CN109244271A - OLED device and preparation method thereof, display device - Google Patents
OLED device and preparation method thereof, display device Download PDFInfo
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- CN109244271A CN109244271A CN201811214254.8A CN201811214254A CN109244271A CN 109244271 A CN109244271 A CN 109244271A CN 201811214254 A CN201811214254 A CN 201811214254A CN 109244271 A CN109244271 A CN 109244271A
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- display area
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- oled device
- auxiliary electrode
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/805—Electrodes
- H10K50/82—Cathodes
- H10K50/824—Cathodes combined with auxiliary electrodes
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/131—Interconnections, e.g. wiring lines or terminals
- H10K59/1315—Interconnections, e.g. wiring lines or terminals comprising structures specially adapted for lowering the resistance
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
Abstract
The present invention provides a kind of OLED device and preparation method thereof, display device, are related to the technical field of semiconductor, and enabling OLED device includes display area, and the non-display area in display area；In non-display area, including the anode being set on underlay substrate；Insulating layer is covered on anode；It is provided with cathode layer, cathode insulated column and multiple auxiliary electrodes on insulating layer, cathode layer is enabled to be divided into a plurality of cathode line by cathode insulated column, enables every cathode line in parallel at least one auxiliary electrode.The present invention can reduce the size of the impedance for the cathode line for being bent and being narrowed, and improve the uniformity of display area brightness.
Description
Technical field
The present invention relates to technical field of semiconductors, more particularly, to a kind of OLED device and preparation method thereof, display device.
Background technique
OLED (Organic Light-Emitting Diode, Organic Light Emitting Diode) device is applied in display screen
When, the part with non-display area, such as watch kind product are usually had, needs to drill in OLED display center,
So porose area and its surrounding are non-display area.Since the cabling in OLED cannot break, so often avoiding porose area carries out cloth
Line, this results in the cabling of non-display area that must be bent and be narrowed, i.e., to the Segment cabling of driving and for scanning
Common cabling is bent and narrows, and the impedance so as to cause the cabling for being bent and being narrowed is larger, and the cabling of normal width
Impedance is smaller, cause it is full frame light display when, narrow routing region display brightness it is lower than the brightness in other regions, occur it is bright
Uneven ill effect is spent, user experience is poor.
Summary of the invention
In view of this, can be dropped the purpose of the present invention is to provide a kind of OLED device and preparation method thereof, display device
The size of the impedance of the low cathode line for being bent and being narrowed improves the uniformity of display area brightness.
In a first aspect, the OLED device includes display area the embodiment of the invention provides a kind of OLED device, and
Non-display area in the display area；
In the non-display area, including the anode being set on underlay substrate；Insulating layer is covered on the anode；Institute
It states and is provided with cathode layer, cathode insulated column and multiple auxiliary electrodes on insulating layer, the cathode layer is by the cathode insulated column point
It is divided into a plurality of cathode line, every cathode line is in parallel with auxiliary electrode described at least one.
With reference to first aspect, the embodiment of the invention provides the first possible embodiments of first aspect, wherein institute
Auxiliary electrode is stated to be set between the cathode layer and the insulating layer.
With reference to first aspect, the embodiment of the invention provides second of possible embodiments of first aspect, wherein institute
Multiple auxiliary electrodes are stated to be separated by the cathode insulated column.
With reference to first aspect, the embodiment of the invention provides the third possible embodiments of first aspect, wherein institute
Stating display area includes pixel isolation layer, and the insulating layer and the pixel isolation layer are located at same figure layer.
With reference to first aspect, the embodiment of the invention provides the 4th kind of possible embodiments of first aspect, wherein institute
The material for stating auxiliary electrode is metal.
With reference to first aspect, the embodiment of the invention provides the 5th kind of possible embodiments of first aspect, wherein institute
Stating includes opening area in non-display area.
