CN109530378A - The cleaning device of photoresist small-size glass container - Google Patents
The cleaning device of photoresist small-size glass container Download PDFInfo
- Publication number
- CN109530378A CN109530378A CN201910010050.0A CN201910010050A CN109530378A CN 109530378 A CN109530378 A CN 109530378A CN 201910010050 A CN201910010050 A CN 201910010050A CN 109530378 A CN109530378 A CN 109530378A
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- CN
- China
- Prior art keywords
- small
- glass container
- size glass
- plate
- layers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 61
- 239000011521 glass Substances 0.000 title claims abstract description 57
- 229920002120 photoresistant polymer Polymers 0.000 title claims abstract description 25
- 238000002955 isolation Methods 0.000 claims abstract description 40
- 238000003825 pressing Methods 0.000 claims abstract description 39
- 230000000694 effects Effects 0.000 abstract description 4
- 238000000034 method Methods 0.000 description 7
- 239000012535 impurity Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 4
- 238000004506 ultrasonic cleaning Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000013618 particulate matter Substances 0.000 description 3
- 238000012827 research and development Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 239000003292 glue Substances 0.000 description 2
- 229920001903 high density polyethylene Polymers 0.000 description 2
- 239000004700 high-density polyethylene Substances 0.000 description 2
- 238000001259 photo etching Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 239000004411 aluminium Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000003708 ampul Substances 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000002000 scavenging effect Effects 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
Landscapes
- Cleaning In General (AREA)
Abstract
The invention discloses a kind of photoresist cleaning devices of small-size glass container, including the outline border slot with 4 side plates and the rectangular shape of 1 bottom plate, it is characterized by: being fixedly connected with multiple one layer of isolation board on the bottom plate of outline border slot, between each adjacent one layer of isolation board and outermost one layer constitutes one layer of small-size glass container accommodating chamber between isolation board and side plate, corresponds to each one layer of small-size glass container accommodating chamber on bottom plate and is respectively equipped at least one through-hole；Equipped with a supporting plate, multiple two layers of isolation boards are fixedly connected on supporting plate, between each adjacent two layers of isolation board and outermost two layers constitute two layers of small-size glass container accommodating chamber between isolation board and side plate, correspond to each two layers of small-size glass container accommodating chamber on supporting plate and are respectively equipped at least one through-hole；Equipped with a pressing plate, pressing plate is located above two layers of isolation board, offers multiple through-holes on pressing plate.The rapid batch cleaning of photoresisted glass bottle may be implemented in the present invention, substantially increases cleaning efficiency, ensure that cleaning effect.
Description
Technical field
The present invention relates to a kind of glass container cleaning devices, and in particular to a kind of high-cleanness glass for storage photoresist
The device that glass container is cleaned.
Background technique
In the semiconductor industry, photoresist is critical material used in chip and device fabrication.In general, photoresist
Product requires the indexs such as granularity, moisture and metal impurities in lower range, to guarantee that chip is not in the fabrication process
It can be photo-etched glue contamination, influence circuit performance.As integrated circuit dimensions constantly reduce, people are in ic manufacturing process
Metals content impurity and granularity require also be continuously improved therewith.The semiconductor chip of most significant end requires the raw material such as photoresist
Single metal impurity content control within 1ppb, granularity 0.15 micron or more control within 10/mL.Photoresist
Packing container must also be controlled with highest standard, the otherwise particulate matter and metal impurities in container can be with photoetching
Process is attached on wafer, is made microcircuit by particulate matter open circuit or short circuit, is caused defect；And then influence semiconductor product by the gross
Yield.
Currently, China is greatly developing semiconductor industry, wherein being one of emphasis to the research and development of photoresist.In photoresist
R&D process in, need repeatedly to carry out lithography performance assessment.In photoetching glue formula R&D process, it is formulated enormous amount, but
Each formula only can prepare a small amount of sample and be assessed.Therefore, the dedicated small cleaning glass container demand of photoresist is huge,
For cost consideration, the cleaning of relevant glass container also becomes ever more important.
