CN109239842A - A kind of holographical wave guide eyeglass and preparation method thereof and three-dimensional display apparatus - Google Patents
A kind of holographical wave guide eyeglass and preparation method thereof and three-dimensional display apparatus Download PDFInfo
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Classifications
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- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
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- G02B6/34—Optical coupling means utilising prism or grating
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- G—PHYSICS
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- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0081—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means for altering, e.g. enlarging, the entrance or exit pupil
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- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
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- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
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- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/12007—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer
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- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
- G02B6/124—Geodesic lenses or integrated gratings
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- G02B6/28—Optical coupling means having data bus means, i.e. plural waveguides interconnected and providing an inherently bidirectional system by mixing and splitting signals
- G02B6/2804—Optical coupling means having data bus means, i.e. plural waveguides interconnected and providing an inherently bidirectional system by mixing and splitting signals forming multipart couplers without wavelength selective elements, e.g. "T" couplers, star couplers
- G02B6/2848—Optical coupling means having data bus means, i.e. plural waveguides interconnected and providing an inherently bidirectional system by mixing and splitting signals forming multipart couplers without wavelength selective elements, e.g. "T" couplers, star couplers having refractive means, e.g. imaging elements between light guides as splitting, branching and/or combining devices, e.g. lenses, holograms
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- G02B6/29304—Optical coupling means having data bus means, i.e. plural waveguides interconnected and providing an inherently bidirectional system by mixing and splitting signals with wavelength selective means operating by diffraction, e.g. grating
- G02B6/29316—Light guides comprising a diffractive element, e.g. grating in or on the light guide such that diffracted light is confined in the light guide
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- G02B6/28—Optical coupling means having data bus means, i.e. plural waveguides interconnected and providing an inherently bidirectional system by mixing and splitting signals
- G02B6/293—Optical coupling means having data bus means, i.e. plural waveguides interconnected and providing an inherently bidirectional system by mixing and splitting signals with wavelength selective means
- G02B6/29304—Optical coupling means having data bus means, i.e. plural waveguides interconnected and providing an inherently bidirectional system by mixing and splitting signals with wavelength selective means operating by diffraction, e.g. grating
- G02B6/29316—Light guides comprising a diffractive element, e.g. grating in or on the light guide such that diffracted light is confined in the light guide
- G02B6/29325—Light guides comprising a diffractive element, e.g. grating in or on the light guide such that diffracted light is confined in the light guide of the slab or planar or plate like form, i.e. confinement in a single transverse dimension only
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- G02B6/29379—Optical coupling means having data bus means, i.e. plural waveguides interconnected and providing an inherently bidirectional system by mixing and splitting signals with wavelength selective means characterised by the function or use of the complete device
- G02B6/2938—Optical coupling means having data bus means, i.e. plural waveguides interconnected and providing an inherently bidirectional system by mixing and splitting signals with wavelength selective means characterised by the function or use of the complete device for multiplexing or demultiplexing, i.e. combining or separating wavelengths, e.g. 1xN, NxM
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- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/0005—Adaptation of holography to specific applications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/22—Processes or apparatus for obtaining an optical image from holograms
Abstract
The invention discloses a kind of holographical wave guide eyeglass and preparation method thereof and using the three-dimensional display apparatus of the eyeglass, which includes a piece of, two panels, three pieces or the above holographical wave guide lens unit of three pieces；Holographical wave guide lens unit is set there are three functional region, is equipped with a nanometer diffraction grating in functional region；Respectively for inputting the outgoing functional region for being coupled into functional region, the relay functionality region for the diffusion of X-direction image and the diffusion of Y-direction image and output of optical coupling.The setting of functional region, can greatly reduce the volume of components three-dimensional display device, and the realization colour that can be convenient shows and expand field angle, at low cost, quality stability is good using nanometer diffraction grating, be suitable for industrialized production.
Description
Technical field
The present invention relates to display equipment technical fields, more specifically to a kind of holographical wave guide eyeglass and its preparation side
Method and three-dimensional display apparatus.
Background technique
Augmented reality (AR) technology, by what is be not present in computer graphics techniques and visualization technique generation physical world
Virtual objects, and its accurate " placement " is presented to the user the richer new environment of perceived effect in physical world.?
Numerous areas, such as industry manufacture and maintenance field, medical field, military field, amusement game field, education sector etc., have
Huge potential using value.In AR industrial chain, while having transparent effect and imaging/light guide effect eyeglass is AR hard
The most critical component that part is carried out.Domestic and international industry or scientific research circle have developed a series of AR eyeglass schemes:
Side image is directly shipped in single human eye by google glass using single reflecting prism, and implementation is simple, still
There is the shortcomings that feeling of fatigue is strong, field angle is small, is imaged without 3D.Meta2 is that vertical shaft is anti-using silver coated half-reflection and half-transmission mask
Image-forming component is penetrated, two images are projected in people or so two, it is big (90 degree) to have the advantages that field angle, but volume is excessively
Huge, in addition without expanding pupil effect, observation comfort level is poor.6,169,613 B1 of United States Patent (USP) US passes through body grating or compound
Image is imported into optical waveguide by body grating, and image is propagated in the waveguide, will be schemed in output end by one or two body gratings
As output, there is coupling and high-efficient, but volume holographic waveguide scheme does not expand pupil effect, in addition can not in high volume answer
System, cost of manufacture are higher.7,751,122 B2 of United States Patent (USP) US discloses a kind of waveguide AR embedded with multiple half-reflection and half-transmission prisms
Lens device, image often encounter a half-reflecting half mirror in propagating in waveguide eyeglass, and image will be coupled out one
Point, by modulating the reflectivity of different location half-reflecting half mirror, so that exit image even intensity in entire range of observation.It should
Waveguide AR eyeglass, which has, expands pupil effect, but depends on traditional optical processing and fabricating, there's almost no high-volume duplication life
A possibility that production, volume production possibility are extremely low.United States Patent (USP) US 2016/0231568 A1, US2016/0231569A1 disclose one
Kind is used for the grating waveguide eyeglass of AR device, and image is coupled into and is exported using specific grating, which has good
Optical vertical penetrability, will not influence wearer observe ambient enviroment, using two panels region grating respectively to image carry out the side X
Expanding pupil to Y-direction, observation comfort level greatly improves, and in addition Surface gratings can be replicated by nano impression processing procedure, because
This is with scale of mass production potentiality.But in Microsoft's holography eyeglass, in order to enable exit image intensity in entire range of observation
Uniformly, the diffraction efficiency of grating of the second functional area and third functional area is needed to be modulated according to space, in routine
Interfere in exposure technique, such preparing grating method yield is very low.In addition, in order to meet phase-matching condition, three regions
Grating slot orientation and screen periods required precision it is high, very big difficulty is brought to conventional interference exposure technique.More than
The production cost that two problems result in Microsoft's holography eyeglass is high, it is difficult to push the development of entire AR product.
Summary of the invention
It yet there are no a simple and easy waveguide eyeglass scheme both at home and abroad, augmented reality display performance (visual field can be taken into account
Angle, range of observation) and the cheap of eyeglass, lightweight and stability.
In order to achieve the above objectives, technical scheme is as follows:
A kind of holographical wave guide eyeglass, including a piece of, two panels, three pieces or the above holographical wave guide lens unit of three pieces；Holographic wave
Lead lens unit be equipped with include at least be coupled into functional region and outgoing two functional regions of functional region, the functionality
A nanometer diffraction grating is equipped in region；It is coupled into functional region for image light signals to be coupled into waveguide lens unit, out
It penetrates functional region and carries out the diffusion of Y-direction image and output for the image light come will to be conducted through in waveguide lens unit.
The waveguide lens unit is additionally provided with the relay functionality region for the diffusion of X-direction image.
The holographical wave guide lens unit includes optical waveguide substrates, and the functional region is set in optical waveguide substrates.
The holographical wave guide lens unit further includes functional film, and the functional region is set on functional film,
The functional film is set in polymer substrate.
The profiled envelope line for being coupled into functional region is the multi-section-line of closed curve or closure, in the multi-section-line of closure
Include one or both of straightway and curved section.
