CN109445170B - Color film substrate and manufacturing method thereof, liquid crystal display panel and display device - Google Patents

Color film substrate and manufacturing method thereof, liquid crystal display panel and display device Download PDF

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Publication number
CN109445170B
CN109445170B CN201811631862.9A CN201811631862A CN109445170B CN 109445170 B CN109445170 B CN 109445170B CN 201811631862 A CN201811631862 A CN 201811631862A CN 109445170 B CN109445170 B CN 109445170B
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filter layer
layer
width
filter
color
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CN109445170A (en
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张伟
李向峰
吴云飞
桂朝亭
王颖
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Chengdu BOE Display Technology Co Ltd
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Chengdu CEC Panda Display Technology Co Ltd
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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133514Colour filters
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133514Colour filters
    • G02F1/133516Methods for their manufacture, e.g. printing, electro-deposition or photolithography

Abstract

The invention provides a color film substrate, a manufacturing method thereof, a liquid crystal display panel and a display device, wherein the color film substrate comprises: the color filter layer comprises a first filter layer, a second filter layer and a third filter layer, extension parts extending towards the outer side of the black matrix layer are arranged on the first filter layer, the second filter layer and the third filter layer, the width of each extension part is smaller than that of any one of the first filter layer, the second filter layer and the third filter layer, and the distance between every two adjacent extension parts is larger than 15 micrometers. According to the color film substrate provided by the invention, the width of the black matrix layer is reduced to improve the transmittance of the liquid crystal display, and meanwhile, the problems that the line width of the color filter layer is measured incorrectly or the line width of the color filter layer cannot be detected are avoided.

Description

Color film substrate and manufacturing method thereof, liquid crystal display panel and display device
Technical Field
The invention relates to the technical field of display equipment, in particular to a color film substrate, a manufacturing method of the color film substrate, a liquid crystal display panel and a display device.
Background
With the development of display technology, flat panel display devices such as Liquid Crystal Displays (LCDs) have advantages of high image quality, power saving, thin body, and wide application range, and are therefore widely used in various consumer electronics products such as mobile phones, televisions, personal digital assistants, digital cameras, notebook computers, and desktop computers. The high transmittance of liquid crystal displays has become a major concern. A typical liquid crystal display panel includes a Color Filter (CF) substrate, a Thin Film Transistor (TFT) substrate (also referred to as an array substrate), and a Liquid Crystal (LC) located between the Color Filter substrate and the array substrate. The color film substrate comprises a substrate base plate, wherein a BM (black matrix) layer and color filter layers are formed on the substrate base plate, the color filter layers comprise a first filter layer, a second filter layer and a third filter layer, the black matrix layer defines a plurality of sub-pixel areas on the substrate base plate, and the first filter layer, the second filter layer and the third filter layer are distributed in the sub-pixel areas, namely the first filter layer, the second filter layer and the third filter layer are separated by the black matrix layer.
In order to increase the transmittance of the liquid crystal display, the aperture ratio of the black matrix layer in the color filter substrate is increased and the width of the black matrix layer is reduced. I.e. the width of the black matrix layer between the first, second and third filter layers is reduced.
However, the width of the black matrix layer is reduced, the distance between the first filter layer, the second filter layer and the third filter layer is reduced, when the line width of the color filter layer is automatically measured, it is difficult to grab the side of the color filter layer contacting the black matrix layer, and the line width measurement error of the color filter layer is easy to occur, or the line width of the color filter layer cannot be detected.
Disclosure of Invention
In view of the above, embodiments of the present invention provide a color filter substrate, a manufacturing method thereof, a liquid crystal display panel, and a display device, so as to solve the problem that when the line width of a color filter layer is automatically measured, since the width of a black matrix layer between a first filter layer, a second filter layer, and a third filter layer is reduced, a line width measurement error of the color filter layer is likely to occur, or the line width of the color filter layer cannot be detected.
In a first aspect, the present invention provides a color filter substrate, including: the color filter layer comprises a first filter layer, a second filter layer and a third filter layer, wherein the first filter layer, the second filter layer and the third filter layer are provided with extending parts extending towards the outer side of the black matrix layer, the width of each extending part is smaller than that of any one of the first filter layer, the second filter layer and the third filter layer, and the distance between the extending parts is larger than 15 mu m.
