CN109283157B - High-temperature low-pressure multiple reflection pool control system - Google Patents
High-temperature low-pressure multiple reflection pool control system Download PDFInfo
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- CN109283157B CN109283157B CN201811424504.0A CN201811424504A CN109283157B CN 109283157 B CN109283157 B CN 109283157B CN 201811424504 A CN201811424504 A CN 201811424504A CN 109283157 B CN109283157 B CN 109283157B
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- 230000001105 regulatory effect Effects 0.000 claims description 51
- 238000010438 heat treatment Methods 0.000 claims description 22
- 238000004458 analytical method Methods 0.000 claims description 8
- 238000006243 chemical reaction Methods 0.000 claims description 5
- 238000001816 cooling Methods 0.000 claims description 5
- 238000001914 filtration Methods 0.000 claims description 5
- -1 polytetrafluoroethylene Polymers 0.000 claims description 5
- 229920001343 polytetrafluoroethylene Polymers 0.000 claims description 5
- 239000004810 polytetrafluoroethylene Substances 0.000 claims description 5
- 238000005516 engineering process Methods 0.000 abstract description 5
- 238000000041 tunable diode laser absorption spectroscopy Methods 0.000 abstract description 4
- 230000007547 defect Effects 0.000 abstract description 3
- 239000007789 gas Substances 0.000 description 31
- 238000005259 measurement Methods 0.000 description 7
- 238000001228 spectrum Methods 0.000 description 7
- 238000001514 detection method Methods 0.000 description 5
- 238000000862 absorption spectrum Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 238000005086 pumping Methods 0.000 description 3
- 230000003595 spectral effect Effects 0.000 description 3
- 230000001276 controlling effect Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000000523 sample Substances 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000003745 diagnosis Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/39—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using tunable lasers
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D27/00—Simultaneous control of variables covered by two or more of main groups G05D1/00 - G05D25/00
- G05D27/02—Simultaneous control of variables covered by two or more of main groups G05D1/00 - G05D25/00 characterised by the use of electric means
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/39—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using tunable lasers
- G01N2021/391—Intracavity sample
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/39—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using tunable lasers
- G01N2021/396—Type of laser source
- G01N2021/399—Diode laser
Abstract
The invention discloses a high-temperature low-pressure multiple reflection pool control system which comprises a high-temperature control unit and a low-pressure control unit. In high temperature control, the system adopts a multi-section PID temperature control mode, and the temperature non-uniformity of the gas in the measuring pool is effectively solved on the basis of ensuring the temperature control precision. In the low-pressure control, a negative pressure source is formed by the vacuum pump and the buffer tank, so that the defect that the vacuum pump cannot work for a long time is overcome, the service life of the vacuum pump is ensured, and the accurate control of the air inlet flow and the air pressure of the measuring pool is realized through PID fine tuning control of the electric valve. The high-temperature low-pressure multiple reflection pool control system provides powerful guarantee for the application of the TDLAS technology in the relevant application fields.
Description
Technical Field
The invention belongs to the field of absorption spectrum of tunable diodes, and particularly relates to a high-temperature low-pressure multiple reflection pool control system.
Background
The tunable absorption spectrum TDLAS technology controls the tunable semiconductor laser to output light beams with continuously-changing wavelength by using a current tuning mode, and the outgoing light beams pass through a multiple reflection pool and then the absorption spectrum of target gas is measured by a detector, so that the information of spectral line broadening, concentration and the like is obtained by inversion. At present, the technology is widely applied to a plurality of fields such as environment detection, industrial control, medical diagnosis and the like.
The selection of the absorption spectrum of the target gas requires consideration of the line cross interference of other gas components in the measurement environment to reduce the influence of the interfering gas on the measurement result. Under a complex industrial emission detection environment, certain target gases have strong adsorptivity and strong chemical reactivity, and overlap with other gas spectral lines seriously, so that the detection precision and accuracy of the TDLAS technology are greatly limited.
The high-temperature low-pressure multiple reflection pool can effectively inhibit the adsorption of target gas molecules, improve the measurement accuracy, compress the spectrum line broadening of the gas molecules, and eliminate the interference of interference gas spectrum lines on spectrum lines to be measured. Therefore, the design of the high-temperature low-pressure multiple reflection tank can effectively widen the application scene and the range of the TDLAS technology, wherein the range and the precision of temperature and air pressure control are key performance indexes of the multiple reflection tank.
Disclosure of Invention
The invention aims to: aiming at the problems, the invention provides a high-temperature low-pressure multiple reflection pool control system so as to realize high-precision temperature control and air pressure control of the multiple reflection pool and facilitate high-precision measurement of spectrum under complex measurement conditions.
The technical scheme is as follows: in order to achieve the purpose of the invention, the technical scheme adopted by the invention is as follows: the control system comprises a first electric regulating valve, an electronic flowmeter, a multiple reflection tank, a second electric regulating valve, a buffer tank, a third electric regulating valve and a vacuum pump; the first electric regulating valve, the electronic flowmeter, the multiple reflecting pool, the second electric regulating valve and the buffer tank are sequentially connected by a high-temperature heat tracing pipeline, and the third electric regulating valve and the vacuum pump are connected behind the buffer tank; also comprises a high temperature control part and a low pressure control part.
Further, the high-temperature control part comprises a heating film, a thermocouple, a main control unit, a current source, an ADC module and a DAC module; the multi-reflection pool is divided into a plurality of temperature control areas, the thermocouples are used for respectively measuring temperature data of each temperature control area, the main control unit is used for collecting the temperature data through the ADC module and controlling output voltage of the DAC module after corresponding logic analysis, so that output current of the current source is controlled, and heating power of each heating film is changed.
Further, the high-temperature control part comprises three heating films, three thermocouples, a first main control unit, three current sources, three ADC modules and three DAC modules; the multi-reflection pool is divided into three temperature control areas in a bisecting mode, the three thermocouples are used for measuring temperature data of the three temperature control areas respectively, the main control unit collects the temperature data through the three ADC modules, and the output voltage of the three DAC modules is controlled after corresponding logic analysis, so that the output current of the three current sources is controlled, and the heating power of the three heating films is changed.
Further, the multi-reflection pond comprises a polytetrafluoroethylene heat-insulating layer, and the polytetrafluoroethylene heat-insulating layer is clung to a heating film outside the multi-reflection pond.
Further, the low-voltage control part comprises a pressure sensor, an electronic flowmeter, an I/V conversion unit, a second main control unit, a three-way ADC module and a three-way DAC module; the first pressure sensor is connected with the multiple reflection tank, and the second pressure sensor is connected with the buffer tank; output current signals of the electronic flowmeter and the pressure sensor are respectively collected by three paths of ADC modules after I/V conversion, collected data are input into the second main control unit, and output voltages of the three paths of DAC modules are regulated after corresponding logic analysis, so that opening control of the three paths of electric valves is realized.
Further, when the air pressure in the buffer tank exceeds a set highest threshold value, the first electric regulating valve is closed, the second electric regulating valve and the third electric regulating valve are in a full-open state, and the vacuum pump is started; when the air pressure is reduced to the set highest threshold value, the second electric regulating valve is closed, and the vacuum pump continues to work; when the air pressure in the buffer tank is reduced to the set minimum threshold value, the third electric regulating valve is closed, and the vacuum pump is stopped; the buffer tank serves as a negative pressure source, and the opening degrees of the first electric regulating valve and the second electric regulating valve are finely adjusted in real time, so that the indication of the first pressure sensor in the multiple reflection tank is stabilized at a set value.
Further, when the air pressure in the buffer tank exceeds a set value of 3kPa, the first electric regulating valve is closed, the second electric regulating valve and the third electric regulating valve are in a full-open state, and the vacuum pump is started; when the air pressure is reduced to 3kPa, the second electric regulating valve is closed, and the vacuum pump continues to work; when the air pressure in the buffer tank is reduced to a set value of 200Pa, the third electric regulating valve is closed, and the vacuum pump is stopped; the buffer tank serves as a negative pressure source, and the opening degrees of the first electric regulating valve and the second electric regulating valve are finely adjusted in real time, so that the indication of the first pressure sensor in the multiple reflection tank is stabilized at a set value.
Further, the device also comprises a gas pretreatment device which is connected between the third electric regulating valve and the vacuum pump and is used for cooling and filtering high-temperature gas.
The beneficial effects are that: the invention adopts a three-section temperature control mode to divide the multi-reflection pool into three parts, namely a front part, a middle part and a rear part, wherein each part comprises an independent high-temperature heating film and a temperature thermocouple, so that the temperature non-uniformity of gas in the measurement pool can be effectively eliminated, the gas adsorption can be effectively avoided, and the spectrum detection stability can be improved. According to the invention, on the premise of accurately controlling the air inlet flow, the air pressure of the multiple reflection pool is accurately controlled, the molecular spectral line broadening can be effectively compressed, and the spectrum detection precision is improved; the system formed by the vacuum pump and the buffer tank effectively solves the defect that the vacuum pump cannot work for a long time, and realizes the long-term stable work of the low-pressure control system. According to the invention, the vacuum pump is connected with the gas pretreatment device in series, so that the cooling and filtering of the gas to be tested are realized, the vacuum pump is prevented from directly pumping high-temperature gas, meanwhile, the pollution of the vacuum pump is effectively avoided, and the service life of the vacuum pump is ensured.
