CN109468616B - Chemical vapor deposition equipment and manipulator thereof - Google Patents

Chemical vapor deposition equipment and manipulator thereof Download PDF

Info

Publication number
CN109468616B
CN109468616B CN201910016365.6A CN201910016365A CN109468616B CN 109468616 B CN109468616 B CN 109468616B CN 201910016365 A CN201910016365 A CN 201910016365A CN 109468616 B CN109468616 B CN 109468616B
Authority
CN
China
Prior art keywords
vapor deposition
chemical vapor
support rods
manipulator
sub
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201910016365.6A
Other languages
Chinese (zh)
Other versions
CN109468616A (en
Inventor
金憘槻
王明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BOE Technology Group Co Ltd
Original Assignee
BOE Technology Group Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BOE Technology Group Co Ltd filed Critical BOE Technology Group Co Ltd
Priority to CN201910016365.6A priority Critical patent/CN109468616B/en
Publication of CN109468616A publication Critical patent/CN109468616A/en
Application granted granted Critical
Publication of CN109468616B publication Critical patent/CN109468616B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

The embodiment of the application provides chemical vapor deposition equipment and a manipulator thereof. The manipulator of the chemical vapor deposition equipment comprises more than two support rods which are arranged in parallel; the tops of the more than two support rods are bearing surfaces for bearing the glass substrate; the support rod comprises more than one connecting assembly and more than two sub support rods, the more than two sub support rods are sequentially connected, and any two adjacent sub support rods are fixedly connected through the connecting assembly. The embodiment of the application realizes that the manipulator is increased on the basis of meeting high temperature resistance and flatness, so that the manipulator can be applied to the high-generation line in the field of liquid crystal, the application range of the manipulator provided by the application is improved, and the carrying problem of a large-size glass substrate is effectively solved.

