CN109207954A - Polychrome film glass and its production method and equipment - Google Patents
Polychrome film glass and its production method and equipment Download PDFInfo
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- CN109207954A CN109207954A CN201811224330.3A CN201811224330A CN109207954A CN 109207954 A CN109207954 A CN 109207954A CN 201811224330 A CN201811224330 A CN 201811224330A CN 109207954 A CN109207954 A CN 109207954A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
- C23C14/0652—Silicon nitride
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Surface Treatment Of Glass (AREA)
- Laminated Bodies (AREA)
Abstract
The present invention relates to a kind of polychrome film glass and its production methods and equipment.Production equipment includes several transfer rollers and the control system that matches with each transfer roller, can be effective for the non-homogeneous film layer of continuous production；Wherein, transfer roller is for placing coating material, and each transfer roller is independently arranged；When using magnetron sputtering method plated film on substrate, the speed of coating material in each transfer roller is adjusted by control system, so that controllable variations occurs in the thicknesses of layers being coated with, obtains polychrome film glass.Production method provided by the invention can effectively solve the problem that the single defect of existing product color, so that product appearance color possesses multiple combinations abundant simultaneously.Meanwhile when observing polychrome film glass of the present invention at different angles, different beautiful colors can be presented, and the equipment can be further designed to can large-scale continuous production filming equipment, be with a wide range of applications.
Description
Technical field
The present invention relates to substrate coating technique fields, and in particular to a kind of polychrome film glass and its production method and equipment.
Background technique
Currently, the design of electronic product becomes an important factor for can a product be succeeded, among these
It include the appearance color design of product.By taking the design of the color of phone housing backboard as an example, overwhelming majority phone housing is carried on the back at present
A kind of color can only be existed simultaneously on plate, and color homogeneity is distributed.Such design facilitates mobile phone backboard continuous on a large scale
Formula production, to meet the needs of market is to quantity.
But there is also limitations for above-mentioned design, because the color on mobile phone backboard is relatively dull, and such commercially available production
Product homogeneity is serious, lacks freshness (see Fig. 1).This limitation is by the filming equipment of current large-scale production and technological design institute
It causes.Specifically, traditional large area continuous coating line schematic diagram is as shown in Fig. 2, on traditional large area continuous coating line, respectively
Company is being dedicated to pursuing more ultimate attainment membrane uniformity and continuous production ability always.In this theory, manufactured big face
Product continuous coating line is difficult to realize the production of scale high-quality.
Based on this, in order to solve the single defect of existing product color, providing a kind of novel can make product while gather around
The production technology and equipment for having colourful appearance color are of great significance.
Summary of the invention
For the defects in the prior art, the present invention is intended to provide a kind of polychrome film glass and its production method and equipment.
Production method provided by the invention can effectively solve the problem that the single defect of existing product color, so that product appearance color is simultaneously
Possess multiple combinations abundant.Meanwhile when observing polychrome film glass of the present invention at different angles, it can present different beautiful
Beautiful color, and the equipment can be further designed to can large-scale continuous production filming equipment, have a wide range of applications valence
Value.
For this purpose, the invention provides the following technical scheme:
In a first aspect, the present invention provides a kind of equipment for producing polychrome film glass, equipment includes several transfer rollers
It, can be effective for the non-homogeneous film layer of continuous production with the control system to match with each transfer roller；Wherein, transfer roller is used
In placement coating material, and each transfer roller is independently arranged；When equipment is used for plated film, each transfer roller is adjusted by control system
The speed of coating material on road obtains polychrome film glass so that controllable variations occurs in the thicknesses of layers being coated with.
Preferably, control system includes driving motor, and the operation control model of driving motor include speed Control and/or
At the uniform velocity control.
Preferably, equipment further includes magnetic control sputtering system, using magnetron sputtering method on coating material plated film；And it is to be coated
Match under the corresponding cathode of layer with each transfer roller.
Second aspect, the present invention provide a kind of for producing the production method of polychrome film glass, and use is provided by the invention
Equipment, comprising the following steps: use magnetron sputtering method plated film on substrate, it is independent that every tunic, which corresponds to the transfer roller under cathode,
Mode, and when plated film, each transfer roller passes through speed when each cathode according to preset rate curve, adjust automatically coating material
Degree, so that controllable variation occurs in the thicknesses of layers being coated with, finally obtains polychrome film glass.
Specifically, every tunic corresponds to the transfer roller under cathode and all can independently adjust, while control system can be to plated film base
The position of material is precisely controlled.When substrate needs plated film, according to the rate curve of each motor set, equipment adjust automatically
Substrate it is excellent by each cathode when speed so that there is controllable variation in the thicknesses of layers being coated with, so that same
Different location on plate substrate can realize different colors.
Preferably, the actual conditions of magnetron sputtering are as follows: ontology vacuum degree < 8 × 10-6mbar；And the type of Coating Materials is big
When two kinds, isolating coefficient > 20 of two neighboring different process atmosphere.
Preferably, substrate selects glass baseplate, and is coated with silicon nitride layer, silicon oxide layer and titanium oxide layer on the glass substrate
One of or it is a variety of.It should be noted that the other materials for being suitable for magnetron sputtering method plated film is also can be with；Actual production
Cheng Zhong, those skilled in the art can adjust the type and ratio of Coating Materials according to the actual situation.
Preferably, speed Control, and preferably even deceleration straight line pattern are carried out when being coated with silicon nitride layer；It is coated with silicon nitride
Except other layer when, using fixed speed control.
Preferably, when being coated with silicon nitride layer, sputter cathode work atmosphere is 4~5 × 10-3Mbar, technique distribution ratio are
450sccm argon gas/650sccm nitrogen；When being coated with titanium oxide layer, sputter cathode work atmosphere is 3~4.5 × 10-3Mbar, technique
Distribution ratio is 800ccm argon gas/70sccm oxygen；When being coated with silicon oxide layer, sputter cathode work atmosphere be 2.5~3.5 ×
10-3Mbar, technique distribution ratio are 500ccm argon gas/360sccm oxygen.
Preferably, it is successively coated with the first silicon nitride layer, silicon oxide layer, the second silicon nitride layer and titanium oxide on the glass substrate
Layer, and the ratio between glass baseplate, the first silicon nitride layer, silicon oxide layer, the second silicon nitride layer and thickness of titanium oxide layer are followed successively by
6mm:(110~230) nm:(30~50) nm:(110~160) nm:(15~25) nm.
The third aspect, the multilayer film glass being prepared using the method for the present invention.
The above technical solution of the present invention has the following advantages over the prior art:
(1) applicant has found by many experiments: production method provided by the invention can effectively solve the problem that existing product face
The single defect of color, so that product appearance color possesses multiple combinations abundant simultaneously.Meanwhile when observation at different angles
When invention polychrome film glass, different beautiful colors can be presented, and production equipment can be designed to continuously to give birth on a large scale
The filming equipment of production, is with a wide range of applications.
(2) using filming equipment provided by the invention, it can be achieved that continuous large-area produces non-homogeneous film layer product, production effect
Rate has revolutionary raising compared with traditional equipment；At the same time, filming equipment of the present invention can be to product in coating process chamber
The position of interior traveling is precisely controlled, and the consistency between product batches is made to provide more favorable guarantee.
Additional aspect and advantage of the invention will be set forth in part in the description, and will partially become from the following description
Obviously, or practice through the invention is recognized.
Detailed description of the invention
Fig. 1 is the color scheme of mobile phone backboard in background of invention；
Fig. 2 is the schematic diagram of traditional large area continuous coating line in background of invention；
Fig. 3 is the structural schematic diagram of filming equipment in the embodiment of the present invention；
Fig. 4 is that each thicknesses of layers of multilayer film glass matches schematic diagram in the embodiment of the present invention；
Fig. 5 is the speed curve diagram that the first silicon nitride layer is coated in the embodiment of the present invention；
Fig. 6 is the speed curve diagram that the second silicon nitride layer is coated in the embodiment of the present invention；
Fig. 7 is the speed curve diagram that other film layers are coated in the embodiment of the present invention；
Fig. 8 is the color diagram that multilayer film glass finished-product is observed from the front in the embodiment of the present invention；
Fig. 9 is color diagram of the multilayer film glass finished-product from 45° angle in the embodiment of the present invention；
Figure 10 is the color scheme for the mobile phone backboard that multilayer film glass production obtains in the embodiment of the present invention.