As an optional mode, in the color filter substrate provided by the present invention, the length of the extending portion is greater than or equal to 50 μm.
As an optional mode, in the color filter substrate provided by the present invention, the length of the extending portion is greater than or equal to 50 μm.
As an optional mode, in the color filter substrate provided by the present invention, the extension portions are respectively disposed on opposite sides of the first filter layer, the second filter layer, and the third filter layer in the length direction.
As an optional mode, in the color filter substrate provided by the present invention, the extension portion is rectangular.
As an optional mode, in the color filter substrate provided by the present invention, the first filter layer, the second filter layer, and the third filter layer are a red filter layer, a green filter layer, and a blue filter layer, respectively.
As an optional mode, in the color filter substrate provided by the present invention, a planarization layer and a spacer are disposed on the substrate, the planarization layer covers the black matrix layer and the color filter layer, and the spacer is disposed on the planarization layer.
In a second aspect, the present invention further provides a method for manufacturing the color film substrate, including;
the color filter comprises a substrate and a black matrix layer, wherein the black matrix layer, a first filter layer, a second filter layer and a third filter layer are sequentially formed on the substrate to form a color filter layer, extending portions extending towards the outer side of the black matrix layer are arranged on the first filter layer, the second filter layer and the third filter layer, the width of each extending portion is smaller than that of any one of the first filter layer, the second filter layer and the third filter layer, and the distance between the extending portions is larger than 15 mu m.
In a third aspect, the present invention also provides a liquid crystal display panel, including: the array substrate is provided.
In a fourth aspect, the present invention also provides a display device, comprising: the liquid crystal display panel is provided.
In the color film substrate, the manufacturing method thereof, the liquid crystal display panel and the display device provided by the embodiment of the invention, the extension parts are arranged on the first filter layer, the second filter layer and the third filter layer of the color film substrate, the extension parts on the first filter layer, the second filter layer and the third filter layer face the outer side of the black matrix layer, meanwhile, the width of the extension parts is smaller than that of any one of the first filter layer, the second filter layer and the third filter layer, and the distance between the adjacent extension parts is larger than 15 micrometers. Like this, when measuring the width of extension, because the interval between the colour layer satisfies the discernment demand of line width measuring equipment, so can not appear the phenomenon of mistake snatching the leading limit, only need snatch in first filter layer, second filter layer and the third filter layer relative two sides in the extension can. When the line width is automatically measured, the width detection of the third filter layer can be qualified. Similarly, the width of the first filter layer and the width of the second filter layer can be measured and monitored in the same manner. When the width of the black matrix layer is reduced to improve the transmittance of the liquid crystal display, the problem that the line width of the color filter layer is measured incorrectly or cannot be detected is solved.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, and it is obvious that the drawings in the following description are some embodiments of the present invention, and those skilled in the art can also obtain other drawings according to the drawings without creative efforts.
FIG. 1 is a schematic diagram of a capturing position during automatic measurement of line width of a color filter layer;
fig. 2 is a schematic structural diagram of a color film substrate according to a first embodiment of the present disclosure;
fig. 3 is a cross-sectional view of a black matrix layer and a color filter layer in a color filter substrate according to a first embodiment of the present invention;
fig. 4 is a flowchart of a manufacturing method of a color film substrate according to a second embodiment of the present invention;
fig. 5 is a schematic structural diagram of a liquid crystal display panel according to a third embodiment of the present invention.
Description of reference numerals:
100-color film substrate;
101-substrate base plate;
102-black matrix layer;
103-color filter layer;
1031 — first filter layer;
1032 — second filter layer;
1033 — a third filter layer;
1034 — an extension;
200-an array substrate;
300-layer of liquid crystal molecules.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention clearer, the technical solutions in the embodiments of the present invention will be described in more detail below with reference to the accompanying drawings in the preferred embodiments of the present invention. In the drawings, the same or similar reference numerals denote the same or similar components or components having the same or similar functions throughout. The described embodiments are only some, but not all embodiments of the invention. The embodiments described below with reference to the drawings are illustrative and intended to be illustrative of the invention and are not to be construed as limiting the invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
With the development of display technology, flat panel display devices such as Liquid Crystal Displays (LCDs) have advantages of high image quality, power saving, thin body, and wide application range, and are therefore widely used in various consumer electronics products such as mobile phones, televisions, personal digital assistants, digital cameras, notebook computers, and desktop computers. The high transmittance of liquid crystal displays has become a major concern. A typical liquid crystal display panel includes a Color Filter (CF) substrate, a Thin Film Transistor (TFT) substrate (also referred to as an array substrate), and a Liquid Crystal (LC) located between the Color Filter substrate and the array substrate. The color filter substrate 100 includes a substrate 101, a BM (black matrix) layer 102 and a color filter layer 103 are formed on the substrate 101, the color filter layer 103 includes a first filter layer 1031, a second filter layer 1032 and a third filter layer 1033, the black matrix layer 102 defines a plurality of sub-pixel regions on the substrate 101, and the first filter layer 1031, the second filter layer 1032 and the third filter layer 1033 are distributed in the sub-pixel regions, i.e., the first filter layer 1031, the second filter layer 1032 and the third filter layer 1033 are separated by the black matrix layer 102.
