CN109341858B - Gradual change type scattering structure spectrum analysis device and spectrum restoration method - Google Patents
Gradual change type scattering structure spectrum analysis device and spectrum restoration method Download PDFInfo
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- 238000001228 spectrum Methods 0.000 title claims abstract description 70
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- 238000000034 method Methods 0.000 title claims abstract description 31
- 230000008859 change Effects 0.000 title claims abstract description 28
- 239000002245 particle Substances 0.000 claims abstract description 76
- 239000000758 substrate Substances 0.000 claims abstract description 28
- 239000011159 matrix material Substances 0.000 claims abstract description 16
- 238000009826 distribution Methods 0.000 claims description 13
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 11
- 230000003595 spectral effect Effects 0.000 claims description 11
- 230000003287 optical effect Effects 0.000 claims description 10
- 230000005855 radiation Effects 0.000 claims description 8
- 238000004528 spin coating Methods 0.000 claims description 8
- 238000001514 detection method Methods 0.000 claims description 7
- 238000012545 processing Methods 0.000 claims description 7
- 238000004458 analytical method Methods 0.000 claims description 5
- 238000010894 electron beam technology Methods 0.000 claims description 5
- 238000005530 etching Methods 0.000 claims description 5
- 238000001338 self-assembly Methods 0.000 claims description 5
- 239000000377 silicon dioxide Substances 0.000 claims description 5
- 230000008020 evaporation Effects 0.000 claims description 4
- 238000001704 evaporation Methods 0.000 claims description 4
- 230000008569 process Effects 0.000 claims description 4
- 238000004611 spectroscopical analysis Methods 0.000 claims description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 3
- 238000000206 photolithography Methods 0.000 claims description 3
- 238000012847 principal component analysis method Methods 0.000 claims description 3
- 239000004793 Polystyrene Substances 0.000 claims description 2
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 2
- 239000000284 extract Substances 0.000 claims description 2
- 230000001678 irradiating effect Effects 0.000 claims description 2
- GQYHUHYESMUTHG-UHFFFAOYSA-N lithium niobate Chemical compound [Li+].[O-][Nb](=O)=O GQYHUHYESMUTHG-UHFFFAOYSA-N 0.000 claims description 2
- 239000004005 microsphere Substances 0.000 claims description 2
- 238000010606 normalization Methods 0.000 claims description 2
- 229920002223 polystyrene Polymers 0.000 claims description 2
- 235000012239 silicon dioxide Nutrition 0.000 claims description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 2
- 239000011787 zinc oxide Substances 0.000 claims 1
- 230000011218 segmentation Effects 0.000 abstract description 5
- 238000005516 engineering process Methods 0.000 description 16
- 238000004519 manufacturing process Methods 0.000 description 7
- 238000011161 development Methods 0.000 description 6
- 230000018109 developmental process Effects 0.000 description 6
- 238000005259 measurement Methods 0.000 description 5
- 239000002105 nanoparticle Substances 0.000 description 5
- 238000001259 photo etching Methods 0.000 description 4
- 238000004364 calculation method Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000013307 optical fiber Substances 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 2
- 229940079593 drug Drugs 0.000 description 2
- 239000003814 drug Substances 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 235000012055 fruits and vegetables Nutrition 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000011084 recovery Methods 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- 239000012780 transparent material Substances 0.000 description 2
- 241000282414 Homo sapiens Species 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 238000012271 agricultural production Methods 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000001149 cognitive effect Effects 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000004049 embossing Methods 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000002075 inversion recovery Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000002381 microspectrum Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 239000004038 photonic crystal Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000002096 quantum dot Substances 0.000 description 1
- 230000010076 replication Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
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- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
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Abstract
The invention provides a spectrum analysis device and a spectrum restoration method for a gradual change type scattering structure. The device comprises a transparent substrate, a scattering particle layer with gradual change structural characteristics is arranged on the transparent substrate, a photoelectric detector array for receiving scattered light is arranged below the substrate, two confocal lenses are arranged above the scattering particle layer, and an aperture diaphragm is arranged between the confocal lenses. The incident light passes through two confocal lenses, then passes through a scattering particle layer, further generates scattering light spots with different characteristics on a photoelectric detector array, finally obtains a spectrum restoration matrix by adopting a method of local windowing, characteristic weighting and spectrum segmentation restoration of the scattering light spots, and restores the spectrum by adopting a method of solving a large linear equation set by Tikhonov regularization. According to the invention, the scattering particle layer adopts the scattering particles with gradual change structural characteristics, so that the contradiction between a wide spectrum analysis range and high spectrum resolution is effectively solved.
