CN109254332A - Wide angle and wide wave band anti-reflection film and its preparation method and application - Google Patents
Wide angle and wide wave band anti-reflection film and its preparation method and application Download PDFInfo
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- CN109254332A CN109254332A CN201710575811.8A CN201710575811A CN109254332A CN 109254332 A CN109254332 A CN 109254332A CN 201710575811 A CN201710575811 A CN 201710575811A CN 109254332 A CN109254332 A CN 109254332A
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- zinc oxide
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- 238000002360 preparation method Methods 0.000 title claims abstract description 20
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims abstract description 138
- 239000013078 crystal Substances 0.000 claims abstract description 69
- 239000011787 zinc oxide Substances 0.000 claims abstract description 69
- SBIBMFFZSBJNJF-UHFFFAOYSA-N selenium;zinc Chemical compound [Se]=[Zn] SBIBMFFZSBJNJF-UHFFFAOYSA-N 0.000 claims abstract description 53
- 239000000758 substrate Substances 0.000 claims abstract description 51
- 239000012528 membrane Substances 0.000 claims abstract description 12
- 230000003287 optical effect Effects 0.000 claims abstract description 12
- 239000011248 coating agent Substances 0.000 claims abstract description 9
- 238000000576 coating method Methods 0.000 claims abstract description 9
- 238000001755 magnetron sputter deposition Methods 0.000 claims abstract description 8
- 239000010410 layer Substances 0.000 claims description 114
- 239000011435 rock Substances 0.000 claims description 58
- 238000000151 deposition Methods 0.000 claims description 33
- 230000008021 deposition Effects 0.000 claims description 33
- 238000000411 transmission spectrum Methods 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 10
- 239000002356 single layer Substances 0.000 claims description 6
- 238000000985 reflectance spectrum Methods 0.000 claims description 4
- 238000004544 sputter deposition Methods 0.000 claims description 4
- 239000007789 gas Substances 0.000 claims 8
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims 2
- 239000011701 zinc Substances 0.000 claims 2
- 229910052725 zinc Inorganic materials 0.000 claims 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
- 230000003647 oxidation Effects 0.000 claims 1
- 238000007254 oxidation reaction Methods 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- 239000010408 film Substances 0.000 abstract description 113
- 238000013461 design Methods 0.000 abstract description 8
- 238000000034 method Methods 0.000 abstract description 7
- 230000003667 anti-reflective effect Effects 0.000 abstract description 4
- 230000005540 biological transmission Effects 0.000 abstract description 4
- 239000010409 thin film Substances 0.000 abstract description 4
- 230000008569 process Effects 0.000 abstract description 3
- 238000012360 testing method Methods 0.000 abstract description 2
- 238000001228 spectrum Methods 0.000 abstract 1
- 229960001296 zinc oxide Drugs 0.000 description 49
- MEYZYGMYMLNUHJ-UHFFFAOYSA-N tunicamycin Natural products CC(C)CCCCCCCCCC=CC(=O)NC1C(O)C(O)C(CC(O)C2OC(C(O)C2O)N3C=CC(=O)NC3=O)OC1OC4OC(CO)C(O)C(O)C4NC(=O)C MEYZYGMYMLNUHJ-UHFFFAOYSA-N 0.000 description 3
- 238000000605 extraction Methods 0.000 description 2
- 239000012788 optical film Substances 0.000 description 2
- 230000004075 alteration Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000008447 perception Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000009738 saturating Methods 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- 238000002371 ultraviolet--visible spectrum Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
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- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Physical Vapour Deposition (AREA)
- Laminated Bodies (AREA)
Abstract
The present invention provides a kind of wide angle and wide wave band anti-reflection films and its preparation method and application, application therein is the light-emitting window that wide angle and wide wave band anti-reflection film is plated on to infrared gas sensor light source, increases the transmissivity of the light-emitting window of the infrared gas sensor light source.This kind of wide angle and wide wave band anti-reflection film, preferable antireflective effect is realized to light of the incident angle within the scope of 20 ° to 50 °, using ZnSe as substrate, identical membrane system is coated in the upper and lower surface of the ZnSe, totally eight layers, it is alternately formed by zinc oxide and ice crystal, include following preparatory process in preparation: being tested by transmission and reflection spectra, calculate ZnSe substrate, the refractive index of ice crystal and zinc oxide film, the thickness for meeting each layer of transmission requirement is found out by optical coating design software, and assembly of thin films is prepared using the method for magnetron sputtering, also it can verify whether it meets design requirement by the anti-reflection rate of test sample after the completion of preparation.
