gear 3 to rotate, driving a main shaft 4 to rotate by the driven gear 3, driving a rotating strip 2 to rotate by the main shaft 4, driving the placing plate 8 to rotate by the rotating strip 2, enabling the placing plate 8 to be positioned below a cutting head 18, controlling a second servo motor 9 to drive a lead screw 13 to rotate, enabling a nut 12 to rotate by the lead screw 13, enabling the nut 12 to drive a bearing block 11 to move back and forth, enabling the bearing block 11 to drive a movable seat 16 to move back and forth through a connecting plate, enabling the movable seat 16 to drive the cutting head 18 to move back and forth, and; drive elevating platform 23 through push rod motor 24 and move down, make the cleaning cloth 27 of cleaning roller department with place the board 8 contact, control push rod motor two 25 drives guide block two 33 round trip movement, guide block two 33 drives slide 32 round trip movement, slide 32 makes elevating platform 23 round trip movement, simultaneously, carry the atomising head 29 department with the water in the storage water tank 37 through raceway 35, spray it on placing board 8, cleaning cloth 27 will whole place board 8 clean up.
As shown in fig. 7-9, the passivation apparatus includes a frame 81, a passivation box is fixed on the frame 81, a plurality of lifting doors are arranged on the passivation box, the lifting doors divide the interior of the passivation box into a plurality of process chambers, a conveyor line for conveying silicon wafer baskets is arranged on the frame 81, the conveyor line penetrates through each process chamber, the conveyor line includes two rows of rollers for carrying and horizontally conveying the silicon wafer baskets, and the process chambers include a pretreatment chamber, a first process chamber, a second process chamber and a post-process chamber which are sequentially arranged along the conveying direction of the conveyor line, in this embodiment, the pretreatment chamber, the first process chamber, the second process chamber, the post-process chamber and the conveyor line all adopt the existing structure disclosed in patent No. 201520992271X; the rack 81 is also provided with a feeding mechanism, the feeding mechanism comprises a base 84, a storage table 87, a rotating shaft 94, a feeding paddle 89, an alarm 86, a controller 85 and a square detection plate 88, the base 84 is fixed on the rack 81, the storage table 87 is arranged on the base 84, the storage table 87 is provided with a plurality of storage convex parts 87a for storing silicon wafer baskets, and in the embodiment, the number of the storage convex parts 87a is seven; the material storage table 87 is also connected with a moving structure III which can drive the material storage table to move back and forth, the rotating shaft 94 is vertically arranged on the rack 81, the rotating shaft 94 is positioned between the base 84 and the conveying line, the lower end of the rotating shaft 94 is connected with a power structure II capable of driving the rotating shaft 94 to rotate, the upper end of the rotating shaft 94 is connected with the mounting strip 93, a third push rod motor 90 is fixed on the mounting strip 93, a push rod of the third push rod motor 90 faces downwards vertically, the end part of the push rod of the third push rod motor 90 is connected with the lifting block 91, a fourth push rod motor 92 is fixed on the lifting block 91, a push rod of the fourth push rod motor 92 is horizontally arranged, the end part of the push rod of the fourth push rod motor 92 is connected with the feeding paddle 89, the detection plate 88 is connected with the mounting, and the detecting plate 88 is positioned below the feeding paddle 89, four travel switches 97 are fixed on the detecting plate 88, in the present embodiment, four travel switches 97 can be respectively in contact with four corners of the bottom of the silicon wafer basket; the alarm bell 86 and the controller 85 are both fixed on the base 84, and the alarm bell 86 and the travel switch 97 are both connected with the controller 85 through circuits; in this embodiment, the controller 85 may be a commercially available single chip microcomputer, and the programs for controlling the alarm bell and the travel switch are available, and the programs do not need to be edited again.
