CN109283157A - A kind of high-temperature low-pressure multiple reflecting pool control system - Google Patents
A kind of high-temperature low-pressure multiple reflecting pool control system Download PDFInfo
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- CN109283157A CN109283157A CN201811424504.0A CN201811424504A CN109283157A CN 109283157 A CN109283157 A CN 109283157A CN 201811424504 A CN201811424504 A CN 201811424504A CN 109283157 A CN109283157 A CN 109283157A
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- temperature
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- 238000010438 heat treatment Methods 0.000 claims description 23
- 229920001343 polytetrafluoroethylene Polymers 0.000 claims description 10
- 239000004810 polytetrafluoroethylene Substances 0.000 claims description 10
- 238000004458 analytical method Methods 0.000 claims description 8
- 238000001816 cooling Methods 0.000 claims description 5
- 238000001914 filtration Methods 0.000 claims description 5
- -1 polytetrafluoroethylene Polymers 0.000 claims description 5
- 230000005611 electricity Effects 0.000 claims description 2
- XUCNUKMRBVNAPB-UHFFFAOYSA-N fluoroethene Chemical compound FC=C XUCNUKMRBVNAPB-UHFFFAOYSA-N 0.000 claims 1
- 238000005259 measurement Methods 0.000 abstract description 7
- 238000000034 method Methods 0.000 abstract description 6
- 238000005516 engineering process Methods 0.000 abstract description 5
- 238000000041 tunable diode laser absorption spectroscopy Methods 0.000 abstract description 4
- 230000007774 longterm Effects 0.000 abstract description 3
- 230000003595 spectral effect Effects 0.000 description 9
- 238000001514 detection method Methods 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 3
- 238000000862 absorption spectrum Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000001105 regulatory effect Effects 0.000 description 3
- 238000009529 body temperature measurement Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 241001269238 Data Species 0.000 description 1
- 230000003139 buffering effect Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000003745 diagnosis Methods 0.000 description 1
- 235000013399 edible fruits Nutrition 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000007781 pre-processing Methods 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/39—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using tunable lasers
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D27/00—Simultaneous control of variables covered by two or more of main groups G05D1/00 - G05D25/00
- G05D27/02—Simultaneous control of variables covered by two or more of main groups G05D1/00 - G05D25/00 characterised by the use of electric means
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/39—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using tunable lasers
- G01N2021/391—Intracavity sample
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/39—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using tunable lasers
- G01N2021/396—Type of laser source
- G01N2021/399—Diode laser
Abstract
The invention discloses a kind of high-temperature low-pressure multiple reflecting pool control systems, including high-temperature control unit and low voltage control unit.In high-temperature control, system uses multisection type PID temperature control method, and the temperature unevenness of measurement pool gas is efficiently solved on the basis of guaranteeing temperature-controlled precision.In low voltage control, negative pressure source is formed using vacuum pump and surge tank, solve the disadvantage that vacuum pump can not long-term work, ensure that the working life of vacuum pump, control finely tuned by the PID of motor-driven valve, realizes the accurate control of charge flow rate, measuring cell air pressure.High-temperature low-pressure multiple reflecting pool control system of the present invention provides powerful guarantee for the application of TDLAS technology in related application field.
Description
Technical field
The invention belongs to tunable diode absorption spectrum fields more particularly to a kind of high-temperature low-pressure multiple reflecting pool to control
System.
Background technique
Tunable absorption spectrum TDLAS technology controls semiconductor laser with tunable output wave in the way of electric current tuning
The light beam of long consecutive variations, outgoing beam are measured the absorption spectrum of object gas after multiple reflecting pool by detector, thus
Inverting obtains the information such as its broadening of spectral lines, concentration.The technology has been widely used in environment measuring, Industry Control, medical treatment at present
The multiple fields such as diagnosis.
