CN109115684A - For determining the measurement method and measuring system of laser pre-treated energy level - Google Patents
For determining the measurement method and measuring system of laser pre-treated energy level Download PDFInfo
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- CN109115684A CN109115684A CN201811045738.4A CN201811045738A CN109115684A CN 109115684 A CN109115684 A CN 109115684A CN 201811045738 A CN201811045738 A CN 201811045738A CN 109115684 A CN109115684 A CN 109115684A
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Abstract
The embodiment of the present invention provides a kind of for determining the measurement method and measuring system of laser pre-treated energy level.The described method includes: obtaining the pulse damage threshold of optical element to be processed；Multiple-pulse damage measure is carried out to the optical element to be processed according to the pulse damage threshold, obtains the upper limit value of the pretreatment energy density range of the optical element to be processed；Pretreatment test is carried out to the optical element to be processed with different pulse number amount according to the upper limit value, obtains the lower limit value for the pretreatment energy density range that can produce pretreating effect.It can determine the pretreatment energy density range for being able to ascend optical element performance to be processed through the above way, and then convenient for reducing material defect and reduction damage forerunner's size by carrying out pre-irradiation to optical element to be processed, to improve the laser damage threshold to optical element to be processed.
Description
Technical field
The present invention relates to laser technology fields, in particular to a kind of for determining laser pre-treated energy level
Measurement method and measuring system.
Background technique
KDP (potassium dihydrogen phosphate) and DKDP (potassium dideuterium phosphate) crystal are the function admirables to grow up the 1940s
Inorganic Nonlinear Optical Materials.Because it is with biggish nonlinear optical coefficients, higher laser damage threshold, wider
Optical band, excellent optical homogeneity are easily achieved phase matched, are easy to the advantages that monocrystal of growing large-size, in optics
It is widely applied in system.In high power laser system, the damage of induced with laser frequency-doubling crystal has become limitation system power and mentions
The key factor risen.Therefore, the technical issues of lens lesion threshold value is those skilled in the art's urgent need to resolve how is improved.
Summary of the invention
In order to overcome above-mentioned deficiency in the prior art, being designed to provide for the embodiment of the present invention is a kind of sharp for determining
Light pre-processes the measurement method and measuring system of energy level, can determine and is able to ascend the pre- of optical element performance to be processed
Energy density range is handled, and then convenient for pre-irradiation reduces material defect and reduction damages by carrying out to optical element to be processed
Forerunner's size, to improve the laser damage threshold to optical element to be processed.
In a first aspect, the embodiment of the present invention provide it is a kind of for determining the measurement method of laser pre-treated energy level, institute
The method of stating includes:
Obtain the pulse damage threshold of optical element to be processed；
Multiple-pulse damage measure carried out to the optical element to be processed according to the pulse damage threshold, described in acquisition
The upper limit value of the pretreatment energy density range of optical element to be processed；
Pretreatment test is carried out to the optical element to be processed with different pulse number amount according to the upper limit value, obtaining can
Generate the lower limit value of the pretreatment energy density range of pretreating effect.
Optionally, in embodiments of the present invention, described according to the upper limit value with different pulse number amount to described wait locate
Reason optical element carries out pretreatment test, obtains the step of the lower limit value for the pretreatment energy density range that can produce pretreating effect
After rapid, the method also includes:
Laser pulse within the scope of the pretreatment energy density is located to the optics member to be processed using energy density
Part carries out pre-irradiation, to improve the damage threshold of the optical element to be processed.
Optionally, in embodiments of the present invention, described to be located within the scope of the pretreatment energy density using energy density
Laser pulse pre-irradiation is carried out to the optical element to be processed mode include:
The energy density and repetition arteries and veins of laser pulse according to the pretreatment energy density range setting for pre-irradiation
Frequency is rushed, and pre-irradiation is carried out to the optical element to be processed.
Optionally, in embodiments of the present invention, the mode of the pulse damage threshold for obtaining optical element to be processed
Include:
Pulse damage measure is carried out to the optical device to be processed using 1-on-1 test mode, to obtain the list
Impulse impairments threshold value.
Optionally, in embodiments of the present invention, described first to the optics to be processed according to the pulse damage threshold
Part carries out multiple-pulse damage measure, obtains the mode of the upper limit value of the pretreatment energy density range of the optical element to be processed
Include:
Repetition pulse damage measure is carried out to the optical element to be processed using S-on-1 test mode, is obtained different heavy
Repetition pulse damage threshold under recovering pulse, and the minimum in the repetition pulse damage threshold under different repetition pulses is repeated into arteries and veins
Rush upper limit value of the damage threshold as the pretreatment energy density range.