The feeding mechanism further comprises a dust collector 98 and a U-shaped dust collection pipe 100, the dust collection pipe 100 is fixed at the end part of the detection plate 88, air inlets are formed in two ends of the dust collection pipe 100, the air inlets are vertically upward, an air outlet is formed in the middle of the dust collection pipe 100, the air outlet is communicated with the dust collector 98 through a connecting pipe 99, and the dust collector 98 is fixed on the rack 81; by adopting the structure, the fourth control push rod motor 92 drives the feeding paddle 89 to extend forwards, the silicon wafer basket on the feeding paddle 89 gradually passes through the dust suction pipe 100, the dust collector 98 is started, and dust at the bottom of the silicon wafer basket is removed through the dust suction pipe 100, so that dust removal is rapid.
The third moving structure comprises a guide rod 105, a guide sleeve 104, a servo motor four 103, a gear 101 and a rack 102, the guide rod 105 is horizontally fixed on the base 84, the guide sleeve 104 is arranged on the guide rod 105, the rack 102 is horizontally fixed on the base 84, the rack 102 and the guide rod 105 are parallel to each other, the servo motor four 103 is fixed on the guide sleeve 104, and in the embodiment, the servo motor four 103 is fixed on the guide sleeve 104 in a bolt connection mode; an output shaft of the servo motor IV 103 is vertically downward, the gear 101 is fixed at the end part of the output shaft of the servo motor IV 103, the gear 101 is meshed with the rack 102, and the material storage table 87 is fixed on the guide sleeve 104; the guide bar 105 also has stop blocks 106 at both ends.
The second power structure comprises a second stepping motor 83, a second driving wheel 82 and a second driven wheel 95, the second stepping motor 83 is fixed on the rack 81, an output shaft of the second stepping motor 83 is vertically upward, the second driving wheel 82 is fixed at the end part of the output shaft of the second stepping motor 83, the second driven wheel 95 is fixed at the lower end of the rotating shaft 94, and the second driving wheel 82 is meshed with the second driven wheel 95.
The principle of the passivation treatment device is as follows: when the silicon wafer basket with the battery piece is required to be input into the passivation box, the silicon wafer basket is stored at the storage convex part 87a of the storage platform 87, the servo motor IV 103 is controlled to drive the gear 101 to rotate, the gear 101 is gradually meshed with the rack 102, the guide sleeve 104 moves back and forth along the guide rod 105, and the guide sleeve 104 drives the storage platform 87 to move back and forth; controlling a third push rod motor 90 to drive a lifting block 91 to move downwards, controlling the lifting block 91 to drive a feeding paddle 89 to move downwards, controlling a fourth push rod motor 92 to drive the feeding paddle 89 to extend forwards, enabling the feeding paddle 89 to be inserted into the storage protrusion 87a, controlling the third push rod motor 90 to drive the lifting block 91 to move upwards, taking out the silicon wafer basket on the storage platform 87 by the feeding paddle 89, controlling a fourth push rod motor 92 to drive the feeding paddle 89 to retract backwards, controlling the third push rod motor 90 to drive the feeding paddle 89 to move upwards and downwards, contacting the bottom of the silicon wafer basket on the feeding paddle 89 with a travel switch 97, transmitting a signal to a controller 85 by the travel switch 97, controlling an alarm 86 to work by the controller 85, judging whether the silicon wafer basket on the feeding paddle 89 is placed correctly, controlling a second stepping motor 83 to drive a second driving wheel 82 to rotate, driving the second driving wheel 82 to drive a second driven wheel 95 to rotate, driving a rotating shaft 94 to rotate by the second driven, make material loading oar 89 be located the transfer chain lateral part, control push rod motor four 92 drives material loading oar 89 and stretches out forward, makes material loading oar 89 be located the transfer chain top, and control push rod motor three 90 drives elevator 91 downstream, and elevator 91 makes material loading oar 89 downstream, puts the silicon chip basket on the transfer chain, replaces artifical material loading, and the material loading is convenient.