Need to consider the spectral line cross jamming of other gas components in measurement environment to the selection of object gas absorption line,
To reduce influence of the interference gas to measurement result.Under complicated industrial discharge detection environment, certain object gas have compared with
Strong adsorptivity and stronger chemical reactivity, and it is overlapping serious with other gas spectral lines, significantly limit TDLAS technology
Detection accuracy and accuracy.
The absorption of target gas molecules can be effectively suppressed in high-temperature low-pressure multiple reflecting pool, improves the accuracy of measurement, simultaneously
Interference of the interference gas spectral line to spectral line to be measured can be eliminated with the broadening of spectral lines of compressed gas molecule.Therefore high-temperature low-pressure is multiple
The design of reflection tank can effectively widen the application scenarios and range of TDLAS technology, wherein the range and essence of temperature and pressure control
Degree is the Key Performance Indicator of multiple reflecting pool.
Summary of the invention
Goal of the invention: in view of the above problems, the present invention proposes a kind of high-temperature low-pressure multiple reflecting pool control system, to realize
The high accuracy temperature control and pressure control of multiple reflecting pool, the spectrum high-precision helped to realize under complicated measuring condition are surveyed
Amount.
Technical solution: to achieve the purpose of the present invention, the technical scheme adopted by the invention is that: a kind of high-temperature low-pressure is multiple
Reflection tank control system, the first electric control valve, electronic flowmeter, multiple reflecting pool, the second electric control valve, surge tank,
Three electric control valves, vacuum pump；First electric control valve, electronic flowmeter, multiple reflecting pool, the second electric control valve, buffering
Tank is linked in sequence by high temperature heat traced pipeline, and surge tank is followed by third electric control valve and vacuum pump；It further include high-temperature control part
And low pressure control section.
Further, the high-temperature control part include heating film, thermocouple, main control unit, current source, ADC module,
DAC module；Multiple reflecting pool is divided into several temperature controlled zones, and thermocouple measures the temperature data of each temperature controlled zone, master control respectively
Unit controls the output voltage of DAC module by ADC module temperature collection data after corresponding logic analysis, and then controls
The output electric current of current source processed, to change the heating power of each road heating film.
Further, the high-temperature control part includes three tunnel heating films, three thermocouples, the first main control unit, three tunnels
Current source, three tunnel ADC module, three tunnel DAC modules；Multiple reflecting pool be bisected into before in after three temperature controlled zones, three thermocouples
The temperature data of three temperature controlled zones is measured respectively, and main control unit is by three tunnel ADC module temperature collection data, by corresponding
The output voltage of three tunnel DAC modules is controlled after logic analysis, and then controls the output electric current of three road current sources, to change three tunnels
The heating power of heating film.
It further, further include polytetrafluoroethylene (PTFE) insulating layer, polytetrafluoroethylene (PTFE) insulating layer is close to outside multiple reflecting pool
Heating film.
Further, the low pressure control section includes pressure sensor, electronic flowmeter, I/V conversion, the second master control list
Member, three tunnel ADC module, three tunnel DAC modules；First pressure sensor connects multiple reflecting pool, and the connection of second pressure sensor is slow
Rush tank；The output current signal of electronic flowmeter and pressure sensor is acquired by three tunnel ADC module respectively after I/V is converted,
The data of acquisition input the second main control unit, and the output voltage of three tunnel DAC modules is adjusted after corresponding logic analysis, thus
Realize the aperture control of No. three motor-driven valves.
Further, when air pressure is more than setting highest threshold value in surge tank, the first electric control valve is closed, second is electronic
Regulating valve, third electric control valve are shown in a fully open operation, and start vacuum pump；When setting highest threshold value is down in air pressure, second is closed
Electric control valve, vacuum pump work on；When setting lowest threshold is down in air pressure in surge tank, third motorized adjustment is closed
Valve shuts down vacuum pump；Negative pressure source is served as by surge tank, finely tunes opening for the first electric control valve and the second electric control valve in real time
Degree stablizes the registration of first pressure sensor in multiple reflecting pool in setting value.
