CN108987518A - A kind of flexibility condenser mirror - Google Patents
A kind of flexibility condenser mirror Download PDFInfo
- Publication number
- CN108987518A CN108987518A CN201710413138.8A CN201710413138A CN108987518A CN 108987518 A CN108987518 A CN 108987518A CN 201710413138 A CN201710413138 A CN 201710413138A CN 108987518 A CN108987518 A CN 108987518A
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- China
- Prior art keywords
- metallic reflector
- buffer layer
- flexibility
- condenser mirror
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 239000010410 layer Substances 0.000 claims abstract description 72
- 239000000758 substrate Substances 0.000 claims abstract description 31
- 239000000463 material Substances 0.000 claims abstract description 28
- 239000011241 protective layer Substances 0.000 claims abstract description 25
- 229910052782 aluminium Inorganic materials 0.000 claims description 31
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 20
- 239000004411 aluminium Substances 0.000 claims description 20
- 239000000203 mixture Substances 0.000 claims description 7
- 230000008859 change Effects 0.000 claims description 6
- 229920001296 polysiloxane Polymers 0.000 claims description 6
- 238000004544 sputter deposition Methods 0.000 claims description 6
- 239000003292 glue Substances 0.000 claims description 5
- 239000011347 resin Substances 0.000 claims description 5
- 229920005989 resin Polymers 0.000 claims description 5
- 238000004062 sedimentation Methods 0.000 claims description 5
- 239000004332 silver Substances 0.000 claims description 5
- 229910052709 silver Inorganic materials 0.000 claims description 5
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 3
- 230000003139 buffering effect Effects 0.000 claims description 3
- 239000002131 composite material Substances 0.000 claims description 3
- 238000000151 deposition Methods 0.000 claims description 3
- 230000008021 deposition Effects 0.000 claims description 3
- 229910052710 silicon Inorganic materials 0.000 claims description 3
- 239000010703 silicon Substances 0.000 claims description 3
- CSDREXVUYHZDNP-UHFFFAOYSA-N alumanylidynesilicon Chemical compound [Al].[Si] CSDREXVUYHZDNP-UHFFFAOYSA-N 0.000 claims 1
- 150000004767 nitrides Chemical class 0.000 claims 1
- 238000002360 preparation method Methods 0.000 abstract description 8
- 238000012360 testing method Methods 0.000 description 14
- 238000000034 method Methods 0.000 description 13
- 238000010586 diagram Methods 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 238000009835 boiling Methods 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
- 239000010931 gold Substances 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- -1 metallic reflector Substances 0.000 description 4
- 229920000139 polyethylene terephthalate Polymers 0.000 description 4
- 239000005020 polyethylene terephthalate Substances 0.000 description 4
- 239000013077 target material Substances 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 238000001755 magnetron sputter deposition Methods 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- 229910052681 coesite Inorganic materials 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 229910052682 stishovite Inorganic materials 0.000 description 2
- 229910052905 tridymite Inorganic materials 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical group [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 210000004602 germ cell Anatomy 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000005491 wire drawing Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/054—Optical elements directly associated or integrated with the PV cell, e.g. light-reflecting means or light-concentrating means
- H01L31/0547—Optical elements directly associated or integrated with the PV cell, e.g. light-reflecting means or light-concentrating means comprising light concentrating means of the reflecting type, e.g. parabolic mirrors, concentrators using total internal reflection
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/52—PV systems with concentrators
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Optical Elements Other Than Lenses (AREA)
Abstract
The present invention provides a kind of flexible condenser mirrors, including the protective layer, metallic reflector and substrate successively contacted;It is compounded between the protective layer and metallic reflector between buffer layer or the metallic reflector and substrate and is compounded with buffer layer;Or between the protective layer and metallic reflector, buffer layer is compounded between the metallic reflector and substrate;The buffer layer is functionally gradient material (FGM).The present invention increases the buffer layer of functionally gradient material (FGM) preparation in flexible condenser mirror; protective layer and metallic reflector can be improved; or the binding force between metallic reflector and substrate and the compatibility between material, and reduce the stress as caused by coefficient of thermal expansion differences between the two;So as to effectively improve the service life of flexible mirrors.
Description
Technical field
The present invention relates to technical field more particularly to a kind of flexible condenser mirrors.
