CN109534285B - 一种基于光子结构种子层的ZnO纳米柱及制备方法 - Google Patents

一种基于光子结构种子层的ZnO纳米柱及制备方法 Download PDF

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CN109534285B
CN109534285B CN201811314233.3A CN201811314233A CN109534285B CN 109534285 B CN109534285 B CN 109534285B CN 201811314233 A CN201811314233 A CN 201811314233A CN 109534285 B CN109534285 B CN 109534285B
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余璇
于晓明
谢声旺
李宁
周英棠
陈立桥
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Abstract

一种基于光子结构种子层的ZnO纳米柱及制备方法,所述的ZnO纳米柱由衬底、种子层、ZnO纳米柱组成,所述的种子层是由PEDOT:PSS和ZnO薄膜周期性交叠构成;所述的制备方法包括以下步骤:a.配制ZnO种子层前驱液;b.配制ZnO纳米柱生长液;c.制备种子层:d.制备ZnO纳米柱:在反应容器中添加上述配制得到的ZnO纳米柱生长液,然后将带有种子层的衬底浸入生长液,密封,经水热反应、干燥后得到ZnO纳米柱;它具有成本低,溶液组分易调控,可重复性强,能够制备得到高质量的ZnO纳米柱,避免纳米柱出现裂纹、翘曲、脱落等问题,提高器件性能并延长器件使用寿命等特点。

