CN109491201A - A kind of mask plate high-precision two-dimensional movement mechanism - Google Patents
A kind of mask plate high-precision two-dimensional movement mechanism Download PDFInfo
- Publication number
- CN109491201A CN109491201A CN201811599524.1A CN201811599524A CN109491201A CN 109491201 A CN109491201 A CN 109491201A CN 201811599524 A CN201811599524 A CN 201811599524A CN 109491201 A CN109491201 A CN 109491201A
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- China
- Prior art keywords
- mask plate
- precision
- movement mechanism
- dimensional
- dimensional movement
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Links
- 230000033001 locomotion Effects 0.000 title claims abstract description 34
- 230000007246 mechanism Effects 0.000 title claims abstract description 32
- 239000000919 ceramic Substances 0.000 claims abstract description 30
- 238000011068 loading method Methods 0.000 claims description 10
- 229910052715 tantalum Inorganic materials 0.000 claims description 7
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 7
- 238000009434 installation Methods 0.000 claims description 4
- 229910052573 porcelain Inorganic materials 0.000 claims description 4
- 238000005452 bending Methods 0.000 claims description 3
- 229910001220 stainless steel Inorganic materials 0.000 claims description 3
- 239000010935 stainless steel Substances 0.000 claims description 3
- 239000010409 thin film Substances 0.000 abstract description 18
- 238000000034 method Methods 0.000 abstract description 8
- 230000008569 process Effects 0.000 abstract description 5
- 239000000523 sample Substances 0.000 description 15
- 239000010408 film Substances 0.000 description 13
- 239000000758 substrate Substances 0.000 description 10
- 238000002360 preparation method Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 238000012360 testing method Methods 0.000 description 5
- 230000008901 benefit Effects 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 238000010884 ion-beam technique Methods 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000011065 in-situ storage Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000011056 performance test Methods 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/80—Etching
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Physical Vapour Deposition (AREA)
- Manipulator (AREA)
Abstract
The invention discloses a kind of mask plate high-precision two-dimensional movement mechanisms, including two-dimensional piezoelectric ceramic motor component, are moved for realizing in X-axis and Z axis both direction；Support plate is set to the bottom end of the Z axis telescopic rod of the two-dimensional piezoelectric ceramic motor component；Mask plate bracket is set to the top of described support plate one end, for placing mask plate；Second tabletting is arranged on the mask plate bracket, for the mask plate to be pressed on the mask plate bracket.The problem of mask plate of the invention overcomes thin-film device growth mask plate kinematic accuracy and mask plate position control with high-precision two-dimensional movement mechanism, and reticle pattern replacement is convenient；Since two-dimensional piezoelectric ceramic motor assembly volume is small, stroke is big, precision is high, mask plate high-precision two-dimensional movement mechanism size can be accomplished into very little；It is not limited by size of foundation base and growth of device size in use process, stroke can continuously adjust.
Description
Technical field
The present invention relates to the preparations and testing field of nano-device and/or organic film device, and in particular to a kind of exposure mask
Version high-precision two-dimensional movement mechanism.
Background technique
The thin-film device of high quality has very good physical property and chemical property, the preparation and survey of high-quality thin film
Scale sign is both needed to carry out in the anhydrous vacuum cavity of anaerobic.Mask plate is that have specific pattern by special process preparation
Template, sample, light or the ion beam of evaporation hollow-out part can penetrate above template in the other side of mask plate
The device of specific pattern is grown in substrate or etches the device of specific pattern.
State Intellectual Property Office discloses a Publication No. CN103792443A, entitled " probe in 2014.05.14
Platform, organic film device preparation and test integrated system and method " patent, which disclose " a kind of probe station has
The integrated system and method for preparation and test of machine thin-film device, wherein keep organic film device preparation facilities and probe station close
Envelope connects and is formed between sample transmission channels to external seal, by be arranged sample transfer device with by sample via
The sample transmission channels are transmitted between the organic film device preparation facilities and the probe station, and sample transmitted
The whole isolation external environment atmosphere of journey influences, so that the generation and test of organic film device are isolated external environment and are located
In closed and vacuum environment, test accuracy is effectively improved."