Optionally, in embodiments of the present invention, institute according to the upper limit value with different pulse number amount to the light to be processed
Learn the step of element carries out pretreatment test, obtains the lower limit value for the pretreatment energy density range that can produce pretreating effect packet
It includes:
Multiple test energy densities less than the upper limit value are set, and according to multiple test energy densities respectively using tool
There is same test energy density but the different laser of number of pulses pre-processes the optical element to be processed；
1-on-1 test is carried out to the pretreated optical element to be processed respectively, it is pretreated described to obtain
The pulse damage threshold of optical element to be processed；
Analyze to obtain according to the pulse damage threshold of multiple pretreated optical elements to be processed can produce it is pre-
The lower limit value of the pretreatment energy density range for the treatment of effect.
Second aspect, the embodiment of the present invention also provide a kind of measuring system, applied to described for determining that laser is located in advance
The measurement method of energy level is managed, the measuring system includes control device, laser, energy regulator, optical splitter, energy
Meter, sample stage, light source and image acquisition device,
The laser is for providing laser pulse, wherein carries on the energy regulator, optical splitter and sample stage
Optical element to be processed is arranged in the optical path of the laser pulse；
The energy regulator and the control device communicate to connect, for being referred to according to the first of the control device the control
It enables and energy adjustment is carried out to the laser pulse that the laser provides；
The optical splitter is used to for the laser pulse after energy regulator adjusting being divided into two bundles, a branch of to be radiated to position
In on the optical element to be processed on the sample stage, another beam is radiated on the energy meter；
The energy meter for measure the pulsed laser energy being radiated on the energy meter, with obtain be radiated to described in
Handle the pulsed laser energy on optical element；
Described image collector and the control device communicate to connect, for acquiring institute under the illumination that the light source provides
State the light spot image on optical element to be processed, and be sent to the control device so that control device judgement it is described to
Whether processing optical element damages after being radiated by laser pulse.
Optionally, in embodiments of the present invention, the measuring system further includes optical gate,
The optical gate is arranged between the laser and the energy regulator, and is located at swashing for laser offer
In the optical path of light pulse；
The optical gate and the control device communicate to connect, for being changed according to the second control instruction of the control device
State is to control whether the laser pulse provided by the laser is radiated on the optical element to be processed.
Optionally, in embodiments of the present invention, the measuring system further includes wave plate and focus lamp, wherein the wave plate
And the focus lamp is located in the optical path of the laser pulse of laser offer,
The wave plate is arranged between the energy regulator and optical splitter, for making after the energy regulator is adjusted
Laser pulse in the middle part of shunt excitation light pulse pass through；
The focus lamp is used for the wherein beam of laser pulse concentration after optical splitter light splitting to described to be processed
On optical element.
Optionally, in embodiments of the present invention, the control device and the sample stage communicate to connect, described for controlling
Sample stage movement is mobile to drive the optical element to be processed, so as to test point different on the optical element to be processed
It is tested.
In terms of existing technologies, the invention has the following advantages:
The embodiment of the present invention provides a kind of for determining the measurement method and measuring system of laser pre-treated energy level.It is first
It first passes through test and obtains the pulse damage threshold of optical element to be processed, then to be less than the pulse damage threshold not
Co-energy density carries out multiple-pulse damage measure to the optical element to be processed, to obtain the optical element to be processed
Pre-process the upper limit value of energy density range.It is last different according to being used on the different-energy level of density for being less than the upper limit value
Number of pulses carries out pretreatment test to the optical element to be processed, and obtains can produce pretreatment according to pretreatment test result
The lower limit value of the pretreatment energy density range of effect.It can determine through the above way as a result, and be able to ascend optics member to be processed
The pretreatment energy density range of part performance, and then convenient for reducing material defect by carrying out pre-irradiation to optical element to be processed
And reduce damage forerunner's size, to improve the laser damage threshold to optical element to be processed.
For enable invention above objects, features, and advantages be clearer and more comprehensible, present pre-ferred embodiments are cited below particularly, and
Cooperate appended attached drawing, is described in detail below.
Detailed description of the invention
In order to illustrate the technical solution of the embodiments of the present invention more clearly, below will be to needed in the embodiment attached
Figure is briefly described, it should be understood that the following drawings illustrates only certain embodiments of the present invention, therefore is not construed as pair
The restriction of range for those of ordinary skill in the art without creative efforts, can also be according to this
A little attached drawings obtain other relevant attached drawings.
Fig. 1 is one of the flow diagram of measurement method provided in an embodiment of the present invention.
Fig. 2 is the relational graph of damage threshold and pulse number provided in an embodiment of the present invention.
