CN109456040A - 一种耐高温低形变的陶瓷架 - Google Patents

一种耐高温低形变的陶瓷架 Download PDF

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CN109456040A
CN109456040A CN201811478700.6A CN201811478700A CN109456040A CN 109456040 A CN109456040 A CN 109456040A CN 201811478700 A CN201811478700 A CN 201811478700A CN 109456040 A CN109456040 A CN 109456040A
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ceramic frame
high temperature
waxing
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王相飞
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Wuxi Japod Technology Co Ltd
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Abstract

本发明公开了一种耐高温低形变的陶瓷架，所述陶瓷架设有网格，所述陶瓷架所含原料为氧化镁0.3％，二氧化硅0.15％，氧化铝99.5％，粘结剂0.05％；本发明通过注浆成型、排蜡、两段烧结的过程，制得所述陶瓷架。本发明陶瓷架具有耐高温、低收缩率、成形率高等特点。

Description

一种耐高温低形变的陶瓷架
技术领域
本发明涉及陶瓷制品的加工技术领域，尤其是涉及一种耐高温、低形变、不易断裂的网格状陶瓷架。
背景技术
目前陶瓷制品应用较广的是陶瓷基片，为了提高产品性能，一般都研究将其制成超薄结构，以减轻产品重量，氧化铝陶瓷基片的配方一般采用99.9％纯度的氧化铝，经过原料配制、成型、烧结和磨加工等步骤，制成成品，但是传统的成型(流延和铸模)无法制成理想的厚度。
烧结是陶瓷制品生产过程中最关键的技术环节，一般的陶瓷制品多采用再窑炉中结合煅烧密切采用一次烧结工艺，但是这样存在一些问题，比如陶瓷找那个的增塑剂等不能顺利排出，一次烧结烧成合格率较低，因此选择合适的烧结工艺，对产品的成形和产品质量有着至关重要的影响。
发明内容
针对现有技术存在的上述问题，本发明申请人提供了一种一种耐高温低形变的陶瓷架。本发明采用网状结构减轻产品重量，同时经过排蜡、低温烧结和高温烧结等处理步骤，最终制得产品具有耐高温、低形变、不易断裂的优势。
本发明的技术方案如下：
一种耐高温低形变的陶瓷架，所述陶瓷架设有网格，所述陶瓷架所含原料为氧化镁0.3％，二氧化硅0.15％，氧化铝99.5％，粘结剂0.05％。
所述陶瓷架为方形。
所述陶瓷架的两个对角位置设有锥形脚，相对应的另外两个对角位置设有与锥形脚匹配的凹槽。
所述陶瓷架平行的两边上分别设有一个缺口。
一种耐高温低形变的陶瓷架的制备方法，所述制备方法包括如下步骤：
(1)将0.3％氧化镁、0.2％二氧化硅、0.05％粘结剂和99.5％氧化铝混合，采用注浆成型工艺制成陶瓷架坯料；
(2)将步骤(1)制成的坯料置于排蜡专用填料中，于200-240℃的烤箱中烘烤排蜡，排蜡时间为8-10h，排蜡完毕后冷却至室温；
(3)将步骤(2)排蜡处理坯料置于终烧专用填料中，在烧炉中，于800-900℃下，烧结5-7h；
(4)将步骤(3)处理的坯料再置于1700-1750℃条件下高温烧结12h；
(5)最终对烧结的坯料进行清洗，抛光处理，制得所述耐高温低形变的陶瓷架。
所述排蜡专用填料为400目的氧化铝。
所述终烧专用填料为200目高纯氧化铝粉。
一种耐高温低形变的陶瓷架的应用，所述陶瓷架用于高温制品烧结的托盘。
所述陶瓷架可以多层罗列，相近的两个陶瓷架的锥形脚与另一个陶瓷架的凹槽匹配，达到两个陶瓷架的稳定叠加。
发明有益的技术效果在于：
本发明采用网格结构的设置减轻产品质量，通过排蜡、两段烧结的工艺，制得的产品具有耐高温、低形变且不易断裂；
本发明在陶瓷架的两个角上设有两个圆锥状的脚，在后期应用时，利于热量的传输和待处理产品的受热均匀。
本发明采用排蜡专用填料和终烧专用填料，最终产品表面光滑，产品纯度较高。
本发明申请陶瓷架上锥形脚和凹槽的设计，使陶瓷架罗列时相互之间配合，具有较好的稳定性，同时节省空间，在后期作为托盘对其他产品进行加工提高效率、提高能源利用率。
附图说明
图1为本发明示意图。
具体实施方式
下面结合附图和实施例，对本发明进行具体描述。
实施例1
一种耐高温低形变的陶瓷架的制备方法，所述制备方法包括如下步骤：
(1)将0.3％氧化镁、0.2％二氧化硅、0.05％粘结剂和99.5％氧化铝混合，采用注浆成型工艺制成4×4的网格的方形陶瓷架坯料；所述陶瓷架的两个对角位置设有锥形脚；平行的两边上分别设有一个缺口；
(2)将步骤(1)制成的坯料置于为400目的氧化铝填料中，于200℃的烤箱中烘烤排蜡，排蜡时间为10h，排蜡完毕后冷却至室温；
(3)将步骤(2)排蜡处理坯料置于200目高纯氧化铝粉填料中，在烧炉中，于900℃下，烧结5h；
(4)将步骤(3)处理的坯料再置于1700℃条件下高温烧结12h；
(5)最终对烧结的坯料进行清洗，抛光处理，制得所述耐高温低形变的陶瓷架。最终产品形变率为17％。
实施例2
一种耐高温低形变的陶瓷架的制备方法，所述制备方法包括如下步骤：
(1)将0.3％氧化镁、0.2％二氧化硅、0.05％粘结剂和99.5％氧化铝混合，采用注浆成型工艺制成4×4的网格的方形陶瓷架坯料；所述陶瓷架的两个对角位置设有锥形脚；平行的两边上分别设有一个缺口；
(2)将步骤(1)制成的坯料置于为400目的氧化铝填料中，于240℃的烤箱中烘烤排蜡，排蜡时间为8h，排蜡完毕后冷却至室温；
(3)将步骤(2)排蜡处理坯料置于200目高纯氧化铝粉填料中，在烧炉中，于800℃下，烧结7h；
(4)将步骤(3)处理的坯料再置于1750℃条件下高温烧结12h；
(5)最终对烧结的坯料进行清洗，抛光处理，制得所述耐高温低形变的陶瓷架。最终产品形变率为17％。
实施例3
一种耐高温低形变的陶瓷架的制备方法，所述制备方法包括如下步骤：
(1)将0.3％氧化镁、0.2％二氧化硅、0.05％粘结剂和99.5％氧化铝混合，采用注浆成型工艺制成4×4的网格的方形陶瓷架坯料；所述陶瓷架的两个对角位置设有锥形脚；平行的两边上分别设有一个缺口；
(2)将步骤(1)制成的坯料置于为400目的氧化铝填料中，于220℃的烤箱中烘烤排蜡，排蜡时间为9h，排蜡完毕后冷却至室温；
(3)将步骤(2)排蜡处理坯料置于200目高纯氧化铝粉填料中，在烧炉中，于850℃下，烧结6h；
(4)将步骤(3)处理的坯料再置于1720℃条件下高温烧结12h；
(5)最终对烧结的坯料进行清洗，抛光处理，制得所述耐高温低形变的陶瓷架。最终产品形变率为16.5％。