Further, when air pressure is more than setting value 3kPa in surge tank, the first electric control valve, the second electric adjustable are closed
Section valve, third electric control valve are shown in a fully open operation, and start vacuum pump；When setting value 3kPa is down in air pressure, it is electronic to close second
Regulating valve, vacuum pump work on；When setting value 200Pa is down in air pressure in surge tank, third electric control valve is closed, is shut down
Vacuum pump；Negative pressure source is served as by surge tank, finely tunes the aperture of the first electric control valve and the second electric control valve in real time, is made repeatedly
The registration of first pressure sensor is stablized in setting value in reflection tank.
Further, further include gas pretreatment device, be connected between third electric control valve and vacuum pump, gas is pre-
Processing unit is used as the cooling and filtering of high-temperature gas.
The utility model has the advantages that the present invention use three-stage temperature control method, before multiple reflecting pool is bisected into after three parts, often
A part includes independent high-temperature heating film and temperature thermocouple, can effectively eliminate the non-uniform temperature of measuring cell internal gas
Property, while gas absorption is effectively avoided, improve spectral detection stability.The present invention accurately control charge flow rate under the premise of,
The air pressure for realizing multiple reflecting pool accurately controls, and can be effectively compressed molecular spectrum broadening, improve spectral detection precision；Vacuum pump
With surge tank composition system efficiently solve the disadvantage that vacuum pump can not long-term work, realize the length of low voltage control system
Phase steady operation.The present invention concatenates vacuum pump with gas pretreatment device, realizes the cooling and filtering of under test gas, avoids
Vacuum pump direct extracting high-temperature gas, while can effectively avoid the pollution of vacuum pump, it ensure that the working life of vacuum pump.
Detailed description of the invention
Fig. 1 is the schematic diagram of gas circuit of high-temperature low-pressure multiple reflecting pool control system of the present invention；
Fig. 2 is high-temperature low-pressure multiple reflecting pool control system high-temperature control circuit diagram of the present invention；
Fig. 3 is high-temperature low-pressure multiple reflecting pool control system low-voltage control circuit schematic diagram of the present invention；
Fig. 4 is high-temperature low-pressure multiple reflecting pool control system low voltage control flow chart of the present invention.
Specific embodiment
Further description of the technical solution of the present invention with reference to the accompanying drawings and examples.
As shown in Figure 1, high-temperature low-pressure multiple reflecting pool control system of the present invention, including the first electric control valve 2,
Electronic flowmeter 4, multiple reflecting pool 7, first pressure sensor 11, the second electric control valve 13, surge tank 16, second pressure pass
Sensor 15, third electric control valve 17, gas pretreatment device 18, vacuum pump 19；First electric control valve 2, electronic flowmeter
4, multiple reflecting pool 7, the second electric control valve 13, surge tank 16 are connected by high temperature heat traced pipeline 1,3,5,12,14.Surge tank
Volume should be greater than multiple reflecting pool volume, and be 5~10 times of reflection tank volume be best.The system is divided into high-temperature control part
And low pressure control section.High-temperature control module and low-pressure control module work independently, and the two realizes that data are handed over by serial communication
Mutually.
High-temperature control part includes high temperature heat traced pipeline, heating film, polytetrafluoroethylene (PTFE) insulating layer 6, thermocouple and control electricity
Road.Control circuit includes the first main control unit 24, the digital analog converter DAC/25 of 26,16 precision of current source and 18
The analog-digital converter ADC/23 of precision.High-temperature control uses three-stage control mode.
As shown in Fig. 2, multiple reflecting pool 7 be bisected into before in after three temperature controlled zones, the first temperature controlled zone 8, the second temperature control
Region 9, third temperature controlled zone 10.Each temperature controlled zone has independent thermocouple temperature measurement to pop one's head in, thermocouple 1, thermocouple two
21, thermocouple 3 22, thermocouple temperature measurement probe and measurement gas real-time contact.