In order to increase the transmittance of the liquid crystal display, the aperture ratio of the black matrix layer 102 in the color filter substrate 100 is increased and the width of the black matrix layer 102 is decreased. I.e., the width of the black matrix layer 102 between the first filter layer 1031, the second filter layer 1032, and the third filter layer 1033.
However, the width of the black matrix layer 102 is reduced, and the distance between the first filter layer 1031, the second filter layer 1032 and the third filter layer 1033 is reduced accordingly, so that when the line width of the color filter layer 103 is automatically measured, it is difficult to capture the side of the color filter layer 103 contacting the black matrix layer 102, and an error in measuring the line width of the color filter layer 103 is likely to occur, or the line width of the color filter layer 103 cannot be detected. If the line widths of the first filter layer 1031, the second filter layer 1032 and the third filter layer 1033 are manually measured, the monitoring cannot be performed in time, and if misoperation occurs manually, bad products in batch are caused.
In general, the widths of the first, second, and third filter layers 1031, 1032, and 1033 may affect the exposure process, and the development time, temperature, and concentration, that is, the widths of the first, second, and third filter layers 1031, 1032, and 1033 are set according to the exposure process, and the development time, temperature, and concentration. Too small widths of the first, second, and third filter layers 1031, 1032, and 1033 may cause light leakage in the LCD, but too large widths of the first, second, and third filter layers 1031, 1032, and 1033 may cause color lamination. Therefore, measuring the widths of the first, second, and third filter layers 1031, 1032, and 1033 is an important inspection process in LCD manufacturing.
The measurement methods of the line widths of the first filter layer 1031, the second filter layer 1032 and the third filter layer 1033 are the same, and for convenience of description, the measurement of the line width of the second filter layer 1032 is taken as an example. Fig. 1 is a schematic diagram of a capturing position when the line width of a color filter layer is automatically measured. As shown in fig. 1, the width of the black matrix layer 102 between the first filter layer 1031, the second filter layer 1032 and the third filter layer 1033 is reduced, and when the line width of the second filter layer 1032 is automatically measured, two thick dotted line portions are correct capturing positions when the line width of the second filter layer 1032 is automatically measured, and the thick dotted line portion and the thick straight line portion on the uppermost side are wrong capturing positions (i.e., side edges of the second filter layer 1032) when the line width of the second filter layer 1032 is automatically measured. Wrong grabbing positions during automatic measurement of the line width of the second filter layer 1032 lead to wrong line width detection of the second filter layer 1032, and poor product batch performance can be caused.
In order to solve the above problems, the present invention provides a color filter substrate, a manufacturing method thereof, a liquid crystal display panel, and a display device, wherein the color filter substrate is provided with extension portions on a first filter layer, a second filter layer, and a third filter layer, the extension portions on the first filter layer, the second filter layer, and the third filter layer face the outer side of a black matrix layer, meanwhile, the width of the extension portions is smaller than that of any one of the first filter layer, the second filter layer, and the third filter layer, and the distance between adjacent extension portions is larger than 15 μm. Like this, when measuring the width of extension, because the interval between the colour layer satisfies the discernment demand of line width measuring equipment, so can not appear the phenomenon of mistake snatching the leading limit, only need snatch in first filter layer, second filter layer and the third filter layer relative two sides in the extension can. When the line width is automatically measured, the width detection of the third filter layer can be qualified. Similarly, the width of the first filter layer and the width of the second filter layer can be measured and monitored in the same manner. When the width of the black matrix layer is reduced to improve the transmittance of the liquid crystal display, the problem that the line width of the color filter layer is measured incorrectly or cannot be detected is solved.
