CN109585699A - OLED display panel and its manufacturing method, display device - Google Patents
OLED display panel and its manufacturing method, display device Download PDFInfo
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- CN109585699A CN109585699A CN201811482237.2A CN201811482237A CN109585699A CN 109585699 A CN109585699 A CN 109585699A CN 201811482237 A CN201811482237 A CN 201811482237A CN 109585699 A CN109585699 A CN 109585699A
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/805—Electrodes
- H10K50/81—Anodes
- H10K50/814—Anodes combined with auxiliary electrodes, e.g. ITO layer combined with metal lines
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/805—Electrodes
- H10K50/82—Cathodes
- H10K50/824—Cathodes combined with auxiliary electrodes
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
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Abstract
The invention discloses a kind of OLED display panel and its manufacturing methods, display device, belong to field of display technology.This method comprises: sequentially forming organic luminescent layer, first electrode layer, transparent insulating layer and auxiliary electrode on the first substrate.Since organic luminous layer is first formed with auxiliary electrode, therefore during forming organic luminous layer by evaporation process, organic luminous layer is without being adhered on auxiliary electrode, so that the electric connection between auxiliary electrode and first electrode layer is preferable, the display effect of OLED display panel is effectively raised.
Description
Technical field
The present invention relates to field of display technology, in particular to a kind of OLED display panel and its manufacturing method, display device.
Background technique
Current organic electroluminescent (English: Organic Light-Emitting Diode abbreviation: OLED) display surface
Plate generally includes anode layer, organic luminous layer and cathode layer, can be divided into bottom emitting type OLED display panel according to light-emitting surface difference
With two kinds of top-emitting OLED display panel, since top-emitting OLED display panel can obtain bigger aperture opening ratio, in recent years
To have become a hot topic of research.
Top-emitting OLED display panel needs thin, transparent cathode layer and is able to carry out the anode layer that light reflects, to increase
Add the transmitance of light, and the generally existing resistance value of thin, transparent cathode layer is higher, the serious problem of voltage drop (IR drop).
Usually in cathode layer apart from power supply place get over far from voltage drop be more obvious, so as to cause OLED display panel
There is the phenomenon that apparent non-uniform light.
In order to overcome the problems, such as that voltage drop is serious in the cathode layer in OLED display panel, the OLED in formation is needed to show
Auxiliary electrode is formed before organic luminous layer and cathode layer in panel, which is electrically connected with the cathode layer being subsequently formed
It connects, power supply can provide electric signal for auxiliary electrode, can make the voltage in cathode layer at each position by the auxiliary electrode
It is identical.
Before the cathode layer formed in OLED display panel, need to form organic luminous layer by evaporation process.Logical
During crossing evaporation process formation organic luminous layer, which is liable to stick on auxiliary electrode, leads to auxiliary electricity
Being electrically connected between pole and the cathode layer being subsequently formed is affected, so cause the display effect of the OLED display panel compared with
Difference.
Summary of the invention
The embodiment of the invention provides a kind of OLED display panel and its manufacturing methods, display device.It can solve existing
The poor problem of the display effect of the OLED display panel of technology, the technical solution is as follows:
In a first aspect, providing a kind of manufacturing method of OLED display panel, which comprises
Organic luminous layer is formed on the first substrate, and the organic luminous layer includes multiple organic light emission blocks；
First electrode layer is formed on the organic luminous layer, the first electrode layer is one in cathode layer and anode layer
It is a；
Sequentially form transparent insulating layer and auxiliary electrode in the first electrode layer, the transparent insulating layer include: with
The multiple organic light emission block is one-to-one transparent and multiple limiting units of insulation, and the transparent insulating layer is described first
Orthographic projection on substrate is not overlapped with the orthographic projection of the auxiliary electrode on the first substrate；
Wherein, the first electrode layer is electrically connected with the auxiliary electrode, and each limiting unit is in first base
Orthographic projection on plate covers the orthographic projection of corresponding organic light emission block on the first substrate.
It is optionally, described to sequentially form transparent insulating layer and auxiliary electrode in the first electrode layer, comprising:
The transparent insulating layer is formed in the second substrate using a patterning processes；
The transparent insulating layer formed in the second substrate is transferred to and is formed with the first of the first electrode layer
On substrate；
The auxiliary electrode is formed using InkJet printing processes on the first substrate for being formed with the transparent insulating layer.