Description
Technical Field
The invention relates to the technical field of portable and intelligent miniature spectrum analysis instruments, in particular to a spectrum analysis device with a gradual-change scattering structure and a spectrum restoration method.
Background
The applications of spectroscopy involve almost all areas of our life, such as chemical, pharmaceutical, agricultural production, biomedical, food-safety, environmental safety, aerospace, energy, and so on. With the progress of society and the development of advanced scientific technologies such as information technology of the Internet of things, micro-nano manufacturing and biophotonics, large-scale expensive spectrum analysis equipment leaves a laboratory, so that the cognitive defect of human beings on substances is overcome, detection of fruit and vegetable sugar, moisture, authenticity of medicines, skin age, wine quality and the like is easily realized, and the detection of the fruit and vegetable sugar, moisture, authenticity of medicines, skin age, wine quality and the like is possible to enter the life of people. The development and application of portable and intelligent micro spectrum technology can bring revolutionary changes to the living standard of people and living modes. The miniaturized and integrated spectrum analysis chip technology for intelligent terminal equipment (such as a smart phone) is a new important development direction of advanced spectrum analysis technology and instruments. Development of a novel spectrum analysis device with miniaturization, low cost, high resolution, wide spectrum measurement range and high measurement speed is a research hotspot in various countries at present.
With the rapid development of the emerging disciplines of micro-nano optics, computational optics and the like, scientists creatively propose a plurality of novel principle spectrum analysis technologies in the aspects of physical mechanism and analysis principle, unlike the traditional spectrometer basic spectrum analysis principles (such as a grating spectrometer and a Fourier spectrometer). Such as microcavity resonance-based chip spectrometers, photonic crystal-based chip spectrometers, spot mode field, fringe field distribution-based chip spectrometers, and quantum dot light emission-based spectrometers. The research shows that the light spots generated after the light waves with different wavelengths pass through the non-uniform scattering medium, the optical waveguide (optical fiber) or the specially arranged diffraction medium have different characteristic light field mode distribution, the light spectrum is used as a parameter to carry out spectrum inversion recovery, and the detection of the spectrum component distribution of the incident light can be well realized. The interference light spot-based calculation spectrum technology can realize higher spectrum resolution, and has the main problems of being easily influenced by external environment factors such as temperature, vibration and the like; the multimode optical fiber, the tapered optical fiber and the optical waveguide are utilized to generate interference light spots, so that the problems that space light is difficult to couple and a coupling device is difficult to chip are solved; the phase modulation array structure and the diffraction optical element generate interference light spots, and the interference light spots are easy to integrate into chips, but the disturbance of the space light incidence conditions (angle, collimation and the like) directly affects the measurement result. The spectrum calculating technology based on the scattered light spots has the advantages of easy integration and chip formation, insensitivity to space light incidence conditions and small environmental influence, and meets the technical requirements of the Internet of things, smart phones and the like. However, the spectrum analysis range and the spectrum resolution of the spectrum analysis chip of the technology need to be further improved, and how to realize that the spectrum resolution is higher in the spectrum analysis range with a certain width is the primary problem of the development of the scattered light spot-based calculation spectrum technology. The problem group of the Nanjing university of post Yang Tao provides a phase modulation step array micro spectrometer (200910264251. X), a diffraction hole array micro spectrometer and a high-resolution spectrum restoration method thereof (201210004166.1) and a micro spectrometer (201210578653.9), and the three technical schemes respectively adopt a step array structure, a diffraction hole array structure and a nanoparticle coating, but the three structural characteristics are periodic or disordered, and cannot solve the contradiction between the wide range of spectrum analysis and high spectrum resolution.
Disclosure of Invention
The invention aims to provide a spectrum analysis device with a gradual-change scattering structure, which is used for solving the contradiction between the wide spectrum analysis range and the high spectrum resolution of a miniature spectrum analysis chip.
The second object of the present invention is to provide a spectrum restoration method based on the spectrum analyzer with a graded scattering structure.
