CN109411370B - 一种倒装焊芯片的htcc系统级封装结构及封装方法 - Google Patents
一种倒装焊芯片的htcc系统级封装结构及封装方法 Download PDFInfo
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- 238000003466 welding Methods 0.000 claims description 45
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- 229910045601 alloy Inorganic materials 0.000 claims description 10
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- 238000003491 array Methods 0.000 claims 1
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- 230000017525 heat dissipation Effects 0.000 abstract description 7
- 230000010354 integration Effects 0.000 abstract description 6
- 238000013461 design Methods 0.000 abstract description 4
- 239000000919 ceramic Substances 0.000 abstract description 3
- 239000002184 metal Substances 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 8
- 238000007789 sealing Methods 0.000 description 5
- 230000002093 peripheral effect Effects 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 2
- 238000002955 isolation Methods 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
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Abstract
本发明涉及一种倒装焊芯片的HTCC系统级封装结构及封装方法,尤其涉及一种适用于大功耗倒装焊芯片的HTCC一体化系统级封装结构,所述的大功耗是指倒装焊芯片的功耗不小于10W,属于系统级封装技术领域。本发明的一种适用于大功耗倒装焊芯片的数模混合高集成度HTCC一体化系统级封装结构,与现有封装结构相比,既解决了大功耗芯片散热、倒装焊和金丝键合工艺兼容的难题,又通过双密封腔体设计提高了系统集成度;满足星载数字类陶瓷系统级封装的需求,有较强的实用性和广阔的市场应用前景。
Description
技术领域
本发明涉及一种倒装焊芯片的HTCC系统级封装结构及封装方法,尤其涉及一种适用于大功耗倒装焊芯片的HTCC一体化系统级封装结构,所述的大功耗是指倒装焊芯片的功耗不小于10W,属于系统级封装技术领域。
背景技术
近年来,面对宇航载荷越来越严苛的重量、体积以及自主可控的要求,系统级封装(System in Package,SiP)技术为实现载荷集成化、小型化、轻量化提供了一条有效的解决途径。由于高温共烧陶瓷(HTCC)具有结构强度高、热导率高、化学稳定性好和布线密度高等优点,在星载数字类系统及封装电路中广泛应用。目前常用的封装结构为HTCC一体化封装结构,HTCC作为封装和元器件互联的基板,HTCC底面制作阵列引脚,通过直插或表贴的方式焊接到印制板上。星载数字类系统级封装的基本结构如图1所示。主要包括HTCC基板、围框,盖板、引脚等。