Second aspect, the embodiment of the present invention also provide a kind of production method of OLED device, and the OLED device includes aobvious
Show region, and the non-display area in the display area, which comprises
Anode is formed on underlay substrate；
On the basis of above step, insulation artwork is formed；The insulation artwork includes being located at the display
The pixel isolation layer in region, and the insulating layer of the non-display area is completely covered；
On the basis of above step, multiple auxiliary electrodes are formed in the non-display area；
On the basis of above step, cathode insulated column is formed in the display area and the non-display area；
On the basis of above step, organic material layer is formed in the display area；
On the basis of above step, cathode layer is formed in the display area and the non-display area；
Wherein, the cathode layer is divided into a plurality of cathode line by the cathode insulated column, positioned at the non-display area
Every cathode line is in parallel with auxiliary electrode described at least one.
In conjunction with second aspect, the embodiment of the invention provides the first possible embodiments of second aspect, wherein institute
It states and forms multiple auxiliary electrodes in the non-display area, comprising:
By vapor deposition or magnetron sputtering technique, the metal layer for covering the non-display area is formed；
The metal layer is etched by mask plate patterning processes, forms multiple auxiliary electrodes.
In conjunction with second aspect, the embodiment of the invention provides second of possible embodiments of second aspect, wherein institute
It states and forms multiple auxiliary electrodes in the non-display area, comprising:
The region other than the non-display area is covered using mask plate；
It is formed in the non-display area multiple based on the figure of the mask plate by vapor deposition or magnetron sputtering technique
Auxiliary electrode.
In conjunction with second aspect, the embodiment of the invention provides the third possible embodiments of second aspect, wherein also
Include:
It drills in the non-display area, forms opening area.
The third aspect, the embodiment of the present invention also provide a kind of display device, including such as any one of first aspect embodiment institute
The OLED device stated.
The embodiment of the present invention brings a kind of following the utility model has the advantages that the embodiment of the invention provides OLED device, OLED device
Part includes display area, and the non-display area in display area；In non-display area, including it is set to underlay substrate
On anode；Insulating layer is covered on anode；Cathode layer, cathode insulated column and multiple auxiliary electrodes are provided on insulating layer, yin
Pole layer is divided into a plurality of cathode line by cathode insulated column, and every cathode line is in parallel at least one auxiliary electrode, curved to reduce
The size of the impedance of bent and narrowed cathode line, improves the uniformity of display area brightness, and improve user experience.
Other features and advantages of the present invention will illustrate in the following description, also, partly become from specification
It obtains it is clear that understand through the implementation of the invention.The objectives and other advantages of the invention are in specification, claims
And specifically noted structure is achieved and obtained in attached drawing.
To enable the above objects, features and advantages of the present invention to be clearer and more comprehensible, preferred embodiment is cited below particularly, and cooperate
Appended attached drawing, is described in detail below.
Detailed description of the invention
It, below will be to specific in order to illustrate more clearly of the specific embodiment of the invention or technical solution in the prior art
Embodiment or attached drawing needed to be used in the description of the prior art be briefly described, it should be apparent that, it is described below
Attached drawing is some embodiments of the present invention, for those of ordinary skill in the art, before not making the creative labor
It puts, is also possible to obtain other drawings based on these drawings.
Fig. 1 is the top view of OLED device provided in an embodiment of the present invention；
Fig. 2 is the sectional view of OLED device provided in an embodiment of the present invention；
Fig. 3 is a kind of top view of the non-display area in OLED device provided in an embodiment of the present invention；
Fig. 4 is another top view of the non-display area in OLED device provided in an embodiment of the present invention；
Fig. 5 a to Fig. 5 f is the process schematic of the production method of OLED device provided in an embodiment of the present invention.
Icon:
The display area 110-；120- non-display area；130- opening area；11- underlay substrate；12- anode；13- insulation
Layer；14- cathode layer；15- cathode insulated column；16- auxiliary electrode；17- cathode line；18- pixel isolation layer；180- pixel grid；
19- organic material layer.
Specific embodiment
In order to make the object, technical scheme and advantages of the embodiment of the invention clearer, below in conjunction with attached drawing to the present invention
Technical solution be clearly and completely described, it is clear that described embodiments are some of the embodiments of the present invention, rather than
Whole embodiments.Based on the embodiments of the present invention, those of ordinary skill in the art are not making creative work premise
Under every other embodiment obtained, shall fall within the protection scope of the present invention.