In the prior art, it when cleaning, needs for ampoule to be placed in rinse bath one by one；Then it is filled in each bottle
Enter cleaning solution, is cleaned respectively again after filling；It also needs further each and every one to empty cleaning solution taking-up drying after cleaning.Using existing
Some cleaning ways, main time consumption is during cleaning solution pours into and pours out each bottle.Meanwhile high-volume is cleaned
The case where small-size glass container, there are cleaning solution residuals, will cause cleaning effect variation, the index mistake of granularity and metal impurities
It is high.For the cleanliness for ensuring container, can only using it is a small amount of it is multiple by the way of cleaned, expend a large amount of manpower, be not able to satisfy
Container demand when Formula Development.
Therefore, exploitation is easy, the cleaning device of high-volume cleaning photoresist container is imperative.
Summary of the invention
Goal of the invention of the invention is to provide a kind of cleaning device of photoresist small-size glass container, to realize to small-sized
The batch of photoresist container cleans, and improves cleaning efficiency and cleaning quality.
To achieve the above object of the invention, the technical solution adopted by the present invention is that: a kind of photoresist small-size glass container
Cleaning device, it is fixed on the bottom plate of the outline border slot including the outline border slot with 4 side plates and the rectangular shape of 1 bottom plate
It is connected with multiple one be vertically arranged layer isolation boards, between each adjacent one layer of isolation board and outermost one layer of isolation board and side
One layer of small-size glass container accommodating chamber is constituted between plate, and each one layer of small-size glass container accommodating chamber difference is corresponded on the bottom plate
Equipped at least one through-hole；Supporting plate in the outline border slot can be lain in equipped with one, the supporting plate is placed on one layer of isolation board
Top, is fixedly connected with multiple two be vertically arranged layer isolation boards on the supporting plate, between each adjacent two layers of isolation board and most
Two layers of outside constitute two layers of small-size glass container accommodating chamber between isolation board and side plate, correspond on the supporting plate each two layers small
Type glass container accommodating chamber is respectively equipped at least one through-hole；Equipped with a pressing plate, the pressing plate is located on two layers of isolation board
It is square, multiple through-holes are offered on pressing plate.
In above-mentioned technical proposal, each small-size glass container accommodating chamber can be put into 1 row's glass container, between isolation board
Distance is determined according to the size of applicable vial, since the small-size glass container of photoresist generallys use 100mL vial,
The distance between isolation board with 100mL vial to be adapted to preferably.Side plate, bottom plate, isolation board, supporting plate and pressing plate should be using height
Clean, with some strength material preparation, for example, by using materials such as PP, PDFE or HDPE, can also using as aluminium,
The stainless steel material of 316L.In use, being first sequentially put into vial to be cleaned between one layer of isolation board, it is put into support on it
Plate, then it is put into second layer vial to be cleaned between two layers of isolation board above supporting plate, place into pressing plate.By above-mentioned apparatus
Entirety is put into a rinse bath, pours into cleaning solution, and during this process, supporting plate limits the vial in first layer, pressing plate pair
Vial limit in the second layer, prevents the bottle body for not yet pouring into cleaning solution from floating；Thus, it is possible to realize the quick filling of cleaning solution
Enter and avoid the random floating and collision of bottle body.After pouring into cleaning solution, it can use ultrasonic cleaning apparatus and cleaned.Cleaning
After, lift entire outline border slot, then the cleaning solution out of through-hole discharge slot pins pressing plate, topples over or overturn outline border slot, arranges
Cleaning solution in all glass containers out, thus, it is possible to quickly and completely exclude the intracorporal cleaning solution of bottle.If you need to further clear
It washes, can repeat the above process, cleaning solution cleaning can be employed many times as needed and cleaned using pure water.After cleaning,
Pressing plate is removed, successively cleaning oven is put into after taking-up vial and is dried for standby.
Further technical solution, the height that the supporting plate and the pressing plate are corresponded on the side plate are respectively fixedly connected with
There are pallet support part and platen support part, the pallet support part and the projection of platen support part in the vertical direction are not overlapped,
The position that the platen support part is corresponded on the supporting plate is equipped with escape groove.It will by setting pallet support part and platen support part
Power on supporting plate and pressing plate is transmitted on side plate, can be acted on isolation board to avoid the power of supporting plate and pressing plate, guarantees isolation board
Stability, extend service using life.
Further technical solution is equipped with pressing plate location structure, and the pressing plate is through pressing plate location structure and the pressing plate branch
The removable fixation of support member.When outline border slot is reversed, pressing plate is positioned, and does not need manually to pin pressing plate.