随着星载系统级封装电路功能越来越复杂对封装形式多样性的要求。复杂的电路功能需要更高密度的集成式封装结构;多种芯片的使用需要封装结构能够兼容键合(Wire-Bonding)、倒装焊(Flip-Chip)、焊接、粘接等多种封装工艺的混合使用;大功耗芯片的使用需要封装结构提供良好的散热路径;数模混合一体化及更高的使用频率需要优化的基板布局布线设计。
由于HTCC工艺下的倒装焊芯片安装后需要做底部填充,填充物会挥发有机气体,破坏密封腔体内部气氛,影响其余芯片可靠性,并且对于大功耗倒装芯片,需要保证有良好的散热路径,因此现有的方式是将倒装焊芯片独立放置在HTCC基板的正面,并且不再放置其余芯片,仅倒装焊芯片就占用了基板的主要区域,系统集成度较低,无法满足复杂系统电路集成的需求。
发明内容
本发明的技术解决问题是:克服现有技术的不足,提出一种倒装焊芯片的HTCC系统级封装结构及封装方法。
本发明的技术解决方案是:
一种倒装焊芯片的HTCC系统级封装结构,该封装结构包括HTCC基板、上腔体围框、上腔体盖板、下腔体围框、下腔体盖板、CGA引脚阵列和散热片;
散热片和上腔体盖板并排放置在HTCC基板的上方,HTCC基板和散热片之间为倒装焊芯片的安装区域,在HTCC基板和上腔体盖板之间安装上腔体围框,即HTCC基板、上腔体盖板和上腔体围框一起形成一个密闭的空腔;CGA引脚阵列的中心带有空腔,下腔体盖板位于CGA引脚阵列的中心空腔内,CGA引脚阵列和下腔体盖板位于HTCC基板的下表面,在HTCC基板和下腔体盖板之间安装下腔体围框,即HTCC基板、下腔体盖板和下腔体围框一起形成一个密闭的空腔。
一种倒装焊芯片的HTCC系统级封装结构的制备方法,该方法的步骤包括:
(1)制备HTCC基板,要求HTCC基板的长和宽分别为35-60mm,厚度为2-4mm,倒装焊芯片安装区域平面度不大于30μm;
(2)制备上腔体围框和下腔体围框,要求上腔体围框的高度为1.5-3mm,下腔体围框的高度为1.5-2mm;上腔体围框和下腔体围框的壁厚均为1-2mm,上腔体围框和下腔体围框的材料均为可伐合金;
(3)制备上腔体盖板和下腔体盖板,上腔体盖板和下腔体盖板的材料均为可伐合金,上腔体盖板和下腔体盖板的厚度均为0.1-0.5mm;
(4)制备CGA引脚阵列,CGA引脚阵列的材料为Sn20Pb80,CGA引脚阵列中焊柱的直径为0.45-0.60mm,焊柱的高度为2-3mm;CGA引脚阵列中焊柱的排布方式为:Pitch为1.0mm,焊柱的总数量为860个;
(5)制备散热片,散热片的材料为AlSiC,厚度为0.5-2.0mm;
(6)在HTCC基板的下表面的中心区域焊接下腔体围框,在HTCC基板位于下腔体围框内部的区域安装芯片或表贴元件,然后在下腔体围框的下面安装下腔体盖板,下腔体围框的四周安装CGA引脚阵列6;
(7)将HTCC基板的上表面分为左右两部分,在HTCC基板的上表面的做部分并排安装两个倒装焊芯片,然后在HTCC基板的上表面右部分焊接上腔体围框,在HTCC基板位于上腔体围框内部的区域安装芯片或表贴元件,最后在上腔体围框上面安装上腔体盖板,得到倒装焊芯片的HTCC系统级封装结构。
有益效果
(1)HTCC基板作为芯片的互联基板、封装体、无源元件集成载体,长和宽尺寸要求在35-60mm范围,厚度要求在2-4mm范围。基板尺寸过大或过厚,会使封装的重量增大,力学性能较差;基板尺寸过小,会使芯片散热比较集中,散热能力较差;基板厚度过小,其承载能力较差。针对工作频率高达400MHz的复杂数模混合电路,基板层叠设计为信号层与平面层间隔设计,对平面层的数字模拟电路区域进行分割,对数字与模拟信号引脚区域进行划分,布线进行阻抗控制等方式提高电路性能;