Description

Chemical vapor deposition equipment and manipulator thereof
Technical Field
The application relates to the technical field of chemical vapor deposition equipment, in particular to chemical vapor deposition equipment and a manipulator thereof.
Background
At present, in the advanced line of the liquid crystal field, a manipulator of chemical vapor deposition equipment needs to work in a high-temperature and vacuum environment, and the manipulator in the prior art is generally made by adopting a ceramic process. But along with the continuous upgrading of the generation line in the liquid crystal field, the size of the glass substrate is bigger and bigger, and therefore the length requirement for the manipulator is higher and higher, however, the manipulator can not be increased by the existing ceramic process, and the requirement of the high generation line in the liquid crystal field for the length of the manipulator can not be met.
Disclosure of Invention
The application provides a chemical vapor deposition device and a manipulator thereof aiming at the defects of the prior art, and aims to overcome the defect that the manipulator in the prior art is difficult to increase on the basis of meeting the requirements of high temperature resistance and flatness.
In a first aspect, the embodiment of the application provides a manipulator of a chemical phase deposition apparatus, which comprises more than two support rods arranged in parallel;
the tops of the more than two support rods are bearing surfaces for bearing the glass substrate;
the support rod comprises more than one connecting assembly and more than two sub support rods, the more than two sub support rods are sequentially connected, and any two adjacent sub support rods are fixedly connected through the connecting assembly.
In an embodiment of this application, coupling assembling is the sleeve structure, the both ends of sleeve structure are located respectively the cover on the tip of two adjacent sub-die-pins, and the top thickness of sleeve structure is a little more than the loading face.
In an embodiment of the present application, the sleeve structure and the two adjacent sub-supporting rods are connected by clamping, bonding or welding.
In an embodiment of the present application, the connecting member includes a first member and a second member, the first member is fixedly disposed on the tops of the two adjacent sub-supporting rods, and the second member is fixedly disposed on the bottoms of the two adjacent sub-supporting rods.
In an embodiment of the present application, the top surface of the first element is higher than the carrying surface, and a height difference between the top surface and the carrying surface is within a predetermined height difference range.
In an embodiment of the present application, the second assembly includes a connecting portion, a vertical portion and a supporting portion, which are sequentially connected, and the connecting portion and the supporting portion are respectively and fixedly connected to two adjacent sub-supporting rods; the top of vertical portion with connecting portion link to each other, the bottom of vertical portion with the supporting part links to each other, and vertical portion with the contained angle between the supporting part is less than 90 degrees.
In an embodiment of the present application, the first and second components are connected to the two adjacent sub-supporting rods by bonding or welding.
In an embodiment of the present application, the sub-supporting rod is made of a ceramic material.
In a second aspect, an embodiment of the present application provides a chemical vapor deposition apparatus, including a driving mechanism and a robot of the chemical vapor deposition apparatus as provided in the first aspect of the present application, the robot is fixedly disposed on the driving mechanism, and the driving mechanism is configured to drive the robot to move.
In an embodiment of the present application, the number of the manipulators is two or more, and the two or more manipulators are stacked in a vertical direction.
The technical scheme provided by the embodiment of the application has the following beneficial technical effects:
this application is through being provided with the die-pin that two more than sub die-pins are constituteed to adopt coupling assembling fixed connection between two adjacent sub die-pins, can effectually prevent the manipulator along with the increase of length, because the bending that leads to of the influence of marginal gravity, realized that the manipulator has increased on satisfying high temperature resistant and flat basis, thereby make this application embodiment at the in-process performance of transport glass substrate more stable, thereby the life of this application embodiment has effectively been improved to difficult crooked. In addition, the method can be applied to the advanced line in the field of liquid crystal, the application range of the method is widened, and the problem of carrying large-size glass substrates is effectively solved.
Additional aspects and advantages of the present application will be set forth in part in the description which follows and, in part, will be obvious from the description, or may be learned by practice of the present application.
Drawings
The foregoing and/or additional aspects and advantages of the present application will become apparent and readily appreciated from the following description of the embodiments, taken in conjunction with the accompanying drawings of which:
FIG. 1 is a schematic top view of a robot of a chemical vapor deposition apparatus according to an embodiment of the present disclosure;
FIG. 2 is a schematic side view of a support bar according to an embodiment of the present disclosure;
FIG. 3 is a schematic side view of another embodiment of a carrier bar;
FIG. 4 is an enlarged, partial, side view of another embodiment of the subject application;
fig. 5 is a schematic side view of a chemical vapor deposition apparatus according to an embodiment of the disclosure.
Detailed Description
Reference will now be made in detail to the present application, examples of which are illustrated in the accompanying drawings, wherein like reference numerals refer to the same or similar parts or parts having the same or similar functions throughout. In addition, if a detailed description of the known art is not necessary for illustrating the features of the present application, it is omitted. The embodiments described below with reference to the drawings are exemplary only for the purpose of explaining the present application and are not to be construed as limiting the present application.
It will be understood by those within the art that, unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. It will be further understood that terms, such as those defined in commonly used dictionaries, should be interpreted as having a meaning that is consistent with their meaning in the context of the prior art and will not be interpreted in an idealized or overly formal sense unless expressly so defined herein.
As used herein, the singular forms "a", "an", "the" and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise. It will be further understood that the terms "comprises" and/or "comprising," when used in this specification, specify the presence of stated features, integers, steps, operations, elements, and/or components, but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and/or groups thereof.