Background technique
Solar energy has good prospect, has been greatly developed as permanent, the clean energy.Solar energy benefit
With mainly having photo-thermal and the big system of photovoltaic two, wherein opto-thermal system has advantage at low cost because its system is simple, at present just
Commercialized development.In general, solar energy optical-thermal system form has slot type, tower, dish-style (disc type), four germline of Fresnel
System, and wherein for trough system due to high-efficient, technology is the most mature and is widelyd popularize.
Reflecting mirror field is the critical component in solar energy hot systems, and initial stage mainly uses 2 or 4 songs in trough system
Surface glass reflecting mirror is spliced parabolic trough condenser.Bend glass reflecting mirror is since its matter is heavy, frangible, production cost
Height, existing trend are replaced using flexible mirrors.
However existing flexible mirrors mostly use shaggy substrate, it is therefore desirable to add levelling to reduce cost
Layer.In order to improve the service life of metallic reflector, flexible mirrors are generally also provided with protective layer.The structure of this sandwich style
The poor compatibility of material, the problems such as thermal expansion coefficient difference is big, residual stress is big between the layers are usually deposited, to largely effect on
The reflecting mirror service life.
Summary of the invention
In view of this, the technical problem to be solved in the present invention is that a kind of flexible condenser mirror is provided, by flexibility
Some important key sequence boundaries in condenser mirror structure add suitable buffer layer, make reflecting mirror durability with higher,
Weatherability and durability.
The present invention provides a kind of flexible condenser mirrors, including the protective layer, metallic reflector and substrate successively contacted;
It is compounded between the protective layer and metallic reflector between buffer layer or the metallic reflector and substrate and is compounded with buffering
Layer;Or between the protective layer and metallic reflector, buffer layer is compounded between the metallic reflector and substrate;It is described
Buffer layer is functionally gradient material (FGM).
Preferably, the substrate is compounded with leveling layer towards the side in reflecting layer.
Preferably, the leveling layer is UV glue or organosilicon material.
Preferably, the buffer layer is sieve and silica-sesquioxide or silicon-aluminium-nitride-oxide.
Preferably, in the buffer layer, sieve and silica-sesquioxide or silicon-aluminium-nitride-oxide, material composition change in gradient, along gold
Belong to reflecting layer direction aluminium content to increase, along base material direction, silicone content increases.
Preferably, the buffer layer is using silicon target and aluminium target or silico-aluminum target magnetic control sputtering method deposition.It is closed using sial
When golden more target sputtering sedimentations, aluminium or silicone content change in gradient according to target site location in each silico-aluminum target.
Preferably, in the silico-aluminum target, Al content from 90% be successively decremented to the content of 10% or Si from 10% according to
It is secondary to be incremented to 90%;Or the content of Al is successively decremented to 10% from 90% from 10% content incremented by successively to 90% or Si.
Preferably, the metallic reflector is aluminium, or the composite layer of silver or aluminium and silver.
Preferably, the substrate is sheet metal or resin base material.
Compared with prior art, the present invention provides a kind of flexible condenser mirrors, including protective layer, the gold successively contacted
Belong to reflecting layer and substrate;Buffer layer or the metallic reflector and base are compounded between the protective layer and metallic reflector
Buffer layer is compounded between material;Or between the protective layer and metallic reflector, between the metallic reflector and substrate
It is compounded with buffer layer;The buffer layer is functionally gradient material (FGM).The present invention increases functionally gradient material (FGM) preparation in flexible condenser mirror
Buffer layer, the binding force between protective layer and metallic reflector, metallic reflector and substrate can be improved, and reduce the two
Between the stress as caused by coefficient of thermal expansion differences, improve material compatibility;So as to effectively improve the use of flexible mirrors
Service life.
Detailed description of the invention
Fig. 1 is a kind of structural schematic diagram of flexible condenser mirror provided by the invention;
Fig. 2 is the structural schematic diagram for the flexible condenser mirror that the embodiment of the present invention 1 provides;
Fig. 3 is the structural schematic diagram for the flexible condenser mirror that the embodiment of the present invention 2 provides;
Fig. 4 is another structural schematic diagram of flexible condenser mirror provided by the invention;
Fig. 5 is another structural schematic diagram of flexible condenser mirror provided by the invention.