One of the objects of the present invention is achieved by: a spectrum analysis device of a gradual change type scattering structure comprises a transparent substrate, wherein a scattering particle layer is arranged on the surface of the substrate, the scattering particle layer has gradual change structural characteristics, the gradual change structural characteristics of the scattering particle layer are represented by gradual change distribution of scattering particle size, density and/or refractive index, and the gradual change form of the gradual change structural characteristics is scattering or radiation; two confocal lenses are arranged above the substrate, and an aperture diaphragm is arranged between the two confocal lenses; a photodetector array is disposed below the substrate.
A thickness-adjustable distance matching layer is arranged between the substrate and the photodetector array.
The size of the scattering particles on the scattering particle layer is in the order of nanometers to micrometers.
The scattering particle layer is arranged on the upper surface or the lower surface of the substrate.
The scattering particle layer is manufactured through photoetching, electron beam etching, nanometer self-assembly, evaporation plating or spin coating technology.
The second object of the invention is realized in that: a spectrum restoration method based on a spectrum analysis device of a gradual-change scattering structure comprises the following steps:
a. Irradiating the incident light to a scattering particle layer on the surface of the transparent substrate through two confocal lenses; the scattering particle layer has a gradual change structural characteristic, the gradual change structural characteristic of the scattering particle layer is represented by gradual change distribution of scattering particle size, density and/or refractive index, and the gradual change form of the gradual change structural characteristic is scattering or radiation;
b. A photodetector array positioned below the substrate receives the scattered light scattered by the scattered particle layer and transmits the received light signal to a data processing unit;
c. The data processing unit receives the optical signals sent by the photoelectric detector array, sets local windows according to the gradual change structural characteristics of the scattering particle layer, continuously searches the whole window, extracts the characteristics of the optical signals in each local window, obtains the characteristics related to each wavelength, and forms a spectrum restoration matrix through normalization;
d. And c, solving the spectrum restoration matrix in the step c through Tikhonov regularization to obtain the content of each spectrum component.
In the step c, mathematical morphology and wavelet multi-scale mathematical analysis tools are adopted when the characteristics of the optical signals in each local window are extracted; and then, a feature related to each wavelength is obtained by using a principal component analysis method.
Step d, calculating the content of each spectral component by the following formula:
Ψ=PSF-1S
Wherein, ψ is m×1 matrix, which represents the spectrum component content of each wavelength after discretization; PSF is m×n matrix, which is the spectrum restoration matrix in step c; s is the light intensity of each detection unit on the scattered photodetector array.
According to the invention, the scattering particle layer with the gradual change structure characteristic is adopted to scatter incident light, when light with a certain wavelength passes through the scattering particle layer with the gradual change structure characteristic, scattering light spots (speckles for short) with different characteristics are generated after the light is modulated by scattering media with different structures, the broad-spectrum light waves can correspond to the light spot signals after the superposition of a plurality of speckle characteristics, and the superposition coefficients of the speckle characteristics of each wavelength of different scattering structures are different. Therefore, the contradiction between the wide spectrum analysis range and the high spectrum resolution can be effectively solved by utilizing different combined stacked scattered light spots of the plurality of scattering structures for spectrum restoration. According to the invention, the scattered light spot local windowing, characteristic weighting and spectrum segmentation restoration method is adopted, invalid data caused by crosstalk, chromatic dispersion and device manufacturing errors can be effectively avoided, and the spectrum is restored by adopting a Tikhonov regularization method for solving a large linear equation set, so that distortion can be eliminated, and rapid and real-time spectrum restoration can be realized.
Drawings
Fig. 1 is a schematic structural diagram of a spectrum analyzer with a graded scattering structure according to the present invention.
Fig. 2 is a schematic diagram of a scattering particle layer structure with a gradient density structure according to an embodiment of the present invention.
Fig. 3 is a schematic view of a scattering particle layer with a gradually-changing size and a gradually-changing structure characteristic in an embodiment of the present invention.
Fig. 4 is a schematic view of a scattering particle layer with highly graded structural features according to an embodiment of the present invention.
Fig. 5 is a flow chart of spectral restoration according to the present invention.
FIG. 6 is a schematic diagram of a process for partial windowing, feature weighting, and spectral segmentation restoration of a scattered light spot.
In the figure: 1. a lens; 2. an aperture stop; 3. a scattering particle layer; 4. a substrate; 5. a distance matching layer; 6. a photodetector array; 7. scattering particles; 8. a local window.
Detailed Description
Example 1, a spectroscopic analysis device of graded scattering structure.