(2)HTCC基板的上表面作为主要的芯片安装面,将其分为两个部分,分别作为倒装焊(Flip-Chip)芯片安装区域和密封区域分别设计。倒装焊(Flip-Chip)芯片安装区域采用非气密封装方式,便于在裸芯片的被动面安装散热片,从而可满足高达10W功耗的倒装焊芯片的散热需求;倒装焊(Flip-Chip)区域仅占用42mm×19mm的区域便可放置共计有多达7800多个凸点的倒装焊芯片;密封区域焊接可伐金属围框,可伐金属围框壁为1-2mm,可保证围框与基板的充分接触,通过平行缝焊或熔缝的方式实现金属围框内区域的气密封装,有效保护区域内部键合点的可靠性;
(3)HTCC基板的下表面作为CGA引脚阵列安装面和另一密封区域。下表面中心区域焊接可伐金属围框,通过平行缝焊或熔缝的方式实现金属围框内区域的气密封装,有效提高封装的集成度;下表面的四周区域焊接材料为Sn20Pb80的CGA引脚阵列,CGA引脚阵列6中焊柱的直径为0.45-0.60mm,焊柱的高度为2-3mm,焊柱排布的Pitch为1.0mm时,最多可放置860个。
(4)本发明的一种适用于大功耗倒装焊芯片的数模混合高集成度HTCC一体化系统级封装结构,与现有封装结构相比,既解决了大功耗芯片散热、倒装焊和金丝键合工艺兼容的难题,又通过双密封腔体设计提高了系统集成度;满足星载数字类陶瓷系统级封装的需求,有较强的实用性和广阔的市场应用前景。
附图说明
图1为现有星载数字类系统级封装的基本结构示意图;
图2为本发明的封装结构示意图;
图3为本发明的封装结构的爆炸结构示意图。
具体实施方式
一种倒装焊芯片的HTCC系统级封装结构,该封装结构包括HTCC基板1、上腔体围框2、上腔体盖板3、下腔体围框4、下腔体盖板5、CGA引脚阵列6和散热片7;
散热片7和上腔体盖板3并排放置在HTCC基板1的上方,HTCC基板1和散热片7之间为倒装焊芯片的安装区域,在HTCC基板1和上腔体盖板3之间安装上腔体围框2,即HTCC基板1、上腔体盖板3和上腔体围框2一起形成一个密闭的空腔;CGA引脚阵列6的中心带有空腔,下腔体盖板5位于CGA引脚阵列6的中心空腔内,CGA引脚阵列6和下腔体盖板5位于HTCC基板1的下表面,在HTCC基板1和下腔体盖板5之间安装下腔体围框4,即HTCC基板1、下腔体盖板5和下腔体围框4一起形成一个密闭的空腔。
一种倒装焊芯片的HTCC系统级封装结构的制备方法,该方法的步骤包括:
(1)制备HTCC基板1,要求HTCC基板1的长和宽分别为35-60mm,厚度为2-4mm,倒装焊芯片安装区域平面度不大于30μm;
(2)制备上腔体围框2和下腔体围框4,要求上腔体围框2的高度为1.5-3mm,下腔体围框4的高度为1.5-2mm;上腔体围框2和下腔体围框4的壁厚均为1-2mm,上腔体围框2和下腔体围框4的材料均为可伐合金;
(3)制备上腔体盖板3和下腔体盖板5,上腔体盖板3和下腔体盖板5的材料均为可伐合金,上腔体盖板3和下腔体盖板5的厚度均为0.1-0.5mm;
(4)制备CGA引脚阵列6,CGA引脚阵列6的材料为Sn20Pb80,CGA引脚阵列6中焊柱的直径为0.45-0.60mm,焊柱的高度为2-3mm;CGA引脚阵列6中焊柱的排布方式为:Pitch为1.0mm,焊柱的总数量为860个;
(5)制备散热片7,散热片7的材料为AlSiC,厚度为0.5-2.0mm;
(6)在HTCC基板1的下表面的中心区域焊接下腔体围框4,在HTCC基板1位于下腔体围框4内部的区域安装芯片或表贴元件,然后在下腔体围框4的下面安装下腔体盖板5,下腔体围框4的四周安装CGA引脚阵列6;
(7)将HTCC基板1的上表面分为左右两部分,在HTCC基板1的上表面的做部分并排安装两个倒装焊芯片,然后在HTCC基板1的上表面右部分焊接上腔体围框2,在HTCC基板1位于上腔体围框2内部的区域安装芯片或表贴元件,最后在上腔体围框2上面安装上腔体盖板3,得到倒装焊芯片的HTCC系统级封装结构。