It therefore, sometimes can be as required in the device of specific position growth specific shape in film sample growth course
Physically or chemically performance test in situ is being carried out, or go out specific pattern using ion beam etching on the film grown
The device of case carries out physically or chemically performance test in situ again, this just need it is a set of can be with the mask plate fitness machine of precise motion
Structure.
Based on the above situation, the invention proposes a kind of mask plate high-precision two-dimensional movement mechanism, can effectively solve with
Upper problem.
Summary of the invention
The purpose of the present invention is to provide a kind of mask plate high-precision two-dimensional movement mechanisms.Mask plate of the invention is high
Precision two-dimensional motion mechanism structure is simple, easy to use, overcomes thin-film device growth mask plate kinematic accuracy and mask plate
The problem of position control；It, can be by mask plate height since two-dimensional piezoelectric ceramic motor assembly volume is small, stroke is big, precision is high
Precision two-dimensional motion mechanism size accomplishes very little；It is not limited by size of foundation base and growth of device size in use process, stroke
It can continuously adjust, due to the use of two-dimensional piezoelectric ceramic motor component, ultrahigh vacuum, low temperature, high temperature work can be well adapted for
Make environment.
The present invention is achieved through the following technical solutions:
A kind of mask plate high-precision two-dimensional movement mechanism, including
Two-dimensional piezoelectric ceramic motor component is moved for realizing in X-axis and Z axis both direction；
Support plate is set to the bottom end of the Z axis telescopic rod of the two-dimensional piezoelectric ceramic motor component；
Mask plate bracket is set to the top of described support plate one end, for placing mask plate；
Second tabletting is arranged on the mask plate bracket, for the mask plate to be pressed on the mask plate bracket
On.
Mask plate of the invention is simple with high-precision two-dimensional movement mechanism structure, easy to use, and it is raw to overcome thin-film device
The problem of long mask plate kinematic accuracy and mask plate position control；Since two-dimensional piezoelectric ceramic motor assembly volume is small, stroke
Greatly, precision is high, mask plate high-precision two-dimensional movement mechanism size can be accomplished very little；Not by size of foundation base in use process
Limitation, stroke with growth of device size can continuously adjust, can be well due to the use of two-dimensional piezoelectric ceramic motor component
Adapt to ultrahigh vacuum, low temperature, high-temperature work environment.
Mask plate of the invention is conveniently replaceable mask plate with high-precision two-dimensional movement mechanism, and the pattern of such mask plate can be with
Change as needed, by the multiple patterns on mask plate, mobile mask plate carries out the company of thin-film device in substrate different location
Continuous growth.In actual use, by cooperating long focusing microscope in X-axis and Z-direction, mask plate can be observed in real time
Positional relationship between the distance between substrate and reticle pattern and thin-film device, it is convenient further to adjust.
Preferably, further include the first tabletting, be set to the top of described support plate one end, and be located at prolonging for the support plate
The two sides for stretching direction, for the mask plate bracket to be fixed on the support plate.
The mask plate bracket described in this way is pressed on above the support plate by first tabletting, can be covered by replacement
Film version bracket replaces different types of mask plate, facilitates and is plugged.
It is furthermore preferred that first tabletting include tabular mounting portion and obliquely extend and flexible bending part.
The mask plate bracket can be pressed on strongerly in the support plate in this way.
Preferably, the two-dimensional piezoelectric ceramic motor component includes X-axis guide rail, the branch for being set to the X-axis guide rail both ends
Support leg, two-dimensional piezoelectric ceramic motor shell and the telescopic Z axis stretched out out of described two-dimensional piezoelectric ceramic motor shell
Telescopic rod.
The component that the two-dimensional piezoelectric ceramic motor component described in this way can preferably drive the support plate and be disposed thereon
It is moved in X-axis and Z axis both direction.
Preferably, one end that the support plate is provided with mask plate bracket has U-shaped breach and U-shaped concave station, when installation, institute
It states mask plate bracket to be embedded in the U-shaped concave station, and is compressed by the first tabletting.
It is fitted and fixed in this way convenient for the support plate with the mask plate bracket, and sample (thin-film device) original will not be blocked
Expect vapor movement.
Preferably, the mask plate rack upper surface is provided with loading boss；It is logical that first is provided in the middle part of the loading boss
Hole.