Preferably, the area for being coupled into functional region is in 0.1cm2To 0.4cm2Between.
Preferably, the functional region grating that is coupled into is made of many a random gratings, and the size of random grating is micro- 5
Rice is between 500 microns.
Above-mentioned holographical wave guide eyeglass includes the holographical wave guide lens unit corresponding to different base colors, each holographical wave guide mirror
Blade unit regulates and controls corresponding primary colours.
Nanometer diffraction grating at least one above-mentioned functional region is made of multiple random gratings.
Preferably, the horizontal spacing between the laterally adjacent random grating is the integral multiple of screen periods.
Preferably, the grating slot in random grating be sequentially aligned one by one with the grating slot in longitudinally adjacent random grating or
Incorrect order alignment.
Preferably, the screen periods of random grating are between 200nm to 600nm, and size is between 5 microns to 500 microns.
Preferably, the grating depth of same pixel is consistent in relay functionality region, the depth of different pixels grating
It is gradually reduced with X-direction；The grating depth of same pixel is consistent in the outgoing functional region, different pixels grating
Depth be gradually reduced with Y direction.
Preferably, the grating vector for being coupled into functional region is parallel with X-direction, the grating in the relay functionality region
Vector sum X-direction is at angle β, and the grating vector and X-direction of the outgoing functional region are at 2 angles β.
Preferably, with being coupled into functional region grating on a piece of holographical wave guide lens unit, the period of random grating
Unanimously, orientation is consistent.
For the red red holographical wave guide lens unit of regulation, the period for being coupled into functional region random grating exists
Between 415nm to 550nm；
For the green holographical wave guide lens unit of regulation green, the period for being coupled into functional region random grating exists
Between 350nm to 480nm；
For the blue holographical wave guide lens unit of regulation blue, the period for being coupled into functional region random grating exists
Between 290nm to 410nm.
The above-mentioned angle β is between 40 degree to 50 degree.
The above-mentioned grating inclination alpha for being coupled into functional region between 15 degree to 45 degree, grating duty ratio 0.4 to 0.6 it
Between.
The grating groove profile for being preferably coupled into functional region is the straight strip in left side or right side oblique triangle.
The grating groove profile for being coupled into functional region is arbitrarily to have asymmetric inclined groove profile.
It is positive grating after the nanometer diffraction grating of functional region and outgoing functional region among the above, the grating inclination angle
It is 0 degree, the groove profile of the nanometer diffraction grating is symmetrical along surface normal.
The functional region random grating depth that is coupled into of same holographical wave guide lens unit is kept constant.
Above-mentioned random grating depth h is between 100nm to 400nm.
The grating depth that the nanometer diffraction grating of functional region is coupled on same holographical wave guide lens unit is consistent.
A kind of production method of holographical wave guide eyeglass, which is characterized in that comprise the steps of:
S1: parameter calculates, the light and AR light path imaging field angle of the wavelength regulated and controled as needed, and determination is coupled into functional area
Domain, period of nanometer diffraction grating in outgoing functional region, orientation, the waveguide ginseng of depth distribution and holographical wave guide eyeglass
Number；Functional region will be coupled into, the nanometer diffraction grating in outgoing functional region is resolved into and is arranged together one by one
Random grating；
S2: template preparation is exposed photoresist using photoetching technique；
S3: coating functions film by nanometer embossing will be coupled into functional area on a polymeric substrate first
Domain, outgoing functional region are fabricated on functional film.
It further include relay functionality region in step S1 and S3.
Horizontal spacing in step S1 between the laterally adjacent random grating is the integral multiple of screen periods.
Grating slot in grating slot in random grating described in step S1 and longitudinally adjacent random grating is sequentially one by one
Alignment or incorrect order alignment.
Photoetching technique described in step S2 is dot matrix holographic lithography.
Step S2 are as follows: the spin coating photoresist on substrate carries out photoetching with interference light 1 and 2 double light of interference light.
In step S2, the corresponding template being coupled into functional region the preparation method is as follows:
It is coupled into the preparation of the template in functional region, a photomask board is covered on the substrate for being coated with photoresist,
Only it is coupled into the light transmission of functional region position, it is ipsilateral that interference light 1 and interference light 2 are located at quartz substrate normal, wherein 1 He of interference light
Normal angle α1For be coupled into functional region nanometer diffraction grating inclination angle, 2 angle αs of interference light 1 and interference light1-α2It determines
Period of nanometer diffraction grating.
In step S2, corresponding relay functionality region, the preparation method difference for the template being emitted in functional region are as follows:
The preparation of template in relay functionality region covers a photomask on the quartz substrate for being coated with photoresist
Version, only relay functionality regional location light transmission, the transmitance of transmission region linearly increase from left to right, corresponding grating depth line
Property variation, interference light 1 and interference light 2 are symmetrical with quartz substrate normal, photoresist is exposed using dot matrix holographic technique, do
2 θ of angle for relating to light 1 and interference light 2 determines screen periods；
It is emitted the preparation of the template in functional region, a photomask is covered on the quartz substrate for being coated with photoresist
Version, only outgoing functional region position light transmission, the transmitance of transmission region linearly increase from top to down, corresponding grating depth line
Property variation, interference light 1 and interference light 2 are symmetrical with quartz substrate normal, photoresist is exposed using dot matrix holographic technique, do
2 θ of angle for relating to light 1 and interference light 2 determines screen periods.
In the above-mentioned preparation for being coupled into functional region inner template, nanometer diffraction grating depth passes through photoresist thickness, exposure
Amount and photographic parameter co- controlling；After development, oblique raster is formed in the photoresist, and depth is higher than final grating design value.
By soaking silver reaction, one layer of silverskin is formed on the photoresist grating surface, is then placed in electroforming tank and grows, most
End form at pattern complementary in surfacial pattern and photoresist nickel template；Then it separates, photoresist is removed, obtain with complementation map
The nickel template of shape.
Among the above after in the preparation of the nanometer diffraction grating template in functional region, outgoing functional region, according to receiving
Rice diffraction grating depth distribution design, controls the light exposure of each random grating, to regulate and control grating in post-develop photoresist
Depth distribution controls the screen periods in random grating by regulating and controlling the angle of interference light 1 and interference light 2.
By soaking silver reaction, one layer of silverskin is formed on the photoresist grating surface, is then placed in electroforming tank and grows, most
End form at pattern complementary in surfacial pattern and photoresist nickel template；Then it separates, photoresist is removed, obtain with complementation map
The nickel template of shape.
After the completion of the preparation of nickel template, in the S3 step, using corresponding nickel template by nanometer embossing, respectively to coupling
Enter functional region, relay functionality region, outgoing functional region in nanometer diffraction grating carry out duplication production.
Preferably, nanometer embossing is ultraviolet nanometer technology, the drop coating uv-curable glue in optical waveguide substrates, by nickel template
Pressure is bonded and applied with optical waveguide substrates, and uv-exposure simultaneously demoulds.
The present invention also provides a kind of three-dimensional display apparatus, including aforementioned any holographical wave guide eyeglass or aforementioned
The holographical wave guide eyeglass of one method preparation.
Detailed description of the invention
It in order to more clearly illustrate the technical solutions in the embodiments of the present invention, below will be in embodiment technical description
Required attached drawing is briefly described, it should be apparent that, the accompanying drawings in the following description is only some realities of the invention
Example is applied, it for those of ordinary skill in the art, without creative efforts, can also be according to these attached drawings
Obtain other attached drawings.