Fig. 3 is the flow diagram for the sub-step that Fig. 1 step S130 includes.
Fig. 4 is the two of the flow diagram of measurement method provided in an embodiment of the present invention.
Fig. 5 is one of damage probability curve synoptic diagram provided in an embodiment of the present invention.
Fig. 6 is the two of damage probability curve synoptic diagram provided in an embodiment of the present invention.
Fig. 7 is the three of damage probability curve synoptic diagram provided in an embodiment of the present invention.
Fig. 8 is damage threshold table provided in an embodiment of the present invention.
Fig. 9 is the four of damage probability curve synoptic diagram provided in an embodiment of the present invention.
Figure 10 is the five of damage probability curve synoptic diagram provided in an embodiment of the present invention.
Figure 11 is change curve of the damage probability provided in an embodiment of the present invention about pretreatment energy.
Figure 12 is one of the schematic diagram of measuring system provided in an embodiment of the present invention.
Figure 13 is the two of the schematic diagram of measuring system provided in an embodiment of the present invention.
Icon: 100- measuring system；101- optical element to be processed；110- laser；120- optical gate；130- energy adjustment
Device；140- wave plate；151- optical splitter；152- energy meter；160- focus lamp；171- light source；172- image acquisition device；180- sample
Platform；190- control device.
Specific embodiment
Below in conjunction with attached drawing in the embodiment of the present invention, technical solution in the embodiment of the present invention carries out clear, complete
Ground description, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.Usually exist
The component of the embodiment of the present invention described and illustrated in attached drawing can be arranged and be designed with a variety of different configurations herein.Cause
This, is not intended to limit claimed invention to the detailed description of the embodiment of the present invention provided in the accompanying drawings below
Range, but it is merely representative of selected embodiment of the invention.Based on the embodiment of the present invention, those skilled in the art are not doing
Every other embodiment obtained under the premise of creative work out, shall fall within the protection scope of the present invention.
It should also be noted that similar label and letter indicate similar terms in following attached drawing, therefore, once a certain Xiang Yi
It is defined in a attached drawing, does not then need that it is further defined and explained in subsequent attached drawing.Meanwhile of the invention
In description, term " first ", " second " etc. are only used for distinguishing description, are not understood to indicate or imply relative importance.
With reference to the accompanying drawing, it elaborates to some embodiments of the present invention.In the absence of conflict, following
Feature in embodiment and embodiment can be combined with each other.
Fig. 1 is please referred to, Fig. 1 is provided in an embodiment of the present invention for determining the measurement method of laser pre-treated energy level
One of flow diagram.The detailed process of the measurement method is described in detail below.
Step S110 obtains the pulse damage threshold of optical element to be processed.
In the present embodiment, it is necessary first to which the pulse damage threshold for obtaining optical element to be processed measures so as to subsequent
It can be improved the pretreatment energy density range of the damage threshold of optical element to be processed.Wherein, the pulse damage threshold
Greater than the pretreatment energy density range higher limit.The optical element to be processed may be, but not limited to, KDP crystal,
DKDP crystal etc..Wherein, energy density and the product of facula area are single pulse energy.
In the embodiment of the present embodiment, the mode packet of the pulse damage threshold for obtaining optical element to be processed
It includes: pulse damage measure being carried out to the optical element to be processed using 1-on-1 test mode, to obtain the pulse
Damage threshold.Pulse damage measure determines the damage energy of pulse using the 1-on-1 test method (ISO-21254) of standard
Amount.Wherein, each test point only irradiates once in 1-on-1 test mode.
Step S120 carries out multiple-pulse damage to the optical element to be processed according to the pulse damage threshold and surveys
Examination obtains the upper limit value of the pretreatment energy density range of the optical element to be processed.
In actual use, optical element to be processed can all undergo the irradiation of multiple pulse (thousands of hairs), it is therefore desirable to obtain
Under multiple secondary laser pulse irradiation the damage threshold of optical element to be processed.In the present embodiment, it is surveyed using S-on-1
Examination mode carries out repetition pulse damage measure to the optical element to be processed, obtains the repetition pulse damage under different repetition pulses
Hurt threshold value, and using the minimum repetition pulse damage threshold in the repetition pulse damage threshold under different repetition pulses as described pre-
Handle the upper limit value of energy density range.
Wherein, S-on-1 test is to take the laser of an energy density to a point on sample (optical element i.e. to be processed)
S hair irradiation is carried out to stop irradiating, change next point if sample damages in S hair.It is above-mentioned to change energy density repetition
Process obtains the corresponding damage probability of each energy density, then can draw out damage probability curve.Optionally, energy density
The process of change can be since the pulse damage threshold the decrease of power density down.