Claims (3)

1. A preparation method of a half-wafer polycrystalline solar cell is characterized by comprising the following steps:
a. cleaning and detecting purchased silicon wafers, and removing unqualified silicon wafers;
b. putting the inspected silicon wafer into an alkaline solution for texturing;
c. putting the textured silicon wafer into a quartz boat, and putting the quartz boat into a diffusion furnace for diffusion;
d. placing the diffused silicon wafer into an etching machine for etching;
e. soaking the etched silicon wafer in hydrofluoric acid for 20-30min to remove phosphorosilicate glass on the surface of the silicon wafer;
f. placing the soaked silicon wafer into a graphite boat, and placing the graphite boat into a PECVD device for film coating to form a three-layer antireflection film;
g. printing the coated silicon wafer in a screen printing mode; the printing process in the step g comprises the following steps: preparing back silver paste, back aluminum paste and front silver paste by using preparation equipment; printing 30-50mg of back silver paste on the silicon wafer by using a back electrode screen printing plate, and drying at the temperature of 220-250 ℃; 1300-1600mg of back aluminum paste is screen-printed by a back electric field screen printing plate and dried at the temperature of 280-320 ℃; printing 110-130mg of positive silver paste by using a positive electrode screen printing method;
h. placing the printed silicon wafer into a sintering furnace for sintering to obtain a battery piece;
i. stacking 200 and 400 battery pieces in the same direction in a silicon wafer basket, and putting the silicon wafer basket in a passivation treatment device for passivation;
j. cutting the passivated cell slice by a laser slicer to divide the cell slice into two, thus obtaining a finished product of a semi-polycrystalline solar cell;
the preparation equipment comprises a workbench, a preparation box is fixed on the workbench, a feed inlet is formed in the upper portion of the preparation box, a first electromagnetic valve is arranged at the feed inlet, a discharge outlet is formed in the lower portion of the preparation box, a second electromagnetic valve is arranged at the discharge outlet, an upright post is fixed on the workbench, a lifting seat is arranged on the upright post and is positioned right above the preparation box, the lifting seat is connected with a driving structure capable of enabling the lifting seat to move up and down, the lifting seat is connected with the upper end of a connecting rod, the lower end of the connecting rod extends into the preparation box and is connected with a mounting plate, a stirring mechanism is arranged on the mounting plate and comprises a main stirring shaft, a first auxiliary stirring shaft, a second auxiliary stirring shaft, a driving motor, a driving wheel, a support, a guide strip, a guide block and an auxiliary strip, the driving motor is fixed on the mounting plate, A first auxiliary stirring shaft and a second auxiliary stirring shaft are respectively vertically arranged on the mounting plate, the first auxiliary stirring shaft and the second auxiliary stirring shaft are symmetrically arranged on two sides of the main stirring shaft, a main gear is fixed at the upper end of the main stirring shaft and is meshed with a driving wheel, a spiral forward blade is fixed at the lower end of the main stirring shaft, a first auxiliary gear is fixed at the upper end of the first auxiliary stirring shaft and is meshed with the main gear, a first spiral reverse blade is fixed at the lower end of the first auxiliary stirring shaft, a second auxiliary gear is fixed at the upper end of the second auxiliary stirring shaft and is meshed with the main gear, a second spiral reverse blade is fixed at the lower end of the second auxiliary stirring shaft, a support is fixed on the mounting plate, a guide block is fixed on the support, a guide bar is arranged on the guide block in a sliding manner, the auxiliary bar is horizontally fixed on the guide bar, a first push plate is fixed at one end of the auxiliary bar, the first push plate is, and the second pushing plate is vertically arranged, one side of the auxiliary strip is provided with a first tooth part, the other side of the auxiliary strip is provided with a second tooth part, the first auxiliary stirring shaft is also provided with a first half gear which can be meshed with the first tooth part, and the second auxiliary stirring shaft is also provided with a second half gear which can be meshed with the second tooth part.
2. The method for preparing a half-wafer polycrystalline solar cell according to claim 1, wherein the cleaning process in the step a is as follows: the silicon wafer is firstly put into a sodium hydroxide solution to be soaked for 10-20min, then put into a nitric acid solution to be soaked for 15-25min, and finally put into a hydrofluoric acid solution to be soaked for 5-10 min.
3. The method of claim 1, wherein the three-layer antireflection film of step f has a total thickness of 90 to 110 nm.
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