As shown in fig. 1, the spectrum analyzer with graded scattering structure provided by the invention comprises a substrate 4 made of transparent material, and a layer of scattering particles 3 with graded structural characteristics is arranged on the surface (upper surface or lower surface) of the substrate 4, wherein the scattering particles 3 are composed of a group of scattering particles with nanometer to micrometer scale. The graded structural features of the scattering particle layer 3 are represented by the size, density and/or refractive index etc. of the scattering particles having graded distribution rules including center-out radiation grading, outside-in radiation grading, unidirectional scattering grading, etc. The graded structural features of the scattering particle layer 3 may be realized by a plurality of structural feature parameters of the scattering particles, and the graded structure thereof may also be realized in various forms. As shown in fig. 2 to 4, fig. 2 to 4 provide three gradation types of the scattering particles 7, the gradation type of the scattering particles is a density gradation type in fig. 2, the gradation type of the scattering particles is a size gradation type in fig. 3, and the gradation type of the scattering particles is a height gradation type in fig. 4. Moreover, the three gradual change structures in fig. 2 to 4 are gradually changed from the center to the outside. It should be noted that, in the present invention, the graded structural feature of the scattering particle layer 3 is a graded structural feature of two-dimensional distribution, that is: the scattering particles are distributed gradually along the surface of the film layer of the scattering particle layer 3, so that when the incident light vertically irradiates the surface of the film layer of the scattering particle layer 3, the incident light is scattered by the scattering particles with different structures.
The radiation scattering particle layer 3 can be made of silicon dioxide, polystyrene microsphere, silicon nitride, zinc oxide (ZnO), lithium niobate and other materials. The preparation of the radiation scattering particle layer 3 can be carried out by adopting photoetching, electron beam etching, nanometer self-assembly, vapor plating or spin coating and other processes. For example, for the structure shown in fig. 3 in which the scattering particle size is graded from the center to the outside, spin coating may be used. For example: the scattering particles are silica microspheres (SiO 2) which can be prepared by a hydrolysis condensation method of tetraethoxysilane, and suspension of silica nanoparticles with different sizes is obtained by adjusting the proportion and the temperature of each component in the preparation process. And mixing the silica nanoparticle suspensions with different sizes, controlling the acceleration and the speed of spin coating by using a spin coating method, obtaining a scattering particle layer with gradient structural characteristics of outwards gradient distribution of the silica nanoparticles with different sizes along the rotation center, and fixing the nanoparticles on a substrate in an electrostatic assembly mode to form the scattering particle layer with outwards gradient structural characteristics of the center.
When the scattering particle layer 3 is a hole scattering structure, it can be prepared by, for example, evaporation, photolithography, and ion etching. The gradual change of the size of the hole is realized by manufacturing a precise pattern design of the photoetching plate. The mass production of the scattering particle layer 3 can be realized by embossing replication by a nano-imprinting method.
The incident light passing through the characteristic scattering particle layer 3 can generate scattering light spots with different characteristics, and the scattering light spots can be used for spectrum restoration, so that the contradiction between a wide spectrum analysis range and high spectrum resolution is solved, and the spectrum measurement range is enlarged.
Two confocal lenses 1 are arranged above the substrate 4, and the focal lengths of the two lenses 1 can be the same or different. The two confocal lenses 1 constitute an optical system for matching the diameter of the beam of incident light to be analysed with the size of the area of the detector under the substrate 4. An aperture stop 2 is arranged at the common focus between the two lenses 1, and the aperture stop 2 can eliminate the influence of stray light outside and inside the system so as to improve the measurement accuracy. A photodetector array 6 is disposed below the substrate 4, where the photodetector array 6 may employ a Charge Coupled Device (CCD) or a Complementary Metal Oxide Semiconductor (CMOS) device, and the photodetector array 6 is configured to receive scattered light of the light to be measured after passing through the scattering particle layer 3, so as to construct a scattering light spot generated by the scattering structure. The photodetector array 6 is connected to a data processing unit (not shown) which is mainly used for analyzing and calculating the data acquired by the photodetector array 6 for spectral restoration.
A distance matching layer 5 is further arranged between the substrate 4 and the photodetector array 6, the thickness of the distance matching layer 5 can be adjusted, and the characteristics of scattered light spots generated on the photodetector array 6 after incident light passes through the scattering particle layer 3 can be controlled by adjusting the thickness of the distance matching layer 5.