The following describes the technical solutions of the present application and how to solve the above technical problems with specific embodiments.
The embodiment of the application provides a manipulator of a chemical vapor deposition device, and the structural schematic diagram of the manipulator is shown in fig. 1 and fig. 2, and the manipulator comprises: comprises more than two support rods 1 which are arranged in parallel; the top parts of more than two support rods 1 are bearing surfaces 2 for bearing the glass substrate; the supporting rod 1 comprises more than one connecting assembly 3 and more than two sub supporting rods 4, the more than two sub supporting rods 4 are sequentially connected, and any two adjacent sub supporting rods 4 are fixedly connected through the connecting assembly 3.
As shown in fig. 1, the robot may include two support rods, and the top of the two support rods 1 may be a carrying surface 2 for carrying the glass substrate. Since the support rod is used in a high-temperature vacuum environment, the support rod may be made of a ceramic material, but the application is not limited thereto. As shown in fig. 2, the supporting rod 1 may include a connecting assembly 3 and two sub supporting rods 4, and the two sub supporting rods 4 may be fixedly connected by the connecting assembly 3. It should be noted that the number of the sub-bracket rods and the connecting assemblies is not limited in the present application, for example, the number of the sub-bracket rods may be multiple, but two adjacent sub-bracket rods are all fixedly connected by the connecting assemblies.
This application is through being provided with the die-pin that two more than sub die-pins are constituteed to adopt coupling assembling fixed connection between two adjacent sub die-pins, can effectually prevent the manipulator along with the increase of length, because the bending that leads to of the influence of marginal gravity, realized that the manipulator has increased on satisfying high temperature resistant and flat basis, thereby make this application embodiment at the in-process performance of transport glass substrate more stable, thereby the life of this application embodiment has effectively been improved to difficult crooked. In addition, the method can be applied to the advanced line in the field of liquid crystal, the application range of the method is widened, and the problem of carrying large-size glass substrates is effectively solved.
In an embodiment of this application, coupling assembling 3 is the sleeve structure, and the both ends of sleeve structure overlap respectively and locate on the tip of two adjacent sub-die-pins 4 to the top thickness of sleeve structure is a little higher than loading surface 2.
Optionally, the connecting assembly 3 may be a sleeve structure made of a metal material or a ceramic material, and the two adjacent sub-supporting rods 4 may be respectively sleeved in the two end portions of the connecting assembly 3, so as to fixedly connect the two sub-supporting rods. Since the carrying surface 2 is used for carrying the glass substrate, the top thickness of the connecting member 3 may be slightly higher than that of the carrying surface 2, and the thickness of the other parts of the connecting member 3 except the top may be set to be slightly thicker in order to make the structure more stable. By adopting the design, the structure of the embodiment of the application is simple and durable, and the use and protection cost can be effectively reduced.
It should be noted that, the embodiment of the present application is not limited to the specific material of the connecting member 3 and the thickness of the connecting member, and those skilled in the art can select the material according to actual situations.
In an embodiment of the present application, the connection between the sleeve structure and two adjacent sub-supporting rods 4 is by clamping, bonding or welding. When the connecting assembly 3 is of a sleeve structure, the connecting manner between the connecting assembly and two adjacent sub-joists 4 can adopt any one or combination of the above connecting manners. For example, clamping followed by bonding, or clamping followed by welding may be used. This is not limited in the examples of the present application.
In an embodiment of the present application, the connecting assembly 3 includes a first assembly 31 and a second assembly 32, the first assembly 31 is fixedly disposed on the top of two adjacent sub-supporting rods 4, and the second assembly 32 is fixedly disposed on the bottom of two adjacent sub-supporting rods 4.
As shown in fig. 3, the first component 31 and the second component 32 can be made of metal, plastic or ceramic. The first member 31 may be disposed on the top of two adjacent sub-pallets 4, and the second member 32 is fixedly disposed on the bottom of two adjacent sub-pallets 4. The first component 31 forms a pulling force between two adjacent sub-supporting rods 4, and the second component 32 forms a supporting force for two adjacent sub-supporting rods 4, so that the structure of the embodiment of the present application is more reasonable due to the cooperation of the two components, and the bending phenomenon is not easy to occur. Optionally, the top of the first assembly 31 may also be provided with a flexible material, which may effectively prevent the glass substrate from being scratched, so as to effectively improve the yield of the embodiment of the present application. It should be noted that, the present application is not limited to the materials of the first component and the second component, and those skilled in the art can select and set the components according to actual requirements.
In an embodiment of the present application, the top surface of the first component 31 is higher than the supporting surface 2, and the height difference between the top surface and the supporting surface 2 is within a predetermined height difference range. As shown in fig. 4, the first assembly 1 may be a plate-shaped structure, and two ends of the plate-shaped structure are respectively and fixedly connected to two adjacent sub-supporting rods 4. The thickness of the first member 1 may be set between 1 and 3 mm so that the height difference between the top surface of the first member and the carrying surface 2 may be between 1 and 2 mm. By adopting the design, the bearing surface is mainly used for bearing the glass substrate, so that the first assembly is prevented from influencing the glass substrate, and the yield of the embodiment of the application can be effectively improved.
In an embodiment of the present application, the second assembly 32 includes a connecting portion 321, a vertical portion 322, and a supporting portion 323, which are connected in sequence, and the connecting portion 321 and the supporting portion 323 are respectively and fixedly connected to two adjacent sub-supporting rods 4; the top end of the vertical portion 322 is connected to the connecting portion 321, the bottom end of the vertical portion 322 is connected to the supporting portion 323, and the included angle between the vertical portion 322 and the supporting portion 323 is smaller than 90 degrees.