Optionally, the material of the transparent insulating layer includes: hydrophobic material.
Optionally, described to be formed in the second substrate after the transparent insulating layer using a patterning processes, the side
Method further include:
Surface roughness modifying process is carried out to the transparent insulating layer.
Optionally, it is described formed on the first substrate for being formed with the transparent insulating layer using InkJet printing processes it is described
Auxiliary electrode, comprising:
It is formed on the first substrate for being formed with the transparent insulating layer containing conductive material using InkJet printing processes
Ink；
Curing process is carried out to the ink containing conductive material, to form the auxiliary electrode.
Optionally, the conductive material includes: Argent grain.
Second aspect provides a kind of OLED display panel, comprising:
First substrate；
The first electrode layer and organic luminous layer being arranged on the first substrate, the organic luminous layer include multiple having
Side of the organic luminous layer far from the first substrate, first electricity is arranged in machine light-emitting block, the first electrode layer
Pole layer is one in cathode layer and anode layer；
And the transparent insulating layer and auxiliary electrode being arranged in the first electrode layer, the transparent insulating layer include:
One-to-one transparent and insulation multiple limiting units with the multiple organic light emission block, the transparent insulating layer is described the
Orthographic projection on one substrate is not overlapped with the orthographic projection of the auxiliary electrode on the first substrate；
Wherein, the first electrode layer is electrically connected with the auxiliary electrode, and each limiting unit is in first base
Orthographic projection on plate covers the orthographic projection of corresponding organic light emission block on the first substrate.
Optionally, the material of the transparent insulating layer includes: hydrophobic material.
Optionally, multiple thin film transistor (TFT)s are provided in the first substrate.
The third aspect provides a kind of display device characterized by comprising any OLED of second aspect is aobvious
Show panel.
Technical solution bring beneficial effect provided in an embodiment of the present invention includes at least:
Since organic luminous layer is first formed with auxiliary electrode, in the process for forming organic luminous layer by evaporation process
In, organic luminous layer is without being adhered on auxiliary electrode, so that the electric connection between auxiliary electrode and first electrode layer is preferable,
Effectively raise the display effect of OLED display panel.Also, transparent insulating layer is yet formed in first electrode layer, this is transparent
The orthographic projection of insulating layer on the first substrate is not overlapped, the transparent insulating layer with the orthographic projection of auxiliary electrode on the first substrate
Including multiple limiting units, organic luminous layer includes and multiple limiting units multiple organic light emission blocks correspondingly, each limit
The orthographic projection of unit processed on the first substrate covers the orthographic projection of corresponding organic light emission block on the first substrate, therefore assists electricity
The orthographic projection of pole on the first substrate is not overlapped with the orthographic projection of organic luminous layer on the first substrate, which can't
The light issued to organic luminous layer blocks, and further improves the display effect of OLED display panel.
Detailed description of the invention
To describe the technical solutions in the embodiments of the present invention more clearly, make required in being described below to embodiment
Attached drawing is briefly described, it should be apparent that, drawings in the following description are only some embodiments of the invention, for
For those of ordinary skill in the art, without creative efforts, it can also be obtained according to these attached drawings other
Attached drawing.
Fig. 1 is a kind of flow chart of the manufacturing method of OLED display panel provided in an embodiment of the present invention；
Fig. 2 is the flow chart of the manufacturing method of another OLED display panel provided in an embodiment of the present invention；
Fig. 3 is that one kind provided in an embodiment of the present invention sequentially forms the second electrode lay and pixel defining layer on the first substrate
Schematic diagram；
Fig. 4 is provided in an embodiment of the present invention a kind of organic light emission to be formed on the first substrate for be formed with pixel defining layer
The schematic diagram of layer；
Fig. 5 is provided in an embodiment of the present invention a kind of first electrode to be formed on the first substrate for be formed with organic luminous layer
The schematic diagram of layer；
Fig. 6 is the schematic diagram that auxiliary electrode is directly prepared in first electrode layer；
Fig. 7 is a kind of schematic diagram that transparent insulating layer is formed in the second substrate provided in an embodiment of the present invention；
Fig. 8 is provided in an embodiment of the present invention a kind of in the first substrate for being formed with first electrode layer formation transparent insulating layer
Schematic diagram；
Fig. 9 is the top view of the structure shown in Fig. 8；
Figure 10 is that a kind of formed on the first substrate for be formed with transparent insulating layer provided in an embodiment of the present invention assists electricity
The schematic diagram of pole；
Figure 11 is provided in an embodiment of the present invention a kind of formed on the first substrate for be formed with transparent insulating layer containing leading
The ink of electric material；
Figure 12 is a kind of schematic diagram for forming auxiliary electrode provided in an embodiment of the present invention.
