CN111965932A - Mask plate and display panel preparation method - Google Patents
Mask plate and display panel preparation method Download PDFInfo
- Publication number
- CN111965932A CN111965932A CN202010806498.6A CN202010806498A CN111965932A CN 111965932 A CN111965932 A CN 111965932A CN 202010806498 A CN202010806498 A CN 202010806498A CN 111965932 A CN111965932 A CN 111965932A
- Authority
- CN
- China
- Prior art keywords
- light
- layer
- mask plate
- photosensitive material
- plano
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000002360 preparation method Methods 0.000 title claims abstract description 37
- 239000000463 material Substances 0.000 claims description 51
- 239000000758 substrate Substances 0.000 claims description 25
- 238000004519 manufacturing process Methods 0.000 claims description 13
- 238000000034 method Methods 0.000 claims description 9
- 238000005530 etching Methods 0.000 claims description 7
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 4
- 239000004698 Polyethylene Substances 0.000 claims description 4
- 239000004793 Polystyrene Substances 0.000 claims description 4
- -1 polyethylene Polymers 0.000 claims description 4
- 229920000573 polyethylene Polymers 0.000 claims description 4
- 229920002223 polystyrene Polymers 0.000 claims description 4
- 238000000149 argon plasma sintering Methods 0.000 claims description 3
- 238000005516 engineering process Methods 0.000 description 6
- 238000001312 dry etching Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 239000011147 inorganic material Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 238000001039 wet etching Methods 0.000 description 2
- AFCARXCZXQIEQB-UHFFFAOYSA-N N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CCNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 AFCARXCZXQIEQB-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000004020 luminiscence type Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/805—Electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/122—Pixel-defining structures or layers, e.g. banks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
Abstract
The invention provides a mask plate and a display panel preparation method. The mask plate is provided with a light transmitting area and a shading area surrounding the light transmitting area. The mask plate further comprises a light shielding layer and a refraction layer. The light shielding layer is arranged corresponding to the light shielding area. The refraction layer is arranged corresponding to the light-transmitting area. The refractive layer may condense or diffuse light. According to the preparation method of the display panel, the mask plate can be used for one-time exposure to form regular-trapezoid or inverted-trapezoid exposure patterns, so that the exposure times are reduced.
Description
Technical Field
The invention relates to the field of display equipment, in particular to a mask plate and a display panel preparation method.
Background
The active matrix flat panel display has many advantages such as thin body, power saving, no radiation, etc., and is widely used. Among them, the Organic Light-Emitting Diode (OLED) Display technology is a flat panel Display technology with great development prospect, has very excellent Display performance, especially self-luminescence, simple structure, ultra-Light and Thin, fast response speed, wide viewing angle, low power consumption and flexible Display realization, is known as a "dream Display", and in addition, the production equipment investment is far less than that of a Thin Film Transistor-Liquid Crystal Display (TFT-LCD), so that the technology is favored by various large Display manufacturers, and has become the dominant force of the third generation Display device in the Display technology field. At present, the OLED is in the night before large-scale mass production, and with further research and continuous emergence of new technology, the OLED display device has a breakthrough development.
In order to realize full color of the OLED display, one method is realized by a parallel structure in which red, green, and blue (RGB) sub-pixels respectively emit light, and the other method is realized by a tandem structure in which White Organic Light Emitting Diodes (WOLEDs) and color filters are stacked. In the WOLED, two or more light emitting layers are connected by a charge generating layer to emit white light, and RGB monochromatic light is obtained after filtering through a CF layer, and the light emitting layers are stacked, so that the WOLED is called a tandem structure. Because the WOLED and CF layer laminated structure does not need an accurate mask process, the high resolution of the OLED display can be realized, and the WOLED and CF layer laminated structure is widely applied at present.