Description

一种基于光子结构种子层的ZnO纳米柱及制备方法
技术领域
本发明涉及的是一种基于光子结构种子层的ZnO纳米柱及制备方法,属于光电材料技术领域。
背景技术
ZnO作为一种新型的直接带隙宽禁带化合物半导体材料,室温下禁带宽度为3.37eV,激子束缚能高达60 meV,具有很高的热稳定性和化学稳定性,在光电、压电、热电、铁电等诸多领域都有优异的性能。具有广泛的用途,如气敏传感器、透明导电膜、紫外探测器、太阳电池器件以及纳米发电机等。
高质量ZnO薄膜的生长是实现ZnO基众多光电器件的基础。一维ZnO纳米柱薄膜具有高透过率、直接的电子传输通道,高效的电子传输速率等优点,能够有效提升光生载流子的输运效率。被广泛应用在染料敏化太阳电池、有机聚合物太阳电池以及钙钛矿太阳电池等器件中。然而,通常采用水热法生长ZnO纳米柱,存在着应力难释放的问题,加之较长时间的生长(一般在3~5小时),使得ZnO纳米柱薄膜表面出现裂纹,边缘易翘曲、脱落等现象,导致器件性能和寿命受到影响。
为有效地提高ZnO纳米柱薄膜的质量,充分发挥其在器件中的作用、进而提高器件的性能,迫切需要高质量ZnO纳米柱薄膜的制备方法。PEDOT是一种导电高分子聚合物,通过PSS-掺杂后,形成一种稳定的 PEDOT:PSS 悬浮液,通常被用做聚合物太阳电池的阳极修饰材料,具有良好的空穴迁移率和优秀的成膜性能。通过旋涂或者印刷等方式在玻璃或在塑料等基底上形成透明导电薄膜,加工简单、重复率高、功函数适当,而且耐光耐热,目前在有机太阳电池、发光二极管、场效应晶体管等多个领域有所应用。
我们提出一种采用 PEDOT:PSS和ZnO的多层膜光子结构作为种子层的ZnO纳米柱制备方法。该方法能够有效释放薄膜应力,增强种子层柔韧性,解决ZnO纳米柱薄膜出现裂纹、翘曲、脱落等问题,实现高质量ZnO纳米柱可控生长,提高器件性能并延长器件的使用寿命。
发明内容
本发明的目的在于克服现有技术存在的不足,而提供一种成本低,溶液组分易调控,可重复性强,能够制备得到高质量的ZnO纳米柱,避免纳米柱出现裂纹、翘曲、脱落等问题,提高器件性能并延长器件使用寿命的基于光子结构种子层的ZnO纳米柱及制备方法。
本发明的目的可通过下列技术方案来实现:一种基于光子结构种子层的ZnO纳米柱,由衬底、种子层、ZnO纳米柱组成,所述的种子层是由PEDOT:PSS和ZnO薄膜周期性交叠构成。
一种如上所述基于光子结构种子层的ZnO纳米柱的制备方法,所述的制备方法包括以下步骤:
a. 配制ZnO种子层前驱液:取适量醋酸锌溶解在乙二醇甲醚中,在40~60度热板上采用磁力搅拌子进行加热搅拌,至醋酸锌全部溶解,滴入稳定剂乙醇胺,继续搅拌至澄清,陈化24小时及以上,待用;
b. 配制ZnO纳米柱生长液:称取适量六水合硝酸锌和六亚甲基四胺(HMT),其中二者摩尔比为1:1,然后将六水合硝酸锌和HMT混合于去离子水中形成溶液,室温下搅拌30min,待溶质充分溶解后静置,得到ZnO纳米柱生长液;
c. 制备种子层:
衬底上方第一层(A):将稀释过的PEDOT:PSS旋涂在洗净的衬底上,旋涂后热板上进行热处理;
衬底上方第二层(B):将ZnO种子层前驱液旋涂在(A)膜上方,采用转速1000~4000rpm,旋涂时间为3~20 s,厚度为30~ 70 nm,旋涂后250度热板进行退火处理30 min;
(A)和(B)为一个周期,种子层为{(A) (B)}n, 其中n≥2。
d. 制备ZnO纳米柱:在反应容器中添加上述配制得到的ZnO纳米柱生长液,然后将带有种子层的衬底浸入生长液,密封,经水热反应、干燥后得到ZnO纳米柱。
作为优选:所述衬底为玻璃、PET、ITO、FTO;
所述步骤c中,所述PEDOT:PSS可采用乙醇、异丙醇、去离子水按照体积比1:1稀释;
所述步骤d中,所述水热反应的反应温度为80-90℃,反应时间为1-4h;所述干燥的温度为60~80℃,时间为0.5~1h。
作为优选:所述步骤c中,所述PEDOT:PSS转速3000 ~6000 rpm,旋涂时间为10~60s,热板120~150℃,加热处理5~10 min,厚度约为20~50 nm;ZnO种子层前驱液采用转速1000~3000 rpm,旋涂时间为3~20 s,旋涂后在240~350℃热板进行退火处理10~20min,厚度约为30~70 nm。
与现有技术相比,本发明具有以下几个优点:
1.本发明成本低,溶液组分易调控,可重复性强,适用于大面积商业化生产制造。
2.本发明采用PEDOT:PSS和ZnO的多层膜光子结构作为种子层,制备得到高质量的ZnO纳米柱,避免纳米柱出现裂纹、翘曲、脱落等问题,提高器件性能并延长器件的使用寿命。
具体实施方式
下面将结合具体实施例对本发明作详细的介绍:本发明所述的一种基于光子结构种子层的ZnO纳米柱,由衬底、种子层、ZnO纳米柱组成,所述的种子层是由PEDOT:PSS和ZnO薄膜周期性交叠构成。
一种如上所述基于光子结构种子层的ZnO纳米柱的制备方法,所述的制备方法包括以下步骤:
a. 配制ZnO种子层前驱液:取适量醋酸锌溶解在乙二醇甲醚中,在40~60度热板上采用磁力搅拌子进行加热搅拌,至醋酸锌全部溶解,滴入稳定剂乙醇胺,继续搅拌至澄清,陈化24小时及以上,待用;
b. 配制ZnO纳米柱生长液:称取适量六水合硝酸锌和六亚甲基四胺(HMT),其中二者摩尔比为1:1,然后将六水合硝酸锌和HMT混合于去离子水中形成溶液,室温下搅拌30min,待溶质充分溶解后静置,得到ZnO纳米柱生长液;
c. 制备种子层:
衬底上方第一层(A):将稀释过的PEDOT:PSS旋涂在洗净的衬底上,旋涂后热板上进行热处理;
衬底上方第二层(B):将ZnO种子层前驱液旋涂在(A)膜上方,采用转速1000~4000rpm,旋涂时间为3~20 s,厚度为30~ 70 nm,旋涂后250度热板进行退火处理30 min;
(A)和(B)为一个周期,种子层为{(A) (B)}n, 其中n≥2。
d. 制备ZnO纳米柱:在反应容器中添加上述配制得到的ZnO纳米柱生长液,然后将带有种子层的衬底浸入生长液,密封,经水热反应、干燥后得到ZnO纳米柱。
本发明所述衬底为玻璃、PET、ITO、FTO;
所述步骤c中,所述PEDOT:PSS可采用乙醇、异丙醇、去离子水按照体积比1:1稀释;
所述步骤d中,所述水热反应的反应温度为80-90℃,反应时间为1-4h;所述干燥的温度为60~80℃,时间为0.5~1h。
作为优选的实施例:本发明所述步骤c中,所述PEDOT:PSS转速3000 ~6000 rpm,旋涂时间为10~60 s,热板120~150℃,加热处理5~10 min,厚度约为20~50 nm;ZnO种子层前驱液采用转速1000~3000 rpm,旋涂时间为3~20 s,旋涂后在240~350℃热板进行退火处理10~20min,厚度约为30~70 nm。
本发明所述的PEDOT:PSS/ZnO/PEDOT:PSS/ZnO作为ZnO纳米柱的种子层优化了种子层与基底之间附着力,增强种子层柔韧性,有利于纳米柱的生长及应力释放。
鉴于本发明方案实施例众多,各实施例实验数据庞大众多,不适合于此处逐一列举说明,但是各实施例所需要验证的内容和得到的最终结论均接近。故而此处不对各个实施例的验证内容进行逐一说明。
本文中所描述的具体实施例仅仅是对本发明精神作举例说明。本发明所属技术领域的技术人员可以对所描述的具体实施例做各种修改或补充或采用类似的方式替代,但并不会偏离本发明的精神或者超越所附权利要求书所定义的范围。