Specific embodiment
To make the object, technical solutions and advantages of the present invention clearer, below in conjunction with attached drawing to embodiment party of the present invention
Formula is described in further detail.
In the related art, OLED display panel include: anode layer, pixel defining layer, auxiliary electrode, organic luminous layer and
Cathode layer.The auxiliary electrode is electrically connected with cathode layer, and the pixel defining layer and auxiliary electrode can limit multiple array arrangements
Subpixel area, which includes: the hole injection layer that setting is sequentially overlapped in each subpixel area, hole
Transport layer, organic light emission block, electron transfer layer and electron injecting layer.Wherein, the hole injection being arranged in each subpixel area
Layer is connect with anode layer, and the electron injecting layer being arranged in each subpixel area is connect with cathode layer.It should be noted that each
Hole injection layer, hole transmission layer, organic light emission block, electron transfer layer and electron injecting layer in subpixel area have belonged to
Machine material, electric conductivity are poor.
When preparing the OLED display panel, anode layer, pixel defining layer and auxiliary electricity can be sequentially formed on substrate
Pole.Then hole injection layer, hole transmission layer, organic light emission are being sequentially formed in each subpixel area using evaporation process
Block, electron transfer layer and electron injecting layer.Finally re-form cathode layer.
However, the organic material of vapor deposition is liable to stick on auxiliary electrode during evaporation process, lead to auxiliary electricity
Being electrically connected between pole and the cathode layer being subsequently formed is affected, so cause the display effect of the OLED display panel compared with
Difference.In order to guarantee to be electrically connected preferable between auxiliary electrode and cathode layer, need organic material on auxiliary electrode using laser
Material evaporates, but dust easily occurs in the process, these dust are easy to be attached to the sub- picture in OLED display panel again
In plain region, the display effect of the OLED display panel is appointed so poor.
Referring to FIG. 1, Fig. 1 is a kind of flow chart of the manufacturing method of OLED display panel provided in an embodiment of the present invention.
This method may include:
Step 101 forms organic luminous layer on the first substrate.The organic luminous layer includes multiple organic light emission blocks.
Step 102 forms first electrode layer on organic luminous layer.The first electrode layer is in cathode layer and anode layer
One.
Step 103 sequentially forms transparent insulating layer and auxiliary electrode in first electrode layer.The transparent insulating layer includes:
One-to-one transparent and insulation multiple limiting units with multiple organic light emission blocks, transparent insulating layer is on the first substrate just
Projection, is not overlapped with the orthographic projection of auxiliary electrode on the first substrate.
Wherein, which is electrically connected with auxiliary electrode, and the orthographic projection of each limiting unit on the first substrate is covered
Cover the orthographic projection of corresponding organic light emission block on the first substrate.
In conclusion the manufacturing method of OLED display panel provided in an embodiment of the present invention, comprising: on the first substrate according to
Secondary formation organic luminous layer, first electrode layer, transparent insulating layer and auxiliary electrode.Since organic luminous layer is first and auxiliary electrode shape
At, therefore during forming organic luminous layer by evaporation process, organic luminous layer makes without being adhered on auxiliary electrode
The electric connection obtained between auxiliary electrode and first electrode layer is preferable, effectively raises the display effect of OLED display panel.
Also, transparent insulating layer is yet formed in first electrode layer, the orthographic projection of the transparent insulating layer on the first substrate, with auxiliary electricity
The orthographic projection of pole on the first substrate is not overlapped, which includes multiple limiting units, organic luminous layer include with it is more
Multiple organic light emission blocks, the orthographic projection covering of each limiting unit on the first substrate are corresponding correspondingly for a limiting unit
The orthographic projection of organic light emission block on the first substrate, therefore auxiliary electrode orthographic projection on the first substrate and organic luminous layer exist
Orthographic projection on first substrate is not overlapped, and the light which can't issue organic luminous layer blocks, into
The display effect for improving OLED display panel of one step.