As shown in fig. 4, the second assembly 32 may be formed in an integrated manner, the connecting portion 321 may be horizontally disposed and fixedly connected to the left sub-bracket 4, the end portion of the supporting portion 323 may be supported and fixedly connected to the right sub-bracket, the top end of the vertical portion 322 may be connected to the connecting portion 321, and the bottom end may be connected to the supporting portion 323. The vertical portion 322 and the supporting portion 323 may form an angle therebetween, which may be less than 90 degrees. Adopt above-mentioned setting, can further improve the supporting role of second subassembly for the structure of this application embodiment is more reasonable, and more reliably durable and not pliable, thereby in the better advanced line that is applicable to the liquid crystal field.
It should be noted that the present application is not limited to the specific structure and the specific implementation manner of the second assembly, and a person skilled in the art may select the second assembly according to the actual working condition, for example, the second assembly may also be a plate-shaped structure, and the second assembly is horizontally disposed at the bottom of two adjacent sub-supporting rods, so the embodiment of the present application is not limited thereto.
In an embodiment of the present application, the first and second components 31 and 32 are connected to two adjacent sub-supporting rods 4 by bonding or welding. The connection between the first and second elements 31 and 32 and the two adjacent sub-mounts 4 can be selected according to the material of the first and second elements 31 and 32, for example, when the first and second elements 31 and 32 are made of high temperature resistant ceramic material, bonding can be used. Alternatively, when the first component 31 and the second component 32 are made of metal, the first component and the second component may be bonded or welded, and thus the present embodiment is not limited thereto.
In an embodiment of the present application, the sub-holder rod 4 is made of ceramic.
Based on the same inventive concept, in a second aspect of the present application, a chemical vapor deposition apparatus is provided, which includes a driving mechanism and a robot of the chemical vapor deposition apparatus as provided in the first aspect of the present application, the robot is fixedly disposed on the driving mechanism, and the driving mechanism is configured to drive the robot to move.
As shown in fig. 5, one end of the robot 100 may be fixedly connected to a driving mechanism 200, two or more support rods 1 may be arranged along a horizontal direction, and the upper portions of the two or more support rods 1 are bearing surfaces 2 for bearing the glass machine, and the driving mechanism 200 may drive the glass substrate to move along the horizontal direction and/or the vertical direction through the robot 100. It should be noted that, the present application does not limit the setting manner between the manipulator and the driving mechanism, and those skilled in the art can adjust the setting by themselves according to the working conditions. The embodiment of the application has the advantages that the structure is simple and easy to use, and the connecting assembly is adopted, so that the mechanical arm is not easy to bend when being applied to a large-size glass substrate, the service life of the practical application is effectively prolonged, and the use and maintenance cost is reduced.
In an embodiment of the present application, the number of the manipulators is two or more, and the two or more manipulators are stacked in a vertical direction. As shown in fig. 5, the robot 100 is two, and the two robots 100 may be stacked in a vertical direction. However, the number of the robots is not limited in the present application, and a plurality of robots may be provided, and they are stacked in the vertical direction. Adopt above-mentioned design, owing to originally be provided with a plurality of manipulators for this application embodiment once can carry polylith glass substrate, thereby can effectively improve the work efficiency of this application embodiment.
By applying the embodiment of the application, at least the following beneficial effects can be realized:
this application is through being provided with the die-pin that two more than sub die-pins are constituteed to adopt coupling assembling fixed connection between two adjacent sub die-pins, can effectually prevent the manipulator along with the increase of length, because the bending that leads to of the influence of marginal gravity, realized that the manipulator has increased on satisfying high temperature resistant and flat basis, thereby make this application embodiment at the in-process performance of transport glass substrate more stable, thereby the life of this application embodiment has effectively been improved to difficult crooked. In addition, the method can be applied to the advanced line in the field of liquid crystal, the application range of the method is widened, and the problem of carrying large-size glass substrates is effectively solved.
In the description of the present application, it is to be understood that the terms "center", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", and the like indicate orientations or positional relationships based on those shown in the drawings, and are only for convenience in describing the present invention and simplifying the description, but do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed in a particular orientation, and be operated, and thus, should not be construed as limiting the present invention.
The terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of the present invention, "a plurality" means two or more unless otherwise specified.
In the description of the present application, it is to be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection, a removable connection, or an integral connection; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meanings of the above terms in the present invention can be understood in specific cases to those skilled in the art.
It should be understood that, although the steps in the flowcharts of the figures are shown in order as indicated by the arrows, the steps are not necessarily performed in order as indicated by the arrows. The steps are not performed in the exact order shown and may be performed in other orders unless explicitly stated herein. Moreover, at least a portion of the steps in the flow chart of the figure may include multiple sub-steps or multiple stages, which are not necessarily performed at the same time, but may be performed at different times, which are not necessarily performed in sequence, but may be performed alternately or alternately with other steps or at least a portion of the sub-steps or stages of other steps.
The foregoing is only a partial embodiment of the present application, and it should be noted that, for those skilled in the art, several modifications and decorations can be made without departing from the principle of the present application, and these modifications and decorations should also be regarded as the protection scope of the present application.