Facilitate sample (thin-film device) feedstock vapor in this way and reaches in substrate from the first through hole through the mask plate
Carry out thin-film device growth.
Preferably, second tabletting is L-shaped；Second tabletting is fixedly connected with loading boss one end end.
Preferably mask plate can be secured firmly on the loading boss in this way.
Preferably, the mask plate bracket in their extension direction, far from the two-dimensional piezoelectric ceramic motor component one
End is provided with grip part；The second through-hole is provided on the grip part.
It is more convenient in this way when the mask plate bracket plugs, it effectively prevent slipping.
Preferably, the two-dimensional piezoelectric ceramic motor component periphery is provided with shielding case.
It can effectively prevent polluting two-dimensional piezoelectric ceramic motor in sample (thin-film device) growth course in this way, guarantee the present invention
Mask plate with high-precision two-dimensional movement mechanism have longer service life.
Preferably, the mask plate bracket, the first tabletting and the second tabletting are made of tantalum；The support plate by stainless steel or
Tantalum is made.
Mask plate of the invention in this way can not only be used with high-precision two-dimensional movement mechanism under ultra-high vacuum environment, also
It can use, can also use at high temperature at low ambient temperatures, so as to growing film device under high temperature.
Compared with prior art, the present invention have the following advantages that and the utility model has the advantages that
Mask plate of the invention is simple with high-precision two-dimensional movement mechanism structure, easy to use, and it is raw to overcome thin-film device
The problem of long mask plate kinematic accuracy and mask plate position control；Since two-dimensional piezoelectric ceramic motor assembly volume is small, stroke
Greatly, precision is high, mask plate high-precision two-dimensional movement mechanism size can be accomplished very little；Not by size of foundation base in use process
Limitation, stroke with growth of device size can continuously adjust；The distance between mask plate and substrate and reticle pattern exist
Position in substrate can be observed in real time by long focusing microscope, and be adjusted by two-dimensional piezoelectric ceramic motor component；It covers
Film version can not only be used with high-precision two-dimensional movement mechanism under ultra-high vacuum environment, can also be made under ultra-low temperature surroundings
With can also be used under superhigh temperature, so as to growing film device under high temperature.
It is more closer better at a distance from substrate that mask plate is generally required in thin-film device growth course, between mask plate and substrate
Distance it is continuously adjustable.
Detailed description of the invention
Fig. 1 is decomposition texture schematic diagram of the invention；
Fig. 2 is the structural schematic diagram of two-dimensional piezoelectric ceramic motor component of the present invention；
Fig. 3 is the structural schematic diagram of mask plate bracket of the present invention；
Fig. 4 is the structural schematic diagram of the first tabletting of the present invention；
Fig. 5 is the structural schematic diagram of mask plate of the present invention；
Fig. 6 is installation condition reference configuration schematic diagram of the present invention.
Specific embodiment
It is right combined with specific embodiments below in order to make those skilled in the art more fully understand technical solution of the present invention
The preferred embodiments of the invention are described, but it is to be understood that these descriptions are only to further illustrate spy of the invention
Advantage of seeking peace rather than to the invention patent require limitation.Based on the embodiments of the present invention, those of ordinary skill in the art
Every other embodiment obtained without making creative work, shall fall within the protection scope of the present invention.
The material of mask plate of the present invention includes but is not limited to silicon, sapphire, silicon nitride, aluminium oxide, tantalum.
Mask plate of the invention is used not only in thin-film device growth with high-precision two-dimensional movement mechanism, can also be used in film
Ion beam etching after growth is at device.
Embodiment 1:
As shown in Figures 1 to 6, a kind of mask plate high-precision two-dimensional movement mechanism, it is characterised in that: make pottery including two-dimensional piezoelectric
Porcelain electric machine assembly 1 is moved for realizing in X-axis and Z axis both direction；
Support plate 2 is set to the bottom end of the Z axis telescopic rod 11 of the two-dimensional piezoelectric ceramic motor component 1；
Mask plate bracket 3 is set to the top of described 2 one end of support plate, for placing mask plate 5；
Second tabletting 6 is arranged on the mask plate bracket 3, for the mask plate 5 to be pressed on the mask plate branch
On frame 3.