Referring to FIG. 2, Fig. 2 is the process of the manufacturing method of another OLED display panel provided in an embodiment of the present invention
Figure.This method may include:
Step 201 sequentially forms the second electrode lay and pixel defining layer on the first substrate.
In embodiments of the present invention, which can be to be provided with multiple thin film transistor (TFT)s (English: Thin Film
Transistor；Substrate referred to as: TFT).Optionally, which can be the TFT of top gate type, or the TFT of bottom gate type,
The embodiment of the present invention is not construed as limiting this.
Optionally, the second electrode lay and the first electrode layer being subsequently formed, respectively one in cathode layer and anode layer
A, following embodiment is schematically illustrated so that the second electrode lay is anode layer as an example.The material of the second electrode lay can
To include the higher metal material of reflectivity, for example, the material of the second electrode lay can be metallic silver (referred to as: Ag), metal
Titanium (referred to as: Ti), metallic copper (referred to as: Cu), metallic aluminium (referred to as: Al) or alloy material.
Optionally, the material of the pixel defining layer can be organic material, for example, fluorinated polyimide, the poly- first of fluorination
Base methyl acrylate or polysiloxanes.
It is exemplary, as shown in figure 3, Fig. 3 is that one kind provided in an embodiment of the present invention sequentially forms second on the first substrate
The schematic diagram of electrode layer and pixel defining layer.Pass through appointing in the various ways such as deposition, coating and sputtering on first substrate 10
Then a kind of formation second electrode film forms the second electrode lay 20 by a patterning processes to the second electrode film, should
Patterning processes may include: photoresist coating, exposure, development, etching and photoresist lift off.It is being formed with second electrode again
Pixel defining layer film is formed by any one of various ways such as deposition, coating and sputtering on the first substrate 10 of layer 20,
Then pixel defining layer 30 is formed by a patterning processes to the pixel defining layer film, which can wrap
It includes: photoresist coating, exposure, development, etching and photoresist lift off.
It should be noted that first substrate 10 can be divided into the sub-pixel of multiple array arrangements by the pixel defining layer 30
Region 10a, the second electrode lay 20 include the electrode block 21 being arranged in each subpixel area 10a, each subpixel area
10a corresponds at least one TFT, and the electrode block 21 being arranged in each subpixel area 10a needs and the source in a corresponding TFT
Pole or drain electrode electrical connection.
Step 202 forms organic luminous layer on the first substrate for be formed with pixel defining layer.
Optionally, which includes: multiple organic light emission blocks, multiple organic light emission block and multiple sub-pixel areas
Domain corresponds, and each organic luminous layer block needs to be arranged in corresponding subpixel area.The organic luminous layer further include:
Hole injection layer, hole transmission layer, electron transfer layer and the electron injecting layer being arranged in each subpixel area.Wherein, hole
Implanted layer, hole transmission layer, organic light emission block, electron transfer layer and electron injecting layer are successively folded along the direction far from first substrate
It adds and sets.
It is exemplary, as shown in figure 4, Fig. 4 is provided in an embodiment of the present invention a kind of to be formed with the first of pixel defining layer
The schematic diagram of organic luminous layer is formed on substrate.Can be sequentially formed in each subpixel area 10a hole injection layer 40a,
Hole transmission layer 40b, organic light emission block 41, electron transfer layer 40c and electron injecting layer 40d, to be formed with pixel defining layer
Organic luminous layer 40 is formed on 30 first substrate 10.
Wherein, hole injection layer 40a, hole transmission layer 40b, organic light emission block 41 and electron transfer layer 40c can be adopted
It is formed with InkJet printing processes or evaporation process；Electron injecting layer 40d needs to be formed using evaporation process.
Step 203 forms first electrode layer on the first substrate for be formed with organic luminous layer.
Optionally, which is one in cathode layer and anode layer, and following embodiment is with first electrode layer
For what is schematically illustrated for cathode layer.The material of the first electrode layer may include transparent conductive material, for example, this is thoroughly
Bright conductive material is tin indium oxide (English: Indium Tin Oxide；Referred to as: ITO) or indium-zinc oxide is (English: Indium
zinc oxide；Referred to as: IZO).