Specific embodiment
The embodiment of the present invention is described in detail below in conjunction with attached drawing.Following embodiment is only used for clearer
Illustrate technical solution of the present invention, therefore be only used as example, and not intended to limit the protection scope of the present invention.
Experimental method in following embodiments is unless otherwise specified conventional method.Examination as used in the following examples
Material is tested, is to be commercially available from conventional reagent shop unless otherwise specified.Quantitative test in following embodiment, is all provided with
Three repeated experiments are set, data are the average value or mean+SD of three repeated experiments.
The present invention provides a kind of equipment for producing polychrome film glass, as shown in figure 3, equipment includes several transfer rollers
With the control system driving motor to match with each transfer roller；Wherein, transfer roller is for placing coating material, and each transmission
Roller-way is independently arranged；When equipment is used for plated film, the speed of coating material in each transfer roller is adjusted by driving motor, so that
There are controllable variations in the thicknesses of layers being coated with, obtains polychrome film glass.
In further embodiment of the invention, equipment further includes magnetic control sputtering system, is being plated using magnetron sputtering method
Plated film on film base material；And match under the corresponding cathode of film layer to be plated with each transfer roller.
In addition, the present invention provide it is a kind of for producing the production method of polychrome film glass, using above equipment, including following
Step:
Using magnetron sputtering method plated film on the glass substrate, it is stand-alone mode that every tunic, which corresponds to the transfer roller under cathode,
And when plated film, each transfer roller is passed through speed when each cathode, is made according to preset rate curve, adjust automatically glass baseplate
There is controllable variation in the thicknesses of layers that must be coated with, finally obtains polychrome film glass.Wherein, the actual conditions of magnetron sputtering are as follows:
Ontology vacuum degree < 8 × 10-6mbar；And the type of Coating Materials be greater than or equal to two kinds when, two neighboring different process atmosphere
Isolating coefficient > 20.
It is illustrated With reference to embodiment.
The present embodiment provides a kind of production methods of polychrome film glass, comprising the following steps:
Using magnetron sputtering method on coating material plated film；The transfer roller that film layer to be plated corresponds under cathode is set as independent
Mode, and each transfer roller is each equipped with driving motor；Control ontology vacuum degree < 8 × 10 of magnetron sputtering-6Mbar, when plated film,
Each transfer roller passes through speed when each cathode according to preset rate curve, adjust automatically glass baseplate.Specifically, in glass
The first silicon nitride layer, silicon oxide layer, the second silicon nitride layer and titanium oxide layer, and two neighboring different works are successively coated on glass substrate
Isolating coefficient > 20 of skill atmosphere；
In production process,
Sputter cathode work atmosphere: silicon nitride: 4~5 × 10-3Mbar, titanium oxide: 3~4.5 × 10-3Mbar, silica:
2.5~3.5 × 10-3mbar。
Technique distribution ratio: silicon nitride: 450sccm argon gas/650sccm nitrogen, titanium oxide: 800ccm argon gas/70sccm
Oxygen, silica: 500ccm argon gas/360sccm oxygen.
Thicknesses of layers proportion: glass baseplate, the first silicon nitride layer, silicon oxide layer, the second silicon nitride layer and titanium oxide layer
The ratio between thickness is followed successively by 6mm:(110~230) nm:(30~50) nm:(110~160) nm:(15~25) nm, each thicknesses of layers
It is as shown in Figure 4 to match schematic diagram.
Wherein, using even deceleration straight line pattern when being coated with silicon nitride layer, Fig. 5 and Fig. 6 are respectively to be coated with the first silicon nitride layer
With the speed curve diagram of the second silicon nitride layer；At be coated with except silicon nitride other layer, using fixed speed control, rate curve is such as
Shown in Fig. 7.
Experimental result: under the conditions of the present embodiment, thicknesses of layers can be made gradual change occur in same glass substrate, to make
There is the color of gradual change in the appearance for obtaining substrate, and Fig. 8 is the color that multilayer film glass finished-product is observed from the front in the embodiment of the present invention
Figure；Fig. 9 is that color diagram of the multilayer film glass finished-product from 45° angle is shown in sample in the embodiment of the present invention.
Further, production equipment and method provided by the invention can be used for the preparation process of electronic product casing backboard
In, as shown in Figure 10, for the color scheme of the handset shell backboard produced using the method for the present invention and equipment.