Fig. 1 shows that holographical wave guide eyeglass of the invention uses the schematic diagram of three pieces holographical wave guide lens unit superposition；
Fig. 2 a is distribution schematic diagram of the functional region on holographical wave guide lens unit；
Fig. 2 b is the nanometer diffraction grating schematic diagram for being coupled into functional region；
Fig. 2 c-f is the structural schematic diagram for being coupled into the nanometer diffraction grating of functional region；
Fig. 2 g-h is the period for being coupled into the nanometer diffraction grating of functional region, width, high-level schematic；
Fig. 3 a-b is the nanometer diffraction grating schematic diagram for being emitted functional region and relay functionality region respectively；
Fig. 3 c-f is the structural schematic diagram for relaying, being emitted the nanometer diffraction grating of functional region；
Fig. 3 g-h is relaying, the period of the nanometer diffraction grating of outgoing functional region, width, high-level schematic；
Fig. 4 show relaying, is emitted functional region different pixels grating depth with the variation schematic diagram in space；
Fig. 5 is the schematic diagram be coupled into, relay, being emitted grating orientation and correlation in functional region；
Fig. 6 be image light be coupled into, waveguide, the schematic diagram propagated in relay functionality region；
Fig. 7 is the schematic diagram that image light is propagated in waveguide and outgoing functional region；
Fig. 8 is the image-forming principle schematic diagram constructed after three-dimensional display apparatus；
Fig. 9 a-f show the schematic diagram that functional region processing nanometer diffraction grating is coupled on holographical wave guide lens unit；
Figure 10 a-f, which is shown, to be relayed on holographical wave guide lens unit, is emitted functional region processing nanometer diffraction grating
Schematic diagram；
Figure 11 is two functional region holographical wave guide lens unit structural schematic diagrams.
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation description, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, it is obtained by those of ordinary skill in the art without making creative efforts every other
Embodiment shall fall within the protection scope of the present invention.
A kind of holographical wave guide eyeglass, including a piece of, two panels, three pieces or the above holographical wave guide lens unit of three pieces；Holographic wave
It leads lens unit to set there are three functional region, is equipped with a nanometer diffraction grating in functional region；Respectively it is used for input light
Coupling is coupled into functional region, the relay functionality region for the diffusion of X-direction image and the diffusion of Y-direction image and output
Outgoing functional region.
The setting of functional region, the realization that the volume of components three-dimensional display device can be greatly reduced, and can be convenient
Colour display and expand field angle, it is at low cost, quality stability is good using nanometer diffraction grating, it is suitable for industrialized production.
As shown in Figure 1, for constructing 3 multi-primary color three-dimensional display apparatus, a kind of holographical wave guide eyeglass, by respectively corresponding
The holographical wave guide lens unit for regulating and controlling red-green-blue, which is superimposed, to be constituted, and in a particular embodiment, can use register guide
Note blue, green, red three pieces holographical wave guide lens unit 001,002,003 is stacked, from top to bottom, can be respectively indigo plant,
Green, red holographical wave guide lens unit 001,002,003 (i.e. blue holographical wave guide lens unit, green holographical wave guide lens unit,
Red holographical wave guide lens unit), the distance between holographical wave guide lens unit 001,002,003 can choose as 0.1mm,
It can be set as needed as other spacing, pass through frame sealing between blue, green, red holographical wave guide lens unit 001,002,003
Glued together, the distance between blue, green, red holographical wave guide lens unit 001,002,003 is carried out by the thickness of frame sealing
Control.Image light from top blue holographical wave guide lens unit 001 (corresponding to the holographical wave guide lens unit of blue light, below
Green len, red eyeglass respectively refer to the holographical wave guide lens unit corresponding to green light and red light) be coupled into functionality
Region imports, and the light of blue wave band is coupled into first holographical wave guide lens unit, due to the wavelength selectivity of grating,
The light of its wavelength is very low in the diffraction efficiency for being coupled into functional region of blue eyeglass, concentrates on 0 grade of light, and continuation is propagated down.
The functional area that is coupled into of green holographical wave guide lens unit 002 is got to, the light of similar green band is coupled into complete to second
It ceases in waveguide lens unit, the light of remaining red band continues to propagate downwards, finally by red holographical wave guide lens unit 003
Functional area is coupled into be coupled into third piece holographical wave guide lens unit.In order to reduce light in the reflectivity at different interfaces, thus
The efficiency of light energy utilization is improved, it is holographic in blue holographical wave guide lens unit 001 and green holographical wave guide lens unit 002 and green
Waveguide lens unit 002 is coupled into functional zone position with red holographical wave guide lens unit 003, increases an antireflection layer, increases
Permeable layers can still choose epithio material or other materials met the requirements, and thickness can choose as 100 microns or other numerical value,
It needs to carry out plated film on film, to reach antireflective effect.Blue, green, red three pieces holographical wave guide lens unit is stacked on one
After rising, so that it may it is placed in imaging optical path, it is final to realize colored augmented reality three-dimensional display apparatus.
Preferably, the profiled envelope line for being coupled into functional region is the multi-section-line of closed curve or closure, the multistage of closure
It include one or both of straightway and curved section in line.Square, circle are preferably taken, it is especially square.Area can
In 0.1cm2To 0.4cm2Between select, size is consistent with imaging system emergent pupil size.As shown in Figure 2 a and 2 b, wherein being coupled into
Functional region 201 uses circular schematic diagram, and Fig. 2 a is shown in a kind of embodiment, is coupled into functional region 201 in
After functional region, the respective shape of outgoing functional region and mutual alignment relation, Fig. 2 b, which is shown, is coupled into functional region
A kind of arrangement of middle nanometer diffraction grating is illustrated.In this example, it is round to be coupled into the use of functional region 201, and relay function
Property region 202 using the shape of an approximate inverse isosceles trapezoid, trapezoidal short side does not use straight line, but uses and be coupled into
The concentric circular segment of functional region, the distance between two-end-point are equal to or are approximately equal to be coupled into functional region 201
Round diameter, the central axes of isosceles trapezoid pass through and are coupled into the circular center of circle of functional region 201；Therefore it is coupled into functional area
The central axes in domain 201 and relay functionality region 202 are to arrange along X-axis (see Fig. 2 a), and being emitted functional region 203 is square
Shape, the midpoint line of long side pass through the midpoint of the central axes of 202 isosceles trapezoid of relay functionality region, and normal thereto,
In, the central axes midpoint of isosceles trapezoid is in the midpoint and bottom edge (long side) midpoint line of the circular arc endpoint line of isosceles trapezoid
Point, the i.e. axis parallel of the long side and isosceles trapezoid of outgoing functional region 203, and it is at or about relay functionality area
The circular arc endpoint in domain 202 and the length of perpendicular on isosceles trapezoid bottom edge, the preferably equal to or greater than circular arc in relay functionality region 202
The length of perpendicular of endpoint and isosceles trapezoid bottom edge.
Preferably, functional region area is coupled between 0.1cm2 to 0.4cm2.
In the prior art, the nanometer diffraction grating in functional region is single grating, is wanted to production overall precision
It asks high, causes yields very low, so that production cost is high, seriously affected technological industrialization application.For this purpose, this
The it is proposed of innovation and creation, the nanometer diffraction grating at least one functional region are made of multiple random gratings.
Nanometer diffraction grating in above-mentioned functional region is composed using random grating, in this way, single pixel grating
Parameter, such as period, orientation, depth, duty ratio can be controlled separately, substantially increase the yields of production in this way, effectively drop
Low cost is conducive to industrialization.In addition, three grating functional areas are in identical platform one-pass molding, therefore different zones alignment essence
Degree is high.Based on two above advantage, the yields of pixelation holographical wave guide eyeglass can be improved, in light-emitting uniformity and reduction
In terms of dispersion is imaged, also has biggish performance and improve.
In practical applications, the period of above-mentioned random grating can select between 200nm to 600nm, and size is at 5 microns
To between 500 microns, shape can be rectangular, diamond shape, triangle etc..In different pixels grating, the parameter of grating, such as grating
Period, grating orientation, raster size, raster shape, duty ratio, depth can change, therefore the realization output light that can be convenient
The functions such as strong uniform, focusing, more image planes.
Random grating can be made by extreme ultraviolet photolithographic, electron beam lithography and dot matrix holographic lithography, preferred to use
The production of frequency conversion dot matrix holographic lithography.Main process includes photoetching, pattern transfer, nano impression duplication.
Preferably, the horizontal spacing between laterally adjacent random grating is the integral multiple of screen periods, in random grating
Grating slot is sequentially aligned one by one with the grating slot in longitudinally adjacent random grating or incorrect order is aligned.It is to guarantee phase in this way
Unanimously, the diffraction light that other levels will not be caused, if there is other diffraction times can then cause ghost problems.
In practical applications, the required precision of the grating slot alignment in preferably neighbouring (longitudinally adjacent) random grating
Error is not more than 20nm.
