CN109360900B - Display panel and manufacturing method thereof - Google Patents
Display panel and manufacturing method thereof Download PDFInfo
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- CN109360900B CN109360900B CN201811075693.5A CN201811075693A CN109360900B CN 109360900 B CN109360900 B CN 109360900B CN 201811075693 A CN201811075693 A CN 201811075693A CN 109360900 B CN109360900 B CN 109360900B
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/805—Electrodes
- H10K50/82—Cathodes
- H10K50/824—Cathodes combined with auxiliary electrodes
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
Abstract
The application discloses a display panel and a manufacturing method thereof, wherein an auxiliary electrode and an anode in the display panel are arranged on a substrate, a pixel definition layer covers the auxiliary electrode and the anode and enables the anode and the auxiliary electrode to be partially exposed, a cathode isolation column is arranged on the exposed part of the auxiliary electrode, an isolation platform in the cathode isolation column has conductivity and is in contact with the auxiliary electrode, an isolation column main body in the cathode isolation column is arranged on the isolation platform, and a luminescent layer covers the pixel definition layer, the anode and the exposed part of the auxiliary electrode and is isolated by the cathode isolation column; the cathode covers the luminescent layer and is isolated by the cathode isolation column, and the cathode is at least contacted with the isolation platform. Through the mode, the effective electric connection of the cathode and the auxiliary electrode can be realized, the independent control of the cathode is realized, and the display panel can display uniformly.
Description
Technical Field
The application relates to the technical field of display, in particular to a display panel and a manufacturing method thereof.
Background
Organic Light-Emitting diodes (OLEDs) have Display characteristics and qualities superior to Liquid Crystal Displays (LCDs), such as Light weight, short response time, low driving voltage, better Display color and better Display viewing angle. In recent years, the development of the OLED is more and more advanced, and the OLED not only can be used for manufacturing curved surface display, but also gradually develops towards large size. However, the problem of voltage drop exists in large size, and especially for a top emission display panel, the problem of voltage drop caused by thinner cathode is to be solved urgently, so that an auxiliary electrode and a cathode isolation column are manufactured in the process, and the cathode is isolated, so that the purpose of independently controlling the cathode to reduce the voltage drop is achieved.
The inventors of the present application found, in a long-term research and development, that under a condition that the process control of evaporating the light emitting layer is not good, the auxiliary electrode is completely covered by the light emitting layer, and the cathode cannot be connected with the auxiliary electrode, thereby causing display abnormality.
Disclosure of Invention
The display panel and the manufacturing method thereof can achieve effective electric connection between the cathode and the auxiliary electrode, achieve independent control of the cathode, and enable the display panel to display uniformly.
In order to solve the above technical problem, the technical scheme adopted in the present application is to provide a display panel, including: the pixel structure comprises a substrate, an auxiliary electrode, an anode, a pixel definition layer, a cathode isolating column, a light-emitting layer and a cathode; the auxiliary electrode is arranged on the substrate; the anode is arranged on the substrate; the pixel defining layer covers the auxiliary electrode and the anode, and the anode and the auxiliary electrode are partially exposed through the pixel defining layer; the cathode isolation column is arranged on the exposed part of the auxiliary electrode through the pixel definition layer, and comprises an isolation platform and an isolation column main body, wherein the isolation platform is conductive and is in contact with the auxiliary electrode, and the isolation column main body is insulating and is arranged on the isolation platform; the light-emitting layer covers the pixel defining layer and the exposed parts of the anode and the auxiliary electrode through the pixel defining layer and is separated by the cathode isolating column; the cathode covers the luminescent layer and is isolated by the cathode isolation column, and the cathode is at least contacted with the isolation platform.