Specific embodiment
The present invention provides a kind of flexible condenser mirrors, including the protective layer, metallic reflector and substrate successively contacted;
It is compounded between the protective layer and metallic reflector between buffer layer or the metallic reflector and substrate and is compounded with buffering
Layer, or both has concurrently;The buffer layer is functionally gradient material (FGM).
Flexibility condenser mirror structural schematic diagram provided by the invention is as shown in Figure 1 comprising the protective layer that successively contacts,
Buffer layer, metallic reflector and substrate.
Another flexible condenser mirror structural schematic diagram provided by the invention is as shown in Figure 2 comprising successively contacts
Protective layer, buffer layer, metallic reflector, leveling layer and substrate.
Another flexible condenser mirror structural schematic diagram provided by the invention is as shown in Figure 3 comprising successively contacts
Protective layer, metallic reflector, buffer layer and substrate.
Another flexible condenser mirror structural schematic diagram provided by the invention is as shown in Figure 4 comprising successively contacts
Protective layer, metallic reflector, buffer layer, leveling layer and substrate.
Another flexible condenser mirror structural schematic diagram provided by the invention is as shown in Figure 5 comprising successively contacts
Protective layer, buffer layer 1, metallic reflector, buffer layer 2, leveling layer and substrate.
Currently preferred, the buffer layer is sieve and silica-sesquioxide or silicon-aluminium-nitride-oxide.Material composition can become in gradient
Change, increase along metallic reflector direction aluminium content, along base material direction, silicone content increases.Its thickness is preferably 10~1000nm.
Preferably, the buffer layer is using silicon target and aluminium target or silico-aluminum target magnetic control sputtering method deposition.It is closed using sial
When the more target sputtering sedimentations of gold have the buffer layer of gradient, aluminium or silicone content become in gradient according to target site location in each silico-aluminum target
Change.Preferably, in target material composition Al content from 90% be successively decremented to the content of 10% or Si from 10% it is incremented by successively to
90%.Or it is preferred, the content of Al is successively passed from 10% content incremented by successively to 90% or Si from 90% in target material composition
Reduce to 10%.
The metallic reflector is preferably aluminium, or the composite layer of silver or aluminium and silver.Its thickness is preferably 20~200nm.This
Invention is to the combination process of the metallic reflector and is not particularly limited, and can be method well known to those skilled in the art, this
The method that invention preferably uses magnetron sputtering.
The substrate is preferably sheet metal or resin base material.Wherein, sheet metal is preferably aluminium sheet, aluminium alloy plate or not
Become rusty steel plate etc.;Resin base material is preferably polyethylene terephthalate (PET) or polymethyl methacrylate (PMMA) or poly- third
Olefin(e) acid system resin etc..Its thickness is preferably 100~2000um.Currently preferred, the substrate is before use, cleaned.
The present invention is to the method for the cleaning and is not particularly limited, and can be method well known to those skilled in the art.
Currently preferred, the substrate is compounded with leveling layer towards the side in reflecting layer.The i.e. described buffer layer is between stream
Between leveling and metallic reflector, or between metallic reflector and protective layer.As shown in Fig. 3,4 and 5.
Preferably, the leveling layer is UV glue or organosilicon material.Its thickness is preferably 1~50um.
The present invention increases the buffer layer of functionally gradient material (FGM) preparation in flexible condenser mirror, and leveling layer and gold can be improved
Belong to the binding force between reflecting layer, and reduce the stress as caused by coefficient of thermal expansion differences between the two, improves material compatibility;
So as to effectively improve the service life of flexible mirrors.
In order to further illustrate the present invention, flexible condenser mirror provided by the invention is carried out below with reference to embodiment detailed
Thin description.
Embodiment 1
1, using reflectivity is 60%~70% wire drawing aluminium as substrate, and with a thickness of 0.1~1mm, surface clean is clean;
2, prepared by UV glue leveling layer, and one layer of UV glue is sprayed on aluminium sheet mirror surface, is then exposed, leveling layer with a thickness of 2~
50um;
3, metallic reflector and buffer layer use magnetron sputtering successive sedimentation, but complete in two process cavities: first
Metallic reflector is sputtered in pure Ar atmosphere using aluminium target;Then buffer layer uses 3~5 silico-aluminum targets, in target material composition
The content of Al is successively decremented to that the content of 10% or Si is incremented by successively to 90% from 10%, and sputter gas uses Ar/O from 90%2
Mixed gas or Ar/O2/N2Mixed gas.
4, one layer of organosilicon is sprayed as protective layer, with a thickness of 10~100um.
The mirror structure of preparation is as shown in Figure 2.
Embodiment 2
1, substrate is used as using polyethylene terephthalate (PET), with a thickness of 0.1~1mm, surface clean is clean;
2, novel buffer layer and metallic reflector use magnetron sputtering successive sedimentation, but complete in two process cavities:
Novel buffer layer uses 3~5 silico-aluminum targets first, and the content of Al is incremented by successively to 90% from 10% in target material composition, or
The content of Si is successively decremented to 10% from 90%, and sputter gas uses Ar/O2Mixed gas or Ar/O2/N2Mixed gas;Then
Metallic reflector is sputtered under pure Ar atmosphere using aluminium target.
3, one layer of organosilicon is sprayed as protective layer, with a thickness of 10~100um.
The mirror structure of preparation is as shown in Figure 3.
Comparative example 1
According to the method for embodiment 1, cushioning layer material is only replaced with into SiO2, other process conditions are identical, preparation reflection
Mirror.Its thickness is identical as reflecting mirror prepared by embodiment 1.
Comparative example 2
According to the method for embodiment 2, cushioning layer material is only replaced with into SiO2, other process conditions are identical, preparation reflection
Mirror.Its thickness is identical as reflecting mirror prepared by embodiment 2.
For the improvement effect for testing novel gradient buffer layer prepared by the present invention, following contrast test is carried out:
Boiling water boiling test and the thereafter test of hundred lattice: test is sent out according to by GSB (the German quality association of aluminium part plated film)
Capable guide executes.It is 98 that planar sample having a size of 100mmx100mm, which is placed on and dyes red temperature with special color,
DEG C desalted water in 8 hours, be then shut off heating function and water temperature be gradually decreased to room temperature, during the cooling of 16 hours
Sample, which retains, to be placed in water;The poly- circulation of aforesaid operations step executes 3 times, and it is 72 small that sample, which retains the total duration placed in water,
When.
After completing the above boiling water boiling test, according to ISO2409-1992 standard, hundred lattice are carried out on the surface of all samples
Test, test result are as shown in table 1:
1 boiling test of table and thereafter hundred lattice test results
In above-mentioned test, the edge of notch is completely smooth, and grid edge does not have any peeling.ISO grade: 0;
There is small pieces peeling in the intersection of notch, actual spoilage is no more than 5% in the area Hua Ge.ISO grade: 1;
The edge and/or intersection of notch, which have, to be peeled off, and area is greater than 5%, but less than 15%.ISO grade: 2;
Reflecting mirror prepared by the present invention has excellent adhesive force it can be seen from testing above.
Salt spray test: (NSS) is tested according to the neutral salt spray of ISO 9227-2012, to Examples 1 to 2 and comparative example 1
The reflecting mirror of~2 preparations is detected, and the results are shown in Table 2:
2 salt spray test result of table
As can be seen from the above embodiments, flexible condenser mirror prepared by the present invention has longer service life.
The above description of the embodiment is only used to help understand the method for the present invention and its core ideas.It should be pointed out that pair
For those skilled in the art, without departing from the principle of the present invention, the present invention can also be carried out
Some improvements and modifications, these improvements and modifications also fall within the scope of protection of the claims of the present invention.
Claims (10)
1. a kind of flexibility condenser mirror, which is characterized in that including the protective layer, metallic reflector and substrate successively contacted;Institute
It states to be compounded between protective layer and metallic reflector between buffer layer or the metallic reflector and substrate and is compounded with buffering
Layer;Or between the protective layer and metallic reflector, buffer layer is compounded between the metallic reflector and substrate;It is described
Buffer layer is functionally gradient material (FGM).
2. it is according to claim 1 flexibility condenser mirror, which is characterized in that the substrate towards metallic reflector one
Side is compounded with leveling layer.
3. flexibility condenser mirror according to claim 2, which is characterized in that the leveling layer is UV glue or organosilicon material
Material.
4. flexibility condenser mirror according to claim 1, which is characterized in that the buffer layer is sieve and silica-sesquioxide or silicon
Aluminum ox nitride.
5. it is according to claim 4 flexibility condenser mirror, which is characterized in that in the buffer layer, sieve and silica-sesquioxide or
Silicon-aluminium-nitride-oxide, material composition change in gradient, increase along metallic reflector direction aluminium content, along base material direction, silicone content
Increase.
6. flexibility condenser mirror according to claim 4, which is characterized in that the buffer layer uses silicon target and aluminium target,
Or silico-aluminum target magnetic control sputtering method deposition.
7. flexibility condenser mirror according to claim 5, which is characterized in that the buffer layer uses the more targets of silico-aluminum
Sputtering sedimentation, aluminium or silicone content change in gradient according to target site location in each silico-aluminum target.
8. it is according to claim 7 flexibility condenser mirror, which is characterized in that in the silico-aluminum target, Al content from
90% be successively decremented to 10% or Si content it is incremented by successively to 90% from 10%;Or the content of Al is incremented by successively from 10%
Content to 90% or Si is successively decremented to 10% from 90%.
9. flexibility condenser mirror according to claim 1, which is characterized in that the metallic reflector is aluminium, or silver-colored, or
The composite layer of aluminium and silver.
10. flexibility condenser mirror according to claim 1, which is characterized in that the substrate is sheet metal or resin
Substrate.
Priority Applications (1)
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CN201710413138.8A CN108987518A (en) | 2017-06-05 | 2017-06-05 | A kind of flexibility condenser mirror |
Applications Claiming Priority (1)
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CN201710413138.8A CN108987518A (en) | 2017-06-05 | 2017-06-05 | A kind of flexibility condenser mirror |
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CN108987518A true CN108987518A (en) | 2018-12-11 |
Family
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112397528A (en) * | 2019-08-16 | 2021-02-23 | 新唐科技股份有限公司 | Optical sensing filter and forming method thereof |
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US20070243355A1 (en) * | 2004-09-21 | 2007-10-18 | Guardian Industries Corp. | First surface mirror with silicon-metal oxide nucleation layer |
CN201344978Y (en) * | 2009-02-10 | 2009-11-11 | 光驰科技(上海)有限公司 | Silver-coated reflector |
CN201654264U (en) * | 2010-03-17 | 2010-11-24 | 常州龙腾太阳能热电设备有限公司 | Reflector suitable for trough solar power generation |
CN102277520A (en) * | 2010-06-08 | 2011-12-14 | 西安康博新材料科技有限公司 | Aluminium-based material reflector and preparation method thereof |
CN202710766U (en) * | 2012-08-12 | 2013-01-30 | 兰州大成科技股份有限公司 | Solar reflector |
CN104678469A (en) * | 2015-03-17 | 2015-06-03 | 中国科学院上海高等研究院 | Graded-index material distributed bragg reflector (DBR) and manufacturing method thereof |
-
2017
- 2017-06-05 CN CN201710413138.8A patent/CN108987518A/en active Pending
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20070243355A1 (en) * | 2004-09-21 | 2007-10-18 | Guardian Industries Corp. | First surface mirror with silicon-metal oxide nucleation layer |
CN201344978Y (en) * | 2009-02-10 | 2009-11-11 | 光驰科技(上海)有限公司 | Silver-coated reflector |
CN201654264U (en) * | 2010-03-17 | 2010-11-24 | 常州龙腾太阳能热电设备有限公司 | Reflector suitable for trough solar power generation |
CN102277520A (en) * | 2010-06-08 | 2011-12-14 | 西安康博新材料科技有限公司 | Aluminium-based material reflector and preparation method thereof |
CN202710766U (en) * | 2012-08-12 | 2013-01-30 | 兰州大成科技股份有限公司 | Solar reflector |
CN104678469A (en) * | 2015-03-17 | 2015-06-03 | 中国科学院上海高等研究院 | Graded-index material distributed bragg reflector (DBR) and manufacturing method thereof |
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Publication number | Priority date | Publication date | Assignee | Title |
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CN112397528A (en) * | 2019-08-16 | 2021-02-23 | 新唐科技股份有限公司 | Optical sensing filter and forming method thereof |
TWI748226B (en) * | 2019-08-16 | 2021-12-01 | 新唐科技股份有限公司 | Photo sensor filtron and methods for forming the same |
CN112397528B (en) * | 2019-08-16 | 2023-09-29 | 新唐科技股份有限公司 | Optical sensing filter and forming method thereof |
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Application publication date: 20181211 |