Example one
Fig. 2 is a schematic structural diagram of a color film substrate according to a first embodiment of the present disclosure; fig. 3 is a cross-sectional view of a black matrix layer and a color filter layer in a color filter substrate according to a first embodiment of the invention. As shown in fig. 2 and fig. 3, the color filter substrate 100 provided in this embodiment includes: the color filter layer 103 comprises a first filter layer 1031, a second filter layer 1032 and a third filter layer 1033, wherein the first filter layer 1031, the second filter layer 1032 and the third filter layer 1033 are all provided with extension portions 1034 extending towards the outer side of the black matrix layer 102, the width of each extension portion 1034 is smaller than that of any one of the first filter layer 1031, the second filter layer 1032 and the third filter layer 1033, and the distance between every two adjacent extension portions 1034 is larger than 15 mu m.
Specifically, the black matrix layer 102 defines a plurality of sub-pixel regions on the substrate 101, and the first filter layer 1031, the second filter layer 1032 and the third filter layer 1033 are sequentially distributed in the sub-pixel regions. The extension portions 1034 are disposed on the first, second, and third filter layers 1031, 1032, and 1033, and the extension portions 1034 on the first, second, and third filter layers 1031, 1032, and 1033 all extend toward the outside of the black matrix layer 102, so that when the width of the extension portion 1034 is measured, since the distance between the color layers (the distance between the first, second, and third filter layers 1031, 1032, and 1033) satisfies the identification requirement of the line width measurement device, the phenomenon of mistakenly capturing leading edges does not occur, and only two opposite side edges of the extension portions 1034 in the first, second, and third filter layers 1031, 1032, and 1033 need to be captured.
It should be noted that, in the embodiment, the extension portions 1034 on the first filter layer 1031, the second filter layer 1032 and the third filter layer 1033 all extend towards the outside of the black matrix layer 102, which means that the extension portions 1034 extend along the longitudinal direction of the first filter layer 1031, the second filter layer 1032 and the third filter layer 1033 arranged side by side in fig. 2 and 3 so as to extend to the outside of the black matrix layer 102.
It should be noted that when the width of the black matrix layer 102 is less than 15 μm, when the line width measurement of the first filter layer 1031, the second filter layer 1032 and the third filter layer 1033 is performed, a capture position abnormality is likely to occur at the time of line width automatic measurement, thereby causing a measurement abnormality. In other words, the distance between the first filter layer 1031, the second filter layer 1032 and the extension portions 1034 on the third filter layer 1033 should also be larger than 15 μm, i.e. the pitch between adjacent extension portions 1034 is larger than 15 μm.
Further, the line widths of the first, second, and third filter layers 1031, 1032, and 1033 are characterized by measuring the widths of the extension portions 1034. The line widths of the first filter layer 1031, the second filter layer 1032, and the third filter layer 1033 are generally equal to each other. Therefore, the width of the extension portion 1034 is smaller than the width of any one of the first filter layer 1031, the second filter layer 1032 and the third filter layer 1033, so that the width of the extension portion 1034 is qualified in detection when the line width is automatically measured, that is, the width of the third filter layer 1033 is qualified in detection. Similarly, the width of the first filter layer 1031 and the width of the second filter layer 1032 can be measured and monitored in the same manner.
It should be noted that the width of the extension portion 1034 on the first filter layer 1031 and the width of the first filter layer 1031 may be in a first predetermined ratio, as long as the width of the extension portion 1034 is smaller than the width of any one of the first filter layer 1031, the second filter layer 1032 and the third filter layer 1033, and the distance between the adjacent extension portions 1034 is greater than 15 μm. By measuring the width of the extension portion 1034 in this way, the width of the first filter layer 1031 can be converted. Similarly, the width of the second filter layer 1032 and the width of the extension portion 1034 thereon may also be a second predetermined ratio, the width of the third filter layer 1033 and the width of the extension portion 1034 thereon may also be a third predetermined ratio, and the first predetermined ratio, the second predetermined ratio and the third predetermined ratio may be the same or different, and the embodiment is not limited herein.