It is exemplary, as shown in figure 5, Fig. 5 is provided in an embodiment of the present invention a kind of to be formed with the first of organic luminous layer
The schematic diagram of first electrode layer is formed on substrate.Can on the first substrate 10 for be formed with organic luminous layer 40 by deposition,
Any one of various ways such as coating and sputtering form first electrode layer 50.
Step 204 sequentially forms transparent insulating layer and auxiliary electrode on the first substrate for be formed with first electrode layer.
In embodiments of the present invention, since the organic light emission block after exposure-processed and development treatment in organic luminous layer may
The phenomenon that will appear ageing failure, therefore after the completion of organic luminous layer preparation, it cannot be prepared again by patterning processes subsequent
Film layer structure.
In an optional implementation manner, auxiliary electrode can be prepared using InkJet printing processes, which is
It is made of the electrode wires of more lateral arrangement electrode wires and Duo Gen longitudinal arrangement, any two adjacent electrode wires laterally arranged
A subpixel area can be surrounded with the electrode wires of any two adjacent longitudinal arrangements.
If directly preparing auxiliary electrode by InkJet printing processes in first electrode layer, as shown in fig. 6, Fig. 6 is
The schematic diagram of auxiliary electrode is directly prepared on one electrode layer, the minimum widith d1 of every electrode wires is 220um (micron), and two
The distance between adjacent subpixel area d2 is only 35~40um, therefore, is directly beaten by ink-jet when in first electrode layer
When print technique prepares auxiliary electrode, auxiliary electrode may block the light issued in subpixel area, lead to OLED
The display effect of display panel is poor.
Therefore, the embodiment of the present invention can first pass through transfer printing process in first electrode layer and form transparent insulating layer, then
Auxiliary electrode is formed using InkJet printing processes again, thus guarantee that the width of the electrode wires in the auxiliary electrode is 10~30um,
So that auxiliary electrode will not block the light issued in sub-pixel subpixel area, the aobvious of OLED display panel is improved
Show effect.
Exemplary, above-mentioned steps 204 may include following several sub-steps:
Sub-step 2041 forms transparent insulating layer using a patterning processes in the second substrate.
Optionally, which can be polyethylene terephthalate (English: Polyethylene
Terephthalate；Referred to as: PET) substrate.
In embodiments of the present invention, the material of the transparent insulating layer includes: hydrophobic material, for example, hydrophobic material can
With are as follows: the polyimides (English: Polyimide containing fluorine element；Referred to as: PI).
It is exemplary, as shown in fig. 7, Fig. 7 is that one kind provided in an embodiment of the present invention forms transparent insulation in the second substrate
The schematic diagram of layer.It can be formed on the second substrate 00a by any one of various ways such as deposition, coating and sputtering transparent
Then insulation film 60a forms transparent insulation by a patterning processes to the transparent insulation film 60a using mask plate 00b
Layer 60, a patterning processes may include: photoresist coating, exposure, development, etching and photoresist lift off.The transparent insulation
Layer 60 may include: one-to-one multiple transparent and insulation limiting unit 61 with multiple subpixel areas.
It, can also be with it should be noted that the material of the transparent insulation film 60a in Fig. 7 can only include hydrophobic material
It not only include hydrophobic material, but also including non-hydrophobic material.When the material of transparent insulation film 60a includes hydrophobic material and non-
When hydrophobic material, when forming transparent insulation film 60a, need first to form one layer of hydrophobic material on the second substrate 00a,
Then one layer of non-hydrophobic material is formed on hydrophobic material, it is thin so as to form transparent insulation on the second substrate 00a
Film 60a.
Sub-step 2042 carries out surface roughness modifying process to the transparent insulating layer formed in the second substrate.
In embodiments of the present invention, first electrode layer is formed with for the ease of subsequent be preferably transferred to transparent insulating layer
First substrate on, can first to the transparent insulating layer carry out surface roughness modifying process so that the table of the transparent insulating layer
Surface roughness increases, to increase the surface viscosity of transparent insulating layer, convenient for after subsequent transfer can preferably with the first electricity
Pole layer bonding.