In above-mentioned technical proposal, one layer of small-size glass container accommodating chamber and two layers of small-size glass container accommodating chamber
Width matched with the outer diameter of small-size glass container to be cleaned.
In above-mentioned technical proposal, handle aperture is offered on a pair of side plate, to facilitate the movement and overturning of outline border slot.
Preferred technical solution, the aperture of each through-hole on the bottom plate, supporting plate and pressing plate are outside small-size glass container
The 15%~25% of diameter, the distance between adjacent through-holes are the 40%~80% of small-size glass external diameter.
Preferred technical solution, the via arrangements form on the bottom plate, supporting plate and pressing plate are identical.
Further technical solution is equipped with outline border, and the outline border is the water-tight appearance being made of 4 blocks of side plates and 1 piece of bottom plate
Outline border slot is accommodated in the inner by device, size.Outline border can be used as the container of cleaning, and cleaning solution is directly poured into outline border, and
Outline border is moved at ultrasonic cleaning apparatus and is cleaned, is convenient to operation.
Due to the above technical solutions, the present invention has the following advantages over the prior art:
1, the present invention is provided with the outline border slot with double-layer structure, limits to photoresisted glass bottle to be cleaned, Ke Yishi
Existing rapid batch cleaning；In conjunction with the effect of isolation board, supporting plate and pressing plate, vial is easily limited, and realizes cleaning solution
Quick filling and discharge, substantially increase cleaning efficiency；
2, apparatus of the present invention can be easily in conjunction with ultrasonic cleaning device, to effectively remove remaining metal impurities in container
And particulate matter, guarantee cleaning effect.
Detailed description of the invention
Fig. 1 is the structure schematic front perspective view of the embodiment of the present invention；
Fig. 2 is the bottom substance schematic diagram in Fig. 1；
Fig. 3 is frame structure schematic diagram.
Wherein: 1, side plate；2, bottom plate；3, one layer of isolation board；4, two layers of isolation board；5, pressing plate；6, supporting plate；7, one layer it is small-sized
Glass container accommodating chamber；8, two layers of small-size glass container accommodating chamber；9, through-hole；10, pallet support part；11, platen support part；
12, handgrip hole.
Specific embodiment
The invention will be further described with reference to the accompanying drawings and embodiments:
Embodiment one: a kind of cleaning device of photoresist small-size glass container, it is shown in Figure 1, by 4 side plates 1 and 1
Bottom plate 2 constitutes the outline border slot of rectangular shape, and plate can use PP, PDFE or HDPE material.Handle can be equipped on side plate,
Or grip hole is formed by aperture, it is lifted with facilitating.
Multiple one be vertically arranged layer isolation boards 3, each adjacent one layer of isolation board 3 are fixedly connected on the bottom plate 2 of outline border slot
Between and outermost one layer of isolation board 3 and side plate 1 between constitute one layer of small-size glass container accommodating chamber 7, such as 2 institute of attached drawing
Show, corresponded on bottom plate 2 each one layer of small-size glass container accommodating chamber be respectively equipped with quantity that 10 through-hole 9(pass through can basis
Need to increase and decrease, but it should guaranteeing at least 1 through-hole in each accommodating chamber), thus constitute first layer.
Such as Fig. 1, side is equipped with a supporting plate 6 that can be lain in the outline border slot on the first layer, is fixedly connected on supporting plate 6
Multiple two be vertically arranged layer isolation boards 4, between each adjacent two layers of isolation board 4 and outermost two layers of isolation board 4 and side plate 1
Between constitute two layers of small-size glass container accommodating chamber 8, corresponding to each two layers of small-size glass container accommodating chamber 8 on the supporting plate 6 divides
Not She You through-hole, in the present embodiment, the through-hole arrangement on supporting plate is identical as bottom plate, thus constitutes the second layer.
Side is equipped with a pressing plate 5 on the second layer, offers multiple through-holes on pressing plate 5.
In the present embodiment, the height that the supporting plate 6 and the pressing plate 5 are corresponded on side plate 1 has been respectively fixedly connected with supporting plate
Supporting element 10 and platen support part 11, the pallet support part 10 and the projection of platen support part 11 in the vertical direction do not weigh
It closes, the position of the platen support part 11 correspond on the supporting plate 6 equipped with escape groove, so that the supporting plate of the second layer can be through
The position of over-voltage plate support passes in and out.