In the color filter substrate 100 provided in this embodiment, the extension portions 1034 are disposed on the first, second, and third filter layers 1031, 1032, and 1033, and the extension portions 1034 on the first, second, and third filter layers 1031, 1032, and 1033 extend toward the outer side of the black matrix layer 102. Meanwhile, the width of the extension portion 1034 is smaller than any one of the first, second, and third filter layers 1031, 1032, and 1033, and the interval between the adjacent extension portions 1034 is greater than 15 μm. Thus, when measuring the width of the extension portion 1034 and when measuring the width of the extension portion 1034, since the distance between the color layers meets the identification requirement of the line width measuring equipment, the phenomenon of mistakenly grabbing the leading edge does not occur, and only two opposite side edges of the extension portion 1034 in the first filter layer 1031, the second filter layer 1032 and the third filter layer 1033 need to be grabbed. When the line width is automatically measured, the width of the extending portion 1034 is qualified, i.e., the width of the third filter layer 1033 is qualified. Similarly, the width of the first filter layer 1031 and the width of the second filter layer 1032 can be measured and monitored in the same manner. While the width of the black matrix layer 102 is reduced to improve the transmittance of the liquid crystal display, the problem that the line width of the color filter layer 103 is measured erroneously or cannot be detected is avoided.
In a possible implementation manner, in the color filter substrate 100 provided in this embodiment, the first filter layer 1031, the second filter layer 1032 and the third filter layer 1033 have extension portions 1034 on opposite sides in the length direction. In this way, the line widths of both ends of the first filter layer 1031, the second filter layer 1032, and the third filter layer 1033 can be measured. Optionally, the first filter layer 1031, the second filter layer 1032 and the extension portion 1034 at two ends of the third filter layer 1033 are symmetrically arranged. Distances between the upper side of the extending portion 1034 and the upper side of the first filter layer 1031 and between the lower side of the extending portion 1034 and the lower side of the first filter layer 1031 are equal, and the positions of the extending portion 1034 on the second filter layer 1032 and the third filter layer 1033 are the same as the positions of the extending portion 1034 on the first filter layer 1031, which is not described herein again.
In a specific implementation, in order to facilitate manufacturing the first filter layer 1031, the second filter layer 1032 and the third filter layer 1033, the extending portion 1034 of the color film substrate 100 provided in this embodiment is rectangular. Therefore, the function can be realized by arranging a rectangular through hole on the mask of a subsequent new product.
Further, in the color filter substrate 100 provided in this embodiment, the width of the extension portion 1034 is greater than or equal to 50 μm, and the length of the extension portion 1034 is greater than or equal to 50 μm. The corners of the manufactured extending portion 1034 are prevented from being oval, that is, the actual trial of the extending portion 1034 is that the corners are curved and cannot be measured.
Note that, in the present embodiment, the width of the black matrix layer 102, the width (also referred to as a line width) of the first filter layer 1031, the width (also referred to as a line width) of the second filter layer 1032, and the width (also referred to as a line width) of the third filter layer 1033 are all measured in the vertical direction in fig. 3; a longitudinal direction of the first filter layer 1031, a longitudinal direction of the second filter layer 1032, and a longitudinal direction of the third filter layer 1033 are left and right directions in fig. 3.
In a specific implementation, in the color filter substrate 100 provided in this embodiment, the first filter layer 1031, the second filter layer 1032 and the third filter layer 1033 are a red filter layer (R), a green filter layer (G) and a blue filter layer (B), respectively.
In a specific implementation, in the color filter substrate 100 provided in this embodiment, a planarization layer and a spacer (not shown in the figure) are disposed on the substrate 101, the planarization layer covers the black matrix layer 102 and the color filter layer 103, and the spacer is disposed on the planarization layer.
The structure of the flat layer and the spacer is the structure commonly used for the flat layer and the spacer in the prior art, and this embodiment is not limited herein.
Example two
Fig. 4 is a flowchart of a manufacturing method of a color filter substrate according to a second embodiment of the present invention. As shown in fig. 4, the present embodiment provides a method for manufacturing a color filter substrate according to the foregoing embodiment, including the following steps;
first, a black matrix layer 102 is formed on a base substrate 101.
Before the black matrix layer 102 is formed on the base substrate 101, it is cleaned by a cleaning machine.