Currently, causing its impedance by people due to that can there is a situation where that cabling is bent and narrows in OLED display screen
For increase, impedance is bigger, and brightness is darker, cause it is full frame light display when, there are the display brightness of narrowed cabling than other areas
The brightness in domain is low, is based on this, and a kind of OLED device, production method and display device provided in an embodiment of the present invention can reduce
The size of the impedance for the cathode line for being bent and being narrowed improves the uniformity of display area brightness.
To be carried out first to a kind of OLED device disclosed in the embodiment of the present invention detailed convenient for understanding the present embodiment
It is thin to introduce, as shown in Figure 1, OLED device may include display area 110, and the non-display area in display area 110
Domain 120.It wherein, include opening area 130 in non-display area 120, the shape of aperture can be round, square, rectangle
Etc., this present invention is not particularly limited.
As shown in connection with fig. 2, in non-display area, including the anode 12 being set on underlay substrate 11；It is covered on anode 12
There is insulating layer 13；Cathode layer 14, cathode insulated column 15 and multiple auxiliary electrodes 16 are provided on insulating layer 13, auxiliary electrode 16 can
To be by the relatively low metal of the resistivity such as silver, copper, gold, aluminium, chromium, magnesium, molybdenum, platinum, graphene, compound or composition of alloy
Single layer of conductive film or multilayer conductive film.Insulating layer 13 can for anode 12 and cathode layer 14, multiple auxiliary electrodes 16 to be separated by,
It avoids anode 12 and short circuit problem occurs for cathode layer 14, multiple auxiliary electrodes 16.
As shown in connection with fig. 3, cathode layer 14 is divided into a plurality of cathode line 17 by cathode insulated column 15, every cathode line 17 with extremely
A few auxiliary electrode 16 is in parallel.In the present embodiment, auxiliary electrode 16 is set between cathode layer 14 and insulating layer 13, then auxiliary
The upper surface of electrode 16 and the lower surface of cathode line 17 is helped to be bonded, the two forms parallel connection.Due to each cathode line with one
Or multiple 16 parallel connections of auxiliary electrode, so that each cathode line 17 reduces impedance, then can pass through control and cathode line
The number of auxiliary electrode 16 in parallel, or the area of the single auxiliary electrode 16 of control, so that having bending and narrowed cathode line 17
Impedance size it is identical as the size of the impedance for the cathode line for not being bent and being narrowed so that the brightness of entire plane is more
Add uniformly, increases the experience sense of user.
In other embodiments, auxiliary electrode can also be arranged above cathode line, i.e. the lower surface of auxiliary electrode
It is bonded with the upper surface of cathode line, the two forms parallel connection.
In conjunction with shown in Fig. 2 and Fig. 3, multiple auxiliary electrodes 16 are separated by cathode insulated column 15.Auxiliary electrode 16 in this way
Shape can be identical as the cabling mode of cathode line 17, and two adjacent cathode lines 17 is avoided to connect with the same auxiliary electrode 16
Touching, and the problem of short circuit occurs.
Further, display area includes pixel isolation layer 18, and display area can be divided into one by pixel isolation layer 18
The form of an a pixel, organic material layer 19 are formed in each pixel.As a preferred embodiment, insulating layer 13 and pixel
Separation layer 18 is located at same figure layer, and the two can be formed by synchronous in a mask plate patterning processes, and there is no need to be non-
The insulating layer 14 of display area additionally increases the process complexity of OLED device.
As shown in figure 4, in another embodiment, the basis that multiple auxiliary electrodes 16 are separated by cathode insulated column 15
On, also with the tendency of pixel grid 180 be divided into the smaller electrode block of more areas (non-display area does not divide pixel,
It is effectively equivalent to be separated auxiliary electrode with the extended line of pixel grid in display area).By by auxiliary electrode 16
It is divided into the smaller electrode block of more areas, can further ensure that two adjacent cathode lines will not be with the same auxiliary electricity
Pole 16 contacts, to preferably avoid the generation of short circuit.