Claims (6)

1. The mechanical arm of the chemical vapor deposition equipment is characterized by comprising more than two support rods which are arranged in parallel;
the tops of the more than two support rods are bearing surfaces for bearing the glass substrate;
the support rods comprise more than one connecting assembly and more than two sub support rods, the more than two sub support rods are sequentially connected, and any two adjacent sub support rods are fixedly connected through the connecting assembly;
the connecting assembly comprises a first assembly and a second assembly, the first assembly is fixedly arranged at the tops of the two adjacent sub-supporting rods, and the second assembly is fixedly arranged at the bottoms of the two adjacent sub-supporting rods;
the second assembly comprises a connecting part, a vertical part and a supporting part which are sequentially connected, and the connecting part and the supporting part are respectively and fixedly connected with two adjacent sub-supporting rods; the top of vertical portion with connecting portion link to each other, the bottom of vertical portion with the supporting part links to each other, and vertical portion with the contained angle between the supporting part is less than 90 degrees.
2. The robot of claim 1, wherein the top surface of the first member is higher than the carrying surface, and the height difference between the top surface and the carrying surface is within a predetermined range of height difference.
3. The robot of chemical vapor deposition equipment according to claim 1, wherein the first module and the second module are connected to the two adjacent sub-pins by bonding or welding.
4. The robot of a chemical vapor deposition apparatus as claimed in claim 1, wherein the sub-pins are ceramic sub-pins.
5. A chemical vapor deposition apparatus, comprising a driving mechanism and a robot of the chemical vapor deposition apparatus as claimed in any one of claims 1 to 4, wherein the robot is fixedly arranged on the driving mechanism, and the driving mechanism is used for driving the robot to move.
6. The chemical vapor deposition apparatus according to claim 5, wherein the number of the robots is two or more, and the two or more robots are stacked in a vertical direction.
CN201910016365.6A 2019-01-08 2019-01-08 Chemical vapor deposition equipment and manipulator thereof Active CN109468616B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201910016365.6A CN109468616B (en) 2019-01-08 2019-01-08 Chemical vapor deposition equipment and manipulator thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201910016365.6A CN109468616B (en) 2019-01-08 2019-01-08 Chemical vapor deposition equipment and manipulator thereof