Specifically, the black matrix layer 102 formed on the base substrate 101 may be:
sputtering a black film on the substrate 101, wherein the black film is mainly a black pigment film;
coating photoresist on the black film and pre-baking to form a photoresist layer;
the photoresist layer is exposed and developed in sequence,
etching the black film according to the development result; and
the black film is subjected to photoresist stripping, and a black matrix layer 102 is formed, wherein the black matrix layer 102 is used for light shielding.
And secondly, sequentially generating a first filter layer 1031, a second filter layer 1032 and a third filter layer 1033 on the substrate 101 to form the color filter layer 103, wherein the first filter layer 1031, the second filter layer 1032 and the third filter layer 1033 are all provided with an extension portion 1034 extending towards the outer side of the black matrix layer 102, the width of the extension portion 1034 is smaller than that of any one of the first filter layer 1031, the second filter layer 1032 and the third filter layer 1033, and the distance between the adjacent extension portions 1034 is larger than 15 μm.
Here, the first filter layer 1031, the second filter layer 1032, and the third filter layer 1033 are a red filter layer, a green filter layer, and a blue filter layer, respectively.
It can be understood that, in this embodiment, a mask plate is also required to be manufactured. The mask includes a mask main body portion and a mask extension portion, and the shape of the mask main body portion matches the shape of the first filter layer 1031, the second filter layer 1032, or the third filter layer 1033, and the shape of the extension portion 1034 of the mask extension portion matches.
Specifically, sequentially generating the first filter layer 1031, the second filter layer 1032, and the third filter layer 1033 on the substrate 101 may include:
coating red photoresist on the black matrix layer 102, and pre-baking;
exposing the red photoresist through the manufactured mask plate;
developing and etching to form a red filter layer;
and repeating the steps to form a green filter layer and a blue filter layer in sequence.
Optionally, the method further comprises forming a planarization layer on the black matrix layer 102 and the color filter layer 103,
and forming a spacer on the flat layer.
The specific steps of forming the planarization layer and forming the spacers are not limited in this embodiment.
In the method for manufacturing the color filter substrate 100 provided in this embodiment, the color filter substrate 100 is provided with the extension portions 1034 on the first, second and third filter layers 1031, 1032 and 1033, and the extension portions 1034 on the first, second and third filter layers 1031, 1032 and 1033 extend toward the outer side of the black matrix layer 102. Meanwhile, the width of the extension portion 1034 is smaller than any one of the first, second, and third filter layers 1031, 1032, and 1033, and the interval between the adjacent extension portions 1034 is greater than 15 μm. Thus, when measuring the width of the extension portion 1034, since the distance between the color layers satisfies the identification requirement of the line width measuring device, the phenomenon of mistakenly grabbing the leading edge does not occur, and only two opposite side edges of the extension portion 1034 in the first filter layer 1031, the second filter layer 1032 and the third filter layer 1033 need to be grabbed. When the line width is automatically measured, the width of the third filter layer 1033 can be qualified. Similarly, the width of the first filter layer 1031 and the width of the second filter layer 1032 can be measured and monitored in the same manner. While the width of the black matrix layer 102 is reduced to improve the transmittance of the liquid crystal display, the problem that the line width of the color filter layer 103 is measured erroneously or cannot be detected is avoided.
EXAMPLE III
Fig. 5 is a schematic structural diagram of a liquid crystal display panel according to a third embodiment of the present invention. As shown in fig. 5, the present embodiment provides a liquid crystal display panel, including: the color filter substrate 100 provided in the above embodiments.
Specifically, the liquid crystal display panel includes a color film substrate 100, an array substrate 200, and a liquid crystal molecular layer 300 located between the color film substrate 100 and the array substrate 200. Specifically, the color filter substrate 100 is disposed opposite to the array substrate 200, and the liquid crystal molecular layer 300 is located between the color filter substrate 100 and the array substrate 200.
The color film substrate 100 is the color film substrate 100 provided in the above embodiments.
The structure and the working principle of the color filter substrate 100 are described in detail in the above embodiments, which are not repeated herein.
Example four
The present embodiment provides a display device including: the liquid crystal display panel provided by the embodiment is provided.
The structure and the working principle of the color film substrate 100 in the liquid crystal display panel are described in detail in the above embodiments, which are not repeated herein.