Referring to figure 2., Fig. 2 is the relational graph of damage threshold and pulse number provided in an embodiment of the present invention.Pass through S-on-
The damage threshold under different pulse number irradiation can be obtained in 1 test.Damage threshold year irradiance pulse number variation tendency such as Fig. 2
Shown, with the increase of pulse number, damage threshold can reduce, finally can be substantially constant, this stable damage threshold is
Pre-process the upper limit value of energy density range.
Step S130 carries out pretreatment survey to the optical element to be processed with different pulse number amount according to the upper limit value
Examination, obtains the lower limit value for the pretreatment energy density range that can produce pretreating effect.
In the present embodiment, referring to figure 3., Fig. 3 is the flow diagram for the sub-step that Fig. 1 step S130 includes.Step
S130 may include sub-step S131, sub-step S132 and sub-step S133.
Multiple test energy densities less than the upper limit value are arranged in step S131, and according to multiple test energy densities
Respectively using with same test energy density but the different laser of number of pulses locates the optical element to be processed in advance
Reason.
Step S132 carries out 1-on-1 test to the pretreated optical element to be processed respectively, to obtain pre- place
The pulse damage threshold of the optical element to be processed after reason.
Step S133 analyzes to obtain according to the pulse damage threshold of multiple pretreated optical elements to be processed
It can produce the lower limit value of the pretreatment energy density range of pretreating effect.
In the present embodiment, energy density is gradually reduced according to the upper limit value of the pretreatment energy density range, to set
Set multiple test energy densities.Then in each test fluence level, respectively using different pulse numbers to described wait locate
Reason optical element is pre-processed (for example, 1 is dealt into 3000 hairs).It is following then carry out 1-on-1 test, to determine in different surveys
The minimum pulse number of pretreating effect can be generated under examination energy density.Wherein, if pulse number reaches 1000 hairs, it is greater than pre-
If repetition rate, and without generating pretreating effect, it may be considered that the energy density is not enough to generate pretreating effect.By
This can determine the minimum energy density that can generate pretreating effect to get the lower limit value for arriving the pretreatment energy density.Its
In, with the increase of pretreatment laser pulse number, pretreating effect can be gradually obvious, for example, can generate under 1000 hairs time
The energy density of pretreating effect is less than the lower energy density that can generate pretreating effect of 1 hair time.
Referring to figure 4., Fig. 4 is the two of the flow diagram of measurement method provided in an embodiment of the present invention.In step S130
Later, the method can also include step S140.
Step S140 is located at the laser pulse within the scope of the pretreatment energy density to described wait locate using energy density
It manages optical element and carries out pre-irradiation, to improve the damage threshold of the optical element to be processed.
In the embodiment of embodiment, the laser arteries and veins of pre-irradiation is used for according to the pretreatment energy density range setting
The energy density and repetition pulse frequency of punching, and pre-irradiation is carried out to the optical element to be processed.Energy density and repetition arteries and veins
Can pretreating effect be had an impact by rushing frequency, wherein energy density is affected.In the energy of the laser for pre-irradiation
When metric density is greater than the lower limit value of the pretreatment energy density range, only improves energy density or only increases pulse number,
Pretreating effect can be improved, it may be assumed that the laser for pre-irradiation energy density within the scope of the pretreatment energy density
When, if hair time is identical, energy density is higher, and pretreating effect is better；If energy density is identical, time more, pretreating effect is sent out
Better.
Measurement method is illustrated so that the optical element to be processed is DKDP crystal as an example below.
1-on-1 damage measure first is carried out to DKDP crystal with 1064nm (1 ω) and 355nm (3 ω) laser respectively, is obtained
Pulse damage probability curve can get as shown in Fig. 5 (laser flux in Fig. 5 is energy density) based on matched curve
Pulse damage threshold.Wherein, the spot diameter of 1 ω laser used in damage measure is 447 μm, pulsewidth 10ns, and frequency is
1Hz；And the spot diameter of 3 ω laser is 375 μm, pulsewidth 10ns, frequency 1Hz.According to fitting result, DKDP crystal is obtained
The 1-on-1 damage threshold of 3 ω is about 11J/cm2, the 1-on-1 damage threshold of 1 ω is about 17J/cm2。
Then repetition pulse damage measure is carried out with 1 ω and 3 ω laser respectively, obtains the repeated trauma threshold under different pulses
Value, to obtain the upper limit value of the pretreatment energy density range.Fig. 6, which is shown, makees S-on-1 survey with 1064nm (1 ω) laser
Obtained damage probability curve is tried, the spot diameter of 1 ω laser used in damage measure is 447 μm, pulsewidth 10ns, frequency
For 30Hz.It will be appreciated from fig. 6 that the damage threshold (S-on-1) of DKDP crystal is about 17J/cm as S=102；As S=100, S=
1000, when S=2000, the damage threshold (S-on-1) of DKDP crystal is about 10J/cm2, damage threshold at this time is significantly lower than S
Damage threshold when=10.It follows that pulse number increases when laser energy density is identical, damage probability increasing will lead to
Greatly, but when the extra certain amount of pulse (for example, 100), damage threshold tends towards stability substantially, the damage threshold to tend towards stability
The upper limit value of pretreatment energy density range when then for using 1064nm (1 ω) laser.