In practical applications, it is coupled into grating and is typically chosen and worked by transmissive diffraction, relay grating/output grating
It is worked by transmissive diffraction or reflective diffraction.
On the make when the random grating of region and exit area, make diffraction efficiency of grating with spatial variations, so as to
To obtain in entire range of observation, image intensity is uniform, and diffraction efficiency of grating can depth, duty ratio by random grating
Regulated and controled.The production progress for controlling single random grating is very convenient, and the entire functional region of tradition is by single whole
Nanometer diffraction grating constitute, it is difficult to ensure that precision and yields.
For example, the nanometer diffraction grating being coupled into functional region is made of multiple random gratings, each random grating
Size can select between 5 microns to 500 microns, and being spaced between 0 to 10 microns between random grating selects.Fig. 2 b is aobvious
Show that this more random gratings are combined into the schematic diagram for being coupled into functional region.
In some embodiments, with the period for being coupled into functional region random grating on a piece of holographical wave guide lens unit
Unanimously, orientation is consistent.It, can be with identical angle of diffraction coupling when being incident on coupling grating region because constituting the light of image
It is incorporated into and is mapped in waveguide, meet total reflection condition propagation, in output, light is emitted with the angle for being parallel to incident ray,
Image can completely be shown.It is coupled into screen periods and field angle and lambda1-wavelength needs to meet Λ 1=λ/(1+sin FOV/
2)。
Preferably, with the grating depth for the nanometer diffraction grating for being coupled into functional region on a piece of holographical wave guide lens unit
It is consistent.
Preferably, as shown in Fig. 2 c, Fig. 2 e and Fig. 2 g, the nanometer diffraction grating for being coupled into functional region can choose use
Skew ray grid, grating inclination alpha is between 15 degree to 45 degree, and grating duty ratio is between 0.4 to 0.6.As shown in Fig. 2 c and Fig. 2 e,
The groove profile for being coupled into the nanometer diffraction grating of functional region is that left side is inclined straight strip.
Also it can according to need, using right side oblique triangle, as shown in Fig. 2 d and Fig. 2 f；Or it is any asymmetric inclined
Groove profile.
Preferably, the grating depth h of the nanometer diffraction grating of functional region is coupled between 100nm to 400nm.
Incline grating inclination alpha, the grating of straight strip nanometer diffraction grating and right side oblique triangle nanometer diffraction grating in left side
Depth h and grating period A, raster width W schematic diagram respectively as shown in Fig. 2 g and Fig. 2 h.And W/ Λ is grating duty ratio.For
Guarantee to be coupled into level efficiency higher than 50%, between 15 degree to 45 degree, grating duty ratio arrives preferred grating inclination alpha 0.4
Between 0.6, grating depth h is between 100nm to 400nm.
When preparing the holographical wave guide eyeglass for constructing color three dimension display device, it is with red-green-blue system
Example, it is preferred that holographical wave guide eyeglass includes respectively for the holographical wave guide lens unit of regulation different base colors, including red holography
Waveguide lens unit, green holographical wave guide lens unit and blue holographical wave guide lens unit；Red holographical wave guide lens unit
The period for being coupled into functional region random grating between 415nm to 550nm；Green holographical wave guide lens unit is coupled into function
The period of energy property area pixel grating is between 350nm to 480nm；Blue holographical wave guide lens unit is coupled into functional region
The period of random grating is between 290nm to 410nm.
Above-mentioned cycle value is related with the field angle and incident wavelength of the three-dimensional display apparatus of building.
Preferably, the nanometer diffraction grating in relay functionality region and outgoing functional region constitutes multiple pixel lights
Grid, the size of random grating is between 5 microns to 500 microns, being spaced between 0 micron to 10 microns between random grating.
The shape of random grating can be positive direction, diamond shape or the high figure of other duty ratios.
Preferably, with the picture in the relay functionality region and outgoing functional region on a piece of holographical wave guide lens unit
Plain grating orientation is consistent.
Preferably, the holographical wave guide lens unit includes optical waveguide substrates, and the functional region is set in optical waveguide substrates；
Or, the holographical wave guide lens unit further includes functional film, the functional region is set on functional film, the function
Energy property film is set in polymer substrate；
The bottom of the nanometer diffraction grating is greater than 0 to the distance between optical waveguide substrates surface.
As shown in 2a-h, α is grating inclination angle, and W/ Λ is grating duty ratio.Optical waveguide substrates material is in visible light wave range 400nm
There is good transmitance to 700nm, preferably 96% or more, refractive index is between 1.6 to 2.4, lens index and imaging
System field angle FOV needs to meet n1The relationship of >=1+2sinFOV/2, it is therefore desirable to and the field angle of imaging system carries out unification
Design.Grating is that optical transmittance is good inorganic or organic material, and refractive index is between 1.6 to 2.4, in order to reduce interface
Incidence loss, preferred grating material refractive index are consistent with eyeglass waveguide index.Grating groove and optical waveguide substrates upper surface
For distance between -0.5 micron to 100 microns, negative value indicates that nanometer diffraction grating is directly prepared in optical waveguide substrates 2, positive value table
Show that a nanometer diffraction grating is prepared on other layer of material.Optical waveguide substrates thickness T and imaging system emergent pupil width W meet W=
2tan β T, wherein β is the maximum angle of total reflection, so that can watch whole image, T mono- in any position of output area
As numerical value between 0.5mm to 2mm.
It can not need to be regulated and controled with space due to being coupled into 201 grating depth of functional region, so being coupled into functionality
A single grating can also be used in 201 grating of region, is not that random grating is spliced, screen periods, depth, inclination angle, duty ratio
Etc. parameters and above-mentioned identical.
Preferably, the random grating period in the relay functionality region of red holographical wave guide lens unit arrives in 295nm
Between 390nm, it is identical that the random grating period and distribution for being emitted functional region with it are coupled into functional region；
The random grating period in the relay functionality region of green holographical wave guide lens unit between 250nm to 335nm,
It is identical that the random grating period and distribution for being emitted functional region with it are coupled into functional region；
The random grating period in the relay functionality region of blue holographical wave guide lens unit between 200nm to 290nm,
It is identical that the random grating period and distribution for being emitted functional region with it are coupled into functional region.
Fig. 3 a-h is the structural schematic diagram of relaying, outgoing functional region grating, and the functional area of outgoing is illustrated in Fig. 3 a
In domain nanometer diffraction grating by multiple square pixel grating alignments at schematic diagram, Fig. 3 b illustrates in relay functionality region
Nanometer diffraction grating schematic diagram as made of multiple diamond pixels grating alignments.Relay functionality region and outgoing functional region
Nanometer diffraction grating groove profile can diversification, rectangle groove profile and sinusoidal and channeled is only shown in Fig. 3 c-f.
Preferably, the grating duty ratio of the nanometer diffraction grating of relay functionality region and outgoing functional region is 0.3
To between 0.7.
In practical applications, the nanometer diffraction grating of three functional regions is orientated, is coupled into functional region
Grating vector is parallel with the direction x, and the grating vector and the direction x in relay functionality region are at angle β, is emitted in functional region
Grating vector and the direction x are at 2 angles β.In view of each functional region diffraction efficiency and diffraction time, preferred β is at 40 degree to 50
Between degree.
As shown in figure 4, in order to adjust the brightness uniformity of coupling exit image, relay functionality region and the functional area of outgoing
The depth h of the different pixels grating in domain changes with spatial variations, the depth h of the different pixels grating in relay functionality region with
X-direction variation；The depth h of the different pixels grating of functional region is emitted with y direction change.In practical applications, image needs
It repeatedly to be acted on output grating, correspondingly, output has certain loss to incident image energy every time, in order to enable defeated
Image is uniform in entire range of observation out, and output diffraction efficiency of grating needs are regulated and controled according to space.In same pixel, light
The depth of grid is kept constant, and random grating depth reduces with the direction x in relay functionality region, is emitted pixel in functional region
Grating depth reduces with the direction y.The diffraction efficiency of grating of jth time total reflection output needs to meet ηj=η1/(1-(j-1)η1),
Middle η1To be totally reflected position grating diffration efficiency for the first time, it is emitted diffraction efficiency for the first time1=1/N, wherein N is total is all-trans
Penetrate number.Diffraction efficiency can be regulated and controled by grating duty ratio, grating groove profile and grating depth.Fig. 4, which is shown, passes through light
Grid change in depth regulates and controls diffraction efficiency, and since random grating size is smaller, grating depth can be very with the variation in space
Smoothly, to obtain the image output effect of uniform light intensity.For intensity of the smoothed image in output area, grating depth with
The variation in space can be linear, be also possible to the curve that the increased curve of slope or slope become smaller, with whole face image light
Strong is uniformly standard.
