CN109491199A - Mask plate and mask device - Google Patents
Mask plate and mask device Download PDFInfo
- Publication number
- CN109491199A CN109491199A CN201910003804.XA CN201910003804A CN109491199A CN 109491199 A CN109491199 A CN 109491199A CN 201910003804 A CN201910003804 A CN 201910003804A CN 109491199 A CN109491199 A CN 109491199A
- Authority
- CN
- China
- Prior art keywords
- mask
- light
- grating structure
- reticle
- exposure area
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 claims abstract description 14
- 239000012528 membrane Substances 0.000 claims abstract description 13
- 229910052751 metal Inorganic materials 0.000 claims description 14
- 239000002184 metal Substances 0.000 claims description 14
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 8
- 229910052804 chromium Inorganic materials 0.000 claims description 7
- 239000011651 chromium Substances 0.000 claims description 7
- 230000000903 blocking effect Effects 0.000 claims description 3
- 125000006850 spacer group Chemical group 0.000 abstract description 8
- 239000000758 substrate Substances 0.000 abstract description 8
- 238000002360 preparation method Methods 0.000 abstract description 2
- 238000010276 construction Methods 0.000 abstract 1
- 230000003287 optical effect Effects 0.000 abstract 1
- 230000035515 penetration Effects 0.000 abstract 1
- 238000002834 transmittance Methods 0.000 description 23
- 238000000034 method Methods 0.000 description 4
- 239000010408 film Substances 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000003760 hair shine Effects 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- -1 specifically Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
- G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
The present invention provides a kind of mask plate and mask device, belongs to exposure sources technical field.Mask plate of the invention, including ontology, the ontology have non-exposed area, half-exposure area and complete exposure region；The partial region in the half-exposure area and/or the partial region of the complete exposure region are provided with optical grating construction.There are more kinds of light penetrations for the more existing semi-permeable membrane mask plate of mask plate provided in the present invention, therefore, mask plate in the present invention is applied in the preparation process of the spacer material in display panel, the spacer material of a variety of height can be formed, so as to improve since the segment difference in array substrate is different, caused by display panel periphery light leakage the problem of.
Description
Technical Field
The invention belongs to the technical field of exposure equipment, and particularly relates to a mask plate and a mask device.
Background
The semi-permeable membrane mask is mainly applied to an exposure process, and three different transmittances, namely 100%, the semi-permeable membrane transmittance and 0%, are realized on the same mask by utilizing the semi-permeable membrane, so that three states of the photoresist are realized. For a Thin Film Transistor (TFT) process segment using a positive photoresist and an etching process, one exposure can be reduced, thereby improving productivity. For the spacer (PS) process segment of the negative photoresist, the preparation of spacers with different heights can be realized.
Along with the increase of the size of the display panel, the size of the product frame is increased, which leads to the deterioration of the peripheral light leakage sensitivity of the display panel. To improve the peripheral light leakage problem, more peripheral supporting force needs to be added in a limited space. The height of the array substrate film is limited, the section difference of different positions between the color film substrate and the array substrate is different, and the mask in the prior art can only realize spacers with two different heights, so that the support of the array substrate and the color film substrate in a large-size display panel cannot be met. Therefore, it is an urgent technical problem to provide a mask capable of preparing spacers with different heights.
Disclosure of Invention
The present invention is directed to at least one of the problems of the prior art, and provides a mask and a mask device capable of providing multiple transmittances.
The technical scheme adopted for solving the technical problem is that the mask comprises a body, wherein the body is provided with a non-exposure area, a semi-exposure area and a full-exposure area; and a grating structure is arranged in a partial area of the half exposure area and/or a partial area of the full exposure area.
Preferably, the semi-exposed region is provided with a semi-permeable membrane; the grating structure is disposed on the semi-permeable membrane.
Preferably, the grating structure includes a plurality of light shielding patterns arranged in an array.
Preferably, the material of the light blocking pattern includes a metal.
Preferably, the metal includes: and (3) chromium.
Preferably, the mask plate further comprises a mask frame, and the body is fixed on the mask frame; wherein,
the grating structure is positioned in the full exposure area and fixed on the mask frame.
Preferably, the grating structure comprises a grating body having a plurality of openings arranged in an array thereon.
Preferably, the material of the grating body comprises a metal.
Preferably, the metal includes: and (3) chromium.
The technical scheme adopted for solving the technical problem of the invention is a mask device which comprises the mask plate.
Drawings
Fig. 1 is a schematic structural view of a mask according to embodiment 2 of the present invention;
FIG. 2 is a schematic structural diagram of a mask according to embodiment 3 of the present invention;
fig. 3 is another schematic structural diagram of a mask according to embodiment 3 of the present invention.