The display device provided by this embodiment may be a product or a component having a display function, such as a mobile phone, a tablet computer, a television, a display, an electronic book, electronic paper, a smart watch, a notebook computer, a digital photo frame, or a navigator.
In the description of the present invention, it is to be understood that the terms "outer sidewall" and the like indicate orientations or positional relationships based on those shown in the drawings only for convenience in describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present invention.
In the description of the present invention, "a plurality" means a plurality, e.g., two, four, etc., unless specifically limited otherwise.
Furthermore, in the description of the specification, the terms "first", "second", and "third" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicit to a number of technical features indicated. Thus, features defined as "first", "second", "third" may explicitly or implicitly include one or more of the features.
In the description, unless expressly stated or limited otherwise, the first feature "on" the second feature may include the first and second features being in direct contact, or may include the first and second features not being in direct contact but being in contact with each other by way of additional features between them.
In the present invention, unless otherwise expressly stated or limited, the terms "comprises," "comprising," and "having," and any variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, system, article, or apparatus that comprises a list of steps or elements is not necessarily limited to those steps or elements expressly listed, but may include other steps or elements not expressly listed or inherent to such process, method, article, or apparatus.
In the present invention, unless otherwise specifically stated, the terms "mounted," "connected," "fixed," and the like are to be understood broadly, and for example, may be fixedly connected, detachably connected, or integrally formed, mechanically connected, electrically connected, or communicable with each other; they may be directly connected or indirectly connected through an intermediate medium, or they may be connected internally or in any other manner known to those skilled in the art, unless otherwise specifically limited. The specific meanings of the above terms in the present invention can be understood by those skilled in the art according to specific situations.
Finally, it should be noted that: the above embodiments are only used to illustrate the technical solution of the present invention, and not to limit the same; while the invention has been described in detail and with reference to the foregoing embodiments, it will be understood by those skilled in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some or all of the technical features may be equivalently replaced; and the modifications or the substitutions do not make the essence of the corresponding technical solutions depart from the scope of the technical solutions of the embodiments of the present invention.

Claims (9)

1. A color filter substrate, comprising: the color filter layer comprises a first filter layer, a second filter layer and a third filter layer, and is characterized in that the first filter layer, the second filter layer and the third filter layer are respectively provided with an extending part extending towards the outer side of the black matrix layer, the width of the extending part is smaller than that of any one of the first filter layer, the second filter layer and the third filter layer, and the distance between the adjacent extending parts is larger than 15 mu m;
the width of the extension part on the first filter layer is in a first preset proportion with the width of the first filter layer; the width of the extending part on the second filter layer is in a second preset proportion with the width of the second filter layer; the width of the extension part on the third filter layer is in a third preset proportion with the width of the third filter layer;
the width of the extension is greater than or equal to 50 μm.
2. The color filter substrate according to claim 1, wherein the length of the extension portion is greater than or equal to 50 μm.
3. The color filter substrate according to claim 1, wherein the first filter layer, the second filter layer and the third filter layer each have the extension portions on opposite sides in a length direction.
4. The color filter substrate according to claim 1, wherein the extension portion is rectangular.
5. The color filter substrate of claim 1, wherein the first, second and third filter layers are red, green and blue filter layers, respectively.
6. The color filter substrate according to claim 1, wherein a planarization layer and a spacer are disposed on the substrate, the planarization layer covers the black matrix layer and the color filter layer, and the spacer is disposed on the planarization layer.
7. A method for manufacturing a color filter substrate according to any one of claims 1 to 6, comprising;
the color filter comprises a substrate and a black matrix layer, wherein the black matrix layer, a first filter layer, a second filter layer and a third filter layer are sequentially formed on the substrate to form a color filter layer, extending portions extending towards the outer side of the black matrix layer are arranged on the first filter layer, the second filter layer and the third filter layer, the width of each extending portion is smaller than that of any one of the first filter layer, the second filter layer and the third filter layer, and the distance between the extending portions is larger than 15 mu m.
8. A liquid crystal display panel, comprising: the color filter substrate of any of claims 1-6.
9. A display device, comprising: the liquid crystal display panel of claim 8.
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Address after: No. 1778, Qinglan Road, Huangjia Street, Shuangliu District, Chengdu, Sichuan 610200

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Address before: No. 1778, Qinglan Road, Gongxing street, Shuangliu District, Chengdu, Sichuan 610200

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