CN109154067A - The vacuum system and method for one or more materials are deposited on substrate - Google Patents
The vacuum system and method for one or more materials are deposited on substrate Download PDFInfo
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- CN109154067A CN109154067A CN201780012216.1A CN201780012216A CN109154067A CN 109154067 A CN109154067 A CN 109154067A CN 201780012216 A CN201780012216 A CN 201780012216A CN 109154067 A CN109154067 A CN 109154067A
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- 238000000034 method Methods 0.000 title claims abstract description 43
- 238000000151 deposition Methods 0.000 claims abstract description 302
- 230000008021 deposition Effects 0.000 claims abstract description 285
- 238000001704 evaporation Methods 0.000 claims abstract description 49
- 230000000717 retained effect Effects 0.000 claims abstract description 7
- 230000008020 evaporation Effects 0.000 claims description 44
- 230000008569 process Effects 0.000 claims description 28
- 239000000969 carrier Substances 0.000 claims description 22
- 238000005339 levitation Methods 0.000 claims description 16
- 239000011368 organic material Substances 0.000 claims description 7
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- 239000011159 matrix material Substances 0.000 claims 1
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- 238000009826 distribution Methods 0.000 description 10
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- 230000009286 beneficial effect Effects 0.000 description 3
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- 238000004519 manufacturing process Methods 0.000 description 3
- 238000005240 physical vapour deposition Methods 0.000 description 3
- 229910001111 Fine metal Inorganic materials 0.000 description 2
- 229910001374 Invar Inorganic materials 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
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- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
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- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910000464 lead oxide Inorganic materials 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
- H01J37/185—Means for transferring objects between different enclosures of different pressure or atmosphere
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32733—Means for moving the material to be treated
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32733—Means for moving the material to be treated
- H01J37/32743—Means for moving the material to be treated for introducing the material into processing chamber
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
- H01J37/32899—Multiple chambers, e.g. cluster tools
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
A kind of vacuum system (100) for depositing one or more materials on substrate is described.Vacuum system (100) includes: the first transportation system (110), is configured on prevailing traffic direction (P) and transports substrate (10) along prevailing traffic path (101);With at least one deposition module (104), extend in the transverse direction (T) relative to prevailing traffic direction (P).First transportation system (110) is configured to that substrate (10) is retained in the orientation for being arranged essentially parallel to transverse direction (T) during transportation.In addition, describing a kind of method for depositing on substrate, particularly depositing one or more materials by evaporating.
Description
Technical field
The embodiment of present disclosure is related to a kind of for depositing the vacuum system of one or more materials on substrate.
More particularly, describe it is a kind of in one or more deposition modules in a manner of evaporation (evaporation) by a kind of or
A variety of organic materials are deposited on the vacuum system on multiple substrates.In addition, embodiment is related to depositing on substrate, particularly lead to
Pervaporation is come the method that deposits one or more materials.
Background technique
For some reason, become more next using the electrooptical device of organic material (Opto-electronic devices)
It is more universal.Many materials for manufacturing this device are relatively cheap, therefore organic photoelectric device has compared with inorganic device
The potentiality of cost advantage.The intrinsic property of organic material, as their elasticity, for such as in flexible base board or non-flexible substrate
It may be advantageous for the application of upper deposition.The example of organic photoelectric device includes organic light emitting apparatus (organic light
Emitting devices, OLED), organic photoelectric transistor (organic phototransistors), organic photovoltaic battery
(organic photovoltaic cells) and organic photodetectors (organic photodetectors).
The organic material of OLED device has more performance advantage than traditional material.For example, the wave of organic luminous layer transmitting light
Length can be adjusted easily with suitable dopant.OLED device utilizes the organic film for emitting light when applying voltage on device.
OLED device is becoming the technology increasingly to attract people's attention, for as flat-panel monitor (flat panel displays), photograph
The application such as bright device and back lighting device.
Material, especially organic material are typically deposited in the vacuum system under subatmospheric pressure
On substrate.During deposition, mask set can be arranged in the front of substrate, wherein mask set can have multiple open
Mouthful, these limited openings correspond to the patterns of openings to be deposited to the patterns of material on substrate, such as are deposited by evaporating.?
During deposition, the substrate is typically arranged in mask set rear, and is aligned relative to mask set.For example, can incite somebody to action
The mask carrier of carrying mask set transports in the deposition module of vacuum system, and can be by the substrate carrier of bearing substrate
It transports in deposition module, by substrate arranged at the rear of mask set.
Typically, then two kinds, three or more materials are deposited on substrate, for example, with colored aobvious for manufacturing
Show device.Disposing, there is the vacuum system of multiple deposition modules for different materials to be deposited on multiple substrates may have challenge
Property.In particular, this vacuum system is often extremely complex, the expensive and big quantity space of occupancy.
Therefore it provides a kind of compact and saving for being configured to that reliably one or more materials are deposited on substrate is empty
Between vacuum system will be beneficial.In particular, in the vacuum system for being configured to for material being deposited on substrate, simplify and
Substrate and/or mask transport and replacement is accelerated to will be beneficial.
Summary of the invention
In view of above-mentioned, provide it is a kind of for depositing the vacuum system of one or more materials on substrate, and in substrate
The method of the upper one or more materials of deposition.
According to the one side of present disclosure, a kind of vacuum system that one or more materials are deposited on substrate is provided.
Vacuum system includes: the first transportation system, is configured on prevailing traffic direction and transports substrate along prevailing traffic path;With
At least one deposition module extends on the transverse direction relative to prevailing traffic direction;Wherein the first transportation system is configured
With during substrate is in the transport along prevailing traffic path by substrate holder in the orientation for being arranged essentially parallel to transverse direction.
First transportation system can be configured to hold substrate, so that the major surfaces of substrate are substantially perpendicular to prevailing traffic
Direction, such as during along the substrate transport in prevailing traffic path.
According to the one side of present disclosure, provide a kind of for depositing the vacuum system of one or more materials on substrate
System.This vacuum system includes: the first transportation system, this first transportation system includes: transport vehicle, is configured to along mainly transporting
Transport one or more substrate carriers and/or one or more mask carriers in the prevailing traffic path that defeated side upwardly extends;It is multiple
Deposition module, neighbouring prevailing traffic path are arranged on first side and/or second side in prevailing traffic path;One or more the
Two transportation systems are configured to transport between transport vehicle and the multiple deposition module in a lateral direction one or more
A substrate carrier and/or one or more mask carriers;Wherein be configured to during transportation will be one or more for transport vehicle
A substrate carrier and/or mask carrier are retained in the orientation for being arranged essentially parallel to transverse direction.
Transport vehicle can be configured to hold one or more of substrate carriers and/or one or more mask carriers, make
The major surfaces of substrate carrier and/or mask carrier are substantially perpendicular to prevailing traffic direction and/or substantially vertical.One
A or multiple second transportation systems can be configured to transport one or more of substrate carriers and/or mask carrier, so that substrate
The major surfaces of carrier and/or mask carrier are oriented in the transporting direction and/or base of one or more of second transportation systems
It is vertical in sheet.
According to the one side of present disclosure, a kind of method that one or more materials are deposited on substrate is provided.This side
Method includes: transporting substrate along prevailing traffic path on prevailing traffic direction;This substrate is transported by prevailing traffic path
In at least one deposition module in transverse direction;With at least one described deposition module, it is special in depositing materials on substrates
It is not deposited by evaporating;Wherein the substrate is retained on during the transport along prevailing traffic path and is arranged essentially parallel to
In the orientation of transverse direction.
During along the substrate transport in prevailing traffic path, the major surfaces of substrate can be perpendicular to prevailing traffic direction.
In addition, during transport during the transport along prevailing traffic path and in a lateral direction, the major surfaces of substrate can be with
It is substantially vertical.
Present disclosure further aspect, advantage and feature are apparent in description and institute's accompanying drawings.
Detailed description of the invention
The mode and the disclosure that the above-mentioned detailed characteristics for the present disclosure summarized briefly above can specifically be understood
The particularly description of content, can obtain by referring to embodiment.Institute's accompanying drawings are related to the embodiment of present disclosure, and
And it is described below.Exemplary embodiment is shown in institute's accompanying drawings, and is described in detail in the description that follows.
Fig. 1 is the schematic diagram according to the vacuum system of embodiment as described herein.
Fig. 2 is the schematic diagram according to the vacuum system of embodiment as described herein.
Fig. 3 is the schematic diagram according to the deposition module of the vacuum system of embodiment as described herein.
Fig. 4 is the process for illustrating the method for depositing one or more layers on substrate according to embodiment as described herein
Figure.
Specific embodiment
It will now be made in detail various embodiments now, one or more of examples are illustrated in schema.Each example
All it is to be provided in a manner of explanation, is not meant as limiting.For example, the feature that the part as embodiment is painted or describes
It can be used in combination in any other embodiment, or with any other embodiment, it is other to generate another
Embodiment.Present disclosure is intended to include such modifications and variations.
