CN109041561A - A kind of electromagnetic shielding method of technique for aircraft composite covering - Google Patents
A kind of electromagnetic shielding method of technique for aircraft composite covering Download PDFInfo
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K9/00—Screening of apparatus or components against electric or magnetic fields
- H05K9/0073—Shielding materials
- H05K9/0081—Electromagnetic shielding materials, e.g. EMI, RFI shielding
- H05K9/0088—Electromagnetic shielding materials, e.g. EMI, RFI shielding comprising a plurality of shielding layers; combining different shielding material structure
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/081—Oxides of aluminium, magnesium or beryllium
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/18—Metallic material, boron or silicon on other inorganic substrates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/20—Metallic material, boron or silicon on organic substrates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
- C23C16/402—Silicon dioxide
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
- C23C28/321—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer with at least one metal alloy layer
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
- C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
Abstract
The present invention relates to aircraft skin technical fields, and disclose a kind of electromagnetic shielding method of technique for aircraft composite covering, specific procedure of processing is as follows: using vacuum vapour deposition, it is evaporation material with silica or aluminium oxide, oxygen is compensation gas, plate the insulating layer of layer of silicon dioxide or aluminium oxide on aircraft skin surface, insulating layer with a thickness of 0.5-1 μm;Using Vacuum Coating method, plate one layer of layers of chrome on aircraft skin insulating layer, layers of chrome with a thickness of 0.1-0.5 μm;Using chemical vapour deposition technique, at 30-55 DEG C, in layers of chrome plate one layer of fluorinated silicon dioxide layer, fluorinated silicon dioxide layer with a thickness of 0.3-0.8 μm;Using Vacuum Coating method, plate one layer of layers of copper on fluorinated silicon dioxide layer, layers of copper with a thickness of 0.2-0.6 μm.The electromagnetic shielding method of the technique for aircraft composite covering so that aircraft skin has good electromagnetic shielding capability, and the setting of multilayer material, while also substantially increasing the protection intensity of aircraft skin.
Description
Technical field
The present invention relates to aircraft skin technical field, specially a kind of electromagnetic shielding method of technique for aircraft composite covering.
Background technique
Aircraft skin, which refers to, to be enclosed in outside airframe structure and is fixed on skeleton with bonding agent or rivet, is formed and is flown
The dimension shape component of machine aerodynamic shape.The stressed-skin construction that aircraft skin and skeleton are constituted has compared with large bearing capacity and rigidity, and
Self weight is but very light, plays the role of receiving and transmitting aerodynamic loading.Active force is transmitted to by covering after bearing aerodynamic effect
On connected fuselage wing skeleton, stress is complicated, and covering is directly contacted with the external world in addition, so it is strong not require nothing more than skin material
Degree is high, plasticity is good, also requires surface smooth, there is higher resistance to corrosion.
In the prior art, aircraft skin is simple intensity, plasticity and the resistance to corrosion for taking consideration covering, still
There is no electromagnetic shielding capability is focused on, aircraft encounter electromagnetic interference can cause tremendous influence to navigation, communication system, be easy
The problems such as existing deviation, pick-up point are inaccurate, noise jamming channel.
Summary of the invention
(1) the technical issues of solving
In view of the deficiencies of the prior art, the present invention provides a kind of electromagnetic shielding method of technique for aircraft composite covering, tools
The advantages that standby electromagnetic shielding capability effect is good and protection intensity is high, solves aircraft skin electromagnetic shielding capability in the prior art
The problem of difference.
(2) technical solution
For the purpose that the above-mentioned electromagnetic shielding capability effect of realization is good and protection intensity is high, the present invention provides following technical side
A kind of case: electromagnetic shielding method of technique for aircraft composite covering.
A kind of electromagnetic shielding method of technique for aircraft composite covering, comprising the following steps:
S1: using vacuum vapour deposition, is evaporation material with silica or aluminium oxide, oxygen is compensation gas, in aircraft
Skin-surface plates the insulating layer of layer of silicon dioxide or aluminium oxide, the insulating layer with a thickness of 0.5-1 μm;
S2: using Vacuum Coating method, and one layer of layers of chrome, the layers of chrome are plated on through S1 treated aircraft skin insulating layer
With a thickness of 0.1-0.5 μm;
S3: using chemical vapour deposition technique, at 30-55 DEG C, contains fluorodioxy for one layer of plating on through S2 treated layers of chrome
SiClx layer, the fluorinated silicon dioxide layer with a thickness of 0.3-0.8 μm;
S4: using Vacuum Coating method, and one layer of layers of copper, the layers of copper are plated on through S3 treated fluorinated silicon dioxide layer
With a thickness of 0.2-0.6 μm;
S5: using dispensing facture, forms a shielded layer on through S4 treated layers of copper, the shielded layer it is main
Ingredient is epoxy resin, the shielded layer with a thickness of 0.5-1 μm;
S6: using Vacuum Coating method, and the laminated golden protective layer of plating one, the alloy are anti-on through S5 treated shielded layer
Sheath with a thickness of 0.2-0.5 μm.
Preferably, the technological parameter of the insulating layer is formed are as follows: evaporation current 5-10mA, oxygen flow 200-
350sccm, evaporation time 30-60min.
Preferably, the technological parameter of the layers of chrome is formed are as follows: chromium target power is 6-12kw, using nitrogen as reaction gas,
The flow of nitrogen is 120-180sccm, plated film time 8-15min.
Preferably, the technological parameter of the fluorinated silicon dioxide layer is formed are as follows: with water and fluorine chromium triethoxy alkane be reaction
The ratio of object, water and fluorine chromium triethoxy alkane is 1:2-1:4, chamber pressure 500-800Pa, sedimentation time 40-
70min。
Preferably, the technological parameter of the layers of copper is formed are as follows: copper target power is 5-10kw, using nitrogen as reaction gas,
The flow of nitrogen is 100-160sccm, plated film time 10-15min.
Preferably, the technological parameter of the shielded layer is formed are as follows: the outspoken diameter of glue is 0.2-0.5mm, and dispensing step pitch is 1-
2mm, dispensing diameter are 5-15mm.
Preferably, the technological parameter of the alloy protective layer is formed are as follows: alloy material power is 8-14kw, is anti-with nitrogen
Gas is answered, the flow of nitrogen is 120-170sccm, plated film time 7-12min.
(3) beneficial effect
Compared with prior art, the present invention provides a kind of electromagnetic shielding method of technique for aircraft composite covering, have with
It is lower the utility model has the advantages that
1, the electromagnetic shielding method of the technique for aircraft composite covering plates one on aircraft skin surface by vacuum vapour deposition
Layer insulating, plates one layer of layers of chrome in surface of insulating layer by Vacuum Coating method, is plated by chemical vapour deposition technique on layers of chrome surface
One layer of fluorinated silicon dioxide layer plates one layer of layers of copper in fluorinated silicon dioxide layer surface by Vacuum Coating method, is handled by dispensing
Method forms a shielded layer on layers of copper surface, plates a laminated golden protective layer, multilayer on the shielding layer finally by Vacuum Coating method
Metal layer and electromagnetic shielding material mutual cooperation are successively plated in aircraft skin surface, so that aircraft skin has good electricity
Shielding ability, and the setting of multilayer material, while also substantially increasing the protection intensity of aircraft skin.
Specific embodiment
Below in conjunction with the embodiment of the present invention, technical solution in the embodiment of the present invention is clearly and completely retouched
It states, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.Based on the present invention
In embodiment, every other implementation obtained by those of ordinary skill in the art without making creative efforts
Example, shall fall within the protection scope of the present invention.
Combined with specific embodiments below the present invention is made further to explain.