Further, in another embodiment, further include the first tabletting 4, be set to the upper of described 2 one end of support plate
Side, and it is located at the two sides of the extending direction of the support plate 2, for the mask plate bracket 3 to be fixed on the support plate 2
On.
Further, in another embodiment, first tabletting 4 includes tabular mounting portion 41 and extends obliquely
And flexible bending part 42.
Further, in another embodiment, the two-dimensional piezoelectric ceramic motor component 1 includes X-axis guide rail 12, setting
In the supporting leg 13 at 12 both ends of X-axis guide rail, two-dimensional piezoelectric ceramic motor shell 14 and from the two-dimensional piezoelectric ceramic motor
The telescopic Z axis telescopic rod 11 stretched out in shell 14.
Further, in another embodiment, one end that the support plate 2 is provided with mask plate bracket 3 is lacked with U-shaped
Mouthfuls 21 and U-shaped concave station 22, when installation, the mask plate bracket 3 is embedded in the U-shaped concave station 22 and is compressed by the first tabletting 4.
Further, in another embodiment, 3 upper surface of mask plate bracket is provided with loading boss 31；It is described
First through hole 311 is provided in the middle part of loading boss 31.
Further, in another embodiment, second tabletting 6 is L-shaped；Second tabletting 6 and the loading
31 one end end of boss is fixedly connected.
Further, in another embodiment, the mask plate bracket 3 in their extension direction, far from the two dimension
One end of piezoelectric ceramic motor component 1 is provided with grip part 32；The second through-hole 321 is provided on the grip part 32.
Further, in another embodiment, 1 periphery of two-dimensional piezoelectric ceramic motor component is provided with shielding case.
Further, in another embodiment, the mask plate bracket 3, the first tabletting 4 and the second tabletting 6 are by tantalum system
At；The support plate 2 is made of stainless steel or tantalum.
The working principle of one embodiment of the invention is as follows:
Mask plate of the invention is worked in thin film growth chamber with high-precision two-dimensional movement mechanism.Sample (thin-film device) is former
Material steam sequentially passes through U-shaped breach 21, first through hole 311, the pattern hole on mask plate 5 upwards, reaches substrate 7, carries out film
Device growth；Mask plate 5, which is controlled, by two-dimensional piezoelectric ceramic motor component 1 is carrying out two maintenance and operations in X-axis and Z axis both direction
It is dynamic, in actual use, by cooperating long focusing microscope in X-axis and Z-direction, can observe in real time mask plate 5 with
Positional relationship between the distance between substrate 7 and reticle pattern and thin-film device, it is convenient further to adjust.
Unless otherwise specified, the present invention in, if having term " length ", " width ", "upper", "lower", "front", "rear", " left side ",
" right side ", "vertical", "horizontal", "top", "bottom" "inner", "outside", " clockwise ", " counterclockwise ", " axial direction ", " radial direction ", " circumferential direction "
The orientation or positional relationship of equal instructions is to be based on the orientation or positional relationship shown in the drawings, be merely for convenience of the description present invention and
Simplify description, rather than the device or element of indication or suggestion meaning must have a particular orientation, with specific orientation construction
And operation, therefore the term that orientation or positional relationship is described in the present invention is only for illustration, should not be understood as special to this
The limitation of benefit for the ordinary skill in the art can be in conjunction with attached drawing, and understands above-mentioned term as the case may be
Concrete meaning.
Unless otherwise clearly defined and limited, in the present invention, if there is term " setting ", " connected " and " connection " that should do extensively
Reason and good sense solution may be a detachable connection for example, it may be being fixedly connected, or be integrally connected；It can be directly connected,
The connection inside two elements can be can be indirectly connected through an intermediary.For those of ordinary skill in the art and
Speech, can understand the concrete meaning of above-mentioned term in the present invention with concrete condition.
The above is only presently preferred embodiments of the present invention, not does limitation in any form to the present invention, it is all according to
According to technical spirit any simple modification to the above embodiments of the invention, equivalent variations, protection of the invention is each fallen within
Within the scope of.