Fig. 7 show the damage probability curve tested with 355nm (3 ω) laser as S-on-1.Test 3 ω used
The spot diameter of laser is 373 μm, pulsewidth 10ns, frequency 30Hz.Test shows that as S=10, S=100, DKDP is brilliant
The damage threshold (S-on-1) of body is about 11J/cm2, and when S=1000,2000 and 3000, damage threshold (S-on-1) reduces
To about 8J/cm2.It follows that pulse number increases when laser energy density is identical, damage probability increase, pulse will lead to
When number is more than certain amount (for example, 1000), damage threshold tends towards stability, and the damage threshold to tend towards stability is then use
The upper limit value of pretreatment energy density range when 355nm (3 ω) laser.
Incorporated by reference to referring to Fig. 8, Fig. 8 is damage threshold table provided in an embodiment of the present invention.Fig. 8 is according to curve-fitting results
The S-on-1 damage threshold of DKDP crystal under the value of obtained different S.In the S-on-1 test process of 1 ω and 3 ω, occur
Following phenomenon: laser pulse number increase causes damage threshold to reduce (reduce about 30%), but when S continues to increase to 1000~
When 3000 hair, damage threshold will not continue to reduce and be to maintain stabilization.It is therefore contemplated that damage threshold keeps stable numerical value
The as safe energy point of DKDP crystal, it may be assumed that the upper limit value of pretreatment energy density range when using 1064nm (1 ω) laser
About 10J/cm2, the upper limit value of pretreatment energy density range when using 355nm (3 ω) laser is about 8J/cm2。
Finally determine pretreatment energy density lower range limit.Due to the energy density of pretreating effect and the laser used
And pulse hair time is related, therefore can test to obtain the corresponding place of laser with different-energy density and different pulse hairs time
Effect is managed, to determine the minimum energy density that can produce pretreating effect.
Fig. 9 show with different-energy density and it is different hair time 1064nm (1 ω) laser pre-treated after with it is untreated
The comparison of DKDP lens lesion probability.In pretreatment, several points on sample is first taken to carry out N-on-1 (N=100 or 1000)
Pre-irradiation, and the coordinate of record preprocessing energy density and corresponding points.Then, 10-on-1 is carried out on point after the pre-treatment
Damage measure, then draw sample damage probability curve.Pretreatment and damage measure used in laser parameter be 1 ω,
447μm,10ns,30Hz.In conjunction with Fig. 9 it is found that the 10-on-1 damage threshold of not pretreated DKDP crystal is about 16J/cm2；
With 1000 hair 6J/cm2The 10-on-1 damage threshold of pretreated crystal is about 20J/cm2；With 100 hair 8J/cm2After pretreatment
The 10-on-1 damage threshold of crystal be also about 20J/cm2；And 8J/cm are sent out with 10002Laser pre-irradiation after sample 10-
On-1 damage threshold is about 25J/cm2。
Figure 10 show with different-energy density and it is different hair time 355nm (3 ω) laser pre-treated after with it is untreated
The comparison of DKDP lens lesion probability.In pretreatment, several points on sample is taken to carry out N-on-1 (N=100 or 1000)
Pre-irradiation, and the coordinate of record preprocessing energy density and corresponding points.Then, carry out 10-on-1's on point after the pre-treatment
Damage measure then draws the damage probability curve of sample.Pretreatment and damage measure used in laser be 3 ω, 373 μm,
10ns,30Hz.In conjunction with Figure 10 it is found that the 10-on-1 damage threshold of not pretreated DKDP crystal is about 11J/cm2；With 100
Send out 4.5J/cm2Laser treatment after its 10-on-1 damage threshold be 12J/cm2；With 1000 hair 2J/cm2Laser treatment after its
10-on-1 damage threshold is 12J/cm2；With 1000 hair 4.5J/cm2, 100 hair 6J/cm2With the laser treatment of 1000 hair 6J/cm2
The 10-on-1 damage threshold of crystal is close afterwards, about 17J/cm2。
In conjunction with above content it is found that the performance of DKDP crystal, identical energy can be promoted by increasing pretreated energy density
When density, the performance of DKDP crystal can also be promoted by increasing pretreated hair.Wherein, pre-process the upper limit value of energy density by
Repetition pulse damage threshold determines that after hair time is more than certain hair sub-value (for example, 1000 hairs), pretreating effect tends towards stability.