Embodiment one
A kind of electromagnetic shielding method of technique for aircraft composite covering proposed by the present invention, comprising the following steps:
S1: using vacuum vapour deposition, is evaporation material with silica, oxygen is compensation gas, on aircraft skin surface
Plate layer of silicon dioxide insulating layer, the insulating layer with a thickness of 0.5 μm;
S2: using Vacuum Coating method, and one layer of layers of chrome, the layers of chrome are plated on through S1 treated aircraft skin insulating layer
With a thickness of 0.1 μm;
S3: using chemical vapour deposition technique, and at 35 DEG C, one layer of fluorine-containing titanium dioxide is plated on through S2 treated layers of chrome
Silicon layer, the fluorinated silicon dioxide layer with a thickness of 0.3 μm;
S4: using Vacuum Coating method, and one layer of layers of copper, the layers of copper are plated on through S3 treated fluorinated silicon dioxide layer
With a thickness of 0.2 μm;
S5: using dispensing facture, forms a shielded layer on through S4 treated layers of copper, the shielded layer it is main
Ingredient is epoxy resin, the shielded layer with a thickness of 0.5 μm;
S6: using Vacuum Coating method, and the laminated golden protective layer of plating one, the alloy are anti-on through S5 treated shielded layer
Sheath with a thickness of 0.2 μm.
Form the technological parameter of the insulating layer are as follows: evaporation current 6mA, oxygen flow 250sccm, evaporation time
For 40min.
Forming the technological parameter of the layers of chrome are as follows: chromium target power is 8kw, using nitrogen as reaction gas, the flow of nitrogen
For 130sccm, plated film time 9min.
Form the technological parameter of the fluorinated silicon dioxide layer are as follows: using water and fluorine chromium triethoxy alkane as reactant, water and
The ratio of fluorine chromium triethoxy alkane is 1:2, chamber pressure 600Pa, sedimentation time 50min.
Forming the technological parameter of the layers of copper are as follows: copper target power is 7kw, using nitrogen as reaction gas, the flow of nitrogen
For 120sccm, plated film time 13min.
Form the technological parameter of the shielded layer are as follows: the outspoken diameter of glue is 0.2mm, and dispensing step pitch is 1mm, and dispensing diameter is
8mm。
Forming the technological parameter of the alloy protective layer are as follows: alloy material power is 9kw, using nitrogen as reaction gas, nitrogen
Flow be 150sccm, plated film time 8min.
Embodiment two
A kind of electromagnetic shielding method of technique for aircraft composite covering proposed by the present invention, comprising the following steps:
S1: using vacuum vapour deposition, is evaporation material with aluminium oxide, and oxygen is compensation gas, plates on aircraft skin surface
One layer of alumina insulating layer, the insulating layer with a thickness of 0.6 μm;
S2: using Vacuum Coating method, and one layer of layers of chrome, the layers of chrome are plated on through S1 treated aircraft skin insulating layer
With a thickness of 0.2 μm;
S3: using chemical vapour deposition technique, and at 40 DEG C, one layer of fluorine-containing titanium dioxide is plated on through S2 treated layers of chrome
Silicon layer, the fluorinated silicon dioxide layer with a thickness of 0.4 μm;
S4: using Vacuum Coating method, and one layer of layers of copper, the layers of copper are plated on through S3 treated fluorinated silicon dioxide layer
With a thickness of 0.3 μm;
S5: using dispensing facture, forms a shielded layer on through S4 treated layers of copper, the shielded layer it is main
Ingredient is epoxy resin, the shielded layer with a thickness of 0.6 μm;
S6: using Vacuum Coating method, and the laminated golden protective layer of plating one, the alloy are anti-on through S5 treated shielded layer
Sheath with a thickness of 0.3 μm.
Form the technological parameter of the insulating layer are as follows: evaporation current 7mA, oxygen flow 200sccm, evaporation time
For 50min.
Forming the technological parameter of the layers of chrome are as follows: chromium target power is 6kw, using nitrogen as reaction gas, the flow of nitrogen
For 140sccm, plated film time 10min.
Form the technological parameter of the fluorinated silicon dioxide layer are as follows: using water and fluorine chromium triethoxy alkane as reactant, water and
The ratio of fluorine chromium triethoxy alkane is 1:2.5, chamber pressure 650Pa, sedimentation time 45min.
Forming the technological parameter of the layers of copper are as follows: copper target power is 8kw, using nitrogen as reaction gas, the flow of nitrogen
For 130sccm, plated film time 12min.