When work, high temperature heat traced pipeline preheats gas, and three thermocouple measuring points are located in multiple reflecting pool 7
Three parts after in front of portion, i.e., near the air inlet of reflection tank, near among reflection tank and reflection tank gas outlet, with measurement gas
Real-time contact.Main control unit 24 acquires the temperature feedback number of No. three thermocouples by three tunnel ADC module 23 of SPI interface control in real time
According to by three tunnel actual temperature datas compared with setting value, by way of PID control, three tunnel DAC modules 25 of change is defeated in real time
Voltage out, and then the output electric current of three road current sources 26 is controlled, so as to change three tunnel heating films respectively, heating film 1,
The heating power of heating film 2 28, heating film 3 29 realizes 50 DEG C to 400 DEG C of multiple reflecting pool of temperature control, practical temperature control
Reachable ± 0.2 DEG C of precision.Meanwhile polytetrafluoroethylene (PTFE) insulating layer 6 is close to the heating film outside measuring cell, plays the effect of insulation
Fruit.The setting temperature of high temperature heat traced pipeline is 5 DEG C higher than multiple reflecting pool control temperature.The heating method of three-stage can effectively eliminate
The temperature unevenness of under test gas in measuring cell, improves the stability of spectral measurement.
Low pressure control section includes electric control valve, pressure sensor, electronic flowmeter, surge tank, gas pretreatment dress
It sets, vacuum pump and control circuit.Control circuit mainly includes the second main control unit 35, three tunnel ADC module 34 and three road DAC
Module 36, the circuit are responsible for flow signal, the acquisition of air pressure signal, the aperture control of electric control valve and corresponding logic point
Analysis.
As shown in Figure 3 and Figure 4, when low pressure control section works, it is first shut off the first electric control valve 2, is made second electronic
Regulating valve 13, third electric control valve 17 are shown in a fully open operation, and start vacuum pump 19, at this time multiple reflecting pool 7 and surge tank 16
Air pressure inside is consistent.When atmospheric pressure value is reduced to setting value 3kPa, the second electric control valve 13 is closed, vacuum pump is kept to continue work
Make.When the indicating value of the second pressure sensor 15 in surge tank 16 is down to 200Pa, third electric control valve 17 is closed, is shut down
Vacuum pump 19.At this point, serving as negative pressure source by surge tank, by pid control mode, opening for the first electric control valve 2 is finely tuned in real time
Degree, so that system charge flow rate accurately reaches setting value, meanwhile, equally by pid control mode, the second electric adjustable is finely tuned in real time
The aperture of valve 13 is saved, so that the registration of first pressure sensor 11 is stablized in setting value in multiple reflecting pool 7.When in surge tank 16
It is more than when setting air pressure 3kPa, then to repeat above-mentioned control flow that air pressure, which is gradually increasing,.
The output current signal of electronic flowmeter 4 and pressure sensor is after I/V conversion 33 respectively by three tunnel ADC module
34 acquisitions, the data measured are input to main control unit 35, and main control unit adjusts three tunnel DAC modules after corresponding logic analysis
36 output voltage, to realize the aperture control of No. three motor-driven valves.
Gas pretreatment device 18 is used as the cooling and filtering of high-temperature gas, avoids the direct extracting high-temperature gas of vacuum pump
And pump housing pollution, it ensure that performance and the service life of vacuum pump.
Negative pressure source is served as by surge tank, by the aperture of motor-driven valve between automatic adjustment measuring cell and surge tank, realizes and surveys
Measure the accurate control of air pressure in pond.Measuring cell pressure control can be 3000Pa between 10000Pa by above-mentioned control method, air pressure
Controlling precision is ± 5%.When the air pressure in surge tank is gradually increasing more than 3000Pa, then start vacuum pump for gas in surge tank
Pressure is evacuated to 200Pa again.This method makes vacuum pump be in intermittent work state, and efficiently solving vacuum pump can not permanent worker
The shortcomings that making realizes the long-term stable operation of low voltage control system.Gas pretreatment device be used as high-temperature gas cooling and
Filtering avoids the direct extracting high-temperature gas of vacuum pump and pump housing pollution, ensure that performance and the service life of vacuum pump.
