CN1093828A - The manufacture method of Dished molybdenum-base tungsten target - Google Patents
The manufacture method of Dished molybdenum-base tungsten target Download PDFInfo
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- CN1093828A CN1093828A CN 93103859 CN93103859A CN1093828A CN 1093828 A CN1093828 A CN 1093828A CN 93103859 CN93103859 CN 93103859 CN 93103859 A CN93103859 A CN 93103859A CN 1093828 A CN1093828 A CN 1093828A
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- molybdenum
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- dished
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Abstract
Dished molybdenum-base tungsten target is the rotarting anode in the medical X-ray pipe.Domestic in the past manufacturing Dished molybdenum-base tungsten target is to adopt vapour deposition process, and the combination of the Dished molybdenum-base tungsten target tungsten of this manufactured is not firm, easily produces be full of cracks, and the life-span is extremely short.Abroad be earlier to produce tungsten composite round flat sintered base with powder metallurgic method, finish-forging becomes dish-shaped forging stock again, this method forge passage many, easily cause forging stock to rupture.And the manufacture method of Dished molybdenum-base tungsten target of the present invention has overcome the shortcoming of above-mentioned two kinds of methods, adopt compound reinforced, a compression moulding, through hydrogen or vacuum-sintering, once forge with machine work after just can obtain Dished molybdenum-base tungsten target.
Description
Dished molybdenum-base tungsten target is the rotarting anode in the medical X-ray pipe.Dished molybdenum-base tungsten target manufacture method of the present invention is used powder metallurgical technique production, it is characterized in that compound reinforced press forming, through hydrogen or vacuum-sintering, once forge with machining after, just can obtain the Dished molybdenum-base tungsten target finished product of densification.
Rotarting anode in the medical X-ray pipe, diameter is the dish-shaped target of specifications such as 70mm, 90mm and 100mm, requires material under the high temperature service condition, has anti-electron bombardment, the characteristic that high X-ray emission dosage and heat scatter and disappear rapidly.Therefore, adopt high-melting-point, high density and high atomicity tungsten to hold the mark face usually as the focus that produces the X-ray; And thermal capacity is big, and proportion is more compound for being made into integration for base than the little refractory metal molybdenum of tungsten, thereby reaches the purpose of the working life that produces high X-ray emission rate and length.
At present, domestic is that the gas-phase deposition of refractory metal compound coat of deposits tungsten surface layer on the molybdenum matrix of typing is made, and tungsten layer thickness is only about 1mm, and not firm with combining of molybdenum base.When high temperature used, the tungsten layer grain coarsening was serious, is easy to generate crack failure, and segregation phenomenon often takes place between the tungsten X-ray attenuation rate＞50% in addition, and therefore, the life-span of X-ray tube is extremely short.External elder generation produces tungsten-molybdenum composite round flat sintered base with powder metallurgic method, after 3～4 passages forge circular dull and stereotyped forging stock, finish-forging becomes dish-shaped forging stock again, carry out machining and obtain product, it is many that this method forges passage, and operation is long, and from the circular sintered blank of flat board to dishing forging stock process, machining stress is concentrated to cause the forging stock brisement because the regional area of tungsten composite plate blanks is easy to generate, so the forging rate is low, and the product cost height.
In order to overcome above-mentioned shortcoming, the present invention adopts powder metallurgical technique to produce dish-shaped tungsten compound sintered compact, can obtain dish-shaped forging stock with a forge hot, carries out mechanical turning more a little, the product of can obtain meeting the requirements shape and precision.Gained tungsten layer thickness is greater than 2mm, and grain structure is tiny evenly, and density＞96% solid density is firm with the molybdenum matrix bond.
The manufacture method of Dished molybdenum-base tungsten target of the present invention is as follows, in special mold cavity, filling molybdenum powder 230～600 restrains earlier, a little after the shaping, reinstall tungsten powder 200～400 grams, be pressed into compound blank at 100～200MPa pressure next time,, obtain dish-shaped tungsten compound sintered compact through hydrogen or 1000～1200 ℃ of presintering and 2000～2300 ℃ of high temperature sinterings of 3～4 hours that carry out 1.5 hours of vacuum.As accompanying drawing 1,1 is the tungsten surface layer among the figure, and 2 is the molybdenum matrix.
With dish-shaped sintered blank, the situation that is put in the forge mould is, the placement of tungsten face (1) and molybdenum matrix (2) is corresponding with the convex surface of the concave surface of upper punch (3) and bottom punch (4) identical, and with the have an appointment gap of 0.8mm of the inwall of die sleeve (5).After under nitrogen atmosphere, preheating 1300～1500 ℃ of 0.5h before sintered blank is forged, move in the forging die, start forging hammer, with 1.0 * 10
4J～2.0 * 10
4J forges, and upper punch (3) falls, and a time is forged and made the compound forging stock of Dished molybdenum-base tungsten target.As accompanying drawing 2,1 is tungsten layer among the figure, and 2 is molybdenum basic unit, and 3 is upper punch, and 4 is bottom punch, and 5 is die sleeve.Forge base after machining, obtain satisfactory Dished molybdenum-base tungsten target, as shown in Figure 3.
Embodiment:
The manufacturing of φ 70mm Dished molybdenum-base tungsten target.240 gram molybdenum powder are packed into earlier in the shaping die cavity, reinstall 210 gram tungsten powders a little after the shaping, pressure with＜200MPa is pressed into dish-shaped blank, 1100～1200 ℃ * 1.5h carries out presintering at hydrogen, 2000～2300 ℃ * 3～4h high temperature sintering prepares φ 68～72mm under nitrogen atmosphere or vacuum again, thick 2.8～the 3.0mm of tungsten layer, thick 6.5～the 7.0mm of molybdenum layer, relative density is greater than 90% dish-shaped compound sintered compact, sintered blank is after 1300～1500 ℃ * 0.5h carries out presintering under nitrogen atmosphere, in the forge mould of φ 72mm, with 1.1 * 10
4J～1.7 * 10
4J carries out a time and forges, and gained forging stock shape, size and finished parts are approaching substantially, and the relative density of its tungsten＞96% carries out specification and precision that machining can reach the finished product requirement again.
Claims (4)
1, the powder metallurgical technique base is adopted in the manufacturing of Dished molybdenum-base tungsten target of the present invention, and sintering forges once then.It is characterized in that adopting dish-shape die compound reinforced, a press forming through hydrogen or true sintering, once forges under certain pressure and makes Dished molybdenum-base tungsten target.
2, said compound reinforced according to claim 1, a press forming is to add 230～600 gram molybdenum powders in special die cavity earlier, adds 200～400 gram tungsten powders a little after the shaping again, is pressed into compound base under 100～200MPa pressure.
3, said through hydrogen or vacuum-sintering according to claim 1, the compound suppressing base obtains dish-shaped molybdenum base tungsten layer compound sintered compact at hydrogen or 1000～1200 ℃ of 1.5h presintering of vacuum and 2000～2300 ℃ of 3～4 hours sintering of high temperature.
4, once forging under certain pressure according to claim 1 is said, is after 1300～1500 ℃ of 0.5h preheat in nitrogen atmosphere with compound sintered compact, in special forging die, with 1.0 * 10
4～2.0 * 10
4J press forging becomes Dished molybdenum-base tungsten target.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN93103859A CN1048117C (en) | 1993-04-13 | 1993-04-13 | Dished molybdenum-base tungsten target manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN93103859A CN1048117C (en) | 1993-04-13 | 1993-04-13 | Dished molybdenum-base tungsten target manufacturing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1093828A true CN1093828A (en) | 1994-10-19 |
| CN1048117C CN1048117C (en) | 2000-01-05 |
Family
ID=4984851
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN93103859A Expired - Fee Related CN1048117C (en) | 1993-04-13 | 1993-04-13 | Dished molybdenum-base tungsten target manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1048117C (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101438373B (en) * | 2006-05-05 | 2010-06-16 | 皇家飞利浦电子股份有限公司 | Anode plate for X-ray tube and method of manufacture |
| CN102277558A (en) * | 2011-08-23 | 2011-12-14 | 洛阳科威钨钼有限公司 | Process for manufacturing tungsten spin-coated sputtering tube target |
| CN106077387A (en) * | 2016-06-27 | 2016-11-09 | 泰尔重工股份有限公司 | A kind of forging method of LD steel cylinder blade |
| CN106531599A (en) * | 2016-10-28 | 2017-03-22 | 安泰天龙钨钼科技有限公司 | Tungsten-rhenium-molybdenum alloy rotary anode target material for X-ray tube and preparation method thereof |
| CN109702191A (en) * | 2018-12-21 | 2019-05-03 | 西安瑞福莱钨钼有限公司 | A kind of preparation method of high-precision dynamic balancing rotary anode target |
| CN110293223A (en) * | 2019-07-23 | 2019-10-01 | 金堆城钼业股份有限公司 | A kind of preparation method of butterfly molybdenum tungsten bimetallic composite rotating target |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5450290A (en) * | 1977-09-28 | 1979-04-20 | Toshiba Corp | Production of target for x-ray tube |
-
1993
- 1993-04-13 CN CN93103859A patent/CN1048117C/en not_active Expired - Fee Related
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101438373B (en) * | 2006-05-05 | 2010-06-16 | 皇家飞利浦电子股份有限公司 | Anode plate for X-ray tube and method of manufacture |
| CN102277558A (en) * | 2011-08-23 | 2011-12-14 | 洛阳科威钨钼有限公司 | Process for manufacturing tungsten spin-coated sputtering tube target |
| CN102277558B (en) * | 2011-08-23 | 2012-12-12 | 洛阳科威钨钼有限公司 | Process for manufacturing tungsten spin-coated sputtering tube target |
| CN106077387A (en) * | 2016-06-27 | 2016-11-09 | 泰尔重工股份有限公司 | A kind of forging method of LD steel cylinder blade |
| CN106531599A (en) * | 2016-10-28 | 2017-03-22 | 安泰天龙钨钼科技有限公司 | Tungsten-rhenium-molybdenum alloy rotary anode target material for X-ray tube and preparation method thereof |
| CN106531599B (en) * | 2016-10-28 | 2018-04-17 | 安泰天龙钨钼科技有限公司 | A kind of X-ray tube W-Re molybdenum alloy rotary anode target and preparation method thereof |
| CN109702191A (en) * | 2018-12-21 | 2019-05-03 | 西安瑞福莱钨钼有限公司 | A kind of preparation method of high-precision dynamic balancing rotary anode target |
| CN110293223A (en) * | 2019-07-23 | 2019-10-01 | 金堆城钼业股份有限公司 | A kind of preparation method of butterfly molybdenum tungsten bimetallic composite rotating target |
| CN110293223B (en) * | 2019-07-23 | 2022-03-22 | 金堆城钼业股份有限公司 | Preparation method of butterfly-shaped molybdenum-tungsten bimetal composite rotary target |
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| Publication number | Publication date |
|---|---|
| CN1048117C (en) | 2000-01-05 |
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| C06 | Publication | ||
| PB01 | Publication | ||
| C53 | Correction of patent for invention or patent application | ||
| CB03 | Change of inventor or designer information |
Inventor after: Li Yingquan Inventor after: Li Xiangrong Inventor after: Teng Xiuren Inventor after: Su Yusheng Inventor after: Deng Chaoquan Inventor after: Zheng Xiaohong Inventor before: Li Xiangrong Inventor before: Teng Xiuren Inventor before: Li Yingquan Inventor before: Zheng Yusheng Inventor before: Zheng Xiaohong |
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| COR | Change of bibliographic data |
Free format text: CORRECT: INVENTOR; FROM: LI XIANGRONG; TENG XIUREN; LI YINGQUAN; ZHENG SOUND; ZHENG XIAOJIANG TO:LI YINGQUAN; LI XIANGRONG; TENG XIUREN; SU SOUND; DENG ZHAOQUAN; ZHENG XIAOJIANG |
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| C10 | Entry into substantive examination | ||
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| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20000105 Termination date: 20100413 |