The minimum energy of pretreating effect can be generated when measuring respectively with 1 ω and 3 ω laser pre-treated DKDP crystal, thus
The lower limit value of pretreatment energy density range when obtaining respectively using 1064nm (1 ω) laser, 355nm (3 ω).Pretreatment is surveyed
Examination 1 ω laser parameter used is 1064nm, 447 μm, 10ns, 1Hz；The parameter of 3 ω laser be 355nm, 375 μm, 10ns,
1Hz.In experimentation, the energy density of pretreated laser is first set, 30 points on sample is then taken to be N-on-1 (N=3)
Laser pre-treated, then damage measure is carried out to pretreated point.Then the energy density for changing pretreatment laser, keeps damage
The laser energy density for hurting test is constant, repeats to test.When with 1 ω laser pre-treated, the laser of damage measure is 25J/cm2, 1
ω；When with 3 ω laser pre-treated, the laser of damage measure is 18J/cm2, 3 ω.Damage probability is finally obtained about pretreatment energy
The change curve of metric density, as shown in figure 11.
As seen from Figure 11, with the increase of pretreatment energy density, damage probability elder generation held stationary is then begun to down
Drop.If damage probability drops to 0.6, then it is assumed that pretreating effect is produced, then can generate when with 1 ω laser pre-treated
The minimum energy density of pretreating effect is about 6-8J/cm2；When with 3 ω laser pre-treated, pretreating effect can be generated most
Low energy densities are about 4-6J/cm2.It can be obtained when with 1 ω laser pre-treated by above-mentioned as a result, pretreatment effect can be generated
The pretreatment energy density range of fruit is 6-8J/cm2To 10J/cm2；When with 3 ω laser pre-treated, pretreating effect can be generated
Pretreatment energy density range be 4-6J/cm2To 8J/cm2。
When treating processing element and being pre-processed, using energy density be located within the scope of pretreatment energy density laser into
The damage threshold of element to be processed can be improved in row pre-irradiation.If the energy density used is higher than pretreatment energy density range
Upper limit value is less than pulse damage threshold, then will generate fatigue effect, and multiple-pulse damage occurs；It is identical in laser energy density
When, hair time is more, and damage probability is bigger.Wherein, fatigue effect lowers damage threshold.
Figure 12 is please referred to, Figure 12 is one of the schematic diagram of measuring system 100 provided in an embodiment of the present invention.The measurement system
System 100 can be used in above-mentioned measurement method, to obtain the pretreatment energy density range of optical element 101 to be processed.The survey
Amount system 100 may include laser 110, energy regulator 130, optical splitter 151, energy meter 152, sample stage 180, light source
171, image acquisition device 172 and control device 190.Wherein, the control device 190 may be, but not limited to, computer.
The laser 110 is for providing laser pulse.Wherein, the energy regulator 130 and optical splitter 151 are respectively positioned on
In the optical path of the laser provided by the laser 110.The sample stage 180, should be to for carrying optical element 101 to be processed
Processing optical element 101 also is located in the optical path of the laser provided by the laser 110.The energy regulator 130 and institute
The communication connection of control device 190 is stated, for mentioning according to the first control instruction of the control device 190 to the laser 110
The laser pulse of confession carries out energy adjustment.The optical splitter 151 is used for the laser arteries and veins after the energy regulator 130 adjusting
Punching is divided into two bundles, a branch of to be radiated on the optical element to be processed 101, and another beam is radiated on the energy meter 152.It is described
Energy meter 152 is radiated to the light to be processed for measuring the pulsed laser energy being radiated on the energy meter 152, to obtain
Learn the pulsed laser energy on element 101.Described image collector 172 and the control device 190 communicate to connect, in institute
The light spot image acquired on the optical element to be processed 101 under the illumination of the offer of light source 171 is provided, and is sent to the control dress
190 are set, so that the control device 190 judges whether damage after the optical element to be processed 101 is radiated by laser pulse.
In the measuring system 100, the control device 190 passes through the control of energy regulator 130, can control
The step-length that pulse energy increases in test process, to meet testing requirement.The control device 190, which is also based on, passes through institute
The light spot image for stating the acquisition of image acquisition device 172 determines the area after being radiated on currently pending optical element 101 by laser pulse
Whether damaged in domain.By above-mentioned setting, whether damaged in the region after can determine whether laser pulse radiation, and obtain
The energy of the laser pulse.