In order to solve the above technical problem, another technical solution adopted by the present application is to provide a method for manufacturing a display panel, including: providing a substrate; forming an auxiliary electrode and an anode on a substrate; forming a pixel defining layer on the auxiliary electrode and the anode electrode such that the anode electrode and the auxiliary electrode are partially exposed through the pixel defining layer; forming a cathode isolation column on the exposed part of the auxiliary electrode through the pixel defining layer; forming a light emitting layer on the pixel defining layer and the exposed portions of the anode and the auxiliary electrode through the pixel defining layer; forming a cathode on the light emitting layer; the cathode isolation column comprises an isolation platform and an isolation column main body, wherein the isolation platform is conductive and is in contact with the auxiliary electrode, the isolation column main body is insulating and is arranged on the isolation platform, the luminescent layer is isolated by the cathode isolation column, and the cathode is isolated by the cathode isolation column and is at least in contact with the isolation platform.
Through the scheme, the beneficial effects of the application are that: this application designs the cathode isolation post that has the isolation platform on auxiliary electrode for the cathode can contact with the isolation platform in the cathode isolation post, because the isolation platform has electric conductivity, even the cathode is not directly electrically connected to with auxiliary electrode, also can realize the effective electricity of cathode and auxiliary electrode through the isolation platform and be connected, thereby realize the independent control cathode, improve the pressure drop problem, make display panel show evenly.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings needed to be used in the description of the embodiments will be briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without creative efforts. Wherein:
fig. 1 is a schematic structural diagram of an embodiment of a display panel provided in the present application;
FIG. 2 is a schematic structural diagram of another embodiment of a display panel provided in the present application;
FIG. 3 is a schematic flowchart illustrating a method for manufacturing a display panel according to an embodiment of the present disclosure;
fig. 4 is a schematic structural diagram of steps of manufacturing a display panel based on the method shown in fig. 3.
Detailed Description
The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are only a part of the embodiments of the present application, and not all the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application.
Referring to fig. 1, fig. 1 is a schematic structural diagram of an embodiment of a display panel provided in the present application, where the display panel includes: a substrate 111, an auxiliary electrode 112, an anode 113, a pixel defining layer 114, a cathode separator 115, a light emitting layer 116, and a cathode 117.
The substrate 111 may be a glass substrate or a resin substrate; the auxiliary electrode 112 and the anode 113 are disposed on the substrate 111, and the auxiliary electrode 112 and the anode 113 are disposed on the same layer; the auxiliary electrode 112 may be made of a conductive material such as molybdenum, aluminum, titanium, copper, silver, or Indium Tin Oxide (ITO).
The pixel defining layer 114 covers the auxiliary electrode 112 and the anode electrode 113 such that the anode electrode 113 and the auxiliary electrode 112 are partially exposed through the pixel defining layer 114, and the pixel defining layer 114 covers a gap region between the auxiliary electrode 112 and the anode electrode 113. The material of the pixel defining layer 114 may be a positive or negative photoresist.
The cathode isolation pillar 115 is disposed on a portion of the auxiliary electrode 112 exposed through the pixel defining layer 114, the cathode isolation pillar 115 includes an isolation stage 1151 and an isolation pillar main body 1152, the isolation stage 1151 has conductivity and is in contact with the auxiliary electrode 112, and the isolation pillar main body 1152 has insulation and is disposed on the isolation stage 1151.
The isolation stage 1151 is made of a conductive metal material, and specifically, it may be made of a conductive material such as molybdenum, aluminum, titanium, copper, silver, or ITO. The material of the isolation mesa 1151 may be selected to be different from the material of the auxiliary electrode 112 that is overlapped thereunder.
The isolation column main body 1152 is a plurality of films obtained by chemical vapor deposition, and has at least two or more thin film structures, and the density of the plurality of films increases at least layer by layer from bottom to top.
The light-emitting layer 116 covers the pixel defining layer 114 and the exposed portions of the anode 113 and the auxiliary electrode 112 through the pixel defining layer 114, and is isolated by the cathode isolating column 115; the light-emitting layer 116 can be formed by evaporation or ink-jet printing.
The cathode 117 covers the light-emitting layer 116 and is isolated by the cathode isolation column 115, and the cathode 117 is at least contacted with the isolation platform 1151; the cathode 117 may be a transparent metal electrode, such as ITO, and the cathode 117 may be formed on the light emitting layer 116 by evaporation or printing.