Form the technological parameter of the shielded layer are as follows: the outspoken diameter of glue is 0.3mm, and dispensing step pitch is 1.2mm, dispensing diameter
For 10mm.
Forming the technological parameter of the alloy protective layer are as follows: alloy material power is 11kw, using nitrogen as reaction gas, nitrogen
The flow of gas is 160sccm, plated film time 10min.
Embodiment three
A kind of electromagnetic shielding method of technique for aircraft composite covering proposed by the present invention, comprising the following steps:
S1: using vacuum vapour deposition, is evaporation material with silica, oxygen is compensation gas, on aircraft skin surface
Plate layer of silicon dioxide insulating layer, the insulating layer with a thickness of 0.7 μm;
S2: using Vacuum Coating method, and one layer of layers of chrome, the layers of chrome are plated on through S1 treated aircraft skin insulating layer
With a thickness of 0.3 μm;
S3: using chemical vapour deposition technique, and at 50 DEG C, one layer of fluorine-containing titanium dioxide is plated on through S2 treated layers of chrome
Silicon layer, the fluorinated silicon dioxide layer with a thickness of 0.5 μm;
S4: using Vacuum Coating method, and one layer of layers of copper, the layers of copper are plated on through S3 treated fluorinated silicon dioxide layer
With a thickness of 0.4 μm;
S5: using dispensing facture, forms a shielded layer on through S4 treated layers of copper, the shielded layer it is main
Ingredient is epoxy resin, the shielded layer with a thickness of 0.8 μm;
S6: using Vacuum Coating method, and the laminated golden protective layer of plating one, the alloy are anti-on through S5 treated shielded layer
Sheath with a thickness of 0.4 μm.
Form the technological parameter of the insulating layer are as follows: evaporation current 8mA, oxygen flow 300sccm, evaporation time
For 45min.
Forming the technological parameter of the layers of chrome are as follows: chromium target power is 11kw, using nitrogen as reaction gas, the stream of nitrogen
Amount is 170sccm, plated film time 13min.
Form the technological parameter of the fluorinated silicon dioxide layer are as follows: using water and fluorine chromium triethoxy alkane as reactant, water and
The ratio of fluorine chromium triethoxy alkane is 1:3, chamber pressure 750Pa, sedimentation time 60min.
Forming the technological parameter of the layers of copper are as follows: copper target power is 10kw, using nitrogen as reaction gas, the stream of nitrogen
Amount is 150sccm, plated film time 15min.
Form the technological parameter of the shielded layer are as follows: the outspoken diameter of glue is 0.4mm, and dispensing step pitch is 1.5mm, dispensing diameter
For 13mm.
Forming the technological parameter of the alloy protective layer are as follows: alloy material power is 13kw, using nitrogen as reaction gas, nitrogen
The flow of gas is 170sccm, plated film time 12min.
Example IV
A kind of electromagnetic shielding method of technique for aircraft composite covering proposed by the present invention, comprising the following steps:
S1: using vacuum vapour deposition, is evaporation material with aluminium oxide, and oxygen is compensation gas, plates on aircraft skin surface
One layer of alumina insulating layer, the insulating layer with a thickness of 0.8 μm;
S2: using Vacuum Coating method, and one layer of layers of chrome, the layers of chrome are plated on through S1 treated aircraft skin insulating layer
With a thickness of 0.5 μm;
S3: using chemical vapour deposition technique, and at 35 DEG C, one layer of fluorine-containing titanium dioxide is plated on through S2 treated layers of chrome
Silicon layer, the fluorinated silicon dioxide layer with a thickness of 0.8 μm;
S4: using Vacuum Coating method, and one layer of layers of copper, the layers of copper are plated on through S3 treated fluorinated silicon dioxide layer
With a thickness of 0.5 μm;
S5: using dispensing facture, forms a shielded layer on through S4 treated layers of copper, the shielded layer it is main
Ingredient is epoxy resin, the shielded layer with a thickness of 0.9 μm;
S6: using Vacuum Coating method, and the laminated golden protective layer of plating one, the alloy are anti-on through S5 treated shielded layer
Sheath with a thickness of 0.5 μm.
