CN109405734A - Quick high accuracy plane parallelism measurement device and measurement method - Google Patents
Quick high accuracy plane parallelism measurement device and measurement method Download PDFInfo
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- CN109405734A CN109405734A CN201811531180.0A CN201811531180A CN109405734A CN 109405734 A CN109405734 A CN 109405734A CN 201811531180 A CN201811531180 A CN 201811531180A CN 109405734 A CN109405734 A CN 109405734A
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- 238000005259 measurement Methods 0.000 title claims abstract description 67
- 238000000691 measurement method Methods 0.000 title claims abstract description 19
- 238000005070 sampling Methods 0.000 claims abstract description 33
- 230000003321 amplification Effects 0.000 claims abstract description 13
- 238000003199 nucleic acid amplification method Methods 0.000 claims abstract description 13
- 230000007246 mechanism Effects 0.000 claims abstract description 8
- 230000015572 biosynthetic process Effects 0.000 claims abstract description 5
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims description 31
- 238000006243 chemical reaction Methods 0.000 claims description 15
- 230000005684 electric field Effects 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 9
- 230000008569 process Effects 0.000 claims description 6
- 239000003990 capacitor Substances 0.000 claims description 5
- 238000013341 scale-up Methods 0.000 claims description 4
- 230000003252 repetitive effect Effects 0.000 claims description 3
- 230000009466 transformation Effects 0.000 claims description 3
- 239000000203 mixture Substances 0.000 claims description 2
- 239000000463 material Substances 0.000 abstract description 5
- 239000011521 glass Substances 0.000 abstract description 3
- 239000002184 metal Substances 0.000 abstract description 3
- 229910052755 nonmetal Inorganic materials 0.000 abstract description 3
- 230000001276 controlling effect Effects 0.000 description 14
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- 230000003287 optical effect Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 238000005188 flotation Methods 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 230000013632 homeostatic process Effects 0.000 description 1
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Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
- G01B7/34—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring roughness or irregularity of surfaces
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- Measurement Of Resistance Or Impedance (AREA)
Abstract
The invention discloses a kind of quick high accuracy plane parallelism measurement device and measurement method, measuring device includes measuring mechanism, charge amplification difference self-adjusting gain sample circuit and controlling of sampling and primary processor；Measurement method includes: the setting of (I) device, the formation of (II) equivalent circuit, (III) measurement and (IV) calibration.The present invention provides a kind of quick high accuracy parallelism measuring apparatus and measurement methods, by the positional relationship between central electrode and tested target, it is able to achieve the Quick Polar high-precision measuring of the depth of parallelism, is suitable for any plane, no matter planar materials in addition glass plate it is transparent unilateral.There is wide application, usability is stronger；Metal sheet plane can be measured directly, and non-metal board can be by being tested target, and non-contact measurement avoids the scuffing on surface, be able to achieve the quick of the depth of parallelism, very high degree of precision measurement measurement.
Description
Technical field
The present invention relates to a kind of plane parallelism measurement device and measurement methods, and in particular to a kind of quick high accuracy plane
Parallelism measuring apparatus and measurement method.
Background technique
In optical manufacturing and field of machining, it is often necessary to working flat plate glass such as optical window, optical filter, plane mirror
Elements are waited, a kind of high-precision configuration part can be also processed in machining, have strict demand to the depth of parallelism between each face of part, such as
Optical window directly affects sensor plain shaft parallelism, needs the collimation between two using faces of precise measurement.
Similar patent such as, a kind of plane parallelism measurement device of 107677219 A of CN and measurement method, CN
A kind of air-flotation type parallelism measuring apparatus of 207570467 U, a kind of parallelism measuring apparatus of 207317714 U of CN.It is above-mentioned special
There is disadvantage in benefit, one is the range of measurement requires, excessive, too small planar dimension or interplanar spacing cannot be implemented to survey
Amount；Second, using the measurement method of contact, stylus will streak measurement surface, and increase the scuffing to plane to be measured can
Energy；It manually reads, and decisions making third, the result for using optical interferometric method, but measuring passes through, increase people
The subjective factor of cause.