Since the cathode separation column 115 has a high height, the cathode 117 can be isolated; by arranging the cathode isolation column 115 on the auxiliary electrode 112, the cathode 117 can be in contact with the isolation table 1151 in the cathode isolation column 115, and since the isolation table 1151 has conductivity, even if the cathode 117 is not directly electrically connected with the auxiliary electrode 112, the cathode 117 can be effectively and electrically connected with the auxiliary electrode 112 through the isolation table 1151, so that the cathode 117 can be independently controlled, the voltage drop problem can be improved, and the display panel can be uniformly displayed.
With further reference to fig. 1, the cathode 117 is further in contact with the auxiliary electrode 112 at the periphery of the isolation mesa 1151. Specifically, the auxiliary electrode 112 on the periphery of the isolation stage 1151 may be exposed through the light-emitting layer 116 by controlling the evaporation angle of the light-emitting layer 116 during the evaporation process of the light-emitting layer 116. Further, during the evaporation of the cathode 117, the cathode 117 is brought into contact with the auxiliary electrode 112 on the periphery of the isolation stage 1151 by controlling the evaporation angle of the cathode 117. In this case, the cathode 117 is electrically connected to the auxiliary electrode 112 directly by contacting the auxiliary electrode 112, and is also electrically connected to the auxiliary electrode 112 indirectly by contacting the isolation stage 1151, so that the connection effect is more reliable.
With reference to fig. 1, the display panel of the present application further includes a planarization layer 118, a driving circuit 119, and an auxiliary circuit 120.
The driving circuit 119 and the auxiliary circuit 120 are disposed on the substrate 111, the planarization layer 118 covers the driving circuit 119 and the auxiliary circuit 120, and the planarization layer 118 may be at least one of a thin film made by chemical vapor deposition and a polyimide material.
The anode 113 and the auxiliary electrode 112 are disposed on the planarization layer 118, and are electrically connected to the driving circuit 119 and the auxiliary circuit 120 through via holes 1181 on the planarization layer 118, respectively.
The isolation stage 1151 is made of a different material from the auxiliary electrode 112, and the width of the isolation pillar body 1152 gradually increases in a direction away from the substrate 111. For example, in FIG. 1 the isolation post body 1152 has an inverted trapezoidal shape. Specifically, the isolation pillar main body 1152 includes a plurality of film layers stacked, and the etching resistance of the plurality of film layers increases layer by layer in a direction away from the substrate 111, thereby realizing the above-described shape.
Further, the display panel further includes a light-shielding metal pattern 121 and a buffer layer 122, the light-shielding metal pattern 121 is disposed on the substrate 111, and the buffer layer 122 is disposed on the substrate 111 and covers the light-shielding metal pattern 121; the driving circuit 119 may be a thin film transistor disposed directly above the light-shielding metal pattern 121, a source/drain of the thin film transistor being electrically connected to the anode 113, and the auxiliary circuit 120 may be a metal electrode being electrically connected to the light-shielding metal pattern 121 and the auxiliary electrode 112, respectively.
By contacting the cathode 117 with the auxiliary electrode 112, the cathode 117 is controlled independently, so that the voltage drop problem is improved, and the display panel has uniform display. In addition, the isolation post main body 1152 is provided as a plurality of stacked film layers, the etching resistance of the plurality of film layers increases layer by layer in a direction away from the substrate 111, and after etching, the width of the isolation post main body 1152 gradually increases in a direction away from the substrate 111, thereby performing better control in a formation region of the subsequent light emitting layer 116.
Referring to fig. 2, fig. 2 is a schematic structural diagram of another embodiment of the display panel provided in the present application. In the present embodiment, due to poor process control of the light-emitting layer 116 or other considerations, the exposed portion of the auxiliary electrode 112 is entirely covered by the light-emitting layer 116. At this time, the cathode 117 may still be electrically connected to the auxiliary electrode 112 through contact with the isolation stage 1151.
FIG. 3 is a schematic flow chart illustrating a method for fabricating a display panel according to an embodiment of the present disclosure,
fig. 4 is a schematic structural diagram of steps of manufacturing a display panel based on the method shown in fig. 3. As shown in fig. 3 and 4, the manufacturing method may include the following steps:
step 31: a substrate 111 is provided.
Step 32: an auxiliary electrode 112 and an anode 113 are formed on the substrate 111.
Firstly, providing a substrate 111, wherein the substrate 111 can be a glass substrate or a resin substrate, and the substrate 111 can be cleaned or baked; an auxiliary electrode 112 and an anode 113 are then formed on the substrate 111.
The auxiliary electrode 112 may be made of a conductive material such as molybdenum, aluminum, titanium, copper, silver, or ITO.
Further, the stacked metal light shielding pattern 121 and the buffer layer 122 may be first fabricated on the substrate 111, then the driving circuit 119 and the auxiliary circuit 120 are fabricated on the buffer layer 122, and the planarization layer 118 is formed thereon, and a plurality of through holes 1181 are provided in the planarization layer 118 for electrically connecting the anode 113 and the auxiliary electrode 112 with the driving circuit 119 and the auxiliary circuit 120, respectively.
The metal light-shielding patterns 121 are distributed on the substrate 111 in an array, the driving circuit 119 is disposed right above the metal light-shielding patterns 121 and electrically connected to the anode 113, and the auxiliary circuit 120 is electrically connected to the metal light-shielding patterns 121 and the auxiliary electrode 112, respectively.
Step 33: a pixel defining layer 114 is formed on the auxiliary electrode 112 and the anode electrode 113, and the anode electrode 113 and the auxiliary electrode 112 are partially exposed through the pixel defining layer 114.
A photoresist is applied on the auxiliary electrode 112 and the anode 113, and processes such as exposure and development are performed to form a pattern of the pixel defining layer 114.
Step 34: a cathode isolation pillar 115 is formed on a portion of the auxiliary electrode 112 exposed through the pixel defining layer 114.
The cathode separator 115 includes an isolation stage 1151 and a separator main body 1152, the isolation stage 1151 is electrically conductive and is in contact with the auxiliary electrode 112, and the separator main body 1152 is electrically insulating and is disposed on the isolation stage 1151.
The isolation mesa 1151 is first formed on the exposed portion of the auxiliary electrode 112 through the pixel defining layer 114, i.e., the auxiliary electrode 112 not covered by the pixel defining layer 114 is covered with a layer of conductive material, and is etched by a wet etching process to form the isolation mesa 1151.
A plurality of layers is deposited on the isolation stage 1151 using chemical vapor deposition, and the etch resistance (e.g., densification) of the plurality of layers increases layer by layer in a direction away from the substrate 111. A photoresist is coated on the plurality of film layers, and then exposure and development are performed to form a predetermined pattern. And etching the plurality of film layers by a dry etching method to gradually increase the widths of the plurality of film layers from bottom to top, and removing the photoresist on the plurality of film layers after the etching is completed to form the isolation pillar main body 1152 with the width gradually increasing in a direction away from the substrate 111. For example, as shown in fig. 4, the cathode isolation pillar 115 formed after dry etching has an inverted trapezoid shape.
In addition, in other implementations, the isolation mesa 1151 may be formed by dry etching together with the isolation pillar body 1152.
Step 35: the light emitting layer 116 is formed on the pixel defining layer 114 and portions of the anode electrode 113 and the auxiliary electrode 112 exposed through the pixel defining layer 114.
The light-emitting layer 116 is partitioned by the cathode isolation pillars 115; depositing a material of the light emitting layer 116 on the pixel defining layer 114 and portions of the anode electrode 113 and the auxiliary electrode 112 exposed through the pixel defining layer 114 by evaporation; since the coverage of the light-emitting layer 116 is different due to the different evaporation angles, the auxiliary electrode 112 at the periphery of the isolation stage 1151 is exposed through the light-emitting layer 116 by controlling the evaporation angle of the light-emitting layer 116, that is, the light-emitting layer 116 above the pixel defining layer 114 is not in contact with the isolation stage 1151.
Step 36: a cathode 117 is formed on the light-emitting layer 116.