如图2和3所示,本发明的封装结构包括HTCC基板1、上腔体围框2、上腔体盖板3、下腔体围框4、下腔体盖板5、CGA引脚阵列6、散热片7。HTCC基板1的上表面分为两个区域:分别为上腔体围框2安装区域和倒装焊芯片安装区域8;HTCC基板1的下表面中心区域焊接下腔体围框4,下腔体围框4的四周区域通过CGA引脚阵列6实现与PCB的电互联和机械互联;上腔体盖板3焊接在上腔体围框2上;下腔体盖板5焊接在下腔体围框4上。
实施例
如图2和图3所示,一种倒装焊芯片的HTCC系统级封装结构,该封装结构包括HTCC基板1、上腔体围框2、上腔体盖板3、下腔体围框4、下腔体盖板5、CGA引脚阵列6和散热片7;
散热片7和上腔体盖板3并排放置在HTCC基板1的上表面,HTCC基板1和散热片7之间为倒装焊芯片的安装区域,在HTCC基板1和上腔体盖板3之间安装上腔体围框2,即HTCC基板1、上腔体盖板3和上腔体围框2一起形成一个密闭的空腔;CGA引脚阵列6的中心带有空腔,下腔体盖板5安装在CGA引脚阵列6的中心空腔内,CGA引脚阵列6和下腔体盖板5位于HTCC基板1的下表面,在HTCC基板1和下腔体盖板5之间安装下腔体围框4,即HTCC基板1、下腔体盖板5和下腔体围框4一起形成一个密闭的空腔。
一种倒装焊芯片的HTCC系统级封装结构的制备方法,该方法的步骤包括:
(1)制备HTCC基板1,HTCC基板1的长和宽均为45mm,厚度为4.0mm,倒装焊芯片安装区域平面度不大于30μm;
(2)制备上腔体围框2和下腔体围框4,上腔体围框2的高度为1.8mm,外径尺寸为42.0×21.5mm,壁厚为1mm;下腔体围框4的高度为1.5mm,外径尺寸为24.8×24.8mm,壁厚为1.3mm;上腔体围框2和下腔体围框4的材料均为可伐合金;
(3)制备上腔体盖板3和下腔体盖板5,上腔体盖板3和下腔体盖板5的材料均为可伐合金,上腔体盖板3和下腔体盖板5的总厚度均为0.4mm,四周焊接区域厚度均为0.1mm。
(4)制备CGA引脚阵列6,CGA引脚阵列6的材料为Sn20Pb80,CGA引脚阵列6中焊柱的直径为0.51mm,焊柱的高度为2.54mm;CGA引脚阵列6中焊柱的排布方式为:Pitch为1.0mm,焊柱的总数量为860个;
(5)制备散热片7,散热片7的材料为AlSiC,散热片7的尺寸为42.0×20.0mm,厚度为1.2mm;
(6)在HTCC基板1的下表面的中心区域焊接下腔体围框4,在HTCC基板1位于下腔体围框4内部的区域安装芯片或表贴元件,然后在下腔体围框4的下面安装下腔体盖板5,下腔体围框4的四周安装CGA引脚阵列6;
(7)将HTCC基板1的上表面分为左右两部分,在HTCC基板1的上表面的做部分并排安装两个倒装焊芯片,然后在HTCC基板1的上表面右部分焊接上腔体围框2,在HTCC基板1位于上腔体围框2内部的区域安装芯片或表贴元件,最后在上腔体围框2上面安装上腔体盖板3,得到倒装焊芯片的HTCC系统级封装结构。
得到的上述的封装结果具备如下优点:
(1)HTCC基板1的长和宽均为45mm,整个系统级封装面积缩小了70%以上;厚度为4.0mm,系统级封装结构的总重量约为48±2g,经试验考核满足GJB2438A中机械冲击和恒定加速度的相关要求;
(2)基板层叠设计为信号层与平面层间隔设计,对平面层的数字模拟电路区域进行分割,对数字与模拟信号引脚区域进行划分,布线进行阻抗控制等方式提高电路性能;经测试,在400MHz工作条件下,模拟通道间的信号隔离度>75dB,数字与模拟信号间的隔离度>65dB;
(3)倒装焊(Flip-Chip)芯片安装区域安装两片复旦电子JFM4VSX55倒装焊裸芯片,凸点数共计达到7806个;倒装焊芯片安装区域采用非气密封装方式,在裸芯片的被动面安装散热片7,散热片7的材料为AlSiC,尺寸为42.0×20.0mm,厚度为1.2mm;当倒装焊芯片的总功耗为10W时,经散热分析得出,系统级封装内部芯片最高温升为15.2℃,系统级封装在单板级应用时,内部芯片最高结温满足一级降额要求;
(4)密封区域焊接可伐金属围框,可伐金属围框壁为1-2mm,可保证围框与基板的充分接触,通过平行缝焊或熔缝的方式实现金属围框内区域的气密封装,经试验考核满足GJB2438A中密封的相关要求,有效保护区域内部键合点的可靠性;
(5)CGA引脚阵列6的材料为Sn20Pb80,CGA引脚阵列6中焊柱的直径为0.51mm,焊柱的高度为2.54mm;CGA引脚阵列6中焊柱的排布方式为:Pitch为1.0mm,焊柱的总数量为860个;经力学仿真分析得出,系统级封装在单板级应用时,焊柱的最大受力约为26MPa,满足单机力学考核条件。
Claims (1)
1.一种倒装焊芯片的HTCC系统级封装结构,其特征在于:该封装结构包括HTCC基板(1)、上腔体围框(2)、上腔体盖板(3)、下腔体围框(4)、下腔体盖板(5)、CGA引脚阵列(6)和散热片(7);
散热片(7)和上腔体盖板(3)并排放置在HTCC基板(1)的上方,在HTCC基板(1)和上腔体盖板(3)之间安装上腔体围框(2),CGA引脚阵列(6)的中心带有空腔,下腔体盖板(5)位于CGA引脚阵列(6)的中心空腔内,CGA引脚阵列(6)和下腔体盖板(5)位于HTCC基板(1)的下表面,在HTCC基板(1)和下腔体盖板(5)之间安装下腔体围框(4);
HTCC基板(1)和散热片(7)之间为倒装焊芯片的安装区域,倒装焊芯片安装区域平面度不大于30μm;
HTCC基板(1)的长和宽分别为35-60mm,厚度为2-4mm;
上腔体围框(2)的高度为1.5-3mm,下腔体围框(4)的高度为1.5-2mm;上腔体围框(2)和下腔体围框(4)的壁厚均为1-2mm,上腔体围框(2)和下腔体围框(4)的材料均为可伐合金;
上腔体盖板(3)和下腔体盖板(5)的材料均为可伐合金,上腔体盖板(3)和下腔体盖板(5)的厚度均为0.1-0.5mm;
CGA引脚阵列(6)的材料为Sn20Pb80,CGA引脚阵列(6)中焊柱的直径为0.45-0.60mm,焊柱的高度为2-3mm;
CGA引脚阵列(6)中焊柱的排布方式为:Pitch为1.0mm,焊柱的总数量为860个;
散热片(7)的材料为AlSiC,厚度为0.5-2.0mm;
该倒装焊芯片的HTCC系统级封装结构的制备方法,步骤包括:
(1)制备HTCC基板(1)、上腔体围框(2)、下腔体围框(4)、上腔体盖板(3)、下腔体盖板(5)、CGA引脚阵列(6)和散热片(7);
(2)在HTCC基板(1)的下表面的中心区域焊接下腔体围框(4),在HTCC基板(1)位于下腔体围框(4)内部的区域安装芯片或表贴元件,然后在下腔体围框(4)的下面安装下腔体盖板(5),下腔体围框(4)的四周安装CGA引脚阵列(6);
(3)将HTCC基板(1)的上表面分为左右两部分,在HTCC基板(1)的上表面的做部分并排安装两个倒装焊芯片,然后在HTCC基板(1)的上表面右部分焊接上腔体围框(2),在HTCC基板(1)位于上腔体围框(2)内部的区域安装芯片或表贴元件,最后在上腔体围框(2)上面安装上腔体盖板(3),得到倒装焊芯片的HTCC系统级封装结构;
所述的步骤(1)中,HTCC基板(1)的长和宽分别为35-60mm,厚度为2-4mm,倒装焊芯片安装区域平面度不大于30μm;上腔体围框(2)的高度为1.5-3mm,下腔体围框(4)的高度为1.5-2mm;上腔体围框(2)和下腔体围框(4)的壁厚均为1-2mm,上腔体围框(2)和下腔体围框(4)的材料均为可伐合金;上腔体盖板(3)和下腔体盖板(5)的材料均为可伐合金,上腔体盖板(3)和下腔体盖板(5)的厚度均为0.1-0.5mm;CGA引脚阵列(6)的材料为Sn20Pb80,CGA引脚阵列(6)中焊柱的直径为0.45-0.60mm,焊柱的高度为2-3mm;CGA引脚阵列(6)中焊柱的排布方式为:Pitch为1.0mm,焊柱的总数量为860个;散热片(7)的材料为AlSiC,厚度为0.5-2.0mm。
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