Certainly, the case where enumerating in addition to above-described embodiment selects other Coating Materials, technique distribution ratio, each transmission
The other parameters such as speed of coating material and condition are also possible on roller-way.
Production method provided by the invention can effectively solve the problem that the single defect of existing product color, so that product appearance
Color possesses multiple combinations abundant simultaneously.Meanwhile when observing polychrome film glass of the present invention at different angles, it can present
Different beautiful colors, and the equipment can be further designed to can large-scale continuous production filming equipment, have extensive
Application value.In addition, using filming equipment provided by the invention, it can be achieved that continuous large-area produces non-homogeneous film layer product,
Production efficiency has revolutionary raising compared with traditional equipment；And filming equipment of the present invention can be intracavitary in coating process to product
The position of traveling is precisely controlled, and the consistency between product batches is made to provide more favorable guarantee.
In the description of the present invention, it is to be understood that, term " first ", " second " are used for description purposes only, and cannot
It is interpreted as indication or suggestion relative importance or implicitly indicates the quantity of indicated technical characteristic.Define as a result, " the
One ", the feature of " second " can explicitly or implicitly include one or more of the features.In the description of the present invention,
The meaning of " plurality " is two or more, unless otherwise specifically defined.
In the description of this specification, reference term " one embodiment ", " some embodiments ", " example ", " specifically show
The description of example " or " some examples " etc. means specific features, structure, material or spy described in conjunction with this embodiment or example
Point is included at least one embodiment or example of the invention.In the present specification, schematic expression of the above terms are not
It must be directed to identical embodiment or example.Moreover, particular features, structures, materials, or characteristics described can be in office
It can be combined in any suitable manner in one or more embodiment or examples.In addition, without conflicting with each other, the skill of this field
Art personnel can tie the feature of different embodiments or examples described in this specification and different embodiments or examples
It closes and combines.
Although the embodiments of the present invention has been shown and described above, it is to be understood that above-described embodiment is example
Property, it is not considered as limiting the invention, those skilled in the art within the scope of the invention can be to above-mentioned
Embodiment is changed, modifies, replacement and variant.
Claims (10)
1. a kind of equipment for producing polychrome film glass, it is characterised in that:
The equipment includes several transfer rollers and the control system that matches with each transfer roller；
Wherein, the transfer roller is for placing coating material, and each transfer roller is independently arranged；When the equipment is used for
When plated film, the speed of coating material in each transfer roller is adjusted by control system, so that the thicknesses of layers being coated with occurs
Controllable variations obtain the polychrome film glass.
2. the equipment according to claim 1 for producing polychrome film glass, it is characterised in that:
The control system includes driving motor, and the operation control model of the driving motor includes speed Control and/or even
Speed control.
3. the equipment according to claim 1 or 2 for producing polychrome film glass, it is characterised in that:
The equipment further includes magnetic control sputtering system, using magnetron sputtering method on coating material plated film；And film layer to be plated is corresponding
Cathode under match with each transfer roller.
4. a kind of for producing the production method of polychrome film glass, which is characterized in that using described in any one of claims 1 to 3
Equipment, comprising the following steps:
Using magnetron sputtering method, plated film, film layer to be plated correspond to the transfer roller under cathode as stand-alone mode on substrate；When plated film,
Each transfer roller passes through speed when each cathode according to preset rate curve, adjust automatically coating material, so that plating
There is controllable variation in the thicknesses of layers of system, finally obtains the polychrome film glass.
5. according to claim 4 for producing the production method of polychrome film glass, it is characterised in that:
The actual conditions of the magnetron sputtering are as follows: ontology vacuum degree < 8 × 10-6mbar；And the type of Coating Materials is greater than or equal to
At two kinds, isolating coefficient > 20 of two neighboring different process atmosphere.
6. the production method of multilayer film glass according to claim 4, it is characterised in that:
The substrate selects glass baseplate, and is coated in silicon nitride layer, silicon oxide layer and titanium oxide layer on the glass baseplate
It is one or more.
7. the production method of multilayer film glass according to claim 6, it is characterised in that:
Speed Control, and preferably even deceleration straight line pattern are carried out when being coated with the silicon nitride layer；It is coated with except silicon nitride
At other layer, using fixed speed control.