In recent years, display technology has been developed toward high resolution: the development from a 2K panel to a mainstream 4K panel is continued in the future toward an 8K panel, and in order to ensure a certain aperture ratio and brightness, the distance between sub-pixels in a display panel is required to be smaller and smaller, and the driving voltage of a single pixel is required to be gradually increased. The WOLED display panel can emit light weakly by the undriven sub-pixels beside the driven light-emitting sub-pixels due to the decrease of the pixel pitch and the increase of the driving voltage, i.e., the light leakage phenomenon. The light leakage phenomenon may reduce the color gamut of the display and may result in the display quality being degraded.
In the preparation process of the WOLED, different preparation processes of the Pixel Definition Layer (PDL) may affect the realization of the function of the WOLED. Especially, for preventing the pixel light leakage and the realization of the auxiliary electrode, the shape of the PDL is required to be inverted trapezoidal. Usually, the preparation of the PDL with the special shape adopts a mode of repeatedly exposing and etching a plurality of mask plates with different openings, which greatly increases the process complexity and the manufacturing difficulty of the PDL.
Disclosure of Invention
The invention aims to provide a mask plate, an exposure machine and a display panel preparation method, and aims to solve the problems that in the prior art, a pixel definition layer is complex in preparation process, high in preparation difficulty and the like.
In order to achieve the above object, the present invention provides a mask plate, which has a light-transmitting region and a light-shielding region surrounding the light-transmitting region.
The mask plate further comprises a light shielding layer and a refraction layer. The light shielding layer is arranged corresponding to the light shielding area. The refraction layer is arranged corresponding to the light-transmitting area. The refractive layer may condense or diffuse light.
Further, the refractive layer is at least one of a biconcave lens, a biconvex lens, a plano-concave lens, a plano-convex lens, and a prism.
Furthermore, the mask plate is also provided with a light inlet side and a light outlet side corresponding to the light inlet side.
When the refraction layer is used for light scattering, the curved surface of plano-concave lens faces towards the light inlet side, and the curved surface of plano-convex lens faces towards the light outlet side.
When the refraction layer is used for light gathering, the curved surface of plano-concave lens faces towards the light emergent side, and the curved surface of plano-convex lens faces towards the light incident side.
Further, the refractive index of the refractive layer is 1.6-2.5.
Further, the refraction layer comprises at least one of transparent polyethylene, polystyrene and acrylate.
The invention also provides a preparation method of the display panel, which comprises the following preparation steps:
a substrate is provided. A photosensitive material layer is formed on the substrate. Placing the substrate on the light emergent side of the mask plate according to any one of claims 1 to 5, placing a light source on the light incident side of the mask plate, and turning on the light source to expose the photosensitive material layer. And etching the exposed photosensitive material layer to form a regular trapezoid groove in the photosensitive material layer.
Further, the refraction layer of the mask plate may be one of a biconcave lens, a plano-concave lens, a plano-convex lens and a prism.
Further, an incident angle is formed between the light rays emitted by the light source and the normal line of the refraction surface of the refraction layer of the mask plate, and the angle of the incident angle is 60-120 degrees.
The invention also provides a preparation method of the display panel, which comprises the following preparation steps:
a substrate is provided. A photosensitive material layer is formed on the substrate. Placing the substrate on the light emergent side of the mask plate according to any one of claims 1 to 5, placing a light source on the light incident side of the mask plate, and turning on the light source to expose the photosensitive material layer. And etching the exposed photosensitive material layer to form an inverted trapezoidal groove in the photosensitive material layer.
Further, an incident angle is formed between the light rays emitted by the light source and a normal line of a refraction surface of the refraction layer of the mask plate, and the angle of the incident angle is 60-120 degrees.
The invention has the advantages that: according to the mask plate and the preparation method of the display panel, exposure light is refracted by changing the light-transmitting area of the mask plate into the light-condensing or light-diffusing refraction layer, so that a regular-trapezoid or inverted-trapezoid groove structure can be formed through one-time exposure, the exposure times are greatly reduced, and the exposure difficulty is reduced.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings needed to be used in the description of the embodiments will be briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without creative efforts.