Description
Technical field
The present invention relates to Film Optics field more particularly to a kind of anti-reflection films of gas sensor light source, and in particular to one
Kind is for wide angle and wide wave band anti-reflection film and its preparation method and application.
Background technique
Infrared broadband light source is an important component of infrared gas sensor internal structure.In order to avoid shining
Material is influenced by external environment, it usually needs is encapsulated with the eyeglass of high transparency, is played protective action.ZnSe is one
Transparent material of the kind within the scope of 2 μm to 14 mu m wavebands, is often used as the transmission window of infrared broadband light source.But due to
Its refractive index with higher, transmissivity is usually 70% or so.In order to improve the light emission rate of infrared broadband light source, need
Anti-reflection film is coated on eyeglass.
Anti-reflection film is usually the multi-layer film structure of two kinds of material alternating deposits on substrate, and existing anti-reflection film is in design
More consideration is to realize to normal incident light anti-reflection, and the transmissivity of oblique incident ray is less to be considered as spectrophotometric data.
But in infrared gas sensor, light source and the photosensitive member of detection are integrated on a printed circuit board (PCB).Light source issues
Light by entering pyroelectric sensor after the interior survey top reflective of metal nut cap, after photosensitive member perception, be converted into electric signal,
As shown in Figure 1.Therefore, the light for vertically projecting light-emitting surface cannot be introduced into photosensitive member.The light that can be detected by photosensitive member is
The light that light source projects in some angular range.By taking some products as an example, this angular range is about at 20 ° to 50 °.Oblique
Under condition of incidence, the transmissivity of light can decline with the increase of angle.Therefore, it is being designed for infrared gas sensor light source
Anti-reflection film when, be considered as being promoted the oblique incidence transmitance of the anti-reflection film applied to infrared gas sensor light source, make at its
In one it is higher it is horizontal (such as: 90% or more) so that the light that light source projects can be detected more by photosensitive member, thus
Promote the response rate of product.
In the design of anti-reflection film, optical coating design software is frequently used, such as Xu Xiaofeng, Du Xiliang, Xing Huaizhong, model
The paper that shore and Zhang Fengshan are delivered, " research of broad-angle-incident 400-700nm wave band antireflection film " (the sub- ˙ of [J] light electricity swashs
Light, 2007,18 (7), 886-888).
Summary of the invention
The purpose of the present invention is overcoming the above-mentioned prior art, providing a kind of to be the relatively broadband of oblique incidence
Light beam wide angle and wide wave band anti-reflection film of higher transmissivity and its preparation method and application is provided.
To achieve the goals above, wide angle and wide wave band anti-reflection film of the invention and its preparation method and application is specific such as
Under:
The wide angle and wide wave band anti-reflection film, is mainly characterized by, and the wide angle and wide wave band anti-reflection film is served as a contrast based on ZnSe
Bottom is coated with identical membrane system in the upper bottom surface of the ZnSe substrate, which includes four layers of zinc oxide film and four layers of ice crystal
Rock layers, wherein zinc oxide film and ice crystal rock layers are arranged alternately, and are the first layer for being plated on ZnSe substrate floor with zinc oxide film, respectively
The thickness of film layer, which is satisfied with, makes the wide angle and wide wave band anti-reflection film within the scope of predetermined angle, in default transparent wavelength range
Incident beam reach default transmissivity.