Optical waveguide substrates 2 are that optical transmittance is good inorganic or organic material, and refractive index is between 1.6 to 2, preferably
Between 1.7 to 1.9.Material for processing nanometer diffraction grating is that optical transmittance is good inorganic or organic material,
Refractive index is between 1.6 to 2, preferably between 1.7 to 1.9.Optical waveguide substrates refractive index and the refraction of nanometer diffraction grating material
Rate can be inconsistent, and the distance of nanometer diffraction grating groove and optical waveguide substrates upper surface is born between -0.5 micron to 100 microns
Value indicates that nanometer diffraction grating can be processed directly in optical waveguide substrates, and positive value indicates that nanometer diffraction grating is machined in other light
On grid material (such as functional film or material, and be superimposed with optical waveguide substrates).
In practical applications, different pixels grating depth shown in Fig. 4 with space variation, it is same in relay functionality region
The grating depth of one pixel is consistent, and the depth of different pixels grating is gradually reduced with X-direction；It is emitted in functional region
The grating depth of same pixel is consistent, and the depth of different pixels grating is gradually reduced with Y direction.
Since random grating size is smaller (size of general random grating is between 5 microns to 100 microns), grating depth
Can be very smooth with the variation in space, to obtain the image output effect of uniform light intensity easily.Grating depth with space change
Change can be linear, is also possible to the curve that the increased curve of slope or slope become smaller, is uniformly with whole face image intensity
Standard.
In some embodiments, as shown in figure 5, being coupled into functional region 201 using square, relay functionality region
202 using isosceles trapezoid is inverted, and short side is equal or approximately equal to the side length of square, and outgoing functional region 203 uses square
Shape, long side are equal or approximately equal to the height of isosceles trapezoid, between three to be arranged in previous embodiment identical.It is coupled into functionality
Region 201, relay functionality region 202 and be emitted 203 nanometers of diffraction grating of functional region grating orientation can according to
Lower principle selection, the grating vector for being coupled into functional region 201 is parallel with X-direction, the grating arrow in relay functionality region 202
Amount and X-direction are at angle β, and the grating vector and X-direction for being emitted functional region 203 are at 2 angles β.
Preferably, as needed, any value (contain end value) of the β selection between 40 degree to 50 degree.
In practical applications, the nanometer diffraction grating of relay functionality region and outgoing functional region is that can choose just
Grating can reduce production cost in this way and improve production efficiency, and groove profile is symmetrical along surface normal.Wherein relay functionality area
It domain and is coupled into functional region and connects, interface dimensions are identical with functional region interface dimensions are coupled into, as the direction x size is in y
Direction diffusion, shape are coupled into functional region between 1.5cm2 to 3cm2 similar to taper, relay functionality area size area
And relay functionality region is spaced between 0.2mm to 2mm, two functional regions are parallel in intersection line of demarcation.Outgoing
Functional region x direction size is identical with relay functionality region, the direction y size between 0.5cm to 2.5cm, relaying
Functional region and outgoing functional region are spaced between 0.5cm to 2cm.Relay functionality region and the functional area of outgoing
Domain is preferably made of many a random gratings, and for the size of random grating between 5 microns to 500 microns, shape can be pros
The figure high to, diamond shape or other duty ratios, forms being spaced between 0 micron to 10 microns between random grating.It is other
Technical requirements are as previously described.
When constructing three primary colours color hologram waveguide eyeglass, for relay functionality region, the period and it is coupled into functional area
Domain screen periods need to meet Λ2=Λ1/2cosβ.Correspondingly, for red eyeglass, the random grating in relay functionality region
Period is between 295nm to 390nm；For green len, the random grating period in relay functionality region arrives in 250nm
Between 335nm；For blue eyeglass, the random grating period in relay functionality region is between 200nm to 290nm.In order to full
Sufficient position matches condition, and outgoing functional region screen periods, which are equal to, is coupled into functional region, Λ3=Λ1.Relay functionality area
Domain and outgoing functional region grating groove profile can diversification, rectangle groove profile and sinusoidal and channeled is only shown in Fig. 3 g-h.It is preferred that
Grating duty ratio W/ Λ between 0.3 to 0.7.The depth h of different pixels grating needs centainly to be distributed with space, is used to
The brightness uniformity of adjustment coupling exit image, for relay functionality region grating, depth is with x direction change, for being emitted function
Energy property region grating, depth is with y direction change.
As shown in fig. 6, the light that image output source 101 issues is beaten after the regulation of image-forming component 102 and is being coupled into functionality
On the nanometer diffraction grating in region 201, the nanometer diffraction grating parameter for being coupled into functional region 201 is needed according to image f iotaeld-of-view angle
It is designed with lambda1-wavelength, so that the light in entire field angle is by being coupled into the nanometer diffraction of functional region 201
After optical grating diffraction, positive first-order diffraction light meets the total reflection condition of optical waveguide substrates, thus be coupled into optical waveguide substrates, it is specific to join
Number requires to have provided in the aforementioned embodiment.After light is coupled into optical waveguide substrates 2, to the nanometer in relay functionality region 202
Diffraction grating is advanced, and the nanometer diffraction grating of the light and relay functionality region 202 that are totally reflected every time is acted on, and the face XZ enters
Light is penetrated, is advanced at light is turned back in the face YZ by easy face, and constant with Z axis institute angulation, still meets waveguide transmission requirement.Different angle
The angle of diffraction of the incident light in optical waveguide substrates 2 it is different, therefore the number transmitted in optical waveguide substrates 2 is different.Image by
The nanometer diffraction grating in relay functionality region 202 repeatedly couples easy face, is extended in X-direction.Simultaneously in optical waveguide substrates 2
It propagates in the face YZ.Due to that can regulate and control to the nanometer diffraction grating depth of relaying functional region 2, can make every time
The intensity for coupling easy face light is identical.Constitute between the random grating of the nanometer diffraction grating in entire relay functionality region exist ±
The light in interval location is beaten at 2 microns of interval, cannot be coupled to correct direction by grating, due to interval and grating Pixel Dimensions
Compared to very little, therefore in addition energy loss beats the light in gap less than 2%, waveguide total reflection propagation conditions is unsatisfactory for, along XY
It is directly emitted, crosstalk will not be caused to signal light.
As shown in fig. 7, by easy face at the light of turning back in the face YZ, meeting after the relayed functional region grating effect of reflected light
Total reflection condition continues to propagate, and is acted on the nanometer diffraction grating of outgoing functional region 203.Every time turn back light and go out
The nanometer diffraction grating effect of functional region 203 is penetrated, part light intensity is output in human eye by optical grating diffraction, by multiple
Total reflection, image are extended in the Y direction, and image expands pupil, final range of observation and outgoing functional region in the direction XY
203 sizes are similar.Due to the grating of outgoing functional region grating 203 and the nanometer diffraction grating for being coupled into functional region 201
Period is consistent, therefore entire holographical wave guide eyeglass will not destroy the propagation and imaging of original light, only risen folding optical path and
Expand the effect of pupil.Signal light is divided at the single slit diffraction angle in random grating gap and signal light by grating diffration angle in space
Open, therefore imaging do not influenced, additionally, due to interval compared with Pixel Dimensions very little, therefore energy loss is less than 2%.