In the description below to schema, identical drawing reference numeral indicates the same or similar component.In general, it only retouches
State the difference of each embodiment.Otherwise the description of the part in embodiment or aspect is also applied for separately unless otherwise specified,
Corresponding portion or aspect in one embodiment.
Fig. 1 is according to embodiment as described herein for depositing the vacuum system of one or more materials on the substrate 10
The schematic diagram of system 100.Vacuum system 100 includes: the first transportation system 110, is configured on the P of prevailing traffic direction along master
Transportation route 101 is wanted to transport substrate 10.Vacuum system further comprises at least one deposition module 104, at least one deposition mould
Block 104 extends on the transverse direction T relative to prevailing traffic direction P.In particular, substrate track 30, on transverse direction T by
Prevailing traffic path 101 extends at least one deposition module 104, is especially substantially perpendicular to prevailing traffic path 101.
In some embodiments, vacuum system 100 may include one or more transportation modules 108, one or more fortune
Defeated module 108 is disposed adjacently to one another into along prevailing traffic direction P with substantial linear arrangement mode, wherein transportation module
108 provide prevailing traffic path 101, along the path of the first transportation system 110 transport substrate.
One, two or more deposition module 102 may be disposed to adjacent to prevailing traffic path 101, such as main
On the first side S1 and/or second side S2 of transportation route 101.For example, at least one deposition module 104 can be disposed at transportation module
The first side S1 on and another deposition module can be disposed on second side S2 of transportation module, such as at least one deposition
Module 104 is opposite.In particular, at least one deposition module can be disposed at the two sides in prevailing traffic path 101 in vacuum system.?
In the illustrative embodiments of Fig. 1, two deposition modules are provided in every side in prevailing traffic path.It can provide other sink
Volume module, such as schematic depiction in Fig. 2.
It can be provided in the chamber wall between the transportation module 108 and deposition module 102 for forming prevailing traffic path 101 logical
Road, such as slit (slit) opening, so that can be moved between prevailing traffic path 101 and deposition module 102 by this channel
Substrate.For example, along substrate track 30, it, can be in prevailing traffic path by the slit opening in the chamber wall on transverse direction T
Moving substrate between 101 and at least one deposition module 104.
" deposition module " used herein can be regarded as the vacuum chamber or evacuable compartments of vacuum system 100, deposition module
Accommodate sedimentary origin, especially evaporation source 105, sedimentary origin is configured to deposition materials on substrate 10, particularly by evaporate come
Deposition.For example, evaporation source 105 is arranged in each deposition module 102 in the discribed embodiment of Fig. 1.In some implementations
In mode, two or more evaporation sources can be arranged in deposition module.
Evaporation source 105 can be configured to guide the material of evaporation into one or more substrates.In some embodiments,
Evaporation source 105 can be moved along the source transportation route in deposition module.Evaporation source can be along source transportation route linear movement (especially
It is on transverse direction T), while guiding the material of evaporation into substrate.During deposition, it can arrange that mask fills in front of substrate
It sets.Deposition module can be configured with using mask the deposition materials on substrate.At least some deposition modules can be configured with
Different materials, such as material, the second material, and/or third material are deposited on substrate.
Material can be the first color material of pixel array, such as blue material, and the second material can be pixel battle array
Second color material of column, such as red material and/or third material can be the third color material of pixel array, such as
Green material.Other material can be deposited on substrate in other deposition module.At least some materials, for example, material
Material and the second material, can be organic material.At least one material can be metal.For example, one or more or less can be deposited
Metal is in some deposition modules: aluminium (Al), golden (Au), silver-colored (Ag) and/or copper (Cu).At least one material can be transparent lead
Oxide material, such as ITO (indium tin oxide).At least one material can be transparent material.
Deposition module may include during deposition for arranging the deposition region of substrate.In some embodiments, at least
One deposition module and/or other deposition module may include two deposition regions, that is, be configured to the first of arrangement substrate 10
Deposition region 131, and it is configured to the second deposition region of arrangement the second substrate 11.In deposition module, the first deposition region
131 can be positioned opposite with the second deposition region 132.Evaporation source 105 can be configured then to guide into and be arranged in by the material of evaporation
The substrate 10 of first deposition region 131, and guide the second substrate 11 for being arranged in the second deposition region 132 into.For example, evaporation source
105 evaporation direction can be reversible, such as by at least part in rotary evaporation source 105, such as with the angle of 180 degree
Rotation.
During the deposition of the substrate 10 in the first deposition region 131 for being arranged in deposition module, the second deposition region 132
Can be used for what follows at least one or more: the second substrate to be coated is moved in the second deposition region;It will be coated
The second substrate remove the second deposition region;The second substrate being aligned in the second deposition region 132, for example, heavy relative to second
The mask set that there is provided is aligned in product region.Similarly, second in the second deposition region 132 for being arranged in deposition module
During the deposition of substrate 11, the first deposition region can be used for what follows at least one or more: first substrate to be coated is moved
It moves into the first deposition region;Coated first substrate is removed into the first deposition region;Be aligned in the first deposition region
One substrate, for example, being aligned relative to the mask set provided in the first deposition region.Therefore, by being mentioned in deposition module
For two deposition regions, the number of substrates being coated in given interval can be increased.In addition, the idle period of sedimentary origin
(idle times) can be reduced, for example, because sedimentary origin can be not at sky during by base plate alignment mask to be coated
Indexing is set (idle position), and the deposition that can be used on other substrates.
According to embodiment as described herein, at least one deposition module 104 is in the prevailing traffic relative to vacuum system
Extend on the transverse direction T in path 101.The extending direction of deposition module can be one or more substrate tracks in deposition module
Direction, and/or during deposition arrange substrate deposition module in one or more deposition regions extending direction.One
In a little embodiments, the extending direction of deposition module can correspond to the moving direction of evaporation source 105 in deposition module.In some realities
It applies in mode, the angle between the extending direction and prevailing traffic direction P of at least one deposition module 104 can be 30 degree or more
It is more, especially 60 degree or more, especially about 90 degree.In particular, at least one deposition module 104 can be substantially perpendicular to
The side of prevailing traffic direction P upwardly extends, as depicted in fig. 1.
For example, the substrate track 30 and/or the second substrate track 31 at least one deposition module 104 can be with lateral sides
Formula extends, especially substantially in a manner of relative to prevailing traffic path orthogonal.As depicted in fig. 1, prevailing traffic direction P
Angle between the substrate track 30 and/or the second substrate track 31 at least one deposition module 104 is about 90 degree.
Substrate to be coated can be loaded into vacuum system in the first end in prevailing traffic path 101, such as via
One load lock chamber (first load lock chamber), can be by the first transportation system 110, along prevailing traffic path
101 transport substrates, and coated substrate, example can be unloaded from vacuum system 100 in the second end in prevailing traffic path 101
Such as via the second load lock chamber (second load lock chamber).
Substrate can be transported by prevailing traffic path 101 at least one deposition module 104 on transverse direction T, base
Plate can be applied at least one deposition module 104, and prevailing traffic path 101 can be transported go back to along transverse direction T
In, to be transported in another deposition module.
According to embodiment as described herein, the first transportation system 110 is configured to that substrate holder exists during transportation
It is arranged essentially parallel in the orientation of transverse direction T.For example, as depicted in fig. 1, substrate 12 is held by the first transportation system 110
It is being substantially perpendicular to prevailing traffic direction P and is being arranged essentially parallel in the orientation of transverse direction T.
" orientation " of substrate can be regarded as the orientation of substrate major surfaces, that is to say, that when the orientation of substrate is substantially flat
Row is in transverse direction T, and the major surfaces of substrate substantially parallel (+/- 10 degree) are in transverse direction T.In Fig. 1, by the first transport
The orientation for the substrate 12 that system 110 is transported, is parallel to transverse direction T and perpendicular to prevailing traffic direction P.
In some embodiments, prevailing traffic direction P and transverse direction T can be substantially horizontal direction.Also
It is to say, the first transportation system 110 can be configured to transport substrate in first level direction, and substrate can be from prevailing traffic path
It is transported at least one deposition module 104 in the second horizontal direction for being different from first level direction.In the transport phase
Between, the orientation of substrate, which can be, to be substantially continuously parallel to transverse direction and/or is substantially perpendicular to prevailing traffic direction.It is special
It is not, during the transport along prevailing traffic path, and in prevailing traffic path and at least one deposition module and/or in addition
Deposition module between transport during, the direction of substrate can be held substantially constant.