Preferably, the default ranges of incidence angles is 20 ° to 50 °, presetting light transmitting wavelength is 2 μm to 14 μm, is preset saturating
Penetrating rate is 90%.
More preferably, the thickness of the first zinc oxide film to the 4th zinc oxide film respectively correspond as 490nm, 230nm, 140nm and
55nm, the first ice crystal rock layers are respectively corresponded to the 4th ice crystal thickness degree as 120nm, 240nm, 400nm and 930nm.
The preparation method of above-mentioned wide angle and wide wave band anti-reflection film, is mainly characterized by, and the preparation method includes following
Step:
(1) refractive index of the ZnSe substrate is obtained, and obtains the deposition rate and refractive index of the zinc oxide film,
And the deposition rate and refractive index of ice crystal rock layers；
(2) ZnSe substrate, ice crystal rock layers and the zinc oxide film obtained in input step (1) in optical coating design software
Refractive index, create material, and input predetermined angle range, default transparent wavelength range and default transmissivity wherein, pass through
The optical design software obtains the thickness of each film layer in membrane system；
(3) according to the deposition of the zinc oxide film obtained in the thickness of each film layer of gained in step (2) and step (1)
The deposition rate of rate and ice crystal rock layers successively deposits each film layer on the ZnSe substrate.
Preferably, the step (1) the following steps are included:
(1.1) transmission spectrum and reflectance spectrum that ZnSe substrate is measured by infrared spectrometer, obtain the transflection of the ZnSe substrate
Rate；
(1.2) folding of the ZnSe substrate in default transparent wavelength range is obtained according to the corresponding relationship of transflection rate and refractive index
Penetrate rate；
(1.3) zinc oxide film or ice crystal rock layers of single layer, record are grown on the ZnSe substrate by magnetron sputtering
Technological parameter when sputtering, and by the thickness of the step instrument acquisition zinc oxide film or ice crystal rock layers, calculate the zinc oxide
The deposition rate of layer or ice crystal rock layers；
(1.4) transmission spectrum for being coated with the ZnSe substrate of the zinc oxide film or ice crystal rock layers is obtained；
(1.5) according to the transmission spectrum of the ZnSe substrate for being coated with the zinc oxide film or ice crystal rock layers obtained in step (1.4),
And the zinc oxide film is obtained according to the thickness of the zinc oxide film obtained in step (1.3) or the thickness of ice crystal rock layers
Refractive index or ice crystal rock layers refractive index；
(1.5) according to the refractive index and ice crystal of the zinc oxide film obtained in the refractive index of ZnSe substrate and step (1.4)
The refractive index of rock layers and the predetermined angle range, default light transmitting wavelength and default transmissivity obtain four be arranged alternately
The thickness of layer zinc oxide film and four layers of ice crystal rock layers.
Preferably, the step (2) includes:
The folding of the ZnSe substrate, ice crystal rock layers and zinc oxide film that are obtained in optical coating design software input step (1)
Rate is penetrated, material is created, and inputs predetermined angle range, default transparent wavelength range and default transmissivity wherein, by described
Optical design software obtain membrane system in each film layer thickness.
More preferably, the step (3) includes:
According to the refractive index and deposition rate of the ice crystal rock layers, the refractive index and deposition rate of zinc oxide film, and
Technological parameter when the deposition single layer film layer of the acquisition in step (1), passes through each film layer of magnetron sputtering coater layer by layer deposition.
Have the infrared gas sensor light source of above-mentioned wide angle and wide wave band anti-reflection film, is mainly characterized by, it is described
The light-emitting window of infrared gas sensor light source is coated with the wide angle and wide wave band anti-reflection film, to the infrared gas sensor light source
With oblique shooting angle outgoing light beam carry out it is anti-reflection, make the infrared gas sensor for being coated with the wide angle and wide wave band anti-reflection film
The transmissivity of the light-emitting window of light source meets default transmissivity.
Preferably, the range of the oblique shooting angle is 20 ° to 50 °, the wave of the infrared gas sensor light source
It is long to meet 2 μm to 14 μm, have the default transmissivity of the infrared gas sensor light source of above-mentioned wide angle and wide wave band anti-reflection film
It is 90%.