Fig. 1 is a schematic structural view of a biconcave lens type mask plate in embodiment 1 of the present invention;
fig. 2 is a schematic structural view of a plano-concave lens type mask plate in embodiment 1 of the present invention;
fig. 3 is a schematic structural view of a plano-convex lens type mask plate in embodiment 1 of the present invention;
FIG. 4 is a schematic flow chart of a production process in example 1-2 of the present invention;
FIG. 5 is a schematic view showing the positions of structures in the production process in example 1 of the present invention;
FIG. 6 is a schematic view of a layered structure of a display panel in embodiment 1 of the present invention;
FIG. 7 is a schematic view of a layered structure of a display panel in embodiment 1 of the present invention;
fig. 8 is a schematic structural view of a lenticular mask in embodiment 2 of the present invention;
fig. 9 is a schematic structural view of a plano-concave lens type mask plate in embodiment 2 of the present invention;
fig. 10 is a schematic structural view of a plano-convex lens type mask plate in embodiment 2 of the present invention;
FIG. 11 is a schematic view showing the positions of structures in the production process in example 2 of the present invention;
fig. 12 is a schematic view of a layered structure of a display panel in embodiment 2 of the present invention.
The components in the figures are represented as follows:
a mask plate 10;
a light-transmitting region 11; a light-shielding region 12;
a light incident side 13; a light exit side 14;
a light-shielding layer 15; a refractive layer 16;
a fixed frame 17;
a substrate 20; a photosensitive material layer 30;
a light source 40; a recess 50;
a pixel defining layer 1; a light emitting device 2;
an auxiliary electrode 3; and a cathode 4.
Detailed Description
The preferred embodiments of the present invention will be described below with reference to the accompanying drawings, which are included to demonstrate that the invention can be practiced, and to provide those skilled in the art with a complete description of the invention so that the technical content thereof will be more clear and readily understood. The present invention may be embodied in many different forms of embodiments and should not be construed as limited to the embodiments set forth herein.
In the drawings, structurally identical elements are represented by like reference numerals, and structurally or functionally similar elements are represented by like reference numerals throughout the several views. The size and thickness of each component shown in the drawings are arbitrarily illustrated, and the present invention is not limited to the size and thickness of each component. The thickness of the components may be exaggerated where appropriate in the figures to improve clarity.
Furthermore, the following description of the various embodiments of the invention refers to the accompanying drawings that illustrate specific embodiments of the invention, by which the invention may be practiced. Directional phrases used in this disclosure, such as, for example, "upper," "lower," "front," "rear," "left," "right," "inner," "outer," "side," and the like, refer only to the orientation of the appended drawings and are, therefore, used herein for better and clearer illustration and understanding of the invention, and do not indicate or imply that the device or element so referred to must have a particular orientation, be constructed and operated in a particular orientation, and are therefore not to be considered limiting of the invention. Furthermore, the terms "first," "second," "third," and the like are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.
When certain components are described as being "on" another component, the components can be directly on the other component; there may also be an intermediate member disposed on the intermediate member and the intermediate member disposed on the other member. When an element is referred to as being "mounted to" or "connected to" another element, they may be directly "mounted to" or "connected to" the other element or indirectly "mounted to" or "connected to" the other element through an intermediate element.
Example 1
The embodiment of the invention provides a mask plate 10. As shown in fig. 1, the mask 10 has a light-transmitting region 11 and a light-shielding region 12 surrounding the light-transmitting region 11, and light is irradiated on a photosensitive material through the light-transmitting region 11 to form an exposure pattern. The mask plate 10 further has a light incident side 13 and a light emergent side 14, wherein the light incident side 13 and the light emergent side 14 are oppositely arranged at two sides of the mask plate 10.
The mask 10 further includes a refraction layer 16 and a light shielding layer 15. The light shielding layer 15 is disposed corresponding to the light shielding region 12 and is used for shielding the excessive light. The refraction layer 16 is disposed corresponding to the light-transmitting region 11, and is used for transmitting light and refracting the transmitted light.