Form the technological parameter of the insulating layer are as follows: evaporation current 10mA, oxygen flow 350sccm, evaporation time
For 60min.
Forming the technological parameter of the layers of chrome are as follows: chromium target power is 12kw, using nitrogen as reaction gas, the stream of nitrogen
Amount is 180sccm, plated film time 15min.
Form the technological parameter of the fluorinated silicon dioxide layer are as follows: using water and fluorine chromium triethoxy alkane as reactant, water and
The ratio of fluorine chromium triethoxy alkane is 1:4, chamber pressure 800Pa, sedimentation time 70min.
Forming the technological parameter of the layers of copper are as follows: copper target power is 10kw, using nitrogen as reaction gas, the stream of nitrogen
Amount is 160sccm, plated film time 15min.
Form the technological parameter of the shielded layer are as follows: the outspoken diameter of glue is 0.5mm, and dispensing step pitch is 2mm, and dispensing diameter is
15mm。
Forming the technological parameter of the alloy protective layer are as follows: alloy material power is 14kw, using nitrogen as reaction gas, nitrogen
The flow of gas is 160sccm, plated film time 10min.
In conclusion the electromagnetic shielding method of the technique for aircraft composite covering, by vacuum vapour deposition in aircraft skin table
A layer insulating is plated in face, one layer of layers of chrome is plated in surface of insulating layer by Vacuum Coating method, by chemical vapour deposition technique in layers of chrome
One layer of fluorinated silicon dioxide layer is plated on surface, plates one layer of layers of copper in fluorinated silicon dioxide layer surface by Vacuum Coating method, passes through a little
Glue facture forms a shielded layer on layers of copper surface, plates one layer of alloy protective on the shielding layer finally by Vacuum Coating method
Layer, more metal layers and electromagnetic shielding material mutual cooperation be successively plated in aircraft skin surface so that aircraft skin have it is good
Good electromagnetic shielding capability, and the setting of multilayer material, while also substantially increasing the protection intensity of aircraft skin.
It should be noted that the terms "include", "comprise" or its any other variant are intended to the packet of nonexcludability
Contain, so that the process, method, article or equipment for including a series of elements not only includes those elements, but also including
Other elements that are not explicitly listed, or further include for elements inherent to such a process, method, article, or device.
In the absence of more restrictions, the element limited by sentence "including a ...", it is not excluded that including the element
Process, method, article or equipment in there is also other identical elements.
It although an embodiment of the present invention has been shown and described, for the ordinary skill in the art, can be with
A variety of variations, modification, replacement can be carried out to these embodiments without departing from the principles and spirit of the present invention by understanding
And modification, the scope of the present invention is defined by the appended.
Claims (7)
1. a kind of electromagnetic shielding method of technique for aircraft composite covering, which is characterized in that specific procedure of processing is as follows:
S1: using vacuum vapour deposition, is evaporation material with silica or aluminium oxide, oxygen is compensation gas, in aircraft skin
The insulating layer of layer of silicon dioxide or aluminium oxide is plated on surface, the insulating layer with a thickness of 0.5-1 μm;
S2: using Vacuum Coating method, and one layer of layers of chrome, the thickness of the layers of chrome are plated on through S1 treated aircraft skin insulating layer
It is 0.1-0.5 μm;
S3: using chemical vapour deposition technique, and at 30-55 DEG C, one layer of fluorinated silicon dioxide is plated on through S2 treated layers of chrome
Layer, the fluorinated silicon dioxide layer with a thickness of 0.3-0.8 μm;
S4: using Vacuum Coating method, and one layer of layers of copper, the thickness of the layers of copper are plated on through S3 treated fluorinated silicon dioxide layer
It is 0.2-0.6 μm;
S5: using dispensing facture, forms a shielded layer on through S4 treated layers of copper, the main component of the shielded layer is
Epoxy resin, the shielded layer with a thickness of 0.5-1 μm;
S6: using Vacuum Coating method, the laminated golden protective layer of plating one on through S5 treated shielded layer, the alloy protective layer
With a thickness of 0.2-0.5 μm.