In some embodiments, during transportation, the orientation of substrate can be substantially vertical.That is, transporting
Defeated period, such as during the transport by the first transportation system and/or during the transport by the second transportation system, the master of substrate
Want surface that can be substantially parallel to gravity vector (gravity vector).In particular, the first transportation system and the second fortune
Defeated system can be configured so that substrate and/or mask set to be retained in substantially vertical orientation.In particular, along main
During the transport of transportation route 101 and/or during the transport on transverse direction T, the major surfaces of substrate 12 be can be substantially
On be parallel to gravity vector (+/- 10 degree), be arranged essentially parallel to transverse direction T, and be substantially perpendicular to prevailing traffic direction
P。
Since during the transport along prevailing traffic path P, substrate 12 is oriented parallel to transverse direction T, substrate 12
At least one deposition can be moved into and removed from prevailing traffic path 101 in the case where no any rotation or pendulum motion
Module 104.In particular, the substrate rail during the transport along prevailing traffic path 101, at least one deposition module 104
The direction of road 30 and/or the second substrate track 31 can be corresponded to the orientation of substrate 12.Accordingly, the first transportation system 110 can be along
Prevailing traffic path 101 transport substrate 12 to on the intersection point of at least one deposition module 104.Therefrom, substrate 12 can be along
Substrate track 30 or along the second substrate track 31, is transported in deposition module on transverse direction T.When substrate track 30
The corresponding orientation to substrate 12 of orientation, it may be unnecessary to change the orientation of substrate, not need rotation, swing or pivot especially
Movement, can be moved to deposition module from prevailing traffic path along substrate track 30 or along the second substrate track 31 for substrate
In.
In particular, may not mentioned on intersection point between prevailing traffic path 101 and at least one deposition module 104
Substrate rotary module, substrate swing module, are configured to pivot the robot of substrate or another device to change substrate orientation
Device.
Substrate rotary module is provided when no on the intersection point of prevailing traffic path and deposition module, that is, it is compact to can provide construction
And cost-effective vacuum system.Further, since do not expend time rotary plate with by substrate by prevailing traffic path 101
(routing) is transported into deposition module 102, the cycle rate of vacuum system can be reduced.
Can be in some embodiments in conjunction with other embodiments as described herein, it is possible to provide the second transportation system
120, substrate is transported at least one deposition module 104 and/or transport by prevailing traffic path 101 on transverse direction T
It returns in prevailing traffic path 101.Second transportation system 120 can be configured to transport along the substrate track extended in a lateral direction
Defeated substrate, while the orientation of substrate is essentially corresponded to the orientation of substrate track.
First transportation system 110 and the second transportation system 120 can be configured to make the orientation of substrate basic during transportation
On be continuously kept parallel (+/- 20 degree, 10 degree especially +/-) in transverse direction T, and/or be substantially perpendicular to prevailing traffic
Direction P.In particular, the first transportation system 110 and the second transportation system 120 can be configured so that substrate orientation is kept substantially perseverance
It is fixed.During substrate transmits between the first transportation system 110 and the second transportation system 120, the orientation of substrate can also be substantially
It keeps constant.That is, the major surfaces of substrate and the inclination angle of transverse direction T can be constantly during substrate transport
Less than 20 degree, particularly less than 10 degree.In particular, between the two, three or more deposition module in vacuum system
When transporting substrate, the orientation of substrate can be made not change.
Second transportation system 120 may include substrate track 30 and for along 30 moving substrate of substrate track transport dress
It sets.Substrate track 30 can be extended at least one deposition module 104 on transverse direction T by prevailing traffic path 101.
In some embodiments, the second transportation system 120 can be configured on transverse direction T along substrate track 30
Transport during, non-contactly hold substrate 10.For example, the second transportation system may include magnetic levitation system, magnetic levitation system warp
Configuration is for non-contactly holding substrate.
In some embodiments, substrate track 30 (being shown in Fig. 1 with dotted line) can be extended to by prevailing traffic path 101
In first deposition region 131 of at least one deposition module 104, and the second substrate track 31 (being shown in Fig. 1 with dotted line) can
It is extended in the second deposition region 132 of at least one deposition module 104 by prevailing traffic path 101.Substrate track 30 and
Two substrate tracks 31 can extend parallel to each other on transverse direction T.Can provide the second transportation system on transverse direction T along
Substrate track 30 transports substrate, and the edge on transverse direction T between prevailing traffic path 101 and the first deposition region 131
The second substrate track 31 transport substrate between prevailing traffic path 101 and the second deposition region 132.In some embodiments
In, the second transportation system may include magnetic levitation system, and magnetic levitation system is configured to non-on transverse direction T during transportation connect
It contacts to earth and holds substrate.Therefore, less granular generation can be subtracted during being conveyed into and deposition module out, and deposition knot can be improved
Fruit.
Can be in some embodiments in conjunction with other embodiments as described herein, the first transportation system 110 includes
Transport vehicle 111, this transport vehicle can be moved along prevailing traffic path 101.For example, transport vehicle 111 can be on the P of prevailing traffic direction
It is moved along the track road extended along prevailing traffic path 101.
In some embodiments, the first transportation system 110 may include driving unit, and driving unit is configured to along master
Want the mobile transport vehicle 111 of transportation route 101.Driving unit may include Linear actuator, such as linear motor or spindle driver,
Especially electric motor.
It can provide fixation member of the driving unit of the first transportation system 110 as vacuum system, and can not be with transport
Vehicle 111 moves together.Accordingly, transport vehicle 111 can not carry battery, power supply and/or cable.In particular, can be along main fortune
The track road that defeated path extends passively directs transport vehicle 111.When transport vehicle 111 is fixed driving part driving, can reduce
The weight and complexity of transport vehicle 111.
Can be in some embodiments in conjunction with other embodiments as described herein, in transport vehicle 111 along main
The mobile period of transportation route 101, it is possible to provide magnetic levitation system on track road non-contactly to hold transport vehicle 111.Alternatively,
Mechanically transport vehicle 111 can be supported on track road.For example, transport vehicle 111 may include multiple rollers, the multiple roller is through matching
It sets to be guided along track road.
It should be noted that according to some embodiments as described herein, during processing of the substrate in vacuum system,
Substrate is attached to substrate carrier." substrate carrier " used herein can be interpreted as being configured to a kind of dress of bearing substrate
It sets, wherein substrate can be attached on the retaining surface of substrate carrier.Substrate carrier can be configured for use in transport and sink
Stablize substrate during product.During processing, keep substrate stable by substrate carrier and fixing substrate can be it is reasonable, because of substrate
It itself can be frangible and thin component, such as thickness is less than the thin glass plate of 1mm.
During the transport along prevailing traffic path, during the transport of disengaging transportation module, and during deposition,
Substrate 12 can be attached on substrate carrier.It in some embodiments, during transportation and/or during deposition, can be with non-
Substrate is attached on substrate carrier by horizontal direction, especially in substantially vertical orientation.For example, can be by substrate with electrostatic
Mode is attached on the vertical retaining surface of substrate carrier.
Term " carrier " as used herein can refer to the substrate carrier for being configured to bearing substrate, or is configured to carrying and covers
The mask carrier of mold device.Mask carrier is configured to carry mask set during processing, i.e. true during this processing
During transport in empty set system and/or during deposition.In some embodiments, mask set can be in substantially vertical orientation
On be retained on mask carrier.
Carrier may include the carrier element with retaining surface, which is configured to bearing substrate or mask dress
It sets, especially in substantially vertical orientation.For example, substrate can be attached on substrate carrier by locking device, for example, by
It electrostatic chuck and/or is attached by magnetic chuck.For example, mask set can be attached on mask carrier by locking device, example
Such as, it is attached by electrostatic chuck and/or by magnetic chuck.Other kinds of locking device can be used.
" transport ", " movement " or " transport " of as used herein substrate or mask set typically refers to consolidating in carrier
Corresponding each movement that the carrier of substrate or mask set is held on surface is held, especially in substantially vertical orientation.
Can be in some embodiments in conjunction with other embodiments as described herein, transport vehicle 111 may include in cross
Extend and be configured to the first vector supporting element 112 of support carrier on the T of direction, that is, substrate carrier or mask carrier.First
Carrier support 112 may include the support surface of transport vehicle 111, move the phase along prevailing traffic path 101 in transport vehicle 111
Between, the substrate carrier of fixing substrate (substrate 12 of example as shown in figure 1) can be placed on a support surface.
In some embodiments, the slit that first vector supporting element 112 can be configured to extend on transverse direction T
(slot), wherein carrier can be placed in slit during the transport along prevailing traffic direction P, such as adjacent to can quilt
The Second support being placed in the second slit of transport vehicle.In some embodiments, it is possible to provide such as quilt of magnetic induction element
Induction element is moved adjacent to first vector supporting element 112, carrier is guided on transverse direction T by transport vehicle 111 with safety.Example
Such as, it is moved by transport vehicle 111 into deposition module on transverse direction T when carrier, or when carrier is moved back to by deposition module
On transport vehicle 111, passive guidance element can guarantee that carrier is properly placed on first vector supporting element 112.In some implementations
In mode, it is possible to provide multiple passive guidance elements are on transport vehicle 111, adjacent to corresponding each carrier support.
Period, the first vector supporting element 112 of transport vehicle 111 are moved along prevailing traffic path 101 in transport vehicle 111
The weight of the substrate carrier of fixing substrate 12 can be carried.In particular, not having during substrate is moved along prevailing traffic path
Magnetic suspension system can provide for bearing substrate vehicle weight.Due to there is no magnetic levitation system that may provide in prevailing traffic
Transport on the P of direction, can reduce the complexity of vacuum system, and can provide the first cost-effective transportation system.Especially
It is that the first transportation system 110 includes moveable transport vehicle, and carrying holds the substrate carrier of substrate during transportation, this first
Transportation system is simple and effective, and allows quick substrate transport.
Can in some embodiments in conjunction with other embodiments as described herein, transport vehicle 111 may include two,
Four, six or more carrier support, these carrier supports extend in a lateral direction respectively.For example, describe in Fig. 1
Transport vehicle 111 includes that first vector supporting element 112 and the Second support extended in parallel relative to first vector supporting element 112 support
Part 113.First vector supporting element 112 can be configured first substrate carrier and Second support branch to support fixing first substrate
Support member 113 can be configured the second substrate carrier to support fixing the second substrate.Alternatively or additionally, first vector supports
At least one of part and Second support supporting element can be configured the mask carrier to support fixing mask set.Accordingly, it transports
Vehicle 111 can be configured with while support and transporting two or more substrates or mask set.
Transport vehicle 111 may include multiple carrier supports.For example, the carrier support for being configured to support mask carrier can
Adjacent to the carrier support for being configured to supporting substrate carrier.The distance between described carrier support can be corresponded to deposition mould
The distance between mask track and substrate track in block.Accordingly, mask set and substrate can be transported to simultaneously from transport vehicle 111
In deposition module, vice versa.
In some embodiments, carrier support can be configured to support and will return from the downstream part in prevailing traffic path
To the empty carrier of the upstream portion in prevailing traffic path.
Driving box can provide for being moved to carrier in deposition module by transport vehicle 111 on transverse direction T, or vice versa
, driving box includes the driving unit of such as Linear actuator.In particular, in order to be supported on load from the movement of transport vehicle 111
Carrier on body supporting element, can be first by magnetic suspension unit suspending carrier, and can then move in a lateral direction via driving unit
Dynamic load body.Driving unit can be fixation member, that is to say, that driving unit can not be transported and then transport vehicle 111 together.Or
Preferably, when carrier is properly positioned relative to corresponding each deposition module, driving unit, which can be located at, to be arranged in below carrier
Fixation driving box in.Magnetic suspension unit and driving unit are the part of the second transportation system.Magnetic suspension unit may be arranged at
In the built-in box of vacuum system roof, driving unit may be arranged to be protruded into the built-in box in vacuum system by bottom wall.Alternatively, driving
Moving cell is also disposed in the built-in box of roof.
In some embodiments, two or more carrier supports may be disposed to for filling substrate and/or mask
Set the first deposition region 131 at least one deposition module of transport disengaging, and two or more other carrier supporteds
Part can be arranged to passing in and out substrate and/or mask set transport into the second deposition region 132 at least one deposition module.It can
Alternatively or additionally, at least one carrier support can be configured with the substrate carrier of the coated substrate of support bearing, and
At least one carrier support can be configured to the substrate carrier of support bearing substrate to be coated.Alternatively or additionally
Ground, at least one carrier support can be configured with the mask carrier of support bearing mask set ready for use and at least one
Carrier support can be configured to support the mask set to unload from vacuum system.It is fast and simple from the deposition region of deposition module
What single replacement mask set and/or substrate was possible to.
Since can multiple mask carriers, substrate carrier and/or empty carrier be transported by transport vehicle 111 simultaneously, provides to have and use
It will increase the flexibility of vacuum system in the transport vehicle 111 for the multiple carrier supports for supporting multiple mask carriers and/or substrate,
Furthermore the cycle rate that vacuum system but will be reduced, depends on the circumstances above.For example, transport vehicle 111 may include at least six loads
Body supporting element, wherein at least two carrier support may be disposed to the upstream edge adjacent to transport vehicle 111, and can be configured
It is arrived with transport agent and the first deposition region 131 of deposition module out, and at least two carrier supports can be arranged to phase
Adjacent to the downstream edge of transport vehicle 111, and can be configured with the second deposition region 132 of transport agent disengaging deposition module.
In some embodiments, the carrier support of transport vehicle 111 can be configured to transport substrate carrier and mask and carry
Body, such as when mask carrier such as height and/or the size of thickness are essentially corresponded to such as height and/or thickness of substrate carrier
When the size of degree.
Can be in some embodiments in conjunction with other embodiments as described herein, at least one deposition module 104
It may include that there is the first deposition region 131 of substrate track 30, and the second deposition region 132 with the second substrate track 31,
Transport vehicle 111 may include first vector supporting element 112 to support first substrate carrier and the second base carrier supporting element 113 to prop up
Support the second substrate carrier.In some embodiments, the first distance D1 base between substrate track 30 and the second substrate track 31
It corresponds in sheet to the second distance D2 between first vector supporting element 112 and Second support supporting element 113.Accordingly, transport vehicle 111
It can be used in the first deposition region 131 and the second deposition region 132 while replacing substrate.
Can be in some embodiments in conjunction with other embodiments as described herein, the first transportation system 110 can be through
Configuration with during the transport along prevailing traffic path in the orientation for being parallel to substrate and being orientated (that is, being parallel to transverse direction T)
The one or more mask sets of upper fixing.In particular, the first transportation system 110 may include transport vehicle 111, it is configured wherein having
To support one or more carrier supports of mask carrier.Carrier support can extend in a lateral direction, such as propping up
Support the direction mask carrier parallel with transverse direction T.
Can be in some embodiments in conjunction with other embodiments as described herein, prevailing traffic path 101 be in master
Want substantial linear extension on transporting direction P.It should be noted that in some embodiments, prevailing traffic path can have non-
Linear arrangement, in Fig. 1 describe linear arrangement be only an example.Prevailing traffic path can be regarded as the road along substrate transport
Diameter, and substrate can be carried out prevailing traffic path on intersection point comprising one or more intersection points by prevailing traffic path, and
Into in one or more deposition modules with material coated substrates.Substrate can be shipped back to one or more of prevailing traffic path
On a intersection point, to continue on prevailing traffic path transport substrate.
In some embodiments, transverse direction T is substantially perpendicular to prevailing traffic direction P.In some embodiments,
During transportation, the major surfaces of substrate and/or the major surfaces of mask set are substantially vertical (+/- 10 degree).
Can be in some embodiments in conjunction with other embodiments as described herein, at least one deposition module 104
In can provide evaporation source 105.Evaporation source can be that removable and/or this evaporation source can be configured to have one on transverse direction T
Machine material is oriented to substrate.
As Fig. 1 describes, vacuum system 100 may include multiple first sides deposition module and multiple second side deposition modules,
First side deposition module is located on the first side S1 in prevailing traffic path 101, and second side deposition module is located at prevailing traffic path
On 101 second side S2, wherein the first side deposition module and second side deposition module can extend on transverse direction T respectively.It is special
It is not that the substrate track in deposition module can extend on transverse direction T respectively.In some embodiments, second side deposits
Module can be relatively arranged with the first side deposition module respectively, as depicted in fig. 1.In particular, substrate track 30 can be from
First deposition region of side deposition module extends linearly, and passes through prevailing traffic path 101 and enters second side deposition module
In first deposition region.Alternatively or additionally, the second substrate track 31 can be from the second crystallizing field of the first side deposition module
Domain 132 extends linearly, and passes through prevailing traffic path 101 and enters in the second deposition region of second side deposition module.Accordingly, when
Transport vehicle 111 is on a position of carrier support each rail alignment corresponding with prevailing traffic path two sides of transport vehicle
When, substrate can be transported in the first side deposition module by transport vehicle 111, and/or into second side deposition module.
Substrate can be then transported by prevailing traffic path 101 to multiple first sides deposition module and/or to multiple second side
It in deposition module, is stacked on substrate with deposition materials, especially while the orientation of substrate is constantly made to remain parallel to transverse direction
Direction T.
It can provide multiple second transportation systems, with heavy in prevailing traffic path and the first side deposition module and/or second side
The substrate carrier of transport fixing substrate between volume module.Second transportation system may include magnetic levitation system, and magnetic levitation system is through matching
It sets non-contactly to hold substrate carrier during transport in a lateral direction.
According to embodiment as described herein for depositing the vacuum system 100 of one or more materials on substrate,
It may include first transportation system 110 with transport vehicle 111, transport vehicle 111 is configured to prolong along on the P of prevailing traffic direction
Transport one or more substrate carriers and/or mask carrier in the prevailing traffic path 101 stretched.One or more of substrate carriers
Corresponding each substrate can be carried, and one or more mask carriers can carry corresponding each mask set.Vacuum system
It can further comprise multiple deposition modules 102 and multiple second transportation systems, multiple deposition modules 102 are arranged adjacent to mainly
Transportation route 101 on the first side S1 and second side S2 in prevailing traffic path 101, multiple second transportation systems be configured to by
Transport vehicle 111 transports in multiple deposition modules on one or more substrate carriers and/or mask carrier to transverse direction (T).
Transverse direction T can extend on relative to angle of the prevailing traffic direction P at 30 degree or greater than 30 degree, especially at about 90 degree
Angle on.
Transverse direction T can correspond to the direction of one or more substrate tracks into multiple deposition modules.Transport vehicle 111 can
Be configured to hold in the orientation for being arranged essentially parallel to transverse direction T during transportation one or more substrate carriers and/or
Mask carrier.In particular, transport vehicle 111 may include one or more carrier supports to support carrier, wherein carrier support
Extend on transverse direction T.Due in the transport between prevailing traffic path and deposition module, substrate and mask set are taken
To that can not change, substrate and mask set can accelerate from transport of the prevailing traffic path into deposition module.Along main
The orientation of substrate during the transport of transportation route 101 and/or the orientation of mask set can be corresponded to heavy in deposition module
The orientation of substrate during product and/or the orientation of mask set.
In some embodiments, substrate in vacuum system by during the transport of multiple subsequent deposition modules, substrate
Orientation substantial constant (+/- 10 degree) can be kept can then to deposit multiple materials to substrate in deposition module.Cause
Process time required for rotating for substrate can be reduced, and can reduce the circulation time of vacuum system.
Fig. 2 is the schematic diagram according to the vacuum system 200 of embodiment as described herein.The vacuum system 200 of Fig. 2 can wrap
It includes some or all of features of vacuum system 100 in Fig. 1, therefore this can be held and repeated no more with reference to described above.
For example, vacuum system 200 may include multiple vacuum systems 100 as depicted in fig. 1 as its component part,
Middle vacuum system 100 may be disposed to adjacent to each other along prevailing traffic direction P, allow a large amount of material or layer then in vacuum system
It is deposited on substrate in 200 in system.For example, can be in vacuum system 200 by the folded deposition of the layer heap including five, ten or more layers
To substrate.
Vacuum system 200 may include the first transportation system, and the first transportation system is configured to along in prevailing traffic direction P
On prevailing traffic path 101 transport one or more substrates and/or mask set.Vacuum system 200 can further comprise more
A second transportation system, multiple second transportation systems, which are configured on transverse direction T, sinks in prevailing traffic path 101 with multiple
Transported between volume module 102 and/or other modules arranged adjacent to prevailing traffic path 101 one or more substrates and/or
Mask set.
For example, the second transportation system as described herein can be configured in a lateral direction, in prevailing traffic path 101
It swings between module and transports with the one or more substrate loading or unloading modules and/or substrate arranged adjacent to prevailing traffic path
Defeated one or more substrate.Alternatively or additionally, the second transportation system as described herein can be configured mainly to transport
Transport one or more is covered between defeated path 101 and the one or more mask process modules arranged adjacent to prevailing traffic path
Mold device.Alternatively or additionally, the second transportation system as described herein can be configured with prevailing traffic path 101 with
Adjacent to empty carriers between one or more carrier storage modules of prevailing traffic path arrangement.
Can be in some embodiments in conjunction with other embodiments as described herein, the second transportation system may include magnetic
Levitation device and driving unit, magnetic levitation system are configured to non-contactly hold substrate carrier or mask carrier, and driving is single
Member is configured to move the substrate carrier or mask carrier that the same time is held by magnetic levitation system along track.For example, each
Second transportation system may include suspension box and driving box, and suspension box, which is configured to provide, is used to bearing substrate carrier or mask carrier
The magnetic force of weight, driving box are configured to move the carrier of suspension along track.Levitation device can be arranged in and be provided in vacuum
In built-in box on the roof of system.For example, magnetic levitation system can be arranged in the groove provided in the roof of vacuum system
In.
Vacuum system 200 may include multiple first sides deposition module and multiple second deposition modules, the first side deposition module
It is arranged on the first side S1 in prevailing traffic path, the second deposition module is arranged on second side S2 in prevailing traffic path.
In some embodiments, vacuum system 200 is configured as image line, wherein only in the first side deposition module
First subset of coated substrates, and then only in second side deposition module coated substrates another subset.In an image line,
First side deposition module can be substantially the mirror image of second side deposition module, and two deposition modules positioned opposite can be through matching
It sets to deposit identical material.In other embodiments, each substrate then can be carried through the first side deposition module
With second side deposition module.
First transportation system may include the one or more transports for being configured to move along prevailing traffic path 101
Vehicle 111.For example, the first transportation system may include two or more transport vehicles 111, as depicted in Figure 2.Transport vehicle can be
It can be moved along the track road extended along prevailing traffic path 101.Each transport vehicle can be arranged with adjacent to prevailing traffic path
Scheduled vacuum module connection, these vacuum modules are for example on the first side S1 and/or second side S2 in prevailing traffic path.
For example, each transport vehicle can be in the scheduled partial movement in prevailing traffic path during the operation of vacuum system.
For example, the first transport vehicle can be mobile in the upstream portion in prevailing traffic path 101, and it is configured for use in
May include between the substrate loading module 201 of substrate oscillating table and the first side deposition module and second side deposition module 202, along
Transport substrate in prevailing traffic path.This part does not need mask transport.In some embodiments, the first transport vehicle include two or
Four carrier supports, these carrier supports are configured to support and are up to four substrate carriers extended on transverse direction T.
One or more transport vehicles can be mobile in the respective middle section in prevailing traffic path 101, and is configured to
Between respective multiple first sides deposition module and second side deposition module 203 and/or mask process module 211, along main
Transportation route transports substrate and/or mask set.One or more transport vehicles may include the carrier support more than four, such as
Six or more.Accordingly, one or more transport vehicles can transport multiple mask sets and/or substrate simultaneously.
Another transport vehicle can be mobile in the downstream part in prevailing traffic path 101, and being configured to may include base
Between the substrate Unload module 205 of plate oscillating table and the first side deposition module and second side deposition module 204, along prevailing traffic
Transport substrate in path.This part does not need mask transport.In some embodiments, this another transport vehicle includes two or four
Carrier support, these carrier supports are configured to support and are up to four substrate carriers extended on transverse direction T.
Each transport vehicle 111 may include multiple carrier supports extended in a lateral direction.Carrier support can be through matching
It sets with the substrate carrier of support bearing substrate, this substrate has the orientation of transverse direction, in particular perpendicular to the shifting of transport vehicle 111
Dynamic direction.In particular, the orientation of substrate can be parallel to transverse direction when transport vehicle is moved along prevailing traffic path 101.
Alternatively or additionally, the mask carrier that carrier support can be configured with support bearing mask set, this mask set tool
There is the orientation of transverse direction, in particular perpendicular to the moving direction of transport vehicle 111.
In some embodiments, vacuum system 200 may include one or more mask process modules 211, one or more
A mask process module 211 is arranged adjacent to prevailing traffic path 101 and is located at the first side S1 in prevailing traffic path 101
And/or on second side S2.Mask process module 211 may include mask process component, such as mechanical arm, and mask process component is through matching
It sets to load mask set into vacuum system and/or unload mask set from vacuum system, such as loads to load-lock
In chamber.Mask process component can be configured with the mask dress in the mask carrier in attachment and/or unloading mask process module
It sets.
For example, mask set ready for use can be loaded on the first side S1 of vacuum system into vacuum system 200, very
It can provide the first side mask process module on first side S1 of empty set system 200.It, can be by mask in the first side mask process module
Device is attached on mask carrier.In mask process module 211, mask carrier, which is oriented in, is parallel to transverse direction T.Example
Such as, in mask process module 211, it is possible to provide mask carrier is on the mask track extended on transverse direction T.
When mask set is attached on mask carrier in the first side mask process module, can be existed by the second transportation system
This mask carrier is transported into prevailing traffic path 101 on transverse direction T and arrives the carrier support of one of transport vehicle 111
On.Transport vehicle can be along prevailing traffic path 101, and a deposition module 102 transports mask carrier thereto, wherein this deposition mould
Block 102 is the place using mask set.Then by the second transportation system, by mask carrier from the carrier supported of transport vehicle 111
On part along the mask rail transport in transverse direction into deposition module.Before this, used mask set can be moved
Deposition module out.
In some embodiments, second side S2 by used mask set in vacuum system is unloaded from vacuum system
It carries, wherein second side S2 of vacuum system can provide second side mask process module.It, can be by second side mask process module
Used mask set is got off from mask carrier unloading, and unloaded from vacuum system by mask process component, such as mechanical arm
It carries.Before unloading, the mask carrier for carrying used mask set can be transported from one of by the second transportation system
The carrier support of vehicle 111 transports second side mask process module, especially extends at second side mask in transverse direction
On the mask track for managing component.
In some embodiments, transport vehicle 111 may include carrier support, and it is unloaded that carrier support is configured to support
Body.Empty carrier can be transported the upstream portion to prevailing traffic path from the downstream part in prevailing traffic path.In particular, can be
Substrate Unload module 205 unloads coated substrate from substrate carrier, can be by coated substrate in substrate Unload module 205
It is unloaded from vacuum system.Empty carrier can be transported back to substrate loading module 201, it can will be to be coated in substrate loading module 201
The new substrate of cloth is attached on carrier.
In some embodiments, it can be provided on the first side S1 and/or second side S2 adjacent to prevailing traffic path 101
Carrier storage module or " empty carrier parks module ".Carrier storage module can be used for temporarily storing empty carrier, and being especially used for will
Empty carrier is handed over to another transport vehicle moved in the more upstream part in prevailing traffic path from transport vehicle.In some implementations
In mode, one or more mask process modules 211 can be used as carrier storage module or empty carrier parks module.
In some embodiments, the first subset of mask process module 211 is configured to processing use in deposition module
The first deposition region in mask set and mask process module 211 second subset be configured to processing use sinking
Mask set in second deposition region of volume module.
In some embodiments, without providing power supply on transport vehicle 111.Opposite, can passively it draw along track road
Transport vehicle 111 is led, such as is guided by the fixation driving unit of such as Linear Driving.Passive guidance can be fixed on transport vehicle
On.In some embodiments, the media provision that transport vehicle is provided with electricity, cooling liquid or other fluids is not provided.It can mention
For light-weight and simple transport vehicle.
In some embodiments, maintenance module (being not shown in schema) can be connected to one or more deposition modules
102.Evaporation source can be that movably, evaporation can be overhauled or repair by overhauling module herein into maintenance module from deposition module
Source.For example, the crucible (crucible) of evaporation source can be replaced in maintenance module.
According to embodiment as described herein, due to substrate during being transported by vacuum system and/or mask set
Direction can keep substantial constant, can reduce for change substrate orientation rotary module quantity.Because not with rotor
The related limitation of interference profile, it is possible to increase the deposition of the vacuum system per unit length on the P of prevailing traffic direction
The quantity of module.This will reduce the cost and the quantity of transport substrate and/or the component of mask set of vacuum system.
In some embodiments, in substrate carrier and mask carrier on the length direction of corresponding each carrier (that is,
On the transverse direction T relative to prevailing traffic path) it can provide magnetic levitation system on the position moved along track.For example,
It can provide magnetcisuspension floating box, for carrier transverse direction to be conveyed into out the deposition module for being arranged in prevailing traffic path side, base
Plate loading module, substrate Unload module and/or mask process module.It does not provide for along prevailing traffic path transport agent
Magnetcisuspension floating box.By providing the transport vehicle being configured to along prevailing traffic path transport agent, escapable cost.
During along prevailing traffic path by 111 transport agent of transport vehicle, carrier can be contacted with transport vehicle 111 (not to be had
Have suspension), that is to say, that transport vehicle 111 can carry the weight of carrier.
As depicted in Figure 2, at least four tracks can extend respectively on transverse direction T from prevailing traffic path 101
In each deposition module.Two outside tracks can be substrate track, and substrate track is configured to transport substrate carrier and two
Inner orbit can be mask track, and mask track is configured to transport mask carrier.It accordingly, can be along substrate track and mask rail
Road transports substrate and mask set into the first deposition region and the second deposition region of deposition module from transport vehicle 111.
Second transportation system can provide for non-contactly transporting substrate carrier along substrate track and along mask track
Non-contactly transport mask carrier.During the transport along substrate track, the orientation of substrate can be parallel to substrate track
Orientation, and during the transport along mask track, the orientation of mask set can be parallel to the orientation of mask track.
Second transportation system can be configured in a lateral direction along the non-contacting transport agent of respective track
Fig. 3 is the schematic diagram according to the deposition module 300 of the vacuum system of embodiment as described herein.Deposition module
300 may be disposed to the prevailing traffic path 101 adjacent to vacuum system as described herein.It can be by the substrate carrier of bearing substrate
And/or the mask carrier of carrying mask set transports the deposition region to deposition module from transport vehicle 111, vice versa, wherein
This transport vehicle 111 can be moved along prevailing traffic path 101.
Transport vehicle 111 may include multiple carrier supports 301, with the movement in transport vehicle 111 on the P of prevailing traffic direction
Period supports mask carrier and/or substrate carrier.Carrier support 301 can extend on transverse direction T, for example, to support tool
It is parallel to the carrier in the direction of transverse direction T.
Substrate track 30 can extend to the first deposition region 131 from prevailing traffic path 101 on transverse direction T, and/or
The second substrate track 31 can extend to the second deposition region 132 from prevailing traffic path 101 on transverse direction T.There is provided second
Transportation system from the first substrate carrier of the transport bearing substrate 10 of transport vehicle 111 to first for sinking along substrate track 30
Product region 131.The second transportation system is provided for transporting the second base of carrying from transport vehicle 111 along the second substrate track 31
The second substrate carrier of plate 11 is to the second deposition region 132.
Mask track 32 can extend to the first deposition region 131 from prevailing traffic path 101 on transverse direction T, and/or
Second mask track 33 can extend to the second deposition region 132 from prevailing traffic path 101 on transverse direction T.There is provided second
Transportation system for transporting the mask carrier for carrying mask set 13 to first from transport vehicle 111 along mask track 32 to sink
Product region 131.The second transportation system is provided for the second of the second mask set 14 will to be carried along the second mask track 33
Mask carrier is transported from transport vehicle 111 to the second deposition region 132.The evaporation that mask track 32 can be arranged in deposition module
Between source 105 and substrate track 30, make mask set 13 that can be disposed in the front of substrate 10 during deposition, with allow using
Deposit on the substrate 10 to mask.Evaporation source 105 and the second substrate that second mask track 33 can be arranged in deposition module
Between track 31, make the second mask set 14 that can be disposed in the front of first substrate 11 during deposition, to allow using covering
It is deposited on to mould in the second substrate 11.
Transport vehicle 111 can be moveable, while carrier branch along prevailing traffic path 101 on the P of prevailing traffic direction
Multiple substrate carriers and/or mask carrier are supported in support member 301.
Deposition module 300 may include the vacuum chamber 302 of one or two deposition regions with arrangement substrate.It can be true
The pressure of subatmospheric power, such as 10 millibars (mbar) or the pressure lower than 10 millibars are provided in plenum chamber 302.
In the illustrative embodiments of Fig. 3, two deposition regions are provided in vacuum chamber 302, i.e., for arranging base
First deposition region 131 of plate 10 and the second deposition region 132 for arranging the second substrate 11.In addition, in vacuum chamber 302
Middle arrangement evaporation source 105.First deposition region 131 and the second deposition region 132 may be provided on the opposite side of evaporation source 105.
In some embodiments, evaporation source 105 includes one or more distribution with one or more vapor outlet ports
The plume (plume) of pipe, the material for that will evaporate is oriented to substrate.
Optionally, evaporation source 105 may include idle running veil 303.Can by evaporation source 105 from deposition position (as Fig. 3 is retouched
Draw) it is moved to neutral, in neutral, one or more vapor outlet ports are directed to idle running veil 303.It is depositing
Position, one or more vapor outlet ports are directed to the first deposition region 131 or the second deposition region 132.
Can be in some embodiments in conjunction with other embodiments as described herein, evaporation source 105 can be removable
It moves and passes through the first deposition region 131, it is rotatable between the first deposition region 131 and the second deposition region 132, and move
By the second deposition region 132.Neutral can be the evaporation between the first deposition region 131 and the second deposition region 132
The intermediate rotational position in source 105.
Evaporation source 105 can be along source path 331 it is moveable, this source path 331 can be to be prolonged on transverse direction T
The linear path stretched.In particular, can provide the first driver for making evaporation source along 331 moving evaporation source 105 of source path
105 by the first deposition region 131 and/or by the second deposition region.
Evaporation source 105 may include one, two or more distribution pipes, and distribution pipe extends in substantially vertical orientation.One, two or
Each distribution pipe in more distribution pipes can be fluidly connected with the crucible for being configured for evaporation material.In addition, one, two or more
Each distribution pipe in distribution pipe, it may include along multiple vapor outlet ports that the length of one, two or more distribution pipes is arranged, such as
Nozzle.For example, ten, 20 or more vapor outlet ports can be provided along the length of distribution pipe, this length is for example substantially vertical
Orientation on.Idle running veil 303 can extend at least partially around one, two or more distribution pipes of vapor source.In some realities
It applies in mode, in horizontal cross-section, the opening angle (opening angle) of the plume for the evaporation material propagated from steam (vapor) outlet can
Between 30 degree and 60 degree, especially from about 45 degree.
As Fig. 3 describes in more detail, deposition module 300 be can be configured for being then arranged in the first deposition region
131 substrate 10 and the second substrate 11 for being arranged in the second deposition region 132.When evaporation source 105 moves between deposition region,
Evaporation source 105 can be parked in neutral, and in neutral, one or more vapor outlet ports are led to idle running mask object 303.
For example, evaporation source 105 can stop executing at least one in following: maintenance maintenance, cleaning, waits, is directed at substrate or covers
Mould.Alternatively, evaporation source 105 persistently moves between deposition region, without stopping in neutral.In particular, idle running mask
Object 303 is optional feature.
Deposition module 300 can be configured to be deposited on one or more substrates with using mask.First mask set 13
Can be disposed in the first deposition region 131 can be disposed at the second deposition region in 10 front of substrate and/or the second mask set 14
In 11 front of the second substrate in 132.
As used herein " substantially vertical direction " can be regarded as from vertical direction (that is, gravity vector) deviate 10 degree or
It is smaller, especially 5 degree or smaller direction.For example, during transportation, the major surfaces and gravity of substrate (or mask set) to
Angle between amount can be between+10 degree and -10 degree.In some embodiments, during transportation and/or during deposition, base
The direction of plate (or mask set) can not be slightly tilted to be accurately vertical relative to vertical axes, for example, tilt angle-
Between 1 degree and -5 degree.Negative angle refers to the orientation of substrate (or mask set), and wherein substrate (or mask set) dips down
Tiltedly.In deposition process, the deviation of orientation substrate and gravity vector can be beneficial, and can cause more stable deposition
Journey or downwardly direction may be appropriate to for reducing the particle on substrate during deposition.However, during transportation and/
Or during deposition, (+/- 1 degree) of accurate vertical direction is also possible.
In some embodiments, evaporation source 105 can be provided, at least one deposition module to deposit with using mask
Material is on substrate.However present disclosure is not limited to the vacuum system with evaporation source.For example, having developed chemical vapor deposition
(CVD) system, physical vapour deposition (PVD) (PVD) system such as sputtering system (sputtersystems), and/or vapo(u)rization system, with
Coated substrates in deposition chambers, such as thin glass substrate, such as applied for showing.In typical vacuum system, base can be used
Onboard body holds substrate, and substrate carrier can be transported by vacuum chamber by substrate transport system.
Substrate can be non-flexible substrate, such as the clear crystals piece, glass substrate of chip, such as sapphire or the like
Or ceramic wafer.However, present disclosure is without being limited thereto, and term substrate also may include such as coiled material (web) or foil (foil)
Flexible base board, such as metal foil or plastic foil.
In some embodiments, substrate can be large-area substrates.Large-area substrates can have 0.5 square metre of (m2) or
Bigger surface area.Particularly, large-area substrates can be used for manufacturing display, and can be glass or plastic substrate.For example,
Substrate as described herein should be comprising being typically used in LCD (liquid crystal display, Liquid Crystal Display), PDP (etc.
Gas ions display panel, Plasma Display Panel) and analog substrate.For example, large-area substrates can have 1m2Or
Greater than 1m2The major surfaces of area.In some embodiments, large-area substrates can be corresponding to 0.67m2(0.73m x
0.92m) the 4.5th generation substrate of area, correspond to 1.4m2The 5th generation substrate of (1.1m x 1.3m) area, or bigger base
Plate.In addition, large-area substrates can be corresponding to 4.29m2The 7.5th generation substrate of (1.95m x 2.2m) area corresponds to
5.7m2The 8.5th generation substrate of (2.2m x 2.5m) area even corresponds to 8.7m2The of (2.85m × 3.05m) area
10 generation substrates.It can even be similarly effected in higher generation (such as the 11st generation with the 12nd generation substrate) and its corresponding real estate
Product.In some embodiments, during deposition, completely overlapped with substrate in order to provide, mask set is big than substrate.
In some embodiments, on the direction perpendicular to substrate major surfaces, the thickness of substrate can be 1mm or more
It is small, such as from 0.1mm to 1mm, particularly from 0.3mm to 0.6mm, such as 0.5mm.There may be even more thin substrate.
In some embodiments, mask set may include mask and mask frame.Mask frame can be configured so as to cover
Mould is stablized, and mask is usually fragile part.For example, mask frame can surround mask in the form of frame.Mask can be by for good and all
It is fixed in mask frame, such as can be detachably fixed in mask frame by welding or mask.Around mask
Edge can be fixed to mask frame.
Mask may include the multiple openings being formed in pattern, and be configured to by using the deposition of mask to be provided with depositing
In corresponding patterns of material to substrate.During deposition, mask-placement can be connect at the short distance in front of substrate, or directly
Touch the front surface of substrate.For example, mask can be with multiple openings fine metal mask (fine metal mask,
FMM), such as with 100,000 or more openings.For example, the pattern of organic pixel can be deposited on substrate.Other types
Mask be also possible that, such as edge exclusion mask (edge exclusion mask).
In some embodiments, mask set can be at least partially metal, such as a kind of thermal expansion coefficient
Small metal, such as invar (invar).Mask may include magnetic material, so that mask can be magnetically attracted direction during deposition
Substrate.
The area of mask set can be 0.5m2Or more, especially 1m2Or more.For example, the height of mask set can
To be 0.5m2Or more, especially 1m2Or more and/or the width of mask set can be 0.5m2Or more, especially 1m2
Or more.The thickness of mask set can be 1cm or smaller, and wherein mask frame is than mask thickness.
According to one aspect as described herein, a kind of method depositing one or more materials on substrate is described.Fig. 4 is
Illustrate the flow chart of the method according to embodiment as described herein.
In box 410, substrate is transported along prevailing traffic path 101 on the P of prevailing traffic direction.
In block 420, substrate is transported from prevailing traffic path into deposition module on transverse direction T, such as
It is substantially perpendicular on the direction in prevailing traffic direction.In particular, substrate is transported in deposition module along substrate track 30,
Wherein substrate track 30 can extend on transverse direction T.
In box 430, in deposition module in deposition materials to substrate, particularly deposited by evaporating.
During transporting substrate along prevailing traffic path in box 410, substrate, which is immobilizated in, is arranged essentially parallel to cross
To in the orientation of direction T.In particular, the major surfaces of substrate can be during transporting substrate along prevailing traffic path
Substantially parallel (+/- 10 degree) are in transverse direction T.In addition, in a lateral direction by during substrate transport to deposition module, base
Plate is also possible to be held with being arranged essentially parallel to transverse direction, that is, on the direction of substrate track 30.In particular, in box
410, during box 420 and transport and deposition in box 430, the direction of substrate can not change.
In some embodiments, in box 410, substrate is supported on the transport vehicle 111 of the first transportation system.Fortune
Defeated vehicle moves on prevailing traffic direction along prevailing traffic path, while substrate is supported on transport vehicle.In particular, can transport
Supporting substrate on the first vector supporting element of defeated vehicle 111, and transport vehicle may include at least one Second support supporting element, and this
Two carrier supports may be empty.
In some embodiments, in block 420, that is, during transporting from prevailing traffic path to deposition module,
Substrate is non-contactly held by the second transportation system, this second transportation system for example including magnetic suspension system.
According to embodiment as described herein, in transport and in two, three, five or more subsequent deposition moulds
During the deposition (being then transported to substrate in those deposition modules from prevailing traffic path) in block, substrate can be by constantly solid
It holds on the direction for being parallel to transverse direction T.Accordingly, it is possible to reduce the circulation time of system.
In box 410, the first vector supporting element of transport vehicle can support substrate.Transport substrate at box 420 is extremely
Before deposition module, the substrate of pre-coating can be removed deposition module, and move on transport vehicle.In particular, can be by pre-coating
Substrate is from the transport vehicle that deposition module is sent in prevailing traffic path may be on empty Second support supporting element.With
That is, transport vehicle moves on the P of prevailing traffic direction until first vector supporting element and substrate rail alignment.With that is, can be in transverse direction
Substrate is transported from the first vector supporting element of transport vehicle into deposition module along substrate track on direction.It can be not required to substrate rotation
Turn to replace the substrate in deposition module, because the orientation of substrate can correspond to the substrate into deposition module in prevailing traffic path
Orientation.
During handling substrate in vacuum system, substrate can be attached on substrate carrier.Accordingly, " transport substrate " can
To refer to the substrate carrier of transport bearing substrate.
According to one aspect as described herein, a kind of method for transporting mask set in vacuum plant is described.It can be in master
It wants on transporting direction P, mask set is transported along prevailing traffic path 101.It can then in a lateral direction, by mask set
It transports from prevailing traffic path into deposition module, such as on the direction for being substantially perpendicular to prevailing traffic direction P.Especially
It is that can transport mask set into deposition module along the mask track extended in a lateral direction.
During in deposition materials to substrate, mask set can be arranged in front of substrate.Along prevailing traffic road
During diameter transports mask set, mask set can be immobilizated in the orientation for being parallel to transverse direction T.Along mask track
Transport during, the orientation of mask set is also possible to be arranged essentially parallel to transverse direction.In particular, along prevailing traffic road
Diameter and along mask rail transport mask set during, the major surfaces of mask set can be constantly substantially parallel
(+/- 10 degree) are in transverse direction T.
In some embodiments, mask set and substrate can be transported on transport vehicle along prevailing traffic path, and
Both substrate and mask set have the orientation for being parallel to transverse direction.In deposition module, it is possible to provide at the same replace substrate and
Mask set.
In some embodiments, during the transport of box 410 and box 420, and during the deposition of box 430,
The major surfaces of substrate and the major surfaces of mask set can be substantially vertical.
Although the aforementioned embodiment for present disclosure, in the case where not departing from the base region of present disclosure
Other and the further embodiment that present disclosure can be designed, scope of the present disclosure by appended claims Lai
It determines.
Claims (15)
1. a kind of vacuum system (100) for depositing one or more materials on substrate, comprising:
First transportation system (110) is configured on prevailing traffic direction (P) along prevailing traffic path (101) transport matrix
Plate;With
At least one deposition module (104) extends on the transverse direction (T) relative to the prevailing traffic direction (P);
Wherein first transportation system (110) is configured to transport of the substrate on the prevailing traffic direction (P)
Period is by the substrate holder in the orientation for being arranged essentially parallel to the transverse direction (T).
2. vacuum system as described in claim 1, further comprises:
Second transportation system (120) is configured to the substrate (10) on the transverse direction (T) from the prevailing traffic
Path (101) is transported at least one described deposition module (104), and is transported back in the prevailing traffic path (101).
3. vacuum system as claimed in claim 2, wherein first transportation system (110) and second transportation system
(120) be configured to be continuously kept the substrate is oriented substantially perpendicular to the prevailing traffic direction (P).
4. vacuum system as claimed in claim 2 or claim 3, wherein second transportation system (120) includes substrate track (30)
And/or magnetic levitation system, the substrate track (30) extend on the transverse direction (T), the magnetic levitation system is configured
Non-contactly to hold the substrate (10).
5. such as the described in any item vacuum systems of Claims 1-4, wherein first transportation system (110) includes transport vehicle
(111), the transport vehicle can be mobile along the prevailing traffic path (101).
6. vacuum system as claimed in claim 5 is prolonged wherein the transport vehicle (111) is included on the transverse direction (T)
One, two, four, six or more the carrier support (301) stretched, wherein each carrier support is configured to support
Substrate carrier or mask carrier.
7. such as vacuum system described in claim 5 or 6, wherein at least one described deposition module (104) includes having first
The first deposition region (131) of substrate track (30) and second deposition region (132) with the second substrate track (31), and
The transport vehicle includes being used to support the first vector supporting element (112) of first substrate carrier and being used to support the second substrate carrier
Second support supporting element (113), particularly, wherein the first substrate track (30) and the second substrate track (31) it
Between first distance (D1) correspond essentially to the first vector supporting element (112) and the Second support supporting element (113)
Between second distance (D2).
8. vacuum system as described in any one of claim 1 to 7, wherein the prevailing traffic path (101) is substantial linear
Ground extends on the prevailing traffic direction (P), and the transverse direction (T) is substantially perpendicular to the prevailing traffic direction (P),
And/or the substrate (10) is oriented to substantially vertical orientation.
9. vacuum system as claimed in any one of claims 1 to 8, wherein evaporation source (105) provides described that at least one is heavy
In volume module (104), particularly, wherein the evaporation source (105) is can to move and be configured at the transverse direction (T)
With by organic material towards described substrate-guided.
10. vacuum system as described in any one of claim 1 to 9, first including being located at the prevailing traffic path (101)
Multiple first sides deposition module on side (S1) and the prevailing traffic is located opposite from the multiple first side deposition module
Multiple second side deposition modules in the second side (S2) in path (101), plurality of second transportation system are provided in institute
It states on transverse direction (T) between the prevailing traffic path and first side deposition module and second side deposition module
Transport several substrates and/or several mask sets.
11. vacuum system as described in any one of claim 1 to 10 further comprises one or more mask process modules
(211), one or more of mask process modules arrange adjacent to the prevailing traffic path (101) and including mask process
Component, the mask process component are configured to for mask set being loaded into the vacuum system or from the vacuum system
Unloading.
12. a kind of for depositing the vacuum system of one or more materials on substrate, comprising:
First transportation system (110), including transport vehicle (111), the transport vehicle are configured to along at prevailing traffic direction (P)
Transport one or more substrate carriers and/or one or more mask carriers in the prevailing traffic path (101) of upper extension;
Multiple deposition modules (102), the neighbouring prevailing traffic path (101) are arranged in the prevailing traffic path (101)
On first side (S1) and/or second side (S2);With
Multiple second transportation systems are configured on transverse direction (T) in the transport vehicle (111) and the multiple deposition mould
One or more of substrate carriers and/or one or more of mask carriers are transported between block;
Wherein the transport vehicle (111) is configured to one or more of substrate carriers and/or one or more of covers
Mould carrier is retained in the orientation for being arranged essentially parallel to the transverse direction (T).
13. a kind of method for depositing one or more materials on substrate, comprising:
Substrate (10) are transported along prevailing traffic path (101) on prevailing traffic direction (P);
At least one deposition module that the substrate is transported on transverse direction (T) from the prevailing traffic path (101)
(104) in;With
It is deposited on the substrate by material deposition, particularly by evaporating at least one described deposition module;
Wherein along during the prevailing traffic path (101) transport, the substrate holder is being parallel to the transverse direction
(T) in orientation.
14. method as claimed in claim 13, wherein the phase transported and deposited in two or more subsequent deposition modules
Between, the substrate is constantly retained in the orientation for being parallel to the transverse direction (T).
15. method according to claim 13 or 14, wherein carrying out the transport along the prevailing traffic path (101)
Period, the substrate are supported on the transport vehicle (111) of the first transportation system (110), and/or wherein on the prevailing traffic road
During carrying out the transport between diameter and at least one described deposition module, the substrate is non-by the second transportation system (120)
Contiguously hold.
Applications Claiming Priority (1)
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PCT/EP2017/060240 WO2018197009A1 (en) | 2017-04-28 | 2017-04-28 | Vacuum system and method of depositing one or more materials on a substrate |
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WO2021258473A1 (en) * | 2020-06-24 | 2021-12-30 | 武汉华星光电半导体显示技术有限公司 | Evaporation system and evaporation method |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006045618A (en) * | 2004-08-04 | 2006-02-16 | Ulvac Japan Ltd | Vacuum processing apparatus |
CN104620370A (en) * | 2012-09-10 | 2015-05-13 | 应用材料公司 | Substrate processing system and method of processing substrates |
CN105917019A (en) * | 2014-02-04 | 2016-08-31 | 应用材料公司 | Evaporation source for organic material, apparatus having an evaporation source for organic material, system having an evaporation deposition apparatus with an evaporation source for organic materials, and method for operating an evaporation source for organic material |
CN106165081A (en) * | 2014-04-02 | 2016-11-23 | 应用材料公司 | Base plate processing system, for the vacuum rotating module of base plate processing system and for the method that operates base plate processing system |
-
2017
- 2017-04-28 JP JP2018522516A patent/JP2019518863A/en active Pending
- 2017-04-28 WO PCT/EP2017/060240 patent/WO2018197009A1/en active Application Filing
- 2017-04-28 CN CN201780012216.1A patent/CN109154067A/en active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006045618A (en) * | 2004-08-04 | 2006-02-16 | Ulvac Japan Ltd | Vacuum processing apparatus |
CN104620370A (en) * | 2012-09-10 | 2015-05-13 | 应用材料公司 | Substrate processing system and method of processing substrates |
CN105917019A (en) * | 2014-02-04 | 2016-08-31 | 应用材料公司 | Evaporation source for organic material, apparatus having an evaporation source for organic material, system having an evaporation deposition apparatus with an evaporation source for organic materials, and method for operating an evaporation source for organic material |
CN106165081A (en) * | 2014-04-02 | 2016-11-23 | 应用材料公司 | Base plate processing system, for the vacuum rotating module of base plate processing system and for the method that operates base plate processing system |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2021258473A1 (en) * | 2020-06-24 | 2021-12-30 | 武汉华星光电半导体显示技术有限公司 | Evaporation system and evaporation method |
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WO2018197009A1 (en) | 2018-11-01 |
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