More preferably, the thickness of the first zinc oxide film to the 4th zinc oxide film respectively correspond as 490nm, 230nm, 140nm and
55nm, the first ice crystal rock layers are respectively corresponded to the 4th ice crystal thickness degree as 120nm, 240nm, 400nm and 930nm.
Using the wide angle and wide wave band anti-reflection film and its preparation method and application in the present invention, since it is in the ZnSe
The upper bottom surface of substrate is coated with the identical membrane system of special designing, for different incident light angle requirements, using optical film
It is the thickness that design software obtains each film layer under different demands, is suitable for various demands, is with a wide range of applications, simple side
Just, when using the anti-reflection film on infrared gas sensor light source, preferable antireflective effect can be obtained.
Detailed description of the invention
Fig. 1 is the schematic diagram of internal structure of infrared gas sensor light source.
Fig. 2 is that figure is arranged in the film layer of the wide angle and wide wave band anti-reflection film in the present invention.
Fig. 3 is the infrared gas sensor light source for having above-mentioned wide angle and wide wave band anti-reflection film in the present invention multiple
Window transmitance under angle.
Specific embodiment
It is further to carry out combined with specific embodiments below in order to more clearly describe technology contents of the invention
Description.
Referring to Fig. 2, the wide angle and wide wave band anti-reflection film is based on ZnSe substrate, in the upper bottom surface of the ZnSe substrate
It is coated with identical membrane system, which includes that four layers of zinc oxide film and four layers of ice crystal rock layers, wherein zinc oxide film and ice crystal rock layers are handed over
It for setting, and is the first layer for being plated on ZnSe substrate floor with zinc oxide film, the thickness of each film layer, which is satisfied with, makes the wide angle
Degree broadband anti-reflection film reaches default transmissivity to the incident beam within the scope of predetermined angle, in default transparent wavelength range.
It is 20 ° to 50 ° in the default ranges of incidence angles, presetting light transmitting wavelength is 2 μm to 14 μm, and default transmissivity is
When 90%, the thickness of the first zinc oxide film to the 4th zinc oxide film is respectively corresponded as 490nm, 230nm, 140nm and 55nm, and first
Ice crystal rock layers are respectively corresponded to the 4th ice crystal thickness degree as 120nm, 240nm, 400nm and 930nm.
The preparation method of above-mentioned wide angle and wide wave band anti-reflection film the following steps are included:
(1) refractive index of the ZnSe substrate is obtained, and obtains the deposition rate and refractive index of the zinc oxide film,
And the deposition rate and refractive index of ice crystal rock layers；
(2) ZnSe substrate, ice crystal rock layers and the zinc oxide film obtained in input step (1) in optical coating design software
Refractive index, create material, and input predetermined angle range, default transparent wavelength range and default transmissivity wherein, pass through
The optical design software obtains the thickness of each film layer in membrane system；
(3) according to the deposition of the zinc oxide film obtained in the thickness of each film layer of gained in step (2) and step (1)
The deposition rate of rate and ice crystal rock layers successively deposits each film layer on the ZnSe substrate.
The step (1) the following steps are included:
(1.1) transmission spectrum and reflectance spectrum that ZnSe substrate is measured by infrared spectrometer, obtain the transflection of the ZnSe substrate
Rate；
(1.2) folding of the ZnSe substrate in default transparent wavelength range is obtained according to the corresponding relationship of transflection rate and refractive index
Penetrate rate；
(1.3) zinc oxide film or ice crystal rock layers of single layer, record are grown on the ZnSe substrate by magnetron sputtering
Technological parameter when sputtering, and by the thickness of the step instrument acquisition zinc oxide film or ice crystal rock layers, calculate the zinc oxide
The deposition rate of layer or ice crystal rock layers；
(1.4) transmission spectrum for being coated with the ZnSe substrate of the zinc oxide film or ice crystal rock layers is obtained；
(1.5) according to the transmission spectrum of the ZnSe substrate for being coated with the zinc oxide film or ice crystal rock layers obtained in step (1.4),
And the zinc oxide film is obtained according to the thickness of the zinc oxide film obtained in step (1.3) or the thickness of ice crystal rock layers
Refractive index or ice crystal rock layers refractive index；
(1.5) according to the refractive index and ice crystal of the zinc oxide film obtained in the refractive index of ZnSe substrate and step (1.4)
The refractive index of rock layers and the predetermined angle range, default light transmitting wavelength and default transmissivity obtain four be arranged alternately
The thickness of layer zinc oxide film and four layers of ice crystal rock layers.