Claims (10)
1. a kind of mask plate high-precision two-dimensional movement mechanism, it is characterised in that: including
Two-dimensional piezoelectric ceramic motor component (1) is moved for realizing in X-axis and Z axis both direction；
Support plate (2) is set to the bottom end of the Z axis telescopic rod (11) of the two-dimensional piezoelectric ceramic motor component (1)；
Mask plate bracket (3) is set to the top of the support plate (2) one end, for placing mask plate (5)；
Second tabletting (6) is arranged on the mask plate bracket (3), for the mask plate (5) to be pressed on the mask plate
On bracket (3).
2. mask plate according to claim 1 high-precision two-dimensional movement mechanism, it is characterised in that: further include the first tabletting
(4), it is set to the top of the support plate (2) one end, and is located at the two sides of the extending direction of the support plate (2), being used for will
The mask plate bracket (3) is fixed on the support plate (2).
3. mask plate according to claim 2 high-precision two-dimensional movement mechanism, it is characterised in that: first tabletting
(4) include tabular mounting portion (41) and obliquely extend and flexible bending part (42).
4. mask plate according to claim 1 high-precision two-dimensional movement mechanism, it is characterised in that: the two-dimensional piezoelectric pottery
Porcelain electric machine assembly (1) includes X-axis guide rail (12), the supporting leg (13) for being set to the X-axis guide rail (12) both ends, two-dimensional piezoelectric pottery
Porcelain electric machine casing (14) and the telescopic Z axis telescopic rod stretched out out of described two-dimensional piezoelectric ceramic motor shell (14)
(11)。
5. mask plate according to claim 1 high-precision two-dimensional movement mechanism, it is characterised in that: the support plate (2)
The one end for being provided with mask plate bracket (3) has U-shaped breach (21) and U-shaped concave station (22), when installation, the mask plate bracket
(3) it is embedded in the U-shaped concave station (22) and is compressed by the first tabletting (4).
6. mask plate according to claim 1 high-precision two-dimensional movement mechanism, it is characterised in that: the mask plate bracket
(3) upper surface is provided with loading boss (31)；First through hole (311) are provided in the middle part of the loading boss (31).
7. mask plate according to claim 1 high-precision two-dimensional movement mechanism, it is characterised in that: second tabletting
(6) L-shaped；Second tabletting (6) is fixedly connected with loading boss (31) one end end.
8. mask plate according to claim 6 high-precision two-dimensional movement mechanism, it is characterised in that: the mask plate bracket
(3) in their extension direction, one end far from the two-dimensional piezoelectric ceramic motor component (1) is provided with grip part (32)；It is described
The second through-hole (321) are provided on grip part (32).
9. mask plate according to claim 1 high-precision two-dimensional movement mechanism, it is characterised in that: the two-dimensional piezoelectric pottery
Porcelain electric machine assembly (1) periphery is provided with shielding case.
10. mask plate according to claim 2 high-precision two-dimensional movement mechanism, it is characterised in that: the mask plate branch
Frame (3), the first tabletting (4) and the second tabletting (6) are made of tantalum；The support plate (2) is made of stainless steel or tantalum.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811599524.1A CN109491201B (en) | 2018-12-26 | 2018-12-26 | High-precision two-dimensional movement mechanism for mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811599524.1A CN109491201B (en) | 2018-12-26 | 2018-12-26 | High-precision two-dimensional movement mechanism for mask |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN109491201A true CN109491201A (en) | 2019-03-19 |
| CN109491201B CN109491201B (en) | 2024-01-19 |
Family
ID=65712227
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201811599524.1A Active CN109491201B (en) | 2018-12-26 | 2018-12-26 | High-precision two-dimensional movement mechanism for mask |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN109491201B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN110487609A (en) * | 2019-09-06 | 2019-11-22 | 仪晟科学仪器(嘉兴)有限公司 | Ultrahigh vacuum in-situ film etches electrode growth system |
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| CN209215860U (en) * | 2018-12-26 | 2019-08-06 | 仪晟科学仪器(嘉兴)有限公司 | A kind of mask plate high-precision two-dimensional movement mechanism |
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| US20040189145A1 (en) * | 1999-01-28 | 2004-09-30 | Baruch Pletner | Method and device for vibration control |
| US20060209288A1 (en) * | 2005-03-18 | 2006-09-21 | Lg. Philips Lcd Co., Ltd. | Proximity type exposure apparatus |
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Also Published As
| Publication number | Publication date |
|---|---|
| CN109491201B (en) | 2024-01-19 |
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