Wherein the reference numerals are: 1. a body; 2. a grating structure; 21. a light-shielding pattern; 22. an opening; 3. a mask frame; q1, fully exposed area; q2, half exposed area; q3, non-exposed region.
Detailed Description
In order to make the technical solutions of the present invention better understood, the present invention will be described in further detail with reference to the accompanying drawings and specific embodiments.
Example 1:
the embodiment provides a mask plate, which comprises a body, a mask plate and a mask, wherein the body is provided with a non-exposure area, a half-exposure area and a full-exposure area; wherein, a grating structure is arranged in a partial area of the half exposure area and/or a partial area of the full exposure area; when the mask is illuminated, the light transmittance of the area where the grating structure is located is different from the light transmittance of the rest areas of the mask.
Specifically, when the partial region in the half exposure area sets up the grating structure, through light irradiation mask version, the light that shines to grating structure this moment takes place the diffraction to make partial light filtered, remaining light is partly filtered through the pellicle in half exposure area again, thereby makes light see through the grating structure place region of mask version, remaining half exposure area, and the transmittance homoenergetic in complete exposure area is different, and then realizes four kinds of transmittances of a mask version.
When the partial area in the complete exposure area sets up the grating structure, shine the mask through light, shine the light of grating structure this moment and take place the diffraction to make partial light filtered, thereby make the transmittance of the light through the grating structure and all the other positions in complete exposure area, and the transmittance in half exposure area all different, and then realize four kinds of transmittances of a mask.
When the partial area in the complete exposure area and the partial area in the half exposure area all set up the grating structure, shine the mask version through light, the light that shines to the grating structure this moment takes place the diffraction to make partial light filtered, thereby make complete exposure area and half exposure area all have two kinds of transmittances, and then realize five kinds of transmittances of a mask version.
In summary, the mask provided in this embodiment has a higher light transmittance than the existing semi-permeable membrane mask, and thus, when the mask in this embodiment is applied to the process for preparing the spacers in the display panel, spacers with multiple (more than two) heights can be formed, thereby improving the problem of light leakage around the display panel due to different step differences on the array substrate.
Example 2:
as shown in FIG. 1, the present embodiment provides a reticle, which includes a body 1, the body 1 having a fully exposed region Q1, a half exposed region Q2, a non-exposed region Q3; wherein, a semi-permeable membrane is arranged in the semi-exposure area Q2 of the body 1; the grating structure 2 is arranged on a semi-permeable membrane. The mask is irradiated by light, the light irradiated to the grating structure 2 is diffracted at the moment, so that part of the light is filtered, and the rest of the light passes through the semi-permeable membrane of the semi-exposure area Q2 and is filtered, so that the light penetrates through the area of the grating structure 2 of the mask, the rest of the semi-exposure area Q2 and the transmittance of the complete exposure area Q1 are different, and four transmittances of one mask are realized.
Specifically, the grating structure 2 includes a plurality of light-shielding patterns 21 arranged in an array substrate. Slits are formed between any two adjacent light shielding patterns 21, and the size of the light shielding patterns 21 and the width of the slits are designed so that light is irradiated to the grating structure 2 and then diffracted to filter out part of the light, so that the light transmittance at the position having the grating structure 2 in the half exposure area Q2 is different from that at the rest positions. Here, the light-shielding pattern 21 has different sizes and different slit widths, and the transmittance of the corresponding light is also different.
The material of the light-shielding pattern 21 may be metal, specifically, chromium, and certainly, the material of the light-shielding pattern 21 is not limited to metal, and may also be other non-light-transmitting materials; moreover, even if the material of the light-shielding pattern 21 is metal, it is not limited to chrome, and different metal materials may be used according to the type of the specific light.
Example 3:
as shown in fig. 2, the present embodiment provides a reticle, including a body 1 and a mask frame 3 for fixing the body 1; wherein the body 1 has a full exposure region Q1, a half exposure region Q2, a non-exposure region Q3; wherein a grating structure 2 is arranged in the fully exposed area Q1 of the body 1, which grating structure 2 is fixed on the mask frame 3. The mask is irradiated by light, the light irradiated to the grating structure 2 is diffracted at the moment, so that partial light is filtered, the transmittance of the light passing through the grating structure 2 is different from the rest positions of the full exposure area Q1 and the transmittance of the half exposure area Q2, and four transmittances of one mask are further realized.
Wherein the grating structure 2 comprises a grating body on which a plurality of openings 22 are provided; when the light irradiates the position of the opening 22, diffraction can occur, so that partial light is filtered out, and the fully exposed area Q1 has two light transmittances.
The shape of the opening 22 in the grating body may be circular or slit-shaped, as long as the light irradiated to the position of the opening 22 can be diffracted.