Claims (3)

1.一种基于光子结构种子层的ZnO纳米柱的制备方法,其特征在于:所述的制备方法包括以下步骤:
a. 配制ZnO种子层前驱液:取适量醋酸锌溶解在乙二醇甲醚中,在40~60度热板上采用磁力搅拌子进行加热搅拌,至醋酸锌全部溶解,滴入稳定剂乙醇胺,继续搅拌至澄清,陈化24小时及以上,待用;
b. 配制ZnO纳米柱生长液:称取适量六水合硝酸锌和六亚甲基四胺(HMT),其中二者摩尔比为1:1,然后将六水合硝酸锌和HMT混合于去离子水中形成溶液,室温下搅拌30 min,待溶质充分溶解后静置,得到ZnO纳米柱生长液;
c. 制备种子层,所述的种子层是由PEDOT:PSS和ZnO薄膜周期性交叠构成:
衬底上方第一层(A):将稀释过的PEDOT:PSS旋涂在洗净的衬底上,旋涂后热板上进行热处理;
衬底上方第二层(B):将ZnO种子层前驱液旋涂在(A)膜上方,采用转速1000~4000 rpm,旋涂时间为3~20 s,厚度为30~ 70 nm,旋涂后在240~350℃热板进行退火处理10~20min,厚度为30~70 nm;
(A)和(B)为一个周期,种子层为{(A) (B)}n, 其中n≥2;
d. 制备ZnO纳米柱:在反应容器中添加上述配制得到的ZnO纳米柱生长液,然后将带有种子层的衬底浸入生长液,密封,经水热反应、干燥后得到ZnO纳米柱。
2.根据权利要求1所述的基于光子结构种子层的ZnO纳米柱的制备方法,其特征在于:所述衬底为玻璃、PET、ITO、FTO;
所述步骤d中,所述水热反应的反应温度为80-90℃,反应时间为1-4h;所述干燥的温度为60~80℃,时间为0.5~1h。
3.根据权利要求1所述的基于光子结构种子层的ZnO纳米柱的制备方法,其特征在于:
所述步骤c中,所述PEDOT:PSS转速3000 ~6000 rpm,旋涂时间为10~60 s,热板120~150℃,加热处理5~10 min,厚度为20~50 nm;ZnO种子层前驱液采用转速1000~3000 rpm,旋涂时间为3~20 s。
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