For above-mentioned OLED device, the embodiment of the invention also provides a kind of production methods of OLED device, in conjunction with figure
Shown in 5a~Fig. 5 f, this method is specifically included:
S1: in conjunction with shown in Fig. 5 a, anode 12 is formed on underlay substrate 11.
One layer of ITO (Indium tin oxide, tin indium oxide) specifically is essentially formed in substrate or other transparent are led
Electric material), for example, by using PVD (Physical Vapor Deposition, physical vapour deposition (PVD)) or CVD (Chemical
Vapor Deposition, chemical vapor deposition) method formed ITO.Then a layer photoresist is coated on ITO, using covering
Diaphragm plate patterning processes, through overexposure, development, etching and etc. form the figure of anode, remaining photoresist is finally removed, aobvious
Show that region and non-display area form anode 12.
S2: in conjunction with shown in Fig. 5 b, on the basis of above step, insulation artwork is formed.
Specifically, forming an insulating materials on the underlay substrate 11 for being formed with anode 12, which inherently may be used
Using light-sensitive material (such as negative photoresist or positive photoresist), therefore directly the insulating materials is exposed, is developed i.e.
Insulation artwork can be formed.
The insulation artwork includes the pixel isolation layer 18 positioned at display area, and non-display area is completely covered
Insulating layer 13.
In display area, display area is divided into pixel one by one by pixel isolation layer, in non-display area, insulating layer
It is completely covered on anode, insulating layer 13 can be made anode 12 and the cathode layer and multiple auxiliary electrode phases that are subsequently formed
Every avoiding anode and cathode layer and multiple auxiliary electrodes that short circuit problem occurs.
S3: in conjunction with shown in Fig. 5 c, on the basis of above step, multiple auxiliary electrodes 16 are formed in non-display area.
Multiple auxiliary electrodes 16 can be set in 13 upper layer of insulating layer, auxiliary electrode 16 can be by silver, copper, gold, aluminium,
The single layer of conductive film or multilayer of the relatively low metal of the resistivity such as chromium, magnesium, molybdenum, platinum, graphene, compound or composition of alloy are led
Electrolemma.And auxiliary electrode exists only in non-display area, in no setting is required for display area auxiliary electrode.The present embodiment is with metal material
It is illustrated for material.
As a preferred embodiment, step S3 is specifically included:
S31: by vapor deposition or magnetron sputtering technique, the metal layer of covering non-display area is formed.
One layer of metal layer can be formed on entire substrate using vapor deposition or magnetron sputtering technique, therefore after this step,
Not only non-display area is covered with metal layer, is again covered with metal layer in display area.
S32: being etched metal layer by mask plate patterning processes, forms multiple auxiliary electrodes 16.
Specifically, coat a layer photoresist on the metal layer, using mask plate, through overexposure, development, etching and etc. shape
At multiple auxiliary electrodes 16, remaining photoresist is finally removed.It, also can will be other than non-display area in etching process therein
Metal layer all etches away.
As another embodiment, above-mentioned step S3 may comprise steps of:
S301: the region other than the non-display area is covered using mask plate.
Underlay substrate is integrally covered using mask plate, only exposes non-display area.And the mask plate is corresponding to non-
Display area also has specific figure, i.e., exposes a part of non-display area with specific image, multiple in order to be formed
Auxiliary electrode.
S302: the figure based on mask plate forms multiple auxiliary in non-display area by vapor deposition or magnetron sputtering technique
Electrode.
Metal layer is formed on substrate using vapor deposition or magnetron sputtering technique.Because region other than non-display area by
Mask plate is completely obscured, so only metal layer can be formed in non-display area.In non-display area, since mask plate is had
Special pattern, therefore be formed by metal layer and do not need to be etched, the figure of auxiliary electrode can be directly obtained.
The shape for the auxiliary electrode 16 that this step S3 is formed can (referring to Fig. 3) identical as the cabling mode of cathode line 17,
It avoids two adjacent cathode lines 17 from contacting with the same auxiliary electrode 16, and the problem of short circuit occurs.
In another embodiment, on the basis of multiple auxiliary electrodes 16 are separated by cathode insulated column 15, also with pixel
The tendency of grid is divided into the smaller electrode block of more areas (referring to Fig. 4), can further ensure that two adjacent cathodes
Line 17 will not be contacted with the same auxiliary electrode 16, to preferably avoid the generation of short circuit.
S4: in conjunction with shown in Fig. 5 d, on the basis of above step, cathode isolation is formed in display area and non-display area
Column 15.
Specifically, an insulating layer is re-formed on underlay substrate, which can also be used light-sensitive material (such as negativity light
Photoresist), directly the insulating layer is exposed, PEB (Post Exposure Bake, postexposure bake), develops and can be formed
The figure of cathode insulated column 15.
In display area and non-display area, cathode insulated column 15 isolates the tendency of cathode line, in order to subsequent yin
The production of polar curve.In non-display area, also auxiliary electrode 16 is isolated for cathode insulated column.
S5: in conjunction with shown in Fig. 5 e, on the basis of above step, organic material layer 19 is formed in display area.
Specifically, evaporation process, which can be used, forms organic material layer 19, practical organic material layer 19 is multilayered structure, wherein
Including hole injection layer, hole transmission layer, electron injecting layer etc..It, can be first with mask plate pair before carrying out evaporation process
Non-display area is covered, and organic material layer 19 is only made in display area, avoids being formed in non-display area organic
The electric conductivity of material layer influence auxiliary electrode 16.
S6: in conjunction with shown in Fig. 5 f, on the basis of above step, cathode layer is formed in display area and non-display area.
Cathode layer is formed in display area and non-display area using evaporation process, the cathode layer by with the cathode of formation every
A plurality of cathode line 17 is divided into from column 15.In non-display area, every cathode line 17 is in parallel at least one auxiliary electrode 16, makes
Each cathode line 17 reduces impedance, then can by controlling the number of auxiliary electrode 16 in parallel with cathode line 17,
So that having the size of bending and the impedance of narrowed cathode line 17 and the impedance for the cathode line for not being bent and being narrowed
Size is identical, so that the brightness of entire plane is more uniform, improves the experience sense of user.
The production method of OLED device provided in this embodiment can with the following steps are included:
S7: drilling in non-display area, forms opening area.
The OLED device can be formed by the components such as opening area installation indicator shaft as watch kind product.It should
OLED device, can also be in the installation of opening area progress corresponding component as the product for needing aperture as other.
In another embodiment of the present invention, a kind of display device is additionally provided, including such as provided by the above embodiment
OLED device.
The technical effect and previous embodiment phase of OLED device provided by the embodiment of the present invention, realization principle and generation
Together, to briefly describe, the present embodiment part does not refer to place, can refer to corresponding contents in previous embodiment.
Display device provided in an embodiment of the present invention, it is special with OLED device provided by the above embodiment technology having the same
Sign, so also can solve identical technical problem, reaches identical technical effect.
Unless specifically stated otherwise, the opposite step of the component and step that otherwise illustrate in these embodiments, digital table
It is not limit the scope of the invention up to formula and numerical value.
In all examples being illustrated and described herein, any occurrence should be construed as merely illustratively, without
It is as limitation, therefore, other examples of exemplary embodiment can have different values.It should also be noted that similar label and
Letter indicates similar terms in following attached drawing, therefore, once it is defined in a certain Xiang Yi attached drawing, then in subsequent attached drawing
In do not need that it is further defined and explained.
In addition, in the description of the embodiment of the present invention unless specifically defined or limited otherwise, term " installation ", " phase
Even ", " connection " shall be understood in a broad sense, for example, it may be being fixedly connected, may be a detachable connection, or be integrally connected；It can
To be mechanical connection, it is also possible to be electrically connected；It can be directly connected, can also can be indirectly connected through an intermediary
Connection inside two elements.For the ordinary skill in the art, above-mentioned term can be understood at this with concrete condition
Concrete meaning in invention.
In the description of the present invention, it should be noted that term " center ", "upper", "lower", "left", "right", "vertical",
The orientation or positional relationship of the instructions such as "horizontal", "inner", "outside" be based on the orientation or positional relationship shown in the drawings, merely to
Convenient for description the present invention and simplify description, rather than the device or element of indication or suggestion meaning must have a particular orientation,
It is constructed and operated in a specific orientation, therefore is not considered as limiting the invention.