The material of the grating main body comprises metal, specifically chromium, and certainly, the material of the grating main body is not limited to metal, and can also be other non-light-transmitting materials; and even if the material of the grating main body is metal, the grating main body is not limited to chromium, and different metal materials can be used according to specific light types.
Of course, as shown in fig. 3, on the basis of the mask of this embodiment, as in embodiment 2, the grating structure 2 may be disposed on a part of the semi-permeable membrane of the half-exposure region Q2, and the mask is irradiated by light, at this time, the light irradiated to the grating structure 2 is diffracted, so that part of the light is filtered, and thus, the full-exposure region Q1 and the half-exposure region Q2 both have two transmittances, and further, five transmittances of one mask are achieved.
Example 4:
in this embodiment, a mask apparatus is provided, which includes the mask of any of embodiments 1-3.
It will be understood that the above embodiments are merely exemplary embodiments taken to illustrate the principles of the present invention, which is not limited thereto. It will be apparent to those skilled in the art that various modifications and improvements can be made without departing from the spirit and substance of the invention, and these modifications and improvements are also considered to be within the scope of the invention.
Claims (10)
1. A reticle includes a body having a non-exposed region, a half-exposed region, and a fully exposed region; the device is characterized in that a grating structure is arranged in a partial area of the half exposure area and/or a partial area of the full exposure area.
2. The reticle of claim 1, wherein the semi-exposed region is provided with a semi-permeable membrane; the grating structure is disposed on the semi-permeable membrane.
3. The reticle of claim 2, wherein the grating structure comprises a plurality of light blocking patterns arranged in an array.
4. The reticle of claim 3, wherein the material of the light blocking pattern comprises a metal.
5. The reticle of claim 4, wherein the metal comprises: and (3) chromium.
6. The reticle of claim 1, further comprising a mask frame, the body being secured to the mask frame; wherein,
the grating structure is positioned in the full exposure area and fixed on the mask frame.
7. The reticle of claim 6, wherein the grating structure comprises a grating body having a plurality of openings arranged in an array on the grating body.
8. The reticle of claim 7, wherein the material of the grating body comprises a metal.
9. The reticle of claim 8, wherein the metal comprises: and (3) chromium.
10. A mask arrangement comprising a reticle according to any one of claims 1 to 9.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910003804.XA CN109491199A (en) | 2019-01-02 | 2019-01-02 | Mask plate and mask device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910003804.XA CN109491199A (en) | 2019-01-02 | 2019-01-02 | Mask plate and mask device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN109491199A true CN109491199A (en) | 2019-03-19 |
Family
ID=65713773
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910003804.XA Pending CN109491199A (en) | 2019-01-02 | 2019-01-02 | Mask plate and mask device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN109491199A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111965932A (en) * | 2020-08-12 | 2020-11-20 | Tcl华星光电技术有限公司 | Mask plate and display panel preparation method |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101738846A (en) * | 2008-11-17 | 2010-06-16 | 北京京东方光电科技有限公司 | Mask plate and manufacture method thereof |
| KR20120126154A (en) * | 2011-05-11 | 2012-11-21 | 엘지디스플레이 주식회사 | Mask and method for manufacturing liquid crystal display device |
| CN104407496A (en) * | 2014-10-28 | 2015-03-11 | 京东方科技集团股份有限公司 | Mask plate |
| CN104730753A (en) * | 2013-12-20 | 2015-06-24 | 上海仪电显示材料有限公司 | Mask, light filter, manufacturing method of light filter, and IPS/FFS (in-plane switching/fringe field switching) liquid crystal display device |
| CN104932138A (en) * | 2015-07-07 | 2015-09-23 | 深圳市华星光电技术有限公司 | Photomask and method for manufacturing colored film substrate |
-
2019
- 2019-01-02 CN CN201910003804.XA patent/CN109491199A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101738846A (en) * | 2008-11-17 | 2010-06-16 | 北京京东方光电科技有限公司 | Mask plate and manufacture method thereof |
| KR20120126154A (en) * | 2011-05-11 | 2012-11-21 | 엘지디스플레이 주식회사 | Mask and method for manufacturing liquid crystal display device |
| CN104730753A (en) * | 2013-12-20 | 2015-06-24 | 上海仪电显示材料有限公司 | Mask, light filter, manufacturing method of light filter, and IPS/FFS (in-plane switching/fringe field switching) liquid crystal display device |
| CN104407496A (en) * | 2014-10-28 | 2015-03-11 | 京东方科技集团股份有限公司 | Mask plate |
| CN104932138A (en) * | 2015-07-07 | 2015-09-23 | 深圳市华星光电技术有限公司 | Photomask and method for manufacturing colored film substrate |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111965932A (en) * | 2020-08-12 | 2020-11-20 | Tcl华星光电技术有限公司 | Mask plate and display panel preparation method |
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| Date | Code | Title | Description |
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| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |