CN109166899A - Display base plate and preparation method thereof, display device - Google Patents
Display base plate and preparation method thereof, display device Download PDFInfo
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- CN109166899A CN109166899A CN201811025591.2A CN201811025591A CN109166899A CN 109166899 A CN109166899 A CN 109166899A CN 201811025591 A CN201811025591 A CN 201811025591A CN 109166899 A CN109166899 A CN 109166899A
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- boundary
- base plate
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- area
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/121—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/131—Interconnections, e.g. wiring lines or terminals
Abstract
The present invention provides a kind of display base plates and preparation method thereof, display device, belong to field of display technology.Wherein, the routing region of the display base plate includes the first area at grid line and data line crossover location and the second area in addition to the first area, the display base plate includes thin film transistor (TFT) and the passivation layer for covering the thin film transistor (TFT), organic film is provided on the passivation layer, the organic film includes the hollow-out parts at least corresponding to the first area.According to the technical solution of the present invention, it can be improved the yield of display base plate.
Description
Technical field
The present invention relates to field of display technology, a kind of display base plate and preparation method thereof, display device are particularly related to.
Background technique
The prior art is when making display base plate, after forming the passivation layer of covering thin film transistor (TFT), understands shape on the passivation layer
At one layer of organic film, and pixel electrode is formed over an organic film.The thickness of organic film is bigger, reaches micron level.By having
The distance between thin film transistor (TFT) and pixel electrode of display base plate can be improved in machine film, reduces the parasitic capacitance of display base plate,
To reduce the power consumption of display base plate.
But accumulation electricity is easy on the organic film at the routing region of display base plate, grid line and data line crossover location
Lotus forms charge release just once accumulation is excessive to generate ESD (Electro-Static discharge, Electro-static Driven Comb)
Phenomenon, so that the whole yield of display base plate declines.
Summary of the invention
The technical problem to be solved in the present invention is to provide a kind of display base plate and preparation method thereof, display device, Neng Gouti
The yield of high display base plate.
In order to solve the above technical problems, the embodiment of the present invention offer technical solution is as follows:
On the one hand, a kind of display base plate is provided, the routing region of the display base plate includes that grid line and data line intersect position
The first area for setting place and the second area in addition to the first area, the display base plate include thin film transistor (TFT) and covering
The passivation layer of the thin film transistor (TFT), is provided with organic film on the passivation layer, and the organic film includes at least corresponding to described the
The hollow-out parts in one region.
Further, the minimum spacing between the boundary of the first area and the boundary of the hollow-out parts is greater than default threshold
Value.
Further, the preset threshold is 350um.
Further, electrostatic guide figure is provided between the boundary of the hollow-out parts and the boundary of the first area.
Further, the hollow-out parts include adjacent the first boundary and the second boundary, first boundary and described
Angle between two boundaries is right angle, the electrostatic guide figure close to first boundary and the second boundary include with it is described
The first parallel conductive pattern of first boundary, second conductive pattern parallel with the second boundary and connection described first are led
The conductive connection part of electrograph shape and second conductive pattern, the conductive connection part are arc；Or the conductive connection part packet
Multiple successively end to end conductive line segments are included, angle formed by adjacent conductive line segment is obtuse angle；Or the conductive connection part with
Angle formed by first conductive pattern is obtuse angle, and the conductive connection part is with angle formed by second conductive pattern
Obtuse angle.
The embodiment of the invention also provides a kind of display devices, including display base plate as described above.
The embodiment of the invention also provides a kind of production method of display base plate, the routing region of the display base plate includes
First area at grid line and data line crossover location and the second area in addition to the first area, the production method packet
It includes:
It forms thin film transistor (TFT) and covers the passivation layer of the thin film transistor (TFT)；
Organic film is formed on the passivation layer, the organic film includes the hollow-out parts at least corresponding to the first area.
Further, the organic film that formed on the passivation layer includes:
One layer of photosensitive organic material is formed on the passivation layer；
The organic material is exposed using mask plate, the mask plate includes at least corresponding to the first area
Opaque patterns and the transparent figure in addition to the opaque patterns；
The organic material blocked by the opaque patterns is removed after development.
Further, the method also includes:
Electrostatic guide figure is formed between the boundary of the hollow-out parts and the boundary of the first area.
Further, the hollow-out parts include adjacent the first boundary and the second boundary, first boundary and described
Angle between two boundaries is right angle, is formed close to the electrostatic guide figure of first boundary and the second boundary
It includes:
Form first conductive pattern parallel with first boundary, second conductive pattern parallel with the second boundary
And the conductive connection part of connection first conductive pattern and second conductive pattern, the conductive connection part are arc；
Or the conductive connection part includes multiple successively end to end conductive line segments, angle formed by adjacent conductive line segment is obtuse angle；
Or angle formed by the conductive connection part and first conductive pattern is obtuse angle, the conductive connection part is led with described second
Angle formed by electrograph shape is obtuse angle.
The embodiment of the present invention has the advantages that
In above scheme, in the routing region of display base plate, it is not provided with organic film at grid line and data line crossover location,
The probability for reducing Accumulating charge at grid line and data line crossover location in this way can reduce display base plate and occur in routing region
The probability of ESD, to improve the yield of display base plate.
Detailed description of the invention
Fig. 1 is the schematic diagram of the routing region of existing display base plate；
Fig. 2 is the schematic diagram that ESD occurs for existing display base plate；
Fig. 3 is the schematic diagram of the routing region of one embodiment of the invention display base plate；
Fig. 4 is the schematic diagram of the routing region of another embodiment of the present invention display base plate.
Appended drawing reference
1 grid line
2 data lines
3 organic films
4 occur the position of ESD
5 hollow-out parts
51 first boundaries
52 the second boundaries
6 electrostatic guide figures
61 first conductive line segments
62 second conductive line segments
63 third conduction line segments
Specific embodiment
To keep the embodiment of the present invention technical problems to be solved, technical solution and advantage clearer, below in conjunction with
Drawings and the specific embodiments are described in detail.
Fig. 1 is the schematic diagram of the routing region of existing display base plate, as shown in Figure 1, routing region is provided with 1 sum number of grid line
According to line 2, wherein organic film 3 is covered at the crossover location of grid line 1 and data line 2, due to the intersection of grid line 1 and data line 2
There are segment differences at position, since segment difference influences in the coating procedure of organic film 3, easily in the intersection position of grid line 1 and data line 2
It sets place and generates charge buildup, once accumulation is excessively, charge release is formed just to generate ESD event, as shown in Fig. 2, 4 be generation
The position of ESD, the position that ESD occurs are normally on the coating direction of organic film 3, and ESD event will lead to the good of display base plate
The reduction of rate.
To solve the above-mentioned problems, the embodiment of the present invention provides a kind of display base plate and preparation method thereof, display device,
It can be improved the yield of display base plate.
The embodiment of the present invention provides a kind of display base plate, and the routing region of the display base plate includes that grid line and data line are handed over
The first area and the second area in addition to the first area that vent sets place, the display base plate include thin film transistor (TFT) and
The passivation layer of the thin film transistor (TFT) is covered, organic film is provided on the passivation layer, the organic film includes at least corresponding to institute
State the hollow-out parts of first area.
In the present embodiment, in the routing region of display base plate, it is not provided with organic film at grid line and data line crossover location,
The probability for reducing Accumulating charge at grid line and data line crossover location in this way can reduce display base plate and occur in routing region
The probability of ESD, to improve the yield of display base plate.
Further, the minimum spacing between the boundary of the first area and the boundary of the hollow-out parts is greater than default threshold
Value.The setting area of organic film should be made far from first area as far as possible, the setting area of organic film is at a distance from first area
It is remoter, then the lower of the probability of ESD occurs.
Preferably, the preset threshold be 350um, i.e., the boundary of the boundary of the setting area of organic film and first area it
Between minimum spacing be greater than 350um, enable to the setting area of organic film distant at a distance from first area in this way, significantly
Reduce the probability that ESD occurs.
In order to further reduce the charge of routing region accumulation, in boundary and the first area of the hollow-out parts
Electrostatic guide figure is provided between boundary, electrostatic guide figure is made of conductive material, with the grounding point on display base plate
Or connect with the default grounding point outside display base plate, the charge of routing region accumulation can be guided, it is coated to eliminate organic film
In journey or the case where other hardware fluctuate brought Accumulating charge, the probability that ESD occurs for routing region is further decreased.
In one specific embodiment, the hollow-out parts include adjacent the first boundary and the second boundary, first boundary and
Angle between the second boundary is right angle, and the electrostatic guide figure close to first boundary and the second boundary includes
First conductive pattern parallel with first boundary, second conductive pattern parallel with the second boundary and described in connecting
The conductive connection part of first conductive pattern and second conductive pattern, the conductive connection part are arc；Or the conduction is even
Socket part includes multiple successively end to end conductive line segments, and angle formed by adjacent conductive line segment is obtuse angle；Or the conduction is even
Angle formed by socket part and first conductive pattern is obtuse angle, formed by the conductive connection part and second conductive pattern
Angle is obtuse angle.
Due to corner region occur ESD probability it is higher, by electrostatic guide graphic designs be do not include right angle and
Acute angle is eliminated in organic film coating procedure so as to effectively guide electrostatic or other hardware fluctuates brought accumulation
The case where charge, reduces the probability that ESD occurs for routing region.
With reference to the accompanying drawing and display base plate of the invention is described further in specific embodiment:
As shown in figure 3, the routing region of display base plate is provided with grid line 1 and data line 2, display base plate includes 1 He of grid line
First area at 2 crossover location of data line and the second area in addition to the first area, in addition, also being set on display base plate
It is equipped with organic film 3, organic film 3 includes the hollow-out parts 5 of corresponding first area, wherein the corresponding meaning is first area aobvious
Show that the orthographic projection on substrate falls into hollow-out parts 5 in the orthographic projection on display base plate.Wherein, the boundary of hollow-out parts 5 and the firstth area
Spacing d between the boundary in domain is all larger than 350um, enables to the setting area of organic film ratio at a distance from first area in this way
Farther out, the probability that ESD occurs is substantially reduced.
In order to further reduce the charge of routing region accumulation, as shown in figure 4, boundary and institute in the hollow-out parts 5
It states and is provided with electrostatic guide figure 6 between the boundary of first area, electrostatic guide figure 6 can be with the grounding point on display base plate
Or the grounding point connection except display base plate, the charge of routing region accumulation can be guided.As shown in figure 4, hollow-out parts 5 include
The first adjacent boundary 51 and the second boundary 52, the angle between first boundary 51 and the second boundary 52 is right angle,
Electrostatic guide figure 6 includes successively end to end the first conductive line segment 62 of conductive line segment 61, second and third conduction line segment
63, wherein the first conductive line segment 61 and third conduction line segment 63 are parallel with the first boundary 51 and the second boundary 52 respectively, and first leads
Angle between wire segment 61 and the second conductive line segment 62 is obtuse angle, between third conduction line segment 63 and the second conductive line segment 62
Angle is obtuse angle, since the probability that ESD occurs for corner region is higher, electrostatic guide figure 6 is designed as not include right angle
And acute angle, and extend along the boundary of hollow-out parts 5, the charge of organic film edge accumulation both can have effectively been guided, it can also be effectively
Reduce the probability that ESD occurs for routing region.
It in the present embodiment, is designed by the structure to display base plate, at the crossover location of grid line and data line not
Organic film is set, so that at crossover location of the organic film far from grid line and data line, and design electrostatic guide figure and guide in time
Charge can substantially reduce the probability that ESD occurs for display base plate routing region, to promote the product yield of display base plate.
The embodiment of the invention also provides a kind of display devices, including display base plate as described above.The display device
It can be with are as follows: any products or components having a display function such as TV, display, Digital Frame, mobile phone, tablet computer, wherein
The display device further includes flexible circuit board, printed circuit board and backboard.
The embodiment of the invention also provides a kind of production method of display base plate, the routing region of the display base plate includes
First area at grid line and data line crossover location and the second area in addition to the first area, the production method packet
It includes:
It forms thin film transistor (TFT) and covers the passivation layer of the thin film transistor (TFT)；
Organic film is formed on the passivation layer, the organic film includes the hollow-out parts at least corresponding to the first area.
In the present embodiment, in the routing region of display base plate, it is not provided with organic film at grid line and data line crossover location,
The probability for reducing Accumulating charge at grid line and data line crossover location in this way can reduce display base plate and occur in routing region
The probability of ESD, to improve the yield of display base plate.
Wherein it is possible to be improved by the figure of the mask plate to production organic film, to change the shape of organic film.
When organic film is made of negativity photosensitive material, mask plate includes at least corresponding to the opaque patterns of the first area and removing
Transparent figure except the opaque patterns, the organic film that formed on the passivation layer include:
One layer of photosensitive organic material (negativity photosensitive material) is formed on the passivation layer；
The organic material is exposed using mask plate, the mask plate includes at least corresponding to the first area
Opaque patterns and the transparent figure in addition to the opaque patterns；
The organic material blocked by the opaque patterns is removed after development.
Certainly, organic film is not limited to be made of negativity photosensitive material, can also be made of positive photosensitive material,
When organic film is made of positive photosensitive material, mask plate includes at least corresponding to the transparent figure of the first area and except institute
The opaque patterns except transparent figure are stated, the organic film that formed on the passivation layer includes:
One layer of photosensitive organic material (positive photosensitive material) is formed on the passivation layer；
The organic material is exposed using mask plate, the mask plate includes at least corresponding to the first area
Transparent figure and the opaque patterns in addition to the transparent figure；
Retain the organic material blocked by the opaque patterns after development, removes the organic material being exposed.
Further, the method also includes:
Electrostatic guide figure is formed between the boundary of the hollow-out parts and the boundary of the first area.
In order to further reduce the charge of routing region accumulation, in boundary and the first area of the hollow-out parts
Electrostatic guide figure is provided between boundary, electrostatic guide figure is made of conductive material, with the grounding point on display base plate
Or connect with the default grounding point outside display base plate, the charge of routing region accumulation can be guided, it is coated to eliminate organic film
In journey or the case where other hardware fluctuate brought Accumulating charge, the probability that ESD occurs for routing region is further decreased.
In one specific embodiment, the hollow-out parts include adjacent the first boundary and the second boundary, first boundary and
Angle between the second boundary is right angle, is formed close to the electrostatic guide of first boundary and the second boundary
Figure includes:
Form first conductive pattern parallel with first boundary, second conductive pattern parallel with the second boundary
And the conductive connection part of connection first conductive pattern and second conductive pattern, the conductive connection part are arc；
Or the conductive connection part includes multiple successively end to end conductive line segments, angle formed by adjacent conductive line segment is obtuse angle；
Or angle formed by the conductive connection part and first conductive pattern is obtuse angle, the conductive connection part is led with described second
Angle formed by electrograph shape is obtuse angle.
Due to corner region occur ESD probability it is higher, by electrostatic guide graphic designs be do not include right angle and
Acute angle is eliminated in organic film coating procedure so as to effectively guide electrostatic or other hardware fluctuates brought accumulation
The case where charge, reduces the probability that ESD occurs for routing region.
Unless otherwise defined, the technical term or scientific term that the disclosure uses should be tool in fields of the present invention
The ordinary meaning for thering is the personage of general technical ability to be understood." first ", " second " used in the disclosure and similar word are simultaneously
Any sequence, quantity or importance are not indicated, and are used only to distinguish different component parts." comprising " or "comprising" etc.
Similar word means that the element or object before the word occur covers the element or object for appearing in the word presented hereinafter
And its it is equivalent, and it is not excluded for other elements or object.The similar word such as " connection " or " connected " is not limited to physics
Or mechanical connection, but may include electrical connection, it is either direct or indirectly."upper", "lower",
"left", "right" etc. is only used for indicating relative positional relationship, and after the absolute position for being described object changes, then the relative position is closed
System may also correspondingly change.
It is appreciated that ought such as layer, film, region or substrate etc element be referred to as be located at another element "above" or "below"
When, which " direct " can be located at "above" or "below" another element, or may exist intermediary element.
The above is a preferred embodiment of the present invention, it is noted that for those skilled in the art
For, without departing from the principles of the present invention, it can also make several improvements and retouch, these improvements and modifications
It should be regarded as protection scope of the present invention.
Claims (10)
1. a kind of display base plate, which is characterized in that the routing region of the display base plate includes grid line and data line crossover location
The first area at place and the second area in addition to the first area, the display base plate include thin film transistor (TFT) and covering institute
The passivation layer of thin film transistor (TFT) is stated, organic film is provided on the passivation layer, the organic film includes at least corresponding to described first
The hollow-out parts in region.
2. display base plate according to claim 1, which is characterized in that the boundary of the first area and the hollow-out parts
Minimum spacing between boundary is greater than preset threshold.
3. display base plate according to claim 2, which is characterized in that the preset threshold is 350um.
4. display base plate according to claim 1, which is characterized in that the boundary of the hollow-out parts and the first area
Electrostatic guide figure is provided between boundary.
5. display base plate according to claim 4, which is characterized in that the hollow-out parts include adjacent the first boundary and
Two boundaries, the angle between first boundary and the second boundary is right angle, close to first boundary and described second
The electrostatic guide figure on boundary includes first conductive pattern parallel with first boundary, parallel with the second boundary
The conductive connection part of two conductive patterns and connection first conductive pattern and second conductive pattern, the conductive connection
Portion is arc；Or the conductive connection part includes multiple successively end to end conductive line segments, the formed folder of adjacent conductive line segment
Angle is obtuse angle；Or angle formed by the conductive connection part and first conductive pattern is obtuse angle, the conductive connection part with
Angle formed by second conductive pattern is obtuse angle.
6. a kind of display device, which is characterized in that including display base plate according to any one of claims 1 to 5.
7. a kind of production method of display base plate, which is characterized in that the routing region of the display base plate includes grid line and data
First area at line crossover location and the second area in addition to the first area, the production method include:
It forms thin film transistor (TFT) and covers the passivation layer of the thin film transistor (TFT)；
Organic film is formed on the passivation layer, the organic film includes the hollow-out parts at least corresponding to the first area.
8. the production method of display base plate according to claim 7, which is characterized in that described to be formed on the passivation layer
Organic film includes:
One layer of photosensitive organic material is formed on the passivation layer；
The organic material is exposed using mask plate, the mask plate includes at least correspond to the first area impermeable
Light figure and the transparent figure in addition to the opaque patterns；
The organic material blocked by the opaque patterns is removed after development.
9. the production method of display base plate according to claim 7, which is characterized in that the method also includes:
Electrostatic guide figure is formed between the boundary of the hollow-out parts and the boundary of the first area.
10. the production method of display base plate according to claim 9, which is characterized in that the hollow-out parts include adjacent
First boundary and the second boundary, the angle between first boundary and the second boundary is right angle, is formed close to described
The electrostatic guide figure of one boundary and the second boundary includes:
Formed first conductive pattern parallel with first boundary, second conductive pattern parallel with the second boundary and
The conductive connection part of first conductive pattern and second conductive pattern is connected, the conductive connection part is arc；Or institute
Stating conductive connection part includes multiple successively end to end conductive line segments, and angle formed by adjacent conductive line segment is obtuse angle；Or institute
Stating angle formed by conductive connection part and first conductive pattern is obtuse angle, the conductive connection part and second conductive pattern
Angle formed by shape is obtuse angle.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811025591.2A CN109166899B (en) | 2018-09-04 | 2018-09-04 | Display substrate, manufacturing method thereof and display device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811025591.2A CN109166899B (en) | 2018-09-04 | 2018-09-04 | Display substrate, manufacturing method thereof and display device |
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| CN109166899A true CN109166899A (en) | 2019-01-08 |
| CN109166899B CN109166899B (en) | 2020-10-02 |
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| KR100729046B1 (en) * | 2005-12-09 | 2007-06-14 | 삼성에스디아이 주식회사 | static electricity discharge structure for organic display device and fabricating method of there |
| CN101566765A (en) * | 2009-05-27 | 2009-10-28 | 昆山龙腾光电有限公司 | Liquid crystal display device mother board |
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| CN109166899B (en) | 2020-10-02 |
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