Summary of the invention
The present invention is existing in the prior art with contact measurement and non-contact measurement method measurement plane in order to overcome
Measurement range is small when the depth of parallelism, the material of plane to be measured, transparent, magnetic etc. are required, measure the linearity it is bad, cannot be accurate
The shortcomings that measuring small Spline smoothing and propose, the purpose is to provide a kind of quick high accuracy plane parallelism measurement device and
Measurement method.
The technical scheme is that
A kind of quick high accuracy plane parallelism measurement device, including the amplification difference self-adjusting gain sampling of measuring mechanism, charge
Circuit and controlling of sampling and primary processor；
The measuring mechanism includes the measurement pedestal and high-voltage DC power supply being set on platform, the cathode of high-voltage DC power supply with
The binding post for measuring pedestal is connected by conducting wire；Electrode telescopic device, central electrode and electrode are provided on the measurement pedestal
Telescopic device drives axis connection, and datum plane and plane to be measured are placed on measurement pedestal, and are placed in below central electrode；
The charge amplification difference self-adjusting gain sample circuit includes Current Voltage conversion module, difference sample circuit and gain
Impedance automatic circuit, gain impedance automatic circuit are selected by the sampling thresholding control circuit being connected in series and more impedances
Circuit composition；
Weak current is input to Current Voltage conversion module and completes conversion, completes difference sampling, difference sampling through difference sample circuit
First access is input to two-stage amplifier, and the sampled thresholding control circuit of electric current carries out voltage class judgement, connection pair after amplification
Voltage class access is answered, and is input to more impedance selecting circuits and activates corresponding impedance selection, connects counterpart impedance access, then defeated
It is exported after amplifying out to two-stage amplifier, amplified second level exports and connected by converter and controlling of sampling and primary processor
It connects；Difference samples alternate path by feedback current, eliminates error.
The central electrode axis is parallel with measurement base top surface.
The distance between the central electrode and measurement base top surface are greater than the height of datum plane and plane to be measured.
The Current Voltage conversion module is feedback current scale-up version measuring circuit；Lower operation is biased using input to put
Big device.
The anode of the high-voltage DC power supply is hanging.
The Current Voltage conversion module is any one in OPA128, THS4061 or ADA4530.
The sampling thresholding control circuit is made of multiple and different voltage class path in parallel, is arranged on each access independent
Switch；More impedance selecting circuits are composed in series by multiple and different impedances and multichannel multichannel recombiner.
The controlling of sampling and primary processor are fpga chip.
A kind of quick high accuracy plane parallelism measurement method, comprising the following steps:
The setting of (I) device
High-voltage DC power supply connects 800V DC, and cathode is accessed to the binding post of measurement pedestal, keeps anode hanging；Benchmark is put down
Face and plane to be measured are centrally disposed the lower section of electrode；
The formation of (II) equivalent circuit
Between high-voltage DC power supply and central electrode under uniformly powerful electric field, the electricity for being equivalent to plane-parallel capacitor is formed
Road；
(III) measurement
Charge amplifies the acquisition electric field strength variation of difference self-adjusting gain sample circuit, and is transferred to controlling of sampling and main process task
Show that result is read after device, controlling of sampling and master processor processes.
It further include step (IV) calibration, specific demarcating steps are as follows:
Standard gauge block is taken, is placed on measurement pedestal, is placed central electrode, add high pressure；Amplified by the second level of two-stage amplifier
It afterwards, will as the result is shown using controlling of sampling and primary processor；Repetitive process records the reading of two gauge blocks, establishes one-dimensional recurrence
Equation；The Relationship of Coefficients of y=c+kx is obtained, calibration is completed.
The beneficial effects of the present invention are:
The present invention provides a kind of quick high accuracy plane parallelism measurement device and measurement methods, by central electrode and are tested
Positional relationship between target is able to achieve the Quick Polar high-precision measuring of the depth of parallelism, be suitable for any plane, no matter plane material
Material or even glass plate are transparent unilateral.There is wide application, usability is stronger；Metal sheet plane can be measured directly, non-metal board
It can be by being tested target, non-contact measurement avoids the scuffing on surface, is able to achieve the quick of the depth of parallelism, very high degree of precision
Measurement measurement.
Apparatus of the present invention are by a central electrode across plane to be measured, the direct current that the pedestal of measurement passes through certain voltage
Voltage, so that plane to be measured forms uniform electric field, central electrode is connected by charge amplifier with current measuring device, passes through electricity
The depth of parallelism of plane is fed back in the variation of stream, is finally reached non-contacting rapid survey purpose.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of measuring mechanism in quick high accuracy plane parallelism measurement device of the present invention；
Fig. 2 is that charge amplifies difference self-adjusting gain sample circuit in quick high accuracy plane parallelism measurement device of the present invention
Circuit diagram；
Fig. 3 is equivalent electricity between quick high accuracy plane parallelism measurement device mesohigh DC power supply and central electrode of the present invention
The schematic diagram on road.
Wherein:
1 platform 2 measures pedestal
3 electrode telescopic device, 4 central electrode
5 high-voltage DC power supply, 6 binding post
7 cathode, 8 datum plane
9 10 conducting wires of plane to be measured
11 voltage transformation modules 12 sample thresholding control circuit
More than 13 14 two-stage amplifiers of impedance selecting circuit
15 converter, 16 controlling of sampling and primary processor.
Specific embodiment
With reference to the accompanying drawings of the specification and embodiment is to quick high accuracy plane parallelism measurement device of the present invention and measurement
Method is described in detail:
As shown in Figure 1, a kind of quick high accuracy plane parallelism measurement device, including measuring mechanism, charge amplify difference self-regulated
Whole gain sample circuit and controlling of sampling and primary processor 16；
The measuring mechanism includes the measurement pedestal 2 and high-voltage DC power supply 5 being set on platform 1, and high-voltage DC power supply 5 is born
Pole 7 is connect with the binding post 6 of measurement pedestal 2 by conducting wire 10；Electrode telescopic device 3, center are provided on the measurement pedestal 2
Electrode 4 and electrode telescopic device 3 drive axis connection, datum plane 8 and plane to be measured 9 are placed on measurement pedestal 2, and are placed in
4 lower section of heart electrode；
As shown in Fig. 2, the charge amplification difference self-adjusting gain sample circuit includes Current Voltage conversion module 11, difference is adopted
Sample circuit and gain impedance automatic circuit, gain impedance automatic circuit is by the sampling thresholding control circuit that is connected in series
12 and more impedance selecting circuits 13 form；
Weak current is input to Current Voltage conversion module 11 and completes conversion, completes difference sampling through difference sample circuit, difference is adopted
The first access of sample is input to two-stage amplifier 14, and the sampled thresholding control circuit 12 of electric current carries out voltage class judgement after amplification,
It is connected to corresponding voltage grade access, and is input to more impedance selecting circuits 13 and corresponding impedance is activated to select, connects counterpart impedance
Access, then exported after exporting to the amplification of two-stage amplifier 14, amplified second level exports and by converter 15 and sampling control
System and primary processor 16 connect；Difference samples alternate path by feedback current, eliminates error.
4 axis of central electrode is parallel with measurement 2 top surface of pedestal.
The distance between the central electrode 4 and measurement 2 top surface of pedestal are greater than the height of datum plane 8 and plane to be measured 9.
The Current Voltage conversion module 11 is feedback current scale-up version measuring circuit；Lower operation is biased using input
Amplifier.
The anode of the high-voltage DC power supply 5 is hanging.
The Current Voltage conversion module 11 is any one in OPA128, THS4061 or ADA4530.
The sampling thresholding control circuit 12 is made of multiple and different voltage class path in parallel, is arranged on each access single
Solely switch；More impedance selecting circuits 13 are composed in series by multiple and different impedances and multichannel multichannel recombiner.
The controlling of sampling and primary processor 16 are fpga chip.
The Current Voltage conversion module 11 is a kind of common weak current monitoring method, the feedback current that this patent utilizes
Scale-up version measuring circuit, its main feature is that, structure is simple, and the linearity is good, and the frequency response characteristic of circuit is preferable.Current Voltage conversion
Module should select input to bias lower operational amplifier to complete.For example, commercially available IC:OPA128, THS4061, ADA4530
Deng.
The difference sample circuit is used to that charge leakage to be converted to voltage, linear convergent rate phase by what current signal generated
Subtract.
The gain impedance automatic circuit is one and passes through thresholding control circuit according to difference sample circuit output valve
Threshold condition adjust automatically beneficiating process circuit.
Controlling of sampling and primary processor 16 are commercially available fpga chip, amplified second level output by converter with
FPGA connection.FPGA handles result, exports measurement result.
A kind of quick high accuracy plane parallelism measurement method, comprising the following steps:
The setting of (I) device
High-voltage DC power supply 5 connects 800V DC, and cathode 7 is accessed to the binding post 6 of measurement pedestal 2, keeps anode hanging；By base
Directrix plane 8 and plane to be measured 9 are centrally disposed the lower section of electrode 4；
The formation of (II) equivalent circuit
Between high-voltage DC power supply 5 and central electrode 4 under uniformly powerful electric field, the electricity for being equivalent to plane-parallel capacitor is formed
Road, as shown in Figure 3；
(III) measurement
Charge amplifies the acquisition electric field strength variation of difference self-adjusting gain sample circuit, and is transferred to controlling of sampling and primary processor
16, show that result is read after controlling of sampling and the processing of primary processor 16.
It further include step (IV) calibration, specific demarcating steps are as follows:
10mm is taken, 15mm standard gauge block is placed on measurement pedestal 2, places central electrode 4, add high pressure；Pass through two-stage amplifier
It, will as the result is shown using controlling of sampling and primary processor 16 after 14 second level amplification；Repetitive process records the reading of two gauge blocks
Number, establishes one-dimensional regression equation；The Relationship of Coefficients of y=c+kx is obtained, calibration is completed.
Measuring principle formula is explained:
The voltage that high-voltage DC power supply 5 is supplied to the binding post 6 of measurement pedestal 2 is the constant of homeostasis, therefore passes through electric field strength
Variation can characterize caused by plane-parallel capacitor equivalent distances；
Using the principle of plane-parallel capacitor, total charge dosage between pole plate can be by distance, dielectric constant and cartographic represenation of area.That benefit
Electric current is continuously monitored with controlling of sampling and primary processor 16(FPGA), the total electrical charge electricity that can be asked.
It can be calculated according to the constants such as known voltage and calibrated coefficient by the distance change amount of master plate, into
And it can get flatness index.
Positional relationship between central electrode and tested target is able to achieve the Quick Polar high-precision measuring of the depth of parallelism, is applicable in
In any plane, no matter planar materials in addition glass plate it is transparent unilateral.There is wide application, usability is stronger；Metal plate is flat
Face can directly measure, and non-metal board can be by being tested target, and non-contact measurement avoids the scuffing on surface, is able to achieve
Quick, the very high degree of precision measurement measurement of the depth of parallelism.
Apparatus of the present invention are by a central electrode across plane to be measured, the direct current that the pedestal of measurement passes through certain voltage
Voltage, so that plane to be measured forms uniform electric field, central electrode is connected by charge amplifier with current measuring device, passes through electricity
The depth of parallelism of plane is fed back in the variation of stream, is finally reached non-contacting rapid survey purpose.Measurement method of the present invention belongs to non-connect
The measurement method of touching.
Claims (10)
1. a kind of quick high accuracy plane parallelism measurement device, it is characterised in that: certainly including measuring mechanism, charge amplification difference
Adjust gain sample circuit and controlling of sampling and primary processor (16)；
The measuring mechanism includes the measurement pedestal (2) and high-voltage DC power supply (5) being set on platform (1), high voltage direct current
The cathode (7) in source (5) is connect with the binding post (6) of measurement pedestal (2) by conducting wire (10)；It is arranged on the measurement pedestal (2)
Have electrode telescopic device (3), central electrode (4) and electrode telescopic device (3) drive axis connection, datum plane (8) and to be measured put down
Face (9) is placed in measurement pedestal (2), and is placed in below central electrode (4)；
Charge amplification difference self-adjusting gain sample circuit includes Current Voltage conversion module (11), difference sample circuit and
Gain impedance automatic circuit, gain impedance automatic circuit is by the sampling thresholding control circuit (12) that is connected in series and more
Impedance selecting circuit (13) composition；
Weak current is input to Current Voltage conversion module (11) and completes conversion, completes difference sampling, difference through difference sample circuit
It samples the first access and is input to two-stage amplifier (14), the sampled thresholding control circuit (12) of electric current carries out voltage class after amplification
Judgement is connected to corresponding voltage grade access, and is input to more impedance selecting circuits (13) and activates corresponding impedance selection, connection pair
Impedance path is answered, then is exported after exporting to two-stage amplifier (14) amplification, amplified second level exports and passes through converter
(15) it is connect with controlling of sampling and primary processor (16)；Difference samples alternate path by feedback current, eliminates error.
2. a kind of quick high accuracy plane parallelism measurement device according to claim 1, it is characterised in that: the center
Electrode (4) axis is parallel with measurement pedestal (2) top surface.
3. a kind of quick high accuracy plane parallelism measurement device according to claim 1, it is characterised in that: the center
The distance between electrode (4) and measurement pedestal (2) top surface are greater than the height of datum plane (8) and plane to be measured (9).
4. a kind of quick high accuracy plane parallelism measurement device according to claim 1, it is characterised in that: the electric current
Voltage transformation module (11) is feedback current scale-up version measuring circuit；Lower operational amplifier is biased using input.
5. a kind of quick high accuracy plane parallelism measurement device according to claim 1, it is characterised in that: the high pressure
The anode of DC power supply (5) is hanging.
6. a kind of quick high accuracy plane parallelism measurement device according to claim 1, it is characterised in that: the electric current
Voltage transformation module (11) is any one in OPA128, THS4061 or ADA4530.
7. a kind of quick high accuracy plane parallelism measurement device according to claim 1, it is characterised in that: the sampling
Thresholding control circuit (12) is made of multiple and different voltage class path in parallel, and individually switch is arranged on each access；It is described more
Impedance selecting circuit (13) is composed in series by multiple and different impedances and multichannel multichannel recombiner.
8. a kind of quick high accuracy plane parallelism measurement device according to claim 1, it is characterised in that: the sampling
Control and primary processor (16) are fpga chip.
9. a kind of quick high accuracy plane parallelism measurement method, it is characterised in that: the following steps are included:
The setting of (I) device
High-voltage DC power supply (5) connects 800V DC, and cathode (7) are accessed to the binding post (6) of measurement pedestal (2), keeps anode outstanding
It is empty；Datum plane (8) and plane to be measured (9) are centrally disposed to the lower section of electrode (4)；
The formation of (II) equivalent circuit
Between high-voltage DC power supply (5) and central electrode (4) under uniformly powerful electric field, formation is equivalent to plane-parallel capacitor
Circuit；
(III) measurement
Charge amplifies the acquisition electric field strength variation of difference self-adjusting gain sample circuit, and is transferred to controlling of sampling and primary processor
(16), show that result is read after controlling of sampling and primary processor (16) processing.