Claims (8)
1. a kind of high-temperature low-pressure multiple reflecting pool control system, which is characterized in that the first electric control valve (2), electronic flowmeter
(4), multiple reflecting pool (7), the second electric control valve (13), surge tank (16), third electric control valve (17), vacuum pump
(19)；
First electric control valve (2), electronic flowmeter (4), multiple reflecting pool (7), the second electric control valve (13), surge tank
(16) it is linked in sequence by high temperature heat traced pipeline, surge tank (16) is followed by third electric control valve (17) and vacuum pump (19)；
It further include high-temperature control part and low pressure control section.
2. high-temperature low-pressure multiple reflecting pool control system according to claim 1, which is characterized in that the high-temperature control portion
Divide includes heating film, thermocouple, main control unit, current source, ADC module, DAC module；
Multiple reflecting pool (7) is divided into several temperature controlled zones, and thermocouple measures the temperature data of each temperature controlled zone, master control list respectively
Member controls the output voltage of DAC module by ADC module temperature collection data after corresponding logic analysis, and then controls
The output electric current of current source, to change the heating power of each road heating film.
3. high-temperature low-pressure multiple reflecting pool control system according to claim 1, which is characterized in that the high-temperature control portion
Divide includes three tunnel heating films, three thermocouples, the first main control unit (24), three road current sources (26), three tunnel ADC module, three tunnels
DAC module；
Multiple reflecting pool (7) be bisected into before in after three temperature controlled zones, three thermocouples measure the temperature of three temperature controlled zones respectively
Degree evidence, main control unit (24) control three tunnels by three tunnel ADC module temperature collection data after corresponding logic analysis
The output voltage of DAC module, and then the output electric current of three road current sources (26) is controlled, to change the heating function of three tunnel heating films
Rate.
4. high-temperature low-pressure multiple reflecting pool control system according to claim 2 or 3, which is characterized in that further include poly- four
Vinyl fluoride insulating layer (6), polytetrafluoroethylene (PTFE) insulating layer are close to the heating film outside multiple reflecting pool.
5. high-temperature low-pressure multiple reflecting pool control system according to claim 1, which is characterized in that the low voltage control portion
Divide and converts (33), the second main control unit (35), three tunnel ADC module, three road DAC including pressure sensor, electronic flowmeter, I/V
Module；
First pressure sensor (11) connects multiple reflecting pool (7), and second pressure sensor (15) connects surge tank (16)；
The output current signal of electronic flowmeter and pressure sensor is adopted by three tunnel ADC module respectively after I/V converts (33)
The data of collection, acquisition input the second main control unit (35), and the output electricity of three tunnel DAC modules is adjusted after corresponding logic analysis
Pressure, to realize the aperture control of No. three motor-driven valves.
6. high-temperature low-pressure multiple reflecting pool control system according to claim 5, which is characterized in that when in surge tank (16)
When air pressure is more than setting highest threshold value, close the first electric control valve (2), the second electric control valve (13), third motorized adjustment
Valve (17) is shown in a fully open operation, and is started vacuum pump (19)；When setting highest threshold value is down in air pressure, the second electric control valve is closed
(13), vacuum pump works on；When setting lowest threshold is down in air pressure in surge tank (16), third electric control valve is closed
(17), vacuum pump (19) are shut down；Negative pressure source is served as by surge tank, finely tunes the first electric control valve (2) and the second electric adjustable in real time
The aperture for saving valve (13) stablizes the registration of multiple reflecting pool (7) interior first pressure sensor (11) in setting value.