In the embodiment of the present invention, the refraction layer 16 is used for diffusing light, and as shown in fig. 5, the refraction layer 16 refracts the transmitted light to the outside, so that the irradiated photosensitive material can form a regular trapezoidal exposure pattern. Correspondingly, when the regular trapezoid exposure pattern is etched and removed, the left photosensitive material is in an inverted trapezoid structure.
In order to achieve the light scattering effect, the refraction layer 16 is at least one of a biconcave lens, a plano-concave lens, a plano-convex lens, a prism and other structural lenses. When the refraction layer 16 is a plano-concave lens, the plano-concave lens is disposed as shown in fig. 2, and the curved surface faces the light incident side 13. When the refraction layer 16 is a plano-convex lens, the plano-convex lens is arranged as shown in fig. 3, and the curved surface faces the light-emitting side 14.
The refraction layer 16 may be made of transparent polyethylene, polystyrene, acrylate, etc., which is advantageous for increasing the refractive index and making the refraction angle of light larger.
Specifically, the refractive index of the refractive layer 16 is preferably 1.6 to 2.5.
The embodiment of the invention also provides a preparation method of the display panel, the preparation flow of the preparation method is shown in fig. 4, and the preparation method comprises the following specific steps:
step S10) provides a substrate 20:
the substrate 20 may be an etchable material such as an inorganic material, a metal, or the like.
Step S20) of forming the photosensitive material layer 30:
a layer of photosensitive material, such as photoresist, is uniformly applied on a surface of the substrate 20 to form the photosensitive material layer 30.
Step S30) moves the substrate 20:
the substrate 20 is moved to a position below the mask plate 10, as shown in fig. 5, the mask plate 10 has a light incident side 13 and a light emitting side 14, the photosensitive material layer 30 on the substrate 20 faces the light emitting side 14 of the mask plate 10, and the light incident side 13 of the mask plate 10 is provided with a light source 40. An incident angle is formed between the light emitted by the light source 40 and the normal of the curved surface of the refraction layer 16 of the mask plate 10, and a refraction angle is formed between the refraction light refracted by the refraction layer 16 and the normal, according to a formula: the incident angle-refraction angle is an obtuse angle of the inverted trapezoidal photosensitive material layer, and it is understood that the obtuse angle of the inverted trapezoidal photosensitive material layer 30 is larger as the incident angle of the incident light is larger. Specifically, the angle of the incident angle is preferably 60 ° to 120 °.
Step S40) exposes the photosensitive material layer 30:
and turning on the light source 40, wherein light emitted by the light source 40 and the light-transmitting area 11 penetrating through the mask plate 10 irradiate on the photosensitive material layer 30, and a regular-trapezoid exposure pattern is formed on the photosensitive material layer 30.
Step S50) etching the photosensitive material layer 30:
the portions of the photosensitive material layer 30 irradiated with light are etched by dry etching or wet etching, thereby forming the regular trapezoidal grooves 50 and the inverted trapezoidal photosensitive material layer 30 as shown in fig. 5 in the photosensitive material layer 30.
The mask plate 10 and the display panel preparation method provided by the embodiment of the invention can be used for preparing components such as a pixel defining layer 1, an electrode layer and the like in a display panel. When the method is applied to the preparation of the pixel defining layer 1, as shown in fig. 6, the regular trapezoid groove 50 of the pixel defining layer 1 is usually filled with the light emitting device 2, and the inverted trapezoid pixel defining layer 1 structure with a wide top and a narrow bottom can effectively improve the light leakage problem, which is beneficial to improving the quality of the display picture. When it is applied to the preparation of an electrode layer, as shown in fig. 7, the electrode layer is generally an auxiliary electrode 3 disposed on the pixel defining layer 1, and the electrode layer having the regular trapezoid groove 50 structure can improve the problems of poor connection between the electrode layer and the cathode 4 of the light emitting device.
According to the display panel preparation method provided by the embodiment of the invention, the mask plate 10 is used, so that the special regular trapezoid groove 50 structure can be prepared only through one exposure step, and compared with the exposure method in the prior art, the exposure times are greatly reduced, the preparation difficulty is reduced, the production efficiency is improved, and the production cost is saved.