10. a kind of quick high accuracy plane parallelism measurement method according to claim 9, it is characterised in that: further include
Step (IV) calibration, specific demarcating steps are as follows:
Standard gauge block is taken, is placed in measurement pedestal (2), places central electrode (4), adds high pressure；Pass through two-stage amplifier (14)
Second level amplification after, will as the result is shown using controlling of sampling and primary processor (16)；Repetitive process records the reading of two gauge blocks
Number, establishes one-dimensional regression equation；The Relationship of Coefficients of y=c+kx is obtained, calibration is completed.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201811531180.0A CN109405734B (en) | 2018-12-14 | 2018-12-14 | Quick high-precision plane parallelism measuring device and measuring method |
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| CN201811531180.0A CN109405734B (en) | 2018-12-14 | 2018-12-14 | Quick high-precision plane parallelism measuring device and measuring method |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109405733A (en) * | 2018-12-14 | 2019-03-01 | 中核新科（天津） 精密机械制造有限公司 | Quick high accuracy plane parallelism measurement device |
Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002257508A (en) * | 2001-03-05 | 2002-09-11 | Mitsubishi Electric Corp | Irregularity detecting sensor |
| JP2002305448A (en) * | 2001-04-04 | 2002-10-18 | Sony Corp | Sample and hold circuit and ad converter utilizing the same |
| TW200526949A (en) * | 2004-02-03 | 2005-08-16 | Qcept Technologies Inc | Inspection system and apparatus |
| CN1779413A (en) * | 2004-10-25 | 2006-05-31 | 恩益禧电子股份有限公司 | Movable-type flatness measurement apparatus |
| CN101349537A (en) * | 2008-09-13 | 2009-01-21 | 陈立峰 | Detection imaging method and apparatus of metal pipe barrel thickness and inner wall roughness |
| CN101922909A (en) * | 2010-03-09 | 2010-12-22 | 中国科学院国家天文台南京天文光学技术研究所 | High-precision capacitance-type displacement sensor for direct non-contact detection of mirror surface high-low difference |
| CN204128494U (en) * | 2014-10-23 | 2015-01-28 | 浙江海洋学院东海科学技术学院 | A kind of Metal Surface Roughness measurement mechanism |
| CN108387171A (en) * | 2018-05-08 | 2018-08-10 | 中国工程物理研究院总体工程研究所 | A kind of flexible probe and its roughness algorithm detecting roughness based on capacitance method |
| CN109405733A (en) * | 2018-12-14 | 2019-03-01 | 中核新科（天津） 精密机械制造有限公司 | Quick high accuracy plane parallelism measurement device |
| CN209263898U (en) * | 2018-12-14 | 2019-08-16 | 中核新科（天津）精密机械制造有限公司 | A kind of quick high accuracy plane parallelism measurement device |
-
2018
- 2018-12-14 CN CN201811531180.0A patent/CN109405734B/en active Active
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002257508A (en) * | 2001-03-05 | 2002-09-11 | Mitsubishi Electric Corp | Irregularity detecting sensor |
| JP2002305448A (en) * | 2001-04-04 | 2002-10-18 | Sony Corp | Sample and hold circuit and ad converter utilizing the same |
| TW200526949A (en) * | 2004-02-03 | 2005-08-16 | Qcept Technologies Inc | Inspection system and apparatus |
| CN1779413A (en) * | 2004-10-25 | 2006-05-31 | 恩益禧电子股份有限公司 | Movable-type flatness measurement apparatus |
| CN101349537A (en) * | 2008-09-13 | 2009-01-21 | 陈立峰 | Detection imaging method and apparatus of metal pipe barrel thickness and inner wall roughness |
| CN101922909A (en) * | 2010-03-09 | 2010-12-22 | 中国科学院国家天文台南京天文光学技术研究所 | High-precision capacitance-type displacement sensor for direct non-contact detection of mirror surface high-low difference |
| CN204128494U (en) * | 2014-10-23 | 2015-01-28 | 浙江海洋学院东海科学技术学院 | A kind of Metal Surface Roughness measurement mechanism |
| CN108387171A (en) * | 2018-05-08 | 2018-08-10 | 中国工程物理研究院总体工程研究所 | A kind of flexible probe and its roughness algorithm detecting roughness based on capacitance method |
| CN109405733A (en) * | 2018-12-14 | 2019-03-01 | 中核新科（天津） 精密机械制造有限公司 | Quick high accuracy plane parallelism measurement device |
| CN209263898U (en) * | 2018-12-14 | 2019-08-16 | 中核新科（天津）精密机械制造有限公司 | A kind of quick high accuracy plane parallelism measurement device |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109405733A (en) * | 2018-12-14 | 2019-03-01 | 中核新科（天津） 精密机械制造有限公司 | Quick high accuracy plane parallelism measurement device |
| CN109405733B (en) * | 2018-12-14 | 2024-04-09 | 中核新科（天津）精密机械制造有限公司 | Quick high-precision plane parallelism measuring device |
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| Publication number | Publication date |
|---|---|
| CN109405734B (en) | 2023-11-21 |
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