7. high-temperature low-pressure multiple reflecting pool control system according to claim 5, which is characterized in that when in surge tank (16)
When air pressure is more than setting value 3kPa, close the first electric control valve (2), the second electric control valve (13), third electric control valve
(17) it is shown in a fully open operation, starts vacuum pump (19)；When setting value 3kPa is down in air pressure, close the second electric control valve (13),
Vacuum pump works on；It when setting value 200Pa is down in air pressure in surge tank (16), closes third electric control valve (17), closes
Stop vacuum pump (19)；Negative pressure source is served as by surge tank, finely tunes the first electric control valve (2) and the second electric control valve (13) in real time
Aperture, make multiple reflecting pool (7) interior first pressure sensor (11) registration stablize in setting value.
8. high-temperature low-pressure multiple reflecting pool control system according to claim 5, which is characterized in that further include that gas is located in advance
It manages device (18), is connected between third electric control valve (17) and vacuum pump (19), gas pretreatment device is used as High Temperature Gas
The cooling and filtering of body.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811424504.0A CN109283157B (en) | 2018-11-27 | 2018-11-27 | High-temperature low-pressure multiple reflection pool control system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811424504.0A CN109283157B (en) | 2018-11-27 | 2018-11-27 | High-temperature low-pressure multiple reflection pool control system |
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| Publication Number | Publication Date |
|---|---|
| CN109283157A true CN109283157A (en) | 2019-01-29 |
| CN109283157B CN109283157B (en) | 2024-03-12 |
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| CN201811424504.0A Active CN109283157B (en) | 2018-11-27 | 2018-11-27 | High-temperature low-pressure multiple reflection pool control system |
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| JP2004271295A (en) * | 2003-03-07 | 2004-09-30 | Yokogawa Electric Corp | Laser spectral analyzer |
| US20120125083A1 (en) * | 2010-11-23 | 2012-05-24 | Bruker Chemical Analysis Bv | Gas Chromatography With Ambient Pressure Stability Control |
| CN105067553A (en) * | 2015-08-14 | 2015-11-18 | 安徽蓝盾光电子股份有限公司 | Heat tracing tank based high-precision FTIR (Fourier transform infrared spectroscopy) online measurement system for flue gas |
| CN106442404A (en) * | 2016-09-28 | 2017-02-22 | 曲阜师范大学 | Real-time on-line multi-component monitoring optical system for stable gas isotopes |
| CN107271365A (en) * | 2017-08-23 | 2017-10-20 | 华纳创新（北京）科技有限公司 | A kind of device of on-line determination the escaping of ammonia in situ |
| CN209432698U (en) * | 2018-11-27 | 2019-09-24 | 东南大学 | A kind of high-temperature low-pressure multiple reflecting pool control device |
-
2018
- 2018-11-27 CN CN201811424504.0A patent/CN109283157B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004271295A (en) * | 2003-03-07 | 2004-09-30 | Yokogawa Electric Corp | Laser spectral analyzer |
| US20120125083A1 (en) * | 2010-11-23 | 2012-05-24 | Bruker Chemical Analysis Bv | Gas Chromatography With Ambient Pressure Stability Control |
| CN105067553A (en) * | 2015-08-14 | 2015-11-18 | 安徽蓝盾光电子股份有限公司 | Heat tracing tank based high-precision FTIR (Fourier transform infrared spectroscopy) online measurement system for flue gas |
| CN106442404A (en) * | 2016-09-28 | 2017-02-22 | 曲阜师范大学 | Real-time on-line multi-component monitoring optical system for stable gas isotopes |
| CN107271365A (en) * | 2017-08-23 | 2017-10-20 | 华纳创新（北京）科技有限公司 | A kind of device of on-line determination the escaping of ammonia in situ |
| CN209432698U (en) * | 2018-11-27 | 2019-09-24 | 东南大学 | A kind of high-temperature low-pressure multiple reflecting pool control device |
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