For the random grating in relay functionality region 202 and outgoing functional region 023, if with a piece of eyeglass, as
The period of plain grating can be taken as identical, and design parameter has provided in the aforementioned embodiment, and light is from outgoing functional region 203
When output, since total reflection incidence angle is consistent, and the nanometer for being coupled into functional region 201 and outgoing functional region 203 is spread out
The screen periods for penetrating grating are consistent, and in each total reflection eye point, light and original light ray parallel, this be will cause in different emergent pupils
Position, imaging have certain deviation, imaging surface farther out when, influence less, but when imaging surface is less than 1 meter, to observation
There is certain influence.Fig. 8 show another scheme that this patent AR is shown, wherein outgoing functional region 203 picture according to
Exit positions and imaging position are regulated and controled, mechanical periodicity is less than 30nm.By the light 1001 for regulating and controlling different exit pupil positions
Exit direction, final all image formations by rays same as upper (being located on imaging plane 1002), will not be with exit pupil position
There is virtual image translation phenomenon in translation.
Preferably, the nanometer diffraction grating of the relay functionality region 202 and outgoing functional region 203 is positive light
Grid, grating inclination angle are 0, and the groove profile of nanometer diffraction grating is symmetrical along surface normal.
Preferably, relay functionality region 202 and be coupled into functional region 201 and connect, be coupled into functional region 201 and in
After being spaced between 0.2mm to 2mm for functional region 202, two regions are parallel in intersection line of demarcation.
Preferably, the interface dimensions adjacent with functional region 201 is coupled into of relay functionality region 202 are identical.
Preferably, relay functionality region 202 Y direction width dimensions along X-axis far from being coupled into functional region 201
Direction gradually increase, as shown in Fig. 2 a and Fig. 3 b.
In being applied to near-to-eye three-dimensional display apparatus, 202 dimensioned area of relay functionality region be can choose
Between 1.5cm2 to 3cm2.
Preferably, outgoing functional region 203 is identical in X-direction size and relay functionality region 202, in Y-axis side
To size can choose between 0.5cm to 2.5cm, relay functionality region 202 and outgoing functional region 203 interval
It can choose between 0.5cm to 2cm.
In actual use, holographical wave guide lens unit can also use two functional region schemes, that is, be coupled into functionality
Region and outgoing functional region.As shown in figure 11, holographical wave guide lens unit is emitted by being coupled into functional region grating 201
Functional region 203, waveguide 2 are constituted.It is coupled into functional region 201 and the outgoing at least one piece of region of functional region 203 is
It is made of random grating.Being coupled into functional region 201 is unsymmetrical grating, and outgoing functional region 203 is positive grating or non-
Symmetrical grating.It is coupled into functional region 201 and outgoing functional region 203, the period of random grating is consistent with orientation, with full
Sufficient phase-matching condition, the light and entrance that are emitted from outgoing functional region 203 are coupled into the incident ray of functional region 201
In parallel, to meet imaging requirements.Red eyeglass, the period of the random grating is between 415nm to 550nm；Green len, institute
The period of random grating is stated between 350nm to 480nm；Blue eyeglass, the period of the random grating is in 290nm to 410nm
Between.Monochromatic display can be realized with monolithic eyeglass, blue, green, red eyeglass can also be stacked, and colored display is obtained.
The present invention also provides a kind of production methods of holographical wave guide eyeglass comprising the steps of:
S1: parameter calculates, the light and AR light path imaging field angle of the wavelength regulated and controled as needed, and determination is coupled into functional area
Domain, relay functionality region, the period for the nanometer diffraction grating being emitted in functional region, orientation, depth distribution, and holographic wave
Lead the waveguide parameter of eyeglass；Functional region, relay functionality region, outgoing three functional regions of functional region will be coupled into
In one, two or three in nanometer diffraction grating resolve into the random grating being arranged together one by one, it is laterally adjacent
Horizontal spacing between random grating is the integral multiple of screen periods；Grating slot and longitudinally adjacent pixel light in random grating
Grating slot sequentially alignment or incorrect order alignment one by one in grid；
S2: template preparation makes template using photoetching technique or mechanical Precision Machining；
S3: coating functions film by nanometer embossing will be coupled into functional area on a polymeric substrate first
Domain, relay functionality region, outgoing functional region are fabricated on functional film.
Photoetching technique includes dot matrix holographic lithography, electron beam lithography, ion beam lithography, neutral atom photoetching in step S2,
Wherein it is preferably dot matrix holographic lithography.
Preferably, step S2 are as follows: the spin coating photoresist on quartz substrate, with interference light 1 and 2 double light of interference light into
Row photoetching.
Preferably, in step S2, the corresponding nanometer diffraction grating template being coupled into functional region the preparation method is as follows:
It is coupled into the preparation of the nanometer diffraction grating template in functional region, is covered on the quartz substrate for being coated with photoresist
One photomask board of lid is only coupled into the light transmission of functional region position, and it is same that interference light 1 and interference light 2 are located at quartz substrate normal
Side, wherein interference light 1 and normal angle α 1 are the inclination angle for being coupled into the nanometer diffraction grating of functional region, interference light 1 and interference
2 angle α 1- α 2 of light determine the period of nanometer diffraction grating.
Preferably, the nanometer diffraction grating template in step S2, in corresponding relay functionality region, outgoing functional region
Preparation method difference it is as follows:
The preparation of nanometer optical diffraction grid template in relay functionality region is covered on the quartz substrate for being coated with photoresist
One photomask board of lid, only relay functionality regional location light transmission, the transmitance of transmission region linearly increases from left to right, right
Grating depth linear change is answered, interference light 1 and interference light 2 are symmetrical with quartz substrate normal, using dot matrix holographic technique to photoetching
Glue is exposed, and 2 θ of angle of interference light 1 and interference light 2 determines screen periods；
It is emitted the preparation of the nanometer diffraction grating template in functional region, is covered on the quartz substrate for being coated with photoresist
One photomask board of lid, only outgoing functional region position light transmission, the transmitance of transmission region linearly increases from top to down, right
Grating depth linear change is answered, interference light 1 and interference light 2 are symmetrical with quartz substrate normal, using dot matrix holographic technique to photoetching
Glue is exposed, and 2 θ of angle of interference light 1 and interference light 2 determines screen periods.
Preferably, it is coupled into the preparation of the nanometer diffraction grating template in functional region, nanometer diffraction grating depth is logical
Cross photoresist thickness, light exposure and photographic parameter co- controlling；After development, oblique raster is formed in the photoresist, depth is slightly
Higher than final grating design value；By soaking silver reaction, one layer of silverskin is formed on photoresist grating surface, is then placed in electroforming tank
Growth, ultimately forms the nickel template of pattern complementary in surfacial pattern and photoresist；Then it separates, photoresist is removed, had
There is the nickel template of complementary graph.
Preferably, relay functionality region, outgoing functional region in nanometer diffraction grating template preparation in, according to
Nanometer diffraction grating depth distribution design, controls the light exposure of each random grating, to regulate and control grating in post-develop photoresist
Depth distribution, by regulate and control interference light 1 and interference light 2 angle, control random grating in screen periods；Then pass through leaching
Silver reaction forms one layer of silverskin on photoresist grating surface, is then placed in electroforming tank and grows, ultimately form surfacial pattern and light
The nickel template of pattern complementary in photoresist；Then it separates, photoresist is removed, obtain the nickel template with complementary graph.
Preferably, after the completion of the preparation of nickel template, in the S3 step, pass through nanometer embossing using corresponding nickel template,
Respectively to be coupled into functional region, relay functionality region, outgoing functional region in nanometer diffraction grating carry out duplication life
It produces；Using ultraviolet nanometer technology, nickel template and optical waveguide substrates are bonded and apply pressure by the drop coating uv-curable glue in optical waveguide substrates
Power；Uv-exposure simultaneously demoulds.
Nanometer embossing includes monomer cure nano impression (photocuring or heat cure), hot nano impression, wherein it is preferred that
It is ultraviolet nanometer stamping technique.
Optical waveguide substrates can choose high refractive index dense flint glass, and thickness is between 0.3mm to 1.2mm.Uv-curable glue
Select high refractive index epithio.The distance of grating groove and optical waveguide substrates upper surface can arbitrarily be selected in aforementioned range after coining
It selects, is such as selected as 500nm.