Outline border can be equipped in the present embodiment, referring to shown in attached drawing 3, the outline border is made of 4 blocks of side plates and 1 piece of bottom plate
Water-tight vessel, outline border slot is accommodated in the inner by size；Handgrip hole 12 is offered on a pair of opposite side plate.
When cleaning, first outline border slot is put into outline border, is sequentially put into vial to be cleaned；Then supporting plate and two are successively put into
Layer isolation board, then sequentially it is put into second layer vial to be cleaned；It is subsequently placed into pressing plate, then entire outline border slot is put into outline border；
Cleaning solution is finally poured into outline border, and outline border is moved to and starts to clean at ultrasonic cleaning equipment.
After cleaning, lifts entire outline border slot, drain the cleaning solution in outline border slot, transfer in pond；Then it presses
Firmly pressing plate topples over or overturns outline border slot, further drains the cleaning solution in glass container.If you need to clean in next step, then replacing
After cleaning solution in outline border, outline border slot is put into continues to clean in outline border again；Such as cleaning terminates, then removes pressing plate, will be each
Cleaning oven is put into after vial pure water rinsing to be dried for standby.
The cleaning that photoresisted glass container is carried out using the device of the present embodiment can effectively reduce behaviour when simplifying cleaning
Make step, shortens scavenging period.The present apparatus can disposably clean multiple glass containers, improve cleaning efficiency.
Claims (8)
1. a kind of photoresist cleaning device of small-size glass container, including the rectangular shape with 4 side plates and 1 bottom plate
Outline border slot, it is characterised in that: multiple one be vertically arranged layer isolation boards, each phase are fixedly connected on the bottom plate of the outline border slot
Between adjacent one layer of isolation board and outermost one layer constitutes one layer of small-size glass container accommodating chamber, institute between isolation board and side plate
It states and corresponds to each one layer of small-size glass container accommodating chamber on bottom plate and be respectively equipped at least one through-hole；It can be lain in equipped with one described
Supporting plate in outline border slot, the supporting plate are placed on above one layer of isolation board, are fixedly connected on the supporting plate multiple vertical
Two layers of isolation board of arrangement, between each adjacent two layers of isolation board and outermost two layers constitute two layers between isolation board and side plate
Small-size glass container accommodating chamber, each two layers of small-size glass container accommodating chamber is corresponded on the supporting plate, and to be respectively equipped at least one logical
Hole；Equipped with a pressing plate, the pressing plate is located above two layers of isolation board, offers multiple through-holes on pressing plate.
2. the photoresist according to claim 1 cleaning device of small-size glass container, it is characterised in that: in the side plate
The height of the upper correspondence supporting plate and the pressing plate has been respectively fixedly connected with pallet support part and platen support part, the supporting plate branch
The projection of support member and platen support part in the vertical direction is not overlapped, and the position that the platen support part is corresponded on the supporting plate is set
There is escape groove.
3. the photoresist according to claim 2 cleaning device of small-size glass container, it is characterised in that: fixed equipped with pressing plate
Bit architecture, the pressing plate is through pressing plate location structure and the removable fixation of platen support part.
4. the photoresist according to claim 1 cleaning device of small-size glass container, it is characterised in that: described one layer small
The width of type glass container accommodating chamber and two layers of small-size glass container accommodating chamber is outer with small-size glass container to be cleaned
Diameter matches.
5. the photoresist according to claim 1 cleaning device of small-size glass container, it is characterised in that: described in a pair
Handle aperture is offered on side plate.
6. the photoresist according to claim 1 cleaning device of small-size glass container, it is characterised in that: the bottom plate,
The aperture of each through-hole on supporting plate and pressing plate is the 15%~25% of small-size glass external diameter, and the distance between adjacent through-holes is small
The 40%~80% of type glass container outer diameter.
7. the photoresist according to claim 1 cleaning device of small-size glass container, it is characterised in that: the bottom plate,
Supporting plate is identical with the via arrangements form on pressing plate.