Claims (9)

1.一种耐高温低形变的陶瓷架，其特征在于，所述陶瓷架设有网格，所述陶瓷架所含原料为氧化镁0.3％，二氧化硅0.15％，氧化铝99.5％，粘结剂0.05％。
2.根据权利要求1所述的陶瓷架，其特征在于，所述陶瓷架为方形。
3.根据权利要求2所述的陶瓷架，其特征在于，所述陶瓷架的两个对角位置设有锥形脚，相对应的另外两个对角位置设有与锥形脚匹配的凹槽。
4.根据权利要求2所述的陶瓷架，其特征在于，所述陶瓷架平行的两边上分别设有一个缺口。
5.一种权利要求1所述耐高温低形变的陶瓷架的制备方法，其特征在于，所述制备方法包括如下步骤：
(1)将0.3％氧化镁、0.2％二氧化硅、0.05％粘结剂和99.5％氧化铝混合，采用注浆成型工艺制成陶瓷架坯料；
(2)将步骤(1)制成的坯料置于排蜡专用填料中，于200-240℃的烤箱中烘烤排蜡，排蜡时间为8-10h，排蜡完毕后冷却至室温；
(3)将步骤(2)排蜡处理坯料置于终烧专用填料中，在烧炉中，于800-900℃下，烧结5-7h；
(4)将步骤(3)处理的坯料再置于1700-1750℃条件下高温烧结12h；
(5)最终对烧结的坯料进行清洗，抛光处理，制得所述耐高温低形变的陶瓷架。
6.根据权利要求5所述制备方法，其特征在于，所述排蜡专用填料为400目的氧化铝。
7.根据权利要求5所述的制备方法，其特征在于，所述终烧专用填料为200目高纯氧化铝粉。
8.一种权利要求1所述耐高温低形变的陶瓷架的应用，其特征在于，所述陶瓷架用于高温制品烧结的托盘。
9.根据权利要求8所述的应用，其特征在于，所述陶瓷架可以多层罗列，相近的两个陶瓷架的锥形脚与另一个陶瓷架的凹槽匹配，达到两个陶瓷架的稳定叠加。
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