Publications (2)

Publication Number Publication Date
CN109468616A CN109468616A (en) 2019-03-15
CN109468616B true CN109468616B (en) 2021-01-15

Family

ID=65678277

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201910016365.6A Active CN109468616B (en) 2019-01-08 2019-01-08 Chemical vapor deposition equipment and manipulator thereof

Country Status (1)

Country Link
CN (1) CN109468616B (en)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4876898B2 (en) * 2006-12-22 2012-02-15 シンフォニアテクノロジー株式会社 Linear conveying apparatus for articles and belt body tension adjusting method in the apparatus
CN101693370B (en) * 2009-09-30 2011-06-22 东莞宏威数码机械有限公司 Novel multi-stage transferring robot
CN103276369B (en) * 2013-05-06 2016-02-17 南方科技大学 PECVD (plasma enhanced chemical vapor deposition) film coating system
CN203371550U (en) * 2013-08-06 2014-01-01 东旭集团有限公司 Gripping tool used for substrate handling robot
CN103434842B (en) * 2013-09-04 2015-08-19 深圳市华星光电技术有限公司 Mechanical arm fork and mechanical arm
CN106006034A (en) * 2016-07-28 2016-10-12 苏州高通机械科技有限公司 Glass substrate carrying arm
CN207788938U (en) * 2017-12-12 2018-08-31 柳州上丰自动化设备有限公司 It is a kind of to be connected and fixed device for industrial machine human arm inside shaft

Also Published As

Publication number Publication date
CN109468616A (en) 2019-03-15

Similar Documents

Publication Publication Date Title
US9387584B2 (en) Industrial robot
EP2063320A2 (en) Method and apparatus for fabricating vertical deposition mask
US20030098047A1 (en) Semiconductor wafer cleaning systems and methods
KR20110043742A (en) Magnetic pad for end-effectors
CN101652852A (en) An end effector of a robot for transporting substrates
KR101479943B1 (en) The System and Method to Align Substrate and Mask
KR101309363B1 (en) Chamber and film-forming apparatus
WO2024119635A1 (en) Solder strip carrier assembly, soldering device, and soldering method
CN109468616B (en) Chemical vapor deposition equipment and manipulator thereof
JP2007208231A (en) Method for soldering tab lead to solar battery cell
CN110849145A (en) Muffle furnace crucible frame for automatic production line and working method thereof
CN211387541U (en) Automatic equipment for lamination assembly
KR20140123842A (en) Camera assembly of film deposition system
CN1923642B (en) Carrier for transporting substrate
KR20080108054A (en) Substrate transporting unit
JP4571089B2 (en) Substrate support member, substrate baking furnace, substrate transfer apparatus, and substrate processing method
CN211393032U (en) Product transfer mechanism
KR101291313B1 (en) Panel bonding apparatus
CN211041798U (en) Muffle furnace crucible frame for automatic production line
CN111862805B (en) Method of manufacturing display device
CN206615774U (en) One kind carries module and handling device
CN111745363A (en) Frame installation device
CN220387551U (en) Fixing clamp for processing battery connecting sheet
KR101651545B1 (en) Substrate holder unit and apparatus for treatmenting substrate having the same
CN104425335A (en) Equipment used for holding substrate

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant