CN209432698U - A kind of high-temperature low-pressure multiple reflecting pool control device - Google Patents
A kind of high-temperature low-pressure multiple reflecting pool control device Download PDFInfo
- Publication number
- CN209432698U CN209432698U CN201821970262.0U CN201821970262U CN209432698U CN 209432698 U CN209432698 U CN 209432698U CN 201821970262 U CN201821970262 U CN 201821970262U CN 209432698 U CN209432698 U CN 209432698U
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- China
- Prior art keywords
- temperature
- multiple reflecting
- reflecting pool
- control valve
- electric control
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Abstract
The utility model discloses a kind of high-temperature low-pressure multiple reflecting pool control devices, including the first electric control valve, electronic flowmeter, multiple reflecting pool, the second electric control valve, surge tank, third electric control valve, vacuum pump；First electric control valve, electronic flowmeter, multiple reflecting pool, the second electric control valve, surge tank are linked in sequence by high temperature heat traced pipeline, and surge tank is followed by third electric control valve and vacuum pump.The utility model high-temperature low-pressure multiple reflecting pool control device provides powerful guarantee for the application of TDLAS technology in related application field.
Description
Technical field
The utility model belongs to tunable diode absorption spectrum field more particularly to a kind of high-temperature low-pressure multiple reflecting pool
Control device.
Background technique
Tunable absorption spectrum TDLAS technology controls semiconductor laser with tunable output wave in the way of electric current tuning
The light beam of long consecutive variations, outgoing beam are measured the absorption spectrum of object gas after multiple reflecting pool by detector, thus
Inverting obtains the information such as its broadening of spectral lines, concentration.The technology has been widely used in environment measuring, Industry Control, medical treatment at present
The multiple fields such as diagnosis.
Need to consider the spectral line cross jamming of other gas components in measurement environment to the selection of object gas absorption line,
To reduce influence of the interference gas to measurement result.Under complicated industrial discharge detection environment, certain object gas have compared with
Strong adsorptivity and stronger chemical reactivity, and it is overlapping serious with other gas spectral lines, significantly limit TDLAS technology
Detection accuracy and accuracy.
The absorption of target gas molecules can be effectively suppressed in high-temperature low-pressure multiple reflecting pool, improves the accuracy of measurement, simultaneously
Interference of the interference gas spectral line to spectral line to be measured can be eliminated with the broadening of spectral lines of compressed gas molecule.Therefore high-temperature low-pressure is multiple
The design of reflection tank can effectively widen the application scenarios and range of TDLAS technology, wherein the range and essence of temperature and pressure control
Degree is the Key Performance Indicator of multiple reflecting pool.
Utility model content
Goal of the invention: in view of the above problems, the utility model proposes a kind of high-temperature low-pressure multiple reflecting pool control devices.
Technical solution: to realize above-mentioned purpose of design, the technical scheme adopted by the utility model is a kind of high-temperature low-pressure
Multiple reflecting pool control device, the first electric control valve, electronic flowmeter, multiple reflecting pool, the second electric control valve, buffering
Tank, third electric control valve, vacuum pump；First electric control valve, electronic flowmeter, multiple reflecting pool, the second electric control valve,
Surge tank is linked in sequence by high temperature heat traced pipeline, and surge tank is followed by third electric control valve and vacuum pump；It further include high-temperature control
Part and low pressure control section.
Further, the high-temperature control part includes three tunnel heating films, three thermocouples, the first main control unit, three tunnels
Current source, three tunnel ADC module, three tunnel DAC modules；Multiple reflecting pool be bisected into before in after three temperature controlled zones, three thermocouples
The temperature data of three temperature controlled zones is measured respectively, and main control unit is by three tunnel ADC module temperature collection data, by corresponding
The output voltage of three tunnel DAC modules is controlled after logic analysis, and then controls the output electric current of three road current sources, to change three tunnels
The heating power of heating film.
It further, further include polytetrafluoroethylene (PTFE) insulating layer, polytetrafluoroethylene (PTFE) insulating layer is close to outside multiple reflecting pool
Heating film.
Further, the low pressure control section includes pressure sensor, electronic flowmeter, I/V conversion, the second master control list
Member, three tunnel ADC module, three tunnel DAC modules；First pressure sensor connects multiple reflecting pool, and the connection of second pressure sensor is slow
Rush tank；The output current signal of electronic flowmeter and pressure sensor is acquired by three tunnel ADC module respectively after I/V is converted,
The data of acquisition input the second main control unit, and the output voltage of three tunnel DAC modules is adjusted after corresponding logic analysis, thus
Realize the aperture control of No. three motor-driven valves.
Further, further include gas pretreatment device, be connected between third electric control valve and vacuum pump, gas is pre-
Processing unit is used as the cooling and filtering of high-temperature gas.
The utility model has the advantages that the utility model multiple reflecting pool is bisected into before in after three parts, each part includes independent
High-temperature heating film and temperature thermocouple, the temperature unevenness of measuring cell internal gas can be effectively eliminated, while effectively avoiding
Gas absorption improves spectral detection stability.The utility model concatenates vacuum pump with gas pretreatment device, realizes to be measured
The cooling and filtering of gas avoid the direct extracting high-temperature gas of vacuum pump, while can effectively avoid the pollution of vacuum pump, guarantee
The working life of vacuum pump.
Detailed description of the invention
Fig. 1 is the schematic diagram of gas circuit of the utility model high-temperature low-pressure multiple reflecting pool control system；
Fig. 2 is the utility model high-temperature low-pressure multiple reflecting pool control system high-temperature control circuit diagram；
Fig. 3 is the utility model high-temperature low-pressure multiple reflecting pool control system low-voltage control circuit schematic diagram；
Specific embodiment
The technical solution of the utility model is further described with reference to the accompanying drawings and examples.
As shown in Figure 1, high-temperature low-pressure multiple reflecting pool control system described in the utility model, including the first motorized adjustment
Valve 2, electronic flowmeter 4, multiple reflecting pool 7, first pressure sensor 11, the second electric control valve 13, surge tank 16, second are pressed
Force snesor 15, third electric control valve 17, gas pretreatment device 18, vacuum pump 19；First electric control valve 2, electron stream
Meter 4, multiple reflecting pool 7, the second electric control valve 13, surge tank 16 are connected by high temperature heat traced pipeline 1,3,5,12,14.Buffering
The volume of tank should be greater than multiple reflecting pool volume, and be 5~10 times of reflection tank volume be best.The system is divided into high-temperature control
Part and low pressure control section.High-temperature control module and low-pressure control module work independently, and the two realizes number by serial communication
According to interaction.
High-temperature control part includes high temperature heat traced pipeline, heating film, polytetrafluoroethylene (PTFE) insulating layer 6, thermocouple and control electricity
Road.Control circuit includes the first main control unit 24, the digital analog converter DAC/25 of 26,16 precision of current source and 18
The analog-digital converter ADC/23 of precision.High-temperature control uses three-stage control mode.
As shown in Fig. 2, multiple reflecting pool 7 be bisected into before in after three temperature controlled zones, the first temperature controlled zone 8, the second temperature control
Region 9, third temperature controlled zone 10.Each temperature controlled zone has independent thermocouple temperature measurement to pop one's head in, thermocouple 1, thermocouple two
21, thermocouple 3 22, thermocouple temperature measurement probe and measurement gas real-time contact.
When work, high temperature heat traced pipeline preheats gas, and three thermocouple measuring points are located in multiple reflecting pool 7
Three parts after in front of portion, i.e., near the air inlet of reflection tank, near among reflection tank and reflection tank gas outlet, with measurement gas
Real-time contact.Main control unit 24 acquires the temperature feedback number of No. three thermocouples by three tunnel ADC module 23 of SPI interface control in real time
According to by three tunnel actual temperature datas compared with setting value, by way of PID control, three tunnel DAC modules 25 of change is defeated in real time
Voltage out, and then the output electric current of three road current sources 26 is controlled, so as to change three tunnel heating films respectively, heating film 1,
The heating power of heating film 2 28, heating film 3 29 realizes 50 DEG C to 400 DEG C of multiple reflecting pool of temperature control, practical temperature control
Reachable ± 0.2 DEG C of precision.Meanwhile polytetrafluoroethylene (PTFE) insulating layer 6 is close to the heating film outside measuring cell, plays the effect of insulation
Fruit.The setting temperature of high temperature heat traced pipeline is 5 DEG C higher than multiple reflecting pool control temperature.The heating method of three-stage can effectively eliminate
The temperature unevenness of under test gas in measuring cell, improves the stability of spectral measurement.
Low pressure control section includes electric control valve, pressure sensor, electronic flowmeter, surge tank, gas pretreatment dress
It sets, vacuum pump and control circuit.Control circuit mainly includes the second main control unit 35, three tunnel ADC module 34 and three road DAC
Module 36, the circuit are responsible for flow signal, the acquisition of air pressure signal, the aperture control of electric control valve and corresponding logic point
Analysis.
As shown in figure 3, being first shut off the first electric control valve 2 when low pressure control section works, making the second electric control valve
13, third electric control valve 17 is shown in a fully open operation, and starts vacuum pump 19, at this time multiple reflecting pool 7 and 16 inside gas of surge tank
Pressure is consistent.When atmospheric pressure value is reduced to setting value 3kPa, the second electric control valve 13 is closed, vacuum pump is kept to work on.When
When the indicating value of second pressure sensor 15 in surge tank 16 is down to 200Pa, third electric control valve 17 is closed, vacuum pump is shut down
19.At this point, serving as negative pressure source by surge tank, by pid control mode, the aperture of the first electric control valve 2 is finely tuned in real time, so that
System charge flow rate accurately reaches setting value, meanwhile, equally by pid control mode, the second electric control valve 13 is finely tuned in real time
Aperture so that in multiple reflecting pool 7 first pressure sensor 11 registration stablize in setting value.When in surge tank 16 air pressure by
When being gradually increased beyond setting air pressure 3kPa, then above-mentioned control flow is repeated.