It is exemplary, surface roughness modifying process can be carried out to transparent insulating layer by the way of plasma bombardment.
Transparent insulating layer after surface roughness modifying process is transferred to and is formed with first electrode layer by sub-step 2043
On first substrate.
Exemplary, as shown in Figure 8 and Figure 9, Fig. 8 is provided in an embodiment of the present invention a kind of to be formed with first electrode layer
First substrate forms the schematic diagram of transparent insulating layer, and Fig. 9 is the top view of the structure shown in Fig. 8.Surface roughness can be changed
Treated that transparent insulating layer 60 is transferred on the first substrate 10 for being formed with first electrode layer 50 for matter.After the completion of transfer, need
Guarantee that orthographic projection of each limiting unit 61 on first substrate 10 covers corresponding subpixel area 10a, so that each limit
Unit 61 processed can be covered on the organic light emission block being arranged in corresponding subpixel area 10a in the orthographic projection on first substrate 10
41。
Optionally, the area S1 of the orthographic projection of the limiting unit 61 on first substrate 10 needs to be greater than corresponding sub- picture
The area S2 of orthographic projection of the plain region 10a in first substrate 10 on the first substrate.For example, the relationship between the S2 and S1 is full
Foot: S1=(1+20%) × S2.
Optionally, the gap d 0 between the adjacent limiting unit 61 of any two is 10~30um.
Sub-step 2044 uses InkJet printing processes to form auxiliary electricity on the first substrate for be formed with transparent insulating layer
Pole.
Exemplary, as shown in Figure 10, Figure 10 is provided in an embodiment of the present invention a kind of to be formed with the of transparent insulating layer
The schematic diagram of auxiliary electrode is formed on one substrate.It can be beaten on the first substrate 10 for be formed with transparent insulating layer 60 using ink-jet
It prints technique and forms auxiliary electrode 70.The auxiliary electrode 70 is electrically connected with first electrode layer 50.
For example, above-mentioned sub-step 2044 may include the following steps:
Step A, it is formed on the first substrate for be formed with transparent insulating layer using InkJet printing processes and contains conductive material
Ink.
Optionally, the first substrate for being formed with transparent insulating layer can be carried out using the inkjet print head of model 1pl
Inkjet printing, to form the ink containing conductive material.The viscosity of the ink be 5~10cp (centipoise), density be 1.1~
1.3g/ml (gram every milliliter).The conductive material may include: Argent grain, and the diameter of the Argent grain needs to be less than 30nm (nanometer).
Illustratively, as shown in figure 11, Figure 11 is provided in an embodiment of the present invention a kind of to be formed with transparent insulating layer
The ink containing conductive material is formed on first substrate.The of transparent insulating layer 60 can be formed with using InkJet printing processes
The ink 70a containing conductive material is formed on one substrate 10.
It should be noted that since the material of transparent insulating layer 60 includes: hydrophobic material, in the mistake of inkjet printing
Ink 70a will not rest on transparent insulating layer 60 in journey, and can all stay to except transparent insulating layer 60 is on first substrate 10
In region except orthographic projection region.
Step B, curing process is carried out to the ink containing conductive material, to form auxiliary electrode.
Optionally, to containing conductive material ink carry out curing process when solidification temperature need to be less than 120 DEG C it is (Celsius
Degree), organic luminous layer, which is effectively avoided, since temperature is excessively high occurs the phenomenon that aging again.
Illustratively, as shown in figure 12, Figure 12 is a kind of schematic diagram for forming auxiliary electrode provided in an embodiment of the present invention.
Curing process can be carried out to the ink containing conductive material in the environment of environment temperature is less than 120 DEG C, to form auxiliary electricity
Pole 70.
It should be noted that since the gap between the adjacent limiting unit 61 of any two is 10~30um, institute
The width of electrode wires in the auxiliary electrode 70 of formation is also 10~30um.
In conclusion the manufacturing method of OLED display panel provided in an embodiment of the present invention, comprising: on the first substrate according to
Secondary formation organic luminous layer, first electrode layer, transparent insulating layer and auxiliary electrode.Since organic luminous layer is first and auxiliary electrode shape
At, therefore during forming organic luminous layer by evaporation process, organic luminous layer makes without being adhered on auxiliary electrode
The electric connection obtained between auxiliary electrode and first electrode layer is preferable, effectively raises the display effect of OLED display panel.