Wherein cathode 117 is isolated by cathode isolation column 115 and is in contact with at least isolation stage 1151.
The cathode 117 is vapor-deposited on the light-emitting layer 116, and the cathode 117 is in contact with the auxiliary electrode 112 on the periphery of the isolation stage 1151 by controlling the vapor deposition angle of the cathode 117, so as to ensure that the cathode 117 and the auxiliary electrode 112 can be directly electrically connected, and the light-emitting layer 116 is isolated by the cathode isolation column 115.
The method for manufacturing the display panel in the above embodiment may be applied to a common display panel, and may also be applied to an AMOLED (Active-matrix organic light-emitting diode) or an IJP (Ink-Jet Printing) technology.
The display panel can be manufactured by the method, and the cathode 117 is in contact with the auxiliary electrode 112 on the periphery of the isolation table 1151 by controlling the evaporation angle of the luminescent layer 116 in the evaporation process of the luminescent layer 116; even if the process control of the light-emitting layer 116 is poor, the exposed portion of the auxiliary electrode 112 is entirely covered by the light-emitting layer 116, and the cathode 117 can be electrically connected to the auxiliary electrode 112 by contacting the isolation mesa 1151; therefore, the cathode 117 is controlled independently, the voltage drop problem is improved, and the display panel can display uniformly.
The etching resistance of the plurality of film layers increases layer by layer in the direction away from the substrate 111, so that the formation area of the subsequent light-emitting layer 116 is better controlled; after etching, the inverse-trapezoidal isolation post main body 1152 is formed due to the characteristics of the film layer, and the isolation post main body 1152 formed by the method in the embodiment has the characteristics of good process stability and difficulty in falling, so that the yield of display products is improved.
The above embodiments are merely examples, and not intended to limit the scope of the present application, and all modifications, equivalents, and flow charts using the contents of the specification and drawings of the present application, or those directly or indirectly applied to other related arts, are included in the scope of the present application.
Claims (8)
1. A display panel, comprising:
a substrate;
a light-shielding metal pattern disposed on the substrate;
a driving circuit disposed directly above the light-shielding metal pattern;
an auxiliary electrode disposed on the substrate;
an anode disposed on the substrate;
a pixel defining layer covering the auxiliary electrode and the anode electrode such that the anode electrode and the auxiliary electrode are partially exposed through the pixel defining layer;
the cathode isolation column is arranged on the part of the auxiliary electrode exposed through the pixel definition layer, and comprises an isolation platform and an isolation column main body, wherein the isolation platform is conductive and is in contact with the auxiliary electrode, and the isolation column main body is insulating and is arranged on the isolation platform;
the light-emitting layer covers the pixel definition layer and the exposed parts of the anode and the auxiliary electrode through the pixel definition layer, and is separated by the cathode isolation column;
the cathode covers the light-emitting layer and is isolated by the cathode isolation column, wherein an evaporation angle forming the light-emitting layer is a first evaporation angle, so that the auxiliary electrode on the periphery of the isolation platform is exposed through the light-emitting layer; and forming an evaporation angle of the cathode as a second evaporation angle so that the cathode is in contact with the isolation platform and the auxiliary electrode on the periphery of the isolation platform.
2. The display panel according to claim 1, wherein the width of the column body gradually increases in a direction away from the substrate.
3. The display panel according to claim 2, wherein the barrier pillar bodies are arranged in an inverted trapezoid.
4. The display panel according to claim 2, wherein the spacer main body comprises a plurality of film layers stacked, wherein the etching resistance of the plurality of film layers increases layer by layer in a direction away from the substrate.
5. The display panel according to claim 1, wherein the isolation mesa is made of a material different from that of the auxiliary electrode.
6. The display panel according to claim 1, characterized in that the display panel further comprises:
an auxiliary circuit disposed on the substrate;
and a planarization layer covering the driving circuit and the auxiliary circuit, wherein the anode and the auxiliary electrode are disposed on the planarization layer and electrically connected to the driving circuit and the auxiliary circuit through via holes on the planarization layer, respectively.
7. A method for manufacturing a display panel, the method comprising:
providing a substrate;
forming a light-shielding metal pattern, a driving circuit, an auxiliary electrode and an anode on the substrate, wherein the driving circuit is disposed right above the light-shielding metal pattern;
forming a pixel defining layer on the auxiliary electrode and the anode electrode such that the anode electrode and the auxiliary electrode are partially exposed through the pixel defining layer;
forming an isolation mesa on a portion of the auxiliary electrode exposed through the pixel defining layer;
forming an isolation column main body on the isolation platform, wherein the cathode isolation column comprises the isolation platform and an isolation column main body, the isolation platform is conductive and is in contact with the auxiliary electrode, the isolation column main body is insulating and is arranged on the isolation platform, and the isolation column main body is insulating;
forming a light-emitting layer on the pixel defining layer and the exposed parts of the anode and the auxiliary electrode through the pixel defining layer, and controlling the evaporation angle of the light-emitting layer to be a first evaporation angle to enable the auxiliary electrode on the periphery of the isolation platform to be exposed through the light-emitting layer, wherein the light-emitting layer is isolated by the cathode isolating column;
and forming a cathode on the light-emitting layer, and controlling the evaporation angle of the cathode to be a second evaporation angle so that the cathode is in contact with the auxiliary electrode on the periphery of the isolation platform, wherein the cathode is isolated by the cathode isolation column and is in contact with the isolation platform and the auxiliary electrode on the periphery of the isolation platform.
8. The method of manufacturing a display panel according to claim 7, wherein the step of forming the spacer main body on the spacer stage includes:
forming a plurality of film layers on the isolation stage, wherein the etch resistance of the plurality of film layers increases layer by layer in a direction away from the substrate;
and etching the plurality of film layers to form the isolation column main body with the width gradually increasing in the direction away from the substrate.
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| CN201811075693.5A CN109360900B (en) | 2018-09-14 | 2018-09-14 | Display panel and manufacturing method thereof |
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| CN209071332U (en) * | 2018-10-31 | 2019-07-05 | 云谷（固安）科技有限公司 | Display panel, display screen and display terminal |
| CN113383441A (en) * | 2019-04-01 | 2021-09-10 | 深圳市柔宇科技股份有限公司 | OLED display panel and preparation method thereof |
| CN110137365B (en) * | 2019-05-23 | 2021-01-15 | 深圳市华星光电半导体显示技术有限公司 | OLED display panel and manufacturing method thereof |
| CN110212007A (en) * | 2019-06-21 | 2019-09-06 | 京东方科技集团股份有限公司 | Display base plate, display device and the method for making display base plate |
| CN110176483B (en) * | 2019-06-24 | 2020-10-27 | 深圳市华星光电半导体显示技术有限公司 | Organic light emitting diode display |
| CN110556406A (en) * | 2019-08-26 | 2019-12-10 | 深圳市华星光电半导体显示技术有限公司 | OLED display panel and preparation method thereof |
| CN110783482B (en) * | 2019-08-30 | 2022-04-08 | 昆山国显光电有限公司 | Display panel, manufacturing method thereof, display screen and display device |
| CN111129089B (en) * | 2019-12-17 | 2020-12-25 | 深圳市华星光电半导体显示技术有限公司 | Display panel and preparation method thereof |
| CN113013190B (en) | 2019-12-20 | 2022-07-29 | 京东方科技集团股份有限公司 | Display panel and manufacturing method thereof |
| CN111584761B (en) * | 2020-05-28 | 2022-12-02 | 合肥京东方卓印科技有限公司 | Display panel, manufacturing method thereof and display device |
| CN113270425B (en) * | 2021-05-14 | 2022-06-17 | 长沙惠科光电有限公司 | Array substrate, array substrate preparation method and display panel |
| CN113270426B (en) * | 2021-05-14 | 2022-07-22 | 长沙惠科光电有限公司 | Array substrate and display panel |
| WO2023173313A1 (en) * | 2022-03-16 | 2023-09-21 | 京东方科技集团股份有限公司 | Display substrate and manufacturing method therefor, and display apparatus |
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