8. the photoresist according to claim 1 cleaning device of small-size glass container, it is characterised in that: it is equipped with outline border,
The outline border is the water-tight vessel being made of 4 blocks of side plates and 1 piece of bottom plate, and outline border slot is accommodated in the inner by size.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910010050.0A CN109530378A (en) | 2019-01-06 | 2019-01-06 | The cleaning device of photoresist small-size glass container |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910010050.0A CN109530378A (en) | 2019-01-06 | 2019-01-06 | The cleaning device of photoresist small-size glass container |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN109530378A true CN109530378A (en) | 2019-03-29 |
Family
ID=65834382
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910010050.0A Pending CN109530378A (en) | 2019-01-06 | 2019-01-06 | The cleaning device of photoresist small-size glass container |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN109530378A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110883007A (en) * | 2019-12-02 | 2020-03-17 | 东莞市嘉逸光电有限公司 | Ultra-thin glass processing device |
Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050023246A1 (en) * | 2003-08-01 | 2005-02-03 | Mcentee John F. | Methods and devices for modifying a substrate surface |
| CN104525544A (en) * | 2014-10-10 | 2015-04-22 | 胡博文 | Support pipe for ultrasonically cleaning glass container and ultrasonic cleaning machine |
| CN204523662U (en) * | 2015-03-02 | 2015-08-05 | 广东中烟工业有限责任公司 | A kind of batch ultrasonic cleaning system of open-top receptacle |
| CN105214995A (en) * | 2015-09-25 | 2016-01-06 | 无锡市博阳超声电器有限公司 | A kind of glass ultrasonic cleaner |
| CN206104456U (en) * | 2016-09-21 | 2017-04-19 | 深圳市阳光晶玻科技有限公司 | Liquid crystal display glass ultrasonic cleaner |
| CN206661811U (en) * | 2017-03-21 | 2017-11-24 | 量镀（上海）新材料科技股份有限公司 | A kind of small-sized plated item clearing and drying device |
| CN208146612U (en) * | 2018-02-09 | 2018-11-27 | 郑州伊美诺生物技术有限公司 | The cleaning of glass reagent bottle drains device |
| CN208230471U (en) * | 2018-04-08 | 2018-12-14 | 回音必集团江西东亚制药有限公司 | A kind of vial sterilizing rack easy to clean |
| CN109065472A (en) * | 2018-07-06 | 2018-12-21 | 天长市百盛半导体科技有限公司 | Auxiliary device is used in a kind of cleaning of solar battery crystalline silicon |
| CN209502506U (en) * | 2019-01-06 | 2019-10-18 | 江苏南大光电材料股份有限公司 | The cleaning device of photoresist small-size glass container |
-
2019
- 2019-01-06 CN CN201910010050.0A patent/CN109530378A/en active Pending
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050023246A1 (en) * | 2003-08-01 | 2005-02-03 | Mcentee John F. | Methods and devices for modifying a substrate surface |
| CN104525544A (en) * | 2014-10-10 | 2015-04-22 | 胡博文 | Support pipe for ultrasonically cleaning glass container and ultrasonic cleaning machine |
| CN204523662U (en) * | 2015-03-02 | 2015-08-05 | 广东中烟工业有限责任公司 | A kind of batch ultrasonic cleaning system of open-top receptacle |
| CN105214995A (en) * | 2015-09-25 | 2016-01-06 | 无锡市博阳超声电器有限公司 | A kind of glass ultrasonic cleaner |
| CN206104456U (en) * | 2016-09-21 | 2017-04-19 | 深圳市阳光晶玻科技有限公司 | Liquid crystal display glass ultrasonic cleaner |
| CN206661811U (en) * | 2017-03-21 | 2017-11-24 | 量镀（上海）新材料科技股份有限公司 | A kind of small-sized plated item clearing and drying device |
| CN208146612U (en) * | 2018-02-09 | 2018-11-27 | 郑州伊美诺生物技术有限公司 | The cleaning of glass reagent bottle drains device |
| CN208230471U (en) * | 2018-04-08 | 2018-12-14 | 回音必集团江西东亚制药有限公司 | A kind of vial sterilizing rack easy to clean |
| CN109065472A (en) * | 2018-07-06 | 2018-12-21 | 天长市百盛半导体科技有限公司 | Auxiliary device is used in a kind of cleaning of solar battery crystalline silicon |
| CN209502506U (en) * | 2019-01-06 | 2019-10-18 | 江苏南大光电材料股份有限公司 | The cleaning device of photoresist small-size glass container |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110883007A (en) * | 2019-12-02 | 2020-03-17 | 东莞市嘉逸光电有限公司 | Ultra-thin glass processing device |
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