The step (3) includes:
According to the refractive index and deposition rate of the ice crystal rock layers, the refractive index and deposition rate of zinc oxide film, and
Technological parameter when the deposition single layer film layer of the acquisition in step (1), passes through each film layer of magnetron sputtering coater layer by layer deposition.
Since infrared gas sensor light source has more special shooting angle, the light of outgoing has special wavelength,
Therefore the transmissivity demand that meet the infrared gas sensor, can plate this in the light-emitting window of the infrared gas sensor light source
Wide angle and wide wave band anti-reflection film increases to the light beam with the outgoing of oblique shooting angle to the infrared gas sensor light source
Thoroughly, meet the transmissivity for being coated with the light-emitting window of the infrared gas sensor light source of the wide angle and wide wave band anti-reflection film default
Transmissivity.
The range of the oblique shooting angle is 20 ° to 50 °, and the wavelength of the infrared gas sensor light source meets 2 μ
M to 14 μm, the default transmissivity for having the infrared gas sensor light source of above-mentioned wide angle and wide wave band anti-reflection film is 90%.
The thickness of first zinc oxide film to the 4th zinc oxide film respectively corresponds as 490nm, 230nm, 140nm and 55nm, and
One ice crystal rock layers are respectively corresponded to the 4th ice crystal thickness degree as 120nm, 240nm, 400nm and 930nm.
Referring to Fig. 3, the infrared gas sensor light source for having above-mentioned wide angle and wide wave band anti-reflection film is with higher
Light transmittance has above-mentioned in the case where the angle of the incident wide angle and wide wave band anti-reflection film is 20 °, 30 °, 40 ° and 50 °
The transmissivity of the infrared gas sensor light source of wide angle and wide wave band anti-reflection film can achieve 90% or more, meet wanting for design
It asks, has reached expected antireflective effect.
In a specific embodiment, the preparation of entire wide angle and wide wave band anti-reflection film is divided into three processes, respectively serves as a contrast
Extraction, the software board design of bottom and thin-film material refractive index obtain the deposition of each thickness degree and multilayer film, wherein substrate and
The extraction of thin-film material refractive index specifically:
The transmission spectrum and reflectance spectrum that ZnSe substrate is measured with infrared spectrometer are calculated according to the relationship of transflection rate and refractive index
2 μm of refractive index to ZnSe in 14 μ m wavelength ranges out, wherein the relationship of transflection rate and refractive index can pass through fresnel formula
And the energy supposition after light beam multiple reflections pushes away.
On ZnSe substrate, one layer of ice crystal rock layers or zinc oxide film are grown with the method for magnetron sputtering, when writing down sputtering
Hereafter technological parameter should use same technological parameter when ice crystal rock layers or zinc oxide film in growing multiple layer film system.With platform
Rank instrument measures the thickness of ice crystal rock layers or zinc oxide film, calculates the ice crystal rock layers or zinc oxide film deposition rate.
The transmission spectrum for having plated the ZnSe substrate of one layer of ice crystal rock layers or zinc oxide film is measured with infrared spectrometer, it will before this
ZnSe refractive index of substrate and ice crystal film thickness through obtaining are as known parameters, by solving one about transmissivity and refractive index
Between the available ice crystal rock layers of complicated equation of correlation or the refractive index of zinc oxide film, which can use film
Optical transfer matrix method is derived.