Example 2, a method of spectral restoration.
The spectrum restoration method provided in this embodiment is based on the spectrum analyzer of the graded scattering structure described in embodiment 1.
When the spectrum is measured, the light to be measured irradiates the scattering particle layer 3 after passing through the two confocal lenses 1, then irradiates each pixel of the photoelectric detector array 6 after passing through the distance matching layer 5. Light waves of different wavelengths are scattered when passing through the scattering particle layer 3 with graded structural features, and finally the light spots generated on the photodetector array 6 have light field pattern distributions of different features.
According to Lorenz-Mie theory and multiple scattering theory, particle light scattering characteristics are closely related to particle shape, composition, density, refractive index, size, incident wavelength and the like, and scattering media with different physical structural characteristics generate scattering spots with different characteristics. As shown in fig. 5, for a spectrum analysis device with a specific gradual-change scattering structure, light with a certain wavelength will generate scattering spots with different characteristics after being modulated by scattering media with different structures, and a broad spectrum light wave can correspond to a spot signal obtained by superposing a plurality of speckle features, and the superposition coefficients of the speckle features with different wavelengths are different for different scattering structures. Therefore, the contradiction between the wide spectrum analysis range and the high spectrum resolution can be effectively solved by utilizing different combined stacked scattered light spots of the plurality of scattering structures for spectrum restoration.
The computational spectroscopic analysis of the scattered light spot image based on the scattered particles can be expressed as:
g(x,y)=∫K(x,y,λ)·f(λ)dλ (1)
Where λ is the wavelength, f (λ) is the normalized component content of the wavelength λ, (x, y) is the coordinate position of the scattered light spot image, and g (x, y) is the light intensity value on the photodetector array 6 at a position of the light spot; k (x, y, λ) is the scattering medium space-spectral modulation function.
In practice, the speckle light field spectrum recovery can be expressed discretely as:
S=PSF·Ψ (2)
Wherein, ψ is m×1 matrix, which represents the spectrum component content of each wavelength after discretization, PSF is m×n matrix for normalized speckle characteristics obtained by detection for spectrum inversion, S is the light intensity of each detection unit on the photodetector array after discretization, and the scattered light spot image calculation spectrum is restored to solve ψ=PSF -1 S, namely a discrete discomfort inverse problem is solved.
The speckle image produced by the scattering particles can express information not only about the intensity of light at a certain position, but also information about the interrelation between the spot particles (image statistics, image characteristics). The light spot images at different positions of the spectrum analysis device of the gradual-change scattering structure correspond to different sensitive wavelengths. The invention adopts a scattered light spot local windowing, characteristic weighting and spectrum segmentation restoration method, as shown in fig. 6, a local window 8 with a certain size is arranged, continuous searching is carried out on the whole light spot (for the gradual change form of radiating outwards from the center, searching can be carried out along the ring shape), the effective characteristics of each scattered light spot window image are effectively extracted by utilizing a mathematical morphology and a wavelet multi-scale mathematical analysis tool, and then the characteristic with a certain degree of correlation with each wavelength is obtained by utilizing a principal component analysis method, and the image characteristics selected in the mode are normalized to form a spectrum restoration matrix. Finally, calculating the spectrum of the incident light, solving the PSF matrix equation through Tikhonov regularization, thereby obtaining the content of each spectrum component of the psi, and realizing the recovery of the spectrum.
The spectrum analysis device with the gradual change type scattering structure provided by the invention uses the scattering particle layer with the gradual change type two-dimensional distribution scattering structure characteristics as a key component of the spectrum analysis device, and combines a high-resolution spectrum restoration method based on the structure, compared with the prior art, the spectrum analysis device with the gradual change type two-dimensional distribution scattering structure has the following beneficial effects:
1. The spectrum analysis device has simple processing technology and low cost. By utilizing the now developed micro-nano processing technology and photoelectric technology, the two-dimensional micro-nano structural layer of the spectrum analysis device can be manufactured through technologies such as photoetching, electron beam etching, nano self-assembly, vapor deposition, spin coating and the like, and then batch manufacturing can be realized through a nano imprinting technology; meanwhile, the manufacturing material of the spectrum analysis device can be polymer or other transparent materials with low price, and the detector CCD and the CMOS are technical mature products, so the whole device has low cost.