As shown in Fig. 9 a-f, production is coupled into the nanometer diffraction grating example of functional region 201, region nanometer diffraction light
Grid use oblique raster.Using dot matrix holographic technique or conventional interference photoetching technique, photoresist is exposed.Point array holographic
The corresponding functional region that is coupled into of technology is made of many random gratings, and the corresponding functional region that is coupled into of interference photoetching technology is one
Entire big grating (also can according to need, be arranged using multiple random gratings, each random grating is by one group of nano
Diffraction grating is constituted).In Fig. 9 a, photoresist 304 is coated on substrate 305, then carries out dual-beam light using light beam 1 and grating 2
It carves, wherein light beam 1 and normal angle α 1 are grating inclination angle, and light beam 1 and 2 angle α 1- α 2 of light beam determine that screen periods, grating are deep
Degree passes through photoresist thickness, light exposure and photographic parameter co- controlling.After development, oblique raster is formed in photoresist 304, it is deep
Degree is slightly higher than final grating design value, as shown in figure 9b.By soaking silver reaction, one layer of silver is formed on photoresist grating surface
Then film is placed in electroforming tank and grows, ultimately form (such as Fig. 9 c of nickel template 303 of pattern complementary in surfacial pattern and photoresist
It is shown).Then it separates, photoresist 304 is removed, obtain having the nickel template 303 of complementary graph to utilize this as shown in figure 9d
Nickel template 303 can produce the nanometer diffraction-grating replica for being coupled into functional region 201 by nanometer embossing.Such as Fig. 9 e
It is shown, preferably by ultraviolet nanometer technology, including the drop coating uv-curable glue 302 in optical waveguide substrates 2, by nickel template 303 and wave
Conductive substrate 2 is bonded and applies pressure, and uv-exposure simultaneously demoulds.Optical waveguide substrates 2 can choose high refractive index dense flint glass, thickness
Between 0.3mm to 1.2mm.High refractive index episulfide resin may be selected in uv-curable glue 302.Grating groove and waveguide lining after coining
The distance of bottom upper surface can choose any numerical value being not zero, such as 500nm between 0 to 100 microns.
As shown in Figure 10 a-f, for production relay functionality region 202 and the nanometer diffraction being emitted in functional region 203
The nanometer diffraction grating of the schematic diagram of grating, the two regions can select positive grating.As shown in Figure 10 a, it is coated on substrate 305
Photoresist 304 is exposed photoresist using dot matrix holographic technique, and 2 θ of angle of light beam determines screen periods.According to Fig. 4
Grating depth distribution, control the light exposure of each random grating, to regulate and control the depth distribution of grating in post-develop photoresist,
By regulating and controlling beam angle, the screen periods in random grating are controlled.Template shown in Figure 10 b is eventually formed, leaching is then passed through
Silver reaction forms one layer of silverskin in the grating surface that photoresist 304 is formed.As shown in figure l0c, it is then placed in electroforming tank raw
It is long, ultimately form the nickel template 303 of pattern complementary in surfacial pattern and photoresist.Then it separates, photoresist 304 is removed, is obtained
To the nickel template 303 with complementary graph, as shown in fig. 10d.It then can be by nanometer embossing, to relaying using the template
Nanometer diffraction-grating replica production in functional region 202 and outgoing functional region 203, it is as illustrated in figure 10e, preferred to use
Nickel template 303 and optical waveguide substrates 2 are bonded and are applied by ultraviolet nanometer technology, the drop coating uv-curable glue 302 in optical waveguide substrates 2
Pressure by uv-exposure and demoulds, so that uv-curable glue fills between nickel template 303 and optical waveguide substrates 2 in respective area
Domain obtains nanometer diffraction grating, as shown in figure 10f.Optical waveguide substrates 2 can choose high refractive index dense flint glass, and thickness exists
Between 0.3mm to 1.2mm, uv-curable glue 302 selects high refractive index episulfide resin, and residual layer thickness can be after coining
500nm.Three pieces of grating region (being coupled into, relay and be emitted functional region) utilisation point array holographic technologies are in same nickel mould
It is formed in plate, grating aligning accuracy is high.RGB eyeglass manufacturing process is similar with the above process, and parameter is according in previous embodiment
The condition provided is chosen.It after the completion of three pieces of holographical wave guide lens units, is sequentially stacked according to Fig. 1, to realize
Chromatic image.
The present invention also provides a kind of three-dimensional display apparatus, including above-mentioned holographical wave guide eyeglass and video generation device.Image
How generating means and waveguide eyeglass construct the related art scheme of three-dimensional display apparatus, and first patent and the prior art have phase
It speaks on somebody's behalf bright, repeats no more.
Each embodiment in this specification is described in a progressive manner, the highlights of each of the examples are with other
The difference of embodiment, similar portion may refer to each other between each embodiment.To being stated in the disclosed embodiments
It is bright, it enables those skilled in the art to implement or use the present invention.Various modifications to these embodiments are to this field
It will be apparent for professional technician, the general principles defined herein can not depart from spirit of the invention
Or in the case where range, realize in other embodiments.Therefore, the present invention will not be by limitation and these implementations shown in this article
Example, and it is to fit to the widest scope consistent with the principles and novel features disclosed herein.
Claims (41)
1. a kind of holographical wave guide eyeglass, which is characterized in that including a piece of, two panels, three pieces or the above holographical wave guide eyeglass list of three pieces
Member；Holographical wave guide lens unit, which is equipped with to include at least, is coupled into functional region and outgoing two functional regions of functional region,
A nanometer diffraction grating is equipped in the functional region；Functional region is coupled into for image light signals to be coupled into waveguide mirror
Blade unit, outgoing functional region for will be conducted through in waveguide lens unit come image light carry out the diffusion of Y-direction image and
Output.
2. holographical wave guide eyeglass according to claim 1, which is characterized in that the waveguide lens unit is additionally provided with for X
The relay functionality region of directional image diffusion.
3. holographical wave guide eyeglass according to claim 1, which is characterized in that the holographical wave guide lens unit includes waveguide
Substrate, the functional region are set in optical waveguide substrates.
4. holographical wave guide eyeglass according to claim 1, which is characterized in that the holographical wave guide lens unit further includes function
Energy property film, the functional region are set on functional film, and the functional film is set in polymer substrate.
5. holographical wave guide eyeglass according to claim 1, which is characterized in that the profiled envelope line for being coupled into functional region is
The multi-section-line of closed curve or closure includes one or both of straightway and curved section in the multi-section-line of closure.
6. holographical wave guide eyeglass according to claim 5, which is characterized in that the area for being coupled into functional region exists
0.1cm2To 0.4cm2Between.
7. holographical wave guide eyeglass according to claim 5, which is characterized in that the functional region grating that is coupled into is by many
A random grating is constituted, and the size of random grating is between 5 microns to 500 microns.
8. holographical wave guide eyeglass according to claim 1, which is characterized in that the holographical wave guide eyeglass includes corresponding to not
With the holographical wave guide lens unit of primary colours, each holographical wave guide lens unit regulates and controls corresponding primary colours.
9. -8 any holographical wave guide eyeglass according to claim 1, which is characterized in that at least one functional region
Nanometer diffraction grating is made of multiple random gratings.
10. holographical wave guide eyeglass according to claim 9, which is characterized in that between the laterally adjacent random grating
Horizontal spacing is the integral multiple of screen periods.
11. holographical wave guide eyeglass according to claim 10, which is characterized in that grating slot in the random grating and vertical
Grating slot sequentially alignment or incorrect order alignment one by one into adjacent random grating.
12. holographical wave guide eyeglass according to claim 11, which is characterized in that the screen periods of the random grating exist
Between 200nm to 600nm, size is between 5 microns to 500 microns.
13. holographical wave guide eyeglass according to claim 11, which is characterized in that same picture in the relay functionality region
The grating depth of element is consistent, and the depth of different pixels grating is gradually reduced with X-direction；In the outgoing functional region
The grating depth of same pixel is consistent, and the depth of different pixels grating is gradually reduced with Y direction.
14. holographical wave guide eyeglass according to claim 11, which is characterized in that the grating arrow for being coupled into functional region
Amount is parallel with X-direction, and the grating vector and X-direction in the relay functionality region are at angle β, the outgoing functional region
Grating vector and X-direction at 2 angles β.