Drawings
FIG. 1 is a schematic diagram of the gas circuit of the high temperature low pressure multiple reflection pool control system of the present invention;
FIG. 2 is a schematic diagram of a high temperature control circuit of the high temperature low pressure multiple reflection tank control system of the present invention;
FIG. 3 is a schematic diagram of a low-voltage control circuit of the high-temperature low-voltage multiple reflection tank control system of the invention;
FIG. 4 is a low pressure control flow chart of the high temperature low pressure multiple reflection tank control system of the present invention.
Detailed Description
The technical scheme of the invention is further described below with reference to the accompanying drawings and examples.
As shown in fig. 1, the high-temperature low-pressure multiple reflection tank control system comprises a first electric regulating valve 2, an electric flowmeter 4, a multiple reflection tank 7, a first pressure sensor 11, a second electric regulating valve 13, a buffer tank 16, a second pressure sensor 15, a third electric regulating valve 17, a gas pretreatment device 18 and a vacuum pump 19; the first electric regulating valve 2, the electronic flowmeter 4, the multiple reflection tank 7, the second electric regulating valve 13 and the buffer tank 16 are connected by the high-temperature tracing pipelines 1, 3, 5, 12 and 14. The volume of the buffer tank is larger than that of the multiple reflection pool and is 5-10 times of that of the reflection pool optimally. The system is divided into a high temperature control part and a low pressure control part. The high-temperature control module and the low-pressure control module work independently and realize data interaction through serial communication.
The high temperature control part comprises a high temperature heat tracing pipeline, a heating film, a polytetrafluoroethylene heat preservation layer 6, a thermocouple and a control circuit. The control circuit comprises a first master control unit 24, a current source 26, a 16-bit precision digital-to-analog converter DAC/25 and an 18-bit precision analog-to-digital converter ADC/23. The high temperature control adopts a three-section control mode.
As shown in fig. 2, the multiple reflection pool 7 is divided into three temperature control areas, namely a first temperature control area 8, a second temperature control area 9 and a third temperature control area 10. Each temperature control area is provided with an independent thermocouple temperature measuring probe, namely a first thermocouple 20, a second thermocouple 21 and a third thermocouple 22, and the thermocouple temperature measuring probes are in real-time contact with the measured gas.
When the device works, the high-temperature heat tracing pipeline preheats gas, and three thermocouple measuring points are respectively positioned at the front, middle and back parts inside the multiple reflection tank 7, namely near the gas inlet of the reflection tank, in the middle of the reflection tank and near the gas outlet of the reflection tank, and are in real-time contact with the measured gas. The main control unit 24 controls the three-way ADC module 23 to collect temperature feedback data of the three-way thermocouples in real time through the SPI interface, compares the three-way actual temperature data with a set value, changes the output voltage of the three-way DAC module 25 in real time through a PID control mode, and further controls the output current of the three-way current source 26, so that the heating power of the first heating film 27, the second heating film 28 and the third heating film 29 can be respectively changed, the temperature control of the multiple reflection pools from 50 ℃ to 400 ℃ is realized, and the actual temperature control precision can reach +/-0.2 ℃. Meanwhile, the polytetrafluoroethylene heat-insulating layer 6 is clung to a heating film outside the measuring pool, so that the heat-insulating effect is achieved. The setting temperature of the high-temperature heat tracing pipeline is 5 ℃ higher than the control temperature of the multiple reflection tanks. The three-section heating mode can effectively eliminate the temperature non-uniformity of the gas to be measured in the measuring pool and improve the stability of spectrum measurement.
The low pressure control part comprises an electric regulating valve, a pressure sensor, an electronic flowmeter, a buffer tank, a gas pretreatment device, a vacuum pump and a control circuit. The control circuit mainly comprises a second main control unit 35, a three-way ADC module 34 and a three-way DAC module 36, and is responsible for collection of flow signals and air pressure signals, opening control of the electric regulating valve and corresponding logic analysis.
As shown in fig. 3 and 4, when the low pressure control section is operated, the first electric control valve 2 is first closed, the second electric control valve 13 and the third electric control valve 17 are fully opened, and the vacuum pump 19 is started, and at this time, the multiple reflection tank 7 is in agreement with the internal air pressure of the buffer tank 16. When the air pressure value is reduced to 3kPa, the second electric regulating valve 13 is closed, and the vacuum pump is kept continuously operating. When the indication value of the second pressure sensor 15 in the buffer tank 16 falls to 200Pa, the third electric control valve 17 is closed, and the vacuum pump 19 is turned off. At this time, the buffer tank serves as a negative pressure source, the opening of the first electric regulating valve 2 is finely adjusted in real time in a PID control mode, so that the air inlet flow of the system accurately reaches a set value, and meanwhile, the opening of the second electric regulating valve 13 is finely adjusted in real time in the same PID control mode, so that the indication of the first pressure sensor 11 in the multiple reflection tank 7 is stabilized at the set value. When the air pressure in the buffer tank 16 gradually rises over the set air pressure of 3kPa, the above-described control flow is repeated.
Output current signals of the electronic flowmeter 4 and the pressure sensor are respectively collected by the three-way ADC module 34 after I/V conversion 33, measured data are input to the main control unit 35, and the main control unit adjusts output voltage of the three-way DAC module 36 after corresponding logic analysis, so that opening control of the three-way electric valve is realized.
The gas pretreatment device 18 is used for cooling and filtering high-temperature gas, avoids the direct pumping of the high-temperature gas by a vacuum pump and the pollution of a pump body, and ensures the performance and the service life of the vacuum pump.
The buffer tank serves as a negative pressure source, and the accurate control of the air pressure in the measuring tank is realized by automatically adjusting the opening of the electric valve between the measuring tank and the buffer tank. The control method can control the air pressure of the measuring pool to be between 3000Pa and 10000Pa, and the air pressure control precision is +/-5%. When the air pressure in the buffer tank gradually rises to more than 3000Pa, a vacuum pump is started to pump the air pressure in the buffer tank to 200Pa again. The method enables the vacuum pump to be in an intermittent working state, effectively solves the defect that the vacuum pump cannot work for a long time, and realizes the long-time stable work of the low-pressure control system. The gas pretreatment device is used for cooling and filtering high-temperature gas, so that the direct pumping of the high-temperature gas and the pollution of a pump body by a vacuum pump are avoided, and the performance and the service life of the vacuum pump are ensured.
Claims (5)
1. The control system of the high-temperature low-pressure multiple reflection tank is characterized by comprising a first electric regulating valve (2), an electronic flowmeter (4), a multiple reflection tank (7), a second electric regulating valve (13), a buffer tank (16), a third electric regulating valve (17) and a vacuum pump (19);
the first electric regulating valve (2), the electronic flowmeter (4), the multiple reflection tank (7), the second electric regulating valve (13) and the buffer tank (16) are sequentially connected through a high-temperature heat tracing pipeline, and the buffer tank (16) is connected with the third electric regulating valve (17) and the vacuum pump (19);
the device also comprises a high-temperature control part and a low-pressure control part;
the high-temperature control part comprises a heating film, a thermocouple, a main control unit, a current source, an ADC module and a DAC module;
the multi-reflection pool (7) is divided into a plurality of temperature control areas, thermocouples are used for measuring temperature data of each temperature control area respectively, a main control unit is used for collecting the temperature data through an ADC module, and the output voltage of a DAC module is controlled after corresponding logic analysis, so that the output current of a current source is controlled, and the heating power of each heating film is changed;
the low-voltage control part comprises a pressure sensor, an electronic flowmeter, an I/V conversion unit (33), a second main control unit (35), a three-way ADC module and a three-way DAC module;
the first pressure sensor (11) is connected with the multiple reflection tank (7), and the second pressure sensor (15) is connected with the buffer tank (16);
output current signals of the electronic flowmeter and the pressure sensor are respectively collected by three paths of ADC modules after I/V conversion (33), collected data are input into a second main control unit (35), and output voltages of the three paths of DAC modules are regulated after corresponding logic analysis, so that opening control of the three paths of electric valves is realized;
when the air pressure in the buffer tank (16) exceeds a set highest threshold value, the first electric regulating valve (2) is closed, the second electric regulating valve (13) and the third electric regulating valve (17) are in a full-open state, and the vacuum pump (19) is started; when the air pressure is reduced to the set highest threshold value, the second electric regulating valve (13) is closed, and the vacuum pump continues to work; when the air pressure in the buffer tank (16) is reduced to a set minimum threshold value, the third electric regulating valve (17) is closed, and the vacuum pump (19) is stopped; the buffer tank serves as a negative pressure source, and the opening degrees of the first electric regulating valve (2) and the second electric regulating valve (13) are finely adjusted in real time, so that the indication of the first pressure sensor (11) in the multiple reflection tank (7) is stabilized at a set value.
2. The high temperature low pressure multiple reflection tank control system according to claim 1, wherein the high temperature control part comprises three heating films, three thermocouples, a first main control unit (24), three current sources (26), three ADC modules and three DAC modules;
the multi-reflection pool (7) is divided into three temperature control areas in a bisecting mode, temperature data of the three temperature control areas are measured by three thermocouples respectively, the main control unit (24) collects the temperature data through the three-path ADC module, and the output voltage of the three-path DAC module is controlled after corresponding logic analysis, so that the output current of the three-path current source (26) is controlled, and the heating power of the three-path heating film is changed.
3. The high temperature low pressure multiple reflection tank control system according to claim 1 or 2, further comprising a polytetrafluoroethylene heat-insulating layer (6) which is closely attached to the heating film outside the multiple reflection tank.
4. The high-temperature low-pressure multiple reflection pool control system according to claim 1, wherein when the air pressure in the buffer tank (16) exceeds a set value of 3kPa, the first electric control valve (2) is closed, the second electric control valve (13) and the third electric control valve (17) are in a fully opened state, and the vacuum pump (19) is started; when the air pressure is reduced to 3kPa, the second electric regulating valve (13) is closed, and the vacuum pump continues to work; when the air pressure in the buffer tank (16) is reduced to a set value of 200Pa, the third electric regulating valve (17) is closed, and the vacuum pump (19) is stopped; the buffer tank serves as a negative pressure source, and the opening degrees of the first electric regulating valve (2) and the second electric regulating valve (13) are finely adjusted in real time, so that the indication of the first pressure sensor (11) in the multiple reflection tank (7) is stabilized at a set value.
5. The high-temperature low-pressure multiple reflection tank control system according to claim 1, further comprising a gas pretreatment device (18) connected between the third electric regulating valve (17) and the vacuum pump (19), the gas pretreatment device serving as cooling and filtering of the high-temperature gas.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201811424504.0A CN109283157B (en) | 2018-11-27 | 2018-11-27 | High-temperature low-pressure multiple reflection pool control system |
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| CN201811424504.0A CN109283157B (en) | 2018-11-27 | 2018-11-27 | High-temperature low-pressure multiple reflection pool control system |
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| CN109283157B true CN109283157B (en) | 2024-03-12 |
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| JP2004271295A (en) * | 2003-03-07 | 2004-09-30 | Yokogawa Electric Corp | Laser spectral analyzer |
| CN105067553A (en) * | 2015-08-14 | 2015-11-18 | 安徽蓝盾光电子股份有限公司 | Heat tracing tank based high-precision FTIR (Fourier transform infrared spectroscopy) online measurement system for flue gas |
| CN106442404A (en) * | 2016-09-28 | 2017-02-22 | 曲阜师范大学 | Real-time on-line multi-component monitoring optical system for stable gas isotopes |
| CN107271365A (en) * | 2017-08-23 | 2017-10-20 | 华纳创新（北京）科技有限公司 | A kind of device of on-line determination the escaping of ammonia in situ |
| CN209432698U (en) * | 2018-11-27 | 2019-09-24 | 东南大学 | A kind of high-temperature low-pressure multiple reflecting pool control device |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8549894B2 (en) * | 2010-11-23 | 2013-10-08 | Bruker Chemical Analysis Bv | Gas chromatography with ambient pressure stability control |
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Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004271295A (en) * | 2003-03-07 | 2004-09-30 | Yokogawa Electric Corp | Laser spectral analyzer |
| CN105067553A (en) * | 2015-08-14 | 2015-11-18 | 安徽蓝盾光电子股份有限公司 | Heat tracing tank based high-precision FTIR (Fourier transform infrared spectroscopy) online measurement system for flue gas |
| CN106442404A (en) * | 2016-09-28 | 2017-02-22 | 曲阜师范大学 | Real-time on-line multi-component monitoring optical system for stable gas isotopes |
| CN107271365A (en) * | 2017-08-23 | 2017-10-20 | 华纳创新（北京）科技有限公司 | A kind of device of on-line determination the escaping of ammonia in situ |
| CN209432698U (en) * | 2018-11-27 | 2019-09-24 | 东南大学 | A kind of high-temperature low-pressure multiple reflecting pool control device |
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