Also, transparent insulating layer is yet formed in first electrode layer, the orthographic projection of the transparent insulating layer on the first substrate, with auxiliary electricity
The orthographic projection of pole on the first substrate is not overlapped, which includes multiple limiting units, organic luminous layer include with it is more
Multiple organic light emission blocks, the orthographic projection covering of each limiting unit on the first substrate are corresponding correspondingly for a limiting unit
The orthographic projection of organic light emission block on the first substrate, therefore auxiliary electrode orthographic projection on the first substrate and organic luminous layer exist
Orthographic projection on first substrate is not overlapped, and the light which can't issue organic luminous layer blocks, into
The display effect for improving OLED display panel of one step.
The embodiment of the invention also provides a kind of OLED display panels, and as described in Figure 10, which can wrap
It includes:
First substrate 10.
The first electrode layer 50 and organic luminous layer 40 being arranged on the first substrate 10, the organic luminous layer 40 include more
Side of the organic luminous layer 40 far from first substrate 10 is arranged in a organic light emission block 41, the first electrode layer 50, first electricity
Pole layer 50 is one in cathode layer and anode layer.
And the transparent insulating layer 60 and auxiliary electrode 70 being arranged in first electrode layer 50, the transparent insulating layer 60 packet
It includes: one-to-one transparent and insulation multiple limiting units 61 with multiple organic light emission blocks 41.The transparent insulating layer 60 is
Orthographic projection on one substrate 10 is not overlapped with orthographic projection of the auxiliary electrode 70 on first substrate 10.
Wherein, which is electrically connected with auxiliary electrode 70, and each limiting unit 61 is on first substrate 10
Orthographic projection covers orthographic projection of the corresponding organic light emission block 41 on first substrate 10.
Optionally, the material of the transparent insulating layer 60 includes: hydrophobic material.For example, the hydrophobic material include: containing
The PI of fluorine element.
Optionally, which can also include: the second electrode lay 20 and pixel defining layer 30.The second electrode
Layer 20 and first electrode layer 50 are respectively one in cathode layer and anode layer, and the embodiment of the present invention is to be with first electrode layer 50
Cathode layer, the second electrode lay 20 are what anode layer illustrated.
The pixel defining layer 30 is for first substrate 10 to be divided into and multiple subpixel area 10a, multiple sub-pixel
Region 10a and multiple organic light emission blocks 41 correspond.
Optionally, multiple TFT are provided in first substrate 10.The second electrode lay 20 is included in each subpixel area 10a
The electrode block 21 of interior setting, each subpixel area 10a correspond at least one TFT, the electricity being arranged in each subpixel area 10a
Pole block 21 needs and the source electrode in a corresponding TFT or the electrical connection that drains.
Optionally, organic luminous layer 40 may include: the hole note that setting is sequentially overlapped in each subpixel area 10a
Enter a layer 40a, hole transmission layer 40b, organic light emission block 41, electron transfer layer 40c and electron injecting layer 40d.Wherein, which infuses
Enter layer 40a to be electrically connected with the second electrode lay 20, electron injecting layer 40d is electrically connected with first electrode layer 50.
In conclusion OLED display panel provided in an embodiment of the present invention, comprising: first substrate, on the first substrate
It is sequentially overlapped organic luminous layer, first electrode layer, transparent insulating layer and the auxiliary electrode of setting.Due to organic luminous layer first with it is auxiliary
Electrode is helped to be formed, therefore during forming organic luminous layer by evaporation process, organic luminous layer is without being adhered to auxiliary
On electrode, so that the electric connection between auxiliary electrode and first electrode layer is preferable, OLED display panel is effectively raised
Display effect.Also, transparent insulating layer is yet formed in first electrode layer, the positive throwing of the transparent insulating layer on the first substrate
Shadow is not overlapped with the orthographic projection of auxiliary electrode on the first substrate, which includes multiple limiting units, organic light emission
Layer includes and multiple limiting units multiple organic light emission blocks correspondingly, the orthographic projection of each limiting unit on the first substrate
Cover the orthographic projection of corresponding organic light emission block on the first substrate, thus the orthographic projection of auxiliary electrode on the first substrate with have
The orthographic projection of machine luminescent layer on the first substrate is not overlapped, the auxiliary electrode can't to the light that organic luminous layer is issued into
Row blocks, and further improves the display effect of OLED display panel.