15. holographical wave guide eyeglass according to claim 11, which is characterized in that described with a piece of holographical wave guide lens unit
On be coupled into functional region grating, the period of random grating is consistent, and orientation is consistent.
16. holographical wave guide eyeglass according to claim 15, which is characterized in that for the red red holographical wave guide of regulation
Lens unit, the period for being coupled into functional region random grating is between 415nm to 550nm.
17. holographical wave guide eyeglass according to claim 15, which is characterized in that for the green holographical wave guide of regulation green
Lens unit, the period for being coupled into functional region random grating is between 350nm to 480nm.
18. holographical wave guide eyeglass according to claim 15, which is characterized in that for the blue holographical wave guide of regulation blue
Lens unit, the period for being coupled into functional region random grating is between 290nm to 410nm.
19. holographical wave guide eyeglass according to claim 14, which is characterized in that the angle β is between 40 degree to 50 degree.
20. holographical wave guide eyeglass according to claim 14, which is characterized in that the grating for being coupled into functional region inclines
Angle α is between 15 degree to 45 degree, and grating duty ratio is between 0.4 to 0.6.
21. holographical wave guide eyeglass according to claim 11, which is characterized in that the grating slot for being coupled into functional region
Type is the straight strip in left side or right side oblique triangle.
22. holographical wave guide eyeglass according to claim 11, which is characterized in that the grating slot for being coupled into functional region
Type is arbitrarily to have asymmetric inclined groove profile.
23. holographical wave guide eyeglass according to claim 11, which is characterized in that the relay functionality region and outgoing function
Can the nanometer diffraction grating in property region be positive grating, the grating inclination angle is 0 degree, and the groove profile of the nanometer diffraction grating is along table
Face normal is symmetrical.
24. holographical wave guide eyeglass according to claim 20, which is characterized in that the same holographical wave guide lens unit
Functional region random grating depth is coupled into keep constant.
25. holographical wave guide eyeglass according to claim 24, which is characterized in that the random grating depth h is in 100nm
To between 400nm.
26. holographical wave guide eyeglass according to claim 21, which is characterized in that on the same holographical wave guide lens unit
The grating depth for being coupled into the nanometer diffraction grating of functional region is consistent.
27. a kind of production method of holographical wave guide eyeglass, which is characterized in that comprise the steps of:
S1: parameter calculate, the light and AR light path imaging field angle of the wavelength regulated and controled as needed, determine be coupled into functional region,
It is emitted the waveguide parameter of period of nanometer diffraction grating in functional region, orientation, depth distribution and holographical wave guide eyeglass；
The nanometer diffraction grating for being coupled into functional region, being emitted in functional region is resolved into the pixel being arranged together one by one
Grating；
S2: template preparation is exposed photoresist using photoetching technique；
S3: coating functions film will be coupled into functional region, gone out by nanometer embossing on a polymeric substrate first
Functional region is penetrated to be fabricated on functional film.
28. the method according to claim 27 for preparing holographical wave guide eyeglass, which is characterized in that also wrapped in step S1 and S3
Include relay functionality region.
29. the method according to claim 27 for preparing holographical wave guide eyeglass, which is characterized in that laterally adjacent in step S1
Horizontal spacing between the random grating is the integral multiple of screen periods.
30. the method according to claim 27 for preparing holographical wave guide eyeglass, which is characterized in that pixel described in step S1
Grating slot in grating is sequentially aligned one by one with the grating slot in longitudinally adjacent random grating or incorrect order is aligned.
31. the method according to claim 27 for preparing holographical wave guide eyeglass, which is characterized in that photoetching described in step S2
Technology is dot matrix holographic lithography.
32. the method according to claim 28 for preparing holographical wave guide eyeglass, which is characterized in that step S2 are as follows: in substrate
Upper spin coating photoresist carries out photoetching with interference light 1 and 2 double light of interference light.
33. the method according to claim 32 for preparing holographical wave guide eyeglass, which is characterized in that in step S2, corresponding coupling
Enter the template in functional region the preparation method is as follows:
It is coupled into the preparation of the template in functional region, a photomask board is covered on the substrate for being coated with photoresist, only
It is coupled into the light transmission of functional region position, it is ipsilateral that interference light 1 and interference light 2 are located at quartz substrate normal, wherein interference light 1 and normal
Angle α1For be coupled into functional region nanometer diffraction grating inclination angle, 2 angle αs of interference light 1 and interference light1-α2It determines and receives
The period of rice diffraction grating.
34. the method according to claim 33 for preparing holographical wave guide eyeglass, which is characterized in that in step S2, in correspondence
Preparation method difference after the template in functional region, outgoing functional region is as follows:
The preparation of template in relay functionality region covers a photomask board on the quartz substrate for being coated with photoresist,
Only relay functionality regional location light transmission, the transmitance of transmission region linearly increase from left to right, and corresponding grating depth is linear
Variation, interference light 1 and interference light 2 are symmetrical with quartz substrate normal, are exposed using dot matrix holographic technique to photoresist, interfere
Light 1 and 2 θ of the angle of interference light 2 determine screen periods；
It is emitted the preparation of the template in functional region, a photomask board is covered on the quartz substrate for being coated with photoresist,
It is only emitted the light transmission of functional region position, the transmitance of transmission region linearly increases from top to down, and corresponding grating depth is linear
Variation, interference light 1 and interference light 2 are symmetrical with quartz substrate normal, are exposed using dot matrix holographic technique to photoresist, interfere
Light 1 and 2 θ of the angle of interference light 2 determine screen periods.
35. the method according to claim 33 for preparing holographical wave guide eyeglass, which is characterized in that described to be coupled into functional area
In the preparation of domain inner template, nanometer diffraction grating depth passes through photoresist thickness, light exposure and photographic parameter co- controlling；Development
Afterwards, oblique raster is formed in the photoresist, and depth is higher than final grating design value.
36. the method according to claim 35 for preparing holographical wave guide eyeglass, which is characterized in that by soaking silver reaction,
The photoresist grating surface forms one layer of silverskin, is then placed in electroforming tank and grows, ultimately forms surfacial pattern and photoresist
The nickel template of middle pattern complementary；Then it separates, photoresist is removed, obtain the nickel template with complementary graph.
37. the method according to claim 33 for preparing holographical wave guide eyeglass, which is characterized in that the relay functionality area
Domain, outgoing functional region in nanometer diffraction grating template preparation in, according to nanometer diffraction grating depth distribution design, control
The light exposure of each random grating is made, to regulate and control the depth distribution of grating in post-develop photoresist, by regulating and controlling 1 He of interference light
The angle of interference light 2 controls the screen periods in random grating.
38. preparing the method for holographical wave guide eyeglass according to claim 37, which is characterized in that by soaking silver reaction,
The photoresist grating surface forms one layer of silverskin, is then placed in electroforming tank and grows, ultimately forms surfacial pattern and photoresist
The nickel template of middle pattern complementary；Then it separates, photoresist is removed, obtain the nickel template with complementary graph.
39. preparing the method for holographical wave guide eyeglass according to claim 36 or 38, which is characterized in that prepared by nickel template
Cheng Hou, in the S3 step, using corresponding nickel template by nanometer embossing, respectively to being coupled into functional region, relaying function
Nanometer diffraction grating in energy property region, outgoing functional region carries out duplication production.
40. the method according to claim 39 for preparing holographical wave guide eyeglass, which is characterized in that the nanometer embossing
For ultraviolet nanometer technology, nickel template and optical waveguide substrates are bonded and are applied pressure by the drop coating uv-curable glue in optical waveguide substrates, purple
Outer exposure simultaneously demoulds.
41. a kind of three-dimensional display apparatus, which is characterized in that including the holographical wave guide eyeglass as described in claim 1-26 is any,
Or the holographical wave guide eyeglass prepared according to claim 27-40 either method.
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| CN114895403A (en) * | 2022-05-19 | 2022-08-12 | 西安理工大学 | Parabolic waveguide efficient grating coupler and design method thereof |
| CN115616790A (en) * | 2022-12-20 | 2023-01-17 | 煤炭科学研究总院有限公司 | Hologram display system based on volume holographic optical waveguide |
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