Figure 13 is please referred to, Figure 13 is the two of the schematic diagram of measuring system 100 provided in an embodiment of the present invention.The measurement system
System 100 can also include optical gate 120.The optical gate 120 is arranged between the laser 110 and the energy regulator 130,
And it is located in the optical path for the laser pulse that the laser 110 provides.The optical gate 120 and 190 communication link of control device
It connects, for changing state according to the second control instruction of the control device 190 to control and be swashed by what the laser 110 provided
Whether light pulse is radiated on the optical element to be processed 101, to realize the control of transmitting and the suspension of laser.For example,
The control device 190 controls the optical gate 120 and opens, and the laser that the laser 110 provides then successively passes through energy adjustment
Device 130, optical splitter 151 are radiated on the optical element to be processed 101；The control device 190 controls the optical gate 120 and closes
It closes, then blocks optical path, the laser that the laser 110 provides cannot be radiated on the optical element to be processed 101.As a result,
During the test, since laser pulse emission number is related to the opening time of 110 frequency of laser and optical gate 120,
The control device 190 can realize the control to emitting times based on the control to optical gate 120.Wherein, the optical gate 120 can be with
It is, but is not limited to, shutter.
In the present embodiment, the measuring system 100 further includes wave plate 140 and focus lamp 160, wherein the wave plate 140
And the focus lamp 160 is located in the optical path of the laser pulse of the laser 110 offer.The wave plate 140 is arranged described
Between energy regulator 130 and optical splitter 151, for making part in the laser pulse after the energy regulator 130 is adjusted
Laser pulse passes through, to filter out stray light, avoids on stray light emission to optical element 101 to be processed.The focus lamp 160
For by the wherein beam of laser pulse concentration after the optical splitter 151 light splitting to the optical element 101 to be processed.By
This, in test, the laser that laser 110 provides successively passes through optical gate 120, energy regulator 130, wave plate 140, optical splitter
151, focus lamp 160 is radiated on the optical element to be processed 101.
In the present embodiment, the control device 190 is communicated to connect with the sample stage 180, for controlling the sample
The movement of platform 180 is to drive the optical element to be processed 101 mobile, so as to different on the optical element 101 to be processed
Test point is tested.Wherein, the mobile accuracy of the sample stage 180 reaches 10-6M, the optical element 101 to be processed are II
Class DKDP crystal, 50mm × 50mm × 10mm.During the test, need to test many points on optical element 101 to be processed,
Namely many positions of sample cannot overlap between position, compare spot size, which can guarantee sample surfaces position
Set do not have it is overlapping.Wherein, during pulse damage measure, the pulse recurrence frequency of the laser 110 is 1Hz；More
In impulse impairments test process, the pulse recurrence frequency of the laser 110 can be 30Hz.
In conclusion the embodiment of the present invention provide it is a kind of for determining the measurement method and survey of laser pre-treated energy level
Amount system.The pulse damage threshold of optical element to be processed is obtained by test first, is then damaged with being less than the pulse
The different-energy density for hurting threshold value carries out multiple-pulse damage measure to the optical element to be processed, to obtain described to be processed
The upper limit value of the pretreatment energy density range of optical element.Last basis is in the different-energy level of density for being less than the upper limit value
It is upper that pretreatment test is carried out to the optical element to be processed using different pulse number amount, and being obtained according to pretreatment test result can
Generate the lower limit value of the pretreatment energy density range of pretreating effect.Can determine through the above way as a result, be able to ascend to
The pretreatment energy density range of optical element performance is handled, and then convenient for subtracting by carrying out pre-irradiation to optical element to be processed
Small material defect and reduction damage forerunner's size, to improve the laser damage threshold to optical element to be processed.
The foregoing is only a preferred embodiment of the present invention, is not intended to restrict the invention, for the skill of this field
For art personnel, the invention may be variously modified and varied.All within the spirits and principles of the present invention, made any to repair
Change, equivalent replacement, improvement etc., should all be included in the protection scope of the present invention.
Claims (10)
1. a kind of for determining the measurement method of laser pre-treated energy level, which is characterized in that the described method includes:
Obtain the pulse damage threshold of optical element to be processed；
Multiple-pulse damage measure is carried out to the optical element to be processed according to the pulse damage threshold, is obtained described wait locate
Manage the upper limit value of the pretreatment energy density range of optical element；
Pretreatment test is carried out to the optical element to be processed with different pulse number amount according to the upper limit value, can produce
The lower limit value of the pretreatment energy density range of pretreating effect.
2. the method according to claim 1, wherein it is described according to the upper limit value with different pulse number amount pair
The optical element to be processed carries out pretreatment test, under the pretreatment energy density range for obtaining can produce pretreating effect
After the step of limit value, the method also includes:
Using energy density be located at it is described pretreatment energy density within the scope of laser pulse to the optical element to be processed into
Row pre-irradiation, to improve the damage threshold of the optical element to be processed.
3. according to the method described in claim 2, it is characterized in that, described using energy density, to be located at the pretreatment energy close
The mode that laser pulse in degree range carries out pre-irradiation to the optical element to be processed includes:
The energy density and repetition pulse frequency of laser pulse according to the pretreatment energy density range setting for pre-irradiation
Rate, and pre-irradiation is carried out to the optical element to be processed.
4. the method according to claim 1, wherein the pulse damage threshold for obtaining optical element to be processed
The mode of value includes:
Pulse damage measure is carried out to the optical device to be processed using 1-on-1 test mode, to obtain the pulse
Damage threshold.
5. the method according to claim 1, wherein it is described according to the pulse damage threshold to described wait locate
It manages optical element and carries out multiple-pulse damage measure, obtain the upper limit of the pretreatment energy density range of the optical element to be processed
The mode of value includes:
Repetition pulse damage measure is carried out to the optical element to be processed using S-on-1 test mode, obtains different repetition arteries and veins
The repetition pulse damage threshold swept away, and the minimum repetition pulse in the repetition pulse damage threshold under different repetition pulses is damaged
Hurt upper limit value of the threshold value as the pretreatment energy density range.
6. the method according to claim 1, wherein institute according to the upper limit value with different pulse number amount to described
Optical element to be processed carries out pretreatment test, obtains the lower limit value for the pretreatment energy density range that can produce pretreating effect
The step of include:
Multiple test energy densities less than the upper limit value are set, and according to multiple test energy densities respectively using with phase
With test energy density but the different laser of number of pulses pre-processes the optical element to be processed；
1-on-1 test is carried out to the pretreated optical element to be processed respectively, it is pretreated described wait locate to obtain
Manage the pulse damage threshold of optical element；
It analyzes to obtain according to the pulse damage threshold of multiple pretreated optical elements to be processed and can produce pretreatment
The lower limit value of the pretreatment energy density range of effect.
7. a kind of measuring system, which is characterized in that applied to described in any one of claim 1-6 for determining that laser is pre-
The measurement method of energy level is handled, the measuring system includes control device, laser, energy regulator, optical splitter, energy
Meter, sample stage, light source and image acquisition device,
The laser is for providing laser pulse, wherein carried on the energy regulator, optical splitter and sample stage wait locate
Reason optical element is arranged in the optical path of the laser pulse；
The energy regulator and the control device communicate to connect, for the first control instruction pair according to the control device
The laser pulse that the laser provides carries out energy adjustment；
The optical splitter is used to for the laser pulse after energy regulator adjusting being divided into two bundles, a branch of to be radiated to positioned at institute
It states on the optical element to be processed on sample stage, another beam is radiated on the energy meter；
The energy meter is radiated to described to be processed for measuring the pulsed laser energy being radiated on the energy meter with acquisition
Pulsed laser energy on optical element；
Described image collector and the control device communicate to connect, for described in the acquisition under the illumination that the light source provides to
Handle the light spot image on optical element, and be sent to the control device so that the control device judge it is described to be processed
Whether optical element damages after being radiated by laser pulse.
8. measuring system according to claim 7, which is characterized in that the measuring system further includes optical gate,
The optical gate is arranged between the laser and the energy regulator, and is located at the laser arteries and veins that the laser provides
In the optical path of punching；
The optical gate and the control device communicate to connect, for changing state according to the second control instruction of the control device
To control whether the laser pulse provided by the laser is radiated on the optical element to be processed.
9. measuring system according to claim 8, which is characterized in that the measuring system further includes wave plate and focus lamp,
Wherein, the wave plate and the focus lamp are located in the optical path of the laser pulse of laser offer,
The wave plate is arranged between the energy regulator and optical splitter, for making swashing after the energy regulator is adjusted
Shunt excitation light pulse passes through in the middle part of light pulse；
The focus lamp is used for the wherein beam of laser pulse concentration after optical splitter light splitting to the optics to be processed
On element.
10. measuring system according to claim 9, which is characterized in that
The control device and the sample stage communicate to connect, for controlling the sample stage movement to drive the light to be processed
It is mobile to learn element, to test test point different on the optical element to be processed.
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