The output current signal of electronic flowmeter 4 and pressure sensor is after I/V conversion 33 respectively by three tunnel ADC module
34 acquisitions, the data measured are input to main control unit 35, and main control unit adjusts three tunnel DAC modules after corresponding logic analysis
36 output voltage, to realize the aperture control of No. three motor-driven valves.
Gas pretreatment device 18 is used as the cooling and filtering of high-temperature gas, avoids the direct extracting high-temperature gas of vacuum pump
And pump housing pollution, it ensure that performance and the service life of vacuum pump.
Negative pressure source is served as by surge tank, by the aperture of motor-driven valve between automatic adjustment measuring cell and surge tank, realizes and surveys
Measure the accurate control of air pressure in pond.Measuring cell pressure control can be 3000Pa between 10000Pa by above-mentioned control method, air pressure
Controlling precision is ± 5%.When the air pressure in surge tank is gradually increasing more than 3000Pa, then start vacuum pump for gas in surge tank
Pressure is evacuated to 200Pa again.This method makes vacuum pump be in intermittent work state, and efficiently solving vacuum pump can not permanent worker
The shortcomings that making realizes the long-term stable operation of low voltage control system.Gas pretreatment device be used as high-temperature gas cooling and
Filtering avoids the direct extracting high-temperature gas of vacuum pump and pump housing pollution, ensure that performance and the service life of vacuum pump.
Claims (5)
1. a kind of high-temperature low-pressure multiple reflecting pool control device, which is characterized in that the first electric control valve (2), electronic flowmeter
(4), multiple reflecting pool (7), the second electric control valve (13), surge tank (16), third electric control valve (17), vacuum pump
(19)；
First electric control valve (2), electronic flowmeter (4), multiple reflecting pool (7), the second electric control valve (13), surge tank
(16) it is linked in sequence by high temperature heat traced pipeline, surge tank (16) is followed by third electric control valve (17) and vacuum pump (19)；
It further include high-temperature control part and low pressure control section.
2. high-temperature low-pressure multiple reflecting pool control device according to claim 1, which is characterized in that the high-temperature control portion
Divide includes three tunnel heating films, three thermocouples, the first main control unit (24), three road current sources (26), three tunnel ADC module, three tunnels
DAC module；
Multiple reflecting pool (7) be bisected into before in after three temperature controlled zones, three thermocouples measure the temperature of three temperature controlled zones respectively
Degree evidence, main control unit (24) control the output voltage of three tunnel DAC modules by three tunnel ADC module temperature collection data, into
And the output electric current of three road current sources (26) is controlled, to change the heating power of three tunnel heating films.
3. high-temperature low-pressure multiple reflecting pool control device according to claim 2, which is characterized in that further include polytetrafluoroethyl-ne
Alkene insulating layer (6), polytetrafluoroethylene (PTFE) insulating layer are close to the heating film outside multiple reflecting pool.
4. high-temperature low-pressure multiple reflecting pool control device according to claim 1, which is characterized in that the low voltage control portion
Divide and converts (33), the second main control unit (35), three tunnel ADC module, three road DAC including pressure sensor, electronic flowmeter, I/V
Module；
First pressure sensor (11) connects multiple reflecting pool (7), and second pressure sensor (15) connects surge tank (16)；
The output current signal of electronic flowmeter and pressure sensor is adopted by three tunnel ADC module respectively after I/V converts (33)
The data of collection, acquisition input the second main control unit (35), and adjust the output voltage of three tunnel DAC modules, to realize three roads electricity
The aperture control of dynamic valve.
5. high-temperature low-pressure multiple reflecting pool control device according to claim 1, which is characterized in that further include that gas is located in advance
It manages device (18), is connected between third electric control valve (17) and vacuum pump (19), gas pretreatment device is used as High Temperature Gas
The cooling and filtering of body.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821970262.0U CN209432698U (en) | 2018-11-27 | 2018-11-27 | A kind of high-temperature low-pressure multiple reflecting pool control device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821970262.0U CN209432698U (en) | 2018-11-27 | 2018-11-27 | A kind of high-temperature low-pressure multiple reflecting pool control device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN209432698U true CN209432698U (en) | 2019-09-24 |
Family
ID=67968325
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201821970262.0U Expired - Fee Related CN209432698U (en) | 2018-11-27 | 2018-11-27 | A kind of high-temperature low-pressure multiple reflecting pool control device |
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| Country | Link |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109283157A (en) * | 2018-11-27 | 2019-01-29 | 东南大学 | A kind of high-temperature low-pressure multiple reflecting pool control system |
-
2018
- 2018-11-27 CN CN201821970262.0U patent/CN209432698U/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109283157A (en) * | 2018-11-27 | 2019-01-29 | 东南大学 | A kind of high-temperature low-pressure multiple reflecting pool control system |
| CN109283157B (en) * | 2018-11-27 | 2024-03-12 | 东南大学 | High-temperature low-pressure multiple reflection pool control system |
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| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20190924 Termination date: 20211127 |