8. the production method of multilayer film glass according to claim 7, it is characterised in that:
When being coated with the silicon nitride layer, sputter cathode work atmosphere is 4~5 × 10-3Mbar, technique distribution ratio are 450sccm
Argon gas/650sccm nitrogen；
When being coated with the titanium oxide layer, sputter cathode work atmosphere is 3~4.5 × 10-3Mbar, technique distribution ratio are 800ccm
Argon gas/70sccm oxygen；
When being coated with the silicon oxide layer, sputter cathode work atmosphere is 2.5~3.5 × 10-3Mbar, technique distribution ratio are
500ccm argon gas/360sccm oxygen.
9. according to the production method of the described in any item multilayer film glass of claim 4~8, it is characterised in that:
The first silicon nitride layer, silicon oxide layer, the second silicon nitride layer and titanium oxide layer, and institute are successively coated on the glass baseplate
State the thickness of glass baseplate, first silicon nitride layer, the silicon oxide layer, second silicon nitride layer and the titanium oxide layer
The ratio between be followed successively by 6mm:(110~230) nm:(30~50) nm:(110~160) nm:(15~25) nm.
10. the multilayer film glass being prepared using any one of claim 4~9 the method.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201811224330.3A CN109207954B (en) | 2018-10-19 | 2018-10-19 | Multi-colour film glass and its production method and equipment |
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| CN201811224330.3A CN109207954B (en) | 2018-10-19 | 2018-10-19 | Multi-colour film glass and its production method and equipment |
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| CN109207954B CN109207954B (en) | 2021-04-20 |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111443670A (en) * | 2020-04-02 | 2020-07-24 | 蚌埠凯盛工程技术有限公司 | Control method and device for photovoltaic glass coating production line |
| CN113557278A (en) * | 2020-02-19 | 2021-10-26 | 爱思开希高科技材料有限公司 | Multilayer film and laminate comprising same |
| CN113791510A (en) * | 2021-08-06 | 2021-12-14 | 河北光兴半导体技术有限公司 | Preparation system for electrochromic glass |
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| WO2002024971A1 (en) * | 2000-09-20 | 2002-03-28 | Saint-Gobain Glass France | Substrate with photocatalytic coating |
| CN1749192A (en) * | 2000-09-20 | 2006-03-22 | 法国圣戈班玻璃厂 | Substrate with photocatalytic coating |
| CN1928149A (en) * | 2005-09-06 | 2007-03-14 | 株式会社半导体能源研究所 | Deposition device |
| CN101463471A (en) * | 2009-01-12 | 2009-06-24 | 浙江嘉远格隆能源股份有限公司 | Continuous thin film vacuum deposition method and apparatus |
| CN103290383A (en) * | 2012-02-23 | 2013-09-11 | 上海北玻镀膜技术工业有限公司 | Transmission control method of coated glass |
| CN104046952A (en) * | 2013-03-15 | 2014-09-17 | 住友重机械工业株式会社 | Substrate Carrying Tray And Film Forming Apparatus |
| CN107532274A (en) * | 2015-04-30 | 2018-01-02 | 冯·阿登纳有限公司 | Method and coating unit |
| CN109423607A (en) * | 2017-09-01 | 2019-03-05 | 福建省辉锐电子技术有限公司 | A method of coated cover-plate is prepared using continuous magnetron sputtering sedimentation |
| CN108570651A (en) * | 2018-06-13 | 2018-09-25 | 广东振华科技股份有限公司 | A kind of horizontal magnetron sputtering film production line of multi-chamber and its film plating process |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN113557278A (en) * | 2020-02-19 | 2021-10-26 | 爱思开希高科技材料有限公司 | Multilayer film and laminate comprising same |
| CN113557278B (en) * | 2020-02-19 | 2023-07-04 | 爱思开迈克沃解决方案有限公司 | Multilayer film and laminate comprising same |
| CN111443670A (en) * | 2020-04-02 | 2020-07-24 | 蚌埠凯盛工程技术有限公司 | Control method and device for photovoltaic glass coating production line |
| CN113791510A (en) * | 2021-08-06 | 2021-12-14 | 河北光兴半导体技术有限公司 | Preparation system for electrochromic glass |
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