Example 2
The embodiment of the invention provides a mask plate 10. As shown in fig. 8, the mask 10 has a light-transmitting region 11 and a light-shielding region 12 surrounding the light-transmitting region 11, and light is irradiated on a photosensitive material through the light-transmitting region 11 to form an exposure pattern. The mask plate 10 further has a light incident side 13 and a light emergent side 14, wherein the light incident side 13 and the light emergent side 14 are oppositely arranged at two sides of the mask plate 10.
The mask 10 further includes a refraction layer 16 and a light shielding layer 15. The light shielding layer 15 is disposed corresponding to the light shielding region 12 and is used for shielding the excessive light. The refraction layer 16 is disposed corresponding to the light-transmitting region 11, and is used for transmitting light and refracting the transmitted light.
In the embodiment of the present invention, the refraction layer 16 is used for condensing light, and as shown in fig. 11, the refraction layer 16 refracts the transmitted light to the inner side, so that the irradiated photosensitive material can form an inverted trapezoid exposure structure. Correspondingly, when the inverted trapezoid exposure pattern is etched and removed, the photosensitive material is left to be in a regular trapezoid structure.
In order to achieve the light-gathering effect, the refraction layer 16 is at least one of a biconvex lens, a plano-concave lens, a plano-convex lens, a prism and other structural lenses. When the refraction layer 16 is a plano-concave lens, the plano-concave lens is disposed as shown in fig. 9, and the curved surface faces the light exit side 14. When the refraction layer 16 is a plano-convex lens, the plano-convex lens is disposed as shown in fig. 10, and the curved surface faces the light incident side 13.
The refraction layer 16 may be made of transparent polyethylene, polystyrene, acrylate, etc., which is advantageous for increasing the refractive index and making the refraction angle of light larger.
Specifically, the refractive index of the refractive layer 16 is preferably 1.6 to 2.5.
The embodiment of the invention also provides a preparation method of the display panel, the preparation flow of the preparation method is shown in fig. 4, and the preparation method comprises the following specific steps:
step S10) provides a substrate 20:
the substrate 20 may be an etchable material such as an inorganic material, a metal, or the like.
Step S20) of forming the photosensitive material layer 30:
a layer of photosensitive material, such as photoresist, is uniformly applied on a surface of the substrate 20 to form the photosensitive material layer 30.
Step S30) moves the substrate 20:
the substrate 20 is moved to a position below the mask plate 10, as shown in fig. 11, the mask plate 10 has a light incident side 13 and a light emitting side 14, the photosensitive material layer 30 on the substrate 20 faces the light emitting side 14 of the mask plate 10, and a light source 40 is disposed on the light incident side 13 of the mask plate 10. An incident angle is formed between the light emitted by the light source 40 and the normal of the curved surface of the refraction layer 16 of the mask plate 10, and a refraction angle is formed between the refraction light refracted by the refraction layer 16 and the normal, according to a formula: the incident angle-refraction angle is an obtuse angle of the regular trapezoidal photosensitive material layer, and it is understood that the obtuse angle of the regular trapezoidal photosensitive material layer 30 is larger as the incident angle of the incident light is larger. Specifically, the angle of the incident angle is preferably 60 ° to 120 °.
Step S40) exposes the photosensitive material layer 30:
and turning on the light source 40, wherein light emitted by the light source 40 and the light-transmitting area 11 penetrating through the mask plate 10 irradiate on the photosensitive material layer 30, and an inverted trapezoidal exposure pattern is formed on the photosensitive material layer 30.
Step S50) etching the photosensitive material layer 30:
the portions of the photosensitive material layer 30 irradiated with light are etched by dry etching or wet etching, thereby forming the inverted trapezoidal grooves 50 and the light-sensitive material layer 30 of a regular trapezoid as shown in fig. 5 in the photosensitive material layer 30.
The mask plate 10 and the display panel preparation method provided by the embodiment of the invention can be used for preparing components such as a pixel defining layer 1, an electrode layer and the like in a display panel. When it is applied to the preparation of the pixel defining layer 1, as shown in fig. 12, the inverted trapezoid-shaped groove 50 of the pixel defining layer 1 is usually filled with the light emitting device 2, and the structure of the regular trapezoid-shaped pixel defining layer 1 with a narrow top and a wide bottom can improve the aperture ratio and increase the display brightness.
According to the display panel preparation method provided by the embodiment of the invention, the mask plate 10 is used, so that the special inverted trapezoidal groove 50 structure can be prepared only through one exposure step, and compared with the exposure method in the prior art, the exposure times are greatly reduced, the preparation difficulty is reduced, the production efficiency is improved, and the production cost is saved.
Although the invention herein has been described with reference to particular embodiments, it is to be understood that these embodiments are merely illustrative of the principles and applications of the present invention. It is therefore to be understood that numerous modifications may be made to the illustrative embodiments and that other arrangements may be devised without departing from the spirit and scope of the present invention as defined by the appended claims. It should be understood that features described in different dependent claims and herein may be combined in ways different from those described in the original claims. It is also to be understood that features described in connection with individual embodiments may be used in other described embodiments.
Claims (10)
1. A mask plate is characterized by comprising a light transmitting area and a shading area surrounding the light transmitting area;
the mask plate further comprises:
the shading layer is arranged corresponding to the shading area;
the refraction layer is arranged corresponding to the light-transmitting area;
the refractive layer may condense or diffuse light.
2. A mask according to claim 1, wherein the refractive layer is at least one of a biconcave lens, a biconvex lens, a plano-concave lens, a plano-convex lens, and a prism.
3. A mask plate according to claim 2, further comprising a light incident side and a light emergent side corresponding to the light incident side;
when the refraction layer is used for light scattering, the curved surface of the plano-concave lens faces the light incident side, and the curved surface of the plano-convex lens faces the light emergent side;
when the refraction layer is used for light gathering, the curved surface of plano-concave lens faces towards the light emergent side, and the curved surface of plano-convex lens faces towards the light incident side.
4. A mask according to claim 1, wherein the refractive index of the refractive layer is 1.6-2.5.
5. A mask according to claim 1 wherein the refractive layer comprises at least one of transparent polyethylene, polystyrene and acrylate.
6. The preparation method of the display panel is characterized by comprising the following preparation steps of:
providing a substrate;
forming a photosensitive material layer on the substrate;
placing the substrate on the light emergent side of the mask plate according to any one of claims 1 to 5, placing a light source on the light incident side of the mask plate, and turning on the light source to expose the photosensitive material layer;
and etching the exposed photosensitive material layer to form a regular trapezoid groove in the photosensitive material layer.
7. The method for manufacturing a display panel according to claim 6, wherein the refractive layer of the mask is at least one of a biconcave lens, a plano-concave lens, a plano-convex lens, and a prism.
8. The method for manufacturing a display panel according to claim 6, wherein an incident angle is formed between a light ray emitted from the light source and a normal line of a refractive surface of the mask refractive layer, and the incident angle is 60 ° to 120 °.
9. The preparation method of the display panel is characterized by comprising the following preparation steps of:
providing a substrate;
forming a photosensitive material layer on the substrate;
placing the substrate on the light emergent side of the mask plate according to any one of claims 1 to 5, placing a light source on the light incident side of the mask plate, and turning on the light source to expose the photosensitive material layer;
and etching the exposed photosensitive material layer to form an inverted trapezoidal groove in the photosensitive material layer.