Finally, it should be noted that embodiment described above, only a specific embodiment of the invention, to illustrate the present invention
Technical solution, rather than its limitations, scope of protection of the present invention is not limited thereto, although with reference to the foregoing embodiments to this hair
It is bright to be described in detail, those skilled in the art should understand that: anyone skilled in the art
In the technical scope disclosed by the present invention, it can still modify to technical solution documented by previous embodiment or can be light
It is readily conceivable that variation or equivalent replacement of some of the technical features；And these modifications, variation or replacement, do not make
The essence of corresponding technical solution is detached from the spirit and scope of technical solution of the embodiment of the present invention, should all cover in protection of the invention
Within the scope of.Therefore, the protection scope of the present invention shall be subject to the protection scope of the claims.
Claims (11)
1. a kind of OLED device, which is characterized in that the OLED device includes display area, and is located in the display area
Non-display area；
In the non-display area, including the anode being set on underlay substrate；Insulating layer is covered on the anode；It is described exhausted
Cathode layer, cathode insulated column and multiple auxiliary electrodes are provided in edge layer, the cathode layer is divided by the cathode insulated column
A plurality of cathode line, every cathode line are in parallel with auxiliary electrode described at least one.
2. OLED device according to claim 1, which is characterized in that the auxiliary electrode is set to the cathode layer and institute
It states between insulating layer.
3. OLED device according to claim 2, which is characterized in that the multiple auxiliary electrode is by the cathode insulated column
Separate.
4. OLED device according to claim 1, which is characterized in that the display area includes pixel isolation layer, described
Insulating layer and the pixel isolation layer are located at same figure layer.
5. OLED device according to claim 1, which is characterized in that the material of the auxiliary electrode is metal.
6. OLED device according to claim 1, which is characterized in that include opening area in the non-display area.
7. a kind of production method of OLED device, which is characterized in that the OLED device includes display area, and is located at described
Non-display area in display area, which comprises
Anode is formed on underlay substrate；
On the basis of above step, insulation artwork is formed；The insulation artwork includes being located at the display area
Pixel isolation layer, and the insulating layer of the non-display area is completely covered；
On the basis of above step, multiple auxiliary electrodes are formed in the non-display area；
On the basis of above step, cathode insulated column is formed in the display area and the non-display area；
On the basis of above step, organic material layer is formed in the display area；
On the basis of above step, cathode layer is formed in the display area and the non-display area；
Wherein, the cathode layer is divided into a plurality of cathode line by the cathode insulated column, positioned at every of the non-display area
The cathode line is in parallel with auxiliary electrode described at least one.
8. the production method of OLED device according to claim 7, which is characterized in that described in the non-display area shape
At multiple auxiliary electrodes, comprising:
By vapor deposition or magnetron sputtering technique, the metal layer for covering the non-display area is formed；
The metal layer is etched by mask plate patterning processes, forms multiple auxiliary electrodes.
9. the production method of OLED device according to claim 7, which is characterized in that described in the non-display area shape
At multiple auxiliary electrodes, comprising:
The region other than the non-display area is covered using mask plate；
Multiple auxiliary are formed in the non-display area by vapor deposition or magnetron sputtering technique based on the figure of the mask plate
Electrode.
10. the production method of OLED device according to claim 7, which is characterized in that further include:
It drills in the non-display area, forms opening area.
11. a kind of display device, which is characterized in that including OLED device such as claimed in any one of claims 1 to 6.
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| CN201811214254.8A CN109244271B (en) | 2018-10-17 | 2018-10-17 | OLED device, manufacturing method thereof and display device |
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| CN201811214254.8A CN109244271B (en) | 2018-10-17 | 2018-10-17 | OLED device, manufacturing method thereof and display device |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111739428A (en) * | 2020-07-23 | 2020-10-02 | 维沃移动通信有限公司 | Display module and display device |
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| CN111739428B (en) * | 2020-07-23 | 2022-04-22 | 维沃移动通信有限公司 | Display module and display device |
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| CN109244271B (en) | 2020-06-02 |
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