And software board design obtains each thickness degree with following detailed process:
The refractive index input of the refractive index of ZnSe substrate obtained before this, the refractive index of ice crystal and zinc-oxide film is special
The optical coating design software of industry creates new material.Anti-reflection film is provided in a wavelength range (2 μm to 14 μm) and angular range
The transmission requirement (being more than or equal to 90%) of (20 ° to 50 °), after choosing material, software will carry out board design, finally provide symbol
Desired membrane system is closed, wherein the thickness of every thin film is the data that carries out next step preparation work and must obtain.
The deposition of multilayer film the following steps are included:
According to the thicknesses of layers provided in software design result, in conjunction with the ice crystal rock layers and zinc oxide film obtained before this
Deposition rate calculates the sedimentation time of every tunic.When with monofilm is deposited before this under identical technological parameter, splashed with magnetic control
Penetrate 8 tunic of coating machine layer by layer deposition.After the completion, then ZnSe substrate identical 8 tunic of another bottom surface deposition, be finally completed
Wide angle and wide wave band anti-reflection film.
It, can be by the transmission spectrum of test sample, to verify after the growth for completing each film layer in a kind of preferred embodiment
Whether it meets design requirement (whether the light beam of certain wave band is can reach preset transmissivity after the incidence of certain angular range).
Using the wide angle and wide wave band anti-reflection film and its preparation method and application in the present invention, since it is in the ZnSe
The upper bottom surface of substrate is coated with the identical membrane system of special designing, for different incident light angle requirements, using optical film
It is the thickness that design software obtains each film layer under different demands, is suitable for various demands, is with a wide range of applications, simple side
Just, when using the anti-reflection film on infrared gas sensor light source, preferable antireflective effect can be obtained.
In this description, the present invention is described with reference to its specific embodiment.But it is clear that can still make
Various modifications and alterations are without departing from the spirit and scope of the invention.Therefore, the description and the appended drawings should be considered as illustrative
And not restrictive.
Claims (10)
1. a kind of wide angle and wide wave band anti-reflection film, which is characterized in that the wide angle and wide wave band anti-reflection film is based on ZnSe substrate,
It is coated with identical membrane system in the upper bottom surface of the ZnSe substrate, which includes four layers of zinc oxide film and four layers of ice crystal
Layer, wherein zinc oxide film and ice crystal rock layers are arranged alternately, and are the first layer for being plated on ZnSe substrate floor, each film with zinc oxide film
The thickness of layer, which is satisfied with, makes the wide angle and wide wave band anti-reflection film within the scope of predetermined angle, in default transparent wavelength range
Incident beam reaches default transmissivity.
2. wide angle and wide wave band anti-reflection film according to claim 1, which is characterized in that the default ranges of incidence angles is
20 ° to 50 °, presetting light transmitting wavelength is 2 μm to 14 μm, and presetting transmissivity is 90%.
3. wide angle and wide wave band anti-reflection film according to claim 2, which is characterized in that the first zinc oxide film to the 4th oxidation
The thickness of zinc layers respectively corresponds as 490nm, 230nm, 140nm and 55nm, the first ice crystal rock layers to the 4th ice crystal thickness degree point
120nm, 240nm, 400nm and 930nm are not corresponded to.
4. the preparation method of wide angle and wide wave band anti-reflection film described in a kind of any one of claims 1 to 3, which is characterized in that
The preparation method the following steps are included:
(1) refractive index of the ZnSe substrate is obtained, and obtains the deposition rate and refractive index of the zinc oxide film, and
The deposition rate and refractive index of ice crystal rock layers；
(2) thickness of each film layer in membrane system is obtained by optical coating design software；
(3) according to the deposition rate of the zinc oxide film obtained in the thickness of each film layer of gained in step (2) and step (1)
With the deposition rate of ice crystal rock layers, each film layer successively is deposited on the ZnSe substrate.