2. a kind of electromagnetic shielding method of technique for aircraft composite covering according to claim 1, it is characterised in that: form institute
State the technological parameter of insulating layer are as follows: evaporation current 5-10mA, oxygen flow 200-350sccm, evaporation time 30-
60min。
3. a kind of electromagnetic shielding method of technique for aircraft composite covering according to claim 1, it is characterised in that: form institute
State the technological parameter of layers of chrome are as follows: chromium target power is 6-12kw, and using nitrogen as reaction gas, the flow of nitrogen is 120-
180sccm, plated film time 8-15min.
4. a kind of electromagnetic shielding method of technique for aircraft composite covering according to claim 1, it is characterised in that: form institute
State the technological parameter of fluorinated silicon dioxide layer are as follows: using water and fluorine chromium triethoxy alkane as reactant, water and fluorine chromium triethoxy alkane
Ratio be 1:2-1:4, chamber pressure 500-800Pa, sedimentation time 40-70min.
5. a kind of electromagnetic shielding method of technique for aircraft composite covering according to claim 1, it is characterised in that: form institute
State the technological parameter of layers of copper are as follows: copper target power is 5-10kw, and using nitrogen as reaction gas, the flow of nitrogen is 100-
160sccm, plated film time 10-15min.
6. a kind of electromagnetic shielding method of technique for aircraft composite covering according to claim 1, it is characterised in that: form institute
State the technological parameter of shielded layer are as follows: the outspoken diameter of glue is 0.2-0.5mm, and dispensing step pitch is 1-2mm, and dispensing diameter is 5-15mm.
7. a kind of electromagnetic shielding method of technique for aircraft composite covering according to claim 1, it is characterised in that: form institute
State the technological parameter of alloy protective layer are as follows: alloy material power is 8-14kw, and using nitrogen as reaction gas, the flow of nitrogen is 120-
170sccm, plated film time 7-12min.
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US4686127A (en) * | 1984-05-11 | 1987-08-11 | Brunswick Corporation | Pellicular laminate means for shielding structures from electromagnetic radiation |
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CN102047777A (en) * | 2008-05-30 | 2011-05-04 | 大自达电线股份有限公司 | Electromagnetic-wave shielding material, and printed-wiring board |
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CN103096699A (en) * | 2011-10-31 | 2013-05-08 | 鸿富锦精密工业(深圳)有限公司 | Electromagnetic shielding method and product |
CN204206720U (en) * | 2014-11-10 | 2015-03-11 | 江苏元京电子科技有限公司 | A kind of nano level metal electromagnetic shielding film |
CN205303689U (en) * | 2016-01-19 | 2016-06-08 | 深圳光启高等理工研究院 | Absorbent structure and aircraft covering |
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US4686127A (en) * | 1984-05-11 | 1987-08-11 | Brunswick Corporation | Pellicular laminate means for shielding structures from electromagnetic radiation |
JPS62275519A (en) * | 1986-05-23 | 1987-11-30 | Hiraoka & Co Ltd | Manufacture of wide width sheet material of amorphous thin metal film |
CN102047777A (en) * | 2008-05-30 | 2011-05-04 | 大自达电线股份有限公司 | Electromagnetic-wave shielding material, and printed-wiring board |
CN103096698A (en) * | 2011-10-31 | 2013-05-08 | 鸿富锦精密工业(深圳)有限公司 | Electromagnetic shielding method and product |
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CN103096699A (en) * | 2011-10-31 | 2013-05-08 | 鸿富锦精密工业(深圳)有限公司 | Electromagnetic shielding method and product |
CN204206720U (en) * | 2014-11-10 | 2015-03-11 | 江苏元京电子科技有限公司 | A kind of nano level metal electromagnetic shielding film |
CN205303689U (en) * | 2016-01-19 | 2016-06-08 | 深圳光启高等理工研究院 | Absorbent structure and aircraft covering |
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