2. The spectrum analysis device can realize spectrum analysis of a wide spectrum range and high spectrum resolution. The spectrum analysis device based on scattered light spot analysis is characterized in that the detector obtains signals with mixed speckle characteristics of all wavelengths, then the speckle characteristics of all wavelengths are extracted from the mixed signals, the contrast of the image characteristics of all wavelengths in the mixed signals is lower and lower along with the increase of the spectrum analysis range, and after the contrast reaches a certain degree, the spectrum cannot be restored. The scattering medium with different structures of the gradual change scattering structure generates scattering light spots with different characteristics after modulation, and the different combination forms of the plurality of scattering structures are utilized to overlap the scattering light spots for spectrum restoration, so that the contradiction between a wide spectrum analysis range and high spectrum resolution is solved, and the wide spectrum analysis range and the high spectrum resolution are realized.
3. A spectrum restoration matrix is obtained by adopting a scattering light spot local windowing, characteristic weighting and spectrum segmentation restoration method, invalid data caused by crosstalk, chromatic dispersion and device manufacturing errors can be effectively avoided, and a spectrum is restored by adopting a Tikhonov regularization method for solving a large linear equation set, so that distortion can be eliminated, and rapid and real-time spectrum restoration can be realized.
Claims (10)
1. The spectrum analysis device of the graded scattering structure is characterized by comprising a transparent substrate, wherein a scattering particle layer is arranged on the surface of the substrate, the scattering particle layer has graded structural characteristics, the graded structural characteristics of the scattering particle layer are represented by graded distribution of the size, density or height of scattering particles, and the graded distribution is characterized in that the center is subjected to outwards radiation grading, outwards-inwards radiation grading or unidirectional scattering grading; the scattering particle layer is made of silicon dioxide, polystyrene microspheres, silicon nitride, zinc oxide or lithium niobate materials; two confocal lenses are arranged above the substrate, and an aperture diaphragm is arranged between the two confocal lenses; a photodetector array is arranged below the substrate; light waves with different wavelengths are scattered when passing through the scattering particle layer with gradual change structural characteristics, so that scattering light spots with different characteristics are generated, and the light waves are used for spectrum restoration.
2. The spectroscopic apparatus of claim 1, wherein a thickness-adjustable distance matching layer is provided between the substrate and the photodetector array.
3. The spectroscopic apparatus of claim 1, wherein the size of the scattering particles on the scattering particle layer is in the order of nanometers to micrometers.
4. The spectroscopic apparatus of claim 1, wherein the scattering particle layer is provided on an upper surface or a lower surface of the substrate.
5. The spectroscopic analysis device of claim 1, wherein the scattering particle layer is fabricated by photolithography, electron beam etching, nano self-assembly, evaporation or spin-coating processes.
6. A method of spectral restoration using the apparatus of claim 1, the method comprising the steps of:
a. irradiating the incident light to a scattering particle layer on the surface of the transparent substrate through two confocal lenses;
b. A photodetector array positioned below the substrate receives the scattered light scattered by the scattered particle layer and transmits the received light signal to a data processing unit;
c. The data processing unit receives the optical signals sent by the photoelectric detector array, sets local windows according to the gradual change structural characteristics of the scattering particle layer, continuously searches the whole window, extracts the characteristics of the optical signals in each local window, obtains the characteristics related to each wavelength, and forms a spectrum restoration matrix through normalization;
d. And c, solving the spectrum restoration matrix in the step c through Tikhonov regularization to obtain the content of each spectrum component.
7. The method of spectral restoration according to claim 6, wherein in step c, mathematical morphology and wavelet multi-scale mathematical analysis tools are used in extracting the features of the optical signal in each local window; and then, a feature related to each wavelength is obtained by using a principal component analysis method.
8. The method of spectral restoration according to claim 6, wherein step d calculates the content of each spectral component by the following formula:
in the method, in the process of the invention, For m x 1 matrix, representing the content of spectrum component of each wavelength after discretization; PSF is m×n matrix, which is the spectrum restoration matrix in step c; s is the light intensity of each detection unit on the scattered photodetector array.
9. The method of spectral restoration according to claim 6, wherein the scattering particle layer in step a is formed by photolithography, electron beam etching, nano self-assembly, evaporation or spin-coating.
10. The method of spectral restoration according to claim 6, wherein the scattering particle layer in step a is disposed on an upper surface or a lower surface of the substrate.
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