It is apparent to those skilled in the art that for convenience and simplicity of description, the OLED of foregoing description
The principle of display panel, can with reference to aforementioned display panel manufacturing method embodiment in corresponding description, herein no longer
It repeats.
The embodiment of the invention also provides a kind of display device, which may include that the OLED shown in Figure 10 is shown
Panel.The display device can be with are as follows: Electronic Paper, mobile phone, tablet computer, television set, display, laptop, Digital Frame,
Any products or components having a display function such as navigator.
The foregoing is merely optional embodiments of the invention, are not intended to limit the invention, all in spirit of the invention
Within principle, any modification, equivalent replacement, improvement and so on be should all be included in the protection scope of the present invention.
Claims (10)
1. a kind of manufacturing method of OLED display panel, which is characterized in that the described method includes:
Organic luminous layer is formed on the first substrate, and the organic luminous layer includes multiple organic light emission blocks；
First electrode layer is formed on the organic luminous layer, the first electrode layer is one in cathode layer and anode layer；
Sequentially form transparent insulating layer and auxiliary electrode in the first electrode layer, the transparent insulating layer include: with it is described
Multiple organic light emission blocks are one-to-one transparent and multiple limiting units of insulation, and the transparent insulating layer is in the first substrate
On orthographic projection, be not overlapped with the orthographic projection of the auxiliary electrode on the first substrate；
Wherein, the first electrode layer is electrically connected with the auxiliary electrode, and each limiting unit is on the first substrate
Orthographic projection cover the orthographic projection of corresponding organic light emission block on the first substrate.
2. the method according to claim 1, wherein it is described sequentially formed in the first electrode layer it is transparent absolutely
Edge layer and auxiliary electrode, comprising:
The transparent insulating layer is formed in the second substrate using a patterning processes；
The transparent insulating layer formed in the second substrate is transferred to the first substrate for being formed with the first electrode layer
On；
The auxiliary electrode is formed using InkJet printing processes on the first substrate for being formed with the transparent insulating layer.
3. method according to claim 1 or 2, which is characterized in that
The material of the transparent insulating layer includes: hydrophobic material.
4. according to the method described in claim 2, it is characterized in that, described formed in the second substrate using a patterning processes
After the transparent insulating layer, the method also includes:
Surface roughness modifying process is carried out to the transparent insulating layer.
5. according to the method described in claim 2, it is characterized in that, described in the first substrate for being formed with the transparent insulating layer
It is upper to form the auxiliary electrode using InkJet printing processes, comprising:
The ink containing conductive material is formed on the first substrate for being formed with the transparent insulating layer using InkJet printing processes；
Curing process is carried out to the ink containing conductive material, to form the auxiliary electrode.
6. according to the method described in claim 5, it is characterized in that,
The conductive material includes: Argent grain.
7. a kind of OLED display panel characterized by comprising
First substrate；
The first electrode layer and organic luminous layer being arranged on the first substrate, the organic luminous layer include multiple organic hairs
Side of the organic luminous layer far from the first substrate, the first electrode layer is arranged in light block, the first electrode layer
For one in cathode layer and anode layer；
And the transparent insulating layer and auxiliary electrode being arranged in the first electrode layer, the transparent insulating layer include: and institute
Multiple limiting units that multiple organic light emission blocks are one-to-one transparent and insulate are stated, the transparent insulating layer is in first base
Orthographic projection on plate is not overlapped with the orthographic projection of the auxiliary electrode on the first substrate；
Wherein, the first electrode layer is electrically connected with the auxiliary electrode, and each limiting unit is on the first substrate
Orthographic projection cover the orthographic projection of corresponding organic light emission block on the first substrate.
8. OLED display panel according to claim 7, which is characterized in that
The material of the transparent insulating layer includes: hydrophobic material.
9. OLED display panel according to claim 7, which is characterized in that
Multiple thin film transistor (TFT)s are provided in the first substrate.
10. a kind of display device characterized by comprising any OLED display panel of claim 7 to 9.
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