5. the preparation method of wide angle and wide wave band anti-reflection film according to claim 4, which is characterized in that the step
(1) the following steps are included:
(1.1) transmission spectrum and reflectance spectrum that ZnSe substrate is measured by infrared spectrometer, obtain the transflection rate of the ZnSe substrate；
(1.2) refraction of the ZnSe substrate in default transparent wavelength range is obtained according to the corresponding relationship of transflection rate and refractive index
Rate；
(1.3) zinc oxide film or ice crystal rock layers of single layer, record sputtering are grown on the ZnSe substrate by magnetron sputtering
When technological parameter, and obtain by step instrument the thickness of the zinc oxide film or ice crystal rock layers, calculate the zinc oxide film or
The deposition rate of ice crystal rock layers；
(1.4) transmission spectrum for being coated with the ZnSe substrate of the zinc oxide film or ice crystal rock layers is obtained；
(1.5) according to the transmission spectrum of the ZnSe substrate for being coated with the zinc oxide film or ice crystal rock layers obtained in step (1.4), and root
The folding of the zinc oxide film is obtained according to the thickness of the zinc oxide film obtained in step (1.3) or the thickness of ice crystal rock layers
Penetrate the refractive index of rate or ice crystal rock layers；
(1.5) according to the refractive index and ice crystal rock layers of the zinc oxide film obtained in the refractive index of ZnSe substrate and step (1.4)
Refractive index and the predetermined angle range, default light transmitting wavelength and default transmissivity obtain four layers of oxygen being arranged alternately
Change the thickness of zinc layers and four layers of ice crystal rock layers.
6. the preparation method of wide angle and wide wave band anti-reflection film according to claim 4, which is characterized in that the step
(2) include:
The refractive index of the ZnSe substrate, ice crystal rock layers and zinc oxide film that are obtained in optical coating design software input step (1),
Material is created, and inputs predetermined angle range, default transparent wavelength range and default transmissivity wherein, passes through the optics
Design software obtains the thickness of each film layer in membrane system.
7. the preparation method of wide angle and wide wave band anti-reflection film according to claim 5, which is characterized in that the step
(3) include:
According to the refractive index and deposition rate, the refractive index of zinc oxide film and deposition rate and step of the ice crystal rock layers
(1) technological parameter when deposition single layer film layer of the acquisition in, passes through each film layer of magnetron sputtering coater layer by layer deposition.
8. a kind of infrared gas sensor light for having wide angle and wide wave band anti-reflection film described in any one of claims 1 to 3
Source, which is characterized in that the light-emitting window of the infrared gas sensor light source is coated with the wide angle and wide wave band anti-reflection film, to right
The light beam with the outgoing of oblique shooting angle of the infrared gas sensor light source carries out anti-reflection, makes to be coated with the wide angle and wide wave band anti-reflection
The transmissivity of the light-emitting window of the infrared gas sensor light source of film meets default transmissivity.
9. the infrared gas sensor light source according to claim 8 for having wide angle and wide wave band anti-reflection film, feature exist
In the range of the oblique shooting angle is 20 ° to 50 °, and the wavelength of the infrared gas sensor light source meets 2 μm to 14
μm, the default transmissivity for having the infrared gas sensor light source of above-mentioned wide angle and wide wave band anti-reflection film is 90%.
10. the infrared gas sensor light source according to claim 9 for having wide angle and wide wave band anti-reflection film, feature exist
In the thickness of the first zinc oxide film to the 4th zinc oxide film respectively corresponds as 490nm, 230nm, 140nm and 55nm, the first ice crystal
Rock layers are respectively corresponded to the 4th ice crystal thickness degree as 120nm, 240nm, 400nm and 930nm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710575811.8A CN109254332A (en) | 2017-07-14 | 2017-07-14 | Wide angle and wide wave band anti-reflection film and its preparation method and application |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710575811.8A CN109254332A (en) | 2017-07-14 | 2017-07-14 | Wide angle and wide wave band anti-reflection film and its preparation method and application |
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|---|---|
| CN109254332A true CN109254332A (en) | 2019-01-22 |
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