10. The method of manufacturing a display panel according to claim 9, wherein the light emitted from the light source has an incident angle with a normal line of a refractive surface of the mask refractive layer, and the incident angle is 60 ° to 120 °.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010806498.6A CN111965932A (en) | 2020-08-12 | 2020-08-12 | Mask plate and display panel preparation method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010806498.6A CN111965932A (en) | 2020-08-12 | 2020-08-12 | Mask plate and display panel preparation method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN111965932A true CN111965932A (en) | 2020-11-20 |
Family
ID=73366242
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202010806498.6A Pending CN111965932A (en) | 2020-08-12 | 2020-08-12 | Mask plate and display panel preparation method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN111965932A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114162331A (en) * | 2022-02-14 | 2022-03-11 | 中国空气动力研究与发展中心低速空气动力研究所 | Icing detection device and icing detection method |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07287388A (en) * | 1994-04-18 | 1995-10-31 | Ricoh Opt Ind Co Ltd | Mask for exposure |
| CN106896538A (en) * | 2017-02-28 | 2017-06-27 | 深圳市华星光电技术有限公司 | UV mask plates and preparation method thereof and frame glue cure system |
| CN108153106A (en) * | 2017-12-27 | 2018-06-12 | 深圳市华星光电技术有限公司 | Light shield and patterning method |
| CN109491199A (en) * | 2019-01-02 | 2019-03-19 | 合肥京东方显示技术有限公司 | Mask plate and mask device |
-
2020
- 2020-08-12 CN CN202010806498.6A patent/CN111965932A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07287388A (en) * | 1994-04-18 | 1995-10-31 | Ricoh Opt Ind Co Ltd | Mask for exposure |
| CN106896538A (en) * | 2017-02-28 | 2017-06-27 | 深圳市华星光电技术有限公司 | UV mask plates and preparation method thereof and frame glue cure system |
| CN108153106A (en) * | 2017-12-27 | 2018-06-12 | 深圳市华星光电技术有限公司 | Light shield and patterning method |
| CN109491199A (en) * | 2019-01-02 | 2019-03-19 | 合肥京东方显示技术有限公司 | Mask plate and mask device |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114162331A (en) * | 2022-02-14 | 2022-03-11 | 中国空气动力研究与发展中心低速空气动力研究所 | Icing detection device and icing detection method |
| CN114162331B (en) * | 2022-02-14 | 2022-04-29 | 中国空气动力研究与发展中心低速空气动力研究所 | Icing detection device and icing detection method |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US7321349B2 (en) | Display element, display device, and microlens array | |
| JP4806220B2 (en) | Image display device | |
| CN110783367B (en) | Display panel | |
| KR101286095B1 (en) | One-body multi optical sheet for liquid crystal display device | |
| US11818915B2 (en) | Display backboard, display panel and method of manufacturing the same, and display apparatus | |
| CN1633618A (en) | Liquid crystal display element and method of producing the same | |
| WO2021227197A1 (en) | Under-screen camera display panel and manufacturing method therefor | |
| WO2020186968A1 (en) | Light-emitting display panel and method for manufacturing same, and display apparatus | |
| US11508945B2 (en) | 3-D display panel including heat dissipation structure between light emitting units, and manufacturing method thereof | |
| CN108845461B (en) | Backlight module and liquid crystal display device | |
| CN111415973A (en) | Display panel and preparation method thereof | |
| CN109991775A (en) | Backlight and display device | |
| KR102124022B1 (en) | A monolithic optical sheet and liquid crystal display device including the same | |
| CN111965932A (en) | Mask plate and display panel preparation method | |
| CN113036052A (en) | Display panel, preparation method thereof and display device | |
| EP3907770A1 (en) | Electronic device, display apparatus and pixel structure | |
| JP3954681B2 (en) | Liquid crystal device for liquid crystal projector and counter substrate for liquid crystal device | |
| JP2000314876A (en) | Liquid crystal display element and liquid crystal display device | |
| KR100559528B1 (en) | Display panel with an improved transmittance | |
| WO2023065871A1 (en) | Display module and display device | |
| JP2006337543A (en) | Transflective liquid crystal display apparatus | |
| KR20150062381A (en) | Liquid crystal display device and method for manufacturing the light guide plate | |
| WO2023225868A1 (en) | Microlens substrate, display device, and manufacturing method for microlens substrate | |
| JP5269861B2 (en) | Liquid crystal display | |
| CN114447253B (en) | Display substrate, manufacturing method thereof and display device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20201120 |
|
| RJ01 | Rejection of invention patent application after publication |